CN113458042A - Epitaxial wafer cleaning device and cleaning process for LED street lamp production - Google Patents
Epitaxial wafer cleaning device and cleaning process for LED street lamp production Download PDFInfo
- Publication number
- CN113458042A CN113458042A CN202110743747.6A CN202110743747A CN113458042A CN 113458042 A CN113458042 A CN 113458042A CN 202110743747 A CN202110743747 A CN 202110743747A CN 113458042 A CN113458042 A CN 113458042A
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- Prior art keywords
- epitaxial wafer
- box
- conveying mechanism
- box body
- cleaning
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- 238000004140 cleaning Methods 0.000 title claims abstract description 58
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims description 9
- 230000008569 process Effects 0.000 title claims description 9
- 230000007246 mechanism Effects 0.000 claims abstract description 45
- 239000007788 liquid Substances 0.000 claims abstract description 24
- 238000005507 spraying Methods 0.000 claims abstract description 20
- 238000007599 discharging Methods 0.000 claims abstract description 15
- 239000007921 spray Substances 0.000 claims abstract description 14
- 239000002699 waste material Substances 0.000 claims abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 238000005192 partition Methods 0.000 claims description 4
- 238000005201 scrubbing Methods 0.000 claims description 2
- 230000036541 health Effects 0.000 abstract description 4
- 238000011086 high cleaning Methods 0.000 abstract 1
- 238000002791 soaking Methods 0.000 abstract 1
- 239000002351 wastewater Substances 0.000 description 5
- 238000010276 construction Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention relates to an epitaxial wafer cleaning device for LED street lamp production, which comprises a box body, wherein a conveying mechanism driven by a motor is arranged in the box body, a guide frame fixed on the inner wall of the box body is arranged at the top of the conveying mechanism, a cleaning brush driven by an air cylinder and arranged in the box body in a sliding manner is arranged above the guide frame, a spraying mechanism which is fixedly arranged at the top of the box body and connected with a spraying liquid supply box is arranged above the cleaning brush, an epitaxial wafer inlet is arranged at one end of the box body, which is positioned at the conveying mechanism, an epitaxial wafer outlet is arranged at the other end of the box body, which is positioned at the conveying mechanism, a discharging assembly fixed on the box body is arranged at the epitaxial wafer outlet, a discharging pipe with a valve is arranged at one side of the box body, which is positioned below the conveying mechanism, and a waste liquid guide pipe communicated with the discharging assembly is arranged on the discharging pipe; the cleaning machine has high cleaning efficiency, and the cleaning machine can clean the workpiece without soaking hands in the spray liquid for a long time, so that the health of workers is influenced.
Description
Technical Field
The invention relates to the technical field of LED processing equipment, in particular to an epitaxial wafer cleaning device and a cleaning process for LED street lamp production.
Background
The LED street lamp, also called LED street lamp, means the utensil that can pass light, distribute and change the light distribution of LED light source, include all necessary spare parts, parts used for fixing and protecting LED light source except LED light source, and necessary circuit attachment with power connection, the LED street lamp is with its high efficiency, energy-conservation, safety, long-lived, small and exquisite, clear light technical characteristics such as, become the leading product in the illumination market of the new generation, and pull the high-speed development of the environmental protection and energy saving industry powerfully, the heart of LED is a wafer of semiconductor, the wafer of semiconductor is also called epitaxial wafer, the epitaxial wafer is cut by the monocrystalline silicon rod that finishes processing, the surface of epitaxial wafer after finishing the preliminary processing is apt to remain the pollutant, the surface of epitaxial wafer leaves the pollutant and can reduce the quality of LED street lamp, thus can reduce the finished product quantity of LED street lamp, therefore need wash the epitaxial wafer, at present, the epitaxial wafer is generally cleaned by cleaning solution manually, the manual cleaning mode wastes time and labor, the cleaning efficiency is lower, and the manual cleaning hand needs to be soaked in the cleaning solution for a long time, so that the physical health of workers can be influenced. Therefore, the epitaxial wafer cleaning device and the cleaning process for the production of the LED street lamp are provided.
Disclosure of Invention
The invention aims to overcome the problems in the prior art and provides an epitaxial wafer cleaning device and a cleaning process for LED street lamp production.
In order to achieve the technical purpose and achieve the technical effect, the invention is realized by the following technical scheme:
the utility model provides a production of LED street lamp is with epitaxial wafer belt cleaning device, the power distribution box comprises a box body, the inside of box is equipped with by motor drive's conveying mechanism, conveying mechanism's top is equipped with the leading truck that is fixed in on the box inner wall, the top of leading truck is equipped with slidable mounting in the inside cleaning brush by cylinder drive of box, the top of cleaning brush is equipped with fixed mounting in the box top and with spray the mechanism that sprays that the liquid supply box is connected, the one end of box is located conveying mechanism department and is equipped with the epitaxial wafer entry, and the other end of box is located conveying mechanism department and is equipped with the epitaxial wafer export, the epitaxial wafer exit is equipped with the row's of being fixed in on the box material subassembly, one side of box is located conveying mechanism's below department and is equipped with the fluid-discharge tube of taking the valve, be equipped with the waste liquid honeycomb duct that is linked together with row's material subassembly on the fluid-discharge tube.
Furthermore, conveying mechanism is including being fixed in the inside support of box, install the conveying roller by motor drive on the support, two through the conveyer belt connection between the conveying roller.
Furthermore, the guide frame comprises two fixing strips fixed inside the box body, and the two fixing strips are connected through a plurality of guide strips.
Further, the cleaning brush is including having the plate body in a plurality of holes of permeating water, a plurality of soft bristle tufts have been planted to the bottom of plate body, and the both ends of plate body are equipped with rather than integrated into one piece and by cylinder driven connecting plate, the cylinder is fixed in on the box through the mounting panel.
Furthermore, the spraying mechanism comprises a connecting pipe connected with the spraying liquid supply box, and a plurality of spraying heads extending into the box body are arranged on the connecting pipe.
Further, arrange the material subassembly including being fixed in the workstation that is located the epitaxial wafer exit on the box, the fixed stabilizer blade that is equipped with in bottom of workstation, the fixed breakwater rather than integrated into one piece that is equipped with in top of workstation, the top of workstation be equipped with gib block matched with division board.
The invention also provides an epitaxial wafer cleaning process, which comprises the following steps:
1) placing an epitaxial wafer to be cleaned in the conveying mechanism from an epitaxial wafer inlet and in the guide frame, and driving the conveying mechanism to work by the motor so as to drive the epitaxial wafer to move;
2) the air cylinder drives the cleaning brush to move up and down to enable the cleaning brush to be in contact with the upper surface of the epitaxial wafer, the cleaning brush cleans the upper surface of the epitaxial wafer, and meanwhile, the spraying mechanism is opened to spray the epitaxial wafer while scrubbing;
3) the cleaned epitaxial wafer enters the discharging assembly from the epitaxial wafer outlet, and a worker takes out the epitaxial wafer from the discharging assembly, turns over the epitaxial wafer by 180 degrees and then puts the epitaxial wafer on the conveying assembly again to clean the other surface of the epitaxial wafer.
According to the epitaxial wafer cleaning device, the cleaning brush, the spraying mechanism and the conveying mechanism are matched to clean the epitaxial wafer, the wastewater after cleaning is discharged from the liquid discharge pipe, the wastewater in the discharging assembly is guided into the liquid discharge pipe by the waste liquid guide pipe to be discharged, the cleaning efficiency is high, and the epitaxial wafer cleaning device is cleaned by equipment without being soaked in the spraying liquid for a long time by hands, so that the health of workers is influenced.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the invention and together with the description serve to explain the invention without limiting the invention. In the drawings:
FIG. 1 is a schematic view of the overall structure of an angle of the present invention;
FIG. 2 is a schematic view of another embodiment of the present invention;
FIG. 3 is a schematic view showing the construction of the washing brush according to the present invention;
FIG. 4 is a schematic view of the construction of the housing and discharge assembly of the present invention;
FIG. 5 is a schematic view of the construction of the transport mechanism of the present invention;
fig. 6 is a schematic structural view of the spray mechanism of the present invention.
The reference numbers in the figures illustrate: 1-supporting leg, 2-water baffle, 3-partition plate, 4-workbench, 5-connecting plate, 6-mounting plate, 7-cylinder, 8-box, 9-connecting pipe, 10-valve, 11-liquid discharge pipe, 12-waste liquid guide pipe, 13-epitaxial wafer outlet, 14-motor, 15-epitaxial wafer inlet, 16-permeable hole, 17-plate body, 18-soft bristle cluster, 19-fixing strip, 20-guide strip, 21-epitaxial wafer, 22-conveying roller, 23-bracket, 24-conveying belt and 25-shower head.
Detailed Description
The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.
As shown in fig. 1 to 6, the present embodiment provides an epitaxial wafer cleaning apparatus for LED street lamp production, which includes a box 8, a conveying mechanism driven by a motor 14 is arranged in the box body 8, a guide frame fixed on the inner wall of the box body 8 is arranged at the top of the conveying mechanism, a cleaning brush which is arranged in the box body 8 in a sliding way and driven by an air cylinder 7 is arranged above the guide frame, a spraying mechanism which is fixedly arranged at the top of the box body 8 and is connected with the spraying liquid supply box is arranged above the cleaning brush, an epitaxial wafer inlet 15 is arranged at one end of the box body 8, which is positioned at the conveying mechanism, an epitaxial wafer outlet 13 is arranged at the other end of the box body 8, which is positioned at the conveying mechanism, a discharging assembly fixed on the box body 8 is arranged at the position of the epitaxial wafer outlet 13, a liquid discharge pipe 11 with a valve 10 is arranged at the position, below the conveying mechanism, of one side of the box body 8, and a waste liquid guide pipe 12 communicated with the discharging assembly is arranged on the liquid discharge pipe 11.
Through the cleaning brush with spray the mechanism and cooperate with conveying mechanism, wash epitaxial wafer 21, the waste water after the completion of wasing is discharged by 11 departments of fluid-discharge tube, and waste liquid honeycomb duct 12 discharges in leading-in fluid-discharge tube 11 of the inside waste water of row material subassembly, and the cleaning efficiency is high, and washs through equipment, does not need the long-time bubble of people's hand in spraying liquid, influences workman's health.
Preferably, the conveying mechanism comprises a bracket 23 fixed inside the box body 8, the bracket 23 is provided with conveying rollers 22 driven by the motor 14, and the two conveying rollers 22 are connected through a conveying belt 24.
The motor 14 drives the conveying roller 22 to rotate, and then drives the conveying belt 24 to move, so as to convey the epitaxial wafer 21.
Preferably, the guide frame comprises two fixing strips 19 fixed inside the box body 8, and the two fixing strips 19 are connected through a plurality of guide strips 20.
The guide strips 20 are arranged to limit the position of the epitaxial wafer 21 and prevent the epitaxial wafer 21 from being displaced during the transportation process.
Preferably, the cleaning brush comprises a plate body 17 with a plurality of water permeable holes 16, a plurality of soft bristle tufts 18 are planted at the bottom of the plate body 17, connecting plates 5 which are integrally formed with the plate body 17 and driven by air cylinders 7 are arranged at two ends of the plate body 17, and the air cylinders 7 are fixed on the box body 8 through mounting plates 6.
The cylinder 7 drives the plate body 17 to move up and down along the box body 8, so that the soft bristle tufts 18 are in contact with the surface of the epitaxial wafer 21, and the water permeable holes 16 are arranged to facilitate the spraying liquid to enter the conveying mechanism.
Preferably, the spraying mechanism comprises a connecting pipe 9 connected with the spraying liquid supply box, and a plurality of spraying heads 25 extending into the box body 8 are arranged on the connecting pipe 9.
The arrangement of the spray header 25 can disperse and spray the spray liquid into the box body 8, thereby improving the spray effect.
Preferably, the discharging assembly comprises a workbench 4 fixed on the box body 8 and located at an epitaxial wafer outlet 13, support legs 1 are fixedly arranged at the bottom of the workbench 4, a water baffle 2 integrally formed with the workbench 4 is fixedly arranged at the top of the workbench 4, and a partition plate 3 matched with the guide strip 20 is arranged at the top of the workbench 4.
The arrangement of the water baffle 2 can prevent the wastewater from flowing out of the workbench 4 to influence the workshop environment, and the arrangement of the partition plate 3 can avoid the influence on the cleaning of the other surface of the epitaxial wafer 21 caused by the messy output of the epitaxial wafer 21 from the conveyer belt 24.
The invention also provides an epitaxial wafer cleaning process, which comprises the following steps:
1) disposing an epitaxial wafer 21 to be cleaned in the conveying mechanism from the epitaxial wafer inlet 15 and inside the guide frame, and driving the conveying mechanism to work by the motor 14 so as to drive the epitaxial wafer 21 to move;
2) the air cylinder 7 drives the cleaning brush to move up and down to enable the cleaning brush to be in contact with the upper surface of the epitaxial wafer 21, the cleaning brush cleans the upper surface of the epitaxial wafer 21, and meanwhile the spraying mechanism is opened to spray the epitaxial wafer 21 while being cleaned;
3) the cleaned epitaxial wafer 21 enters the discharging assembly from the epitaxial wafer outlet 13, and a worker takes out the epitaxial wafer 21 from the discharging assembly, turns over the epitaxial wafer 21 by 180 degrees, puts the epitaxial wafer on the conveying assembly again, and cleans the other surface of the epitaxial wafer 21.
The foregoing shows and describes the general principles, essential features, and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed.
Claims (7)
1. The utility model provides a production of LED street lamp is with epitaxial wafer belt cleaning device, includes the box, its characterized in that: the inside of box is equipped with by motor drive's conveying mechanism, conveying mechanism's top is equipped with the leading truck that is fixed in on the box inner wall, the top of leading truck is equipped with slidable mounting in the inside cleaning brush by cylinder drive of box, the top of cleaning brush be equipped with fixed mounting in the box top and with spray the liquid supply box and be connected spray the mechanism, the one end of box is located conveying mechanism department and is equipped with the epitaxial wafer entry, and the other end of box is located conveying mechanism department and is equipped with the epitaxial wafer export, the epitaxial wafer exit is equipped with the row's of being fixed in material subassembly on the box, one side of box is located conveying mechanism's below department and is equipped with the fluid-discharge tube of taking the valve, be equipped with on the fluid-discharge tube and arrange the waste liquid honeycomb duct that the material subassembly is linked together.
2. The epitaxial wafer cleaning device for the production of the LED street lamp as claimed in claim 1, wherein: the conveying mechanism comprises a support fixed inside the box body, conveying rollers driven by a motor are mounted on the support, and the two conveying rollers are connected through a conveying belt.
3. The epitaxial wafer cleaning device for the production of the LED street lamp as claimed in claim 1, wherein: the guide frame comprises two fixing strips fixed inside the box body, and the two fixing strips are connected through a plurality of guide strips.
4. The epitaxial wafer cleaning device for the production of the LED street lamp as claimed in claim 1, wherein: the cleaning brush is including having the plate body in a plurality of holes of permeating water, a plurality of soft bristle tufts have been planted to the bottom of plate body, and the both ends of plate body are equipped with rather than integrated into one piece and by cylinder driven connecting plate, the cylinder is fixed in on the box through the mounting panel.
5. The epitaxial wafer cleaning device for the production of the LED street lamp as claimed in claim 1, wherein: the spraying mechanism comprises a connecting pipe connected with the spraying liquid supply box, and a plurality of spraying heads extending into the box body are arranged on the connecting pipe.
6. The epitaxial wafer cleaning device for the production of the LED street lamp as claimed in claim 1, wherein: the discharging assembly comprises a workbench fixed on the box body and located at an outlet of the epitaxial wafer, supporting legs are fixedly arranged at the bottom of the workbench, a water baffle integrally formed with the workbench is fixedly arranged at the top of the workbench, and a partition plate matched with the guide strip is arranged at the top of the workbench.
7. A process for cleaning an epitaxial wafer using the apparatus for cleaning an epitaxial wafer of any one of claims 1 to 6, comprising the steps of:
1) placing an epitaxial wafer to be cleaned in the conveying mechanism from an epitaxial wafer inlet and in the guide frame, and driving the conveying mechanism to work by the motor so as to drive the epitaxial wafer to move;
2) the air cylinder drives the cleaning brush to move up and down to enable the cleaning brush to be in contact with the upper surface of the epitaxial wafer, the cleaning brush cleans the upper surface of the epitaxial wafer, and meanwhile, the spraying mechanism is opened to spray the epitaxial wafer while scrubbing;
3) the cleaned epitaxial wafer enters the discharging assembly from the epitaxial wafer outlet, and a worker takes out the epitaxial wafer from the discharging assembly, turns over the epitaxial wafer by 180 degrees and then puts the epitaxial wafer on the conveying assembly again to clean the other surface of the epitaxial wafer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202110743747.6A CN113458042A (en) | 2021-07-01 | 2021-07-01 | Epitaxial wafer cleaning device and cleaning process for LED street lamp production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN202110743747.6A CN113458042A (en) | 2021-07-01 | 2021-07-01 | Epitaxial wafer cleaning device and cleaning process for LED street lamp production |
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CN113458042A true CN113458042A (en) | 2021-10-01 |
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CN202110743747.6A Pending CN113458042A (en) | 2021-07-01 | 2021-07-01 | Epitaxial wafer cleaning device and cleaning process for LED street lamp production |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20110067440A (en) * | 2009-12-14 | 2011-06-22 | 주식회사 다산 | Automatic pipe cleaning system |
CN206935858U (en) * | 2017-06-21 | 2018-01-30 | 巫山县大庙陶大妈皮蛋厂 | A kind of lime-preserved egg cleaning device |
CN206966185U (en) * | 2017-05-06 | 2018-02-06 | 长沙泽航农业科技有限公司 | A kind of steamed crab efficient cleaning machine |
CN207844113U (en) * | 2018-02-11 | 2018-09-11 | 青岛市金玲印务有限公司 | A kind of green printing product transmitting device |
CN108856064A (en) * | 2018-05-03 | 2018-11-23 | 新昌县绿松科技有限公司 | A kind of novel bearing cleaning device |
CN109622442A (en) * | 2018-11-22 | 2019-04-16 | 禹州市合同泰药业有限公司 | A kind of Chinese medicine cleaning device |
-
2021
- 2021-07-01 CN CN202110743747.6A patent/CN113458042A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20110067440A (en) * | 2009-12-14 | 2011-06-22 | 주식회사 다산 | Automatic pipe cleaning system |
CN206966185U (en) * | 2017-05-06 | 2018-02-06 | 长沙泽航农业科技有限公司 | A kind of steamed crab efficient cleaning machine |
CN206935858U (en) * | 2017-06-21 | 2018-01-30 | 巫山县大庙陶大妈皮蛋厂 | A kind of lime-preserved egg cleaning device |
CN207844113U (en) * | 2018-02-11 | 2018-09-11 | 青岛市金玲印务有限公司 | A kind of green printing product transmitting device |
CN108856064A (en) * | 2018-05-03 | 2018-11-23 | 新昌县绿松科技有限公司 | A kind of novel bearing cleaning device |
CN109622442A (en) * | 2018-11-22 | 2019-04-16 | 禹州市合同泰药业有限公司 | A kind of Chinese medicine cleaning device |
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Application publication date: 20211001 |
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