CN113448174A

CN113448174A - Buffer structure, mask table and photoetching machine

Info

Publication number: CN113448174A
Application number: CN202010224501.3A
Authority: CN
Inventors: 杨存攀; 纪俊洋
Original assignee: Shanghai Micro Electronics Equipment Co Ltd
Current assignee: Shanghai Micro Electronics Equipment Co Ltd
Priority date: 2020-03-26
Filing date: 2020-03-26
Publication date: 2021-09-28
Anticipated expiration: 2040-03-26
Also published as: CN113448174B

Abstract

The invention relates to a buffer structure, a mask table and a photoetching machine, wherein the buffer structure comprises a first buffer seat and a second buffer seat which are connected with each other; the first buffer seat is provided with a first flexible reed set, and the first flexible reed set comprises at least two first flexible reeds which are arranged at intervals along a first direction; and a second flexible reed set is arranged on the second buffer seat and comprises at least two second flexible reeds which are arranged at intervals along a second direction, and the first direction is perpendicular to the second direction. The buffer structure can effectively absorb impact during impact and reduce element damage.

Description

Buffer structure, mask table and photoetching machine

Technical Field

The invention relates to the technical field of photoetching, in particular to a buffer structure, a mask table and a photoetching machine.

Background

With advances in lithography and the rapid growth of the semiconductor industry, there is an increasing demand for lithographic apparatus throughput, and high precision, high speed and high speed are inevitable options, particularly for front end lithography machines. The high acceleration and high speed and high precision of the photoetching equipment are contradictory, and in order to solve the contradiction, the current photoetching equipment adopts a structure combining a coarse motion platform and a fine motion platform so as to realize the technical separation of high speed and high precision.

The coarse motion platform is used for completing the large-stroke scanning exposure motion of the mask plate, and the fine motion platform is used for completing the precise fine adjustment of the mask plate. In the moving process of the mask, collision may occur between the coarse motion stage and the fine motion stage, and the main body of the fine motion stage is generally made of microcrystalline glass with high price, so that when the coarse motion stage collides with the fine motion stage, potential safety hazards can be caused, and the fine motion stage is damaged to increase the photoetching cost.

Disclosure of Invention

The invention aims to provide a buffer structure, a mask table and a photoetching machine.

In order to achieve the above object, the present invention provides a buffer structure, which comprises a first buffer seat and a second buffer seat connected with each other; the first buffer seat is provided with a first flexible reed set, and the first flexible reed set comprises at least two first flexible reeds which are arranged at intervals along a first direction; and a second flexible reed set is arranged on the second buffer seat and comprises at least two second flexible reeds which are arranged at intervals along a second direction, and the first direction is perpendicular to the second direction.

Optionally, the number of the first flexible reed groups is at least two, and at least two first flexible reed groups are arranged at intervals along a third direction; the buffer structure further comprises a first impact part, the first impact part is arranged on the first buffer seat, at least part of the edge of the first impact part protrudes out of the second buffer seat in the first direction, the first impact part is arranged between the two adjacent first flexible reed sets in the third direction, and the third direction is perpendicular to the first direction and the second direction.

Optionally, the number of the first flexible spring plate groups is two, and the number of the first striking parts is one.

Optionally, the first flexible spring plate set is formed by forming a plurality of through holes in the first buffer seat, and each through hole penetrates through the first buffer seat in the second direction.

Optionally, a first adjusting mechanism is further disposed on the first buffer seat, and the first adjusting mechanism is configured to adjust rigidity of the first buffer seat.

Optionally, the first adjusting member is a bolt, a first threaded hole penetrating through the first buffer seat along a first direction is formed in the first buffer seat, the first adjusting member is disposed in the first threaded hole, and the rigidity of the first buffer seat is adjusted by adjusting the tightening degree of the bolt.

Optionally, the second buffer seat includes a first sub buffer seat, a second sub buffer seat and a third sub buffer seat arranged in sequence along a second direction, the second sub buffer seat is provided with at least one second flexible spring plate set, the first sub buffer seat and the second sub buffer seat are provided with a first limiting gap therebetween, and the second sub buffer seat and the third sub buffer seat are provided with a second limiting gap therebetween.

Optionally, two second flexible reed sets are arranged on the second sub-buffer seat, the two second flexible reed sets are arranged along the second direction, and a dividing gap is formed between the two second flexible reed sets.

Optionally, at least one second flexible reed set is arranged on the first sub-buffer seat.

Optionally, the second flexible spring plate set is formed by forming a plurality of through holes in the second buffer seat, and each through hole penetrates through the second buffer seat in a third direction; and/or the presence of a gas in the gas,

forming the second flexible reed set by forming a plurality of through holes in the first buffer seat, wherein each through hole penetrates through the first buffer seat in a third direction;

the third direction is perpendicular to the first direction and the second direction.

Optionally, the stiffness of the third sub-cushion socket is greater than the stiffness of the second flexible reed.

Optionally, the material of the third sub-buffering seat is the same as the material of the second flexible reed, and the thickness of the third sub-buffering seat is greater than the thickness of the second flexible reed, where the thickness refers to a dimension of the third sub-buffering seat or the second flexible reed in the second direction.

Optionally, the second buffer seat further includes a fourth sub buffer seat, the fourth sub buffer seat is located on one side of the third sub buffer seat far away from the second sub buffer seat, a third limiting gap is further formed between the fourth sub buffer seat and the third sub buffer seat, and at least one second flexible reed set is arranged on the fourth sub buffer seat.

Optionally, the second flexible spring plate set is formed by forming a plurality of through holes on the fourth sub-buffer base, each through hole penetrating through the fourth sub-buffer base in a third direction, and the third direction is perpendicular to the first direction and the second direction.

Optionally, a second striker portion is formed on the second cushion seat.

Optionally, the second buffer seat is provided with a buffer connection hole extending along a first direction, and in the second direction, the buffer connection hole has two first side walls arranged oppositely, and the two first side walls constitute the two second impact portions.

Optionally, in a third direction, the buffer connection hole has two second sidewalls that are disposed opposite to each other, at least one of the second sidewalls is provided with a limiting structure that extends toward the inside of the buffer connection hole, and the third direction is perpendicular to the first direction and the second direction.

Optionally, the limiting structure is detachably disposed on the second buffer seat.

Optionally, a second adjusting member is further disposed on the second buffer seat, and the second adjusting member is used for adjusting the rigidity of the second buffer seat.

Optionally, a second threaded hole extending along the second direction and penetrating through the fourth sub-buffer seat and the third sub-buffer seat is formed in the second buffer seat, the second adjusting piece is a bolt, the bolt is arranged in the second threaded hole, and the rigidity of the second buffer seat is adjusted by adjusting the screwing degree of the bolt.

Optionally, in the second direction, the first cushion seat is arranged at a distance from the second cushion seat.

Optionally, the buffer device further comprises a connecting part, the first buffer seat and the second buffer seat are connected through the connecting part, and a waist-shaped connecting hole is formed in the connecting part.

In addition, in order to achieve the above object, the present invention further provides a mask stage, comprising a coarse stage, a fine stage and the buffer structure as described in any one of the above, wherein the buffer structure is disposed between the coarse stage and the fine stage and is used for buffering a collision acting force between the coarse stage and the fine stage.

In addition, to achieve the above object, the present invention further provides a lithographic apparatus including the mask stage as described above.

Compared with the prior art, the buffer structure, the mask table and the photoetching machine have the following advantages:

the buffer structure comprises a first buffer seat and a second buffer seat which are connected with each other; the first buffer seat is provided with a first flexible reed set, and the first flexible reed set comprises at least two first flexible reeds which are arranged at intervals along a first direction; and a second flexible reed set is arranged on the second buffer seat and comprises at least two second flexible reeds which are arranged at intervals along a second direction, and the first direction is perpendicular to the second direction. When the buffer structure is arranged on the mask table, the buffer structure can be used for buffering the impact force in two directions (such as the X direction and the Y direction), and the damage to the micropositioner is reduced.

Drawings

FIG. 1 is a schematic view of a buffer structure provided in accordance with an embodiment of the present invention in one direction;

FIG. 2 is a schematic view of the cushioning structure shown in FIG. 1 in another orientation;

FIG. 3 is a top view of the cushioning structure shown in FIG. 1;

FIG. 4 is a cross-sectional view B-B of the cushioning structure shown in FIG. 3;

FIG. 5 is a cross-sectional view A-A of the cushioning structure shown in FIG. 3;

FIG. 6 is a schematic diagram of a mask table according to an embodiment of the present invention.

[ reference numerals are described below ]:

10-a buffer structure;

100-a first cushion seat;

101-a first flexible reed;

110-a first elongated aperture;

120-a first adjustment member;

200-a second buffer seat;

201-a second flexible reed, 202-a first limit gap, 203-a second limit gap, 204-a third limit gap;

210-a first sub-cushion mount;

220-a second sub-cushion mount;

221-dividing the gap, 222-buffering the connecting hole, 223-limiting the structure;

230-a third sub-cushion mount;

240-fourth sub-cushion mount;

250-a second elongated aperture;

260-a second adjustment member;

270-a second impingement portion;

300-a connecting portion;

310-a first connection hole;

400-a first impingement portion;

500-a fourth limit gap;

20-a coarse moving platform;

30-a micropositioner;

40-a balancing mass frame;

50-a balance mass module;

60-buffer damper.

Detailed Description

To further clarify the objects, advantages and features of the present invention, a more particular description of the invention will be rendered by reference to the appended drawings. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention.

As used in this specification, the singular forms "a," "an," and "the" include plural referents unless the content clearly dictates otherwise. As used in this specification, the term "or" is generally employed in its sense including "and/or" unless the content clearly dictates otherwise, and the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either fixedly connected, detachably connected, or integrally connected. Either mechanically or electrically. Either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations. The same or similar reference numbers in the drawings identify the same or similar elements.

An object of an embodiment of the present invention is to provide a buffer structure that can be applied to a mask stage and is used to buffer an impact force between a coarse motion stage and a fine motion stage. Referring to fig. 1 to 3, the buffering structure 10 includes a first buffering seat 100 and a second buffering seat 200 connected to each other, and a first flexible spring set is disposed on the first buffering seat 100 and includes at least two first flexible springs 101 arranged at intervals along a first direction. The second buffer seat 200 is provided with a second flexible reed set, the second flexible reed set comprises at least two second flexible reeds 201 arranged at intervals along a second direction, and the first direction is perpendicular to the second direction.

The cushioning structure 10 may be made of a metal material such as steel. When the cushioning structure 10 is placed on a horizontal surface, the first direction and the second direction are horizontal directions, wherein the first direction may be an X direction, the second direction may be a Y direction, and a third direction mentioned later may be a Z direction, and it is understood that the X direction, the Y direction, and the Z direction include positive and negative directions. When the buffer structure 10 is impacted from the first direction, the first flexible spring plate group can absorb the impact force, so that the impact is reduced. When the buffer structure 10 is impacted from the second direction, the second flexible spring plate group can absorb the impact force, so that the impact is reduced.

One preferred construction of the cushioning structure 10 is described below in connection with fig. 1-5, but it should be understood that it is only one alternative and therefore should not be construed as limiting the invention.

As shown in fig. 1 to 2, the buffering structure 10 may include a connection part 300, a first buffering seat 100 and a second buffering seat 200, the first buffering seat 100 and the second buffering seat 200 being arranged in the second direction and both connected to the connection part 300. The connecting portion 300 is used for connecting with an external mechanism, such as a coarse stage of a mask stage, and thus the connecting portion 300 is provided with a first connecting hole 310, in some embodiments, the first connecting hole 310 is a circular hole (as shown in fig. 1), and in other embodiments, the first connecting hole is a kidney-shaped hole (not shown), so that the position of the cushioning structure 10 can be adjusted when the cushioning structure 10 is mounted on the external mechanism. The length direction of the first connection hole 310 is set according to actual needs, for example, the length direction of the first connection hole 310 extends along the first direction or along the second direction.

With continuing reference to fig. 1 and with reference to fig. 2, at least two first flexible spring groups are disposed on the first buffer seat 100, and at least two first flexible spring groups are spaced apart from each other along a third direction, where the third direction is perpendicular to the first direction and the second direction, that is, the third direction may be a Z direction (that is, a vertical direction). The buffering structure 10 further includes a first striking part 400, the first striking part 400 is disposed on a side of the first buffering seat 100 departing from the connecting part 300, and an edge of the first striking part 400 protrudes out of the second buffering seat 200. Each of the first striking parts 400 is disposed between two adjacent sets of the first flexible spring plate groups, for example, in one embodiment, when the number of the first flexible spring plate groups is two, the number of the first striking parts 400 may be one, and in the third direction, the first striking part 400 is disposed between two first flexible spring plate groups. In other embodiments, the number of the first flexible spring plate groups may be three, and the number of the first striking portions 400 may be two, and when the orientation shown in fig. 1 is taken as an example, one first striking portion 400 may be disposed between two first flexible spring plate groups at the upper end and the middle, and the other first striking portion 400 may be disposed between two first flexible spring plate groups at the middle end and the lower end. The first flexible spring plate group and the first striker 400 may be similarly arranged when the number thereof is other values.

Referring to fig. 2, the first buffer seat 100 has a certain thickness, and in the present embodiment, the first flexible spring set may be formed by forming a through hole penetrating through the first buffer seat 100 in the second direction on the first buffer seat 100. Specifically, taking the orientation shown in fig. 2 as an example, a group of first elongated holes 110 with a length extending along the third direction is opened on a portion of the first buffer seat near the upper end, the number of the first elongated holes 110 in each group is at least three, and at least three first elongated holes 110 are arranged at intervals along the first direction, so that a portion between two adjacent first elongated holes 110 can form one first flexible strip 101, and an edge portion of the first buffer seat 100 away from the connecting portion 300 also forms one first flexible strip 101. The number of the first flexible reeds 101 in each first flexible reed group is determined by the number of the first elongated holes 110, and the first elongated holes 110 may form a gap between two adjacent first flexible reeds 101 in the same first flexible reed group. Then, a group of first elongated holes 110 is further formed in the portion, close to the lower end, of the first buffer seat, so that another first flexible reed group is formed. It can be understood that the thickness of the first flexible reed 101 can be adjusted by adjusting the distance between two adjacent first elongated holes 110, and the thickness of the first flexible reed 101 is set according to actual needs. Here, the "thickness" refers to a dimension of the first buffer base 100 or the first flexible reed 101 in the first direction.

In this embodiment, one of the first flexible spring pieces at the upper end includes four first flexible springs 101, and one of the first flexible spring pieces at the lower end also includes four first flexible springs 101, and the first flexible springs 101 in the two first flexible spring pieces are arranged in a one-to-one correspondence, and at the same time, on the side close to the connecting portion 300, the two first flexible spring pieces share one first elongated hole 110. In other embodiments, the first flexible reeds 101 in two adjacent first flexible reed groups may not be arranged in a one-to-one correspondence, or the number of the first flexible reeds 101 in two adjacent first flexible reed groups is not equal.

Optionally, as shown in fig. 4, a first adjusting member 120 is further disposed on the first cushion seat 100, and the first adjusting member 120 is used to adjust the rigidity of the first cushion seat 100. In an exemplary embodiment, the first buffer seat 100 is provided with a first screw hole penetrating through the first buffer seat along a first direction, and in the second direction, the first screw hole may be disposed between two adjacent first flexible spring plate groups. The first adjusting member 120 is a bolt, the bolt is disposed in the first screw hole, and the rigidity of the first buffer seat 100 can be adjusted by adjusting the tightening degree of the bolt, so as to adjust the buffering performance of the first buffer seat 100.

Referring to fig. 1 to 3, the second buffer base 200 includes a first sub buffer base 210, a second sub buffer base 220, and a third sub buffer base 230 sequentially arranged along the second direction, wherein the second sub buffer base 220 is provided with the second flexible reed set, a first limiting gap 202 is provided between the first sub buffer base 210 and the second sub buffer base 220, and a second limiting gap 203 is provided between the second sub buffer base 220 and the third sub buffer base. When the second sub-buffer base 220 receives an impact force along the second direction and pointing to the first sub-buffer base 210, each of the second flexible reeds 201 of the second flexible reed set absorbs the impact force and makes the second sub-buffer base 220 deform toward the first sub-buffer base 210, if the impact force is large enough, the second sub-buffer base 220 will contact the first sub-buffer base 210, and the deformation amount of the first sub-buffer base 210 can be limited after the first limiting gap 202 is closed. Similarly, when the second sub-buffer seat 220 receives an impact force along the second direction and pointing to the third sub-buffer seat 230, the second flexible spring set absorbs the impact force and deforms the second sub-buffer seat 220 toward the third sub-buffer seat 230, if the impact force is large enough, the second sub-buffer seat 220 will contact the third sub-buffer seat 230, and the amount of deformation of the second sub-buffer seat 220 can be limited after the second limiting gap 203 is closed.

At least one second flexible reed set is arranged on the second sub-buffer base 220. Preferably, two second flexible spring leaf groups are arranged on the second sub-buffer seat 220 along the second direction, a dividing gap 221 is formed between the two second flexible spring leaf groups, the dividing gap 221 penetrates through the second buffer seat 220 in the third direction, and the dividing gap 221 may be concave when viewed along the third direction. This arrangement is advantageous in that the cushioning structure 10 further improves the cushioning absorption capacity against the impact force in the second direction. In addition, at least one second flexible reed set is also disposed on the first sub-buffer base 210.

Further, the second buffer base 200 further includes a fourth sub buffer base 240, and the fourth sub buffer base 240 is located on a side of the third sub buffer base 230 far from the second sub buffer base 220. At least one second flexible reed set is arranged on the fourth sub-buffer base 240, and a third limiting gap 204 is arranged between the fourth sub-buffer base 240 and the third sub-buffer base 230.

Similar to the forming method of the first flexible spring 101 on the first buffer base 100, the second flexible spring 201 set can be formed by opening through holes penetrating along a third direction on the first sub buffer base 210, the second buffer base 220 and the fourth sub buffer base 240. For example, as shown in fig. 3, a plurality of second elongated holes 250 are opened in the first sub-cushion 210, and the longitudinal direction of the second elongated holes 250 extends in the first direction. The number of the second elongated holes 250 is at least three, at least three of the second elongated holes 250 are arranged at intervals along the second direction, so that a portion between two adjacent second elongated holes 250 is formed as one second flexible spring 201, and an edge portion of the first sub cushion socket 210 is also formed as one second flexible spring 201. That is, the number of the second flexible tongues 201 included in each second flexible tongue set is determined by the number of the second elongated holes 250, and the second elongated holes 250 may form a gap between two adjacent second flexible tongues 201. Similarly, the other sub-buffer bases may be provided with the second elongated hole 250 to form the second flexible reed set.

Further, the stiffness of the third sub-cushion socket 230 is greater than the stiffness of the second flexible reed 201. Thus, when the second sub buffer socket 220 is deformed toward the third sub buffer socket 230 until the second sub buffer socket 220 comes into contact with the third sub buffer socket 230, the third sub buffer socket 230 can effectively limit the amount of deformation of the second sub buffer socket 220. Preferably, the material of the third sub-buffer base 230 is the same as that of the second flexible reed 201, and the thickness of the third sub-buffer base 230 is greater than that of the second flexible reed 201, so that the rigidity of the third sub-buffer base 230 is greater than that of the second flexible reed 201. The thickness of the second flexible spring sheet 201 and the thickness of the third sub-cushion base 230 can be set according to the requirement. Here, the "thickness" refers to a dimension of the third sub-cushion socket 230 or the second flexible reed 201 in the second direction.

Further, as shown in fig. 5, a second adjusting member 260 is further disposed on the second cushion seat 200, and the second adjusting member 260 is used for adjusting the rigidity of the second cushion seat 200. Specifically, a second threaded hole extending along the second direction and penetrating through the fourth sub-cushion seat 240 and the third sub-cushion seat 230 is formed in the second cushion seat 200, and the second adjusting member 260 is a bolt disposed in the second threaded hole. By adjusting the tightening degree of the bolt, the sizes of the third limiting gap 204 and the second limiting gap 203 can be adjusted, and further the rigidity of the second buffer seat 200 can be adjusted, so that the purpose of adjusting the buffer performance of the second buffer seat 200 is achieved.

In addition, a second striker 270 is provided on the second cushion socket 200. As shown in fig. 2, the second buffer base 220 is provided with a buffer connection hole 222 extending along the first direction, and in the second direction, the buffer connection hole 222 has two first sidewalls oppositely disposed, and the two first sidewalls constitute two second striking portions 270. When an external mechanism, such as a partial structure of a micropositioner, is disposed in the buffer connection hole 222, the external mechanism may impact the buffer structure 10 in the second direction through the second impact portion 270. In this embodiment, preferably, in the second direction, the buffer connecting hole 222 is disposed between the two second flexible spring plate groups.

Further, referring to fig. 1 and 2, in the third direction, the buffer connection hole 222 has two opposite second sidewalls, at least one of the second sidewalls is provided with a limiting structure 223 protruding toward the inside of the buffer connection hole 222, and the limiting structure 223 can be used to limit a distance that the external mechanism moves in the third direction. In this embodiment, the two second sidewalls are both provided with the limiting structures 223. Optionally, the limiting structure 223 is detachably connected to the second buffer base 220, for example, a second connection hole communicated with the buffer connection hole 222 is formed in the second buffer base 220, and the limiting structure 223 is formed by disposing a bolt in the second connection hole. Since the dividing gap between the two second flexible spring leaf groups on the second buffer base 220 is concave, the second side wall has enough space for installing the limiting structure 223.

In practice, the first and

second cushion sockets

100 and 200 may be integrally formed at the time of manufacture, and then cut to form the fourth limiting gap 500, so that the first and

second cushion sockets

100 and 200 are spaced apart in the first direction. Then, the first limiting gap 201, the second limiting gap 203 and the third limiting gap 204 are cut and formed on the second buffer base 200 to divide the second buffer base 200 into the first sub buffer base 210, the second sub buffer base 220, the third sub buffer base 230 and the fourth sub buffer base 240.

As shown in fig. 6, the embodiment of the present invention also provides a mask stage 1, and the constituent components and the approximate positional relationship of the mask stage are only schematically depicted in fig. 6. The mask stage 1 comprises the aforementioned buffer structure 10, coarse stage 20 and fine stage 30, wherein the buffer structure 10 is arranged between the coarse stage 20 and the fine stage 30.

In detail, the mask stage 1 further includes a balance mass frame 40, a balance mass module 50, and a buffer damper 60, wherein the balance mass module 50 is disposed on the balance mass frame 40. The coarse motion stage 20 is movably disposed on the balance mass module 50, and the buffer damper 60 is disposed between the coarse motion stage 20 and the balance mass frame 40 to absorb the impact energy between the coarse motion stage 20 and the balance mass frame 40. The micro-motion stage 30 is movably disposed on the coarse motion stage 20, and has a predetermined gap in the X direction with the coarse motion stage 20, and the micro-motion stage is provided with an impact block extending in the X direction. The coarse motion stage 20 is coupled to the coupling portion 300 of the cushion structure 10, and the impact mass of the fine motion stage 30 is inserted into the cushion coupling hole 222. The first direction coincides with the X-direction, the second direction coincides with the Y-direction (i.e. the scanning direction of the mask table), and the third direction coincides with the Z-direction.

When the micro-motion stage 30 collides with the macro-motion stage 20 from the X direction, the micro-motion stage 30 first contacts the first impact portion 400 on the first buffer seat 100, the first flexible spring set absorbs at least part of the impact force and then transmits the rest of the impact force to the macro-motion stage 20, and the macro-motion stage 20 generates a counter force and transmits the counter force to the micro-motion stage 30 through the buffer structure 10. The buffer structure 10 can greatly reduce the reaction force applied to the micropositioner 30, thereby reducing damage to the micropositioner 30. When the micropositioner 30 impacts the coarse motion stage 20 from the Y direction (e.g., the positive direction), the impact mass of the micropositioner 30 first contacts the second impact portion 270, the second flexible spring set on the second buffer seat 220 absorbs at least part of the impact force and then transmits the rest impact force to the coarse motion stage 20, the coarse motion stage 20 generates a reaction force and acts on the micropositioner 30 through the buffer structure 10, and the buffer structure 10 also reduces the damage of the micropositioner 30 caused by the impact. Furthermore, when an abnormality occurs in the mask stage 1, the micro stage 30 may also move in the Z direction, and the limiting structure 223 is used to limit the distance that the micro stage 30 moves in the Z direction.

Tables 1 to 3 provide simulation data of the reaction force generated by the coarse stage 20 when the fine stage 30 collides with the coarse stage during the operation of the mask stage according to the embodiment of the present invention, and simulation data of the reaction force received by the fine stage when the coarse stage collides with the fine stage during the operation of the mask stage according to the prior art, which will not be described herein because the buffer structure on the mask stage in the prior art is well known to those skilled in the art.

TABLE 1

TABLE 2

TABLE 3

Table 1 shows simulation data of an X-direction crash, tables 2 and 3 show Y-direction crashes, and the number of the simulation data of the mask stage provided by the embodiment of the present invention is 1, and the number of the simulation data of the mask stage in the related art is 2. The collision speed listed in the table is the relative movement speed of the coarse stage and the fine stage, and the rigidity is the rigidity value of the collision portion of the cushion structure 10 at the time of collision. In the experiment, collision kinetic energy is converted into elastic potential energy of the buffer structure to calculate collision deformation, and further calculate the counter force applied to the micropositioner (the table shows the counter force applied to the collision block at the collision position of the buffer structure).

As can be seen from comparison, the cushioning structure 10 provided in the embodiment of the present invention has a better cushioning effect when the structural rigidity of the cushioning structure is lower than that of the cushioning structure in the prior art.

Further, an embodiment of the present invention further provides a lithographic apparatus, which includes the mask stage as described above.

Although the present invention is disclosed above, it is not limited thereto. Various modifications and alterations of this invention may be made by those skilled in the art without departing from the spirit and scope of this invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.

Claims

1. A buffer structure is characterized by comprising a first buffer seat and a second buffer seat which are connected with each other; the first buffer seat is provided with a first flexible reed set, and the first flexible reed set comprises at least two first flexible reeds which are arranged at intervals along a first direction; and a second flexible reed set is arranged on the second buffer seat and comprises at least two second flexible reeds which are arranged at intervals along a second direction, and the first direction is perpendicular to the second direction.

2. The cushioning structure of claim 1, wherein the number of the first flexible spring leaf groups is at least two, and at least two of the first flexible spring leaf groups are arranged at intervals along a third direction; the buffer structure further comprises a first impact part, the first impact part is arranged on the first buffer seat, at least part of the edge of the first impact part protrudes out of the second buffer seat in the first direction, the first impact part is arranged between the two adjacent first flexible reed sets in the third direction, and the third direction is perpendicular to the first direction and the second direction.

3. The buffer structure according to claim 2, wherein the number of the first flexible reed groups is two, and the number of the first striker portions is one.

4. A buffering structure according to any one of claims 1 to 3, wherein said first flexible spring plate group is formed by providing a plurality of through holes in said first buffering seat, each of said through holes penetrating said first buffering seat in said second direction.

5. The cushion structure of claim 1, wherein a first adjusting mechanism is further disposed on the first cushion seat, and the first adjusting mechanism is configured to adjust a rigidity of the first cushion seat.

6. The cushion structure according to claim 5, wherein the first adjusting member is a bolt, a first threaded hole is provided in the first cushion seat to extend through the first cushion seat in a first direction, and the first adjusting member is provided in the first threaded hole, and adjustment of the rigidity of the first cushion seat is achieved by adjusting a tightening degree of the bolt.

7. The buffer structure according to claim 1, wherein the second buffer seat comprises a first sub buffer seat, a second sub buffer seat and a third sub buffer seat sequentially arranged along a second direction, the second sub buffer seat is provided with at least one second flexible reed set, a first limiting gap is arranged between the first sub buffer seat and the second sub buffer seat, and a second limiting gap is arranged between the second sub buffer seat and the third sub buffer seat.

8. The buffer structure according to claim 7, wherein two second flexible spring plate groups are arranged on the second sub-buffer seat, two second flexible spring plate groups are arranged along the second direction, and a separation gap is formed between the two second flexible spring plate groups.

9. The cushioning structure of claim 8, wherein at least one of said second flexible spring plate sets is provided on said first sub-cushioning mount.

10. The buffer structure of claim 9, wherein the second flexible spring plate set is formed by forming a plurality of through holes in the second buffer base, each of the through holes penetrating the second buffer base in a third direction; and/or the presence of a gas in the gas,

11. The cushioning structure of claim 7, wherein the stiffness of the third sub-cushioning socket is greater than the stiffness of the second flexible leaf.

12. The cushioning structure of claim 11, wherein the material of the third sub-cushioning seat is the same as the material of the second flexible spring, and the thickness of the third sub-cushioning seat is greater than the thickness of the second flexible spring, and the thickness is the dimension of the third sub-cushioning seat or the second flexible spring in the second direction.

13. The buffer structure according to claim 7, wherein the second buffer base further includes a fourth sub-buffer base, the fourth sub-buffer base is located on a side of the third sub-buffer base away from the second sub-buffer base, a third limiting gap is further provided between the fourth sub-buffer base and the third sub-buffer base, and at least one second flexible spring set is provided on the fourth sub-buffer base.

14. The buffer structure as claimed in claim 13, wherein the second flexible spring plate set is formed by forming a plurality of through holes in the fourth sub-buffer base, each of the through holes penetrating the fourth sub-buffer base in a third direction perpendicular to the first direction and the second direction.

15. The cushion structure according to any one of claims 5 to 14, wherein a second striker portion is formed on the second cushion seat.

16. The cushion structure of claim 15, wherein the second cushion base defines a cushion connecting hole extending along a first direction, and the cushion connecting hole has two first sidewalls oppositely disposed in the second direction, and the two first sidewalls define the two second striking portions.

17. The cushion structure of claim 16, wherein the cushion attachment hole has two second sidewalls opposite to each other in a third direction, at least one of the second sidewalls has a position-limiting structure extending toward the inside of the cushion attachment hole, and the third direction is perpendicular to the first direction and the second direction.

18. The cushion structure of claim 17, wherein the retaining structure is removably disposed on the second cushion seat.

19. The cushion structure of claim 13, wherein a second adjustment member is further provided on the second cushion seat, the second adjustment member being configured to adjust a rigidity of the second cushion seat.

20. The cushion structure of claim 19, wherein the second cushion seat is provided with a second threaded hole extending along the second direction and penetrating through the fourth sub-cushion seat and the third sub-cushion seat, and the second adjusting member is a bolt provided in the second threaded hole, and the rigidity of the second cushion seat is adjusted by adjusting the tightening degree of the bolt.

21. The cushion structure of claim 1, wherein the first cushion seat is spaced from the second cushion seat in the second direction.

22. The cushion structure according to claim 1, further comprising a connecting portion, wherein the first cushion seat and the second cushion seat are connected by the connecting portion, and the connecting portion is provided with a kidney-shaped connecting hole.

23. A mask stage comprising a coarse stage, a fine stage and a buffer structure according to any one of claims 1 to 22, the buffer structure being disposed between the coarse and fine stages and configured to buffer a collision force between the coarse and fine stages.

24. A lithographic apparatus comprising a mask table according to claim 23.