CN113365402B - Apparatus for confining a plasma beam - Google Patents
Apparatus for confining a plasma beam Download PDFInfo
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- CN113365402B CN113365402B CN202010151455.9A CN202010151455A CN113365402B CN 113365402 B CN113365402 B CN 113365402B CN 202010151455 A CN202010151455 A CN 202010151455A CN 113365402 B CN113365402 B CN 113365402B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
- H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
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Abstract
The present disclosure relates to an apparatus for confining a plasma beam. An apparatus for confining a plasma beam, comprising: an inlet for receiving an incident plasma beam; an outlet from which the plasma beam exits; and an inner wall connecting the inlet and the outlet, configured to reflect the plasma beam such that the plasma beam travels toward the outlet, wherein a size of the inlet is larger than a size of the outlet.
Description
Technical Field
The present disclosure relates to an apparatus for confining a plasma beam.
Background
At present, the application of plasma is more and more extensive. For example, nuclear fusion can be achieved by collision of multiple high-energy hydrogen plasma beams. The high-energy hydrogen plasma beam is adopted to bombard a target material such as heavy metal, and the like, so that a neutron beam can be generated, and the high-energy hydrogen plasma beam can be used as a neutron source. A plasma beam generating apparatus is an apparatus that generates a plasma beam.
Disclosure of Invention
According to an aspect of the present disclosure, there is provided an apparatus for confining a plasma beam, including: an inlet for receiving an incident plasma beam; an outlet from which the plasma beam exits; and an inner wall connecting the inlet and the outlet, configured to reflect the plasma beam such that the plasma beam travels toward the outlet, wherein a size of the inlet is larger than a size of the outlet.
In some embodiments according to the present disclosure, the inner wall includes a first portion adjacent the inlet and a second portion adjacent the outlet, and a dimension where the first portion and the second portion meet is smaller than a dimension of the inlet and smaller than a dimension of the outlet.
In some embodiments according to the present disclosure, a cross-section of the first portion parallel to an axis, which is a straight line connecting a center point of the inlet and a center point of the outlet, is shaped as a straight line or a convex streamline.
In some embodiments according to the present disclosure, the first portion of the linear shape is angled at an angle of 15 ° to 50 ° to the axis.
In some embodiments according to the present disclosure, the included angle is 25 ° to 40 °.
In some embodiments according to the present disclosure, the included angle is 30 ° -35 °
In some embodiments according to the present disclosure, a cross-section of the second portion parallel to an axis that is a straight line connecting a center point of the inlet and a center point of the outlet is shaped as a straight line or a concave streamline.
In some embodiments according to the present disclosure, the second portion of the rectilinear shape is angled from 0 ° to 80 ° from the axis.
In some embodiments according to the present disclosure, the means for confining the plasma beam further comprises: and a protective layer covering the inner wall surface.
In some embodiments according to the present disclosure, the material used to fabricate the means for confining the plasma beam comprises at least one of: boron nitride, aluminum oxide.
In some embodiments according to the present disclosure, the material of the protective layer comprises at least one of: aluminum nitride, boron nitride.
In some embodiments according to the present disclosure, the protective layer has a thickness of 1mm to 15mm.
In some embodiments according to the present disclosure, the inner wall has a surface roughness of less than 3.2.
According to another aspect of the present disclosure, there is provided a plasma beam generating apparatus including: a plasma source; a first power supply for powering the plasma source to generate a plasma; a first electrode configured to have a hole; a second power supply for generating a first electric field between a negative electrode of the plasma source and the first electrode such that the plasma passes from the aperture through the first electrode; a second electrode for receiving plasma passing through the first electrode; a third power supply for generating a second electric field between the first electrode and the second electrode; a vacuum chamber for containing the plasma; a magnet for generating a magnetic field configured to confine the plasma in the vicinity of a central axis of the vacuum chamber; and at least one device for confining a plasma beam according to the present disclosure disposed between the plasma source and the second electrode.
In some embodiments according to the present disclosure, the vacuum chamber includes a first chamber and a second chamber sequentially arranged along a traveling direction of free electrons in the plasma, and the magnet includes:
a first magnet for generating a first magnetic field in the first chamber; and a second magnet for generating a second magnetic field in the second chamber, wherein the magnetic field strength of the second magnetic field is greater than the magnetic field strength of the first magnetic field.
In some embodiments according to the present disclosure, the second chamber has an inner diameter smaller than an inner diameter of the first chamber.
In some embodiments according to the present disclosure, the second magnet comprises a solenoid disposed about the second chamber.
In some embodiments according to the present disclosure, the third power supply, the solenoid of the second magnet, and the second electrode are connected in series.
In some embodiments according to the present disclosure, the solenoid comprises at least a portion of a wire connected in series between the third power source and the second electrode.
According to still another aspect of the present disclosure, there is provided a plasma beam generating apparatus including: a plasma source; a first power supply for powering the plasma source to generate a plasma; a plurality of cascaded first electrodes, each first electrode provided with an aperture; a plurality of second power sources connected in series and each having a positive electrode electrically connected to a corresponding first electrode such that the plasma passes from the hole through the corresponding first electrode; a second electrode for receiving plasma through the plurality of cascaded first electrodes; a third power supply having a positive electrode electrically connected to the second electrode and a negative electrode electrically connected to the first electrode adjacent to the second electrode; a vacuum chamber for containing the plasma; a magnet for generating a magnetic field configured to confine the plasma in the vicinity of a central axis of the vacuum chamber; and at least one device for confining a plasma beam according to the present disclosure disposed between the plasma source and the second electrode.
In some embodiments according to the present disclosure, the vacuum chamber includes a first chamber and a second chamber sequentially arranged along a traveling direction of free electrons in the plasma, and the magnet includes:
a first magnet for generating a first magnetic field in the first chamber; and a second magnet for generating a second magnetic field in the second chamber, wherein the magnetic field strength of the second magnetic field is greater than the magnetic field strength of the first magnetic field, the second magnet comprising a cable wound a plurality of turns on the second chamber, one end of the cable being electrically connected to the positive electrode of the third power source and the other end being electrically connected to the second electrode.
Other features of the present disclosure and advantages thereof will become more apparent from the following detailed description of exemplary embodiments thereof, which proceeds with reference to the accompanying drawings.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the disclosure and together with the description, serve to explain the principles of the disclosure.
The present disclosure may be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings, in which:
fig. 1 shows a schematic view of a plasma beam generating apparatus according to one or more exemplary embodiments of the present disclosure.
Fig. 2 shows a schematic view of a plasma beam generating apparatus according to one or more exemplary embodiments of the present disclosure.
Fig. 3 shows a schematic view of a plasma beam generating apparatus according to one or more exemplary embodiments of the present disclosure.
Fig. 4 shows a schematic view of a plasma beam generating apparatus according to one or more exemplary embodiments of the present disclosure.
Fig. 5 shows a schematic view of a plasma beam generating apparatus according to one or more exemplary embodiments of the present disclosure.
Fig. 6 illustrates a photograph of a plasma beam taken by a high-speed camera in a plasma beam generating apparatus according to one or more exemplary embodiments of the present disclosure.
Fig. 7 illustrates a cross-sectional view of an apparatus to confine a plasma beam according to some embodiments of the present disclosure.
Fig. 8 illustrates a cross-sectional view of an apparatus to confine a plasma beam according to some embodiments of the present disclosure.
Fig. 9 illustrates a cross-sectional view of an apparatus to confine a plasma beam, according to some embodiments of the present disclosure.
Fig. 10 illustrates a schematic diagram of a plasma beam generating apparatus, according to some embodiments of the present disclosure.
Fig. 11 illustrates a schematic diagram of a plasma beam generation apparatus, in accordance with some embodiments of the present disclosure.
Fig. 12 a-12 c show photographs of the plasma beam 115 taken by a high speed camera.
Note that in the embodiments described below, the same reference numerals are used in common between different drawings to denote the same portions or portions having the same functions, and a repetitive description thereof will be omitted. In some cases, similar items are indicated using similar reference numbers and letters, and thus, once an item is defined in a figure, it need not be discussed further in subsequent figures.
For convenience of understanding, the positions, sizes, ranges, and the like of the respective structures shown in the drawings and the like do not sometimes indicate actual positions, sizes, ranges, and the like. Therefore, the present disclosure is not limited to the positions, dimensions, ranges, and the like disclosed in the drawings and the like.
Detailed Description
Various exemplary embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings. It should be noted that: the relative arrangement of the components and steps, the numerical expressions, and numerical values set forth in these embodiments do not limit the scope of the present disclosure unless specifically stated otherwise.
The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the disclosure, its application, or uses. That is, the structures and methods herein are shown by way of example to illustrate different embodiments of the structures and methods of the present disclosure. Those skilled in the art will understand, however, that they are merely illustrative of exemplary ways in which the disclosure may be practiced and not exhaustive. Furthermore, the figures are not necessarily to scale, some features may be exaggerated to show details of particular components.
Techniques, methods, and apparatus known to those of ordinary skill in the relevant art may not be discussed in detail but are intended to be part of the specification where appropriate.
In all examples shown and discussed herein, any particular value should be construed as merely illustrative, and not limiting. Thus, other examples of the exemplary embodiments may have different values.
Fig. 1 shows a schematic view of a plasma generation device according to an embodiment of the present disclosure.
As shown in fig. 1, the plasma generating apparatus 100 includes a plasma source, a first electrode 103, a second electrode 104, a vacuum chamber 106, a gas source 112, a magnet 114, a first power supply 107, a second power supply 108, a third power supply 109, a first current meter 110, and a second current meter 111. In addition to this, an exhaust port (not shown) may be provided on the vacuum chamber 106.
The plasma source includes a hollow cylindrical positive electrode 102 and a negative electrode 101 located inside the positive electrode. In some embodiments according to the present disclosure, the positive electrode 102 can be cylindrical, as shown in fig. 1. The positive electrode 102 may have other suitable shapes such as a hollow conical cylinder. The negative electrode 101 may be, for example, rod-shaped or needle-shaped. The negative electrode of the first power supply 107 is electrically connected to the negative electrode 101 of the plasma source, and the positive electrode of the first power supply 107 is electrically connected to the positive electrode 102 of the plasma source.
The plasma source is disposed within the vacuum chamber 106 and can generate a plasma in the vacuum chamber 106. Further, a first electrode 103 is provided in the vacuum chamber 106. As shown in fig. 1, the first electrode 103 is provided with a hole 113, and a plasma beam formed by plasma can pass through the hole 113. The first electrode 103 is electrically connected to the positive electrode of the second power supply 108 and the negative electrode of the third power supply 109.
The vacuum chamber 106 is provided with a third electrode 104. The third electrode 104 is electrically connected to the positive electrode of the third power supply 109. In addition, the gas source 112 is in fluid communication with the vacuum chamber 106, and a gas can be provided to the vacuum chamber 106, for example, the gas provided by the gas source 112 can be hydrogen, helium, argon, a mixture of at least two of the above, or the like. A portion of the gas entering the vacuum chamber will be ionized into a plasma by the plasma source.
In addition, in the case of the present invention, a first ammeter 110 and a second ammeter 111 may also be provided in the vacuum chamber 106. The first current meter 110 and the second current meter 111 may be, for example, rogowski Coil (Rogowski Coil), and may measure a current of the plasma beam. The rogowski coil is a toroidal coil uniformly wound on a non-ferromagnetic material. The output signal of the rogowski coil is the current differential over time. The input current of the Rogowski coil can be really restored through a circuit for integrating the output voltage signal. In the embodiment shown in fig. 1, the first current meter 110 may measure the current of the plasma beam flowing from the plasma source to the first electrode 103, and the second current meter 111 may measure the current of the plasma beam flowing from the first electrode 103 to the second electrode 104.
In the plasma beam generating apparatus 100 shown in fig. 1, a magnet 114 is also provided. As shown in fig. 1, magnets 114 may be disposed around the vacuum chamber 106. The magnet 114 may generate a confinement magnetic field in the vacuum chamber 106. The plasma beam 115 may be constrained on a predetermined trajectory by a confining magnetic field, for example, the plasma beam 115 may be constrained near a central axis of the vacuum chamber 106, ensuring that the plasma beam 115 travels along the central axis. The magnet 114 may be a permanent magnet or an electromagnet.
It should be appreciated that in some embodiments according to the present disclosure, the plasma beam generation apparatus 100 may not include the magnet 114. According to theoretical calculations, when the current reaches about 30kA or more, the magnetic field generated by the plasma beam itself can achieve magnetic confinement of the plasma beam, which is called self-induced magnetic confinement (self-induced magnetic confinement). However, in the current state of the art, it is difficult for a single power supply to meet the above current requirements. In the embodiment of fig. 1, an arrangement of a second power supply 108 and a third power supply 109 is employed. This arrangement of multiple power sources can support higher currents and the distance traveled by the plasma beam 115 in the vacuum chamber 106 can be longer.
Further, in order to realize a larger current, the first power supply 107, the second power supply 108, and the third power supply 109 may all be pulse power supplies. For example, the pulse width of the first power source 107 may be, for example, 0.1 msec to 10 msec, and the voltage may be, for example, 1kV to 2kV. The pulse width of the second power supply 108 may be, for example, 0.5 msec to 50 msec, and the voltage may be, for example, 300V to 1000V. The pulse width of the third power supply 109 may be, for example, 0.1 msec to 10 msec, and the voltage may be, for example, 1kV to 3kV. In some embodiments according to the present disclosure, the voltage of the third power supply 109 may also be, for example, 1kV-2.2kV.
The operation of the plasma beam generating apparatus shown in fig. 1 will be described in detail.
First, the vacuum chamber 106 is evacuated, and then a mixed gas of hydrogen and argon is introduced into the vacuum chamber 106 through the gas source 112, wherein the flow ratio of hydrogen to argon is 1:1. the flow rate of the gas source 112 is controlled so that the gas pressure in the vacuum chamber 106 is maintained at 1Pa to 10Pa. For example, the pressure in the vacuum chamber 106 is maintained at about 5Pa by adjusting the flow rate of hydrogen gas to 2000sccm and the flow rate of argon gas to 2000 sccm.
Next, the first power supply 107 is turned on to supply power to the negative electrode 101 and the positive electrode 102 of the plasma source. When the pulse generated by the first power source 107 is supplied to the plasma source, the gas between the negative electrode 101 and the positive electrode 102 is ionized, thereby generating plasma.
The second power supply 108 and the third power supply 109 are also pulsed power supplies and the first power supply 107, the second power supply 108 and the third power supply 109 are substantially synchronized. That is, the first power supply 107, the second power supply 108, and the third power supply 109 pulse substantially simultaneously. Accordingly, while the plasma source generates plasma, a pulse from the second power source 108 is applied between the first electrode 103 and the negative electrode 101 of the plasma source, thereby generating an electric field between the first electrode 103 and the negative electrode 101. Under the action of the electric field and the plasma, the gas between the first electrode 103 and the negative electrode 101 is also ionized. Thus, a plasma beam 115 between the first electrode 103 and the negative electrode 101 is formed.
An aperture 113 is provided in the first electrode 103 such that at least a portion of the plasma beam 115 may pass through the first electrode 103 via the aperture 113. A pulse from the third power supply 109 is applied between the second electrode 104 and the first electrode 103, and an electric field is also generated between the second electrode 104 and the first electrode 103. Under the action of the electric field and the plasma beam passing through the hole 113, the gas between the second electrode 104 and the first electrode 103 is also ionized, so that the plasma beam 115 is elongated and reaches the second electrode 104.
In the above embodiment, the voltage of the first pulse power supply is 1000V, and the pulse width is 1 msec; the voltage of the second pulse power supply is 450V, and the pulse width is 5 milliseconds; the voltage of the third pulse power supply was 1800V, and the pulse width was 1 msec. As can be measured, the plasma density at the center of the plasma beam 115 is about 6.56 x 10 22 m -3 . The plasma density is greater than that obtained by other plasma beam generating devices.
It is to be understood that the present disclosure is not limited to the above specific embodiments. Other approaches may also be employed in accordance with the teachings of the present disclosure. For example, the plasma beam generating apparatus may further comprise further electrodes and corresponding power supplies. In other words, a plurality of cascaded first electrodes and corresponding second power supplies may be provided to lengthen the plasma beam. Wherein each first electrode may be provided with an aperture for the plasma beam to pass through. For example, a plurality of second power sources may be connected in series with each other, and the positive electrode of each second power source is electrically connected to the corresponding first electrode, such that the negative electrodes of the remaining second power sources are electrically connected to the first electrode in front of the corresponding first electrode, except that the negative electrode of the first second power source is electrically connected to the negative electrode of the plasma source. Further, a positive electrode of the third power source is electrically connected to the second electrode, and a negative electrode of the third power source is electrically connected to the first electrode adjacent to the second electrode. In this way, an electric field having the same direction can be generated along the axial direction of the vacuum chamber, so that the plasma beam can continue to extend along the electric field.
Fig. 2 illustrates a schematic diagram of a plasma beam generating apparatus, according to some embodiments of the present disclosure.
As shown in fig. 2, the plasma beam generating apparatus 200 includes a plasma source, a first electrode 103, a second electrode 104, a vacuum chamber 106, a gas source 112, a magnet 114, a first power supply 107, a second power supply 108, a third power supply 109, a first current meter 110, and a second current meter 111. These components are similar to the plasma beam generating apparatus 100 of fig. 1 and will not be described again.
In the plasma beam generator 200 shown in fig. 2, a first electrode 2103 and a second power source 2108 are provided. As shown in fig. 2, the second power source 2108 is connected in series with the second power source 108, wherein the positive pole of the second power source 2108 is electrically connected to the first electrode 2103 and the negative pole of the second power source 2108 is electrically connected to the first electrode 103. In addition, the first electrode 2103 is also provided with an aperture 2113, so that the plasma beam 115 can pass through the aperture 2113. The second power supply 2108 may also be a pulsed power supply, for example, and may be synchronized with other pulsed power supplies.
The operation of the plasma beam generating apparatus 200 is similar to that of the plasma beam generating apparatus 100 shown in fig. 1. Under the action of the electric field between the electrodes and the plasma generated by the plasma source, the plasma forms a plasma beam and passes through the aperture 113 of the first electrode 103, the aperture 2113 of the first electrode 2103, and to the second electrode 104 in this order. Due to the addition of the first electrode 2103, the length of the plasma beam 115 can be further extended, and the density of plasma near the central axis can be increased.
The plasma beam generating apparatus according to the present disclosure may have many uses. For example, the target 105 may be provided at the end of the second electrode 104. In this way, experiments can be performed in which the target 105 is bombarded with a plasma beam. Since the plasma beam generating apparatus 100 according to the present disclosure can generate a high-density plasma beam, many new test results can be obtained.
In the plasma beam generator shown in fig. 1 and 2, the confinement magnetic field (along the axial direction of the vacuum chamber) generated by the magnet 114 stabilizes the plasma beam, and increases the density of the plasma, thereby achieving the condition of Z-pinch. However, in the case of a high current plasma beam, the magnetic field strength of the confinement magnetic field generated by the magnet 114 is relatively low, for example, about 0.3 tesla in the vicinity of the central axis of the vacuum chamber (i.e., in the vicinity of the plasma beam), due to the influence of the size of the vacuum chamber and the limitation of the magnet 114, and this magnetic field strength is not sufficient to suppress the instability of the plasma in the case where the current of the plasma beam reaches, for example, 5kA or more.
Fig. 3 illustrates a schematic diagram of a plasma beam generating apparatus, according to some embodiments of the present disclosure. As shown in fig. 3, the plasma beam generating apparatus 300 includes a plasma source, a first electrode 103, a second electrode 104, a vacuum chamber 106, a gas source 112, a first power supply 107, a second power supply 108, a third power supply 109, a first current meter 110, and a second current meter 111. These components are similar to the plasma beam generating apparatus 100 of fig. 1 and will not be described again.
The vacuum chamber 106 of the plasma beam generating apparatus 300 may include a first chamber 331 and a second chamber 332. As shown in fig. 3, the vacuum chamber 106 may be substantially divided into a first chamber 331 and a second chamber 332 along an imaginary line AA', i.e., the vacuum chamber 106 includes the first chamber 331 and the second chamber 332 sequentially disposed in a traveling direction of plasma. The second electrode 104 and the target 105 are disposed in the second chamber 332, and the other components are mostly disposed in the first chamber 331.
Further, as shown in fig. 3, the plasma beam generating apparatus 300 further includes a first magnet 341 and a second magnet 342 for generating a confinement magnetic field in the vacuum chamber. The first magnet 341 is disposed on the first chamber 331 for generating a first magnetic field in the first chamber 331. The second magnet 342 is disposed on the second chamber 332 for generating a second magnetic field in the second chamber 332, and the magnetic field strength of the second magnetic field is greater than the magnetic field strength of the first magnetic field.
As described above, in order to confine plasma under the condition of a high current plasma beam and improve the stability of the plasma, it is necessary to generate a magnetic field of higher intensity in the vacuum chamber. However, if high-strength magnetic fields are generated in the first and second chambers 331 and 332 of the entire vacuum chamber, the manufacturing cost and/or the operating cost of the plasma beam generating apparatus 300 may be greatly increased. Therefore, in the plasma beam generating apparatus 300 shown in fig. 3, the second magnetic field of higher intensity is generated only in the second chamber 332 by the second magnet 342, and the first magnetic field in the first chamber 331 can be maintained at the original intensity. For example, in one embodiment according to the present disclosure, the magnetic field strength of the second magnetic field may be increased to about 0.5 tesla while the magnetic field strength of the first magnetic field is maintained at about 0.3 tesla. Under this condition, a stable plasma beam having a current intensity of up to 7kA can be obtained in the vacuum chamber. If the current density is further increased, instability of the plasma beam may occur. After the plasma beam flowing out of the plasma source enters the vacuum chamber, the current of the plasma beam sometimes decreases. For example, the current level may be up to 12kA before the plasma beam enters the vacuum chamber, and the current level may be reduced to, for example, 7kA after the plasma beam enters the vacuum chamber, because a portion of the charged particles may be trapped in the vacuum chamber.
Fig. 4 illustrates a schematic diagram of a plasma beam generating apparatus, according to some embodiments of the present disclosure. As shown in fig. 4, the plasma beam generating apparatus 400 includes a plasma source, a first electrode 103, a second electrode 104, a gas source 112, a first magnet 341, a second magnet 342, a first power supply 107, a second power supply 108, a third power supply 109, a first current meter 110, and a second current meter 111. These components are similar to the plasma beam generating apparatus 300 of fig. 3 and will not be described again.
In addition, in the plasma beam generating apparatus 400 shown in fig. 4, the vacuum chamber 106 includes a first chamber 431 and a second chamber 432, and the second chamber 432 is smaller than the first chamber 431. For example, in the case where the first and second chambers are cylindrical, the diameter (i.e., inner diameter) of the inner wall of the second chamber 432 is smaller than the inner diameter of the first chamber 431. Thus, the second magnet 342 disposed on the second chamber 432 is closer to the plasma beam 115 through which current of the third power supply 109 circuit flows. Compared to the plasma beam generator 300 shown in fig. 3, in the case of the same second magnet 342, a higher intensity of the confinement magnetic field can be obtained in the vicinity of the plasma beam 115, thereby further improving the current intensity for stabilizing the plasma beam 115. For example, in some embodiments according to the present disclosure, the magnetic field strength near the plasma beam 115 in the second chamber 432 may be further increased to, for example, 0.8 tesla, and the current strength of the plasma beam may be as high as 11kA.
Fig. 5 illustrates a schematic diagram of a plasma beam generating apparatus, according to some embodiments of the present disclosure. As shown in fig. 5, the plasma beam generating apparatus 500 includes a plasma source, a first electrode 103, a second electrode 104, a first chamber 431, a second chamber 432, a gas source 112, a first magnet 341, a second magnet 342, a first power source 107, a second power source 108, a first current meter 110, and a second current meter 111. These components are similar to those of the plasma beam generating apparatus 300 of fig. 4, and a description thereof will not be repeated.
Further, the second magnet 342 in the plasma beam generating apparatus 500 is an electromagnet, such as a solenoid. The coil of the solenoid may be wound on the second chamber 432 and powered by the third power supply 109. As shown in fig. 5, the positive electrode of the third power supply 109 is electrically connected to one segment of the solenoid, the other end of the solenoid is electrically connected to the second electrode 104. Thus, the third power source 109, the second magnet 342 (i.e., solenoid), and the second electrode are connected in series. The current flowing from the positive electrode of the third power supply 109 passes through the second magnet, the second electrode, the plasma beam 115, and the like in this order, and finally returns to the negative electrode of the third power supply 109.
Further, as described above, the third power supply 109 may be a pulse power supply. Thus, only during generation of the plasma beam 115 is current passed through the second magnet 342 and a corresponding magnetic field is generated. In this way, it is not necessary to continuously supply power to the second magnet 342 through an additional power supply, reducing the manufacturing cost and the operating cost of the plasma beam generating apparatus 500.
Further, in some embodiments according to the present disclosure, a cable may be used as the solenoid of the second magnet 342. For example, a cable electrically connected to the positive pole of the third power source 109 may be wound around the second chamber 432 (e.g., 5-20 turns) and then electrically connected to the second electrode 104. Thus, when current flows through the cable, the cable wound around the second chamber 432 can act as a solenoid, thereby generating a confining magnetic field within the second chamber 432. Thus, as the current of the plasma beam 115 increases, the confinement magnetic field generated in the second chamber 432 is also enhanced synchronously, thereby achieving the self-adaptive effect.
For example, in some embodiments according to the present disclosure, the cable has a diameter of 18mm, the solenoid formed by winding the cable has an inner diameter of 132mm, and a mixed gas of argon, hydrogen, and helium is provided in the vacuum chamber 106, wherein a flow ratio of the argon, hydrogen, and helium is 1:3:10, the background gas pressure in the vacuum chamber 106 was maintained at about 3.2Pa. The current flowing through the cable is about 15kA and the magnetic field strength near the central axis of the second chamber 432 is about 0.8 tesla. Fig. 6 shows a photograph of the plasma beam taken by a high-speed camera (100 kHz). As can be seen from fig. 6, with the plasma beam generating apparatus 500 shown in fig. 5, a stable plasma beam can be obtained, which is gradually narrowed in the traveling direction from about 22.6mm to about 5mm. It can be further calculated from data collected by the high speed camera and analysis of the target surface trace after plasma bombardment that the width of the plasma beam 115 prior to bombarding the target 105 is about 40 μm, corresponding to a plasma density of about 5.1 x 10 23 m -3 。
It should be understood that the travel direction of the plasma described in this disclosure refers to a direction away from the plasma source, i.e., a direction in which electrons and negative ions travel under the action of an electric field. As shown in fig. 5, the plasma beam 115 emitted from the plasma source passes through the first ammeter 110, the first electrode 103, and the second ammeter 111 in this order, and finally strikes the target 105.
Fig. 7 illustrates a cross-sectional view of an apparatus to confine a plasma beam according to some embodiments of the present disclosure. In the present disclosure, the device for confining the plasma beam is also referred to simply as "beam limiter". As shown in fig. 7, the cross-sectional view is taken along a plane parallel to axis 706. The beam limiter 700 comprises an inlet 701, an outlet 702 and an inner wall 705. The entrance 701 may receive the incident plasma beam 115. The plasma beam 115 passes through the beam limiter 700 and exits the outlet 702. An inner wall 705 connects the inlet 701 and the outlet 702, and is configured to reflect the plasma beam 115 such that the plasma beam 115 travels toward the outlet. The beam limiter 700 is trumpet shaped in cross-section, i.e. the inlet 701 is larger in size than the outlet 702. The axis 706 is a straight line connecting the center point of the inlet 701 and the center point of the outlet 702.
In the beam limiter 700 shown in fig. 7, the inner wall 705 comprises a first portion 703 adjacent to the inlet 701 and a second portion 704 adjacent to the outlet 702. The size at the junction of the first portion 703 and the second portion 704 is smaller than the size of the inlet 701 and smaller than the size of the outlet 702. The first portion 703 and the second portion 704 are both straight and at different angles relative to the axis 706. Wherein the angle α between the first portion 703 and the axis 706 may be 15-50. In some embodiments according to the present disclosure, the angle α between the first portion 703 and the axis 706 may be 25 ° -40 °. In other embodiments according to the present disclosure, the angle α between the first portion 703 and the axis 706 may be 30-35 °. The angle β between the second portion 704 and the axis 706 may be 0-80. The first portion 703 may act as a beam limiter and inertial compression for electrons moving in a forward direction in the plasma beam 115. When the angle between the second portion 704 and the axis is greater than 0 °, positive ions moving in the opposite direction in the plasma beam 115 can be focused, thereby increasing the positive ion concentration. In addition, by setting the appropriate reverse angle β to be larger than 0 °, it is possible to increase the concentration of positive ions in the plasma beam 115 in the exit axis region, and enhance the pinching effect and stability of the plasma beam 115 in the exit region.
Fig. 8 shows a cross-sectional view of a beam limiter according to one embodiment of the present disclosure. As shown in fig. 8, the inner wall of the beam limiter 800 includes a first portion 803 adjacent to the inlet 801 and a second portion 804 adjacent to the outlet 802. The first part 803 has a convex streamline shape, and the second part 804 has a concave streamline shape. By setting the inner wall of the beam limiter 800 to be streamlined, the first portion 803 can improve the smoothness of the movement of electrons in plasma, and reduce energy loss. The second portion 804 may improve the focusing effect and concentration of positive ions. Accordingly, the beam limiter 800 may improve the density and stability of the plasma beam, which in turn may increase the confinement time of the plasma beam. At the same time, the use of streamlining may also reduce energy losses and increase the final energy of the plasma beam, such as the energy before striking the target 105. Therefore, the maximization of the triple product of density, confinement time and energy can be realized, the product is close to or even exceeds the Lawson criterion accepted in the field of nuclear fusion research, and the fusion neutron yield is increased.
Fig. 9 illustrates a cross-sectional view of a beam limiter according to one embodiment of the present disclosure. As shown in fig. 9, both the first portion 903 and the second portion 904 of the inner wall of the beam limiter 900 are covered with a protective layer 908. The protective layer 908 protects the beam limiter 900 from damage to the beam limiter 900 due to bombardment by the high energy plasma beam. Thus, the material of the protective layer 908 is required to be able to withstand the bombardment of the plasma beam. In some embodiments according to the present disclosure, the material of the protective layer 908 can be a high temperature resistant, high thermal conductivity ceramic material such as aluminum nitride, boron nitride, etc.
Furthermore, in some embodiments according to the present disclosure, the material of the beam limiter 900 may be a readily machinable ceramic material such as boron nitride, alumina, or the like.
In the plasma beam generating apparatus according to the embodiment of the present disclosure, one or more beam limiters according to the embodiment of the present disclosure described above may be placed in series on the path of the plasma beam, so that the width of the plasma beam is reduced.
Fig. 10 illustrates a schematic diagram of a plasma beam generating apparatus, according to some embodiments of the present disclosure. As shown in fig. 10, in the plasma beam generating apparatus 500 of fig. 5, two beam limiters 1011 and 1012 are disposed. Wherein the beam limiter 1011 is arranged between the plasma source and the first electrode 103 and the beam limiter 1012 is arranged between the first electrode 103 and the target 105.
The position of the beam limiter is not limited to the specific position shown in fig. 10, as long as the beam limiter is generally located between the plasma source and the target.
For example, fig. 11 illustrates a schematic diagram of a plasma beam generating apparatus, according to some embodiments of the present disclosure. As shown in fig. 11, in the plasma beam generating apparatus 500 of fig. 5, 4 beam limiters 1111 to 1114 are disposed. Wherein the beam limiter 1111 is located between the plasma source and the first electrode 103, the beam limiter 1112 is located between the first electrode 103 and the second galvanometer 111, and the beam limiters 1113 and 1114 are located between the second galvanometer 111 and the target 105.
In order to test the effect of the beam limiter, 0 beam limiter, 2 beam limiters, and 4 beam limiters were used in the plasma beam generating apparatus 500, respectively. Some of the operating parameters of the plasma beam generating apparatus 500 are as follows: the first voltage 107 is 1800V, and the gas source 112 provides a mixture of hydrogen, helium, and argon at 100 standard milliliters per minute (sccm), 300sccm, and 1000sccm. The plasma beam 115 is imaged by a camera (e.g., comprising a CCD or CMOS image sensor) prior to being incident on the target 105. The beam limiter has the same structure as the beam limiter 900 shown in fig. 9.
Fig. 12 a-12 c show photographs of the plasma beam 115 taken by a high speed camera. Fig. 12a shows the plasma beam 115 imaged in the case of 0 beam limiter, fig. 12b shows the plasma beam 115 imaged in the case of 2 beam limiters, and fig. 12c shows the plasma beam imaged in the case of 4 beam limiters. As can be seen from fig. 12a, in the case where the beam limiter is not disposed in the plasma beam generating apparatus 500, the width of the plasma beam 115 is large, and the entire plasma beam 115 cannot be seen in the field of view of the camera.
As can be seen from fig. 12b and 12c, in the case where the beam limiter is provided in the plasma beam generating apparatus 500, the width D of the plasma beam 115 is significantly reduced under the same experimental conditions, and the entire plasma beam 115 can be seen in the field of view of the camera.
It should be understood that the number of beam limiters in an ion beam generating apparatus according to embodiments of the present disclosure may be any number. For example, the number of beam limiters may be 1 or more. While the stability of the plasma beam 115 is increased.
In addition, according to some embodiments of the present disclosure, the following technical solutions may also be adopted:
1. an apparatus for confining a plasma beam, comprising:
an inlet for receiving an incident plasma beam;
an outlet from which the plasma beam exits; and
an inner wall connecting the inlet and the outlet, configured to reflect the plasma beam such that the plasma beam travels toward the outlet,
wherein the size of the inlet is larger than the size of the outlet.
2. The device of claim 1, wherein the inner wall includes a first portion adjacent the inlet and a second portion adjacent the outlet, and a dimension where the first and second portions meet is less than a dimension of the inlet and less than a dimension of the outlet.
3. The device according to claim 2, wherein the cross-section of the first portion parallel to the axis, which is a straight line connecting the centre point of the inlet and the centre point of the outlet, is shaped as a straight line or a convex streamline.
4. The device of claim 3, wherein the angle between the first portion of the rectilinear shape and the axis is between 15 ° and 50 °.
5. The device of claim 4, wherein the included angle is between 25 ° and 40 °.
6. The device of 4, wherein the included angle is 30-35 degrees
7. The device according to claim 2, wherein the cross-section of the second portion parallel to the axis which is a straight line connecting the centre point of the inlet and the centre point of the outlet is in the shape of a straight line or a concave streamline.
8. The device of claim 7, wherein the second portion of the linear shape is at an angle of 0 ° to 80 ° to the axis.
9. The apparatus of 1, further comprising:
and a protective layer covering the inner wall surface.
10. The device of claim 9, wherein the material of the device comprises at least one of: boron nitride, aluminum oxide.
11. The apparatus of claim 9, wherein the material of the protective layer comprises at least one of: aluminum nitride, boron nitride.
12. The apparatus of claim 9, wherein the protective layer has a thickness of 1mm to 15mm.
13. The apparatus of claim 9, wherein the inner wall has a surface roughness of less than 3.2.
14. A plasma beam generating apparatus comprising:
a plasma source;
a first power supply for powering the plasma source to generate a plasma;
a first electrode configured to have a hole;
a second power supply for generating a first electric field between a negative electrode of the plasma source and the first electrode such that the plasma passes from the aperture through the first electrode;
a second electrode for receiving plasma passing through the first electrode;
a third power supply for generating a second electric field between the first electrode and the second electrode;
a vacuum chamber for containing the plasma;
a magnet for generating a magnetic field configured to confine the plasma in the vicinity of a central axis of the vacuum chamber; and
at least one device for confining a plasma beam according to any of the claims 1-13, arranged between the plasma source and the second electrode.
15. The plasma beam generating apparatus according to claim 14, wherein the vacuum chamber includes a first chamber and a second chamber which are arranged in order in a traveling direction of free electrons in the plasma,
the magnet includes:
a first magnet for generating a first magnetic field in the first chamber; and
a second magnet for generating a second magnetic field in the second chamber,
wherein the magnetic field strength of the second magnetic field is greater than the magnetic field strength of the first magnetic field.
16. The plasma beam generating apparatus according to claim 15, wherein the second chamber has an inner diameter smaller than that of the first chamber.
17. The plasma beam generating apparatus according to 15 or 16, wherein the second magnet includes a solenoid disposed around the second chamber.
18. The plasma beam generating apparatus according to claim 17, wherein the third power supply, the solenoid of the second magnet, and the second electrode are connected in series.
19. The plasma beam generating apparatus according to claim 17, wherein the solenoid includes at least a portion of a wire connected in series between the third power supply and the second electrode.
20. A plasma beam generating apparatus comprising:
a plasma source;
a first power supply for powering the plasma source to generate a plasma;
a plurality of cascaded first electrodes, each first electrode provided with an aperture;
a plurality of second power sources connected in series and each having a positive electrode electrically connected to a corresponding first electrode such that the plasma passes from the hole through the corresponding first electrode;
a second electrode for receiving plasma through the plurality of cascaded first electrodes;
a third power supply having a positive electrode electrically connected to the second electrode and a negative electrode electrically connected to the first electrode adjacent to the second electrode;
a vacuum chamber for containing the plasma;
a magnet for generating a magnetic field configured to confine the plasma in the vicinity of a central axis of the vacuum chamber; and
at least one device for confining a plasma beam according to any of the claims 1-13, arranged between the plasma source and the second electrode.
21. The plasma beam generating apparatus according to 20, wherein the vacuum chamber includes a first chamber and a second chamber which are arranged in order in a traveling direction of free electrons in the plasma,
the magnet includes:
a first magnet for generating a first magnetic field in the first chamber; and
a second magnet for generating a second magnetic field in the second chamber,
wherein the magnetic field strength of the second magnetic field is greater than the magnetic field strength of the first magnetic field, the second magnet comprises a cable wound a plurality of turns around the second chamber, one end of the cable is electrically connected to the positive electrode of the third power supply, and the other end is electrically connected to the second electrode.
The terms "front," "back," "top," "bottom," "over," "under," and the like in the description and in the claims, if any, are used for descriptive purposes and not necessarily for describing permanent relative positions. It is to be understood that the terms so used are interchangeable under appropriate circumstances such that the embodiments of the disclosure described herein are, for example, capable of operation in other orientations than those illustrated or otherwise described herein.
As used herein, the word "exemplary" means "serving as an example, instance, or illustration," and not as a "model" that is to be replicated accurately. Any implementation exemplarily described herein is not necessarily to be construed as preferred or advantageous over other implementations. Furthermore, there is no intention to be bound by any expressed or implied theory presented in the preceding technical field, background, brief summary or the detailed description.
As used herein, the term "substantially" is intended to encompass any minor variation resulting from design or manufacturing imperfections, device or component tolerances, environmental influences, and/or other factors. The word "substantially" also allows for differences from a perfect or ideal situation due to parasitics, noise, and other practical considerations that may exist in a practical implementation.
In addition, the foregoing description may refer to elements or nodes or features being "connected" or "coupled" together. As used herein, unless expressly stated otherwise, "connected" means that one element/node/feature is directly connected to (or directly communicates with) another element/node/feature, either electrically, mechanically, logically, or otherwise. Similarly, unless expressly stated otherwise, "coupled" means that one element/node/feature may be mechanically, electrically, logically, or otherwise joined to another element/node/feature in a direct or indirect manner to allow for interaction, even though the two features may not be directly connected. That is, to "couple" is intended to include both direct and indirect joining of elements or other features, including connection with one or more intermediate elements.
In addition, "first," "second," and like terms may also be used herein for reference purposes only, and thus are not intended to be limiting. For example, the terms "first," "second," and other such numerical terms referring to structures or elements do not imply a sequence or order unless clearly indicated by the context.
It will be further understood that the terms "comprises/comprising," "includes" and/or "including," when used herein, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
In the present disclosure, the term "providing" is used broadly to encompass all ways of obtaining an object, and thus "providing an object" includes, but is not limited to, "purchasing," "preparing/manufacturing," "arranging/setting," "installing/assembling," and/or "ordering" the object, and the like.
Those skilled in the art will appreciate that the boundaries between the above described operations merely illustrative. Multiple operations may be combined into a single operation, single operations may be distributed in additional operations, and operations may be performed at least partially overlapping in time. Moreover, alternative embodiments may include multiple instances of a particular operation, and the order of operations may be altered in various other embodiments. However, other modifications, variations, and alternatives are also possible. The specification and drawings are, accordingly, to be regarded in an illustrative rather than a restrictive sense.
Although some specific embodiments of the present disclosure have been described in detail by way of example, it should be understood by those skilled in the art that the foregoing examples are for purposes of illustration only and are not intended to limit the scope of the present disclosure. The various embodiments disclosed herein may be combined in any combination without departing from the spirit and scope of the present disclosure. It will also be appreciated by those skilled in the art that various modifications may be made to the embodiments without departing from the scope and spirit of the disclosure. The scope of the present disclosure is defined by the appended claims.
Claims (19)
1. An apparatus for pinching a plasma beam, comprising:
an inlet for receiving an incident plasma beam;
an outlet from which the plasma beam exits; and
an inner wall connecting the inlet and the outlet, configured to reflect the plasma beam such that the plasma beam travels toward the outlet,
wherein the size of the inlet is larger than the size of the outlet,
the inner wall including a first portion adjacent the inlet and a second portion adjacent the outlet, and the first portion and the second portion meeting at a size less than the size of the inlet and less than the size of the outlet,
the shape of the section of the second part parallel to the axis is a straight line or a concave streamline, the axis is a straight line connecting the central point of the inlet and the central point of the outlet,
the second portion is at an angle greater than 0 ° to the axis such that oppositely moving positive ions in the plasma beam are focused.
2. The device of claim 1, wherein a cross-section of the first portion parallel to an axis that is a straight line connecting a center point of the inlet and a center point of the outlet is shaped as a straight line or a convex streamline.
3. The device of claim 2, wherein the angle between the first portion of the linear shape and the axis is between 15 ° and 50 °.
4. A device according to claim 3, wherein the included angle is 25 ° -40 °.
5. A device according to claim 3, wherein the included angle is 30 ° -35 °.
6. The device of claim 1, wherein the second portion of the rectilinear shape is at an angle of less than or equal to 80 ° to the axis.
7. The apparatus of claim 1, further comprising:
and a protective layer covering the inner wall surface.
8. The device of claim 7, wherein the device material comprises at least one of: boron nitride, aluminum oxide.
9. The apparatus of claim 7, wherein the material of the protective layer comprises at least one of: aluminum nitride, boron nitride.
10. The device of claim 7, wherein the protective layer has a thickness of 1mm-15mm.
11. The device of claim 7, wherein the inner wall has a surface roughness of less than 3.2.
12. A plasma beam generating apparatus comprising:
a plasma source;
a first power supply for powering the plasma source to generate a plasma;
a first electrode configured to have a hole;
a second power supply for generating a first electric field between a negative electrode of the plasma source and the first electrode such that the plasma passes from the aperture through the first electrode;
a second electrode for receiving plasma passing through the first electrode;
a third power supply for generating a second electric field between the first electrode and the second electrode;
a vacuum chamber for containing the plasma;
a magnet for generating a magnetic field configured to confine the plasma near a central axis of the vacuum chamber; and
at least one apparatus for pinching a plasma beam as claimed in any one of claims 1 to 11, being arranged between the plasma source and the second electrode.
13. The plasma beam generating apparatus according to claim 12, wherein the vacuum chamber includes a first chamber and a second chamber which are arranged in order in a traveling direction of free electrons in the plasma,
the magnet includes:
a first magnet for generating a first magnetic field in the first chamber; and
a second magnet for generating a second magnetic field in the second chamber,
wherein the magnetic field strength of the second magnetic field is greater than the magnetic field strength of the first magnetic field.
14. The plasma beam generating apparatus as claimed in claim 13, wherein the second chamber has an inner diameter smaller than that of the first chamber.
15. The plasma beam generating apparatus as claimed in claim 13 or 14, wherein the second magnet comprises a solenoid disposed around the second chamber.
16. The plasma beam generating apparatus as claimed in claim 15, wherein the third power source, the solenoid of the second magnet, and the second electrode are connected in series.
17. The plasma beam generating apparatus as claimed in claim 15, wherein the solenoid comprises at least a portion of a wire connected in series between the third power supply and the second electrode.
18. A plasma beam generating apparatus comprising:
a plasma source;
a first power supply for powering the plasma source to generate a plasma;
a plurality of cascaded first electrodes, each first electrode provided with an aperture;
a plurality of second power sources connected in series and each having a positive electrode electrically connected to a corresponding first electrode such that the plasma passes from the hole through the corresponding first electrode;
a second electrode for receiving plasma through the plurality of cascaded first electrodes;
a third power supply having a positive electrode electrically connected to the second electrode and a negative electrode electrically connected to the first electrode adjacent to the second electrode;
a vacuum chamber for containing the plasma;
a magnet for generating a magnetic field configured to confine the plasma in the vicinity of a central axis of the vacuum chamber; and
at least one apparatus for pinching a plasma beam as claimed in any one of claims 1 to 11, being arranged between the plasma source and the second electrode.
19. The plasma beam generating apparatus as claimed in claim 18, wherein the vacuum chamber includes a first chamber and a second chamber which are sequentially arranged along a traveling direction of free electrons in the plasma,
the magnet includes:
a first magnet for generating a first magnetic field in the first chamber; and
a second magnet for generating a second magnetic field in the second chamber,
wherein the second magnetic field has a magnetic field strength greater than that of the first magnetic field, the second magnet comprises a cable wound a plurality of turns around the second chamber, one end of the cable being electrically connected to the positive electrode of the third power source and the other end being electrically connected to the second electrode.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN85104800A (en) * | 1985-06-22 | 1986-12-17 | 通用电气公司 | Generation has the method and the device of the plasma jet of heating and broadening plasma spraying |
| US4714834A (en) * | 1984-05-09 | 1987-12-22 | Atomic Energy Of Canada, Limited | Method and apparatus for generating ion beams |
| CN1235695A (en) * | 1996-07-24 | 1999-11-17 | 菲尔帕斯真空技术私人有限公司 | Cathode arc source and graphite target |
| CN106252191A (en) * | 2016-08-02 | 2016-12-21 | 中国科学院长春光学精密机械与物理研究所 | Exchangeable nozzle ICP generating means in plasma chemistry etching apparatus |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5404079A (en) * | 1992-08-13 | 1995-04-04 | Matsushita Electric Industrial Co., Ltd. | Plasma generating apparatus |
| JP3454384B2 (en) * | 1994-09-30 | 2003-10-06 | 理化学研究所 | Ion beam generator and method |
| JPH11135297A (en) * | 1997-10-31 | 1999-05-21 | Kumagai Hiromi | Plasma generator |
| CN1169191C (en) * | 1998-06-12 | 2004-09-29 | 日新电机株式会社 | Method for implanting negative hydrogen ion and implanting apparatus |
| DE10140298B4 (en) * | 2001-08-16 | 2005-02-24 | Mtu Aero Engines Gmbh | Method for plasma welding |
| AU2002950505A0 (en) * | 2002-07-31 | 2002-09-12 | Varian Australia Pty Ltd | Mass spectrometry apparatus and method |
| JP2004068070A (en) * | 2002-08-05 | 2004-03-04 | Sumitomo Heavy Ind Ltd | Ion plating system |
| WO2004027825A2 (en) * | 2002-09-19 | 2004-04-01 | Applied Process Technologies, Inc. | Beam plasma source |
| JP5968666B2 (en) * | 2012-04-09 | 2016-08-10 | 中外炉工業株式会社 | Plasma generator and vapor deposition apparatus |
| US9536712B2 (en) * | 2014-06-09 | 2017-01-03 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and method for mass analyzed ion beam |
-
2020
- 2020-03-06 CN CN202010151455.9A patent/CN113365402B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4714834A (en) * | 1984-05-09 | 1987-12-22 | Atomic Energy Of Canada, Limited | Method and apparatus for generating ion beams |
| CN85104800A (en) * | 1985-06-22 | 1986-12-17 | 通用电气公司 | Generation has the method and the device of the plasma jet of heating and broadening plasma spraying |
| CN1235695A (en) * | 1996-07-24 | 1999-11-17 | 菲尔帕斯真空技术私人有限公司 | Cathode arc source and graphite target |
| CN106252191A (en) * | 2016-08-02 | 2016-12-21 | 中国科学院长春光学精密机械与物理研究所 | Exchangeable nozzle ICP generating means in plasma chemistry etching apparatus |
Non-Patent Citations (1)
| Title |
|---|
| 李强,罗萃文,张鹏,李洁萍,易萍,赵长林,薛军.SWIP-RFP装置反场箍缩等离子体约束改善实验.核聚变与等离子体物理.1997,(第04期),全文. * |
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