CN113359335A - Reflective pure-phase liquid crystal spatial light modulator and preparation and box thickness testing methods thereof - Google Patents
Reflective pure-phase liquid crystal spatial light modulator and preparation and box thickness testing methods thereof Download PDFInfo
- Publication number
- CN113359335A CN113359335A CN202110705066.0A CN202110705066A CN113359335A CN 113359335 A CN113359335 A CN 113359335A CN 202110705066 A CN202110705066 A CN 202110705066A CN 113359335 A CN113359335 A CN 113359335A
- Authority
- CN
- China
- Prior art keywords
- layer
- liquid crystal
- spatial light
- electrode layer
- light modulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
Abstract
The invention provides a reflective pure-phase liquid crystal spatial light modulator and a preparation method and a box thickness testing method thereof, which solve the problems that the existing reflective liquid crystal spatial light modulator is small in target surface size, uneven in box thickness and poor in box thickness uniformity easily caused by packaging. In the modulator, an upper cover plate glass, a second electrode layer and an upper orientation layer are sequentially arranged from top to bottom to form an upper substrate; the lower orientation layer, the first electrode layer, the pixel circuit layer and the lower cover plate glass are sequentially arranged from top to bottom to form a lower substrate; the transparent support columns are arranged in the liquid crystal molecular layer and are distributed in the pixel non-opening area; the pixel circuit layer adopts a large-area array thin film transistor TFT-LCD circuit substrate; the first electrode layer comprises a reflecting layer and protective layers arranged on two sides of the reflecting layer and is used for realizing a reflecting light path of the TFT-LCD circuit substrate; the liquid crystal molecule layer is arranged between the upper substrate and the lower substrate, the periphery of the liquid crystal molecule layer is provided with the peripheral frame glue, and the transparent support columns, the peripheral frame glue and the liquid crystal molecules realize uniform box thickness.
Description
Technical Field
The invention belongs to the field of spatial light modulator devices, and particularly relates to a reflective pure-phase liquid crystal spatial light modulator and a preparation and box thickness testing method thereof.
Background
The liquid crystal spatial light modulator is a device for performing two-dimensional modulation on light field intensity and phase distribution based on liquid crystal photoelectric characteristics, and is widely applied to the fields of teaching, scientific research, optical communication, display, industry and the like. Meanwhile, the liquid crystal spatial light modulator has the advantages of high resolution, large modulation range, flexible pattern loading and the like, and is also widely concerned in the fields of micro display, holographic projection, optical communication and the like. The liquid crystal light valve is a core device of the liquid crystal spatial light modulator, liquid crystal molecules deflect under the action of an electric field, and the optical characteristics of the liquid crystal light valve are changed, so that the light field is modulated. The liquid crystal spatial light modulator is divided into a transmission type and a reflection type according to light paths, and is divided into a TFT (thin film transistor) type and an LCoS (liquid Crystal on silicon) type according to the type of a substrate, wherein the TFT substrate is generally used for the transmission type liquid crystal spatial light modulator, and the LCoS substrate is generally used for the reflection type liquid crystal spatial light modulator.
Fig. 1a and 1b are structural diagrams of a light modulation device liquid crystal light valve of a conventional LCOS reflective pure phase liquid crystal spatial light modulator and a TFT transmissive pure phase liquid crystal spatial light modulator. The size of the existing reflective pure phase liquid crystal spatial light modulator is generally 0.26-1.2 ", and the size is small, and it can be seen from fig. 1a that the cell thickness is mainly supported by the peripheral frame sealing glue and the liquid crystal molecules. The size of the existing transmissive pure-phase liquid crystal spatial light modulator is generally 0.7 "-1.8", and it can be seen from fig. 1b that the cell thickness is mainly supported by the frame sealing glue and the liquid crystal molecules and the sprayed spacer spherical ions (some products are not even provided with spherical spacer ions).
The existing reflective liquid crystal spatial light modulator is manufactured by using LCOS, and has the advantages of high resolution, high light utilization rate and the like, but has the problems of small target surface size, easy occurrence of uneven box thickness in packaging and the like. The target surface is too small, so that the method is not suitable for large-area application occasions, and the problem of insufficient splicing precision exists in the splicing of small target surfaces. Due to the fact that the size and the pixel of the LCOS are small, a Spacer is not added when liquid crystal is packaged, the box thickness supporting effect is achieved only through the peripheral frame sealing glue and liquid crystal molecules in the box, the uniformity of the box thickness is poor, and the problem that the regulation quality is poor when the liquid crystal spatial light modulator regulates and controls an optical field is caused. For example, the image quality is not uniform, and the modulation linearity is not sufficient. The existing transmission type TFT-LCD type liquid crystal spatial light modulator has weak phase modulation capability and cannot realize a reflection type effect.
Disclosure of Invention
The invention aims to solve the problems that the existing reflective liquid crystal spatial light modulator is small in target surface size, uneven in box thickness and poor in box thickness uniformity easily caused by packaging, and the phase modulation capability of the transmission type liquid crystal spatial light modulator is weak, and provides a reflective pure-phase liquid crystal spatial light modulator and a preparation method and a box thickness testing method thereof.
In order to achieve the purpose, the invention adopts the following technical scheme:
a reflective pure phase liquid crystal spatial light modulator comprises upper cover plate glass, a second electrode layer, an upper orientation layer, a liquid crystal molecular layer, a lower orientation layer, a first electrode layer, a pixel circuit layer, lower cover plate glass and a transparent support column; the upper cover plate glass, the second electrode layer and the upper orientation layer are sequentially arranged from top to bottom to form an upper substrate, and a light shielding layer is arranged on the upper cover plate glass; the lower orientation layer, the first electrode layer, the pixel circuit layer and the lower cover plate glass are sequentially arranged from top to bottom to form a lower substrate; the transparent support columns are connected with the second electrode layer, arranged in the liquid crystal molecular layer and distributed in the pixel non-opening area; the pixel circuit layer adopts a large-area array thin film transistor TFT-LCD circuit substrate; the first electrode layer comprises a reflecting layer and protective layers arranged on two sides of the reflecting layer and is used for realizing a reflecting light path of the TFT-LCD circuit substrate; the liquid crystal molecule layer is arranged between the upper substrate and the lower substrate, the periphery of the liquid crystal molecule layer is provided with peripheral frame glue, and the transparent support columns, the peripheral frame glue and the liquid crystal molecules realize uniform box thickness.
Further, the reflecting layer is an Ag layer or an Al layer, and the protective layer is an ITO layer or a Ti layer.
Further, the first electrode layer comprises an ITO layer, an Ag layer and an ITO layer which are sequentially arranged, or the ITO layer, the Al layer and the ITO layer which are sequentially arranged, or a Ti layer, the Ag layer and the Ti layer which are sequentially arranged.
Furthermore, a colored resistance layer is arranged between the upper cover plate glass and the second electrode layer.
Furthermore, the transparent support column is manufactured on the second electrode layer in a gluing and photoetching mode.
Furthermore, the shape of the transparent support column is cylindrical, round table or oval strip.
Further, the liquid crystal molecular layer is an ECB mode which is a positive nematic liquid crystal of an antiparallel alignment and no chiral agent or a VA mode which is a negative nematic liquid crystal of an antiparallel alignment and no chiral agent.
Meanwhile, the invention also provides a manufacturing method of the reflective pure-phase liquid crystal spatial light modulator, which comprises the following steps:
step one, preparing an upper substrate;
1.1) manufacturing a reference layer on the upper cover plate glass, namely manufacturing a shading layer;
1.2) manufacturing a second electrode layer on the shading layer;
1.4) manufacturing a transparent support pillar on the second electrode layer;
in the step, a transparent support column is manufactured on the second electrode layer by adopting a gluing and photoetching mode;
step two, preparing a lower substrate;
2.1) manufacturing a TFT-LCD pixel circuit layer on the lower cover plate glass;
2.2) manufacturing a first electrode layer on the TFT-LCD pixel circuit layer;
the first electrode layer comprises a reflecting layer and protective layers arranged on two sides of the reflecting layer and is used for realizing a reflecting light path of the TFT-LCD circuit substrate;
step three, combined packaging;
3.1) manufacturing an upper alignment layer on the second electrode layer to form an upper substrate, and manufacturing a lower alignment layer on the first electrode layer to form a lower substrate;
if the first electrode layer is an organic film, selecting a high-temperature vacuum coating film when the first electrode layer is evaporated on the organic film, and if the first electrode layer is an inorganic film, selecting a normal-temperature vacuum coating film when the first electrode layer is evaporated on the inorganic film;
3.2) respectively coating sealant and liquid crystal dropping materials on the upper substrate and the lower substrate;
3.3) carrying out vacuum attachment on the upper substrate and the lower substrate processed in the step 3.2);
3.4) curing the sealant;
and 3.5) cutting the product processed in the step 3.4) to a target size to finish the preparation.
Further, the following processes are also included between step 1.1) and step 1.2): and continuously manufacturing a color resistance layer on the reference layer.
In addition, the invention also provides a box thickness testing method of the reflective pure phase liquid crystal spatial light modulator, which comprises the following steps:
firstly, replacing a reflecting layer with an equal-thickness protective layer; and secondly, taking the equivalently replaced liquid crystal box as a transmission type liquid crystal box to measure the box thickness, thereby obtaining the liquid crystal box thickness.
Compared with the prior art, the invention has the following beneficial technical effects:
1. the reflective pure-phase liquid crystal spatial light modulator adopts a large-area array thin film transistor TFT-LCD substrate, can design the effective display area according to the use requirement, can design the product into pure-phase modulation through the design of an alignment mode and the selection of liquid crystal materials on the basis of a large target surface, and can play an excellent role in the fields of large-size 3D holographic display, large-area phase modulation, maskless exposure, laser parallel processing and the like.
2. The reflective pure-phase liquid crystal spatial light modulator solves the problem of weak phase modulation capability of a transmission type TFT-LCD type liquid crystal spatial light modulator, adopts special common electrode design and material selection, can realize a reflective effect, can greatly improve the phase modulation capability, realizes the reflective pure-phase modulation liquid crystal spatial light modulator, and achieves the same effect of an LOCS type reflective pure-phase liquid crystal spatial light modulator.
3. The reflective pure-phase liquid crystal spatial light modulator is characterized in that transparent support columns with required height are manufactured on an upper substrate in a gluing and photoetching mode when the substrate is manufactured, the positions of the transparent support columns can be regularly or irregularly arranged according to needs and are usually located at the pixel interval positions, the transparent support columns with different heights can be realized, and meanwhile, the positions of the transparent support columns can be designed according to needs, so that the peripheral frame glue, liquid crystals in the box and the transparent support columns uniformly distributed in the box are realized, and the effect of uniform box thickness in the process of packaging the liquid crystals of the thin film transistor circuit board is achieved.
Drawings
FIG. 1a is a schematic diagram of a conventional reflective phase-only liquid crystal spatial light modulator;
FIG. 1b is a schematic diagram of a conventional transmissive phase-only liquid crystal spatial light modulator;
FIG. 2 is a schematic diagram of a reflective phase-only liquid crystal spatial light modulator according to the present invention;
FIG. 3 is a schematic diagram of the size and film structure of a reflective large-area TFT-LCD according to the present invention;
FIG. 4 is a schematic diagram of the arrangement rule of the transparent support pillars in the liquid crystal spatial light modulator according to the present invention;
FIG. 5 is a schematic diagram of the effect of the reflective phase-only liquid crystal spatial light modulator according to the present invention;
FIG. 6 is a schematic diagram of a box thickness test principle of a conventional reflective pure-phase liquid crystal spatial light modulator;
FIG. 7 is a schematic diagram of an "equivalent substitution method" of the box thickness testing method of the reflective pure-phase liquid crystal spatial light modulator according to the present invention.
Detailed Description
The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood by those skilled in the art that these embodiments are only for explaining the technical principle of the present invention and are not intended to limit the scope of the present invention.
The invention provides a reflective pure-phase liquid crystal spatial light modulator and a preparation and box thickness testing method thereof, wherein the liquid crystal spatial light modulator adopts a large-area array thin film transistor TFT-LCD circuit substrate, and can meet the requirements of large size and multiple shapes of a target surface; meanwhile, the first electrode layer adopts a three-layer design scheme of a protective layer, a reflective layer and a protective layer, so that a reflective light path of the TFT-LCD large-area array substrate can be realized; the transparent support column designed in the middle of the upper substrate can effectively guarantee the box thickness uniformity of the large-area array spatial light modulator, so that the pure phase modulation uniformity and the display uniformity of the reflective liquid crystal spatial light modulator are guaranteed, the phase modulation amount can reach 2 times of that of the transmissive spatial light modulator due to the design of the same box thickness, and the liquid crystal response time can be changed to be half of that of the transmissive spatial light modulator when the same phase modulation amount is required. In addition, the invention includes 2 schemes, and can be designed into a color or black and white type liquid crystal spatial light modulator according to requirements.
As shown in fig. 2, the reflective pure-phase liquid crystal spatial light modulator of the present invention includes an upper cover plate glass, a second electrode layer, an upper alignment layer, a liquid crystal molecule layer, a lower alignment layer, a first electrode layer, a pixel circuit layer, a lower cover plate glass, and a transparent support pillar; the upper cover plate glass, the second electrode layer and the upper orientation layer are sequentially arranged from top to bottom to form an upper substrate, and a light shielding layer is arranged on the upper cover plate glass; the lower orientation layer, the first electrode layer, the pixel circuit layer and the lower cover plate glass are sequentially arranged from top to bottom to form a lower substrate; the transparent support columns are connected with the second electrode layer, arranged in the liquid crystal molecular layer and distributed in the pixel non-opening area; the pixel circuit layer adopts a large-area array thin film transistor TFT-LCD circuit substrate; the first electrode layer comprises a reflecting layer and protective layers arranged on two sides of the reflecting layer and is used for realizing a reflecting light path of the TFT-LCD circuit substrate; the liquid crystal molecule layer is arranged between the upper substrate and the lower substrate, the periphery of the liquid crystal molecule layer is provided with the peripheral frame glue, and the transparent support columns, the peripheral frame glue and the liquid crystal molecules realize uniform box thickness.
As shown in FIGS. 3 and 4, the large area array of reflective phase-only liquid crystal spatial light modulator of the present invention can be used as desiredThe size of the TFT-LCD substrate is designed and adjusted, for example, the size of the TFT-LCD substrate is 3-8 inches, and the feasibility, the convenience and the maturity of the TFT-LCD substrate for realizing a large area array are far higher than the large size of a silicon-based circuit LCOS. In the design of the reflective thin film transistor circuit substrate, a pixel electrode in the existing thin film transistor integrated circuit is redesigned, a reflective layer is sputtered on the pixel electrode, the reflective layer is made of metal Ag or Al, the reflectivity of an Ag film layer or an Al film layer is high, the light utilization rate of the liquid crystal spatial light modulator can be effectively improved, however, Ag is very easy to oxidize in the process of exposure, etching and baking, and the oxidized Ag can become yellow, so that the optical performance of a product is seriously influenced. The first electrode structure is designed according to the following thought, and a layer of Indium Tin Oxide (ITO) material or Ti material is respectively evaporated before and after the sputtering evaporation of the Ag film layer, so that the light transmittance is not influenced, a good protection effect can be achieved, the ITO material is stable in property, and the Ag film layer can be protected from being oxidized in the process of exposure, etching and baking. According to the previous test experience: ITO/Ag/ITO layer is corresponding to thickness respectively in
The reflectivity can reach more than 90% under the design and process conditions. Different products can be simulated and adjusted in thickness, meanwhile, the ITO material can be matched and adjusted or doped to a certain extent according to different wave bands (visible light, near infrared, intermediate infrared and other wave bands) of the products, the problem that the ITO material is high in absorption effect in certain wave bands is solved, and the scheme effectively meets the requirements of a reflective light path of the liquid crystal spatial light modulator and the requirements of large target surface display and light control.
As shown in fig. 5, the reflective optical path design in the reflective pure-phase liquid crystal spatial light modulator of the present invention can effectively reduce the cell thickness of the liquid crystal spatial light modulator by half compared with the transmissive pure-phase modulation, and the response time of the liquid crystal becomes nearly twice, thereby greatly increasing the selection range of the liquid crystal material and reducing the difficulty of the liquid crystal packaging process, improving the light control capability of the transmissive pure-phase liquid crystal spatial light modulator, and improving the refresh frequency of the whole product, so that the product has more competitiveness.
The reflective pure-phase liquid crystal spatial light modulation can realize pure-phase modulation: the design scheme of the reflective TFT-LCD combines an ECB mode (anti-parallel alignment + positive nematic liquid crystal without chiral agent) and a VA mode (anti-parallel alignment + negative nematic liquid crystal without chiral agent), both modes can realize a pure phase modulation mode, the main difference is that the pretilt angles of the ECB and VA modes are different, the adopted liquid crystals are different in positive and negative, and both modes can realize the design and development of a reflective pure phase liquid crystal spatial light modulator. The box thickness and material selection need to be calculated according to the optical phase modulation quantity requirement and the refresh frequency requirement of the liquid crystal spatial light modulator before the height of the transparent support column is determined.
The reflective pure phase liquid crystal spatial light modulator can realize the design and manufacture in a color or black and white mode according to the requirement. First, a reference layer (i.e., a light shielding layer) is formed on the upper cover glass for positioning and calibrating the subsequent film process. The realization modes of the reference layer are 2 types generally, and the PR (photo-etching) photoresist and the metal material (Mo and the like) are manufactured, wherein the PR photoresist belongs to a common process, the manufacturing process is simple, and the line width which can be manufactured is relatively limited (more than or equal to 2.5 mu m) but can influence the transmittance of an upper substrate; if the transmittance requirement for the upper substrate is high, a metallic material scheme can be used, and the line width can be controlled to be smaller (1.5 μm), thus the overall transmittance loss is smaller. After the reference layer is made, a color resistance layer (Red/Green/Blue/white color film layers, common photoresist PR (resist) can be made according to color requirements) (Red, Green and Blue), and corresponding materials and film thickness are selected according to the color requirements of the liquid crystal spatial light modulator to be adjusted. If a black-and-white mode is required, the color resistance layer can be directly skipped, and the subsequent processes can be carried out. After the design and the process are completed, the design of the transparent support column can be carried out according to the optical requirements, and the design comprises the material, the height, the appearance, the arrangement period and the position of the transparent support column. As shown in fig. 4, the white point positions in the graph are designed distribution positions and arrangement rules of the transparent support columns, and are generally designed at the pixel positions, so that the aperture opening ratio and the transmittance are prevented from being greatly influenced, the arrangement rules can be regularly arranged or irregularly arranged, the same supporting force/strength between unit areas is achieved, and Mura-type defects cannot be caused on macroscopic display. The transparent support column can be cylindrical, round table-shaped, oval and the like, no special limitation is needed, the principle of the material is that the hardness is appropriate (the film layers such as an orientation film are prevented from being scratched), the material has certain elastic recovery rate (irreversible damage is not easy to cause), and particularly, a negative photoresist can be adopted, so that the material is a PS PR material produced by JSR company, and the high design is selected by combining the optical phase modulation quantity requirement of a liquid crystal spatial light modulator and the liquid crystal response time. Specifically, the Height PS Height of the transparent supporting pillar is Cell Gap + δ PSH, and the Cell Gap represents the Cell thickness of the liquid crystal panel in the liquid crystal spatial light modulation, and is usually calculated according to the physical properties of the liquid crystal material and the optical index requirements of the product; the PSH' is a fixed deformation of the PS after PI and rubber processes in the Cell packaging process, generally an empirical constant, and the design scheme can effectively solve the problems of poor display effect, poor light field modulation capability and poor modulation linearity caused by nonuniform box thickness in the liquid crystal packaging process of the liquid crystal spatial light modulator.
Based on the above process, the invention provides a method for manufacturing a reflective pure phase liquid crystal spatial light modulator, which comprises the following steps:
step one, preparing an upper substrate;
1.1) manufacturing a reference layer on the upper cover plate glass, namely manufacturing a shading layer; (ii) a
The realization mode of the reference layer is 2 types generally, and the reference layer is made of photoetching PR (photo-etching) glue and a metal material;
1.2) continuously manufacturing a color resistance layer on the reference layer, wherein the color resistance layer can be manufactured according to color requirements;
1.3) manufacturing a second electrode layer on the color resistance layer;
1.4) manufacturing a transparent support pillar on the second electrode layer;
in the step, a transparent support column with the required height is manufactured on the second electrode layer in a gluing and photoetching mode;
step two, preparing a lower substrate;
2.1) manufacturing a TFT-LCD pixel circuit layer on the lower cover plate glass;
2.2) manufacturing a first electrode on the TFT-LCD pixel circuit layer;
the first electrode layer comprises a reflecting layer and protective layers arranged on two sides of the reflecting layer and is used for realizing a reflecting light path of the TFT-LCD circuit substrate;
step three, combined packaging;
3.1) manufacturing an upper alignment layer on the second electrode layer to form an upper substrate, and manufacturing a lower alignment layer on the first electrode layer to form a lower substrate;
if the first electrode layer is an organic film, high-temperature vacuum coating (120/280/120 ℃) can be selected when the first electrode layer is evaporated on the organic film, and if the first electrode layer is an inorganic film, normal-temperature vacuum coating (25/25/25 ℃) can be selected when the first electrode layer is evaporated on the inorganic film, so that the process condition can effectively improve the adhesion between the film layers and avoid bad bubbles in the rear-end liquid crystal packaging process;
3.2) respectively coating sealant and liquid crystal dropping materials on the upper substrate and the lower substrate;
3.3) carrying out vacuum attachment on the upper substrate and the lower substrate processed in the step 3.2);
3.4) curing the sealant;
3.5) cutting the product processed in the step 3.4) to a target size;
step four, manufacturing a liquid crystal panel module;
4.1) manufacturing FPC flexible flat cable at the position of the liquid crystal panel electrode;
4.2) the control circuit can load signals to the liquid crystal spatial light modulator through the FPC flexible flat cable.
As shown in fig. 6, the conventional reflective liquid-silicon-based Cell thickness cannot be directly measured, and the commonly used method is to measure the Cell thickness of the empty Cell by using the principle that different interface reflected lights generate interference ripples after the silicon substrate and the glass cover plate are packaged, and the commonly used devices are as follows: mission Pick Thin film machine. The actual thickness of the liquid crystal box after crystal filling is equivalently replaced according to the thickness of an empty box, and a method for directly testing the thickness of the liquid crystal box after crystal filling is unavailable.
As shown in fig. 7, the method adopted by the liquid crystal cell thickness test in the reflective pure phase liquid crystal spatial light modulator of the present invention is "equivalent substitution method". The large-area array reflection type liquid crystal box used by the reflection type pure phase liquid crystal spatial light modulator can directly test the box thickness of the liquid crystal box by adopting the following method, can directly test the box thickness of a target product after crystal filling in a design stage and a production stage, not only can accurately test reaction process data, but also can effectively avoid the product performance problem caused by inaccurate box thickness. During testing, the equal-thickness ITO material is used for replacing the reflecting layer Ag, so that the space in the liquid crystal box cannot be changed, the ITO material is transparent, the liquid crystal box after the ITO material is equivalently replaced can be used as a transmission type liquid crystal box for carrying out box thickness measurement, namely, the box thickness d is equal to the light effect Re/liquid crystal birefringence delta n, the accuracy and timeliness of box thickness detection and the quality of products are greatly improved by the method, the testing method behind the transmission type liquid crystal box is conventional, and a plurality of box thickness testing devices can be used in the market.
Based on the above description, the reflective pure-phase liquid crystal spatial light modulator of the present invention has the following characteristics:
the existing LCOS type reflective pure-phase liquid crystal spatial light modulator is small in effective display area size and is not suitable for application scenes (the fields of large-size 3D holographic display, large-area phase modulation, maskless exposure, laser parallel processing and the like) with large requirements on target surfaces. The liquid crystal spatial light modulator adopts a large-area array thin film transistor TFT-LCD substrate, the effective display area can be designed according to the use requirement, the product can be designed to be pure phase modulation through the design of an alignment mode and the selection of a liquid crystal material on the basis of a large target surface, and the liquid crystal spatial light modulator can play an excellent role in the fields of large-size 3D holographic display, large-area phase modulation, maskless exposure, laser parallel processing and the like.
The existing transmission type TFT-LCD type liquid crystal spatial light modulator has weak phase modulation capability and cannot realize the reflection type effect. The liquid crystal spatial light modulator adopts special common electrode design and material selection, not only can realize a reflection type effect, but also can greatly improve the phase modulation capability, realize the reflection type pure phase modulation liquid crystal spatial light modulator and achieve the same action of an LOCS type reflection type pure phase liquid crystal spatial light modulator.
The size of the traditional LCOS panel and the size of a pixel are both smaller, most of LCOS panels adopt spacers which are not added during liquid crystal packaging, and are supported by the surrounding frame adhesive and liquid crystal, so that more serious nonuniformity still exists; in addition, a few spacers are added, but the uniformity of the spacers is still poor due to the spraying process of the spacers, and the two points cause the uneven thickness of the packaging box of the LCOS type reflective pure phase liquid crystal spatial light modulator, which causes the problems of uneven phase modulation and poor linearity. The reflective pure-phase liquid crystal spatial light modulator is manufactured by adopting a gluing and photoetching mode to manufacture transparent support columns with required height on the upper cover plate glass, and the positions of the transparent support columns can be regularly or irregularly arranged according to the requirement and are usually located at the pixel interval positions.
Claims (10)
1. A reflective phase-only liquid crystal spatial light modulator, comprising: the liquid crystal display panel comprises upper cover plate glass, a second electrode layer, an upper orientation layer, a liquid crystal molecular layer, a lower orientation layer, a first electrode layer, a pixel circuit layer, lower cover plate glass and a transparent support column;
the upper cover plate glass, the second electrode layer and the upper orientation layer are sequentially arranged from top to bottom to form an upper substrate, and a light shielding layer is arranged on the upper cover plate glass;
the lower orientation layer, the first electrode layer, the pixel circuit layer and the lower cover plate glass are sequentially arranged from top to bottom to form a lower substrate;
the transparent support columns are connected with the second electrode layer, arranged in the liquid crystal molecular layer and distributed in the pixel non-opening area;
the pixel circuit layer adopts a large-area array thin film transistor TFT-LCD circuit substrate;
the first electrode layer comprises a reflecting layer and protective layers arranged on two sides of the reflecting layer and is used for realizing a reflecting light path of the TFT-LCD circuit substrate;
the liquid crystal molecule layer is arranged between the upper substrate and the lower substrate, the periphery of the liquid crystal molecule layer is provided with peripheral frame glue, and the transparent support columns, the peripheral frame glue and the liquid crystal molecules realize uniform box thickness.
2. The reflective phase-only liquid crystal spatial light modulator of claim 1, wherein: the reflecting layer is an Ag layer or an Al layer, and the protective layer is an ITO layer or a Ti layer.
3. The reflective phase-only liquid crystal spatial light modulator of claim 2, wherein: the first electrode layer comprises an ITO layer, an Ag layer and an ITO layer which are sequentially arranged, or the ITO layer, an Al layer and the ITO layer which are sequentially arranged, or a Ti layer, an Ag layer and a Ti layer which are sequentially arranged.
4. The reflective phase-only liquid crystal spatial light modulator of claim 1, 2 or 3, wherein: and a colored resistance layer is arranged between the upper cover plate glass and the second electrode layer.
5. The reflective phase-only liquid crystal spatial light modulator of claim 4, wherein: the transparent support column is manufactured on the second electrode layer in a gluing and photoetching mode.
6. The reflective phase-only liquid crystal spatial light modulator of claim 5, wherein: the transparent support column is cylindrical, round table-shaped or oval strip-shaped.
7. The reflective phase-only liquid crystal spatial light modulator of claim 6, wherein: the liquid crystal molecular layer is an ECB mode or a VA mode, the ECB mode is positive nematic liquid crystal with antiparallel alignment and no chiral agent, and the VA mode is negative nematic liquid crystal with antiparallel alignment and no chiral agent.
8. A manufacturing method of a reflective pure phase liquid crystal spatial light modulator is characterized by comprising the following steps:
step one, preparing an upper substrate;
1.1) manufacturing a reference layer on the upper cover plate glass, namely manufacturing a shading layer;
1.2) manufacturing a second electrode layer on the shading layer;
1.4) manufacturing a transparent support pillar on the second electrode layer;
in the step, a transparent support column is manufactured on the second electrode layer by adopting a gluing and photoetching mode;
step two, preparing a lower substrate;
2.1) manufacturing a TFT-LCD pixel circuit layer on the lower cover plate glass;
2.2) manufacturing a first electrode layer on the TFT-LCD pixel circuit layer;
the first electrode layer comprises a reflecting layer and protective layers arranged on two sides of the reflecting layer and is used for realizing a reflecting light path of the TFT-LCD circuit substrate;
step three, combined packaging;
3.1) manufacturing an upper alignment layer on the second electrode layer to form an upper substrate, and manufacturing a lower alignment layer on the first electrode layer to form a lower substrate;
if the first electrode layer is an organic film, selecting a high-temperature vacuum coating film when the first electrode layer is evaporated on the organic film, and if the first electrode layer is an inorganic film, selecting a normal-temperature vacuum coating film when the first electrode layer is evaporated on the inorganic film;
3.2) respectively coating sealant and liquid crystal dropping materials on the upper substrate and the lower substrate;
3.3) carrying out vacuum attachment on the upper substrate and the lower substrate processed in the step 3.2);
3.4) curing the sealant;
and 3.5) cutting the product processed in the step 3.4) to a target size to finish the preparation.
9. The method of claim 8, wherein: the following processes are also included between the step 1.1) and the step 1.2): and continuously manufacturing a color resistance layer on the reference layer.
10. A box thickness test method of a reflective pure phase liquid crystal spatial light modulator is characterized by comprising the following steps:
firstly, replacing a reflecting layer with an equal-thickness protective layer; and secondly, taking the equivalently replaced liquid crystal box as a transmission type liquid crystal box to measure the box thickness, thereby obtaining the liquid crystal box thickness.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110705066.0A CN113359335A (en) | 2021-06-24 | 2021-06-24 | Reflective pure-phase liquid crystal spatial light modulator and preparation and box thickness testing methods thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110705066.0A CN113359335A (en) | 2021-06-24 | 2021-06-24 | Reflective pure-phase liquid crystal spatial light modulator and preparation and box thickness testing methods thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113359335A true CN113359335A (en) | 2021-09-07 |
Family
ID=77536130
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110705066.0A Pending CN113359335A (en) | 2021-06-24 | 2021-06-24 | Reflective pure-phase liquid crystal spatial light modulator and preparation and box thickness testing methods thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113359335A (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001075066A (en) * | 1999-09-06 | 2001-03-23 | Seiko Epson Corp | Liquid crystal device and method for measuring cell thickness of liquid crystal device |
| US20020118325A1 (en) * | 2001-02-06 | 2002-08-29 | Shoji Hinata | Liquid crystal device, method of manufacturing liquid crystal device and electronic apparatus |
| US20030133063A1 (en) * | 2002-01-15 | 2003-07-17 | Hoi-Sing Kwok | Structures for reflective liquid crystal displays |
| JP2007052106A (en) * | 2005-08-16 | 2007-03-01 | Sharp Corp | Substrate for semitransmissive liquid crystal panel, method for manufacturing the substrate, semitransmissive liquid crystal panel, and semitransmissive liquid crystal display apparatus |
| CN107015409A (en) * | 2017-05-18 | 2017-08-04 | 上海天马微电子有限公司 | Spatial light modulator and display device |
| JP2017151167A (en) * | 2016-02-22 | 2017-08-31 | 大日本印刷株式会社 | Dimming film, laminated glass and method for manufacturing dimming film |
| JP2019132973A (en) * | 2018-01-31 | 2019-08-08 | 大日本印刷株式会社 | Reflection screen and image display device |
-
2021
- 2021-06-24 CN CN202110705066.0A patent/CN113359335A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001075066A (en) * | 1999-09-06 | 2001-03-23 | Seiko Epson Corp | Liquid crystal device and method for measuring cell thickness of liquid crystal device |
| US20020118325A1 (en) * | 2001-02-06 | 2002-08-29 | Shoji Hinata | Liquid crystal device, method of manufacturing liquid crystal device and electronic apparatus |
| US20030133063A1 (en) * | 2002-01-15 | 2003-07-17 | Hoi-Sing Kwok | Structures for reflective liquid crystal displays |
| JP2007052106A (en) * | 2005-08-16 | 2007-03-01 | Sharp Corp | Substrate for semitransmissive liquid crystal panel, method for manufacturing the substrate, semitransmissive liquid crystal panel, and semitransmissive liquid crystal display apparatus |
| JP2017151167A (en) * | 2016-02-22 | 2017-08-31 | 大日本印刷株式会社 | Dimming film, laminated glass and method for manufacturing dimming film |
| CN107015409A (en) * | 2017-05-18 | 2017-08-04 | 上海天马微电子有限公司 | Spatial light modulator and display device |
| JP2019132973A (en) * | 2018-01-31 | 2019-08-08 | 大日本印刷株式会社 | Reflection screen and image display device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10634958B1 (en) | Manufacturing method of black photo spacer array substrate and black photo spacer array substrate | |
| CN110673412B (en) | Display panel and display device | |
| US10295713B2 (en) | Color filter substrate, preparing method thereof, and display device | |
| CN103033978B (en) | Color film substrate and manufacturing method thereof and display device | |
| CN107121832A (en) | Liquid crystal display | |
| US9195110B2 (en) | Liquid crystal display device and process for producing the same | |
| US9541793B2 (en) | Liquid crystal display panel and display apparatus using the same | |
| CN101644844B (en) | Liquid crystal display panel | |
| CN110596947A (en) | Display device | |
| CN209590464U (en) | A kind of color membrane substrates and display device | |
| US9104070B2 (en) | Liquid crystal display panel and display apparatus using the same | |
| US20200348559A1 (en) | Color filter substrate and liquid crystal display panel | |
| US11822176B2 (en) | Display panel and display device | |
| US20150331281A1 (en) | Display panel, display device and manufacture method for the display panel | |
| US20230089004A1 (en) | Display device and driving method therefor and manufacturing method thereof | |
| CN104765192A (en) | Liquid crystal display panel and manufacture method and display device thereof | |
| US20150062496A1 (en) | Liquid crystal display panel and display apparatus using the same | |
| US20150070632A1 (en) | Liquid crystal display panel and display apparatus using the same | |
| CN106681049A (en) | Manufacturing method of display substrate, manufacturing method of display panel and display panel | |
| EP2722709B1 (en) | Color filter substrate, liquid crystal panel, and liquid crystal display device | |
| EP3200015B1 (en) | Array substrate, display panel, display apparatus, and method for repairing display panel | |
| US20110043734A1 (en) | Liquid crystal display panel | |
| CN105652510A (en) | Display panel and manufacture method thereof as well as display device | |
| CN106990597B (en) | Color filter substrate, manufacturing method thereof, display panel and display device | |
| CN101363991A (en) | Colourful filtering substrate, method for manufacturing same and liquid crystal display panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20220414 Address after: Room 301, building 3, Xike holding hard technology enterprise community, 3000 Biyuan 2nd Road, hi tech Zone, Xi'an City, Shaanxi Province, 710000 Applicant after: XI'AN CAS MICROSTAR OPTOELECTRONICS TECHNOLOGY CO.,LTD. Address before: 710119, No. 17, information Avenue, new industrial park, hi tech Zone, Shaanxi, Xi'an Applicant before: XI'AN INSTITUTE OF OPTICS AND PRECISION MECHANICS, CHINESE ACADEMY OF SCIENCES |
|
| TA01 | Transfer of patent application right |