CN113358579A - Wide-spectrum ellipsometry optical system - Google Patents
Wide-spectrum ellipsometry optical system Download PDFInfo
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- CN113358579A CN113358579A CN202110564091.1A CN202110564091A CN113358579A CN 113358579 A CN113358579 A CN 113358579A CN 202110564091 A CN202110564091 A CN 202110564091A CN 113358579 A CN113358579 A CN 113358579A
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- 230000003287 optical effect Effects 0.000 title claims abstract description 34
- 238000001228 spectrum Methods 0.000 title claims abstract description 24
- 238000000572 ellipsometry Methods 0.000 title claims abstract description 18
- 230000010287 polarization Effects 0.000 claims abstract description 22
- 230000008878 coupling Effects 0.000 claims abstract description 14
- 238000010168 coupling process Methods 0.000 claims abstract description 14
- 238000005859 coupling reaction Methods 0.000 claims abstract description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 17
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- 238000000034 method Methods 0.000 claims description 8
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- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 3
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 239000000523 sample Substances 0.000 description 26
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
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- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
- G01N2021/213—Spectrometric ellipsometry
Abstract
The invention relates to a broad spectrum ellipsometry optical system, which comprises a polarizing component and an analyzing component; the polarizing component comprises a light source, an off-axis elliptical reflector, a field diaphragm, an off-axis parabolic mirror, a first aperture diaphragm, a polarizer, a first phase retarder and a converging lens; the polarization analyzing assembly comprises a collimating lens, a second aperture diaphragm, a second phase retarder, a polarization analyzer, a coupling lens and a spectrometer; the polarizing component and the polarization analyzing component are symmetrically arranged along the normal direction of the sample table when working, and the included angle theta of the light path between the polarizing component and the polarization analyzing component is more than 50 degrees and less than 180 degrees. The invention utilizes the off-axis elliptical reflector to converge 193-1700nm wide-spectrum light sources into the field stop under the condition of not introducing color focal shift, and the full-spectrum energy utilization rate is consistent. The spot size of the sample surface is controlled by a field diaphragm. The light beam passing through the field diaphragm is collimated by the off-axis parabolic mirror in 193-1700nm full-waveband color-difference-free mode, and the full-spectrum energy collimation degree is consistent.
Description
Technical Field
The invention relates to the technical field of optical measurement, in particular to a broad spectrum ellipsometry optical system for measuring sub-nanometer film thickness.
Background
In the production process of a semiconductor integrated circuit, measurement means comprise a conventional Scanning Electron Microscope (SEM), a Scanning Tunneling Microscope (STM), an Atomic Force Microscope (AFM), a Transmission Electron Microscope (TEM) and the like, and the measurement requirements of sub-nanometer thickness dimensions are met. However, the method has the advantages of low measurement speed, high maintenance cost, high environmental requirement, difficulty in realizing online measurement, certain destructiveness and selectivity on a sample to be measured, and incapability of representing the optical characteristics of the material. In contrast, spectroscopic ellipsometers use a polarized light beam as a probe to measure the effect of a sample being measured on the polarization state of the reflected light beam, thereby obtaining information on some optical characteristics and surface structure properties of the sample. The film thickness measurement of the sub-nanometer level can be realized, and the method also has the advantages of high measurement speed, no damage, low cost, easy integration and the like.
The spectroscopic ellipsometer measures the polarization state of a reflected light beam of a measured sample, and the wavelength range of the irradiated light directly determines the measurable sample material. A wider spectrum of light can be used for a wider range of applications. However, the chromatic shift in the broad spectral beam path causes the illumination spot to become large and affects the energy efficiency of each wavelength. The common achromatic cemented lens can absorb ultraviolet wavelength, and the lens stress can influence the polarization state of light beams, thereby shortening the measurement wavelength and reducing the measurement precision.
Disclosure of Invention
The invention provides a broad spectrum ellipsometry optical system for measuring the sub-nanometer film thickness, aiming at least one technical problem in the prior art.
The technical scheme for solving the technical problems is as follows: a wide-spectrum ellipsometry optical system comprises a polarizing component and an analyzing component;
the polarizing component comprises a light source, an off-axis elliptical reflector, a field diaphragm, an off-axis parabolic mirror, a first aperture diaphragm, a polarizer, a first phase retarder and a converging lens;
the polarization analyzing assembly comprises a collimating lens, a second aperture diaphragm, a second phase retarder, a polarization analyzer, a coupling lens and a spectrometer;
the polarizing component and the polarization detecting component are symmetrically arranged along the axial direction of the sample table when working, and the included angle theta of the light path between the polarizing component and the polarization detecting component is more than 50 degrees and less than 180 degrees.
The invention has the advantages that 193-1700nm wide-spectrum light sources are converged into the field diaphragm by the off-axis elliptical reflector under the condition of not introducing color focal shift, and the full-spectrum energy utilization rate is consistent. The spot size of the sample surface is controlled by a field diaphragm. The light beam passing through the field diaphragm is collimated by the off-axis parabolic mirror in 193-1700nm full-waveband color-difference-free mode, and the full-spectrum energy collimation degree is consistent.
Further, the magnification of the off-axis elliptical reflector includes but is not limited to 0.5-2.5 times, and the off-axis elliptical reflector is used for coupling light source energy into the field diaphragm.
Furthermore, the focal length of the off-axis parabolic mirror is f1, the focal length of the off-axis parabolic mirror is more than 30mm and less than f1 and less than 150mm, and the surface of the off-axis parabolic mirror is coated with an ultraviolet enhanced aluminum film for collimating the light beam passing through the field diaphragm.
Further, the focal length of the converging lens is f2, 0.15f1 < f2 < 1.5f1, and the converging lens is used for irradiating the collimated light beam on the surface of the sample; the focal length of the collimating lens is f3, f3 is more than 0.15f1 and less than 1.5f1, and the collimating lens is used for collimating a reflected beam of the sample surface; the coupling lens has an angular separation of f4, 0.15f1 < f4 < 1.5f1, and functions to couple light energy into the spectrometer.
Furthermore, the convergent lens and the collimating lens are non-coating, non-birefringence and non-stress tri-cemented achromatism lenses.
Furthermore, the first lens material of the tri-cemented achromatism lens is ultraviolet fused quartz, the second lens material is calcium fluoride, the third lens material is ultraviolet fused quartz, and the cementing process is deepened optical cement.
Further, the first phase retarder and the second phase retarder are rotated along the optical axis at the same or different speeds during the measurement.
Furthermore, the converging lens and the collimating lens are made of non-birefringent glass materials and are installed in a stress-free mode, so that no factor for changing the phase of an optical path exists between the first phase retarder and the second phase retarder.
Furthermore, the field diaphragm is an elliptical aperture, the major-minor axis ratio of the elliptical aperture is e, and e is more than 1 and less than 5, and the field diaphragm is used for controlling the size of light spots irradiated on the sample surface.
Furthermore, the first aperture diaphragm and the second aperture diaphragm are both circular through holes, the aperture of the light passing is d, and d is more than 2mm and less than 10mm, and the aperture is used for controlling the numerical aperture of the system and filtering stray light.
The invention utilizes the converging lens and the collimating lens to adopt the tri-cemented achromatism lens without coating, double refraction material and stress, thereby eliminating the influence of the film layer, double refraction and stress on the measuring result while reducing the color focal shift. The converging lens and the collimating lens are achromatic lenses, and deepened optical cement is selected in the gluing process, so that the chromatic shift and the Fresnel reflection surface are effectively reduced, and the transmittance of full-spectrum light beams is improved.
Drawings
FIG. 1 is a schematic diagram of a spectroscopic ellipsometer according to the present invention;
FIG. 2 is a converging lens suitable for use in an embodiment of the invention;
FIG. 3 is a coupling lens suitable for use in embodiments of the present invention;
FIG. 4 is a color focus shift curve of a sample side illumination spot in an example of the present invention;
FIG. 5 is a cross-sectional view of a Wheatstone PSF with 0 ° illumination of the sample face in an example of the invention;
FIG. 6 is a cross-sectional view of a Wheatstone PSF with 65 ° illumination of the sample face in an example of the invention.
In the drawings, the components represented by the respective reference numerals are listed below:
1. the device comprises a light source, 2 an off-axis elliptic reflector, 3 a field diaphragm, 4 an off-axis parabolic mirror, 5 a first aperture diaphragm, 6 a polarizer, 7 a first phase retarder, 8 a converging lens, 9 a collimating lens, 10 a second aperture diaphragm, 11 a second phase retarder, 12 an analyzer, 13 a coupling lens, 14 a spectrometer, 15 and a sample stage.
Detailed Description
The principles and features of this invention are described below in conjunction with the following drawings, which are set forth by way of illustration only and are not intended to limit the scope of the invention.
An embodiment of the present invention, as shown in fig. 1, provides a wide-spectrum ellipsometry optical system, which includes a polarization component and an analyzer component;
the polarizing component comprises a light source 1, an off-axis elliptical reflector 2, a field diaphragm 3, an off-axis parabolic mirror 4, a first aperture diaphragm 5, a polarizer 6, a first phase retarder 7 and a converging lens 8;
the polarization analyzing component comprises a collimating lens 9, a second aperture diaphragm 10, a second phase retarder 11, an analyzer 12, a coupling lens 13 and a spectrometer 14;
the polarizing component and the polarization analyzing component are symmetrically arranged along the normal direction of the sample table 15 when working, and the included angle of the light path between the polarizing component and the polarization analyzing component is theta which is more than 50 degrees and less than theta and less than 180 degrees. In the embodiment of the present disclosure, when the polarization component optical path and the polarization detection component optical path work, they are symmetrical along a normal direction of the sample stage, an included angle is 130 °, and an included angle between the polarization component optical path and the sample surface is 25 °.
The light source 1 adopts a xenon lamp light source, and the light emitting wavelength is 180nm to 2000 nm. Therefore, the ellipsometry optical system disclosed in this embodiment is suitable for 193-1700nm wide spectrum measurement.
The magnification of the off-axis elliptic reflector 2 is 0.5-2.5 times, but not limited to, and the light beam emitted by the xenon lamp light source is converged to the field diaphragm 3. The specifications of the off-axis elliptical mirror in this embodiment are shown in table 1.
The field diaphragm 3 is an elliptical aperture, the ratio of the major axis b to the minor axis a of the elliptical aperture is e, 1 < e < 5, and the field diaphragm is used for controlling the size of a light spot irradiated on a sample surface. The minor axis 5 of the elliptical aperture selected in the embodiments herein may be: the obtained elliptic light through hole is the field diaphragm 3 and is positioned at the back focus of the off-axis elliptic reflector 2.
The focal length of the off-axis parabolic mirror 4 is f1, f1 is more than 30mm and less than 150mm, the surface of the off-axis parabolic mirror is coated with an ultraviolet enhanced aluminum film, and light beams passing through the field diaphragm 3 are collimated. The specification of the off-axis parabolic mirror 4 in this embodiment is shown in table 1.
TABLE 1 Reflector Specification
After collimation of the off-axis parabolic mirror, the light beam sequentially passes through the first aperture diaphragm 5, the polarizer 6, the first phase retarder 7 and the convergent lens 8 and irradiates the surface of the sample to be measured.
The first aperture diaphragm and the second aperture diaphragm are circular through holes, the aperture of the light passing is d, and d is more than 2mm and less than 10mm, and the first aperture diaphragm and the second aperture diaphragm are used for controlling the numerical aperture of the system and filtering stray light. In this embodiment, the first aperture diaphragm 5 is a light-passing hole with an aperture of 2mm < d < 7 mm. The polarizer 6 is a magnesium fluoride polaroid with a transmission waveband of 110-8500 nm, the extinction ratio is 10000:1, the separation angle is 1.76 degrees, and linearly polarized light is provided for the system. The first phase retarder 7 is a phase retarder of a multi-piece composite super achromatic wave plate, and the full-spectrum phase retardation is in the range of 60-140 degrees.
The focal length of the convergent lens 8 is f2, f2 is more than 0.15f1 and less than 1.5f1, the convergent lens is used for irradiating the field diaphragm 3 on a sample surface in an imaging mode, the irradiation spot size is controlled in a full spectrum mode without stress, a deepened photoresist process is adopted, the 193-1700nm full spectrum chromatic focal shift is 299 micrometers, the Numerical Aperture (NA) is more than or equal to 0.04, the 65-degree irradiation spot is not more than 26 multiplied by 40 micrometers, the focal length is not more than 24mm, and the specification of the convergent lens 8 adopted in the example is shown in table 2.
TABLE 2 cemented lens Specification
| Surface of | Radius of curvature | Thickness of | Bore diameter | Material |
| S1 | -20.05 | 2mm | 4mm | F_SILICA |
| S2 | -7.74 | 5mm | 4mm | CAF2 |
| S3 | 30.84 | 2mm | 4mm | F_SILICA |
| S4 | -224.76 | 0.5mm | 4mm | |
| S5 | -17.72 | 2mm | 4mm | F_SILICA |
| S6 | -11.21 | 5mm | 4mm | CAF2 |
| S7 | 9.73 | 2mm | 4mm | F_SILICA |
| S8 | 54.33 | 4mm |
The light beam reflected by the sample surface to be measured sequentially passes through the collimating lens 9, the second aperture diaphragm 10, the second phase retarder 11, the analyzer 12 and the coupling lens 13 of the analyzer assembly and enters the spectrometer 14.
The focal length of the collimating lens is f3, f3 is more than 0.15f1 and less than 1.5f1, the collimating lens is used for collimating the reflected beam of the sample surface, no stress is required, and the full spectrum collimation is required, and the specifications of the collimating lens 9 and the converging lens 8 in the embodiment are consistent, see table 2. Fig. 2 shows a schematic structural diagram of the condensing lens 8 and the collimating lens 9.
The second aperture stop 10 is in conformity with the specification of the first aperture stop 5. The second phase retarder 11 is a phase retarder formed by combining a plurality of super achromatic wave plates, and the full-spectrum phase retardation is within the range of (60 degrees and 140 degrees). The analyzer is a magnesium fluoride polaroid with a transmission waveband of 110-8500 nm, the extinction ratio is 10000:1, and the separation angle is 1.76 degrees.
The coupling lens has a focal length of f4, 0.15f1 < f4 < 1.5f1, and is used for coupling light energy into a spectrometer. In the embodiment, the cost factor is considered, and the coupling lens adopts a fused quartz single lens. The focal length is 18.7mm, the specific specification refers to table 3, and the structural schematic diagram is shown in fig. 3.
TABLE 3 Single lens Specification
| Surface of | Radius of curvature | Thickness of | Bore diameter | Material |
| S1 | 8.33 | 3mm | 4mm | F_SILICA |
| S2 | Infinite number of elements | 4mm |
The spectrometer 14 is used for receiving and measuring the light intensity signal, and in the embodiment of the invention, a 50-100 μm slit is selected, and a 193-1700nm full spectrum spectrometer is selected.
As a preferred embodiment, the convergent lens and the collimating lens are non-coated, non-birefringent, non-stress tri-cemented achromat lenses. The first lens material of the tri-cemented achromatism lens is ultraviolet fused quartz, the second lens material is calcium fluoride, the third lens material is ultraviolet fused quartz, and the cementing process is deepening optical cement.
As a preferred embodiment, the first phase retarder and the second phase retarder are rotated along the optical axis at the same or different speeds during the measurement.
As a preferred embodiment, the converging lens and the collimating lens are made of non-birefringent glass materials and are mounted in a stress-free manner, so that no factor for changing the phase of the optical path exists between the first phase retarder and the second phase retarder.
Compared with the prior art, the invention utilizes the off-axis elliptical reflector to converge the 193-1700nm wide-spectrum light source into the field diaphragm under the condition of not introducing color focal shift, and the full-spectrum energy utilization rate is consistent. The spot size of the sample surface is controlled by a field diaphragm. The light beam passing through the field diaphragm is collimated by the off-axis parabolic mirror in 193-1700nm full-waveband color-difference-free mode, and the full-spectrum energy collimation degree is consistent. The converging lens and the collimating lens adopt a tri-cemented achromatism lens without coating film, birefraction material and stress, the influence of a film layer, birefringence and stress on a measurement result is eliminated while the color focal shift is reduced, and the color focal shift curve of the sample surface irradiation light spot is shown in figure 4. The converging lens and the collimating lens are achromatic lenses, and deepened optical cement is selected in the gluing process, so that the chromatic shift and the Fresnel reflection surface are effectively reduced, and the transmittance of full-spectrum light beams is improved. FIG. 5 and FIG. 6 are cross-sectional views of a Wheatstone PSF with 0 ° and 65 ° illumination of the sample plane, respectively, for film thickness measurement using the present invention.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (10)
1. A wide-spectrum ellipsometry optical system is characterized by comprising a polarizing component and an analyzing component;
the polarizing component comprises a light source, an off-axis elliptical reflector, a field diaphragm, an off-axis parabolic mirror, a first aperture diaphragm, a polarizer, a first phase retarder and a converging lens;
the polarization analyzing assembly comprises a collimating lens, a second aperture diaphragm, a second phase retarder, a polarization analyzer, a coupling lens and a spectrometer;
the polarizing component and the polarization analyzing component are symmetrically arranged along the normal direction of the sample table when working, and the included angle theta of the light path between the polarizing component and the polarization analyzing component is more than 50 degrees and less than 180 degrees.
2. The broad spectrum ellipsometry optical system of claim 1, wherein the off-axis elliptical mirror magnification is at least 0.5-2.5 times for coupling light source energy into the field stop.
3. The broad spectrum ellipsometry optical system of claim 1 or 2, wherein the off-axis parabolic mirror focal length is f1, and 30mm < f1 < 150 mm.
4. The broad spectrum ellipsometry optical system of claim 3, wherein said converging lens focal length is f2, 0.15f1 < f2 < 1.5f 1; the focal length of the collimating lens is f3, f3 is more than 0.15f1 and less than 1.5f1, the angular distance of the coupling lens is f4, and f4 is more than 0.15f1 and less than 1.5f 1.
5. The broad spectrum ellipsometry optical system of claim 4, wherein said collection lens and said collimating lens are both uncoated, birefractive-free, stress-free tri-cemented achromat lenses.
6. The broad spectrum ellipsometry optical system of claim 5, wherein the first lens material of said tri-cemented achromatic lens is UV fused silica, the second lens material is calcium fluoride, the third lens material is UV fused silica, and the cementing process is deep optical cement.
7. The broad spectrum ellipsometry optical system of claim 3, wherein the first phase retarder and the second phase retarder are rotated along the optical axis at the same or different speeds during the measurement.
8. The broad spectrum ellipsometry optical system of claim 3, wherein said collection lens and said collimating lens are made of non-birefringent glass material and are mounted in a stress-free manner.
9. The broad spectrum ellipsometry optical system of claim 3, wherein said field stop is an elliptical aperture having an aspect ratio e, 1 < e < 5.
10. The broad spectrum ellipsometry optical system of claim 3, wherein said first aperture stop and said second aperture stop are circular through holes with a clear aperture of d, 2mm < d < 10 mm.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114383814A (en) * | 2021-12-06 | 2022-04-22 | 武汉颐光科技有限公司 | Lens wide-spectrum transmittance measuring device and method |
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