CN113340920A - Method and equipment for detecting defects of upper surface and lower surface of transparent material - Google Patents
Method and equipment for detecting defects of upper surface and lower surface of transparent material Download PDFInfo
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- CN113340920A CN113340920A CN202110495548.8A CN202110495548A CN113340920A CN 113340920 A CN113340920 A CN 113340920A CN 202110495548 A CN202110495548 A CN 202110495548A CN 113340920 A CN113340920 A CN 113340920A
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- 239000012780 transparent material Substances 0.000 title claims abstract description 172
- 230000007547 defect Effects 0.000 title claims abstract description 68
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- 238000001514 detection method Methods 0.000 claims abstract description 77
- 230000008569 process Effects 0.000 description 6
- 230000009471 action Effects 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
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Abstract
The invention discloses a method and equipment for detecting defects of upper and lower surfaces of a transparent material, which relate to the field of AOI appearance detection and comprise the following steps: the upper surface defects of the transparent material are directly detected using a detection device disposed above the transparent material. And focusing the image of the lower surface of the transparent material in a reflector arranged below the transparent material by using the detection device so as to detect the defect of the lower surface of the transparent material. The invention can detect the defects of the upper surface and the lower surface without turning the product, and is not influenced by the limitation of the depth of field of a lens and the thickness of a transparent material.
Description
Technical Field
The invention relates to the field of AOI appearance detection, in particular to a method and equipment for detecting defects of upper and lower surfaces of a transparent material.
Background
With continuous pursuit of people to large-screen display effect, the quality requirement of display requirement is higher and higher, and transparent material is used in more display products, like the glass apron of display, AR waveguide piece etc. its thickness variation range 50um ~ 2mm is unequal, and the detection requirement to its defect is higher and higher, not only need detect the upper surface defect, still need detect the lower surface defect, defect kind is a bit, line, mar, dirty etc..
For the detection of dots, lines, scratches, stains, and the like, defect detection may be performed with reference to an existing appearance detection AOI (Automated Optical Inspection) technique. However, the defects are also divided into upper and lower layer defects, sometimes the material is not suitable for being turned over due to the limitation of mechanism space, the size of the transparent material is large, the transparent material is thin and fragile, and the like, and the defects on the upper surface and the lower surface can only be detected through the upper surface, but sometimes the defects on the upper surface and the lower surface are difficult to distinguish and detect due to the reason that the material is too thin and the depth of field of the lens is large.
Disclosure of Invention
In view of the defects in the prior art, the first aspect of the invention provides a method for detecting defects on the upper and lower surfaces of a transparent material, which can detect the defects without turning the product and is not limited by the depth of field of a lens and the thickness of the transparent material.
In order to achieve the above purposes, the technical scheme adopted by the invention is as follows:
a method for detecting defects on the upper surface and the lower surface of a transparent material comprises the following steps:
directly detecting an upper surface defect of a transparent material using a detection device disposed above the transparent material;
and focusing the image of the lower surface of the transparent material in a reflector arranged below the transparent material by using the detection device so as to detect the defect of the lower surface of the transparent material.
In some embodiments, the detection method further comprises:
and adjusting the distance from the reflecting mirror to the transparent material so as to control the distance from the image of the lower surface of the transparent material in the reflecting mirror to the detection device.
In some embodiments, the directly detecting the defects on the upper surface of the transparent material using a detection device disposed above the transparent material comprises:
focusing a detection device to an upper surface of the transparent material;
starting a first light source arranged above the upper surface, and shooting and taking pictures by using a detection device so as to detect pits and/or scratches on the upper surface of the transparent material;
and starting second light sources arranged on two sides of the transparent material in the horizontal direction, and shooting and drawing by using a detection device so as to detect the pollution condition of the upper surface of the transparent material.
In some embodiments, the first light source includes at least two light-emitting sources arranged in mirror symmetry, and the at least two light-emitting sources are obliquely arranged at an included angle with the transparent material.
In some embodiments, said focusing, using said detection device, an image of a lower surface of a transparent material in a mirror disposed below said transparent material to detect a lower surface defect of said transparent material comprises:
focusing a detection device to the image of the lower surface of the transparent material in a reflector;
starting a third light source arranged below the lower surface, and shooting and taking pictures by using a detection device so as to detect pits and/or scratches on the lower surface of the transparent material;
and starting second light sources arranged on two sides of the transparent material in the horizontal direction, and shooting and drawing by using a detection device so as to detect the pollution condition of the lower surface of the transparent material.
In some embodiments, the detection method further comprises:
moving the detection device and the mirror to detect a next area of the transparent material.
A second aspect of the present invention provides an apparatus for detecting defects on upper and lower surfaces of a transparent material, which can detect defects on the upper and lower surfaces without turning the product over, and which is not affected by the depth of field of a lens and the thickness of the transparent material.
In order to achieve the above purposes, the technical scheme adopted by the invention is as follows:
an apparatus for detecting defects on upper and lower surfaces of a transparent material, comprising:
the detection device is used for being arranged above the transparent material to be detected;
a mirror for being disposed below the transparent material;
and the detection device is used for directly detecting the defects on the upper surface of the transparent material and focusing the images on the lower surface of the transparent material in the reflector arranged below the transparent material so as to detect the defects on the lower surface of the transparent material.
In some embodiments, the mirror is adjustable in distance from the transparent material to control the distance from the image of the lower surface of the transparent material in the mirror to the detection device.
In some embodiments, the detection apparatus further comprises a light source assembly comprising:
a first light source for being disposed over the transparent material;
the second light sources are used for being arranged on two sides of the transparent material in the horizontal direction;
a third light source for being disposed below the transparent material.
In some embodiments, each of the first light source and the third light source includes at least two light-emitting sources arranged in mirror symmetry, and the at least two light-emitting sources are obliquely arranged at an included angle with the transparent material.
Compared with the prior art, the invention has the advantages that:
the method for detecting the defects on the upper surface and the lower surface of the transparent material can detect the defects on the upper surface and the lower surface without turning the product, can detect the defects on the upper surface and the lower surface through multiple times of focusing without being influenced by the limitation of the depth of field of a lens and the thickness of the transparent material, can well distinguish the defects on the upper surface and the lower surface, provides data support for the production of the product, and efficiently provides valuable process and quality control for the panel industry.
Drawings
FIG. 1 is a flow chart of a method for detecting defects on the upper and lower surfaces of a transparent material according to an embodiment of the present invention;
FIG. 2 is a flowchart of step S1 according to an embodiment of the present invention;
FIG. 3 is a flowchart of step S2 according to an embodiment of the present invention;
FIG. 4 is a schematic structural diagram of an apparatus for detecting defects on upper and lower surfaces of a transparent material according to an embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some embodiments of the present application, but not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
Referring to fig. 1, an embodiment of the present invention provides a method for detecting defects on upper and lower surfaces of a transparent material, including the following steps:
s1, directly detecting the upper surface defects of the transparent material by using detection equipment arranged above the transparent material.
In this embodiment, the detection device located on the upper surface of the transparent material may directly perform detection, and in a specific implementation, referring to fig. 2, step S1 includes:
s11, focusing the detection device on the upper surface of the transparent material.
S12, a first light source arranged above the upper surface is started, and a detection device is used for shooting and taking pictures so as to detect pits and/or scratches on the upper surface of the transparent material.
Referring to fig. 4, in the present embodiment, the detection apparatus mainly includes an area-array camera 1 and a lens 2. The first light source comprises at least one light emitting source arranged above the transparent material 10 for assisting the detection device in detecting the upper surface of the transparent material 10, in order to provide the high-level light required for detection. Preferably, the first light source comprises at least two light sources arranged in mirror symmetry, and may be arranged as the light source 3 and the light source 4 shown in the figure, both of which are arranged in mirror symmetry and are inclined at an angle θ with respect to the transparent material 10. It will be appreciated that by arranging the light emitting sources in this manner, pits and/or scratches on the upper surface of the transparent material 10 can be better found.
And S13, turning on second light sources arranged on two sides of the transparent material in the horizontal direction, and shooting and taking pictures by using a detection device so as to detect the pollution condition of the lower surface of the transparent material.
Referring to fig. 4, the second light source includes light emitting sources 5 and 6 on the left and right sides of the transparent material 10 in the horizontal direction, which are mainly used to provide low-layer side light required for detection. Thereby facilitating the detection of soiling of the upper surface of the transparent material 10 by the detection means.
S2, focusing the image of the lower surface of the transparent material in the reflector arranged below the transparent material by using the detection device so as to detect the defect of the lower surface of the transparent material.
The problem that in the prior art, due to the limitation of mechanism space, the size of a transparent material is large, the transparent material is thin and fragile, the transparent material is sometimes not suitable for being turned over, the defects of the upper surface and the lower surface can only be detected through the upper surface, and the defects of the upper surface and the lower surface are difficult to distinguish and detect due to the fact that the material is too thin and the depth of field of a lens is large is solved.
In this embodiment, mainly by disposing a mirror under the transparent material, in a specific implementation, referring to fig. 3, step S2 includes:
s21, focusing the detection device to the imaging of the lower surface of the transparent material in the reflecting mirror.
Referring to fig. 4, it can be understood that after a mirror 9 is disposed under a transparent material 10, based on the mirror imaging principle, an image 11 in fig. 4 is obtained, and then the lower surface of the transparent material 10 can be detected by focusing on the image 11 with a detection device.
In addition, in order to adapt to the depth of field ranges of different lenses and the thickness of the transparent material, the distance from the reflecting mirror to the transparent material can be adjusted to control the distance from the image of the lower surface of the transparent material in the reflecting mirror to the detection device,
and S22, starting a third light source arranged below the lower surface, and shooting and taking pictures by using a detection device so as to detect pits and/or scratches on the lower surface of the transparent material.
Referring to fig. 4, the third light source includes at least one light emitting source disposed above the transparent material 10 for assisting the inspection device in inspecting the lower surface of the transparent material in order to provide the high-level light required for inspection. Preferably, the third light source comprises at least two light sources arranged in mirror symmetry, and may be arranged as the light source 7 and the light source 8 shown in the figure, both of which are arranged in mirror symmetry and are inclined at an angle to the transparent material 10. It will be appreciated that by arranging the light emitting sources in this manner, pits and/or scratches of the lower surface of the transparent material 10 can be better found.
And S23, turning on second light sources arranged on two sides of the transparent material in the horizontal direction, and shooting and taking pictures by using a detection device so as to detect the pollution condition of the lower surface of the transparent material.
The second light source can be used for detecting the dirt on the upper and lower surfaces of the transparent material, and as shown in fig. 4, the second light source includes a light source 5 and a light source 6 which are located on the left and right sides of the transparent material 10 in the horizontal direction and are mainly used for providing the low-layer side light required for detection. Thereby facilitating the detection of soiling of the lower surface of the transparent material 10 by the detection means.
It is worth mentioning that, in order to save energy, when it is necessary to detect the pits and/or scratches on the upper surface of the transparent material, it is only necessary to turn on the light emitting sources 3 and 4, while the light emitting sources 5, 6, 7 and 8 are all turned off.
When it is desired to detect pits and/or scratches of the lower surface of the transparent material, only light emitting source 7 and light emitting source 8 need to be turned on, while light emitting source 3, light emitting source 4, light emitting source 5 and light emitting source 6 are all turned off.
When the upper and lower surfaces of the transparent material need to be detected, only the light emitting source 5 and the light emitting source 6 need to be turned on, and the light emitting source 3, the light emitting source 4, the light emitting source 7 and the light emitting source 8 are all turned off.
It will be appreciated that when one area of transparent material has been inspected, the detection means, mirror and corresponding light emitting source may be moved to detect the next area of transparent material.
In summary, the method for detecting the defects on the upper surface and the lower surface of the transparent material can detect the defects on the upper surface and the lower surface without turning the product, can detect the defects on the upper surface and the lower surface through multiple times of focusing without being limited by the depth of field of a lens and the thickness of the transparent material, can well distinguish the defects on the upper surface and the lower surface, provides data support for the production of the product, and efficiently provides valuable process and quality control for the panel industry.
Meanwhile, the embodiment of the invention also provides equipment for detecting the defects on the upper surface and the lower surface of the transparent material, which comprises a detection device and a reflector.
The detection device is arranged above the transparent material to be detected. The reflector is arranged below the transparent material. And the detection device is used for directly detecting the defects on the upper surface of the transparent material and focusing the images on the lower surface of the transparent material in the reflector arranged below the transparent material so as to detect the defects on the lower surface of the transparent material.
In some embodiments, in order to adapt to the depth of field ranges of different lenses and the thickness of the transparent material, the distance between the reflecting mirror and the transparent material can be adjusted to control the distance from the imaging of the lower surface of the transparent material in the reflecting mirror to the detection device.
In some embodiments, in order to facilitate the detection device to detect the defects on the upper surface and the lower surface of the transparent material, the detection apparatus further comprises a light source assembly including a first light source, a second light source and a third light source.
Wherein the first light source is arranged above the transparent material. The second light sources are arranged on two sides of the transparent material in the horizontal direction. The third light source is arranged below the transparent material. Preferably, in order to better detect the defect, each of the first light source and the third light source includes at least two light-emitting sources arranged in mirror symmetry, and the at least two light-emitting sources and the transparent material are arranged in an inclined manner at an included angle, so as to better detect the defect.
The above-described detection apparatus is further described below with reference to fig. 4:
in fig. 4, the detection apparatus includes an area-array camera 1 and a lens 2, and a mirror 9 is located below a transparent material 10. The first light source comprises a light source 3 and a light source 4 which are obliquely arranged at an included angle with the transparent material 10, the second light source comprises a light source 5 and a light source 6 which are positioned at the left side and the right side of the transparent material 10 in the horizontal direction, and the third light source comprises a light source 7 and a light source 8 which are obliquely arranged at an included angle with the transparent material 10.
When pits and/or scratches on the upper surface of the transparent material need to be detected, the area-array camera 1 and the lens 2 focus on the upper surface of the transparent material 10, the light source 3 and the light source 4 are turned on, meanwhile, the light source 5, the light source 6, the light source 7 and the light source 8 are turned off, and the area-array camera 1 shoots and picks up images to complete detection.
When the dirt condition of the upper surface of the transparent material needs to be detected, the area array camera 1 and the lens 2 focus on the upper surface of the transparent material 10, the light source 5 and the light source 6 are turned on, meanwhile, the light source 3, the light source 4, the light source 7 and the light source 8 are turned off, and the area array camera 1 shoots and picks up images to complete detection.
When pits and/or scratches on the lower surface of the transparent material need to be detected, the area-array camera 1 and the lens 2 focus an image 11 on the lower surface of the transparent material 10 in the reflector 9, the light-emitting source 7 and the light-emitting source 8 are turned on, the light-emitting source 3, the light-emitting source 4, the light-emitting source 5 and the light-emitting source 6 are turned off, and the area-array camera 1 shoots and picks up an image to complete detection.
When the dirty condition of the lower surface of the transparent material needs to be detected, the area-array camera 1 and the lens 2 focus on an image 11 of the lower surface of the transparent material 10 in the reflector 9, the light-emitting source 5 and the light-emitting source 6 are turned on, meanwhile, the light-emitting source 3, the light-emitting source 4, the light-emitting source 7 and the light-emitting source 8 are all turned off, and the area-array camera 1 shoots and picks up images to complete detection.
And completing detection and image taking of one area based on the four steps, if other areas need to be shot, moving the area array camera 1, the lens 2, the light emitting source 3, the light emitting source 4, the light emitting source 7, the light emitting source 8 and the reflector 9 to the next area simultaneously, and repeating the four steps to take images.
In summary, the detection equipment for the defects on the upper surface and the lower surface of the transparent material can detect the defects on the upper surface and the lower surface without turning the product, can detect the defects on the upper surface and the lower surface through multiple times of focusing without being limited by the depth of field of a lens and the thickness of the transparent material, can well distinguish the defects on the upper surface and the lower surface, provides data support for the production of the product, and efficiently provides valuable process and quality control for the panel industry.
In the description of the present application, it should be noted that the terms "upper", "lower", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, which are only for convenience in describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed in a specific orientation, and operate, and thus, should not be construed as limiting the present application. Unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are intended to be inclusive and mean, for example, that they may be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
It is noted that, in the present application, relational terms such as "first" and "second", and the like, are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
The above description is merely exemplary of the present application and is presented to enable those skilled in the art to understand and practice the present application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (10)
1. A method for detecting defects on the upper surface and the lower surface of a transparent material is characterized by comprising the following steps:
directly detecting an upper surface defect of a transparent material using a detection device disposed above the transparent material;
and focusing the image of the lower surface of the transparent material in a reflector arranged below the transparent material by using the detection device so as to detect the defect of the lower surface of the transparent material.
2. The method of claim 1, further comprising:
and adjusting the distance from the reflecting mirror to the transparent material so as to control the distance from the image of the lower surface of the transparent material in the reflecting mirror to the detection device.
3. The method for detecting the defects on the upper surface and the lower surface of the transparent material as claimed in claim 1, wherein the directly detecting the defects on the upper surface of the transparent material by using the detecting device arranged above the transparent material comprises:
focusing a detection device to an upper surface of the transparent material;
starting a first light source arranged above the upper surface, and shooting and taking pictures by using a detection device so as to detect pits and/or scratches on the upper surface of the transparent material;
and starting second light sources arranged on two sides of the transparent material in the horizontal direction, and shooting and drawing by using a detection device so as to detect the pollution condition of the upper surface of the transparent material.
4. The method of claim 3, wherein the step of detecting the defects on the upper and lower surfaces of the transparent material comprises:
the first light source comprises at least two light-emitting sources which are arranged in mirror symmetry, and an included angle is formed between the at least two light-emitting sources and the transparent material in an inclined mode.
5. The method for detecting defects on the upper and lower surfaces of a transparent material according to claim 1, wherein the step of focusing the image of the lower surface of the transparent material in the reflector disposed below the transparent material by using the detection device to detect the defects on the lower surface of the transparent material comprises the steps of:
focusing a detection device to the image of the lower surface of the transparent material in a reflector;
starting a third light source arranged below the lower surface, and shooting and taking pictures by using a detection device so as to detect pits and/or scratches on the lower surface of the transparent material;
and starting second light sources arranged on two sides of the transparent material in the horizontal direction, and shooting and drawing by using a detection device so as to detect the pollution condition of the lower surface of the transparent material.
6. The method of claim 1, further comprising:
moving the detection device and the mirror to detect a next area of the transparent material.
7. An apparatus for detecting defects on upper and lower surfaces of a transparent material, comprising:
the detection device is used for being arranged above the transparent material to be detected;
a mirror for being disposed below the transparent material;
and the detection device is used for directly detecting the defects on the upper surface of the transparent material and focusing the images on the lower surface of the transparent material in the reflector arranged below the transparent material so as to detect the defects on the lower surface of the transparent material.
8. The apparatus for detecting defects on the upper and lower surfaces of a transparent material as claimed in claim 7, wherein:
the reflector can adjust the distance between the reflector and the transparent material so as to control the distance between the image of the lower surface of the transparent material in the reflector and the detection device.
9. The apparatus for detecting defects on the upper and lower surfaces of a transparent material as claimed in claim 7, wherein: the detection apparatus further comprises a light source assembly comprising:
a first light source for being disposed over the transparent material;
the second light sources are used for being arranged on two sides of the transparent material in the horizontal direction;
a third light source for being disposed below the transparent material.
10. The apparatus for detecting defects on the upper and lower surfaces of a transparent material as claimed in claim 9, wherein: the first light source and the third light source respectively comprise at least two light-emitting sources which are arranged in mirror symmetry, and the at least two light-emitting sources and the transparent material are obliquely arranged at an included angle.
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| CN202110495548.8A CN113340920A (en) | 2021-05-07 | 2021-05-07 | Method and equipment for detecting defects of upper surface and lower surface of transparent material |
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| CN202110495548.8A CN113340920A (en) | 2021-05-07 | 2021-05-07 | Method and equipment for detecting defects of upper surface and lower surface of transparent material |
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