CN113281916B - Method for continuously adjusting infrared emissivity of object and infrared functional surface based on method - Google Patents

Method for continuously adjusting infrared emissivity of object and infrared functional surface based on method Download PDF

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CN113281916B
CN113281916B CN202110506340.1A CN202110506340A CN113281916B CN 113281916 B CN113281916 B CN 113281916B CN 202110506340 A CN202110506340 A CN 202110506340A CN 113281916 B CN113281916 B CN 113281916B
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material layer
emissivity
infrared
regulating
regulating material
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CN113281916A (en
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周明
杨名扬
张之勋
俞剑文
张毅博
程文俊
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Tsinghua University
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/0009—Materials therefor
    • G02F1/0063—Optical properties, e.g. absorption, reflection or birefringence
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

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Abstract

The invention provides a method for continuously adjusting the infrared emissivity of an object and an infrared functional surface based on the method. According to the invention, the surface of the object is provided with the regulating material layer with emissivity different from that of the object, and then the occupied area proportion of the regulating material layer on the whole surface formed by the regulating material layer and the object is regulated, so that the continuous regulation of the infrared emissivity of 0.1-0.9 in the wave bands of 3-5 mu m and 8-14 mu m is realized. Compared with the traditional method for manufacturing the coating with different emissivity on the surface of the object, the method has the advantages of simple process, low cost, good repeatability and large-area application, and has important significance for the application of heat preservation, energy conservation, emission reduction and the like of the building outer wall.

Description

Method for continuously adjusting infrared emissivity of object and infrared functional surface based on method
Technical Field
The invention relates to the technical field of functional materials, in particular to a method for continuously adjusting infrared emissivity of an object and an infrared functional surface based on the method.
Background
Infrared radiation is light invisible to the human eye, also known as infrared light or infrared light, and refers to electromagnetic waves having wavelengths in the 0.78-1000 μm band, which were found by the uk scientist helter in 1800 years. With the development of infrared physics and technology, the application research of infrared optical materials and industrial, traffic, scientific and medical infrared technologies is accelerated. In astronomy, the atmosphere of the golden star contains a large amount of carbon dioxide gas, and the atmospheres of the wooden star, the earth star, the starfish and the starfish comprise a large amount of methane which are all determined by an infrared detection instrument.
The emergent degree of the infrared radiation of the object needs to be regulated and controlled according to different application directions. According to the steven-boltzmann law: m=εσt 4 (where ε is the emissivity of the object, σ is the Stefan-Boltzmann constant, T is the absolute temperature of the object), the radiant emittance is proportional to ε and the 4 th power of T, and thus the radiant emittance can be adjusted by adjusting the temperature and emissivity of the object. Because the temperature is difficult to regulate, the most common method for changing the radiation emittance is to manufacture coatings with different emittance on the surface of an object.
The current infrared coating realizes the adjustment of the emissivity of the coating mainly by changing the proportion of pigment and binder in the coating, but the adjustment mode is discontinuous, and a large amount of early experiments are needed to obtain the coating meeting the emissivity requirement, so that the cost is high.
Disclosure of Invention
Aiming at the defects existing in the prior art, the invention provides a method for continuously adjusting the infrared emissivity of an object and an infrared functional surface based on the method.
The invention adopts the following technical scheme:
the invention provides a method for continuously adjusting infrared emissivity of an object, which comprises the steps of arranging a regulating material layer on the surface of the object, arranging a plurality of through holes on the regulating material layer in the direction vertical to the surface of the object, and continuously adjusting the infrared emissivity by adjusting the area of the object exposed from the through holes.
According to the invention, the surface of the object is provided with the regulating material layer with emissivity different from that of the object, then the occupied area of the regulating material layer on the whole surface formed by the regulating material layer and the object (namely the whole formed by the surface of the regulating material layer and the surface of the object exposed in the through hole) is regulated to realize continuous regulation of the infrared emissivity, and the result shows that the continuous regulation of the infrared emissivity of 0.1-0.9 can be realized at 3-5 mu m and 8-14 mu m. Compared with the traditional method for manufacturing the coating with different emissivity on the surface of the object, the method has low cost, can simply and efficiently adjust the infrared emissivity of the object, and has important significance for the application of heat preservation, energy conservation, emission reduction and the like of the building outer wall.
Further, the infrared emissivity of the regulating material layer and the object in the wave bands of 3-5 mu m and 8-14 mu m are different by more than 0.6. When the difference between the infrared emissivity of the regulating material layer and the infrared emissivity of the object is more than 0.6, the whole infrared emissivity can be regulated to a large extent.
Further, when the object is metal, the regulating material layer is graphite or boron;
when the object is an elastic porous material such as polyurethane sponge, melamine foam and the like, the regulating material layer is made of metals such as gold, silver, copper, aluminum or platinum and the like.
Further, when the regulating material layer is made of a metal material, the regulating material layer is deposited in a magnetron sputtering method or an electron beam evaporation mode, and when the regulating material layer is made of a non-metal material, the regulating material layer is deposited in a thermal evaporation, electron beam evaporation or magnetron sputtering mode.
Preferably, both are cleaned before the layer of conditioning material is applied to the surface of the object. The cleaning is preferably sequentially performed by using acetone, ethanol and deionized water.
Further, the through holes are micropore arrays with the aperture of 100-500 mu m and the pitch of 500-1500 mu m. The aperture and pitch of the through holes also affect the overall emissivity adjustment range. The through holes are arranged into the micropore array with the aperture and the aperture, so that a wider emissivity adjusting range is obtained, and the emissivity of the whole object is uniform.
The through holes in the regulating material layer can be manufactured by adopting methods such as laser or wet etching.
Further, the method of adjusting the size of the exposed area of the object from the through hole according to the present invention may be to stretch the adjusting material layer so as to increase the cross-sectional area of the through hole. The cross-sectional area of the through hole is enlarged, the area proportion of the surface of the object exposed from the through hole is enlarged, the overall infrared emissivity is changed, and in the adjusting process, once the target emissivity is obtained through adjustment, the adjusting and controlling material layer is fixed, so that the cross-sectional area of the through hole is not changed any more.
Further, the method for adjusting the size of the exposed area of the object from the through hole according to the present invention may be: the regulating material layer is arranged to be of a double-layer structure capable of relatively moving, and the double-layer structure is relatively displaced through translation or rotation, so that the whole through hole area of the regulating material layer is changed.
The invention also provides an infrared functional surface based on the method for continuously adjusting the infrared emissivity of the object.
The invention provides an infrared functional surface with continuously adjustable infrared emissivity, which comprises a substrate material layer and a regulating material layer arranged on the surface of the substrate material layer; the thickness of the substrate material layer is larger than 1mm, and the regulating material layer is provided with a plurality of through holes in the direction perpendicular to the surface of the substrate material layer. The thickness of the regulating material layer has no special requirement.
The invention utilizes the emissivity of infrared radiation to be only related to the surface state of an object, and obtains the infrared functional surface with continuously adjustable infrared emissivity by adjusting the difference of the occupied area of the substrate material layer and the regulating material layer in the whole surface.
In a preferred embodiment of the invention, the layer of conditioning material consists of a surface deposited conditioning material of an elastomeric carrier, preferably natural rubber.
In another preferred embodiment of the present invention, the regulating material layer is a relatively movable bilayer structure, and the regulating materials are adopted as the material of the bilayer structure.
Further, the infrared emissivity of the regulating material and the base material in the wave bands of 3-5 mu m and 8-14 mu m is different by more than 0.6.
Further, when the substrate material is metal, the regulating material is graphite or boron;
when the substrate material is elastic porous material such as polyurethane sponge, melamine foam, etc., the regulating material is selected from metal such as gold, silver, copper, aluminum or platinum, etc.
Further, the through holes are micropore arrays with the aperture of 100-500 mu m and the pitch of 500-1500 mu m.
The invention provides a method for continuously adjusting the infrared emissivity of an object and an infrared functional surface based on the method, wherein the infrared emissivity of the infrared functional surface is continuously adjustable in the wave bands of 3-5 mu m and 8-14 mu m by arranging a regulating material layer with the emissivity different from that of the object on the surface of the object and then adjusting the occupied area ratio of the regulating material layer on the whole surface formed by the regulating material layer and the object. Compared with the traditional method for manufacturing the coating with different emissivity on the surface of the object, the method has the advantages of simple process, low cost, good repeatability and large-area application, and has important significance for the application of heat preservation, energy conservation, emission reduction and the like of the building outer wall.
Drawings
FIG. 1 is a schematic diagram of the structure of an infrared functional surface with continuously adjustable emissivity in embodiment 1 of the present invention;
FIG. 2 shows the range of the emissivity of the entire structure of the infrared functional surface in the 3-5 μm and 8-14 μm bands, which is actually measured in example 1;
FIG. 3 shows the range of the emissivity of the entire structure of the infrared functional surface in the 3-5 μm and 8-14 μm bands, which was actually measured in example 2.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention will be clearly and completely described below, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The embodiment of the invention provides a method for continuously adjusting infrared emissivity of an object, which comprises the steps of arranging a regulating material layer on the surface of the object, arranging a plurality of through holes on the regulating material layer in the direction vertical to the surface of the object, and continuously adjusting the infrared emissivity by adjusting the area of the object exposed from the through holes.
Wherein the through holes are micropore arrays with the aperture of 100-500 mu m and the pitch of 500-1500 mu m.
The infrared emissivity of the regulating material layer and the object in the wave bands of 3-5 mu m and 8-14 mu m are different by more than 0.6 so as to regulate the overall infrared emissivity to a large extent.
In this embodiment, when the object is metal, the adjusting material layer is graphite or boron;
when the object is made of elastic porous materials such as polyurethane sponge, melamine foam and the like, the regulating material layer is made of metals such as gold, silver, copper, aluminum or platinum and the like.
Example 1
The embodiment provides an infrared functional surface with continuously adjustable emissivity, and the structural schematic diagram is shown in fig. 1, and the infrared functional surface consists of a substrate material layer and a regulating material layer arranged above the substrate material layer.
Wherein, the substrate material layer is polylactic acid (PLA) with high emissivity, and the thickness is 5mm.
The regulating material layer is aluminum-plated natural rubber, the total thickness is 0.5mm, the thickness ratio of the aluminum to the natural rubber has no special requirement, and the emissivity of the regulating material layer is about 0.15. The deposition method of aluminum in this example is thermal evaporation. The regulating material layer is provided with an array of micro-holes to expose a portion of the surface of the substrate material layer. The processing method of the micropore array in this embodiment is laser processing, the aperture of the micropore is 100 μm, and the pitch of the micropore is 500 μm.
In this embodiment, the infrared emissivity of the infrared functional surface is adjusted by equiaxed stretching of the adjustment and control material layer.
According to the overall structure used in this example, the infrared emissivity of the 3-5 μm and 8-14 μm bands was tested when the area of the control material layer was changed, and as a result, as shown in fig. 2, the control material layer was increased in the area of micropores due to the increase in the stretched area, the exposed area of the base material was increased, and the overall emissivity was increased. It can be seen that the final infrared emissivity adjustment range achieved in this embodiment is 0.1-0.5.
Example 2
The embodiment provides an infrared functional surface with continuously adjustable emissivity, which consists of a substrate material layer and a regulating material layer arranged above the substrate material layer.
Wherein, the substrate material layer is polylactic acid (PLA) with high emissivity, and the thickness is 5mm.
The regulating material layer is silver-plated natural rubber, the total thickness is 0.5mm, the thickness ratio of the silver to the natural rubber is not particularly required, and the emissivity of the regulating material layer is about 0.15. The deposition method of silver in this embodiment is magnetron sputtering. The regulating material layer is provided with an array of micro-holes to expose a portion of the surface of the substrate material layer. The processing method of the micropore array in this embodiment is laser processing, the aperture of the micropore is 500 μm, and the pitch of the micropore is 1500 μm.
In this embodiment, the infrared emissivity of the infrared functional surface is adjusted by equiaxed stretching of the adjustment and control material layer.
According to the overall structure used in this example, the infrared emissivity of the 3-5 μm and 8-14 μm bands was tested when the area of the control material layer was changed, and as a result, as shown in fig. 3, the control material layer was increased in the area of micropores due to the increase in the stretched area, the exposed area of the base material was increased, and the overall emissivity was increased. It can be seen that the final infrared emissivity adjustment range achieved in this embodiment is 0.2-0.75.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and are not limiting; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims (3)

1. The method for continuously adjusting the infrared emissivity of the object is characterized by comprising the steps of arranging a regulating material layer on the surface of the object, arranging a plurality of through holes on the regulating material layer in the direction perpendicular to the surface of the object, and continuously adjusting the infrared emissivity by adjusting the area of the object exposed from the through holes;
the infrared emissivity of the regulating material layer and the object in the wave bands of 3-5 mu m and 8-14 mu m differ by more than 0.6;
the through holes are micropore arrays with the aperture of 100-500 mu m and the pitch of 500-1500 mu m;
the method for adjusting the size of the area of the object exposed from the through hole comprises the following steps:
stretching the regulating material layer to enlarge the cross-sectional area of the through hole;
or, the regulating material layer is arranged into a double-layer structure capable of relatively moving, and the double-layer structure is relatively displaced through translation or rotation, so that the whole penetrating hole area is changed.
2. The infrared functional surface with continuously adjustable emissivity is characterized by comprising a substrate material layer and a regulating material layer arranged on the surface of the substrate material layer; the thickness of the substrate material layer is larger than 1mm, and the regulating material layer is provided with a plurality of through holes in the direction perpendicular to the surface of the substrate material layer; the infrared emissivity of the regulating and controlling material and the base material in the wave bands of 3-5 mu m and 8-14 mu m differ by more than 0.6; the through holes are micropore arrays with the aperture of 100-500 mu m and the pitch of 500-1500 mu m;
the regulating material layer is formed by depositing regulating materials on the surface of an elastic carrier, the elastic carrier is natural rubber, and the regulating material layer is stretched to enlarge the cross section area of the through hole;
or, the regulation and control material layer is a double-layer structure capable of relatively moving, and the materials of the double-layer structure are regulation and control materials, so that the double-layer structure is relatively displaced through translation or rotation, and the whole through hole area is changed.
3. The continuously adjustable emissivity infrared functional surface of claim 2, wherein when said modulating material layer is a relatively movable bilayer structure, said modulating material is graphite or boron when said base material is metal;
when the substrate material is an elastic porous material, the regulating material is metal.
CN202110506340.1A 2021-05-10 2021-05-10 Method for continuously adjusting infrared emissivity of object and infrared functional surface based on method Active CN113281916B (en)

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US6292293B1 (en) * 1999-06-25 2001-09-18 Raytheon Company Wide-angle infrared lens and detector with internal aperture stop and associated method
EP3623779A1 (en) * 2018-09-13 2020-03-18 Hahn-Schickard-Gesellschaft für angewandte Forschung e.V. Modulation of a moving ir emitter by means of a shutter structure
EP3623780A1 (en) * 2018-09-13 2020-03-18 Hahn-Schickard-Gesellschaft für angewandte Forschung e.V. Modulation of the emission intensity of an ir emitter by variation of the emitting surface
CN110863181B (en) * 2019-11-05 2021-04-13 吉林大学 Infrared emissivity active modulation coating based on double-layer phase change material
CN112625521A (en) * 2020-12-02 2021-04-09 中昊北方涂料工业研究设计院有限公司 Low-infrared-emissivity coating with visible light compatibility and preparation method thereof

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