CN113262665A - Emulsion mixing stirrer for preparing new semiconductor material - Google Patents
Emulsion mixing stirrer for preparing new semiconductor material Download PDFInfo
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- CN113262665A CN113262665A CN202110468523.9A CN202110468523A CN113262665A CN 113262665 A CN113262665 A CN 113262665A CN 202110468523 A CN202110468523 A CN 202110468523A CN 113262665 A CN113262665 A CN 113262665A
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- plate
- solid impurities
- elastic
- semiconductor material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/10—Maintenance of mixers
- B01F35/12—Maintenance of mixers using mechanical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/80—After-treatment of the mixture
- B01F23/808—Filtering the mixture
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F27/00—Mixers with rotary stirring devices in fixed receptacles; Kneaders
- B01F27/60—Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a horizontal or inclined axis
- B01F27/70—Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a horizontal or inclined axis with paddles, blades or arms
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
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Abstract
The invention discloses an emulsion mixing stirrer for preparing a new semiconductor material, which structurally comprises a stirring mechanism, a rotator and a workbench, wherein the surface of the lower end of the stirring mechanism is welded at the upper end of the workbench, the rotator penetrates through the middle and the inner part of the stirring mechanism, the lower end of the stirring mechanism is embedded at the upper end of the workbench, the rotator rotates, and simultaneously, a rotating rod drives a sweeping structure to rotate at the inner side of a collecting structure so as to clean solid impurities and prevent the solid impurities in the collecting structure from flowing out along with liquid, so that the solid impurities are blocked at the side surface of a gap plate, the effect of collecting the solid impurities is achieved, the solid impurities are prevented from being mixed with the new material emulsion, the solid impurities at the inner side of the collecting structure are subjected to sliding stress when the sweeping structure rotates, the solid impurities are forced to enter a blocking structure so as to be collected, and simultaneously, the solid impurities enter the outer side of a round rod through a movable structure, the solid impurities in the new material emulsion are collected and cleaned, and the purity of the new material emulsion is improved.
Description
Technical Field
The invention relates to the field of new semiconductor material preparation, in particular to an emulsion mixing stirrer for preparing a new semiconductor material.
Background
The preparation of the new semiconductor material utilizes the liquid crystal polymer emulsion to stir, reduces the impurities of the new semiconductor material, simultaneously melts the semiconductor into an emulsion state at high temperature, stirs and separates the rest material impurities in the semiconductor according to the melting points of different materials, and simultaneously prevents the generation of gaps among the new semiconductor materials.
However, in the preparation of the new semiconductor material, impurities are removed according to different melting points in the stirring process, the impurities are separated from the semiconductor emulsion to form fine spheres again, the diameter of the solid impurities is small, the solid impurities are easily adhered to the semiconductor emulsion during stirring, and a mesh screening method is used for separating the impurities, so that the semiconductor emulsion is easily subjected to large resistance, the fine solid impurities are inconvenient to screen, and the circulation of the semiconductor emulsion is blocked.
Disclosure of Invention
The invention is realized by the following technical scheme: the utility model provides a semiconductor new material preparation is with emulsion mixing agitator, its structure includes rabbling mechanism, rotation ware, workstation, the welding of rabbling mechanism lower extreme surface is in the workstation upper end, it runs through inside in the middle of the rabbling mechanism to rotate the ware, the rabbling mechanism lower extreme inlays admittedly in the workstation upper end, the rabbling mechanism is equipped with collects structure, rotary rod, sweeps the structure, it inlays admittedly in the rotary rod outside to sweep the structure, collect the structure inboard and sweep structure outside clearance fit, it is located same center axis to collect structure and rotary rod, it inlays admittedly in the workstation upper end to collect structure outside lower extreme, it is equipped with four to sweep the structure to the rotary rod evenly encircle as the center, it is two-layer inside and outside to collect the structure and divide into, is equipped with the clearance between two-layer.
As a further improvement of the invention, the sweeping structure is provided with a guide block, a sealing block, a rotating plate and a limiting structure, the guide block is attached to the upper end of the rotating plate, the sealing block is clamped on the inner side of the upper end of the rotating plate, the limiting structure is arranged on the upper end of the inner part of the rotating plate, the rotating plate is embedded and fixed on the outer side of the rotating rod, the inner side of the guide block is of an arc structure, and the upper end of the limiting structure inclines at an angle of 60 degrees.
As a further improvement of the invention, the limiting structure is provided with an inclined pipe, a clamping plate and three filtering structures, the filtering structures are embedded and fixed at the inner side of the clamping plate, the lower end of the inclined pipe is connected with the upper end of the clamping plate, the clamping plate is arranged at the upper end inside the rotating plate, and the three filtering structures are continuously bent and distributed in parallel.
As a further improvement of the invention, the filtering structure is provided with an elastic structure, a bent plate and four filtering plates, two sides in the middle of the elastic structure are clamped in the filtering plates, the filtering plates are arranged on the inner sides of the bent plate, the bent plate is embedded and fixed on the inner sides of the clamping plates, the elastic structures are distributed along with the bent shape of the bent plate, and gaps exist among the filtering plates.
As a further improvement of the invention, the elastic structure is provided with an elastic plate, a gap plate and a spring, the spring is embedded and fixed on the side surface of the gap plate, the elastic plate is clamped on the side surface of the gap plate, the spring is welded on the inner side of the elastic plate, two sides of the middle of the gap plate are clamped inside the filter plate, the elastic plate is made of aluminum alloy and has the characteristics of strong toughness and easy bending, and the inner side of the elastic plate is in a sealed state.
As a further improvement of the invention, the collecting structure is provided with a rotating pipe, a clamping plate and a blocking structure, wherein the clamping plate is clamped at the inner side of the rotating pipe, the outer side of the blocking structure is in clearance fit with the inner side of the clamping plate, the inner side of the rotating pipe is in clearance fit with the outer side of the sweeping structure, and the inner side of the clamping plate is of an arc structure and can be disengaged from the rotating pipe.
As a further improvement of the invention, the blocking structure is provided with a support plate, a circular rod and a movable structure, the outer side of the support plate is embedded and fixed at the inner side of the movable structure, the inner side of the support plate is clamped at the outer side of the circular rod, the circular rod and the movable structure are positioned on the same central axis, the outer side of the movable structure is in clearance fit with the inner side of the clamping plate, the circular rod is made of aluminum alloy, is of a circular ring structure, and has the characteristics of strong toughness and easy deformation.
As a further improvement of the invention, the movable structure is provided with a movable plate, a rubber block and a sliding ring, the rubber block is attached to the inner side of the sliding ring, the movable plate is embedded and fixed on the inner side of the sliding ring, the outer side of the supporting plate is embedded and fixed on the inner side of the sliding ring, the movable plate is of an arc-shaped structure, and the side surface of the movable plate is provided with a semicircular groove, so that the friction force is enhanced.
Advantageous effects
Compared with the prior art, the invention has the beneficial effects that:
1. the structure is being collected the inboard rotation of structure to the rotary rod drive when the rotor is rotatory, clear up solid impurity, avoid collecting the inside solid impurity of structure and follow the liquid outflow, the rotor plate is whole to be rotated simultaneously, new material emulsion then flows through the filter, solid impurity gets into the elastic structure side, carry out elasticity to the spring under the atress of elastic plate, make the elastic plate move about, thereby solid impurity is blockked in the clearance board side, reach the effect of collecting solid impurity, avoid solid impurity and new material emulsion to mix.
2. Sweep the structure and slide the atress to the inboard solid impurity of collection structure when rotating, make the solid impurity atress get into in the barrier structure, thereby collect solid impurity, thereby the activity structure receives and sweeps the effort of structure after rotatory in the block board is inboard, solid impurity passes through the activity structure simultaneously and gets into the round bar outside, thereby the activity board moves about under the elasticity of block rubber, make solid impurity pass through the slip ring and get into the round bar outside, the solid impurity roll-off has been avoided under the activity of fly leaf, collect the clearance to the solid impurity in the new material emulsion, improve the purity of new material emulsion.
Drawings
Fig. 1 is a schematic structural diagram of an emulsion mixer for preparing a new semiconductor material according to the present invention.
FIG. 2 is a schematic side view of a stirring mechanism according to the present invention.
FIG. 3 is a schematic side view of a cleaning structure according to the present invention.
FIG. 4 is a schematic side view of a position-limiting structure according to the present invention.
FIG. 5 is a partial enlarged view of a filter structure according to the present invention.
Fig. 6 is a schematic side view of an elastic structure according to the present invention.
Fig. 7 is a partial h enlarged structural diagram of a collecting structure according to the present invention.
FIG. 8 is a schematic side view of a barrier structure according to the present invention.
Fig. 9 is a partial m enlarged structure diagram of an active structure according to the present invention.
In the figure: the device comprises a stirring mechanism-1, a rotator-2, a workbench-3, a collecting structure-11, a rotating rod-12, a sweeping structure-13, a guide block-131, a sealing block-132, a rotating plate-133, a limiting structure-134, an inclined tube-a 1, a clamping plate-a 2, a filtering structure-a 3, an elastic structure-a 31, a bending plate-a 32, a filtering plate-a 33, an elastic plate-w 1, a gap plate-w 2, a spring-w 3, a rotating tube-111, a clamping plate-112, a blocking structure-113, a supporting plate-e 1, a circular rod-e 2, a movable structure-e 3, a movable plate-e 31, a rubber block-e 32 and a sliding ring-e 33.
Detailed Description
The technology of the present invention is further described with reference to the accompanying drawings:
example 1:
as shown in fig. 1-6:
the invention relates to an emulsion mixing stirrer for preparing new semiconductor materials, which structurally comprises a stirring mechanism 1, a rotator 2 and a workbench 3, wherein the surface of the lower end of the stirring mechanism 1 is welded at the upper end of the workbench 3, the rotator 2 penetrates through the middle and the inside of the stirring mechanism 1, the lower end of the stirring mechanism 1 is embedded and fixed at the upper end of the workbench 3, the stirring mechanism 1 is provided with a collecting structure 11, a rotating rod 12 and a sweeping structure 13, the sweeping structure 13 is embedded and fixed at the outer side of the rotating rod 12, the inner side of the collecting structure 11 is in clearance fit with the outer side of the sweeping structure 13, the collecting structure 11 and the rotating rod 12 are positioned on the same central axis, the lower end of the outer side of the collecting structure 11 is embedded and fixed at the upper end of the workbench 3, the sweeping structure 13 is provided with four rotating rods, the rotating rod 12 is uniformly surrounded as the center, the collecting structure 11 is divided into an inner layer and an outer layer, and a gap is arranged between the inner layer and the outer layer, make the clearance accelerate thermal transmission, rotary rod 12 drives simultaneously and sweeps structure 13 and is collecting the structure 11 inboard rotatory, clears up solid impurity, avoids collecting the inside solid impurity of structure 11 and follows liquid outflow.
Wherein, sweep structure 13 and be equipped with guide block 131, sealed block 132, rotor plate 133, limit structure 134, guide block 131 laminates in rotor plate 133 upper end, sealed block 132 block is inboard in rotor plate 133 upper end, limit structure 134 is installed in the inside upper end of rotor plate 133, rotor plate 133 inlays and fixes in the rotary rod 12 outside, guide block 131 is inboard to curved structure, limit structure 134 upper end slope 60 degrees, and rotor plate 133 is whole to be rotated to carry out the atress to new material emulsion in the middle of the rotor plate 133, the emulsion filters the screening in limit structure 134 in getting into limit structure 134 under guide of guide block 131 simultaneously.
The limiting structure 134 is provided with an inclined tube a1, a clamping plate a2 and a filtering structure a3, the filtering structure a3 is embedded inside the clamping plate a2, the lower end of the inclined tube a1 is connected to the upper end of the clamping plate a2, the clamping plate a2 is installed at the upper end inside the rotating plate 133, the three filtering structures a3 are of a continuous bending structure and are distributed in parallel, so that new material emulsion enters the clamping plate a2 inside the inclined tube a1, blocking is performed in the filtering structure a3 in the middle inside of the clamping plate a2, and meanwhile, the inclined tube a1 prevents solid impurities from pouring back into the new material emulsion from the clamping plate a 2.
The novel material emulsion filtering device comprises a filtering structure a3, an elastic structure a31, a bent plate a32 and a filtering plate a33, wherein two sides of the middle of the elastic structure a31 are clamped inside a filtering plate a33, the filtering plate a33 is installed on the inner side of the bent plate a32, the bent plate a32 is embedded inside a clamping plate a2, the number of the elastic structures a31 is four, the four elastic structures a31 are distributed along with the bent shape of the bent plate a32, gaps exist among the filtering plates a33, when the solids in the novel material emulsion pass through the elastic structure a31, the solids are clamped on the side face of the elastic structure a31 under the blocking of the filtering plate a33, the novel material emulsion flows out through the filtering plate a33, and solid impurities are prevented from being mixed with the novel material emulsion.
The elastic structure a31 is provided with an elastic plate w1, a gap plate w2 and a spring w3, the spring w3 is embedded in the side surface of the gap plate w2, the elastic plate w1 is clamped in the side surface of the gap plate w2, the spring w3 is welded on the inner side of the elastic plate w1, two sides of the middle of the gap plate w2 are clamped in the filter plate a33, the elastic plate w1 is made of aluminum alloy and has the characteristics of strong toughness and easy bending, the inner side of the elastic plate w1 is in a sealed state, solid impurities enter the side surface of the elastic structure a31, the spring w3 is subjected to elastic force under the elastic plate w1, the elastic plate w1 is moved, and the solid impurities are blocked on the side surface of the gap plate w2, so that the effect of collecting the solid impurities is achieved.
The embodiment has the following specific use modes and functions:
in the invention, the rotator 2 rotates and the rotating rod 12 drives the sweeping structure 13 to rotate at the inner side of the collecting structure 11 to clean solid impurities, so that the solid impurities in the collecting structure 11 are prevented from flowing out along with liquid, meanwhile, the rotating plate 133 integrally rotates, so that new material emulsion is stressed in the middle of the rotating plate 133, the emulsion enters the limiting structure 134 under the guidance of the guide block 131, the emulsion is filtered and screened in the limiting structure 134, so that the new material emulsion enters the clamping plate a2 in the inclined tube a1, the filtering structure a3 in the middle of the clamping plate a2 is blocked, meanwhile, the inclined tube a1 prevents the solid impurities from pouring back into the new material emulsion from the clamping plate a2, the solids in the new material emulsion pass through the elastic structure a31 and are clamped at the side surface of the elastic structure a31 under the blocking of the filter plate a33, and the new material emulsion flows out through the filter plate a33, solid impurities enter the side face of the elastic structure a31, the spring w3 is subjected to elastic force under the stress of the elastic plate w1, the elastic plate w1 moves, and therefore the solid impurities are blocked on the side face of the gap plate w2, the effect of collecting the solid impurities is achieved, and the solid impurities are prevented from being mixed with new material emulsion.
Example 2:
as shown in fig. 7-9:
the collecting structure 11 is provided with a rotating pipe 111, a clamping plate 112 and a blocking structure 113, the clamping plate 112 is clamped on the inner side of the rotating pipe 111, the outer side of the blocking structure 113 is in clearance fit with the inner side of the clamping plate 112, the inner side of the rotating pipe 111 is in clearance fit with the outer side of the sweeping structure 13, the inner side of the clamping plate 112 is of an arc structure and can be separated from the rotating pipe 111, and the sweeping structure 13 is used for sliding and stressing solid impurities on the inner side of the collecting structure 11, so that the solid impurities are stressed into the blocking structure 113, and the solid impurities are collected.
Wherein, block structure 113 and be equipped with backup pad e1, circular pole e2, mobile structure e3, the backup pad e1 outside is inlayed admittedly at mobile structure e3 inboard, the inboard block of backup pad e1 is in the circular pole e2 outside, circular pole e2 and mobile structure e3 are located same central axis, mobile structure e3 outside and the inboard clearance fit of block plate 112, circular pole e2 is the aluminum alloy material, and is the circular ring shape structure, has strong toughness, the characteristic of easy deformation to mobile structure e3 receives to sweep behind the effort of structure 13 and rotates in block plate 112 inboard, and solid impurity gets into the circular pole e2 outside through mobile structure e3 simultaneously, block between circular pole e 2.
The movable structure e3 is provided with a movable plate e31, a rubber block e32 and a sliding ring e33, the rubber block e32 is attached to the inner side of the sliding ring e33, the movable plate e31 is embedded in the inner side of the sliding ring e33, the outer side of the supporting plate e1 is embedded in the inner side of the sliding ring e33, the movable plate e31 is of an arc-shaped structure, the side face of the movable plate e31 is provided with a semicircular groove, the friction force is enhanced, solid impurities are extruded on the movable plate e31 under the action force of the sweeping structure 13, the movable plate e31 moves under the elastic force of the rubber block e32, the solid impurities enter the outer side of the circular rod e2 through the sliding ring e33, and the solid impurities are prevented from sliding out under the movement of the movable plate e 31.
The embodiment has the following specific use modes and functions:
in the invention, when the sweeping structure 13 rotates, the solid impurities on the inner side of the collecting structure 11 are subjected to sliding stress, so that the solid impurities are forced to enter the blocking structure 113, and then the solid impurities are collected, so that the movable structure e3 rotates on the inner side of the clamping plate 112 after being subjected to the acting force of the sweeping structure 13, meanwhile, the solid impurities enter the outer side of the circular rod e2 through the movable structure e3 and are clamped between the circular rods e2, the solid impurities extrude the movable plate e31 under the acting force of the sweeping structure 13, so that the movable plate e31 moves under the elastic force of the rubber block e32, the solid impurities enter the outer side of the circular rod e2 through the sliding ring e33, the solid impurities are prevented from sliding out under the action of the movable plate e31, the solid impurities in the new material emulsion are collected and cleaned, and the purity of the new material emulsion is improved.
The technical scheme of the invention is utilized, or a similar technical scheme is designed by a person skilled in the art based on the inspiration of the technical scheme of the invention, so that the technical effects are achieved, and the technical scheme and the method fall into the protection scope of the invention.
Claims (8)
1. The utility model provides a new material of semiconductor preparation is with emulsion mixing agitator, its structure includes rabbling mechanism (1), rotates ware (2), workstation (3), the welding of rabbling mechanism (1) lower extreme surface is in workstation (3) upper end, it runs through inside in the middle of rabbling mechanism (1) to rotate ware (2), rabbling mechanism (1) lower extreme inlays solid in workstation (3) upper end, its characterized in that:
rabbling mechanism (1) is equipped with collects structure (11), rotary rod (12), sweeps structure (13), sweep structure (13) and inlay in the rotary rod (12) outside, collect structure (11) inboard and sweep structure (13) outside clearance fit, it is located same center axis with rotary rod (12) to collect structure (11), it inlays admittedly in workstation (3) upper end to collect structure (11) outside lower extreme.
2. The emulsion mixing agitator for preparing new semiconductor material according to claim 1, wherein: sweep structure (13) and be equipped with guide block (131), sealed piece (132), rotor plate (133), limit structure (134), the laminating of guide block (131) is in rotor plate (133) upper end, sealed piece (132) block is inboard in rotor plate (133) upper end, limit structure (134) are installed in the inside upper end of rotor plate (133), rotor plate (133) are inlayed and are fixed in the rotary rod (12) outside.
3. The emulsion mixing agitator for preparing new semiconductor material according to claim 2, wherein: the limiting structure (134) is provided with an inclined pipe (a1), a clamping plate (a2) and a filtering structure (a3), the filtering structure (a3) is embedded in the clamping plate (a2), the lower end of the inclined pipe (a1) is connected to the upper end of the clamping plate (a2), and the clamping plate (a2) is installed at the upper end of the inside of the rotating plate (133).
4. The emulsion mixing agitator for preparing new semiconductor material according to claim 3, wherein: the filter structure (a3) is provided with an elastic structure (a31), a bent plate (a32) and a filter plate (a33), two sides of the middle of the elastic structure (a31) are clamped inside the filter plate (a33), the filter plate (a33) is installed on the inner side of the bent plate (a32), and the bent plate (a32) is embedded inside the clamping plate (a 2).
5. The emulsion mixing agitator for preparing new semiconductor material according to claim 4, wherein: the elastic structure (a31) is provided with an elastic plate (w1), a gap plate (w2) and a spring (w3), the spring (w3) is embedded in the side face of the gap plate (w2), the elastic plate (w1) is clamped in the side face of the gap plate (w2), the spring (w3) is welded on the inner side of the elastic plate (w1), and two sides of the middle of the gap plate (w2) are clamped in the filter plate (a 33).
6. The emulsion mixing agitator for preparing new semiconductor material according to claim 1, wherein: the collecting structure (11) is provided with a rotating pipe (111), a clamping plate (112) and a blocking structure (113), the clamping plate (112) is clamped on the inner side of the rotating pipe (111), the outer side of the blocking structure (113) is in clearance fit with the inner side of the clamping plate (112), and the inner side of the rotating pipe (111) is in clearance fit with the outer side of the sweeping structure (13).
7. The emulsion mixing agitator for preparing new semiconductor material according to claim 6, wherein: the blocking structure (113) is provided with a supporting plate (e1), a round rod (e2) and a movable structure (e3), the outer side of the supporting plate (e1) is embedded and fixed on the inner side of the movable structure (e3), the inner side of the supporting plate (e1) is clamped on the outer side of the round rod (e2), the round rod (e2) and the movable structure (e3) are located on the same central axis, and the outer side of the movable structure (e3) is in clearance fit with the inner side of the clamping plate (112).
8. The emulsion mixing agitator for preparing new semiconductor material according to claim 7, wherein: the movable structure (e3) is provided with a movable plate (e31), a rubber block (e32) and a sliding ring (e33), the rubber block (e32) is attached to the inner side of the sliding ring (e33), the movable plate (e31) is embedded and fixed on the inner side of the sliding ring (e33), and the outer side of the supporting plate (e1) is embedded and fixed on the inner side of the sliding ring (e 33).
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110468523.9A CN113262665B (en) | 2021-04-28 | 2021-04-28 | Emulsion mixing stirrer for preparing new semiconductor material |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110468523.9A CN113262665B (en) | 2021-04-28 | 2021-04-28 | Emulsion mixing stirrer for preparing new semiconductor material |
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| CN113262665A true CN113262665A (en) | 2021-08-17 |
| CN113262665B CN113262665B (en) | 2022-05-13 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115025668A (en) * | 2022-06-15 | 2022-09-09 | 黑龙江省八达路桥建设有限公司 | High-speed asphalt stirring device capable of moving through guide rail |
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| US20050103030A1 (en) * | 2003-11-13 | 2005-05-19 | Elcor S. R. L. | Machine for producing granita and similar beverages |
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