CN113253370A - Anti-dazzle wide-angle wide-wavelength scattering reduction film - Google Patents
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Abstract
The invention discloses an anti-glare wide-angle and wide-wavelength scattering reduction film which comprises a substrate and a dielectric multilayer film arranged on the substrate. The substrate is hard glass, and a rough microstructure is manufactured on the coating surface of the substrate. The multilayer scattering reduction film consists of a wide-angle admittance matching layer and a wide-wavelength admittance extension layer, wherein the wide-angle admittance matching layer consists of a second highest refractive index Ta2O5Film and intermediate refractive index Al2O3The two films are alternately formed, and the wide wavelength admittance extension layer is made of high-refractive-index TiO2Film, sub-high refractive index Ta2O5Film, intermediate refractive index Al2O3Film and low refractive index SiO2The membrane consists of four films. The scattering reduction film adopts strong ion beam auxiliary bombardment and high substrate temperature in the plating process. The diffusion reducing film is introduced into the airThe range of the angle of incidence can reach 0-70 degrees, the wavelength width can reach 450-650 nm, and the wide-angle wide-wavelength anti-dazzle effect is excellent.
Description
Technical Field
The invention relates to an anti-glare wide-angle and wide-wavelength scattering reduction film, which can effectively eliminate glare of a display panel under a strong light background and improve the image contrast and definition of the display panel, and belongs to the technical field of thin film optics.
Background
Mobile phones, cameras, computers, various vehicle-mounted and onboard head-up display systems and navigation instruments and the like are often used under a strong light background such as sunlight, and at the moment, the observation of human eyes is bound to be disturbed by dazzling strong light, and the dazzling background interference strong light is often called Glare (Glare). The harmfulness of glare is very large, if the harmfulness is very large, the contrast and the definition of display information are reduced, and if the harmfulness is very large, the displayed content cannot be seen clearly at all; even more, the strong light irritating eyes can make the eyes of people tired and even hurt the eyes of people. Because of this, the companies such as apple and Huashi, which have the function of guiding the wind vane at home and abroad, have taken lead to the first attempt to introduce the anti-glare technology into the display panel of mobile phones, computers, etc., which is an innovation of the display panel with foresight!
The mechanism of generation of glare is not complicated, and the fundamental reason is caused by strong reflection, diffuse reflection and scattering of background interference glare on the surface of the display panel, particularly reflected light, which is considered as the most dazzling glare. Based on the knowledge, the surface treatment of the display panel is directly proposed at present to form an uneven rough microstructure on the surface of the panel, so that strong interference light of the background is scattered instead of being directly reflected to enter human eyes for observation, and the effect of slowly releasing glare is achieved; then the interference effect based on the optical film is utilized to reduce the reflection or scattering of the surface of the panel to below 1 percent, thereby greatly reducing the glare caused by reflection or scattering and generating a satisfactory anti-dazzle effect.
Unfortunately, the introduction of anti-glare technology has entailed the problem of a broad angular width wavelength of an anti-reflection film or a scattering reduction film. Although antireflection films are ubiquitous in various optical, optoelectronic and laser instruments today! However, these antireflection films are designed by optimization of the system, and generally can limit the incident angle of light in air to be small enough, for example, within 20 ° or 30 °. Obviously, this is not feasible in an antiglare system because the background interfering glare light comes randomly from all directions, and although it is almost impossible to say that glancing incidence at an angle of incidence greater than 80 ° in air is a natural case at angles of incidence from 0 ° up to 70 ° and even up to 80 ° in air, which is a wide angle requirement for antiglare. The requirement of wide angle can cause difficulty of wide wavelength, the existing antireflection film with small incident angle has no difficulty in realizing wide wavelength antireflection of visible light 300nm in principle, but the wavelength width can only reach several nm to dozens of nm under the condition of wide angle of 0-70 degrees, and even can hardly reach 100 nm. Obviously, this is far from sufficient in the anti-glare system, because the background interference strong light is visible light, even if the wavelengths which are relatively small to stimulate human eyes by removing the two ends of the visible light, the remaining wavelength region 450nm to 650nm still has the width of 200nm, which is the wide wavelength requirement of anti-glare.
The invention mainly aims to realize an anti-reflection film or a scattering reduction film with wide angle and wide wavelength of an anti-dazzle display panel.
Disclosure of Invention
The invention aims to provide an anti-glare wide-angle and wide-wavelength anti-scattering film (namely an anti-glare wide-angle and wide-wavelength anti-reflection film or anti-scattering film) so as to effectively inhibit glare of a display panel under a strong light background and improve the image contrast and definition of the display panel, which has important practical significance on a display system used under the strong light background.
The concept of the present invention is as follows.
The method is mainly implemented in two steps, wherein in the first step, an uneven rough microstructure is constructed on the surface of the hard optical glass, and the reflection of background interference strong light is changed into scattering, namely, strong directional reflection glare is converted into scattered scattering glare, so that dazzling glare strong light is relieved; and secondly, manufacturing an antireflection film or a scattering reduction film with wide angle and wide wavelength on the rough microstructure surface of the glass substrate, so as to basically achieve the purpose of inhibiting reflection or scattering glare. It should be noted that, if the parameters of the microstructure can be reasonably selected, the strong background interference light can generate complete scattering on the surface of the microstructure, and does not contain reflected light or diffuse reflected light, which means that the microstructure has completely converted the incident light into scattered light, and the function of the antireflection film has been completely changed into the scattering reduction film in practice, so the antireflection film on the surface of the microstructure is referred to as the scattering reduction film in the following.
Specific concepts are described below.
First, a rough microstructured surface is constructed.
And (3) constructing a microstructure with a rough surface on the surface of the hard optical glass by adopting an optical cold-processing rough grinding method. The size of the microstructure depends mainly on the size of the diamond grains, that is, different sizes of microstructures can be conveniently obtained by adjusting the thickness of the diamond grains. The average diameter and average depth of the microstructure can be measured by means of a surface profiler or the like, and the obtained microstructure parameters can be used for analyzing the scattering properties of the microstructure.
Description of surface scattering there are often two very important microstructural parameters: surface root mean square roughness σ and correlation length
σ represents the degree of irregularity of the rough surface from the average plane (or average height) in the vertical direction, which largely characterizes the scattering magnitude of the rough surface. The larger σ, the larger the undulation of the surface, the larger the scattering; conversely, the smaller σ, the smoother the surface, and the smaller the scattering. Correlation length
Which represents the average spacing of the irregular peaks of the rough surface in the horizontal direction, is not only related to the magnitude of the scattering, but also determines the angular distribution of the scattered light. When in use
When the temperature of the water is higher than the set temperature,
the larger the size, the more sparse the surface irregularity peaks are, and the scattered light is mainly concentrated near the reflected light to generate diffuse reflection; with following
The gradual decrease shows that the irregular peaks are fluctuated and dense, and the scattered light is distributed in a larger solid angle, so that the complete scattering is generated.
For a single rough microstructured surface, the statistical parameters root mean square roughness σ and correlation length can be used if it is characterized
Meaning that the reflected scattered light S can be derived from the kirchhoff diffraction integral by means of scalar theory when the light is incident perpendicularly on the rough surfaceRComprises the following steps:
wherein R is0Is the reflectance of the surface when the surface is an ideal optical surface. According to the formula (1): scattering and root mean square roughness σ of rough surfaces, correlation length
The relation with the wavelength lambda is a square factor; a and
increasing, scattering increases, while wavelength λ increases, scattering decreases; the same sum of
Value, σ contributes more to scattering than
Large; in the visible region, a sum of sub-micron
The reflection can be basically converted into scattering, and considering that a scattering reduction film with wide angle and wide wavelength is designed on the surface of the microstructure and has more film layers and thicker film layer thickness, in order to ensure stable and complete scattering and obtain a high-quality continuous multilayer film on a rough surface, the invention is favorable for properly increasing microstructure parameters, so micron-sized or neglected-sized microstructure parameters are selected: the average diameter of the microstructure is 9-15 micrometers, and the related length is obtained from the graph 1
Micron size; the average depth of the microstructure is 3 to 5 micrometers, and from fig. 1, if a rough surface is simulated by approximation with a sine curve, the root mean square roughness is 1.1 to 1.77 micrometers. For the micro-structure of silk level or near silk level, the invention is not adopted because the relevant length is too large and the diffuse reflection is easy to generate.
The single microstructure surface becomes a multi-interface after being coated with a plurality of layers of scattering reduction films, and the analysis of multi-interface scattering is much more complicated than that of a single surface. According to the correlation of roughness between the interfaces of the films, three different calculation models can be provided: non-correlated, partially correlated, and fully correlated. The invention can ensure that the film does not generate extra roughness when growing by selecting reasonable microstructure parameters, selecting the number of layers as small as possible and the film thickness as thin as possible, and selecting strong ion assistance and a high substrate temperature process, so that the film conforms to a completely relevant surface roughness model as much as possible, namely the surface of each film can completely and topologically copy the roughness of the substrate microstructure (as shown in figure 2), and thus the multi-interface scattering can be approximately represented by single-surface scattering.
Secondly, designing a wide-angle and wide-wavelength scattering reduction film.
As can be understood from equation (1), antireflection and backscatter are in fact very similar, being antireflection for smooth ideal optical surfaces, backscatter for rough surfaces, or both antireflection and backscatter are required in the case of diffuse reflection. It will further be appreciated that although equation (1) is derived for normal incidence, it is readily possible to generalize normal incidence scattering to high incidence scattering with reference to the existing reflection equation for high incidence.
To design a wide-angle, wide-wavelength dispersion-reducing film, it is first necessary to know what will happen when the angle of incidence is increased. In short, for a medium with refractive index n and physical thickness d, two main problems occur when the incident angle increases: 1) the refractive index n of the film or substrate medium is separated for light in different vibration directions, and therefore the refractive index is expressed by the modified admittance η, where ηsModified admittance, eta, of s-polarized light representing vertical vibrationpThe modified admittances of p-polarized light representing parallel oscillations, as a function of the angle of refraction θ of the light in the medium, are: etas＝n cosθ，ηpN/cos θ. Since the angle of refraction increases with increasing angle of incidence, the larger the angle of incidence, ηsAnd ηpThe larger the separation, this results in the pair etas、ηpMeanwhile, admittance matching is extremely difficult to realize, and the larger the incident angle is, the harder the matching is, which is a difficult problem inevitably faced by 'wide angle'. 2) The phase thickness δ of the film becomes thin, and since cos θ in δ ═ 2 π ndcos θ/λ decreases with increasing refraction angle θ, the smaller the phase thickness δ of the film the larger the incidence angle, the more the characteristic spectral curve of the film shifts to short wavelengths, that is, it is impossible to realize excellent film characteristics over a wide wavelength at a wide angle, and the "wide angle" entails a confusion of "wide wavelength". The two problems described above are the fundamental principle of the incident angle acting on a single medium, and the problem is further complicated for multiple media. Therefore, in order to increase the comparability of various media, the invention provides a concept of 'normalization correction admittance', namely, the correction admittance of the high-refractive-index film, the second-high-refractive-index film, the middle-refractive-index film and the low-refractive-index film, the substrate and the incident medium air is uniformly divided by cos theta0Wherein, theta0Is the angle of incidence of the light in air, the normalized modified admittance can then be simply expressed as: etas＝n cosθ/cosθ0，ηp＝n cosθ0The/[ theta ] is calculated. When the high refractive index film, the second highest refractive index film, the intermediate refractive index film, and the low refractive index film of the present invention are approximately replaced with n of 2.5, 2.0, 1.52, and 1.38, respectively, the relationship between the normalized correction admittance calculated and the incident angle in air is shown in fig. 3. In fig. 3, since a glass having a refractive index n of 1.52 is often used as a substrate, a set of η having n of 1.52s、ηpThe curve can be used as normalized modified admittance reference of the substrate and the intermediate refractive index film at the same time; and n-1.0 is the normalized modified admittance curve of the incident medium air.
From fig. 3 it can be analyzed that: 1) all dielectric materials, except air where n is 1.0, do not produce normalized modified admittance separation, the normalized modified admittance of both polarizations will be separated as the angle of incidence increases, and the larger the angle of incidence, the greater the separation, which is a fundamental difficulty in designing high angle incidence film systems, and an inherent, unchangeable property. 2) The normalized modified admittance of s-polarized light and p-polarized light increases or decreases with increasing angle of incidence, meaning that the reflection or scattering of s-polarized light increases with increasing angle and the reflection or scattering of p-polarized light decreases with increasing angle, which is the brewster angle (brewster angle for short, θ) when the medium normalized modified admittance curve intersects the n-1 curveB) The reflection or scattering of p-polarized light equals zero at the spread angle, that is, all light from s-polarized light is reflected or scattered when the angle of incidence is at the spread angle of a medium. 3) For the 4 dielectric films and substrates of the present invention, the angle of lay was around 60 °. For a high refractive index film with n 2.5, the cloth angle is 68 °, and the normalized modified admittance of the corresponding s-polarized light rises very much, so that the reflection or scattering of the s-polarized light is very large, which is a disadvantage of the high refractive index film and is also a main reason why the use of the high refractive index film is not preferable when designing a wide-angle antireflection or scattering reduction film. For a low refractive index film with n being 1.38, the angle is about 54 °, and the return modified admittance of the corresponding s-polarized light is still low, so the reflection or scattering of the s-polarized light is small, which is an advantage of the low refractive index film, and this means that the low refractive index film should be selected as low as possible when designing a wide-angle antireflection or scattering reduction filmThe lower the index of refraction of the low index film, the better the anti-reflection or anti-scattering properties, unfortunately, the less and less are truly useful low index dielectric films with a higher index of refraction. On the other hand, however, the angle of refraction in the high refractive index film is significantly smaller than that in the low refractive index film for the same incident angle in air, which is an advantage of the high refractive index film over the low refractive index film, indicating that the high refractive index film is very useful for suppressing wavelength drift or realizing a wide wavelength characteristic. 4) When the spread angle is larger than 54 ° and smaller than 70 °, the reflection or scattering reduction is mainly performed for s-polarized light because the reflection or scattering of p-polarized light is small for all media, and the normalized modified admittance of s-polarized light is large, i.e., the reflection or scattering is large. In this large angle of incidence region, the refractive index of the antireflection or backscatter film must be greater than that of the substrate, which can overwhelm the amplitude conditions for antireflection in thin film optics: the refractive index of the antireflection film is equal to the square of the product of the refractive indices of the incident medium and the substrate, i.e., the refractive index of the antireflection film must be smaller than the refractive index of the substrate. Accordingly, the present invention intentionally introduces films of sub-high and intermediate refractive indices to satisfy the condition that the refractive index of the film is greater than that of the substrate at large angles of incidence. 5) η of s-polarized light for high refractive index (H) and low refractive index (L) filmss H/ηs LThe ratio of which increases with increasing angle of incidence, and eta for p-polarized lightp H/ηp LThe ratio of the two bands decreases with increasing incidence angle, which means that the bandwidth of the reflection reduction or scattering reduction is very different for two polarized lights, and the larger the incidence angle is, the larger the bandwidth difference is, which is also one of the obstacles for realizing "wide wavelength". The five points are the basis for constructing the wide-angle and wide-wavelength scattering reduction film, and the invention only proposes to adopt four thin film materials based on the five points.
The four thin film materials of the wide-angle and wide-wavelength scattering reduction film comprise titanium dioxide (TiO) with high refractive index2) Film, tantalum pentoxide (Ta) of next highest refractive index2O5) Film, intermediate refractive index aluminum oxide (Al)2O3) Film and low refractive index silicon dioxide (SiO)2) And (3) a membrane. High foldRefractive index film TiO2A refractive index of 2.44 at a central wavelength of 550nm, and a second highest refractive index film Ta2O5A refractive index of 2.11 at a central wavelength of 550nm, and an intermediate refractive index film Al2O3A refractive index of 1.62 at a central wavelength of 550nm, and a low refractive index film of SiO2The refractive index at a central wavelength of 550nm was 1.46. The wide-angle wide-wavelength scattering reduction film comprises a wide-angle admittance matching layer and a wide-wavelength admittance extension layer, wherein the wide-angle admittance matching layer comprises 2-10 layers, the first preferable layer of the embodiment of the invention is 8 layers, and the first preferable layer is a second high-refractive-index film Ta with the refractive index higher than that of the substrate from the substrate to the outside in sequence2O5And an intermediate refractive index film Al2O3The alternate composition is adopted so as to improve the combined admittance of the substrate and the film and realize better admittance matching of the s-polarized light in a large incidence angle area, thereby realizing the purpose of wide angle; the wide wavelength admittance extension layer is 18-25 layers, and the first preferred layer in the embodiment of the invention is 19 layers, and the 19 layers of the film simultaneously comprise TiO with high refractive index2Film, Ta of next highest refractive index2O5Film, intermediate refractive index Al2O3Film and low refractive index SiO2The membrane is four thin membranes, aiming at realizing the requirement of 'wide wavelength' by means of different materials to disperse the angle and expand the range of admittance. For example, if only high refractive index TiO is taken2Film and low refractive index SiO2Two materials of film, TiO due to high refractive index2The refractive index of the film was 2.44 and the angle spread was close to 68 deg., at which time the TiO film was TiO2The normalized modified admittance of the s-polarized light of the film reaches 6.2, while the normalized modified admittance of the p-polarized light is only 1, the polarization separation is very large, a reflection or scattering high point is formed, the high point is continuously overlapped due to a single material, and finally the difficulty of 'wide wavelength' is difficult to break through, after the four materials are selected, the angle distribution is dispersed, the rapidly-rising normalized modified admittance of the s-polarized light is staggered, and finally the normalized modified admittance of the s-polarized light meets the requirements on 'wide wavelength' and balance.
In order to achieve the purpose, the invention adopts the following specific technical scheme:
an anti-glare wide-angle wide-wavelength anti-scatter film includes a substrate and a dielectric multilayer film disposed on the substrate. The substrate is hard optical glass, and a rough microstructure is manufactured on the film coating surface of the dielectric multilayer film of the substrate. The dielectric multilayer film is composed of a wide-angle admittance matching layer and a wide-wavelength admittance extension layer which are sequentially arranged on a substrate. The wide-angle admittance matching layer and the wide wavelength admittance extension layer jointly contribute to form the wide-angle and wide-wavelength scattering reduction film.
The dielectric multilayer film adopts titanium dioxide TiO with high refractive index2Film, sub-high refractive index tantalum pentoxide Ta2O5Film, intermediate refractive index aluminum sesquioxide Al2O3Film, low refractive index silica SiO2Film, low refractive index MgF2At least two of the membranes.
The wide-angle admittance matching layer is composed of Ta with second highest refractive index2O5Film and intermediate refractive index Al2O3The two membranes are alternately formed;
the wide wavelength admittance extension layer is made of TiO with high refractive index2Film, Ta of next highest refractive index2O5Film, intermediate refractive index Al2O3Film and low refractive index SiO2The four films together or consist of high refractive index TiO2Film, Ta of next highest refractive index2O5Film, intermediate refractive index Al2O3Film and low refractive index MgF2Membranes four membranes are composed together.
Further, the refractive index of the hard optical glass is 1.45 to 1.65.
Further, on the multilayer film coating surface of the hard optical glass substrate, the average diameter of the microstructure is 9-15 micrometers, and the average depth of the microstructure is 3-5 micrometers.
Furthermore, the total number of the film layers of the scattering reduction film is 20-35, and 27 layers are preferred in the invention.
Further, high refractive index film TiO2A refractive index of 2.44 at a central wavelength of 550nm, and a second highest refractive index film Ta2O5A refractive index of 2.11 at a central wavelength of 550nm, and an intermediate refractive index film Al2O3In whichA refractive index of 1.62 at a core wavelength of 550nm, and a low refractive index film of SiO2The refractive index at a central wavelength of 550nm was 1.46.
Further, the number of the film layers of the wide-angle admittance matching layer is 2-10; the number of the film layers of the wide wavelength admittance extension layer is 18-25, wherein, the TiO with high refractive index2Film of 1-4 layers of Ta with next highest refractive index2O55-9 layers of film and Al with intermediate refractive index2O3The film is 4-5 layers of SiO with low refractive index2The film comprises 6-8 layers.
Further, the dielectric multilayer film (i.e. high refractive index TiO)2Film, Ta of next highest refractive index2O5Film, intermediate refractive index Al2O3Film and low refractive index SiO2Film) is bombarded with the aid of strong ion beams in the plating process, wherein the beam pressure of the ion beams is 900-1100V, and the beam current is 900-1100 mA.
Further, the dielectric multilayer film is coated (namely, TiO with high refractive index2Film, Ta of next highest refractive index2O5Film, intermediate refractive index Al2O3Film and low refractive index SiO2Film) is heated to 250 to 300 ℃.
Furthermore, the incidence angle range of the scattering reduction film in the air can reach 0-70 degrees, the scattering reduction wavelength range can reach 450-650 nm, and the wide-angle wide-wavelength anti-dazzle effect is very excellent.
Compared with the prior art, the invention has the beneficial effects that:
heretofore, various types of rough microstructured surfaces have been known in the art, but such microstructured surfaces have been limited primarily to antiglare, light-equalizing, and privacy applications on architectural glass. The display panels of the prior mobile phones, computers and the like do not adopt any anti-dazzle measures, not to mention the scattering reduction films with wide angles and wide wavelengths. However, these display systems are often used under strong ambient light such as sunlight, which results in that the contrast and definition of the information displayed on the panel are reduced, and the display content on the panel is not clearly seen; even more, the strong light dazzling makes the eyes tired and even the eyes are damaged. Obviously, the introduction of anti-glare technology into display panels of mobile phones, computers and the like is imperative, and the introduction of anti-glare technology is certainly becoming an important advance that display panels have foresight!
The invention considers that when the anti-dazzle technology is introduced into display systems of mobile phones, computers and the like, an anti-reflection or scattering reduction film of the anti-reflection or scattering reduction film inevitably encounters the difficult problem of wide angle and wide wavelength, because strong interference light of the background always randomly comes from all directions, the strong interference light cannot be limited in a smaller angle range, the visible light spectrum generating glare is wider, and the covering of the whole visible light region is not feasible at present, so the invention develops special research on the problem, and finally realizes the anti-dazzle light scattering reduction film with wide angle in the incident angle range of 0-70 degrees and wide wavelength in the wavelength region of 450-650 nm in the air by arranging the wide-angle admittance matching layer consisting of two thin film materials and the wide-wavelength admittance expansion layer consisting of four thin film materials on the surface of the microstructure of the hard optical glass. The method not only can obviously improve the contrast and the definition of the display information and solve the trouble that the display content cannot be seen clearly, but also can avoid dazzling strong light and prevent human eyes from being damaged by the interference strong light.
Drawings
FIG. 1 is a schematic representation of the rough microstructure of the substrate surface and its parameters of the present invention.
FIG. 2 is an illustration of a topological replication of the surface microstructure of a multilayer film of the media.
FIG. 3 is a normalized modified admittance versus angle of incidence in air for wide angle incidence of the present invention.
FIG. 4 is a graph of the refractive index versus physical thickness of each layer of an embodiment of the present invention.
Fig. 5 is a plot of scattering versus wavelength for various angles of incidence of an embodiment of the present invention, in fig. 5-for s-polarized light, -for p-polarized light, and-for an average value.
Fig. 6 is a plot of scattering versus wavelength calculated for a microstructure on a substrate having a refractive index of 1.52 according to the present invention, in fig. 6, -for s-polarized light, -for p-polarized light, -for an average value.
FIG. 7 is a graph of the refractive index versus physical thickness for each of the two films of example two of the present invention.
Fig. 8 is a plot of scattering versus wavelength for various angles of incidence, in fig. 8, -for s-polarized light, -for p-polarized light, and-for an average value, for an embodiment of the present invention.
Detailed Description
FIG. 1 is a schematic representation of the rough microstructure of the substrate surface and its parameters of the present invention. Definition of the microstructure parameters: the correlation length represents the average pitch of the irregular peaks of the rough surface in the horizontal direction, so that it can be seen that the average diameter of the microstructure is equal to the correlation length; the depth of the microstructure, i.e. the height from the valley to the bottom of the peak, characterizes the surface roughness of the microstructure, which, as can be seen from fig. 1, represents the degree of irregularity in the vertical direction from the mean plane (or mean height) and which characterizes to a large extent the scattering magnitude of the rough surface. Although the surface roughness can also be expressed in terms of arithmetic mean roughness, the root mean square roughness σ is statistically more significant than the arithmetic mean roughness. The root mean square roughness σ is the square of each deviation from the mean plane, and then the squared values are summed and averaged and squared. The larger σ, the larger the undulation of the surface, the larger the scattering; conversely, the smaller σ, the smoother the surface, and the smaller the scattering. According to root mean square roughness σ and correlation length
The magnitude of the reflected scatter is easily evaluated and calculated by the foregoing formula (1).
FIG. 2 is an illustration of a topological replication of the surface microstructure of a multilayer film of the media. As shown in fig. 2, 2 is a hard optical glass substrate, wherein the lower surface 1 is a phosphor layer for displaying image information, and the upper surface 3 is a rough microstructure surface; then, a wide-angle and wide-wavelength medium scattering reduction film 4, 5 is plated on the microstructure surface 3 to form the outermost microstructure surface. The invention requires that the outermost microstructure surface 5 is capable of replicating the microstructure of the upper surface 3 of the glass substrate in a complete topology, which simplifies the scattering calculation and evaluation of the microstructure, and approximately characterizes the multiple layers of the complex multilayer film by simple single surface scatteringSurface scattering. For this purpose, it is necessary to ensure that the microstructure of the substrate surface is topologically well replicated onto the individual film interfaces, and in addition to a rational selection of the microstructure parameters of the substrate surface, it is also necessary to ensure that the film thickness of the multilayer film is as thin as possible and the number of layers is as small as possible. For the design of the invention, the microstructure parameters of the substrate surface are selected as follows: the average diameter of the microstructures is 9-15 micrometers, preferably 12 micrometers, and the average depth of the microstructures is 3-5 micrometers, preferably 4 micrometers. That is, the correlation length of the microstructure
9-15 microns, preferably 12 microns, and a root mean square roughness σ of 1.1-1.77 microns, preferably 1.41 microns. The total number of layers of the dielectric light scattering reduction film 4 was 27, and the total thickness was 1.243 μm. The ratio of total thickness to average diameter is about 10% and the ratio of total thickness to average depth is about 31% compared to the microstructure parameters. Obviously, in order to meet the requirements of wide angle and wide wavelength, although the number of layers of the scattering reduction film is larger and the thickness of the scattering reduction film is thicker, the ratio of the total film thickness to the microstructure parameters is still low, and the topological replication of the surface microstructure is beneficial. Furthermore, to prevent the introduction of additional roughness when growing thin films, the present invention proposes the use of strong ion beam assisted and high substrate temperature deposition. The multiple actions ensure that the fully relevant surface microstructure characteristics of the multilayer film are ultimately obtained.
FIG. 3 is a normalized modified admittance versus angle of incidence in air for wide angle incidence of the present invention. Fig. 3 is very important for the invention or is an important basis for the following embodiments, but since the details have been discussed in the second point of the description of the above specific concepts, they will not be described in detail here.
Example one
As a first example, the invention selects TiO2、Ta2O5、Al2O3And SiO2The wide-angle wide-wavelength scattering reduction film is designed by four oxide hard films, and the four oxide hard films have excellent optical and mechanical properties. From the optical performance, the refractive index distribution of the material satisfies the conditions of high refractive index, next high refractive index,Intermediate and low refractive indices and a relatively uniform distribution, in particular SiO2Film, which is the only hard oxide film with a refractive index below 1.52. The films are very strong from the mechanical point of view, TiO2、Ta2O5、Al2O3And SiO2The Knoop hardness of the four hard films respectively reaches 8800N/mm2、7400N/mm2、21000N/mm2And 7800N/mm2Knoop hardness of 1200N/mm with a conventional aluminum (Al) film2Compared with the prior art, the Al content is increased by at least 6 times, wherein the Al content is2O3An increase of about 17 times.
The specific implementation steps are as follows:
1) making a rough microstructure on the coated surface of a common hard optical glass substrate with the refractive index of 1.52. Specifically, diamond dust with the Chinese brand number of W14 is adopted, and an optical cold-processing coarse grinding process is adopted, so that the surface of the glass substrate generates the microstructure required by the invention. The microstructure parameters were tested with a surface profiler, and the obtained microstructure parameters were: the average diameter of the microstructures is 9-15 micrometers, and preferably 12 micrometers; the average depth of the microstructures is 3 to 5 micrometers, preferably 4 micrometers.
2) A wide angle wide wavelength backscatter film was constructed on the microstructured surface using commercial TFcal film design software. Designing four hard film materials TiO with reference wavelength of 520nm2、Ta2O5、Al2O3And SiO2The refractive indices at a central wavelength of 550nm were 2.44, 2.11, 1.62 and 1.46, respectively. The wide-angle and wide-wavelength scattering reduction film in the first embodiment of the present invention is composed of two parts, i.e., a wide-angle admittance matching layer and a wide-wavelength admittance extension layer, and specifically, as shown in a relationship diagram between refractive index and physical thickness of each layer of film in fig. 4, the designed total number of layers is 27, and the total thickness is 1.243 μm.
The wide-angle admittance matching layer is a sub-high refractive index film Ta with the refractive index higher than that of the substrate from the 1 st layer to the 8 th layer on the substrate2O5And an intermediate refractive index film Al2O3Alternating composition which enhances the combination of substrate and filmSo as to realize better admittance matching of the s-polarized light in a large incidence angle area, thereby realizing the purpose of wide angle.
The wide wavelength admittance spreading layer is 19 layers from 9 th layer to 27 th layer, and the 19 layers of the layer simultaneously comprise high refractive index TiO2Second highest refractive index Ta2O5Intermediate refractive index Al2O3And low refractive index SiO2The purpose of the four films of (2) is to spread the angle and extend the range of admittance by means of different materials, thereby achieving the requirement of "broad wavelength". Wherein the 9 th, 13 th, 15 th and 21 th layers are high refractive index film TiO 210 th, 12 th, 18 th, 20 th, 24 th and 27 th layers are low refractive index films of SiO2Layers 11, 16, 19, 22 and 26 are sub-high index films Ta2O514 th, 17 th, 23 th and 25 th layers are intermediate refractive index films Al2O3。
The refractive indices and physical thicknesses of the respective layers of the wide angle admittance materials matching layer of the 1 st to 8 th layers and the wide wavelength admittance material spreading layer of the 9 th to 27 th layers are shown in fig. 4.
Example the scattering ratio versus wavelength for various angles of incidence is shown in fig. 5, with the results for 0 °, 20 °, 40 °, 50 °, 60 ° and 70 ° of incidence in air being shown in fig. 5, respectively. As can be seen from fig. 5, 1) for small incidence angle regions with an incidence angle of less than 40 °, the scattering power-wavelength curve does not change much, and the polarization separation is substantially negligible, so both cases of 10 ° and 30 ° are omitted in fig. 5; 2) for large incidence areas with incidence angles greater than 40 °, not only does the polarization separation increase gradually with incidence angle, but the scattering power rises rapidly with incidence angle, especially for incidence angles of 60 ° and 70 °; 3) the scattering power-wavelength curve moves towards short wave with the increasing incidence angle, and the larger the incidence angle, the more the movement will be; 4) the wavelength region of the reduced scattering region becomes narrower with increasing incidence angle, the greater the incidence angle, the more the narrowing, and the bandwidth at 70 ° is about 200nm, so the reduced scattering bandwidth is limited by the maximum incidence angle.
For direct comparison with glass substrates that were not coated with multiple anti-scatter films, FIG. 6 shows the calculated scattering rate versus wavelength for microstructures on a refractive index 1.52 substrate according to the present invention. For greater clarity of comparison, FIGS. 5 and 6 each depict a 200nm bandwidth quadrilateral frame with wavelengths of 450nm to 650 nm. Comparing fig. 5 and fig. 6, it can be seen that the scattering rate is greatly reduced after the wide-angle and wide-wavelength scattering reduction film of the first embodiment is plated in the scattering reduction wavelength region of 450nm to 650nm, and table 1 shows the average percent scattering rate of the wide-angle and wide-wavelength scattering reduction film of the first embodiment at various incident angles in the wavelength region of 450nm to 650nm on the substrate microstructure with the refractive index of 1.52. As can be seen from Table 1, in the small incident angle region with the incident angle less than 40 °, the scattering rate of the first embodiment is reduced by about 13-20 times compared with the microstructure single surface of the glass substrate; whereas in the large incidence angle region of 50 ° to 70 °, especially at incidence angles of 60 ° and 70 °, the effect of scattering reduction is significantly reduced, since this is exactly the angular distribution region of the four films, where the normalized modified admittance of s-polarized light rises sharply, which intrinsic property is hard to change.
TABLE 1
| Angle of |
0° | 10° | 20° | 30° | 40° | 50° | 60° | 70° |
| Examples A/%) | 0.29 | 0.26 | 0.21 | 0.22 | 0.38 | 0.87 | 2.59 | 8.90 |
| Glass substrate/%) | 4.2 | 4.2 | 4.3 | 4.4 | 4.8 | 6.0 | 9.2 | 17.5 |
It is worth pointing out that the present invention is designed by calculation for the glass substrate microstructure with refractive index of 1.52, if the refractive index of the glass substrate in table 1 is increased, the scattering reduction effect is better, and the higher the refractive index of the substrate is, the better the scattering reduction effect is. For example, in a silicon solar cell, in order to absorb as much sunlight as possible and improve photoelectric conversion efficiency, an antireflection film on the surface of a silicon wafer cannot be omitted. Because the silicon substrate has a high refractive index, with a complex refractive index at a wavelength of 550nm of 4.1-i 0.26 (the complex refractive index indicates that the material is an optical absorber at that wavelength, and the imaginary component 0.26 (i.e., i0.26) is called the extinction coefficient, with greater extinction coefficient, greater absorption, and zero extinction coefficient, indicating a transparent body), the reflectivity of a single surface at 0 ° incidence can be as high as 37%, rather than 4.2% of the glass substrate of Table 1, so that the silicon wafer requires a smaller number of layers and thinner filmsThe thickness can better realize wide-angle and wide-wavelength antireflection. However, the anti-glare property of the display panel is only that the refractive index of the high-transparency hard glass substrate is about 1.52, and the refractive index of the film layer is 1.23 according to the anti-reflection amplitude condition, unfortunately, no material with low refractive index exists in nature. Therefore, it is necessary to use Ta2O5And Al2O3To achieve wide angle admittance matching of the substrate, and TiO2、Ta2O5、Al2O3And SiO2The four thin films are used to realize the wide wavelength admittance extension, which undoubtedly increases the number of layers and the thickness of the film in the first embodiment.
3) And heating and evaporating four hard film materials by adopting electron beams, wherein strong ion beams are adopted for auxiliary bombardment during film deposition, the beam pressure of the ion beams is 900-1100V, preferably 1000V, the beam current is 900-1100 mA, preferably 1000mA, and the substrate temperature is heated to 250-300 ℃, preferably 280 ℃.
Finally, it is expected that not only small incident angle regions but also large incident angle regions can obtain smaller glare, so that the image contrast and definition of the display panel are greatly increased, and even under the background of strong light such as sunlight, the glare cannot be disturbed by the dazzling strong light.
Example two
As the second embodiment for expanding the popularization, if the firmness requirement of the display panel can be properly reduced, the low refractive index film of the scattering reduction film can be magnesium fluoride MgF2SiO 2 in place of the first embodiment2Due to MgF2A refractive index in the visible region of 1.38 to SiO2Is 1.46 lower, and thus lower reflection scattering is expected, but MgF2Mechanical hardness of only 4300N/mm2Not shorter than SiO2And (3) a membrane.
The implementation steps of the second embodiment are basically similar to those of the first embodiment.
1) Exactly the same as in the first embodiment.
2) A wide angle wide wavelength backscatter film was constructed on the microstructured surface using commercial TFcal film design software. Four film materials TiO with reference wavelength of 520nm2、Ta2O5、Al2O3And MgF2The refractive indices at a central wavelength of 550nm were 2.44, 2.11, 1.62 and 1.38, respectively, and the total number of film layers was designed to be 27, with a total film layer thickness of 1.573 microns.
FIG. 7 is a graph of the refractive index versus physical thickness for each of the two films of example two of the present invention.
FIG. 8 shows the scattering ratio versus wavelength for various angles of incidence for the example, as in FIG. 5, with angles of incidence in air of 0, 20, 40, 50, 60, and 70, respectively. As can be seen from fig. 8, all of its characteristics are similar to those shown in fig. 5. Comparing FIG. 8 to FIG. 6, Table 2 lists the average percent scattering at various angles of incidence for the wavelength interval 450nm to 650nm for the wide angle, wide wavelength, reduced scattering film of example two on a substrate microstructure having a refractive index of 1.52. It is clear that the results in Table 2 are similar to those in Table 1, but are all superior to those in Table 1, due to MgF2Has a refractive index of 1.38 lower than that of SiO21.46.
It can also be seen from FIG. 7 that it is because of MgF2Has a refractive index lower than that of SiO2So that the number of wide-angle admittance-matching layers is reduced and only one layer of high-refractive-index TiO is required in the wide-wavelength admittance-extension layer2And (3) a membrane. It can be seen how the refractive index of the low index film is important to the anti-scatter properties!
TABLE 2
| Angle of |
0° | 10° | 20° | 30° | 40° | 50° | 60° | 70° |
| Examples A/%) | 0.27 | 0.23 | 0.19 | 0.18 | 0.29 | 0.63 | 1.88 | 7.03 |
| Glass substrate/%) | 4.2 | 4.2 | 4.3 | 4.4 | 4.8 | 6.0 | 9.2 | 17.5 |
3).MgF2Although the film is a soft film material, it is mixed with hard film TiO2、Ta2O5、Al2O3The combination is good, the firmness close to that of a hard film can be obtained under the assistance of strong ions and high substrate temperature, and the practical application value is not lost.
Claims (8)
1. The anti-dazzle wide-angle wide-wavelength scattering reduction film comprises a substrate and a medium multilayer film arranged on the substrate, and is characterized in that the substrate is made of hard optical glass, the medium multilayer film consists of a wide-angle admittance matching layer and a wide-wavelength admittance extension layer which are sequentially arranged on the substrate, and the wide-angle admittance matching layer and the wide-wavelength admittance extension layer jointly form the anti-dazzle wide-angle wide-wavelength scattering reduction film;
the surface of the dielectric multilayer film coating of the hard optical glass is provided with a rough microstructure;
the dielectric multilayer film adopts titanium dioxide TiO with high refractive index2Film, sub-high refractive index tantalum pentoxide Ta2O5Film, intermediate refractive index aluminum sesquioxide Al2O3Film, low refractive index silica SiO2Film, low refractive index MgF2At least two of the membranes.
2. The anti-glare wide-angle and wide-wavelength anti-scatter film according to claim 1, wherein the wide-angle admittance-matching layer is composed of Ta with a second highest refractive index2O5Film and intermediate refractive index Al2O3The two membranes are alternately formed;
the wide wavelength admittance extension layer is made of TiO with high refractive index2Film, Ta of next highest refractive index2O5Film, intermediate refractive index Al2O3Film and low refractive index SiO2The four films together or consist of high refractive index TiO2Film, Ta of next highest refractive index2O5Film, intermediate refractive index Al2O3Film and low refractive index MgF2Membranes four membranes are composed together.
3. The anti-glare, wide-angle, broad-wavelength light-scattering reduction film according to claim 1, wherein the refractive index of the hard optical glass is 1.45 to 1.65.
4. The anti-glare wide-angle and wide-wavelength scattering reduction film according to claim 1, wherein the average diameter of the microstructures on the dielectric multilayer film coated surface of the hard optical glass is 9 to 15 micrometers, and the average depth of the microstructures is 3 to 5 micrometers.
5. The anti-glare wide-angle and wide-wavelength scattering reduction film according to claim 1, wherein the total number of layers of the dielectric multilayer film is 20-35.
6. The anti-glare wide-angle and wide-wavelength scattering reduction film according to claim 2, wherein the number of the film layers of the wide-angle admittance matching layer is 2-10;
the number of the film layers of the wide wavelength admittance extension layer is 18-25, wherein, the TiO with high refractive index2Film of 1-4 layers of Ta with next highest refractive index2O55-9 layers of film and Al with intermediate refractive index2O3The film is 4-5 layers of SiO with low refractive index2Films or MgF of low refractive index2The film comprises 6-8 layers.
7. The anti-glare wide-angle and wide-wavelength scattering reduction film according to claim 2, wherein the dielectric multilayer film is bombarded with strong ion beams under the assistance of an ion beam in the plating process, the ion beam pressure is 900-1100V, and the beam current is 900-1100 mA.
8. The anti-glare wide-angle and wide-wavelength scattering reduction film according to claim 1, wherein the substrate temperature of the dielectric multilayer film during coating is heated to 250-300 ℃.
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