CN113248287B - Formaldehyde-removing ceramic tile and preparation method thereof - Google Patents
Formaldehyde-removing ceramic tile and preparation method thereof Download PDFInfo
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- CN113248287B CN113248287B CN202110792980.3A CN202110792980A CN113248287B CN 113248287 B CN113248287 B CN 113248287B CN 202110792980 A CN202110792980 A CN 202110792980A CN 113248287 B CN113248287 B CN 113248287B
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- formaldehyde
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- 239000000919 ceramic Substances 0.000 title claims abstract description 52
- 238000002360 preparation method Methods 0.000 title claims abstract description 33
- 230000001699 photocatalysis Effects 0.000 claims abstract description 124
- 239000000463 material Substances 0.000 claims abstract description 101
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims abstract description 82
- 238000005498 polishing Methods 0.000 claims abstract description 81
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 67
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 61
- 239000011787 zinc oxide Substances 0.000 claims abstract description 35
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 26
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000000395 magnesium oxide Substances 0.000 claims abstract description 21
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 18
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims abstract description 18
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 claims abstract description 17
- 238000010304 firing Methods 0.000 claims abstract description 14
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000001035 drying Methods 0.000 claims abstract description 9
- 238000009740 moulding (composite fabrication) Methods 0.000 claims abstract description 4
- 239000011449 brick Substances 0.000 claims description 56
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 30
- 238000002156 mixing Methods 0.000 claims description 27
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 26
- 239000000843 powder Substances 0.000 claims description 25
- 238000000498 ball milling Methods 0.000 claims description 21
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 20
- 230000005484 gravity Effects 0.000 claims description 19
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 18
- 239000010410 layer Substances 0.000 claims description 17
- 239000010453 quartz Substances 0.000 claims description 16
- 239000010434 nepheline Substances 0.000 claims description 15
- 229910052664 nepheline Inorganic materials 0.000 claims description 15
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 15
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 14
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 14
- 239000005022 packaging material Substances 0.000 claims description 14
- DLHONNLASJQAHX-UHFFFAOYSA-N aluminum;potassium;oxygen(2-);silicon(4+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Si+4].[Si+4].[Si+4].[K+] DLHONNLASJQAHX-UHFFFAOYSA-N 0.000 claims description 13
- 238000001354 calcination Methods 0.000 claims description 12
- 239000011230 binding agent Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 239000000375 suspending agent Substances 0.000 claims description 11
- 229910052656 albite Inorganic materials 0.000 claims description 10
- 239000010427 ball clay Substances 0.000 claims description 10
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 10
- 239000000454 talc Substances 0.000 claims description 10
- 229910052623 talc Inorganic materials 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- 239000010456 wollastonite Substances 0.000 claims description 9
- 229910052882 wollastonite Inorganic materials 0.000 claims description 9
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims description 7
- 239000000292 calcium oxide Substances 0.000 claims description 7
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 7
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 claims description 7
- 229910001950 potassium oxide Inorganic materials 0.000 claims description 7
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims description 7
- 229910001948 sodium oxide Inorganic materials 0.000 claims description 7
- 238000005507 spraying Methods 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 6
- 239000002344 surface layer Substances 0.000 claims description 6
- 238000003825 pressing Methods 0.000 claims description 5
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 3
- 239000010433 feldspar Substances 0.000 claims description 3
- 229940072033 potash Drugs 0.000 claims description 3
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Substances [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 3
- 235000015320 potassium carbonate Nutrition 0.000 claims description 3
- 230000004927 fusion Effects 0.000 claims description 2
- XUIMIQQOPSSXEZ-NJFSPNSNSA-N silicon-30 atom Chemical group [30Si] XUIMIQQOPSSXEZ-NJFSPNSNSA-N 0.000 claims description 2
- 238000007688 edging Methods 0.000 abstract description 7
- 239000000853 adhesive Substances 0.000 abstract description 3
- 230000001070 adhesive effect Effects 0.000 abstract description 3
- 230000001680 brushing effect Effects 0.000 abstract 1
- 238000000746 purification Methods 0.000 abstract 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 18
- 239000001768 carboxy methyl cellulose Substances 0.000 description 18
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 18
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 18
- 235000012239 silicon dioxide Nutrition 0.000 description 17
- 235000019832 sodium triphosphate Nutrition 0.000 description 16
- 230000009286 beneficial effect Effects 0.000 description 7
- 238000007873 sieving Methods 0.000 description 7
- 239000002002 slurry Substances 0.000 description 7
- 239000005995 Aluminium silicate Substances 0.000 description 6
- 235000012211 aluminium silicate Nutrition 0.000 description 6
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 6
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 5
- 230000006378 damage Effects 0.000 description 5
- 239000004744 fabric Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 208000027418 Wounds and injury Diseases 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 208000014674 injury Diseases 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000003550 marker Substances 0.000 description 3
- 238000007146 photocatalysis Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000004480 active ingredient Substances 0.000 description 2
- 238000004887 air purification Methods 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000008595 infiltration Effects 0.000 description 2
- 238000001764 infiltration Methods 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000011941 photocatalyst Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003044 adaptive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000009408 flooring Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 230000005802 health problem Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- -1 platinum ions Chemical class 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910021487 silica fume Inorganic materials 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/89—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with noble metals
- B01J23/8933—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with noble metals also combined with metals, or metal oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/898—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with noble metals also combined with metals, or metal oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with vanadium, tantalum, niobium or polonium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J33/00—Protection of catalysts, e.g. by coating
-
- B01J35/39—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/0009—Use of binding agents; Moulding; Pressing; Powdering; Granulating; Addition of materials ameliorating the mechanical properties of the product catalyst
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/08—Heat treatment
- B01J37/082—Decomposition and pyrolysis
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
- C03C8/16—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions with vehicle or suspending agents, e.g. slip
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/5022—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with vitreous materials
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/86—Glazes; Cold glazes
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Abstract
The invention discloses a formaldehyde-removing ceramic tile and a preparation method thereof, wherein the preparation method comprises the steps of preparing a photocatalytic material A, preparing a photocatalytic wrapping material B, preparing a photocatalytic glaze material C, preparing a surface glaze D, preparing a polishing solution E, glazing, drying, firing and forming, edging and polishing, the preparation method comprises the steps of wrapping the photocatalytic materials such as copper-doped bismuth vanadate, platinum-doped titanium oxide, nano-magnesium oxide, nano-zinc oxide and the like by high-temperature-resistant aluminum oxide and silicon oxide for improving the high-temperature resistance of the photocatalytic materials, introducing the wrapped photocatalytic materials into the photocatalytic glaze material and the polishing solution, enabling the fired ceramic tile to be capable of withstanding brushing for 10000 times, and enabling the formaldehyde removal rate to still reach 82-93%, the ceramic tile has the characteristics of good formaldehyde removal, good durability, good adhesive force and the like, the surface of the ceramic tile is ultra-bright, the glossiness reaches 95-100 degrees, and has excellent apparent quality, meets the requirements of consumers on the beautiful appearance of the ceramic tile and the purification of formaldehyde in the air.
Description
Technical Field
The invention relates to the technical field of ceramic tiles and preparation methods thereof, in particular to a formaldehyde-removing ceramic tile and a preparation method thereof.
Background
With the development of industry, the living standard of people is improved, and the concern on health is higher and higher, such as the concern on the harm of formaldehyde to human bodies.
Wood flooring, wooden furniture, interior wall coating etc. in the house all can release formaldehyde more or less, and the problem of inferior product formaldehyde residue is especially serious, and the release of formaldehyde is still long-time moreover, if people wait until the formaldehyde all scatters and just live in it is not practical, so the consumer hopes to start with through the ceramic tile that can the air-purifying formaldehyde in, improves the indoor air quality, consequently has the ceramic tile of air-purifying function in the market to come to life. One of the existing ceramic tiles with the air purification function utilizes an anion technology, and the other ceramic tile utilizes a photocatalyst technology, the anion is accompanied with certain radioactivity, and even if the problem of formaldehyde is solved, another health problem can be introduced; the photocatalyst ceramic tile has poor formaldehyde removal durability and cannot continuously and effectively remove formaldehyde released for a long time.
It is seen that improvements and enhancements to the prior art are needed.
Disclosure of Invention
In view of the defects of the prior art, the invention aims to provide a formaldehyde removal ceramic tile and a preparation method thereof, and aims to solve the problems that the existing ceramic tile with the air purification function has radioactivity and the formaldehyde removal durability is poor.
In order to achieve the purpose, the invention adopts the following technical scheme:
a preparation method of the formaldehyde-removing ceramic tile comprises the following steps:
s1, preparing a photocatalytic material A: mixing copper-doped bismuth vanadate, platinum-doped titanium oxide, nano zinc oxide, nano magnesium oxide, a suspending agent, a binder and water into a ball mill for ball milling to obtain a photocatalytic material A;
s2, preparing a photocatalytic packaging material B: mixing alumina and silica, spraying the photocatalytic material A on the surfaces of the alumina and the silica which are uniformly mixed, drying, calcining and crushing to obtain a photocatalytic coating material B;
s3, preparing a photocatalytic glaze material C: mixing the photocatalytic packaging material B, the fusion cake, the calcined talc, the albite, the potash feldspar, the wollastonite powder, the ball clay, the nepheline powder, the quartz, the calcium carbonate, the zinc oxide, the suspending agent, the binder and the water into a ball mill for ball milling to obtain a photocatalytic glaze material C;
s4, preparing a cover glaze D;
s5, preparing polishing solution E: mixing the nano silica sol and the photocatalytic material A to obtain polishing solution E;
s6, glazing: applying the overglaze D on the brick surface; applying a photocatalytic glaze material C on the overglaze D; drying, firing and forming;
s7, polishing: and (5) performing secondary polishing on the brick surface by using the polishing solution E after edging and primary polishing in the step S6.
The preparation method of the formaldehyde-removing tile comprises the following steps of (1) calculating the photocatalytic material A in the step S1 by weight: 5-8 parts of copper-doped bismuth vanadate, 1-2 parts of platinum-doped titanium oxide, 12-16 parts of nano zinc oxide, 10-15 parts of nano magnesium oxide, 0.15-0.2 part of suspending agent, 0.4 part of binder and 100 parts of water.
The preparation method of the formaldehyde-removing tile comprises the following steps of (1) calculating the photocatalytic coating material B in the step S2 by weight: 50-60 parts of aluminum oxide, 40-50 parts of silicon oxide and 30-40 parts of photocatalytic material A.
The preparation method of the formaldehyde-removing ceramic tile comprises the following steps of, by weight: 2-5 parts of photocatalytic wrapping material B, 10-13 parts of frit, 10-15 parts of calcined talc, 20-25 parts of albite, 5-8 parts of potassium feldspar, 20-25 parts of wollastonite powder, 8-10 parts of ball clay, 5-8 parts of nepheline powder, 8-10 parts of quartz, 11-15 parts of calcium carbonate, 2-5 parts of zinc oxide, 0.15-0.2 part of suspending agent, 0.4 part of binder and 30 parts of water.
The preparation method of the formaldehyde-removing ceramic tile comprises the following steps of: 15-20 parts of silicon oxide, 50-55 parts of aluminum oxide, 0.1-0.5 part of iron oxide, 3-5 parts of titanium oxide, 11-12 parts of calcium oxide, 6-9 parts of magnesium oxide, 1-2 parts of sodium oxide, 1-2 parts of potassium oxide, 3-4 parts of barium oxide and 1-1.5 parts of zinc oxide.
The preparation method of the formaldehyde-removing ceramic tile comprises the following steps of sieving the ball-milled materials obtained in the step S1 by a 600-mesh sieve, wherein the sieve residue is 0.3-0.5%, and the specific gravity of glaze slip is 1.0-1.10; the material crushed in the step S2 needs to be sieved by a 325-mesh sieve, and the sieve allowance is 0.1-0.2%; the ball-milled material obtained in the step S3 needs to be sieved by a 400-mesh sieve, and the sieve allowance is 0.3-0.5%; the specific gravity of the glaze slip is 1.48-1.50.
The preparation method of the formaldehyde-removing ceramic tile comprises the step S6, wherein the application amount of the overglaze D is 500-600 g/m3The application amount of the photocatalytic glaze material C is 300-400 g/m3(ii) a And firing and forming at 1100-1150 ℃ for 54 min.
The preparation method of the formaldehyde-removing ceramic tile comprises the step S5, wherein the weight ratio of the nano silica sol of the polishing solution E to the photocatalytic material A is (8-9) to (1-2).
The preparation method of the formaldehyde-removing ceramic tile comprises the following specific steps of S7: the glossiness of the brick surface after the first polishing is 45-55 degrees, and then a dropper is used for dropping the polishing solution E on the brick surface, wherein the dropping amount is 50-60 g/m2(ii) a And performing polishing under the conditions that the pressure is 42-45 MPA, the polishing linear speed is 50.68HZ and the rotating speed is 900 r/min.
The formaldehyde-removing ceramic tile is prepared by the preparation method of the formaldehyde-removing ceramic tile, and the formaldehyde-removing ceramic tile sequentially comprises the following components from bottom to top: a brick layer, a surface glaze layer, a photocatalytic glaze layer and a bright surface layer; the overglaze layer is formed by applying overglaze D; the photocatalytic glaze layer is formed by applying photocatalytic glaze C; the bright surface layer is formed by polishing and pressing polishing liquid E.
Has the advantages that:
the invention provides a formaldehyde-removing ceramic tile and a preparation method thereof, wherein the preparation method comprises the steps of wrapping photocatalytic materials such as copper-doped bismuth vanadate, platinum-doped titanium oxide, nano-magnesium oxide and nano-zinc oxide by high-temperature-resistant aluminum oxide and silicon oxide, and is used for improving the high-temperature resistance of the photocatalytic materials, introducing the wrapped photocatalytic materials into photocatalytic glaze and polishing solution, so that the fired ceramic tile can withstand 10000 times of washing, the formaldehyde removal rate is still up to 82-93%, and the ceramic tile has the characteristics of good formaldehyde removal, good durability, good adhesive force, good wear resistance and the like, has an ultra-clean and bright brick surface and a glossiness of 95-100 degrees, has excellent apparent quality, can meet the requirement of consumers on the attractiveness of the ceramic tile, can meet the requirement of the consumers on formaldehyde in purified air, and is beneficial to large-scale application and popularization.
Detailed Description
The invention provides a formaldehyde-removing ceramic tile and a preparation method thereof, and in order to make the purpose, technical scheme and effect of the invention clearer and clearer, the invention is further described in detail by taking examples. It should be understood that the specific embodiments described herein are merely illustrative of the invention and do not limit the scope of the invention.
The invention provides a preparation method of a formaldehyde-removing ceramic tile, which comprises the following steps:
s1, preparing a photocatalytic material A: taking 5-8 parts of copper-doped bismuth vanadate (Cu-BiVO)4) 1-2 parts of platinum-doped titanium oxide (Pt-TiO)2) Mixing 12-16 parts of nano zinc oxide, 10-15 parts of nano magnesium oxide, 0.15-0.2 part of suspending agent (carboxymethyl cellulose), 0.4 part of binder (sodium tripolyphosphate) and 100 parts of water into a ball mill for ball milling to obtain a photocatalytic material A, wherein the ball milled material needs to be sieved by a 600-mesh sieve, the balance of the sieve is 0.3-0.5%, and the specific gravity of glaze slurry is 1.0-1.10; bismuth, titanium and zinc have excellent photocatalytic properties. The nano-grade zinc oxide and magnesium oxide have small grain size and large specific surface area, and are beneficial to fully filling the photocatalytic active ingredients into the porous alumina and silicon oxide. The nano-scale magnesium oxide has chemical properties of light, electricity and magnetism, and has a promoting effect on the photocatalysis effect. The above substances can decompose formaldehyde in air under the action of active free radicals and superoxide radicals under the photocatalysis condition, thereby achieving the effect of purifying air.
The bismuth vanadate has better photocatalytic performance than pure bismuth vanadate and titanium oxide doped with platinum than pure titanium oxide by doping copper ions in the bismuth vanadate and doping platinum ions in the titanium oxide for modifying the bismuth vanadate and the titanium oxide, so that copper is dispersed on the surface of the bismuth vanadate in the form of oxide, and platinum is dispersed on the surface of the titanium oxide in the form of oxide.
Carboxymethyl cellulose is added into raw glaze slip, hydrophilic groups of the carboxymethyl cellulose are combined with water to generate water absorption expansion, and a net structure is gradually formed through van der Waals force interaction, so that the glaze slip particles are fully dispersed in a system, precipitation is avoided, the special net structure and the surface adsorption of the glaze slip particles are prevented, the glaze slip particles are prevented from contacting with each other, and the space stability of the glaze slip is ensured; furthermore, sodium ions and polymeric anion groups dissociated from carboxymethyl cellulose increase the repulsive force between particles, thereby increasing fluidity. The sodium tripolyphosphate is used for adjusting the amount of water used in ball milling.
S2, preparing a photocatalytic packaging material B: mixing 50-60 parts of alumina and 40-50 parts of silicon oxide, spraying 30-40 parts of photocatalytic material A on the surfaces of the alumina and the silicon oxide which are uniformly mixed, and baking for 30-40 min at the temperature of 100-200 ℃ to prepare for subsequent calcination; then calcining for 50-60 min at 800-1000 ℃ to sinter the photocatalytic active ingredients with alumina and silica. After calcining, crushing and sieving to obtain the photocatalytic coating material B. When sieving, a 325-mesh screen is adopted, and the sieve residue is 0.1-0.2%. Preferably, 30-40 parts of the photocatalytic material A is sprayed on 100g of the uniformly mixed mixture of alumina and silica. The alumina is high temperature resistant and used for improving the sintering temperature, has the characteristic of multiple pore diameters and is beneficial to loading the photocatalytic material A in the pore diameters. The addition amount can enable the photocatalytic material A to be fully loaded on the surfaces of the aluminum oxide and the silicon oxide, so that the aluminum oxide and the silicon oxide can protect the photocatalytic material A, and the photocatalytic material A is prevented from being degraded to reduce the photocatalytic performance under the high-temperature condition.
S3, preparing a photocatalytic glaze material C: mixing 2-5 parts of photocatalytic packaging material B, 10-13 parts of frit, 10-15 parts of calcined talc, 20-25 parts of albite, 5-8 parts of potassium feldspar, 20-25 parts of wollastonite powder, 8-10 parts of ball clay, 5-8 parts of nepheline powder, 8-10 parts of quartz, 11-15 parts of calcium carbonate, 2-5 parts of zinc oxide, 0.15-0.2 part of suspending agent (carboxymethyl cellulose), 0.4 part of binder (sodium tripolyphosphate) and 30 parts of water into a ball mill for ball milling to obtain photocatalytic glaze C; the ball-milled materials need to be sieved by a 400-mesh sieve, and the rest is 0.3 to 0.5 percent; the specific gravity of the glaze slip is 1.48-1.50; mixing a photocatalytic coating material B loaded on the surfaces of aluminum oxide and silicon oxide with other components to improve the temperature resistance of a photocatalytic glaze material C, wherein the photocatalytic coating material B plays a role in removing formaldehyde through photocatalysis; the frit is used for improving the permeability of the fired glaze surface; the calcined talc is used for improving the roughness of the glaze surface; the albite and the potash feldspar are used for adjusting the fluidity of the glaze at high temperature and low temperature; the silica fume powder is used for improving the weather resistance of the glaze, improving the color and luster of the glaze and improving the clear and transparent degree; the ball clay has certain viscosity and is used for improving the binding force of each component of the glaze; the nepheline powder is used for reducing the sintering temperature; the quartz is beneficial to forming a glass phase in the glaze surface, and the dispersed crystal phases are bonded together, so that the growth of crystal grains and gas-filled pores are inhibited, and the glaze surface is more compact; the calcium carbonate is used for reducing the sintering temperature; the zinc oxide is used for improving the texture of the glaze. Through the matching of the components and the proportion, the photocatalytic glaze material C has the characteristics of high dispersity, good fluidity, high temperature resistance and the like, and the fired glaze surface is smooth, flat and transparent.
S4, preparing a cover glaze D: mixing 30-40 parts of potassium feldspar, 15-20 parts of nepheline powder, 10-20 parts of kaolin, 10-15 parts of alumina, 10-15 parts of barium carbonate, 3 parts of zinc oxide, 10 parts of quartz, 10 parts of frit, 0.15-0.2 part of suspending agent (carboxymethyl cellulose), 0.4 part of binder (sodium tripolyphosphate) and 30 parts of water into a ball mill for ball milling to obtain overglaze D, wherein the ball-milled materials need to pass through a 400-mesh sieve, and the balance of the sieve is 0.3-0.5%; the specific gravity of the glaze slip is 1.60-1.68; the process of forming the vitreous glaze after the potassium feldspar is melted is slow, the crystallization capacity is small, and the product is prevented from being damaged due to the crystal phase separated in the process of forming the glass phase; the kaolin is introduced with alumina, and is matched with the alumina with the addition amount to improve the firing temperature of the overglaze D, and the barium carbonate and the quartz are both beneficial to forming a glass phase; the combination of the components and the addition amount ensures that the surface glaze D has good fluidity and good leveling property, and the bonding force of the components is moderate, thereby being beneficial to covering green bricks and ensuring that the glaze surface is smoother and smoother.
The frits in the steps S3 and S4 comprise, in parts by weight: 15-20 parts of silicon oxide, 50-55 parts of aluminum oxide, 0.1-0.5 part of iron oxide, 3-5 parts of titanium oxide, 11-12 parts of calcium oxide, 6-9 parts of magnesium oxide, 1-2 parts of sodium oxide, 1-2 parts of potassium oxide, 3-4 parts of barium oxide and 1-1.5 parts of zinc oxide. The frit is used as a solvent in the raw material, and gases such as carbon dioxide and the like are discharged firstly, so that the flatness and the glossiness of the glaze surface are improved; the suspension property of the glaze material and the adhesion to the green brick are improved, and fine cracks, pinholes and the like generated on the glaze surface during high-temperature sintering are avoided.
S5, preparing polishing solution E: mixing the nano silica sol and the photocatalytic material A in a ratio of (8-9) to (1-2) to obtain a polishing solution E; the nano silica sol is amorphousDispersion of form silica in water, the molecular formula of which can be expressed as mSiO2•nH2O, mainly playing a role in loading the photocatalytic material A, when the silica sol loses moisture, the monomer silicic acid is gradually polymerized into high polymeric silica gel, colloid molecules are enlarged along with the evaporation of the moisture, and finally a coating film with excellent water resistance and heat resistance is formed; the nano-level silica sol has small particle size and strong infiltration capacity for the brick surface, can infiltrate into the brick surface through a capillary, still has good fluidity and dispersibility after being loaded with the photocatalytic material A, so that the photocatalytic material A uniformly covers the brick surface, and enters into capillary pores of the brick surface due to the strong infiltration capacity of the silica sol, thereby enabling the brick surface to have the capacity of durably and effectively removing formaldehyde.
S6, glazing: applying a cloth in an amount of 500-600 g/m3The overglaze D is applied on the surface of the brick; 300 to 400 g/m3The photocatalytic glaze material C is distributed on the overglaze D; the overglaze D and the photocatalytic glaze C can be applied by means of glaze spraying, glaze pouring and the like. Then drying the brick surface, and firing and forming the brick surface through a ceramic roller kiln at the temperature of 1100-1150 ℃ for 54 min; the application amount is adaptive to the glaze slurry proportion of the overglaze D and the glaze slurry proportion of the photocatalytic glaze material C, and the overglaze D with the application amount is used for covering the surface of a green brick with poor flatness, so that the glaze surface is smoother, the bonding force with the green brick is strong, and the green brick cracking is prevented; the photocatalytic glaze material C with the distributed amount uniformly covers the photocatalytic wrapping material B on the overglaze D, so that the photocatalytic material A can endure the firing temperature of 1100-1150 ℃, the formaldehyde removal capability of the photocatalytic glaze material layer is favorably ensured, and the fired glaze surface is smooth, flat and transparent and has good apparent quality. The firing temperature is matched with the components of the overglaze D and the photocatalytic glaze material C and the proportion of the components, and the firing temperature is higher, so that the formation and the growth of a crystal phase in the glaze surface are facilitated, and the wear resistance of the glaze surface is improved.
S7, polishing: edging and polishing the brick surface in the step S6 for the first time, and when the glossiness of the brick surface is 45-55 degrees, using polishing solution E for polishingAnd the second polishing comprises the following specific operations: dropping the polishing solution E on the brick surface by a dropper, wherein the dropping amount is 50-60 g/m2(ii) a And (2) performing polishing and pressing under the conditions that the pressure is 42-45 MPA, the polishing linear speed is 50.68HZ and the rotating speed is 900r/min, so that the silicon dioxide and the photocatalytic material A in the polishing solution E cover the brick surface, and in the polishing and pressing process, filling as much silicon dioxide and photocatalytic material A as possible into capillary pores of the brick surface by utilizing the stronger permeability of the nano silica sol and the pressure of a polishing wheel, so as to form a film layer which is excellent in water resistance and heat resistance and is not adhered with dust on the brick surface, so that the brick surface has an ultra-clean and bright surface and excellent and durable formaldehyde removal performance.
The invention also provides a formaldehyde-removing ceramic tile which is prepared by the preparation method of the formaldehyde-removing ceramic tile, and the formaldehyde-removing ceramic tile sequentially comprises the following components from bottom to top: a brick layer, a surface glaze layer, a photocatalytic glaze layer and a bright surface layer; the overglaze layer is formed by applying overglaze D; the photocatalytic glaze layer is formed by applying photocatalytic glaze C; the bright surface layer is formed by polishing and pressing polishing liquid E.
To further illustrate a formaldehyde-removing tile and method of making the same according to the present invention, the following examples are provided.
Example 1
A preparation method of the formaldehyde-removing ceramic tile comprises the following steps:
s1, preparing a photocatalytic material A: taking 7 parts of copper-doped bismuth vanadate (Cu-BiVO)4) 2 parts of platinum-doped titanium oxide (Pt-TiO)2) 13 parts of nano zinc oxide, 12 parts of nano magnesium oxide, 0.2 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 100 parts of water are mixed into a ball mill for ball milling, the ball milled materials are sieved by a 600-mesh sieve, the balance of the sieve is 0.3-0.5%, and the specific gravity of the glaze slip is 1.04.
S2, preparing a photocatalytic packaging material B: 60 parts of alumina and 43 parts of silicon oxide are mixed, 34 parts of photocatalytic material A is sprayed on the surfaces of the alumina and the silicon oxide which are uniformly mixed, the mixture is baked for 40min at the temperature of 100 ℃, preparation is made for subsequent calcination, the mixture is calcined for 55min at the temperature of 950 ℃, and then the mixture is crushed and sieved, a 325-mesh screen is adopted during sieving, and the screen allowance is 0.1-0.2%.
S3, preparing a photocatalytic glaze material C: 3 parts of photocatalytic packaging material B, 12 parts of frit, 10 parts of calcined talc, 24 parts of albite, 8 parts of potassium feldspar, 22 parts of wollastonite powder, 9 parts of ball clay, 7 parts of nepheline powder, 9 parts of quartz, 11 parts of calcium carbonate, 5 parts of zinc oxide, 0.18 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 30 parts of water are mixed into a ball mill for ball milling, the ball milled material needs to be sieved by a 400-mesh sieve, and the balance of the sieve is 0.3-0.5%; the specific gravity of the glaze slip is 1.48.
S4, preparing a cover glaze D; mixing 30 parts of potassium feldspar, 18 parts of nepheline powder, 13 parts of kaolin, 13 parts of alumina, 10 parts of barium carbonate, 3 parts of zinc oxide, 10 parts of quartz, 10 parts of frit, 0.2 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 30 parts of water into a ball mill for ball milling, wherein the ball milled materials need to be sieved by a 400-mesh sieve, and the balance of the sieve is 0.3-0.5%; the specific gravity of the glaze slip is 1.62.
The frits in the steps S3 and S4 comprise, in parts by weight: 18 parts of silicon oxide, 50 parts of aluminum oxide, 0.2 part of iron oxide, 4 parts of titanium oxide, 11 parts of calcium oxide, 8 parts of magnesium oxide, 1 part of sodium oxide, 1 part of potassium oxide, 4 parts of barium oxide and 1.5 parts of zinc oxide.
S5, preparing polishing solution E: mixing the nano silica sol and the photocatalytic material A in a ratio of 9: 1.5 to obtain polishing solution E.
S6, glazing: the cloth application amount is 530g/m3The overglaze D is sprayed on the surface of the brick; mixing at 300g/m3The photocatalytic glaze material C is sprayed on the overglaze D; then drying the brick surface, and then firing and forming the brick surface by a ceramic roller kiln at the temperature of 1120 ℃ for 54 min.
S7, polishing: and (5) edging and polishing the brick surface in the step (S6) for the first time, and polishing for the second time by using polishing liquid E when the glossiness of the brick surface is 47 degrees, wherein the operations are as follows: dropping the polishing solution E on the brick surface by a dropper, wherein the dropping amount is 50g/m2(ii) a The polishing was carried out under a pressure of 43MPA, a polishing linear speed of 50.68HZ and a rotational speed of 900 r/min.
Example 2
A preparation method of the formaldehyde-removing ceramic tile comprises the following steps:
s1, preparing a photocatalytic material A: taking 5 parts of copper-doped bismuth vanadate (Cu-BiVO)4) 1.5 parts of platinum-doped titanium oxide (Pt-TiO)2) 12 parts of nano zinc oxide, 15 parts of nano magnesium oxide, 0.18 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 100 parts of water are mixed into a ball mill for ball milling, and the specific gravity of the glaze slip is 1.0.
S2, preparing a photocatalytic packaging material B: mixing 53 parts of alumina and 47 parts of silicon oxide, spraying 30 parts of photocatalytic material A on the surfaces of the alumina and the silicon oxide which are uniformly mixed, baking for 30min at the temperature of 170 ℃ to prepare for subsequent calcination, calcining for 60min at the temperature of 850 ℃, and then crushing and sieving.
S3, preparing a photocatalytic glaze material C: 4 parts of photocatalytic packaging material B, 13 parts of frit, 13 parts of calcined talc, 20 parts of albite, 6 parts of potassium feldspar, 20 parts of wollastonite powder, 10 parts of ball clay, 5 parts of nepheline powder, 10 parts of quartz, 13 parts of calcium carbonate, 4 parts of zinc oxide, 0.16 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 30 parts of water are mixed into a ball mill for ball milling, and the specific gravity of the glaze slurry is 1.49.
S4, preparing a cover glaze D; taking 36 parts of potassium feldspar, 16 parts of nepheline powder, 10 parts of kaolin, 15 parts of alumina, 14 parts of barium carbonate, 3 parts of zinc oxide, 10 parts of quartz, 10 parts of frit, 0.16 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 30 parts of water, mixing the mixture into a ball mill, and carrying out ball milling, wherein the specific gravity of the glaze slip is 1.68.
The frits in the steps S3 and S4 comprise, in parts by weight: 20 parts of silicon oxide, 53 parts of aluminum oxide, 0.5 part of iron oxide, 5 parts of titanium oxide, 11.5 parts of calcium oxide, 6 parts of magnesium oxide, 2 parts of sodium oxide, 2 parts of potassium oxide, 3.5 parts of barium oxide and 1.2 parts of zinc oxide.
S5, preparing polishing solution E: mixing the nano silica sol and the photocatalytic material A in a ratio of 9: 1 to obtain polishing solution E.
S6, glazing: the cloth application amount is 570 g/m3The overglaze D is sprayed on the surface of the brick; 330 g/m3The photocatalytic glaze material C is sprayed on the overglaze D; then drying the brick surface, and firing and forming at 1140 ℃ for 54 min.
S7, polishing: edging and first polishing the brick surface in the step S6, and performing second polishing by using polishing solution E when the glossiness of the brick surface is 52 DEGThe method comprises the following specific operations: dropping the polishing solution E on the brick surface by a dropper, wherein the dropping amount is 52g/m2(ii) a The polishing was carried out under a pressure of 44MPA, a polishing linear speed of 50.68HZ and a rotational speed of 900 r/min.
Example 3
A preparation method of the formaldehyde-removing ceramic tile comprises the following steps:
s1, preparing a photocatalytic material A: taking 8 parts of copper-doped bismuth vanadate (Cu-BiVO)4) 1.5 parts of platinum-doped titanium oxide (Pt-TiO)2) 15 parts of nano zinc oxide, 10 parts of nano magnesium oxide, 0.15 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 100 parts of water are mixed into a ball mill for ball milling, and the specific gravity of the glaze slip is 1.1.
S2, preparing a photocatalytic packaging material B: mixing 56 parts of alumina and 40 parts of silicon oxide, spraying 36 parts of photocatalytic material A on the surfaces of the uniformly mixed alumina and silicon oxide, baking for 35min at the temperature of 200 ℃ in preparation for subsequent calcination, calcining for 50min at the temperature of 1000 ℃, and then crushing and sieving.
S3, preparing a photocatalytic glaze material C: mixing 2 parts of photocatalytic packaging material B, 11 parts of frit, 12 parts of calcined talc, 22 parts of albite, 7 parts of potassium feldspar, 25 parts of wollastonite powder, 8 parts of ball clay, 8 parts of nepheline powder, 8 parts of quartz, 15 parts of calcium carbonate, 2 parts of zinc oxide, 0.2 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 30 parts of water into a ball mill for ball milling, wherein the specific gravity of the glaze slurry is 1.50.
S4, preparing a cover glaze D: 40 parts of potassium feldspar, 15 parts of nepheline powder, 17 parts of kaolin, 10 parts of alumina, 15 parts of barium carbonate, 3 parts of zinc oxide, 10 parts of quartz, 10 parts of frit, 0.15 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 30 parts of water are mixed into a ball mill for ball milling, and the specific gravity of the glaze slip is 1.65.
The frits in the steps S3 and S4 comprise, in parts by weight: 16 parts of silicon oxide, 52 parts of aluminum oxide, 0.4 part of iron oxide, 3 parts of titanium oxide, 12 parts of calcium oxide, 9 parts of magnesium oxide, 1 part of sodium oxide, 1 part of potassium oxide, 4 parts of barium oxide and 1 part of zinc oxide.
S5, preparing polishing solution E: mixing the nano silica sol and the photocatalytic material A in a ratio of 8.5: 2 to obtain polishing solution E.
S6, glazing: the cloth application amount is 500 g/m3The overglaze D is sprayed on the surface of the brick; 360 g/m3The photocatalytic glaze material C is sprayed on the overglaze D; then drying the brick surface, and firing and forming at 1100 ℃ for 54 min.
S7, polishing: and (5) edging and polishing the brick surface in the step (S6) for the first time, and polishing for the second time by using polishing liquid E when the glossiness of the brick surface is 45 degrees, wherein the operations are as follows: dripping the polishing solution E on the brick surface by a dropper, wherein the dripping amount is 57g/m2(ii) a The polishing was carried out under a pressure of 42MPA, a polishing linear speed of 50.68HZ and a rotational speed of 900 r/min.
Example 4
A preparation method of the formaldehyde-removing ceramic tile comprises the following steps:
s1, preparing a photocatalytic material A: taking 6 parts of copper-doped bismuth vanadate (Cu-BiVO)4) 1 part of platinum-doped titanium oxide (Pt-TiO)2) 16 parts of nano zinc oxide, 14 parts of nano magnesium oxide, 0.16 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 100 parts of water are mixed into a ball mill for ball milling, and the specific gravity of the glaze slip is 1.07.
S2, preparing a photocatalytic packaging material B: mixing 50 parts of alumina and 50 parts of silicon oxide, spraying 40 parts of photocatalytic material A on the surfaces of the alumina and the silicon oxide which are uniformly mixed, baking for 35min at the temperature of 140 ℃ to prepare for subsequent calcination, calcining for 55min at the temperature of 800 ℃, and then crushing and sieving.
S3, preparing a photocatalytic glaze material C: mixing 5 parts of photocatalytic packaging material B, 10 parts of frit, 15 parts of calcined talc, 25 parts of albite, 5 parts of potassium feldspar, 24 parts of wollastonite powder, 10 parts of ball clay, 6 parts of nepheline powder, 9 parts of quartz, 12 parts of calcium carbonate, 3 parts of zinc oxide, 0.15 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 30 parts of water into a ball mill for ball milling, wherein the specific gravity of the glaze slurry is 1.49.
S4, preparing a cover glaze D: mixing 33 parts of potassium feldspar, 20 parts of nepheline powder, 20 parts of kaolin, 12 parts of alumina, 12 parts of barium carbonate, 3 parts of zinc oxide, 10 parts of quartz, 10 parts of frit, 0.18 part of carboxymethyl cellulose, 0.4 part of sodium tripolyphosphate and 30 parts of water into a ball mill for ball milling, wherein the specific gravity of the glaze slurry is 1.60.
The frits in the steps S3 and S4 comprise, in parts by weight: 15 parts of silicon oxide, 55 parts of aluminum oxide, 0.1 part of iron oxide, 4 parts of titanium oxide, 12 parts of calcium oxide, 7 parts of magnesium oxide, 2 parts of sodium oxide, 2 parts of potassium oxide, 3 parts of barium oxide and 1.3 parts of zinc oxide.
S5, preparing polishing solution E: mixing the nano silica sol and the photocatalytic material A in a ratio of 8: 2 to obtain polishing solution E.
S6, glazing: the cloth application amount is 600 g/m3The overglaze D is sprayed on the surface of the brick; 400 g/m3The photocatalytic glaze material C is sprayed on the overglaze D; then the brick surface is dried and is fired and molded under the conditions of 1150 ℃ and 54min of firing time.
S7, polishing: and (5) edging and polishing the brick surface in the step (S6) for the first time, and polishing for the second time by using polishing liquid E when the glossiness of the brick surface is 55 degrees, wherein the operations are as follows: dropping the polishing solution E on the brick surface by a dropper, wherein the dropping amount is 60g/m2(ii) a The polishing was carried out under a pressure of 45MPA, a polishing linear speed of 50.68HZ and a rotational speed of 900 r/min.
The results of the performance tests of examples 1-4 are as follows:
the tiles of examples 1-4 were respectively washed 10000 times according to GB/T9266-.
According to GB/T3810.14-2006 ceramic tile test method, section 14: the stain resistance was measured by the following procedure: the antifouling properties of examples 1 to 4 were measured by leaving the blue ink, black ink, red ink, blue marker, black marker, and red marker on the surface of the tile produced in examples 1 to 4 for 60 minutes, and then gently wiping the tile with water and a rag.
| Formaldehyde removal rate/%) | Antifouling rating | Gloss/degree of brick surface | Brick surface effect | |
| Example 1 | 82 | Rub off the pollution, five grades | 97 | Soft but not slippery, without secondary injury caused by sharp phenomena such as hand pricking |
| Example 2 | 85 | Rub off the pollution, five grades | 98 | Soft but not slippery, without secondary injury caused by sharp phenomena such as hand pricking |
| Example 3 | 90 | Rub off the pollution, five grades | 95 | Soft but not slippery, without secondary injury caused by sharp phenomena such as hand pricking |
| Example 4 | 93 | Rub off the pollution, five grades | 100 | Soft but not slippery, without secondary injury caused by sharp phenomena such as hand pricking |
In conclusion, the preparation method disclosed by the invention wraps the photocatalytic materials such as copper-doped bismuth vanadate, platinum-doped titanium oxide, nano-magnesium oxide and nano-zinc oxide by high-temperature-resistant alumina and silicon oxide, is used for improving the high-temperature resistance of the photocatalytic materials, introduces the wrapped photocatalytic materials into the photocatalytic glaze and polishing solution, ensures that the formaldehyde removal rate of the prepared formaldehyde-removing ceramic tile is still up to 82-93% after the prepared formaldehyde-removing ceramic tile is washed for 10000 times, has the characteristics of good formaldehyde removal, good durability, good adhesive force and the like, has an ultra-clean and bright brick surface, has the glossiness of 95-100 degrees, has excellent apparent quality, can meet the requirement of consumers on the attractiveness of the ceramic tile, can meet the requirement of the consumers on the formaldehyde in the purified air, and is beneficial to large-scale application and popularization.
It should be understood that equivalents and modifications of the technical solution and inventive concept thereof may occur to those skilled in the art, and all such modifications and alterations should fall within the protective scope of the present invention.
Claims (9)
1. The preparation method of the formaldehyde-removing ceramic tile is characterized by comprising the following steps:
s1, preparing a photocatalytic material A: mixing copper-doped bismuth vanadate, platinum-doped titanium oxide, nano zinc oxide, nano magnesium oxide, a suspending agent, a binder and water into a ball mill for ball milling to obtain a photocatalytic material A;
s2, preparing a photocatalytic packaging material B: mixing alumina and silica, spraying the photocatalytic material A on the surfaces of the alumina and the silica which are uniformly mixed, drying, calcining and crushing to obtain a photocatalytic coating material B;
s3, preparing a photocatalytic glaze material C: mixing the photocatalytic packaging material B, the fusion cake, the calcined talc, the albite, the potash feldspar, the wollastonite powder, the ball clay, the nepheline powder, the quartz, the calcium carbonate, the zinc oxide, the suspending agent, the binder and the water into a ball mill for ball milling to obtain a photocatalytic glaze material C;
s4, preparing a cover glaze D;
s5, preparing polishing solution E: mixing the nano silica sol and the photocatalytic material A to obtain polishing solution E;
s6, glazing: applying the overglaze D on the brick surface; applying a photocatalytic glaze material C on the overglaze D; drying, firing and forming;
s7, polishing: performing secondary polishing on the brick surface ground and the first polishing in the step S6 by using polishing solution E;
the frit comprises the following components in parts by weight: 15-20 parts of silicon oxide, 50-55 parts of aluminum oxide, 0.1-0.5 part of iron oxide, 3-5 parts of titanium oxide, 11-12 parts of calcium oxide, 6-9 parts of magnesium oxide, 1-2 parts of sodium oxide, 1-2 parts of potassium oxide, 3-4 parts of barium oxide and 1-1.5 parts of zinc oxide.
2. The method for preparing formaldehyde-removing ceramic tile according to claim 1, wherein the photocatalytic material A in step S1 comprises the following components in weight portion: 5-8 parts of copper-doped bismuth vanadate, 1-2 parts of platinum-doped titanium oxide, 12-16 parts of nano zinc oxide, 10-15 parts of nano magnesium oxide, 0.15-0.2 part of suspending agent, 0.4 part of binder and 100 parts of water.
3. The method for preparing formaldehyde-removing ceramic tile according to claim 1, wherein the photocatalytic coating material B in step S2 comprises the following components in weight portion: 50-60 parts of aluminum oxide, 40-50 parts of silicon oxide and 30-40 parts of photocatalytic material A.
4. The method for preparing formaldehyde-removing ceramic tile according to claim 1, wherein the photocatalytic glaze C in step S3 comprises the following components in weight portion: 2-5 parts of photocatalytic wrapping material B, 10-13 parts of frit, 10-15 parts of calcined talc, 20-25 parts of albite, 5-8 parts of potassium feldspar, 20-25 parts of wollastonite powder, 8-10 parts of ball clay, 5-8 parts of nepheline powder, 8-10 parts of quartz, 11-15 parts of calcium carbonate, 2-5 parts of zinc oxide, 0.15-0.2 part of suspending agent, 0.4 part of binder and 30 parts of water.
5. The preparation method of the formaldehyde-removing ceramic tile according to claim 1, wherein the material subjected to ball milling in the step S1 needs to be sieved by a 600-mesh sieve, the balance of the sieve is 0.3-0.5%, and the specific gravity of the glaze slip is 1.0-1.10; the material crushed in the step S2 needs to be sieved by a 325-mesh sieve, and the sieve allowance is 0.1-0.2%; the ball-milled material obtained in the step S3 needs to be sieved by a 400-mesh sieve, and the sieve allowance is 0.3-0.5%; the specific gravity of the glaze slip is 1.48-1.50.
6. The method for preparing formaldehyde-removing ceramic tile according to claim 1, wherein the amount of the overglaze D applied in step S6 is 500-600 g/m3The application amount of the photocatalytic glaze material C is 300-400 g/m3(ii) a And firing and forming at 1100-1150 ℃ for 54 min.
7. The method for preparing the formaldehyde-removing tile according to claim 1, wherein the weight ratio of the nano silica sol of the polishing solution E and the photocatalytic material A in the step S5 is (8-9) to (1-2).
8. The method for preparing formaldehyde-removing ceramic tile according to claim 7, wherein the step S7 comprises the following steps: the glossiness of the brick surface after the first polishing is 45-55 degrees, and then a dropper is used for dropping the polishing solution E on the brick surface, wherein the dropping amount is 50-60 g/m2(ii) a And performing polishing under the conditions that the pressure is 42-45 MPA, the polishing linear speed is 50.68HZ and the rotating speed is 900 r/min.
9. The formaldehyde removing tile is characterized by being prepared by the preparation method of the formaldehyde removing tile as claimed in any one of claims 1 to 8, and sequentially comprising the following components from bottom to top: a brick layer, a surface glaze layer, a photocatalytic glaze layer and a bright surface layer; the overglaze layer is formed by applying overglaze D; the photocatalytic glaze layer is formed by applying photocatalytic glaze C; the bright surface layer is formed by polishing and pressing polishing liquid E.
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| CN114180837A (en) * | 2021-11-24 | 2022-03-15 | 亚细亚建筑材料股份有限公司 | Glaze for degrading formaldehyde in air |
| CN113999057B (en) * | 2021-12-28 | 2022-04-08 | 佛山市陶莹新型材料有限公司 | Formaldehyde-removing ceramic tile and preparation method thereof |
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