CN113213761A - High-hardness full-polishing glaze - Google Patents

High-hardness full-polishing glaze Download PDF

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Publication number
CN113213761A
CN113213761A CN202010081593.4A CN202010081593A CN113213761A CN 113213761 A CN113213761 A CN 113213761A CN 202010081593 A CN202010081593 A CN 202010081593A CN 113213761 A CN113213761 A CN 113213761A
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CN
China
Prior art keywords
glaze
hardness
polishing
full
mass fraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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CN202010081593.4A
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Chinese (zh)
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程家麒
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Individual
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Individual
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Priority to CN202010081593.4A priority Critical patent/CN113213761A/en
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/04—Frit compositions, i.e. in a powdered or comminuted form containing zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/22—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions containing two or more distinct frits having different compositions

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)

Abstract

The invention discloses a high-hardness full-polishing glaze, which effectively improves the addition amount of a silicon oxide simple substance and an aluminum oxide simple substance in a glaze formula and the mass fraction of the sum of the silicon oxide and the aluminum oxide in the formula components due to the adoption of a frit with the mass fraction of more than 50%, thereby improving the hardness of a glaze layer and better solving the defect of low hardness of a full-polishing floor tile.

Description

High-hardness full-polishing glaze
Technical Field
The invention relates to a high-hardness full-polishing glaze, belongs to the field of architectural ceramics, and is particularly suitable for polishing tiles with requirements on the hardness of floor tile glaze in families and public places.
Background
At present, the fully-glazed floor tiles are the mainstream of the floor tile industry due to the characteristics of simple production process, rich colors and smooth and bright glaze, but compared with polished tiles, the fully-glazed floor tiles have the biggest defect of lower hardness, most of the fully-glazed floor tiles have the Mohs hardness of 4-4.5 grade, and the polished tiles have the Mohs hardness of 6 grade, so that the fully-glazed floor tiles are limited in application in some public occasions.
Disclosure of Invention
The invention provides a high-hardness full-polishing glaze for improving the defects of the prior art, and the scheme is as follows:
the glaze material has the components including oxide in the weight fraction, silica and alumina in the total amount of over 76%, and frit in the glaze material formula in the weight fraction of over 50%. The sum of the mass fractions of the silicon oxide simple substance and the aluminum oxide simple substance in the glaze formula is more than or equal to 8 percent.
The simple substance of alumina in the formula of the high-hardness full-polishing glaze comprises various isomerous isomers of alumina and various isomerous isomers of corundum, and the simple substance of silica comprises various isomerous isomers of quartz and silica.
In the formula glaze of the high-hardness full-polishing glaze, the sum of the mass fractions of silicon oxide and aluminum oxide is preferably more than 77% in terms of the mass fraction of oxides.
The frit mass fraction in the formula of the high-hardness full-polishing glaze is more than or equal to 55%.
The frit in the glaze formula of the high-hardness full-polishing glaze comprises the following components in percentage by mass of oxides: SiO 2260-68%、Al2O3 5-12%、CaO 15-18%、MgO 1-3%、K2O 2-4%、Na2O 0-1%、ZnO 0-6%、BaO 0-6%。
The high-hardness full-polishing glaze comprises the following components in percentage by mass of oxides: SiO 22 60-68%、Al2O3 5-12%、CaO 15-18%、MgO 1-3%、K2O 2-4%、Na20-1% of O, 0-6% of ZnO and 0-6% of BaO are one or the combination of more than two kinds of frits.
According to the high-hardness full-polishing glaze, the sum of the mass fractions of the simple substance of silicon oxide and the simple substance of aluminum oxide in the formula of the glaze is more than or equal to 9%.
The high-hardness full-polishing glaze comprises the following components in percentage by mass of oxides: SiO 22 55-65%、Al2O3 15-25%、CaO 9-15%、MgO 1-3%、K2O 2-4%、Na2O 0-4%、ZnO 0-5%、BaO 0-6%。
In the formula system of the ceramic glaze, silicon oxide and aluminum oxide are networks, alkali metal oxide and alkaline earth metal oxide are fluxes, and the alkali metal oxide and the alkaline earth metal oxide destroy the network structure of the networks at high temperature so as to reduce the melting temperature of the glaze and sinter the glaze, so that the higher the content ratio of the silicon oxide to the aluminum oxide in the glaze, the higher the hardness of the glaze is, but the sintering temperature is increased.
In long-term experiments, the fluxing effect of the frit is far greater than that of raw materials, which benefits from the fact that some raw materials such as barium carbonate are weak fluxing agents when being added in the form of barium carbonate, but become strong fluxing agents in the form of barium oxide after being melted at high temperature in the frit, so that the frit-based formula system can improve the mass fraction of silicon oxide and aluminum oxide to the maximum extent, and the effect of improving the strength of the glaze is achieved.
Compared with the prior art, the high-hardness full-polishing glaze material adopting the technology has the following advantages that:
1. the Mohs hardness of the glaze after firing is more than or equal to 4.5 grade.
2. The pores are less after the glaze is fired.
3. The glaze has simple formula and stable components, and can save production cost.
The specific embodiment is as follows:
the present invention is described in detail below with reference to examples:
example 1:
fusion cake 1: the mass fraction of the oxide components is as follows: SiO 22 65-68%、Al2O3 5-8%、CaO 16-18%、
MgO 1-3%、K2O 1-3%、Na2O 0-2%、ZnO 4-6%。
The formula of the high-hardness full-polishing glaze material is as follows:
A1 A2 A3 A4 A5 A6 A7 A8
feldspar 20 20 20 20 10 10
Washing kaolin 7 7 7 7 7 7 7 7
Alumina/corundum 15 10 10 5 15 10 10 10
Quartz 5 10 5 5 10 10
Zinc oxide 1.5 1.5
Frit 1 60 60 60 60 65 70 70 75
Mohs hardness ≥4.5 ≥4.5 ≥5 ≥5 ≥5 ≥5 ≥5 ≥5
Example 2:
and (3) fusion cake 2: the mass fraction of the oxide components is as follows: SiO 22 65-68%、Al2O3 5-8%、CaO 15-17%、
MgO 1-3%、K2O 1-3%、Na2O 0-2%、ZnO 2-3%、BaO 4-5%。
The formula of the high-hardness full-polishing glaze material is as follows:
B1 B2 B3 B4 B5 B6 B7 B8
feldspar 20 20 20 20 10 10
Washing kaolin 7 7 7 7 7 7 7 7
Alumina/corundum 15 10 10 5 15 10 10 10
Quartz 5 10 5 5 10 10
Zinc oxide 2 1 1 1 2 1 1 1
Frit 2 60 60 60 60 65 70 70 75
Mohs hardness ≥4.5 ≥4.5 ≥5 ≥5 ≥5 ≥5 ≥5 ≥5
Example 3:
fusion cake 3: the mass fraction of the oxide components is as follows: SiO 22 65-68%、Al2O3 5-8%、CaO 15-17%、
MgO 1-3%、K2O 1-3%、Na2O 0-2%、ZnO 0-0.5%、BaO 5-7%。
The formula of the high-hardness full-polishing glaze material is as follows:
C1 C2 C3 C4 C5 C6 C7 C8
feldspar 20 20 20 20 10 10
Washing kaolin 7 7 7 7 7 7 7 7
Alumina/corundum 15 10 10 5 15 10 10 10
Quartz 5 10 5 5 10 10
Zinc oxide 2 1 1 1 2 1 1 1
Frit 3 60 60 60 60 65 70 70 75
Mohs hardness ≥4.5 ≥4.5 ≥5 ≥5 ≥5 ≥5 ≥5 ≥5
Example 4:
and (4) fusion cake: the mass fraction of the oxide components is as follows: SiO 22 58-62%、Al2O3 12-15%、CaO
22-25%、MgO 1-3%、K2O 0-1%、Na2O 0-1%。
And (5) fusion cake: the mass fraction of the oxide components is as follows: SiO 22 62-66%、Al2O3 5-8%、CaO 10-15%、
MgO 3-5%、K2O 0-1%、Na2O 10-12%。
The formula of the high-hardness full-polishing glaze material is as follows:
D1 D2 D3 D4 D5 D6
feldspar 20 10 20 10
Washing kaolin 7 7 7 7 7 7
Alumina/corundum 5 6 7 5 6 7
Quartz 5 8 13 5 8 13
Zinc oxide 1 1 1
Frit 4 50 50 50 50 50 50
Frit 5 10 16 20 10 16 16
Mohs hardness ≥5 ≥5 ≥5 ≥5 ≥5 ≥5
Example 5:
and (4) fusion cake: the mass fraction of the oxide components is as follows: SiO 22 58-62%、Al2O3 12-15%、CaO
22-25%、MgO 1-3%、K2O 0-1%、Na2O 0-1%。
And (5) fusion cake: the mass fraction of the oxide components is as follows: SiO 22 62-66%、Al2O3 5-8%、CaO 10-15%、
MgO 3-5%、K2O 0-1%、Na2O 10-12%。
And (6) fusion cake: the mass fraction of the oxide components is as follows: SiO 22 40-50%、Al2O3 15-18%、CaO
12-20%、MgO 3-5%、K2O 0-1%、Na2O 0-1%、BaO 12-20%。
The formula of the high-hardness full-polishing glaze material is as follows:
E1 E2 E3 E4 E5 E6 E7 E8 E9
feldspar 20 10 20 10 20 10
Washing kaolin 7 7 7 7 7 7 7 7 7
Alumina/corundum 6 7 8 5 6 7 5 6 7
Quartz 6 9 14 10 14 18 10 14 18
Frit 4 40 40 40 30 30 30 30 30 30
Frit 5 8 14 18 5 10 15
Frit 6 10 10 10 20 20 20 25 30 35
Mohs hardness ≥5 ≥5 ≥5 ≥5 ≥5 ≥5 ≥5 ≥5 ≥5
The changes made in the formula of the above examples by adding zinc oxide, barium carbonate and the like are all
The scope of the invention.

Claims (8)

1. The high-hardness full-polishing glaze is characterized in that the sum of the mass fractions of silicon oxide and aluminum oxide in the glaze components is greater than 76% by mass fraction of oxides, the mass fraction of frit in the glaze formula is greater than or equal to 50%, and the sum of the mass fractions of silicon oxide simple substance and aluminum oxide simple substance in the glaze formula is greater than or equal to 8%.
2. The high-hardness full-polishing glaze according to claim 1, wherein the simple substance of alumina in the glaze formulation comprises various isomerous isomers of alumina and various isomerous isomers of corundum, and the simple substance of silica comprises various isomerous isomers of quartz and silica.
3. The high-hardness full-polishing glaze material as claimed in claim 1, wherein the sum of the mass fractions of silicon oxide and aluminum oxide in the glaze material composition is greater than 77% in terms of mass fraction of oxides.
4. The high-hardness full-polishing glaze according to claim 1, wherein the mass fraction of the frit in the glaze formulation is greater than or equal to 55%.
5. The high-hardness full-polishing glaze according to claims 1 and 4, wherein the frit in the glaze formulation comprises, in mass fraction of oxides: SiO 22 60-68%、Al2O3 5-12%、CaO 15-18%、MgO 1-3%、K2O 2-4%、Na2O 0-1%、ZnO 0-6%、BaO 0-6%。
6. The high-hardness full-polishing glaze according to claims 1, 4 and 5, characterized in that it comprises, in terms of oxide mass fraction: SiO 22 60-68%、Al2O3 5-12%、CaO 15-18%、MgO 1-3%、K2O 2-4%、Na20-1% of O, 0-6% of ZnO and 0-6% of BaO are one or the combination of more than two kinds of frits.
7. The high-hardness full-polishing glaze material as claimed in claim 1 and 2, wherein the sum of the mass fractions of the simple substance of silicon oxide and the simple substance of aluminum oxide in the glaze material formula is greater than or equal to 9%.
8. The high-hardness full-polishing glaze according to claim 1, wherein the composition of the glaze layer after firing of the glaze comprises, in terms of mass fraction of oxides: SiO 22 55-65%、Al2O3 15-25%、CaO 9-15%、MgO 1-3%、K2O 2-4%、Na2O 0-4%、ZnO 0-5%、BaO 0-6%。
CN202010081593.4A 2020-02-06 2020-02-06 High-hardness full-polishing glaze Pending CN113213761A (en)

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Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
CN113213761A true CN113213761A (en) 2021-08-06

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2743840A1 (en) * 1977-09-29 1979-04-05 Pfaelzische Emailschmelze Rolf PROCESS FOR THE PRODUCTION OF A HIGHLY ABRASION-RESISTANT, ACID-RESISTANT, ENAMELLED OR GLAZED COVERING ON A METAL OR PORCELAIN AND STONE WELL SURFACE, AS WELL AS OBJECTS COATED WITH SUCH COATING
US5348914A (en) * 1992-06-17 1994-09-20 Ferro Corporation Granular materials, a process for their production and their use
US6132832A (en) * 1998-05-07 2000-10-17 Ferro Corporation Tile glaze
WO2012003792A1 (en) * 2010-07-08 2012-01-12 景德镇陶瓷学院 Medium-low temperature sintered fine bone china and manufacturing method thereof
CN107417115A (en) * 2017-07-17 2017-12-01 佛山市简陶瓷有限公司 A kind of preparation method of high-hardness, wearable glaze
CN108328927A (en) * 2018-05-07 2018-07-27 惠达卫浴股份有限公司 A kind of ultra-smooth white glaze and preparation method
KR20190070440A (en) * 2017-12-13 2019-06-21 한국세라믹기술원 Glaze composition for high hardness glaze layer and manufacturing method of ceramic floor tile having excellent scratch resistance using the composition

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2743840A1 (en) * 1977-09-29 1979-04-05 Pfaelzische Emailschmelze Rolf PROCESS FOR THE PRODUCTION OF A HIGHLY ABRASION-RESISTANT, ACID-RESISTANT, ENAMELLED OR GLAZED COVERING ON A METAL OR PORCELAIN AND STONE WELL SURFACE, AS WELL AS OBJECTS COATED WITH SUCH COATING
US5348914A (en) * 1992-06-17 1994-09-20 Ferro Corporation Granular materials, a process for their production and their use
US6132832A (en) * 1998-05-07 2000-10-17 Ferro Corporation Tile glaze
WO2012003792A1 (en) * 2010-07-08 2012-01-12 景德镇陶瓷学院 Medium-low temperature sintered fine bone china and manufacturing method thereof
CN107417115A (en) * 2017-07-17 2017-12-01 佛山市简陶瓷有限公司 A kind of preparation method of high-hardness, wearable glaze
KR20190070440A (en) * 2017-12-13 2019-06-21 한국세라믹기술원 Glaze composition for high hardness glaze layer and manufacturing method of ceramic floor tile having excellent scratch resistance using the composition
CN108328927A (en) * 2018-05-07 2018-07-27 惠达卫浴股份有限公司 A kind of ultra-smooth white glaze and preparation method

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
中国硅酸盐学会陶瓷分会建筑卫生陶瓷专业委员会等: "《现代建筑卫生陶瓷技术手册》", 30 April 2010, 中国建材工业出版社 *
殷敏: "高硬度全抛釉的研制", 《中国优秀硕士学位论文全文数据库工程科技Ⅰ辑》 *

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Application publication date: 20210806