CN113204125A - Beam splitting ratio adjustable beam splitter - Google Patents
Beam splitting ratio adjustable beam splitter Download PDFInfo
- Publication number
- CN113204125A CN113204125A CN202110509918.9A CN202110509918A CN113204125A CN 113204125 A CN113204125 A CN 113204125A CN 202110509918 A CN202110509918 A CN 202110509918A CN 113204125 A CN113204125 A CN 113204125A
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- China
- Prior art keywords
- splitting ratio
- beam splitter
- glass substrates
- film
- medium
- Prior art date
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- 239000011521 glass Substances 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 239000000463 material Substances 0.000 claims abstract description 21
- 239000005083 Zinc sulfide Substances 0.000 claims description 4
- 230000007423 decrease Effects 0.000 claims description 4
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical group [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 4
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 4
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 4
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical group [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 4
- 239000003989 dielectric material Substances 0.000 claims 3
- 238000005516 engineering process Methods 0.000 abstract description 2
- 238000002310 reflectometry Methods 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Abstract
The invention discloses a beam splitter with adjustable beam splitting ratio, which comprises glass substrates which are symmetrically arranged, wherein one opposite sides of the glass substrates on two sides are provided with conducting layers, the inner surfaces of the conducting layers are sequentially plated with a first medium film surface and a second medium film surface, medium materials are filled around the space between the second medium film surfaces on the two opposite sides, an air film is formed between the second medium film surfaces, a voltage source is connected between the conducting layers on the two sides, the attraction force between the glass substrates is changed by changing the voltage applied to the glass substrates through a direct current power supply, the elastic medium materials are deformed, the thickness of the air film between the glass substrates is changed, the thickness of the air film is reduced along with the increase of the voltage, and the adjustment of any beam splitting ratio is realized. The invention adjusts the beam splitting ratio of the beam splitter based on the multilayer dielectric film interference principle, and has mature technology, simple structure, low cost and high reliability; the beam splitting ratio is controlled by adopting direct current voltage, and the operation is simple.
Description
Technical Field
The invention relates to a beam splitter, in particular to a beam splitter with an adjustable beam splitting ratio.
Background
The beam splitter is an important element of an optical system, and is generally made of coated optical glass. The beam splitter can make a part of light penetrate through the lens and reflect the rest light to divide a beam into two beams. The beam splitter is widely used in various optical research and use occasions such as an interferometer for teaching, a laser interferometer for research, polarized light research, optical fiber communication and the like. In the interference of light, the closer the light intensity of the two beams of light is, the better the interference effect is. Therefore, the main application of the beam splitter is to divide the laser beam equally at a ratio of 50:50, which is commonly known as a half mirror.
However, there are also cases where a beam splitter is required to flexibly adjust the ratio of transmission to reflection. For example, a laser beam is divided into a plurality of beams equally to form multi-beam interference; for example, in holography, object light is the reflected light of an object, and in order to achieve a good interference effect, the light irradiated on the object is required to be relatively strong with respect to a reference light. These situations require a beam splitter that allows for flexible adjustment of the splitting ratio.
Disclosure of Invention
The purpose of the invention is as follows: the invention aims to provide a beam splitter with an adjustable beam splitting ratio, which can adjust the ratio of incident light to reflected light when a laser light source is split.
The technical scheme is as follows: the invention comprises symmetrically arranged glass substrates, wherein one opposite side of the glass substrates at two sides is a conductive layer, the inner surface of the conductive layer is sequentially plated with a first medium film surface and a second medium film surface, the periphery of a space between the second medium film surfaces at two opposite sides is filled with medium materials, an air film is formed between the second medium film surfaces, and a voltage source is connected between the conductive layers at two sides.
The first medium film surface is a film material with low refractive index.
The first medium film surface is magnesium fluoride.
The second medium film surface is made of a high-refractive-index film material.
The second medium film surface is zinc sulfide.
The thickness of the first medium film surface and the second medium film surface is at least 0.1 μm.
The medium material is an elastic medium material, the voltage applied on the glass substrates is adjusted through a direct current power supply, the attraction force between the glass substrates is changed, the elastic medium material is deformed, and the thickness of an air film between the glass substrates is changed.
The voltage source is a direct current voltage source.
The direct current voltage source adjusts the voltage applied on the glass substrates, changes the attraction force between the glass substrates, enables the elastic medium material to deform, and changes the thickness of the air film between the glass substrates.
The thickness of the air film decreases as the voltage increases.
Has the advantages that: the invention adjusts the beam splitting ratio of the beam splitter based on the multilayer dielectric film interference principle, and has mature technology, simple structure, low cost and high reliability; the beam splitting ratio is controlled by adopting direct current voltage, and the operation is simple.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a graph of the transmittance of a beamsplitter versus air film thickness in accordance with the present invention.
Detailed Description
The invention will be further explained with reference to the drawings.
As shown in figure 1, the invention comprises two glass substrates 1 which are symmetrically arranged, wherein one opposite side of each glass substrate 1 at two sides is a conductive layer 2, a first medium film surface and a second medium film surface are sequentially plated on the inner surface of the conductive layer 2, the first medium film surface is a low-refractive-index film system material magnesium fluoride 3, the second medium film surface is a high-refractive-index film system material zinc sulfide 4, wherein the refractive index of the zinc sulfide 4 is 2.4, the thickness is 0.1 mu m, the refractive index of the magnesium fluoride 3 is 1.3, and the thickness is 0.1 mu m. The second medium film surfaces between the two glass substrates 1 are parallel and opposite, the periphery of the space between the second medium film surfaces is filled with an elastic medium material 5, an air film 6 with a certain thickness is formed between the two glass substrates 1, and the original thickness of the air film 6 is designed to be 1 mu m. The positive and negative electrodes of the DC voltage source 7 are connected to the conductive layers 2 of the two glass substrates 1.
A laser light source with the wavelength of 632.8nm is used to be incident on the glass substrate 1 at an angle of 45 degrees, and according to the interference principle of the multilayer dielectric film, a part of light is reflected, a part of light is transmitted, and a beam of light is divided into two beams. The voltage applied to the conductive glass substrates is adjusted by the direct-current voltage source 7, the attraction force between the two glass substrates 1 is changed, the elastic medium material 5 is deformed, the thickness of the air film 6 between the glass substrates 1 is changed, the reflectivity of incident light is changed, and finally the beam splitting ratio of the beam splitter is changed, so that the controllable and adjustable beam splitting ratio of the beam splitter is realized. Such as: when the voltage is zero, the thickness of the air layer is h1, the reflectivity is 50%, and the beam splitting ratio is 1: 1; as the voltage was increased, the air layer thickness became h2, with a reflectivity of 1%, at a beam splitting ratio of 99: 1; theoretically, a beam splitting ratio of 1 to infinity can be achieved as long as the reflectivity varies from 0 to 50%.
As the voltage increases, the thickness of the air film 6 decreases, and as shown in fig. 2, the transmittance of the transmitted light may gradually decrease from 0.88 to 0, and an arbitrary splitting ratio may be realized. For example, if the splitting ratio of the stronger light to the weaker light in the two beams is 3, the transmittance can be 75% and the reflectance can be 25%, and if the thickness of the air layer in fig. 2 is 0.78 μm, the voltage is adjusted to adjust the thickness of the air layer to 0.78 μm; if the fraction ratio is 1, the transmittance can be 50%, and the reflectance can be 50%, adjusting the voltage to make the thickness of the air layer 0.72 μm; if the splitting ratio is required to be 9, the transmittance is 10% and the reflectance is 90%, the voltage is adjusted so that the thickness of the air layer becomes 0.66 μm.
The dielectric film system of the present invention may be represented by glahlg, wherein G represents glass, H represents a high refractive index material layer, L represents a low refractive index material layer, and a represents an air layer. A program is designed by using a matrix calculation method of the optical characteristics of the film system, and a curve of the reflectivity changing along with the thickness of the air layer is simulated. According to the theory of multilayer dielectric films, materials with high and low refractive indexes with the largest difference of refractive indexes are selected, so that the reflectivity is obviously changed. During simulation, the thickness of the high-refractive-index material and the low-refractive-index material is artificially adjusted, so that the reflectivity of the beam splitter is as large as possible along with the thickness change range of the air film and is close to a linear relation, thus realizing a beam splitting ratio in a larger range in the adjusting process and gradually changing the beam splitting ratio along with the thickness of the air film.
Claims (10)
1. The beam splitter with the adjustable beam splitting ratio is characterized by comprising glass substrates (1) which are symmetrically arranged, wherein one opposite sides of the glass substrates (1) on two sides are provided with conducting layers (2), the inner surfaces of the conducting layers (2) are sequentially plated with a first medium film surface and a second medium film surface, the periphery of a space between the opposite second medium film surfaces on the two sides is filled with medium materials, an air film (6) is formed between the second medium film surfaces, and a voltage source is connected between the conducting layers (2) on the two sides.
2. The beam splitter of claim 1, wherein the first dielectric film surface is a low refractive index film material.
3. The beam splitter mirror with adjustable splitting ratio of claim 1 or 2, wherein the first dielectric film surface is magnesium fluoride (4).
4. The beam splitter of claim 1, wherein the second dielectric film surface is a high index film material.
5. The beam splitter mirror with adjustable splitting ratio of claim 1 or 4, wherein the second dielectric film surface is zinc sulfide (3).
6. The adjustable beam splitting ratio beamsplitter of claim 1 wherein the first dielectric film side and the second dielectric film side have a thickness of at least 0.1 μm.
7. The adjustable beam splitting ratio beam splitter as claimed in claim 1, wherein said dielectric material is an elastic dielectric material (5).
8. The adjustable beam splitting ratio beam splitter as claimed in claim 1, wherein said voltage source is a dc voltage source (7).
9. The beam splitter mirror with adjustable splitting ratio of claim 8, wherein the DC voltage source (7) adjusts the voltage applied to the glass substrates (1) to change the attractive force between the glass substrates (1) and deform the elastic dielectric material (5) to change the thickness of the air film (6) between the glass substrates (1).
10. Beam splitter adjustable in splitting ratio according to claim 1, characterized in that the thickness of the air film (6) decreases with increasing voltage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110509918.9A CN113204125A (en) | 2021-05-11 | 2021-05-11 | Beam splitting ratio adjustable beam splitter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110509918.9A CN113204125A (en) | 2021-05-11 | 2021-05-11 | Beam splitting ratio adjustable beam splitter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113204125A true CN113204125A (en) | 2021-08-03 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110509918.9A Pending CN113204125A (en) | 2021-05-11 | 2021-05-11 | Beam splitting ratio adjustable beam splitter |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1417617A (en) * | 2001-11-01 | 2003-05-14 | 鸿富锦精密工业（深圳）有限公司 | Intelligent film filter |
| CN1424593A (en) * | 2002-12-24 | 2003-06-18 | 中国科学院上海技术物理研究所 | Double layer orderless super narrow bandpass optical film filter |
| CN1492259A (en) * | 2003-09-04 | 2004-04-28 | 上海理工大学 | Method for producing tunable optical fiber attenuator |
| CN103963711A (en) * | 2013-02-01 | 2014-08-06 | 宁波昊达汽车科技有限公司 | Semi-transmittance and semi-reflection type anti-dazzling electronic rearview mirror lens |
| CN204166153U (en) * | 2014-11-14 | 2015-02-18 | 孟繁有 | A kind of spectro-film and beam splitter |
| CN112161952A (en) * | 2020-09-15 | 2021-01-01 | 南京信息职业技术学院 | Liquid refractive index measuring method and device based on interference filter |
-
2021
- 2021-05-11 CN CN202110509918.9A patent/CN113204125A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1417617A (en) * | 2001-11-01 | 2003-05-14 | 鸿富锦精密工业（深圳）有限公司 | Intelligent film filter |
| CN1424593A (en) * | 2002-12-24 | 2003-06-18 | 中国科学院上海技术物理研究所 | Double layer orderless super narrow bandpass optical film filter |
| CN1492259A (en) * | 2003-09-04 | 2004-04-28 | 上海理工大学 | Method for producing tunable optical fiber attenuator |
| CN103963711A (en) * | 2013-02-01 | 2014-08-06 | 宁波昊达汽车科技有限公司 | Semi-transmittance and semi-reflection type anti-dazzling electronic rearview mirror lens |
| CN204166153U (en) * | 2014-11-14 | 2015-02-18 | 孟繁有 | A kind of spectro-film and beam splitter |
| CN112161952A (en) * | 2020-09-15 | 2021-01-01 | 南京信息职业技术学院 | Liquid refractive index measuring method and device based on interference filter |
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Application publication date: 20210803 |
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