CN113182691A - Method for preparing super-hydrophobic film by using femtosecond laser etching coating machine substrate - Google Patents
Method for preparing super-hydrophobic film by using femtosecond laser etching coating machine substrate Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/3568—Modifying rugosity
- B23K26/3584—Increasing rugosity, e.g. roughening
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2202/00—Metallic substrate
- B05D2202/10—Metallic substrate based on Fe
- B05D2202/15—Stainless steel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2203/00—Other substrates
- B05D2203/30—Other inorganic substrates, e.g. ceramics, silicon
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2203/00—Other substrates
- B05D2203/30—Other inorganic substrates, e.g. ceramics, silicon
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Abstract
The invention discloses a method for preparing a super-hydrophobic film by using femtosecond laser to etch a coating machine substrate, which comprises the following steps: fixing a coating machine substrate on a three-dimensional precision moving platform, focusing femtosecond laser on the surface of the coating machine substrate through a microscope objective, controlling the three-dimensional precision moving platform to move, focusing the femtosecond laser on the surface of the coating machine substrate for etching, adjusting the moving speed of the three-dimensional precision moving platform to repeat the etching to obtain a coating machine micro-nano substrate, forming a film on the surface of the coating machine substrate in a solution coating or melt deposition mode, and drying after solidification to obtain the super-hydrophobic film with a 3D micro-texture structure on the surface. According to the invention, the femtosecond laser is adopted to etch the hard base material of the coating machine to obtain the micro-nano base material, and then the film is formed on the surface of the micro-nano base material to obtain the 3D micro texture structure, so that the contact angle of liquid drops is increased, the hydrophobic property of the film is greatly improved, and the coating machine can be used for film distillation materials, glass curtain walls, field photoelectric instruments or precision instruments.
Description
Technical Field
The invention relates to a preparation method of a super-hydrophobic film, in particular to a method for preparing a super-hydrophobic film by using a femtosecond laser etching coating machine substrate.
Background
The nanostructured surface exhibits a higher static water contact angle and strong water adhesion, since the horizontal arrangement of the nanostructures on the surface of the film creates more solid-liquid interfaces, increasing the adhesion of water, and the combination of the microstructures and nanostructures on the surface of the film can significantly reduce the adhesion of water. One of the common methods to increase the surface roughness of materials is to create a uniform micro-texture on the surface of the film by using a templated substrate, Polydimethylsiloxane (PDMS) is widely used for templated substrates, and some cast PVDF films on PDMS molds, with textured PVDF films having a static water contact angle of 166 °, a sliding angle of 15.8 °, while ordinary PVDF films possess a lower static water contact angle (139.2 °) and a larger sliding angle (>90 °). However, since the process of producing the PDMS mold is relatively complicated, the casting and application of the film based on the micro-texture are limited.
One has synthesized 3D micro-textured PVDF films by direct casting on different templated microstructured substrates, using 5000 mesh fabrics and non-woven fabrics as templated micro-substrates, with different widths and depths of the micro-valleys, the resulting PVDF film with non-woven templated substrates shows high average surface roughness, enhanced fluid shear near the surface of the film, dirt is difficult to adhere to, the film also shows superhydrophobicity, static water contact angles up to 156 °, dynamic sliding angles as low as 5 °. However, when the polymer solution is coated on a template substrate to prepare a super-hydrophobic film, the film is difficult to separate from the fabric after being subjected to a water bath or an alcohol bath, and the 3D micro texture structure of the surface of the prepared film is uncontrollable.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention aims to provide a method for preparing a super-hydrophobic film by using femtosecond laser to etch a coating machine substrate, which combines a femtosecond laser three-dimensional micro-nano processing technology with a coating machine hard substrate, endows the coating machine hard substrate with a 3D micro texture structure required, improves the hydrophobicity of the film, and has the advantages of simple process operation and low cost.
In order to achieve the purpose, the invention adopts the technical scheme that:
a method for preparing a super-hydrophobic film by using a femtosecond laser etching coating machine substrate comprises the following steps:
(1) fixing a coating machine base material on a three-dimensional precision moving platform, and focusing the coating machine base material on the surface of the coating machine base material through a microscope objective by adopting a femtosecond laser with the pulse width of 40-160 fs and the wavelength of 338-1100 nm;
(2) controlling the moving speed of the three-dimensional precise moving platform to be 0.2 mu m/s-0.5 mm/s, controlling the single pulse energy of the femtosecond laser to be 15 nJ-5 mJ, controlling the pulse repetition frequency to be 20 Hz-100 kHz and controlling the pulse width to be 40-140 fs, and focusing the femtosecond laser on the surface of the base material of the coating machine for etching processing;
(3) after the basic morphology of the micro-nano base material is processed in the step (2), adjusting the moving speed of the three-dimensional precision moving platform to be 0.2-100 um/s, repeating etching processing under the same condition with the femtosecond laser in the step (2), and controlling the precision and the surface roughness of the morphology to obtain the micro-nano base material of the coating machine;
(4) and (3) coating a solution of a hydrophobic polymer and an organic solvent or depositing a hydrophobic polymer melt on the surface of the micro-nano base material of the coating machine in the step (3) to form a film, and drying the film after curing to obtain the super-hydrophobic film with the 3D micro-texture structure on the surface.
Preferably, the material of the coating machine substrate is selected from quartz glass, silicon or stainless steel.
Preferably, the numerical aperture (n.a) of the microscope objective is 0.15 to 0.95.
Preferably, the hydrophobic polymer is selected from one or more of polyvinylidene fluoride (PVDF), vinylidene fluoride homopolymer, Polyethylene (PE), polypropylene (PP), Polystyrene (PS), polyvinyl chloride (PVC), Polyethersulfone (PEs), and Polyacrylonitrile (PAN).
Preferably, the organic solvent is selected from one or a combination of two or more of N, N '-Dimethylformamide (DMF), N' -dimethylacetamide (DMAc), dimethyl sulfoxide (DMSO), N-methylpyrrolidone (NMP), tetrahydrofuran, acetone, chloroform, toluene and xylene.
Preferably, the 3D micro texture structure is selected from a wave ridge structure, a micro-bump structure, a micro-well array structure, a cross-shaped structure or a micro-column array structure.
The invention also provides a super-hydrophobic film with a 3D micro texture structure on the surface, which is prepared by etching the coating machine substrate by using the femtosecond laser.
The invention also provides application of the super-hydrophobic film with the surface having the 3D micro texture structure in membrane distillation materials, glass curtain walls, field photoelectric instruments or precision instruments.
The invention also provides a processing device for preparing the super-hydrophobic film by using the femtosecond laser etching coating machine base material, which is formed by sequentially connecting a laser loading system, a material clamping system and a monitoring system, wherein:
the laser loading system consists of a femtosecond laser, a converter, a small hole, a variable attenuator, a beam splitter, a controllable optical switch, a reflector and a microscope objective, wherein the femtosecond laser output by the femtosecond laser passes through the controllable optical switch and is guided into the microscope objective by the reflector for focusing;
the material clamping system consists of a three-dimensional precision moving platform, a sample table and a computer, the coating machine base material can be fixed on the three-dimensional precision moving platform, and the control computer is connected with the three-dimensional precision moving platform;
the monitoring system consists of a CCD camera and can realize real-time monitoring on the machining process.
Preferably, the numerical aperture of the microscope objective is 0.15-0.95.
Compared with the prior art, the invention has the beneficial effects that:
(1) the method for preparing the micro-nano substrate by using the femtosecond laser etching coating machine substrate has simple process, does not use any chemical reagent or solvent in the preparation process, and is environment-friendly and nontoxic. The material has strong selectivity, a large processing size range and high precision, meets 3D micro texture structures of various requirements, has a stable micro-nano structure of the micro-nano base material and high reusability, and can greatly reduce the cost.
(2) The processing device for preparing the super-hydrophobic film by using the femtosecond laser etching coating machine substrate has strong operability and high speed.
(3) The super-hydrophobic film prepared by the invention has a controllable 3D micro texture structure, and the hydrophobicity of the film is greatly improved.
The above-described and other features, aspects, and advantages of the present application will become more apparent with reference to the following detailed description.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the invention and together with the description serve to explain the invention without limiting the invention to its proper form. It is obvious that the drawings in the following description are only some embodiments, and that for a person skilled in the art, other drawings can be derived from them without inventive effort. In the drawings:
FIG. 1 is a schematic structural diagram of a processing device for preparing a super-hydrophobic film by using a femtosecond laser etching coating machine substrate; wherein: the system comprises a computer 1, a CCD (charge coupled device) 2 camera, a reflector 3, a beam splitter 4, a variable attenuator 5, a controllable optical switch 6, a pinhole 7, a microscope objective 8, a three-dimensional precision moving platform 9, a femtosecond 10, a femtosecond 11, a femtosecond 12, a sample 13 and a microscopic texture structure 14-3D.
FIG. 2 is a 3D micro texture structure of different shapes of the surface of the super-hydrophobic film.
Detailed Description
The present invention will be described in detail with reference to examples. The following examples will assist those skilled in the art in further understanding the invention, but are not intended to limit the invention in any way. It should be noted that it would be apparent to those skilled in the art that several modifications and improvements can be made without departing from the inventive concept. All falling within the scope of the present invention.
Referring to fig. 1, the processing device for preparing the super-hydrophobic film by using the femtosecond laser etching coater substrate is formed by sequentially connecting a laser loading system, a material clamping system and a monitoring system, wherein:
the laser loading system consists of a femtosecond laser 10, a converter 12, an aperture 7, a variable attenuator 5, a beam splitter 4, a controllable optical switch 6, a reflector 3 and a microscope objective 8, wherein the femtosecond laser 11 output by the femtosecond laser sequentially passes through the converter 12, the aperture 7, the variable attenuator 5 and the beam splitter 4, and the controllable optical switch 6 is adjusted to be guided into the microscope objective 8 by the reflector 3 for focusing; wherein the numerical aperture of the microscope objective 8 can be set to 0.15-0.95;
the material clamping system consists of a three-dimensional precision moving platform 9, a sample table 13 and a computer 1, the base material of the coating machine can be fixed on the three-dimensional precision moving platform 9, and the control computer 1 is connected with the three-dimensional precision moving platform 9;
the monitoring system is composed of a CCD camera 2 and can realize real-time monitoring on the processing process.
When the super-hydrophobic film is prepared by etching the base material of the coating machine by using the femtosecond laser, the femtosecond laser 11 (the parameters of the laser beam can be set as follows: the pulse width is 30fs, the wavelength is 800nm, the pulse frequency is 1kHz, the laser single pulse energy is 3.5 muJ, and the laser average power is 3.5mw) output by the femtosecond laser 10 enters the microscope objective 8 with the numerical aperture of 0.5 through the controllable optical switch 6 and the beam splitter 4 and is focused on the surface of the hard base material of the coating machine. The hard base material is fixed on the sample table, the movement of the hard base material is realized through a three-dimensional precision moving platform 9 controlled by a computer 1, the hard base material moves according to a processing track required by manufacturing a 3D micro texture structure and completes micro-nano base material processing, and the whole processing process is monitored in real time through a CCD camera 2.
Example 1
The processing device shown in fig. 1 is used for preparing the super-hydrophobic PVDF film with the 3D micro-texture structure, and the steps are as follows: the titanium gem femtosecond laser outputs femtosecond laser, the pulse width of which is 35fs, the wavelength is 800nm, the repetition frequency is 1kHz, the average laser power is 4mw, a microscope objective with the numerical aperture of 0.5 and the magnification of 50 times is focused on the surface of a quartz glass material with the size of 100mm multiplied by 100mm, the diameter of a focusing light spot is about 1.5 mu m, a sample is moved by a three-dimensional precise moving platform controlled by a computer, the moving speed is 200 mu m/s, and micro-nano substrate processing is carried out according to the processing track shown in figure 2 b.
Before film preparation, NMP is heated to 60 ℃, then dry PVDF powder (15 wt%) is slowly added into the solution and stirred for 6 hours to dissolve the polymer, and the dissolved PVDF solution is subjected to ultrasonic treatment for one hour to remove redundant bubbles. And (3) pouring the PVDF solution onto the micro-nano base material, wherein the pouring thickness is 400 mu m, and the area of the casting film is about 80mm multiplied by 80 mm. The prepared membrane is soaked in a solvent-free coagulation bath (water or ethanol) for 24 hours, then soaked in an ethanol bath for 6 hours, and then soaked in clear water at room temperature for 18 hours. And after curing, air-drying overnight, and peeling the dried film from the micro-nano substrate to obtain the super-hydrophobic PVDF film with the 3D micro texture structure.
Tests show that compared with a commercial PVDF film, the super-hydrophobic PVDF film with the 3D micro-texture structure has the roughness as high as 7 mu m, and simultaneously shows super-hydrophobic performance, the static water contact angle is as high as 159 degrees, and the dynamic sliding angle is as low as 4 degrees.
Example 2
The processing device shown in fig. 1 is used for preparing the super-hydrophobic polypropylene film with the 3D micro-texture structure, and the steps are as follows: the titanium gem femtosecond laser outputs femtosecond laser, the pulse width of which is 35fs, the wavelength is 400nm, the repetition frequency is 1kHz, the average laser power is 4mw, a microscope objective with the numerical aperture of 0.5 and the magnification of 50 times is focused on the surface of a quartz glass material with the size of 100mm multiplied by 100mm, the diameter of a focusing light spot is about 1.5 mu m, a sample is moved by a three-dimensional precise moving platform controlled by a computer, the moving speed is 200 mu m/s, and micro-nano substrate processing is carried out according to the processing track shown in figure 2 d.
The polypropylene slices or granules are heated and melted by a screw extruder, the formed melt is filtered by a metal screen and then pushed into a metering pump, the melt is accurately metered and pressurized by the metering pump to form the melt with stable flow, stable temperature, stable pressure and uniform distribution, and then the melt is pushed into a melt-blowing die head. And finally, mutually bonding and tangling under the action of the waste heat of the fibers and the heat of the drafting airflow, and solidifying to form the super-hydrophobic polypropylene film with the surface having the 3D micro texture structure.
Tests show that the super-hydrophobic polypropylene film with the 3D micro-texture structure shows super-hydrophobic performance, and the static water contact angle is as high as 150 degrees.
Example 3
The super-hydrophobic polystyrene film with the 3D micro-texture structure is prepared by adopting a processing device shown in figure 1, and the steps are as follows: the titanium gem femtosecond laser outputs femtosecond laser, the pulse width of which is 35fs, the wavelength is 400nm, the repetition frequency is 1kHz, the average laser power is 4mw, a microscope objective with the numerical aperture of 0.5 and the magnification of 50 times is focused on the surface of a quartz glass material with the size of 100mm multiplied by 100mm, the diameter of a focusing light spot is about 1.5 mu m, a sample is moved by a three-dimensional precise moving platform controlled by a computer, the moving speed is 200 mu m/s, and micro-nano substrate processing is carried out according to the processing track shown in figure 2 e.
Dissolving 1 g of polystyrene particles in 20ml of N, N-dimethylformamide to form a uniformly dissolved polystyrene solution, pouring the polystyrene solution on the micro-nano substrate, and drying for 24 hours in an environment with the relative humidity of 50% and the temperature of 60 ℃ to obtain the super-hydrophobic polystyrene film with the 3D micro-texture structure.
The test shows that the contact angle of the wettability of the film surface measured by a contact angle tester and water is 155 degrees, the rolling angle is 6 degrees, and the hydrophobic property is far larger than that of an untreated polystyrene film.
As can be seen from the above embodiments 1 to 3, the femtosecond laser is used to etch the hard substrate of the coating machine, so that the surface of the film generates the required 3D micro texture structure, compared with the hydrophobic film without the 3D micro texture structure on the surface, the liquid drop contact angle is increased, the surface hydrophobic effect is greatly improved, and the coating film can be used for film distillation materials, glass curtain walls, field photoelectric instruments or precision instruments, and is directly attached to the surfaces of various materials. The preparation method has the advantages of simple process, controllable film thickness, no use of any chemical reagent or solvent in the preparation process, environmental protection and no toxicity.
The present invention has been described in detail with reference to the embodiments, but the present invention is only a preferred embodiment of the present invention and is not to be construed as limiting the scope of the present invention. All equivalent changes and modifications made within the scope of the present invention shall fall within the scope of the present invention.
Claims (10)
1. A method for preparing a super-hydrophobic film by using a femtosecond laser etching coating machine substrate is characterized by comprising the following steps:
(1) fixing a coating machine base material on a three-dimensional precision moving platform, and focusing the coating machine base material on the surface of the coating machine base material through a microscope objective by adopting a femtosecond laser with the pulse width of 40-160 fs and the wavelength of 338-1100 nm;
(2) controlling the moving speed of the three-dimensional precise moving platform to be 0.2 mu m/s-0.5 mm/s, controlling the single pulse energy of the femtosecond laser to be 15 nJ-5 mJ, controlling the pulse repetition frequency to be 20 Hz-100 kHz and controlling the pulse width to be 40-140 fs, and focusing the femtosecond laser on the surface of the base material of the coating machine for etching processing;
(3) after the basic morphology of the micro-nano base material is processed in the step (2), adjusting the moving speed of the three-dimensional precision moving platform to be 0.2-100 um/s, repeating etching processing under the same condition of the femtosecond laser in the step (2), and controlling the precision and the surface roughness of the morphology to obtain the micro-nano base material of the coating machine;
(4) and (3) coating a solution of a hydrophobic polymer and an organic solvent or depositing a hydrophobic polymer melt on the surface of the micro-nano base material of the coating machine in the step (3) to form a film, and drying the film after curing to obtain the super-hydrophobic film with the 3D micro-texture structure on the surface.
2. The method for preparing the superhydrophobic film by femtosecond laser etching of the coater substrate according to claim 1, wherein the material of the coater substrate is selected from quartz glass, silicon or stainless steel.
3. The method for preparing a superhydrophobic film using a femtosecond laser etching coater substrate according to claim 1, wherein the numerical aperture (n.a) of the microscope objective is 0.15-0.95.
4. The method for preparing the super-hydrophobic film by using the femtosecond laser etching coater substrate according to claim 1, wherein the hydrophobic polymer is one or more selected from polyvinylidene fluoride (PVDF), vinylidene fluoride homopolymer, Polyethylene (PE), polypropylene (PP), Polystyrene (PS), polyvinyl chloride (PVC), polyether sulfone (PES) and Polyacrylonitrile (PAN).
5. The method for preparing a superhydrophobic film using a femtosecond laser etching coater substrate according to claim 1, wherein the organic solvent is one or a combination of two or more selected from N, N '-Dimethylformamide (DMF), N' -dimethylacetamide (DMAc), dimethyl sulfoxide (DMSO), N-methylpyrrolidone (NMP), tetrahydrofuran, acetone, chloroform, toluene, and xylene.
6. The method for preparing a superhydrophobic film using a femtosecond laser etching coater substrate according to claim 1, wherein the 3D micro texture structure is selected from a wave ridge structure, a micro-bump structure, a micro-well array structure, a field-shaped structure or a micro-column array structure.
7. A super-hydrophobic thin film obtained by the method for preparing a super-hydrophobic thin film using a femtosecond laser etching coater substrate according to any one of claims 1 to 6.
8. Use of the superhydrophobic film of claim 7 in membrane distillation materials, glass curtain walls, field optoelectronics or precision instruments.
9. The processing apparatus for preparing a superhydrophobic film using a femtosecond laser etching coater substrate according to any one of claims 1 to 6, wherein the processing apparatus is formed by sequentially connecting a laser loading system, a material clamping system and a monitoring system, wherein:
the laser loading system consists of a femtosecond laser, a beam splitter, a controllable optical switch, a variable attenuator, a reflector and a microscope objective, wherein the femtosecond laser output by the femtosecond laser passes through the controllable optical switch and is guided into the microscope objective by the reflector for focusing;
the material clamping system consists of a three-dimensional precision moving platform, a sample table and a computer, the coating machine base material can be fixed on the three-dimensional precision moving platform, and the control computer is connected with the three-dimensional precision moving platform;
the monitoring system consists of a CCD camera and can realize real-time monitoring on the machining process.
10. Machining device according to claim 9, characterized in that the numerical aperture of the microobjective is 0.15-0.95.
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