CN113162550A - 一种基于tsv变容管的压控振荡器 - Google Patents
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- 239000000758 substrate Substances 0.000 claims abstract description 42
- 101150090280 MOS1 gene Proteins 0.000 claims abstract description 31
- 101100401568 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) MIC10 gene Proteins 0.000 claims abstract description 31
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 22
- 229910052710 silicon Inorganic materials 0.000 claims description 22
- 239000010703 silicon Substances 0.000 claims description 22
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 19
- 229910052802 copper Inorganic materials 0.000 claims description 19
- 239000010949 copper Substances 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 101100461812 Arabidopsis thaliana NUP96 gene Proteins 0.000 claims description 16
- 101100262446 Arabidopsis thaliana UBA1 gene Proteins 0.000 claims description 15
- 101100478187 Arabidopsis thaliana MOS4 gene Proteins 0.000 claims description 10
- 239000003990 capacitor Substances 0.000 abstract 1
- 241000724291 Tobacco streak virus Species 0.000 description 85
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
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- 101001051799 Aedes aegypti Molybdenum cofactor sulfurase 3 Proteins 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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Abstract
本发明公开了一种基于TSV变容管的压控振荡器,包括可变电感M1,PMOS1源极S1、衬底B1、PMOS2源极S2和衬底B2相连形成电源接入端,PMOS1漏极D1与PMOS2栅极G2、M1输入端Min1、C1输出端Cout1、MOS3漏极D3和MOS4栅极G4相连,PMOS2漏极D2与PMOS1栅极G1、M1输出端Mout1、C2输出端Cout2、MOS4漏极D4和MOS3栅极G3相连,MOS3源极S3、衬底B3、MOS4源极S4和衬底B4为接地端,C1输入端Cin1和C2输入端Cin2相连组成电容控制电源接入端,MOS5栅极G5、衬底B5分别为电感控制电源接入端和接地端。
Description
技术领域
本发明属于三维集成电路技术领域,涉及一种基于TSV变容管的压控振荡器。
背景技术
压控振荡器(VCO)是锁相环中的关键部分,可通过控制电压对输出振荡频率进行调节,压控振荡器在射频电路中具有重要的地位,特别是在锁相环电路、时钟恢复电路和频率综合器电路中更是重中之重。
随着微电子技术的发展,微电子器件的尺寸按照摩尔定律持续减小,集成电路的集成度也逐渐增大,但是晶体管的特征尺寸逐渐达到物理极限,使集成电路的设计、可靠性都受到严重影响。
目前的压控振荡器均是基于CMOS技术,相位噪声高,占用芯片面积大,能耗高,已难以满足高集成度电路的要求。
发明内容
本发明的目的是提供一种基于TSV变容管的压控振荡器,解决了现有压控振荡器高相位噪声和高能耗的问题。
本发明所采用的技术方案是,一种基于TSV变容管的压控振荡器,包括基于TSV的惠斯通桥式可变电感M1,两个TSV变容管,分别为C1、C2,两个晶体管,分别为PMOS1、PMOS2,以及两个TSV垂直开关,分别为MOS3、MOS4,基于TSV的惠斯通桥式可变电感M1由六个单根TSV电感和一个TSV垂直开关MOS5连接组成,PMOS1的源极S1、衬底B1以及PMOS2的源极S2和衬底B2相连形成电源VDD接入端,PMOS1的漏极D1与PMOS2的栅极G2、基于TSV的惠斯通桥式可变电感M1的输入端Min1、C1的输出端Cout1、MOS3的漏极D3和MOS4的栅极G4相连,PMOS2的漏极D2与PMOS1的栅极G1、基于TSV的惠斯通桥式可变电感M1的输出端Mout1、C2的输出端Cout2、MOS4的漏极D4和MOS3的栅极G3相连,MOS3的源极S3、衬底B3以及MOS4的源极S4、衬底B4均为接地端GND,C1的输入端Cin1和C2的输入端Cin2相连组成电容控制电源Vctr2接入端,TSV垂直开关MOS5的栅极G5、衬底B5分别为电感控制电源Vctr1接入端和接地端GND。
本发明的技术特征还在于,
C1包括P型硅衬底,P型硅衬底中设置有竖直的TSV铜柱,TSV铜柱外侧设置有SiO2介质层,P型硅衬底上下两端的SiO2介质层外均设置有p型掺杂区,p型掺杂区外侧面上设置有金属层,上、下两个金属层上分别引出有源极S和漏极D,源极S和漏极D相连接形成C1的输出端Cout1,TSV铜柱顶端端部引出有栅极G,栅极G为C1的输入端Cin1。
C2与C1的结构相同。
基于TSV的惠斯通桥式TSV可变电感M1中六个单根TSV电感分别为L1、L2、L3、L4、L5、L6,六个TSV电感各有两个端口,L1的端口a1与L2的端口a2相连,L1的端口b1与L3的端口b3相连,TSV垂直开关MOS5的源极S5分别与L2的端口b2和L4的端口b4相连,TSV垂直开关MOS5的漏极D5分别与L3的端口a3和L5的端口a5相连,L4的端口a4与L6的端口a6相连,L6的端口b6与L5的端口b5相连,TSV可变电感M1的输入端Min1与L1的端口a1相连,TSV可变电感M1的输出端Mout1与L6的端口b6相连。
PMOS1和PMOS2均为平面P型MOSFET晶体管。
MOS3和MOS4为N型MOSFET,N型MOSFET包括P型硅衬底,P型硅衬底中设置有TSV铜柱,TSV铜柱顶端端部引出有MOSFET的栅极G,TSV铜柱外侧设置有SiO2介质层,P型硅衬底上下两端的SiO2介质层外侧设置有n型掺杂区,n型掺杂区上设置有金属层,P型硅衬底上下两端的金属层上分别引出有MOSFET的源极S和漏极D。
TSV垂直开关MOS5为N型MOSFET。
本发明的有益效果是,采用基于TSV垂直开关的可变电感,通过调节电感控制电源Vctr1来控制TSV垂直开关的导通及关断,进而调节基于TSV的惠斯通桥式可变电感M1的总电感值,配合TSV变容管实现对压控振荡器的频率调节;变容管C1、C2均为TSV变容管,MOS3、MOS4和TSV垂直开关MOS5均采用了TSV三维结构,减小了芯片面积及成本,提高了芯片集成度,损耗低;本发明压控振荡器相比于传统压控振荡器具有面积小、调谐范围大和相位噪声低等优点。
附图说明
图1是本发明基于TSV变容管的压控振荡器的电路示意图;
图2是本发明基于TSV变容管的压控振荡器中TSV变容管C1的结构示意图;
图3是本发明基于TSV变容管的压控振荡器中TSV变容管C1的俯视图;
图4是本发明基于TSV变容管的压控振荡器中TSV可变电感M1的结构示意图;
图5是本发明基于TSV变容管的压控振荡器中TSV可变电感M1的电路示意图。
图中,1.TSV铜柱,2.SiO2介质层,3.金属层,5.P型硅衬底,6.二氧化硅层,7.p型掺杂区。
具体实施方式
下面结合附图和具体实施方式对本发明进行详细说明。
本发明一种基于TSV变容管的压控振荡器,参照图1,包括基于TSV的惠斯通桥式的可变电感M1,两个TSV变容管,分别为C1、C2,两个晶体管,分别为PMOS1、PMOS2,以及两个TSV垂直开关,分别为MOS3、MOS4,基于TSV的惠斯通桥式可变电感M1由六个单根TSV电感和一个TSV垂直开关MOS5连接组成,PMOS1的源极S1、衬底B1以及PMOS2的源极S2和衬底B2相连形成电源VDD接入端,PMOS1的漏极D1与PMOS2的栅极G2、基于TSV的惠斯通桥式可变电感M1的输入端Min1、C1的输出端Cout1、MOS3的漏极D3和MOS4的栅极G4相连,PMOS2的漏极D2与PMOS1的栅极G1、基于TSV的惠斯通桥式可变电感M1的输出端Mout1、C2的输出端Cout2、MOS4的漏极D4和MOS3的栅极G3相连,MOS3的源极S3、衬底B3以及MOS4的源极S4、衬底B4均为接地端GND,C1的输入端Cin1和C2的输入端Cin2相连组成电容控制电源Vctr2接入端,TSV垂直开关MOS5的栅极G5、衬底B5分别为电感控制电源Vctr1接入端和接地端GND。
参照图2和图3,TSV变容管C1包括P型硅衬底5,P型硅衬底5中设置有竖直的TSV铜柱1,TSV铜柱1外侧设置有SiO2介质层2,P型硅衬底上下两端的SiO2介质层2外侧均设置有p型掺杂区7,p型掺杂区7外侧面上设置有金属层3,除金属层3以外的TSV变容管C1上下端面上均覆盖有二氧化硅层6,上、下两个金属层3上分别引出有源极S和漏极D,源极S和漏极D相连接形成C1的输出端Cout1,TSV铜柱顶端端部引出有栅极G,栅极G为C1的输入端Cin1。TSV变容管C2与TSV变容管C1的结构相同。
PMOS1和PMOS2均为平面P型MOSFET晶体管。
MOS3和MOS4为N型MOSFET,N型MOSFET包括P型硅衬底,P型硅衬底中设置有TSV铜柱,TSV铜柱顶端端部引出有MOSFET的栅极G,TSV铜柱外侧设置有SiO2介质层,P型硅衬底上下两端的SiO2介质层外侧设置有n型掺杂区,n型掺杂区上设置有金属层,金属层以外的N型MOSFET上下端面上均覆盖有二氧化硅层,P型硅衬底上下两端的金属层上分别引出有MOSFET的源极S和漏极D。TSV垂直开关MOS5也为N型MOSFET,与MOS3结构相同。
参照图4和图5,基于TSV的惠斯通桥式可变电感M1中六个单根TSV电感分别为L1、L2、L3、L4、L5、L6,L1的端口a1与L2的端口a2相连,L1的端口b1与L3的端口b3相连,TSV垂直开关MOS5的源极S5分别与L2的端口b2和L4的端口b4相连,TSV垂直开关MOS5的漏极D5分别与L3的端口a3和L5的端口a5相连,L4的端口a4与L6的端口a6相连,L6的端口b6与L5的端口b5相连,基于TSV的惠斯通桥式可变电感M1的输入端Min1与L1的端口a1相连,基于TSV的惠斯通桥式可变电感M1的输出端Mout1与L6的端口b6相连。
使用本发明压控振荡器时,将电源VDD接入端与电源连接,将接地端GND接地,将电容控制电源Vctr2接入端与电容控制电源连接,将电感控制电源Vctr1接入端电感控制电源连接。
基于TSV的惠斯通桥式可变电感M1的总电感分为以下两种:
(1)当电感控制电源Vctr1小于TSV垂直开关MOS5的阈值电压时,TSV垂直开关MOS5断开,基于TSV的惠斯通桥式可变电感M1的总电感值Ltot1为:
Ltot1=[(L0-ΔL)+(L0+ΔL)]||[(L0+ΔL)+(L0-ΔL)]=L0
即基于TSV的惠斯通桥式可变电感M1的输入端Min1到输出端Mout1的等效电感值为L0。
上式中(L0-△L)等效为TSV电感L2,L5的电感,(L0+△L)等效为TSV电感L4与L6,L1与L3的串联电感。
(2)当电感控制电源Vctr1大于TSV垂直开关MOS5的阈值电压时,TSV垂直开关MOS5导通,基于TSV的惠斯通桥式可变电感M1的总电感值Ltot2为:
本发明压控振荡器采用基于TSV垂直开关的惠斯通电桥电感器,通过TSV垂直开关MOS5的导通/关断来调节电感电路的总电感值,配合TSV变容管C1和C2实现对压控振荡器的频率调节。
基于TSV的惠斯通桥式可变电感拥有更大的可调范围,更小的面积以及更高的品质因数,于此同时本发明还使用了TSV变容管以及TSV垂直开关,相比于平面变容管及平面开关,TSV变容管及TSV垂直开关拥有更小的面积,更高的品质因数,因此本发明拥有占用片上面积小、功耗低、可调范围广泛、相位噪声低的优点。
Claims (7)
1.一种基于TSV变容管的压控振荡器,其特征在于,包括基于TSV的惠斯通桥式的可变电感M1,两个TSV变容管,分别为C1、C2,两个晶体管,分别为PMOS1、PMOS2,以及两个TSV垂直开关,分别为MOS3、MOS4,基于TSV的惠斯通桥式可变电感M1由六个单根TSV电感和一个TSV垂直开关MOS5连接组成,PMOS1的源极S1、衬底B1以及PMOS2的源极S2和衬底B2相连形成电源VDD接入端,PMOS1的漏极D1与PMOS2的栅极G2、基于TSV的惠斯通桥式可变电感M1的输入端Min1、C1的输出端Cout1、MOS3的漏极D3和MOS4的栅极G4相连,PMOS2的漏极D2与PMOS1的栅极G1、基于TSV的惠斯通桥式可变电感M1的输出端Mout1、C2的输出端Cout2、MOS4的漏极D4和MOS3的栅极G3相连,MOS3的源极S3、衬底B3以及MOS4的源极S4、衬底B4均为接地端GND,C1的输入端Cin1和C2的输入端Cin2相连组成电容控制电源Vctr2接入端,TSV垂直开关MOS5的栅极G5、衬底B5分别为电感控制电源Vctr1接入端和接地端GND。
2.根据权利要求1所述的一种基于TSV变容管的压控振荡器,其特征在于,所述C1包括P型硅衬底,P型硅衬底中设置有竖直的TSV铜柱,TSV铜柱外侧设置有SiO2介质层,P型硅衬底上下两端的SiO2介质层外均设置有p型掺杂区,p型掺杂区外侧面上设置有金属层,上、下两个金属层上分别引出有源极S和漏极D,源极S和漏极D相连接形成C1的输出端Cout1,TSV铜柱顶端端部引出有栅极G,栅极G为C1的输入端Cin1。
3.根据权利要求2所述的一种基于TSV变容管的压控振荡器,其特征在于,所述C2与C1的结构相同。
4.根据权利要求1或3所述的一种基于TSV变容管的压控振荡器,其特征在于,所述基于TSV的惠斯通桥式可变电感M1中六个单根TSV电感分别为L1、L2、L3、L4、L5、L6,L1的端口a1与L2的端口a2相连,L1的端口b1与L3的端口b3相连,TSV垂直开关MOS5的源极S5分别与L2的端口b2和L4的端口b4相连,TSV垂直开关MOS5的漏极D5分别与L3的端口a3和L5的端口a5相连,L4的端口a4与L6的端口a6相连,L6的端口b6与L5的端口b5相连,基于TSV的惠斯通桥式可变电感M1的输入端Min1与L1的端口a1相连,基于TSV的惠斯通桥式可变电感M1的输出端Mout1与L6的端口b6相连。
5.根据权利要求1所述的一种基于TSV变容管的压控振荡器,其特征在于,所述PMOS1和PMOS2均为平面P型MOSFET晶体管。
6.根据权利要求5所述的一种基于TSV变容管的压控振荡器,其特征在于,所述MOS3和MOS4为N型MOSFET,N型MOSFET包括P型硅衬底,P型硅衬底中设置有TSV铜柱,TSV铜柱顶端端部引出有MOSFET的栅极G,TSV铜柱外侧设置有SiO2介质层,P型硅衬底上下两端的SiO2介质层外侧设置有n型掺杂区,n型掺杂区上设置有金属层,P型硅衬底上下两端的金属层上分别引出有MOSFET的源极S和漏极D。
7.根据权利要求6所述的一种基于TSV变容管的压控振荡器,其特征在于,所述TSV垂直开关MOS5为N型MOSFET。
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