CN113126172B

CN113126172B - Static displacement correction method and device

Info

Publication number: CN113126172B
Application number: CN202010045597.7A
Authority: CN
Inventors: 陶德强
Original assignee: China National Petroleum Corp; BGP Inc
Current assignee: China National Petroleum Corp; BGP Inc
Priority date: 2020-01-16
Filing date: 2020-01-16
Publication date: 2024-01-30
Anticipated expiration: 2040-01-16
Also published as: CN113126172A

Abstract

The invention discloses a static displacement correction method and a device, wherein the method comprises the following steps: filtering the original apparent resistivity to obtain a second apparent resistivity; replacing the apparent resistivity of the original apparent resistivity with the apparent resistivity of the second apparent resistivity with the relative error not smaller than the preset relative error threshold to obtain a third apparent resistivity data body; determining a fourth apparent resistivity in the third apparent resistivity data volume; filtering the fourth apparent resistivity to obtain a filtered result sixth apparent resistivity; and determining the fourth visual resistivity data body after static correction according to the fourth visual resistivity and the corresponding sixth visual resistivity and the second visual resistivity data body. The invention can eliminate the distortion point in apparent resistivity and improve the static displacement correction effect; meanwhile, based on the relative error, the distortion point can be eliminated without other processing, and the static displacement correction efficiency is improved.

Description

Static displacement correction method and device

Technical Field

The invention relates to the technical field of geophysical exploration, in particular to a static displacement correction method and device.

Background

This section is intended to provide a background or context to the embodiments of the invention that are recited in the claims. The description herein is not admitted to be prior art by inclusion in this section.

In magnetotelluric exploration, when there is a local electrical inhomogeneity near the surface, the surface of the electrical inhomogeneity creates an accumulated charge under the influence of an external electric field, thereby creating an additional electric field, resulting in distortion of the observed electric field, which is almost independent of frequency. The distortion of the measured apparent resistivity is mainly represented by a fixed value of translation of the whole single-point curve along the resistivity axis or downward in a double logarithmic coordinate system, and the phenomenon of fine dried noodles with densely distributed transverse interval contour lines is represented in the profile contour lines, and the phenomenon of unaffected phase data is usually called static effect or static displacement.

Static displacement phenomenon is common in magnetotelluric exploration, and will have serious impact on the accuracy or precision of data processing, inversion and interpretation results. In order to eliminate such an influence, a static displacement correction process is necessary. At present, static displacement correction at home and abroad mainly comprises a curve plane method, a spatial filtering method, an impedance tensor decomposition method, a transient electromagnetic correction method, a phase correction method and the like. However, these methods are mainly applied in two-dimensional magnetotelluric exploration, and are rarely applied in three-dimensional magnetotelluric exploration. The static displacement correction method applied to the three-dimensional geomagnetic has the problems of poor correction effect and low correction efficiency.

Therefore, the conventional static displacement correction has problems of poor correction effect and low correction efficiency.

Disclosure of Invention

The embodiment of the invention provides a static displacement correction method for improving static displacement correction effect and static displacement correction efficiency, which comprises the following steps:

determining each original apparent resistivity in an original apparent resistivity data body comprising all the apparent resistivity data in a preset direction; the original apparent resistivity is the average apparent resistivity of the apparent resistivity of a plurality of preset intermediate frequency frequencies adjacent to the preset frequency in each measuring point in the original apparent resistivity data body;

filtering each original apparent resistivity to obtain each second apparent resistivity of each original apparent resistivity at the original position;

according to the relative error of each original apparent resistivity and the apparent resistivity of each corresponding position in each second apparent resistivity, replacing the apparent resistivity of the corresponding position in each original apparent resistivity by the apparent resistivity in each second apparent resistivity with the relative error not smaller than a preset relative error threshold value to obtain each third apparent resistivity; the relative error in apparent resistivity reflects the degree of distortion in apparent resistivity;

determining each fourth apparent resistivity in the third apparent resistivity data volume; the third apparent resistivity data body is a second apparent resistivity data body formed by the difference value between each original apparent resistivity and each corresponding measuring point in the corresponding third apparent resistivity, and is obtained by adding the apparent resistivity of each corresponding measuring point in the original apparent resistivity data body; each fourth apparent resistivity is the average apparent resistivity of the apparent resistivities of a plurality of preset high-frequency band frequency numbers in each measuring point in the third apparent resistivity data body;

Filtering each fourth apparent resistivity to obtain a filtering result of each fourth apparent resistivity at the original position and each sixth apparent resistivity;

and determining a fourth apparent resistivity data body after static correction of the original apparent resistivity data body according to each fourth apparent resistivity, each sixth apparent resistivity and the second apparent resistivity data body.

The embodiment of the invention also provides a static displacement correction device for improving the static displacement correction effect and the static displacement correction efficiency, which comprises:

the original apparent resistivity determining module is used for determining each original apparent resistivity in an original apparent resistivity data body comprising all the apparent resistivity data in the preset direction; the original apparent resistivity is the average apparent resistivity of the apparent resistivity of a plurality of preset intermediate frequency frequencies adjacent to the preset frequency in each measuring point in the original apparent resistivity data body;

the first filtering module is used for filtering each original apparent resistivity to obtain each second apparent resistivity of each original apparent resistivity at the original position;

the replacing module is used for replacing the apparent resistivity of the corresponding position in each original apparent resistivity by the apparent resistivity in each second apparent resistivity with the relative error not smaller than the preset relative error threshold according to the relative error of the apparent resistivity of each original apparent resistivity and each corresponding position in each second apparent resistivity, so as to obtain each third apparent resistivity; the relative error in apparent resistivity reflects the degree of distortion in apparent resistivity;

A fourth apparent resistivity determination module configured to determine each fourth apparent resistivity in the third apparent resistivity data volume; the third apparent resistivity data body is a second apparent resistivity data body formed by the difference value between each original apparent resistivity and each corresponding measuring point in the corresponding third apparent resistivity, and is obtained by adding the apparent resistivity of each corresponding measuring point in the original apparent resistivity data body; each fourth apparent resistivity is the average apparent resistivity of the apparent resistivities of a plurality of preset high-frequency band frequency numbers in each measuring point in the third apparent resistivity data body;

the second filtering module is used for filtering each fourth apparent resistivity to obtain a filtering result of each fourth apparent resistivity at the original position and each sixth apparent resistivity;

and the correction result obtaining module is used for determining a fourth visual resistivity data body after static correction of the original visual resistivity data body according to each fourth visual resistivity, each sixth visual resistivity and the second visual resistivity data body.

The embodiment of the invention also provides computer equipment, which comprises a memory, a processor and a computer program stored on the memory and capable of running on the processor, wherein the static displacement correction method is realized when the processor executes the computer program.

The embodiment of the invention also provides a computer readable storage medium which stores a computer program for executing the static displacement correction method.

In the embodiment of the invention, the apparent resistivity of the corresponding position in the original apparent resistivity is replaced by the apparent resistivity in the second apparent resistivity with the relative error not smaller than the preset relative error threshold, and the distortion point of the apparent resistivity can be eliminated based on the relative error, so that the static displacement correction effect on the apparent resistivity is improved. In addition, the embodiment of the invention can eliminate the distortion point in the apparent resistivity only according to the relative error of the apparent resistivity, can quickly eliminate the distortion point without other extra processing, and can improve the efficiency of static displacement correction.

Drawings

In order to more clearly illustrate the embodiments of the invention or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art. In the drawings:

FIG. 1 is a flow chart of a static displacement correction method according to an embodiment of the present invention;

FIG. 2 is a flowchart illustrating the implementation of step 101 in the static displacement correction method according to the embodiment of the present invention;

FIG. 3 is a flowchart illustrating a step 102 in the static displacement correction method according to an embodiment of the present invention;

FIG. 4 is a flowchart illustrating a step 103 in the static displacement correction method according to the embodiment of the present invention;

FIG. 5 is a flowchart illustrating a step 104 in the static displacement correction method according to the embodiment of the present invention;

FIG. 6 is a flowchart illustrating a step 105 in a static displacement correction method according to an embodiment of the present invention;

FIG. 7 is a flowchart illustrating a step 106 in the static displacement correction method according to an embodiment of the present invention;

FIG. 8 is a flowchart of another implementation of the static displacement correction method according to an embodiment of the present invention;

FIG. 9 is a functional block diagram of a static displacement correction device according to an embodiment of the present invention;

FIG. 10 is a block diagram illustrating an initial apparent resistivity determination module 901 in a static displacement correction apparatus according to an embodiment of the present invention;

fig. 11 is a block diagram illustrating a structure of a first filtering module 902 in the static displacement correction device according to an embodiment of the present invention;

fig. 12 is a block diagram of a replacement module 903 in the static displacement correction device according to the embodiment of the present invention;

Fig. 13 is a block diagram illustrating a structure of a fourth apparent resistivity determining module 904 in the static displacement correction apparatus according to the embodiment of the present invention;

fig. 14 is a block diagram illustrating a structure of a second filtering module 905 in the static displacement correction device according to the embodiment of the present invention;

fig. 15 is a block diagram illustrating a correction result obtaining module 906 in the static displacement correction device according to the embodiment of the present invention;

FIG. 16 is a block diagram of another static displacement correction device according to an embodiment of the present invention;

FIG. 17 is a schematic view of a planar contour of apparent resistivity at a frequency of 1.035Hz in the XY direction prior to static displacement correction in accordance with an embodiment of the present invention;

FIG. 18 is a schematic view of a planar contour of apparent resistivity at a frequency of 1.035Hz in the XY direction after correction of electrostatic displacement in accordance with an embodiment of the present invention;

FIG. 19 is a schematic view of a contour line of a apparent resistivity profile of a certain line in the XY direction before static displacement correction according to an embodiment of the present invention;

FIG. 20 is a schematic view of a contour of a cross section of apparent resistivity of a certain line in XY direction after static displacement correction according to an embodiment of the present invention.

Detailed Description

For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the embodiments of the present invention will be described in further detail with reference to the accompanying drawings. The exemplary embodiments of the present invention and their descriptions herein are for the purpose of explaining the present invention, but are not to be construed as limiting the invention.

Fig. 1 shows a flow of implementing the static displacement correction method according to the embodiment of the present invention, and for convenience of description, only the parts related to the embodiment of the present invention are shown, which are described in detail below:

as shown in fig. 1, the static displacement correction method includes:

step 101, determining each original apparent resistivity in an original apparent resistivity data body comprising all the apparent resistivity data in a preset direction; the original apparent resistivity is the average apparent resistivity of the apparent resistivity of a plurality of preset intermediate frequency frequencies adjacent to the preset frequency in each measuring point in the original apparent resistivity data body;

step 102, filtering each original apparent resistivity to obtain each second apparent resistivity of each original apparent resistivity at the original position;

step 103, replacing the apparent resistivity of the corresponding position in each original apparent resistivity with the apparent resistivity of each second apparent resistivity with the relative error of which is not less than the preset relative error threshold according to the relative error of the apparent resistivity of each original apparent resistivity and each corresponding position in each second apparent resistivity, so as to obtain each third apparent resistivity; the relative error in apparent resistivity reflects the degree of distortion in apparent resistivity;

step 104, determining each fourth apparent resistivity in the third apparent resistivity data volume; the third apparent resistivity data body is a second apparent resistivity data body formed by the difference value between each original apparent resistivity and each corresponding measuring point in the corresponding third apparent resistivity, and is obtained by adding the apparent resistivity of each corresponding measuring point in the original apparent resistivity data body; each fourth apparent resistivity is the average apparent resistivity of the apparent resistivities of a plurality of preset high-frequency band frequency numbers in each measuring point in the third apparent resistivity data body;

Step 105, filtering each fourth apparent resistivity to obtain a filtering result of each fourth apparent resistivity at the original position and each sixth apparent resistivity;

and step 106, determining a fourth apparent resistivity data body after static correction of the original apparent resistivity data body according to each fourth apparent resistivity, each sixth apparent resistivity and the second apparent resistivity data body.

The original apparent resistivity data body for three-dimensional magnetotelluric static displacement correction mainly comprises apparent resistivity in XY direction and apparent resistivity in YX direction. The processing method of static displacement correction of the two direction data is the same. The preset direction may be, for example, only the XY direction or only the YX direction, and it will be understood by those skilled in the art that the preset direction may also be the XY direction and the YX direction, which is not particularly limited in the embodiment of the present invention. The original apparent resistivity data body is composed of all apparent resistivity data in a preset direction. The original apparent resistivity data body is a three-dimensional data body.

The original apparent resistivity data body comprises a plurality of measuring points, and each measuring point comprises apparent resistivity corresponding to a plurality of frequencies. For convenience of description, we will refer herein to the average apparent resistivity of the preset plurality of intermediate frequency frequencies adjacent to the preset frequency in each measurement point as the original apparent resistivity. It is understood that the raw apparent resistivity data volume corresponds to a plurality of raw apparent resistivities. The original apparent resistivity corresponding to each measuring point is the average value of the apparent resistivity of a plurality of preset intermediate frequency frequencies adjacent to the preset frequency in the measuring point. It is understood that each of the raw apparent resistivities is planar apparent resistivity data.

The preset frequency is a preset frequency, for example, the preset frequency is preset to be 1Hz, and it will be understood by those skilled in the art that the preset frequency may be preset to other frequencies besides the 1Hz, for example, the preset frequency is preset to be 0.5Hz,1.5Hz or 2Hz, etc., which is not limited in particular. In a preferred embodiment, the predetermined frequency is 1Hz.

The preset plurality of intermediate frequency bands adjacent to the preset frequency are preset frequencies in a plurality of intermediate frequency bands adjacent to the preset frequency. For example, the preset plurality of intermediate frequency bands may be preset to have frequencies of 0.9Hz, 1Hz and 1.1Hz, respectively, and as those skilled in the art will understand, the preset plurality of intermediate frequency bands may also be preset to have frequencies of other intermediate frequency bands than the above-mentioned 0.9Hz, 1Hz and 1.1Hz, for example, the preset plurality of intermediate frequency bands may be preset to have frequencies of 0.8Hz, 1Hz and 1.2Hz, respectively, which is not particularly limited in the embodiment of the present invention.

Assuming that the preset frequency is 1Hz, and the frequencies of a plurality of intermediate frequency bands adjacent to 1Hz in a certain measuring point are frequency a, frequency B and frequency C, respectively, the original apparent resistivity is the average apparent resistivity of the apparent resistivity of frequency a, the apparent resistivity of frequency B and the apparent resistivity of frequency C. To this end, each different measurement point in the raw apparent resistivity data volume corresponds to each different raw apparent resistivity.

After the original apparent resistivity corresponding to each measuring point is determined, each original apparent resistivity corresponding to each measuring point is filtered, so that a filtering result of each original apparent resistivity at an original position, namely a second apparent resistivity, is obtained. It will be appreciated that each station corresponds to each primary apparent resistivity and each primary apparent resistivity corresponds to each secondary apparent resistivity. The second apparent resistivity is a filtering result of the original apparent resistivity at the original position, that is, the positions of the data points in the second apparent resistivity and the positions of the data points in the original apparent resistivity are in one-to-one correspondence. The filtering method used for filtering the original apparent resistivity may be a filtering method commonly used in the prior art, and will not be described in detail herein. It is understood that each of the second apparent resistivities is planar apparent resistivity data.

After each second apparent resistivity is obtained as a result of the filtering of each original apparent resistivity, distortion points in the original apparent resistivity can be eliminated by using the second apparent resistivity. Specifically, the relative error of the data point at each corresponding position in the original apparent resistivity and the second apparent resistivity is determined first, the relative error of the apparent resistivity reflects the distortion degree of the data point (apparent resistivity), and if the relative error of the apparent resistivity of the data point in the original apparent resistivity and the apparent resistivity of the corresponding data point in the second apparent resistivity is not smaller than the preset relative error threshold, the data point in the original apparent resistivity is regarded as the distortion data point if the distortion degree of the apparent resistivity of the data point in the original apparent resistivity is larger.

Therefore, in order to eliminate the distorted data point in the original apparent resistivity, the distorted data point in the original apparent resistivity can be replaced by the data point in the second apparent resistivity corresponding to the distorted data point in the original apparent resistivity, so as to achieve the purpose of eliminating the distorted data point in the original apparent resistivity. And for the data points in the original apparent resistivity with the relative error smaller than the preset relative error threshold, the data points in the original apparent resistivity with the relative error smaller than the preset relative error threshold are shown to have smaller distortion, namely the data points in the original apparent resistivity with the relative error smaller than the preset relative error threshold are considered to have no distortion, and the data points in the original apparent resistivity are reserved, so that the third apparent resistivity after distortion elimination is formed.

It will be appreciated that, in view of the fact that the positions of the data points in the second apparent resistivity correspond to the positions of the data points in the original apparent resistivity, and that the third apparent resistivity is obtained by replacing the distorted data points in the corresponding positions of the original apparent resistivity with the data points in the corresponding positions in the second apparent resistivity, it can be known that the positions of the data points in the third apparent resistivity correspond to the positions of the data points in the original apparent resistivity. It is understood that each of the third apparent resistivities is planar apparent resistivity data.

The preset relative error threshold is any relative error in a preset relative error threshold interval. The preset relative error threshold interval is a preset relative error threshold interval, for example, the preset relative error threshold interval may be set to 0.01 to 0.5, and it will be understood by those skilled in the art that the preset relative error threshold interval may also be preset to other relative error threshold intervals besides the above-mentioned 0.01 to 0.5, for example, 0.02 to 0.48, or 0.05 to 0.45, etc., which are not particularly limited by those skilled in the art. In a preferred embodiment, the predetermined relative error interval is 0.01 to 0.5.

The preset relative error threshold is a preset relative error threshold, and is any relative error in a preset relative error threshold section. For example, when the preset relative error threshold interval is 0.01 to 0.5, the preset relative error threshold may be preset to 0.08, and it will be understood by those skilled in the art that the preset relative error threshold may be preset to other relative error values than the above-mentioned 0.08, for example, 0.06, or 0.10, etc., which are not particularly limited by those skilled in the art. In a preferred embodiment, the predetermined relative error threshold is 0.08.

Thus, for each original apparent resistivity and each second apparent resistivity corresponding to each measuring point, the corresponding third apparent resistivity can be determined by using the relative errors. It is understood that the third apparent resistivity is planar apparent resistivity data.

After obtaining each third apparent resistivity corresponding to each measuring point, determining a difference value between each original apparent resistivity and each corresponding measuring point in each third apparent resistivity, and forming a second apparent resistivity data body by using the difference values between all the original apparent resistivity and each corresponding measuring point in the corresponding third apparent resistivity. It is understood that the second volume of apparent resistivity data is a volume of three-dimensional apparent resistivity data. After the second apparent resistivity data body is obtained, the apparent resistivity between each corresponding measuring point in the second apparent resistivity data body and the original apparent resistivity data body is added, and then a third apparent resistivity data body can be obtained. It is understood that the third volume of apparent resistivity data is three-dimensional apparent resistivity data.

In the embodiment of the invention, the third apparent resistivity data body comprises a plurality of measuring points, and each measuring point corresponds to each fourth apparent resistivity. The fourth apparent resistivity is the average apparent resistivity of the apparent resistivities of a plurality of preset high-frequency band frequency numbers in each measuring point in the third apparent resistivity data body.

The preset high-frequency band numbers are preset, for example, preset high-frequency band numbers are preset to be the frequencies of the high-frequency band numbers 2, 3 and 4, respectively, and it will be understood by those skilled in the art that the preset high-frequency band numbers may be preset to be other frequencies except the frequencies of the frequency number 2, the frequency number 3 and the frequency number 4, which are not particularly limited by those skilled in the art. In a preferred embodiment, the plurality of preset high-band frequency numbers are the frequency numbers of the high-band frequency numbers 2, 3 and 4.

Accordingly, it is assumed that the preset high-band frequencies are frequencies A, B and C in the high-band, i.e., frequency A, frequency B and frequency C. And the fourth apparent resistivity is the average apparent resistivity of the frequency number A, the frequency number B and the frequency number C in each measuring point, so that each fourth apparent resistivity corresponding to each measuring point in the third apparent resistivity data body is determined.

And after obtaining each fourth apparent resistivity corresponding to each measuring point in the third apparent resistivity data body, filtering each fourth apparent resistivity to obtain a filtering result of each fourth apparent resistivity at the original position, namely, each corresponding sixth apparent resistivity. It is understood that each fourth apparent resistivity and each corresponding sixth apparent resistivity is planar apparent resistivity data. The filtering method used for filtering the fourth apparent resistivity may be a filtering method commonly used in the prior art, and will not be described in detail herein. The location of the data point in each of the sixth apparent resistivities corresponds to the location of the data point in each of the fourth apparent resistivities.

After each filtering result corresponding to each fourth apparent resistivity, namely each sixth apparent resistivity is obtained, further according to each corresponding sixth apparent resistivity of each fourth apparent resistivity and the second apparent resistivity data body, determining a fourth apparent resistivity data body after static correction of the original apparent resistivity data body. It is understood that the fourth visual resistivity data body is three-dimensional visual resistivity data, and the position of the visual resistivity data in the fourth visual resistivity data body corresponds to the position of the visual resistivity data in the original visual resistivity data body.

In the embodiment of the invention, the apparent resistivity of the corresponding position in the original apparent resistivity is replaced by the apparent resistivity in the second apparent resistivity with the relative error not smaller than the preset relative error threshold, and the distortion point of the apparent resistivity can be eliminated based on the relative error, so that the static displacement correction effect on the apparent resistivity is improved. In addition, the embodiment of the invention can determine the distortion point in the apparent resistivity only according to the relative error of the apparent resistivity, can quickly eliminate the distortion point without other extra processing, and can improve the efficiency of static displacement correction.

Fig. 2 shows a flow of implementing step 101 in the static displacement correction method according to the embodiment of the present invention, and for convenience of description, only the portions relevant to the embodiment of the present invention are shown, which are described in detail below:

In an embodiment of the present invention, in order to further improve the efficiency of the static displacement correction, as shown in fig. 2, step 101, determining each original apparent resistivity in the original apparent resistivity data volume including all the apparent resistivity data in the preset direction includes:

step 201, obtaining apparent resistivity of a plurality of preset intermediate frequency frequencies adjacent to a preset frequency in each measuring point in an original apparent resistivity data body;

step 202, taking the average apparent resistivity of the preset plurality of intermediate frequency frequencies adjacent to the preset frequency in each measuring point as each original apparent resistivity.

In order to improve the efficiency of static displacement correction, only the apparent resistivity of a plurality of preset intermediate frequency frequencies adjacent to the preset frequency in each measuring point is determined, and then the average value of the apparent resistivity of the plurality of intermediate frequency frequencies is calculated, namely the original apparent resistivity corresponding to each measuring point.

Specifically, in the embodiment of the present invention, the preset frequency is 1Hz. First, a plurality of preset intermediate frequency frequencies adjacent to 1Hz in each measuring point are obtained. Assume that the obtained preset plurality of intermediate frequency frequencies adjacent to 1Hz are frequency A, frequency B and frequency C, respectively. And further calculating the average apparent resistivity of the three apparent resistivity of the frequency A, the apparent resistivity of the frequency B and the apparent resistivity of the frequency C, wherein the average apparent resistivity of the three apparent resistivity is the original apparent resistivity. Thus, the original apparent resistivity corresponding to each measuring point can be obtained.

In the embodiment of the invention, the apparent resistivity of the preset plurality of intermediate frequency frequencies adjacent to the preset frequency in each measuring point in the original apparent resistivity data body is obtained, and the original apparent resistivity can be rapidly determined only by calculating the average apparent resistivity of the preset plurality of intermediate frequency frequencies adjacent to the preset frequency in each measuring point when the original apparent resistivity is determined, so that the static displacement correction efficiency can be further improved.

Fig. 3 shows a flow of implementing step 102 in the static displacement correction method according to the embodiment of the present invention, and for convenience of description, only the portions relevant to the embodiment of the present invention are shown, which are described in detail below:

in an embodiment of the present invention, in order to further improve the effect of static displacement correction, as shown in fig. 3, step 102 of filtering each original apparent resistivity to obtain each second apparent resistivity of each original apparent resistivity at the original position includes:

step 301, performing kriging interpolation on each original apparent resistivity by adopting a regular interpolation grid to obtain each first interpolation apparent resistivity; the ratio of the grid interval of the regular interpolation grid to the data interval of the original apparent resistivity is any multiple in a preset multiple interval;

Step 302, performing moving average filtering on each first interpolation apparent resistivity by adopting a first filtering window to obtain each first apparent resistivity; the central position data of the first filtering window does not participate in filtering;

step 303, performing inverse interpolation on each first apparent resistivity to obtain each second apparent resistivity of the filtering result of each original apparent resistivity at the original position.

When the original apparent resistivity is subjected to filtering treatment, the original apparent resistivity can be subjected to Kriging interpolation, moving average filtering and inverse interpolation treatment of a regular interpolation grid in sequence.

Specifically, first, a kriging interpolation is performed on each original apparent resistivity by using a regular interpolation grid, so as to determine each first interpolation apparent resistivity after interpolation. In one embodiment of the present invention, the grid interval of the regular interpolation grid used for kriging interpolation is not greater than the data point interval of each original apparent resistivity, or the ratio of the grid interval of the regular interpolation grid to the data point interval of each original apparent resistivity is a preset ratio. The preset ratio is a value of not more than 1 in view of the mesh interval of the regular interpolation mesh not more than the data point interval of the original apparent resistivity.

For example, the grid spacing of the regular interpolation grid is the same as the data point spacing of each original apparent resistivity, or the ratio of the grid spacing of the regular interpolation grid to the data point spacing of each original apparent resistivity is 0.95 or 0.9, i.e., the grid spacing of the regular interpolation grid is slightly less than the data point spacing of each original apparent resistivity. It will be appreciated by those skilled in the art that the ratio of the grid spacing of the regular interpolation grid to the data point spacing of each raw apparent resistivity may be other than the above-described values of no more than 1, such as 1 or 0.9, or 0.98, etc., and embodiments of the present invention are not particularly limited.

On the other hand, the node density of the regular interpolation grid is a preset multiple of the node density of each original apparent resistivity. The preset multiple is any multiple in a preset multiple interval. The preset multiple interval is a preset multiple interval, for example, the preset multiple interval may be set to 1 to 2 times, and it will be understood by those skilled in the art that the preset multiple interval may be set to other multiple intervals besides 1 to 2 times, for example, 1.2 to 1.8 times, or 1.5 to 1.75 times, etc., which are not particularly limited by those skilled in the art. In a preferred embodiment, the predetermined multiple interval is set to 2 to 3 times.

The preset multiple is a preset multiple and is any multiple in a preset multiple interval. For example, when the preset multiple interval is 1 to 2 times, the preset multiple may be preset to be 1.5 times, and it will be understood by those skilled in the art that the preset multiple may be preset to be other relative error values than 1.5 times, such as 1.4, or 1.6, etc., which are not particularly limited by those skilled in the art.

And performing Kriging interpolation on each original apparent resistivity by adopting a regular interpolation grid to obtain each corresponding first interpolation apparent resistivity, and then performing moving average filtering on each obtained corresponding first interpolation apparent resistivity.

Specifically, a first filter window is adopted to carry out moving average filtering on each first interpolation apparent resistivity, and the first apparent resistivity after moving average filtering is obtained. In an embodiment of the present invention, the filter coefficient of the moving average filter is any filter coefficient in a first preset filter coefficient interval. In addition, the center position data of the first filter window does not participate in the filtering.

The first preset filter coefficient is any filter coefficient in a first preset filter coefficient interval. The first preset filter coefficient interval is a preset filter coefficient interval, for example, the first preset filter coefficient interval may be set to be 1.01 to 2, and it will be understood by those skilled in the art that the first preset filter coefficient interval may be set to be other filter coefficient intervals besides 1.01 to 2, for example, 1.05 to 1.95, or 1.2 to 1.90, etc., which are not particularly limited by those skilled in the art. In a preferred embodiment, the first predetermined filter coefficient interval is 1.01 to 2.

The first preset filter coefficient is a preset filter coefficient and is any filter coefficient in a first preset filter coefficient section. For example, when the first preset filter coefficient interval is 1.01 to 2, the first preset filter coefficient may be preset to 1.5, and it will be understood by those skilled in the art that the first preset filter coefficient may also be preset to other relative error values besides 1.5, such as 1.25, or 1.75, etc., which are not particularly limited by those skilled in the art.

In addition, in an embodiment of the present invention, the number of nodes of the first filtering window in each direction is equal and odd, and the number of nodes of the first filtering window in each direction does not exceed a preset threshold of the number of nodes. Specifically, it is assumed that the first filter window is wx×wy×wz, where Wx is the number of filter window nodes of the first filter window in the x direction, wy is the number of filter window nodes of the first filter window in the y direction, and Wz is the number of filter window nodes of the first filter window in the z direction. In an embodiment of the present invention, the number of filter window nodes Wx in the x direction, the number of filter window nodes Wy in the y direction, and the number of filter window nodes Wz in the z direction are all odd numbers, for example, all odd numbers such as 3, 5 or 7, and the number of nodes in each direction does not exceed a preset node number threshold. In addition, in one embodiment of the present invention, the filter window node numbers Wx, wy and Wz are all equal. Accordingly, in a preferred embodiment, first filter window Wx× wy×wz=3 x 3.

The preset node number threshold is a preset node number threshold, for example, the preset node number threshold is preset to be 7, and it will be understood by those skilled in the art that the preset node number threshold may be preset to be other node numbers except 7, for example, the preset node number threshold is preset to be 5 or 9, which is not particularly limited in the embodiment of the present invention. Generally, the number of nodes in each direction of the first filter window should not exceed 7.

Accordingly, after the first filter window is adopted to carry out moving average filtering on each first interpolation apparent resistivity to obtain first apparent resistivity, then each first apparent resistivity is subjected to inverse interpolation to obtain corresponding second apparent resistivity. The corresponding second apparent resistivity is the filtering result of each original apparent resistivity at the original position, and the positions of the data points in each second apparent resistivity and the positions of the data points in the original apparent resistivity are corresponding.

In view of the fact that the three-dimensional interpolated data is regular, the distribution of adjacent data points along a coordinate axis is equidistant, and four data points nearest to each other in space can form a tetrahedron. Specifically, when the first apparent resistivity is subjected to inverse interpolation, searching a tetrahedron where the scattered point data is located according to the position of certain scattered point data in each first apparent resistivity, calculating the value of the scattered point data according to the values of the scattered point data on four vertexes of the tetrahedron, and calculating the scattered point data of all the scattered point positions in the inverse interpolation mode. It will be appreciated by those skilled in the art that the inverse interpolation of each first apparent resistivity may be performed herein, and that other inverse interpolation algorithms other than those described above may be used, and embodiments of the present invention are not particularly limited.

In the embodiment of the invention, the kriging interpolation is performed on each original apparent resistivity by using a regular interpolation grid to obtain each corresponding first interpolation apparent resistivity, then the first filter window is adopted to perform moving average filtering on each first interpolation apparent resistivity to obtain each corresponding first apparent resistivity, finally each first apparent resistivity is subjected to inverse interpolation to obtain each second apparent resistivity of the filtering result of the original apparent resistivity at the original position, and the kriging interpolation, cosine filtering, inverse interpolation and the like of the regular interpolation grid are sequentially performed on each original apparent resistivity, so that the filtering effect can be further improved, and the static displacement correction effect can be further improved.

Fig. 4 shows a flow of implementing step 103 in the static displacement correction method according to the embodiment of the present invention, and for convenience of description, only the portions relevant to the embodiment of the present invention are shown, which are described in detail below:

in an embodiment of the present invention, in order to further improve the effect of the static displacement correction and further improve the efficiency of the static displacement correction, as shown in fig. 4, step 103, according to the relative error between each original apparent resistivity and the apparent resistivity of each corresponding position in each second apparent resistivity, replaces the apparent resistivity of each corresponding position in each original apparent resistivity with the apparent resistivity of each second apparent resistivity having the relative error not less than the preset relative error threshold, to obtain each third apparent resistivity, including:

Step 401, determining a relative error between each original apparent resistivity and the apparent resistivity of each corresponding position in each second apparent resistivity;

step 402, when the relative error of the apparent resistivity of each corresponding position is smaller than the preset relative error threshold, the apparent resistivity of the corresponding position in each original apparent resistivity is used as the apparent resistivity of the corresponding position of each third apparent resistivity;

and step 403, when the relative error of the apparent resistivity of each corresponding position is not less than the preset relative error threshold, the apparent resistivity of the corresponding position in each second apparent resistivity is taken as the apparent resistivity of the corresponding position of each third apparent resistivity.

In order to eliminate the distortion point in each original apparent resistivity, further submit the effect of static displacement correction, and improve the efficiency of eliminating the distortion point, and further improve the efficiency of static displacement correction, the data point in each second apparent resistivity with the relative error not smaller than the preset relative error threshold may be used to replace the data point in the corresponding position in each original apparent resistivity, so as to obtain each third apparent resistivity after eliminating the distortion point.

In view of the fact that the positions of the data points in each of the original apparent resistivities correspond to the positions of the data points in each of the second apparent resistivities, first, a relative error of the data points in each of the original apparent resistivities and each of the corresponding positions in each of the second apparent resistivities may be determined, the relative error reflecting the degree of distortion of the data points.

In particular, in one embodiment of the invention, the method may be carried out by, for exampleThe following equation determines the data point A in each raw apparent resistivity ₁ And the data point A in each second apparent resistivity ₁ Data point A corresponding to position ₂ Relative error between:

wherein E represents the data point A in each raw apparent resistivity ₁ Data point A in second apparent resistivity ₂ Relative error between them.

In one embodiment of the present invention, based on each original apparent resistivity, when the relative error of the data point at each corresponding location is less than the preset relative error threshold, the data point at each original apparent resistivity is considered to be undistorted, and the data point at each original apparent resistivity is retained. When the relative error of the data point of each corresponding position is not smaller than the preset relative error threshold, the data point of each original apparent resistivity is considered to generate distortion, and the data point of each second apparent resistivity with the relative error not smaller than the preset relative error threshold is used for replacing the data point of the corresponding position in each original apparent resistivity, so that a third apparent resistivity with distortion eliminated is formed, the purpose of eliminating the distortion point in each original apparent resistivity is achieved, and the effect of static displacement correction is improved.

In an embodiment of the present invention, based on each original apparent resistivity, when a relative error of a data point at each corresponding position is smaller than a preset relative error threshold, the data point at each original apparent resistivity is considered to be undistorted, and the data point at the corresponding position in each original apparent resistivity is taken as the data point at the corresponding position of each third apparent resistivity; when the relative error of the data point at each corresponding position is not smaller than the preset relative error threshold, the data point of each original apparent resistivity is considered to generate distortion, and at the moment, the data point at the position corresponding to the data point of each original apparent resistivity in each second apparent resistivity is taken as the data point at the position corresponding to each third apparent resistivity, so that each third apparent resistivity with distortion eliminated is formed, the purpose of eliminating the distortion point in each original apparent resistivity is achieved, and the effect of static displacement correction is improved.

In the embodiment of the invention, the relative error of the data point of each corresponding position in each original apparent resistivity and the second apparent resistivity is determined, when the relative error of the data point of each corresponding position is smaller than the preset relative error threshold value, the data point of the corresponding position in each original apparent resistivity is taken as the data point of each third apparent resistivity corresponding position, when the relative error of the data point of each corresponding position is not smaller than the preset relative error threshold value, the data point of the corresponding position in each second apparent resistivity is taken as the data point of each third apparent resistivity corresponding position, the distortion point in the original apparent resistivity is eliminated based on the relative error of each data point, the effect of static displacement correction can be further improved, and the efficiency of static displacement correction can be further improved while the effect of static displacement correction is further improved.

Fig. 5 shows a flow of implementing step 104 in the static displacement correction method according to the embodiment of the present invention, and for convenience of description, only the portions relevant to the embodiment of the present invention are shown, which are described in detail below:

in one embodiment of the present invention, to further improve the efficiency of the static displacement correction, as shown in fig. 5, step 104 of determining each fourth apparent resistivity in the third apparent resistivity data volume includes:

step 501, determining a difference value between each original apparent resistivity and each corresponding measuring point in each third apparent resistivity to form a second apparent resistivity data body;

step 502, adding the apparent resistivity of each corresponding measuring point in the original apparent resistivity data body and the second apparent resistivity data body to obtain a third apparent resistivity data body;

step 503, determining the apparent resistivity of a plurality of preset high-frequency band frequency numbers in each measuring point in the third apparent resistivity data body;

and 504, taking the average apparent resistivity of the apparent resistivities of a plurality of preset high-frequency band frequency numbers in each measuring point as each fourth apparent resistivity.

In order to further improve the efficiency of the static displacement correction, the third apparent resistivity data body may be determined based on each original apparent resistivity and each corresponding third apparent resistivity, and the apparent resistivity of the second apparent resistivity data body, and each fourth apparent resistivity in the third apparent resistivity data body may be determined.

Specifically, firstly, determining the difference value between each original apparent resistivity and each corresponding measuring point in each third apparent resistivity, and obtaining the difference value between all original apparent resistivities and all corresponding third apparent resistivities, thereby forming a second apparent resistivity data body. And adding the original apparent resistivity data body and the apparent resistivity of each corresponding measuring point in the second apparent resistivity data body to obtain a third apparent resistivity data body. It is understood that the second and third apparent resistivity data volumes are three-dimensional apparent resistivity data.

So far, after the third visual resistivity data body is determined, the visual resistivities of a plurality of preset high-frequency band frequency numbers in each measuring point in the third visual resistivity data body are obtained, and then the average visual resistivity of the visual resistivities of the plurality of preset high-frequency band frequency numbers in each measuring point is calculated, wherein the average visual resistivity is the fourth visual resistivity corresponding to each measuring point in the third visual resistivity data body. It is understood that the fourth apparent resistivity is planar apparent resistivity data.

In the embodiment of the invention, the third visual resistivity data body is determined based on each original visual resistivity, each corresponding third visual resistivity and the visual resistivity of the second visual resistivity data body, and then the average visual resistivity of a plurality of preset high-frequency band frequency numbers in each measuring point in the third visual resistivity data body is used as the fourth visual resistivity, and the fourth visual resistivity can be rapidly determined based on the average value of the visual resistivities of a plurality of high-frequency band frequency numbers, so that the static displacement correction efficiency is further improved.

Fig. 6 shows a flow of implementing step 105 in the static displacement correction method according to the embodiment of the present invention, and for convenience of description, only the relevant parts of the embodiment of the present invention are shown, which is described in detail below:

in an embodiment of the present invention, in order to further improve the effect of static displacement correction, as shown in fig. 6, step 105 of filtering each fourth apparent resistivity to obtain a filtering result of each fourth apparent resistivity at an original position, each sixth apparent resistivity includes:

Step 601, performing kriging interpolation on each fourth apparent resistivity by adopting a regular interpolation grid to obtain each second interpolation apparent resistivity; the ratio of the grid interval of the regular interpolation grid to the data interval of the fourth apparent resistivity is any multiple in a preset multiple interval;

step 602, performing Gaussian low-pass filtering on each second interpolation apparent resistivity by adopting a second filtering window to obtain each fifth apparent resistivity;

and 603, performing inverse interpolation on each fifth apparent resistivity to obtain a filtering result of each fourth apparent resistivity at the original position and each sixth apparent resistivity.

In order to further improve the effect of static displacement correction, after each fourth apparent resistivity is obtained, further performing the kriging interpolation of the regular interpolation grid on each fourth apparent resistivity in sequence to obtain a filtering result of each fourth apparent resistivity at the original position, namely, each fifth apparent resistivity.

Specifically, first, a kriging interpolation is still performed on each third apparent resistivity by adopting a regular interpolation grid, and each interpolated second apparent resistivity is obtained after interpolation. The regular interpolation grid is the same as the regular interpolation grid in the corresponding embodiment of fig. 2 and fig. 2, and specific reference may be made to the description in the above corresponding embodiment, which is not described in detail here.

After obtaining each second interpolation apparent resistivity, the embodiment of the invention carries out Gaussian low-pass filtering on each second interpolation apparent resistivity to obtain each corresponding fourth apparent resistivity. In an embodiment of the present invention, the second filter coefficient of the gaussian low pass filter is any filter coefficient in a second predetermined filter coefficient interval. The second preset filter coefficient interval is a preset filter coefficient interval, for example, the second preset filter coefficient interval may be set to 0.01 to 10, and it will be understood by those skilled in the art that the second preset filter coefficient interval may be set to other filter coefficient intervals besides the above 0.01 to 10, for example, 0.05 to 9.95, or 0.2 to 9.90, etc., which are not particularly limited by those skilled in the art. In a preferred embodiment, the second predetermined filter coefficient interval is 0.01 to 10.

The second preset filter coefficient is a preset filter coefficient and is any filter coefficient in a second preset filter coefficient section. For example, when the second preset filter coefficient interval is 0.01 to 10, the second preset filter coefficient may be preset to 4.5, and it will be understood by those skilled in the art that the second preset filter coefficient may be preset to other relative error values besides 4.5, such as 4.1, or 5.5, etc., which are not particularly limited by those skilled in the art.

In addition, in an embodiment of the present invention, the number of nodes of the gaussian low pass filter in each direction is equal and odd, and the number of nodes of the gaussian low pass filter in each direction does not exceed a preset threshold. Specifically, it is assumed that the gaussian low pass filter is wx×wy×wz, where Wx is the number of filter nodes of the gaussian low pass filter in the x direction, wy is the number of filter nodes of the gaussian low pass filter in the y direction, and Wz is the number of filter nodes of the gaussian low pass filter in the z direction. In an embodiment of the present invention, the number of filtering nodes Wx in the x direction, the number of filtering nodes Wy in the y direction, and the number of filtering nodes Wz in the z direction are all odd numbers, for example, all odd numbers such as 3, 5 or 7, and the number of nodes in each direction does not exceed a preset node number threshold. In addition, in one embodiment of the present invention, the number of filtering nodes Wx, wy and Wz are all equal. Accordingly, in a preferred embodiment, gaussian low-pass filtering to Wx x wy×wz= 3X 3.

The preset node number threshold is a preset node number threshold, for example, the preset node number threshold is preset to be 7, and it will be understood by those skilled in the art that the preset node number threshold may be preset to be other node numbers except 7, for example, the preset node number threshold is preset to be 5 or 9, which is not particularly limited in the embodiment of the present invention. Generally, the number of nodes of the gaussian low pass filter in each direction should not exceed 7.

In addition, in one embodiment of the present invention, the weight coefficient of each data in the gaussian low pass filter is determined by the following formula:

W＝exp(-factor×(fx _i ×fx _i +fy _j ×fy _j +fz _k ×fz _k ))；

fx _i ＝i/Wx，i＝-Wx/2~Wx/2；

fy _j ＝j/Wy，j＝-Wy/2～Wy/2；

fz _k ＝k/Wz，k＝-Wz/2～Wz/2；

wherein W represents a weight coefficient of data (i, j, k) in the Gaussian low-pass filtering, i represents a data node number of the data (i, j, k) in the x-direction, j represents a data node number of the data (i, j, k) in the y-direction, k represents a data node number of the data (i, j, k) in the z-direction, wx represents a node number of the Gaussian low-pass filtering in the x-direction, wy represents a node number of the Gaussian low-pass filtering in the y-direction, wz represents a node number of the Gaussian low-pass filtering in the z-directionNumber, fx _i Weight coefficient, fy, representing data node i in x-direction _j Weight coefficient, fz, representing data node j in y-direction _k The weight coefficient representing the data node k in the z-direction, and the factor represents the filter coefficient of the gaussian low pass filter.

Accordingly, after the gaussian low-pass filtering is performed on each second interpolation apparent resistivity to obtain each corresponding fifth apparent resistivity, then the inverse interpolation is performed on each fifth apparent resistivity to obtain each sixth apparent resistivity. Each sixth apparent resistivity is a filtering result of the fourth apparent resistivity at the original position, and the positions of the data points in the sixth apparent resistivity and the positions of the data points in the fourth apparent resistivity are corresponding. It is understood that each of the fourth apparent resistivity, each of the fifth apparent resistivity, and each of the sixth apparent resistivity is planar apparent resistivity data.

In view of the fact that the three-dimensional interpolated data is regular, the distribution of adjacent data points along a coordinate axis is equidistant, and four data points nearest to each other in space can form a tetrahedron. Specifically, when the inverse interpolation is performed on each fifth apparent resistivity, searching for a tetrahedron where the scattered point data is located according to the position of certain scattered point data in each fifth apparent resistivity, calculating the value of the scattered point data according to the values of the scattered point data on four vertexes of the tetrahedron, and further calculating the scattered point data of all the scattered point positions by the inverse interpolation mode to obtain each sixth apparent resistivity. It will be appreciated by those skilled in the art that the fourth apparent resistivity is inversely interpolated here, and that other inverse interpolation algorithms than those described above may be used, and that the present embodiments are not particularly limited.

In the embodiment of the invention, the kriging interpolation is performed on each fourth apparent resistivity by using the regular interpolation grid to obtain each interpolated second apparent resistivity, then the Gaussian low-pass filtering is performed on each second interpolated apparent resistivity to obtain each corresponding fifth apparent resistivity, finally the anti-interpolation processing is performed on each fifth apparent resistivity to obtain the sixth apparent resistivity of the filtering result of each corresponding fifth apparent resistivity at the original position, and the kriging interpolation, the Gaussian low-pass filtering and the anti-interpolation processing of the regular interpolation grid are sequentially performed on each fourth apparent resistivity, so that the filtering effect can be further improved, and the static displacement correction effect is further improved.

Fig. 7 shows a flow of implementing step 106 in the static displacement correction method according to the embodiment of the present invention, and for convenience of description, only the portions relevant to the embodiment of the present invention are shown, which are described in detail below:

in an embodiment of the present invention, in order to further improve the efficiency of static displacement correction, as shown in fig. 7, step 106, determining a fourth apparent resistivity data body after static correction on the original apparent resistivity data body according to each fourth apparent resistivity and each corresponding sixth apparent resistivity, and the second apparent resistivity data body includes:

step 701, determining a difference value between each fourth apparent resistivity and each corresponding measuring point in each sixth apparent resistivity to form a third apparent resistivity data body;

step 702, adding the apparent resistivity of each corresponding measuring point in the second apparent resistivity data body and the third apparent resistivity data body to obtain a fourth apparent resistivity data body.

And determining each sixth apparent resistivity corresponding to each fourth apparent resistivity, namely determining a fourth apparent resistivity data body after static displacement correction according to each fourth apparent resistivity, each corresponding sixth apparent resistivity and the second apparent resistivity data body.

Specifically, after each sixth apparent resistivity corresponding to each fourth apparent resistivity is determined, firstly, according to each fourth apparent resistivity and each corresponding sixth apparent resistivity, determining a difference value between each fourth apparent resistivity and each corresponding measuring point in each corresponding sixth apparent resistivity, and forming a third apparent resistivity data body by using the difference values between all fourth apparent resistivity and each corresponding measuring point in the corresponding sixth apparent resistivity. After the third apparent resistivity data body is determined, the apparent resistivity of each corresponding measuring point in the second apparent resistivity data body and the third apparent resistivity data body is added to obtain a fourth apparent resistivity data body. The fourth apparent resistivity data body is the apparent resistivity data after static displacement correction is carried out on the original apparent resistivity data body. It is understood that the third visual resistivity data volume and the fourth visual resistivity data volume are three-dimensional visual resistivity data.

In the embodiment of the invention, the difference value between each fourth apparent resistivity and each corresponding measuring point in each sixth apparent resistivity is determined to form a third apparent resistivity data body, and then the apparent resistivity of each corresponding measuring point in the second apparent resistivity data body and the third apparent resistivity data body is added to obtain a fourth apparent resistivity data body after static displacement correction, so that the apparent resistivity data after static displacement correction can be rapidly determined, and the efficiency of static displacement correction can be further improved.

Fig. 8 shows another implementation flow of the static displacement correction method according to the embodiment of the present invention, and for convenience of description, only the relevant parts of the embodiment of the present invention are shown, which is described in detail below:

in an embodiment of the present invention, to further improve the efficiency of the static displacement correction, as shown in fig. 8, based on the above method steps, before step 101, the static displacement correction method further includes:

step 801, taking the logarithm taking the preset value as the base for the original apparent resistivity data body to obtain a first apparent resistivity data body;

accordingly, step 102 of determining each original apparent resistivity in the original apparent resistivity data volume including all the apparent resistivity data in the preset direction includes:

Step 802, determining each original apparent resistivity in a first apparent resistivity data volume including all apparent resistivity data in a predetermined direction.

Since the logarithmic coordinates are used in the static displacement correction process, the efficiency of static displacement correction can be improved. Therefore, in order to further improve the efficiency of the static displacement correction, the log calculation is first performed on the original apparent resistivity data body before step 101, that is, the log based on the preset value is taken on the original apparent resistivity data body, so as to obtain the first apparent resistivity data body after the log calculation. It is understood that the first volume of apparent resistivity data is three-dimensional apparent resistivity data.

The preset value is a preset value, for example, the preset value is preset to be 10, and it will be understood by those skilled in the art that the preset value may be preset to other values besides 10, for example, the preset value is preset to be 5 or 8, or 12, which is not particularly limited in the embodiment of the present invention. In a preferred embodiment, the predetermined value is 10.

After the above-mentioned logarithmic processing is performed on the original apparent resistivity data volume, each of the original apparent resistivities in the original apparent resistivity data volume, specifically, each of the original apparent resistivities in the first apparent resistivity data volume is determined in step 101.

In the embodiment of the invention, the logarithm based on the preset value is taken from the original apparent resistivity data body to obtain the first apparent resistivity data body, and the static displacement correction processing is carried out in the logarithm coordinate, so that the static displacement correction efficiency can be further improved.

In an embodiment of the present invention, to further improve the efficiency of the static displacement correction, after step 106, the static displacement correction method further includes:

step 803, performing an inverse logarithm operation on the fourth apparent resistivity data volume, and determining a corrected fifth apparent resistivity data volume of the original apparent resistivity data volume.

And carrying out logarithmic operation on the original apparent resistivity data body before static displacement correction, and converting the logarithmic operation into logarithmic coordinates for static displacement correction. Then, the corresponding fourth apparent resistivity data volume after the correction of the original apparent resistivity data volume is obtained, and the fourth apparent resistivity data volume is the result of the static displacement correction in the logarithmic coordinate, so that it is necessary to perform an inverse logarithmic operation corresponding to the logarithmic operation on the apparent resistivity data in the fifth apparent resistivity data volume expressed in the logarithmic form to form a fifth apparent resistivity data volume after the static displacement correction in the non-logarithmic coordinate form.

In the embodiment of the invention, the fourth apparent resistivity data body is subjected to the anti-logarithmic operation, and the fifth apparent resistivity data body corrected by the original apparent resistivity data body is determined, so that the static displacement correction efficiency can be further improved.

The embodiment of the invention also provides a static displacement correction device, which is described in the following embodiment. Since the principle of solving the problems of these devices is similar to that of the static displacement correction method, the implementation of these devices can be referred to as the implementation of the method, and the repetition is omitted.

Fig. 9 shows functional modules of the static displacement correction device according to the embodiment of the present invention, and for convenience of explanation, only the parts related to the embodiment of the present invention are shown in detail as follows:

referring to fig. 9, each module included in the static displacement correction apparatus is configured to perform each step in the corresponding embodiment of fig. 1, and detailed descriptions of fig. 1 and the corresponding embodiment of fig. 1 are omitted herein. In the embodiment of the present invention, the static displacement correction device includes an original apparent resistivity determining module 901, a first filtering module 902, a replacing module 903, a fourth apparent resistivity determining module 904, a second filtering module 905 and a correction result obtaining module 906.

An original apparent resistivity determining module 901, configured to determine each original apparent resistivity in an original apparent resistivity data body including all apparent resistivity data in a preset direction; the original apparent resistivity is the average apparent resistivity of the preset plurality of intermediate frequency frequencies adjacent to the preset frequency in each measuring point in the original apparent resistivity data body.

The first filtering module 902 is configured to filter each original apparent resistivity to obtain each second apparent resistivity of each original apparent resistivity at the original location.

A replacing module 903, configured to replace, according to a relative error between each original apparent resistivity and an apparent resistivity of each corresponding position in each second apparent resistivity, the apparent resistivity of each corresponding position in each original apparent resistivity with an apparent resistivity in each second apparent resistivity whose relative error is not less than a preset relative error threshold, to obtain each third apparent resistivity; the relative error in apparent resistivity reflects the degree of distortion in apparent resistivity.

A fourth apparent resistivity determination module 904 for determining each fourth apparent resistivity in the third apparent resistivity data volume; the third apparent resistivity data body is a second apparent resistivity data body formed by the difference value between each original apparent resistivity and each corresponding measuring point in the corresponding third apparent resistivity, and is obtained by adding the apparent resistivity of each corresponding measuring point in the original apparent resistivity data body; each fourth apparent resistivity is the average apparent resistivity of the apparent resistivities of a plurality of preset high-band frequency numbers in each measuring point in the third apparent resistivity data body.

The second filtering module 905 is configured to filter each fourth apparent resistivity to obtain a filtering result of each fourth apparent resistivity at the original position, and each sixth apparent resistivity.

The correction result obtaining module 906 is configured to determine a fourth apparent resistivity data body after static correction of the original apparent resistivity data body according to each fourth apparent resistivity and each corresponding sixth apparent resistivity, and the second apparent resistivity data body.

In the embodiment of the present invention, the replacing module 903 replaces the apparent resistivity at the corresponding position in the original apparent resistivity with the apparent resistivity in the second apparent resistivity with the relative error not less than the preset relative error threshold, so as to eliminate the distortion point of the apparent resistivity based on the relative error, thereby improving the static displacement correction effect on the apparent resistivity. In addition, the embodiment of the invention can eliminate the distortion point in the apparent resistivity only according to the relative error of the apparent resistivity, can quickly eliminate the distortion point without other extra processing, and can improve the efficiency of static displacement correction.

Fig. 10 shows a schematic structural diagram of an initial apparent resistivity determining module 901 in a static displacement correction device according to an embodiment of the present invention, and for convenience of explanation, only the portions related to the embodiment of the present invention are shown, and the details are as follows:

In an embodiment of the present invention, in order to further improve the efficiency of the static displacement correction, referring to fig. 10, each unit included in the original apparent resistivity determining module 901 is configured to perform each step in the corresponding embodiment of fig. 2, and detailed descriptions of fig. 2 and the corresponding embodiment of fig. 2 are omitted herein. In the embodiment of the present invention, the original apparent resistivity determining module 901 includes an apparent resistivity obtaining unit 1001 and a first average unit 1002.

The apparent resistivity obtaining unit 1001 is configured to obtain apparent resistivity of a plurality of intermediate frequency frequencies adjacent to a preset frequency in each measurement point in the original apparent resistivity data body.

The first averaging unit 1002 is configured to take, as each original apparent resistivity, an average apparent resistivity of the apparent resistivities of a plurality of intermediate frequency frequencies adjacent to the preset frequency in each measurement point.

In the embodiment of the present invention, the apparent resistivity obtaining unit 1001 obtains the apparent resistivity of the preset plurality of intermediate frequency bands adjacent to the preset frequency in each measurement point in the original apparent resistivity data body, and when determining the original apparent resistivity, the first averaging unit 1002 only needs to calculate the average apparent resistivity of the preset plurality of intermediate frequency bands adjacent to the preset frequency in each measurement point, so that the original apparent resistivity can be quickly determined, and thus the efficiency of static displacement correction can be further improved.

Fig. 11 shows a schematic structure of a first filtering module 902 in the static displacement correction device according to the embodiment of the present invention, and for convenience of explanation, only the portion relevant to the embodiment of the present invention is shown, which is described in detail below:

in an embodiment of the present invention, in order to further improve the effect of static displacement correction, referring to fig. 11, each unit included in the first filtering module 902 is configured to perform each step in the corresponding embodiment of fig. 3, and detailed descriptions in fig. 3 and the corresponding embodiment of fig. 3 are omitted herein. In the embodiment of the present invention, the first filtering module 902 includes a first interpolation unit 1101, a moving average filtering unit 1102, and a first inverse interpolation unit 1103.

A first interpolation unit 1101, configured to perform kriging interpolation on each original apparent resistivity by using a regular interpolation grid, so as to obtain each first interpolation apparent resistivity; the ratio of the grid interval of the regular interpolation grid to the data interval of the original apparent resistivity is any multiple in a preset multiple interval.

A moving average filtering unit 1102, configured to perform moving average filtering on each first interpolation apparent resistivity by using a first filtering window, so as to obtain each first apparent resistivity; the center position data of the first filter window does not participate in the filtering.

The first inverse interpolation unit 1103 is configured to perform inverse interpolation on each first apparent resistivity, so as to obtain each second apparent resistivity as a result of filtering each original apparent resistivity at the original position.

In the embodiment of the present invention, the first interpolation unit 1101 performs kriging interpolation on each original apparent resistivity by using a regular interpolation grid to obtain each corresponding first interpolation apparent resistivity, and then the moving average filtering unit 1102 performs moving average filtering on each first interpolation apparent resistivity by using a first filtering window to obtain each corresponding first apparent resistivity, and finally the first inverse interpolation unit 1103 performs inverse interpolation on each first apparent resistivity to obtain each second apparent resistivity of the filtering result of the original apparent resistivity at the original position, and sequentially performs processing such as kriging interpolation, cosine filtering, inverse interpolation, etc. on each original apparent resistivity by using the regular interpolation grid, so that the filtering effect can be further improved, and further the effect of static displacement correction can be further improved.

Fig. 12 shows a schematic structure of a replacement module 903 in the static displacement correction device according to the embodiment of the present invention, and for convenience of explanation, only the portions related to the embodiment of the present invention are shown in detail as follows:

In an embodiment of the present invention, in order to further improve the effect of the static displacement correction and further improve the efficiency of the static displacement correction, referring to fig. 12, each unit included in the replacing module 903 is configured to execute each step in the corresponding embodiment of fig. 4, and specifically please refer to fig. 4 and the related description in the corresponding embodiment of fig. 4, which are not repeated herein. In the embodiment of the present invention, the replacing module 903 includes a relative error determining unit 1201, a retaining unit 1202, and a replacing unit 1203.

A relative error determination unit 1201 for determining a relative error of each original apparent resistivity and the apparent resistivity of each corresponding position in each second apparent resistivity.

And a retaining unit 1202, configured to, when the relative error of the apparent resistivity of each corresponding position is smaller than the preset relative error threshold, take the apparent resistivity of the corresponding position in each original apparent resistivity as the apparent resistivity of each third apparent resistivity corresponding position.

And a replacing unit 1203 configured to, when the relative error of the apparent resistivity of each corresponding position is not less than the preset relative error threshold, take the apparent resistivity of the corresponding position in each second apparent resistivity as the apparent resistivity of the corresponding position of each third apparent resistivity.

In the embodiment of the present invention, the relative error determining unit 1201 determines the relative error of each data point at each corresponding position in the original apparent resistivity and the second apparent resistivity, so that when the relative error of each data point at each corresponding position in the retaining unit 1202 is smaller than the preset relative error threshold, the data point at the corresponding position in each original apparent resistivity is taken as the data point at each corresponding position in the third apparent resistivity, and when the relative error of the data point at each corresponding position in the replacing unit 1203 is not smaller than the preset relative error threshold, the data point at the corresponding position in each second apparent resistivity is taken as the data point at the corresponding position in the third apparent resistivity, and based on the relative error of each data point, the distortion point in the original apparent resistivity is eliminated, so that not only the effect of static displacement correction can be further improved, but also the effect of static displacement correction can be further improved.

Fig. 13 shows a schematic structural diagram of a fourth apparent resistivity determining module 904 in the static displacement correction apparatus according to the embodiment of the present invention, and for convenience of explanation, only the portions related to the embodiment of the present invention are shown, which is described in detail below:

In an embodiment of the present invention, in order to further improve the efficiency of the static displacement correction, referring to fig. 6, each unit included in the fourth apparent resistivity determining module 904 is configured to perform each step in the corresponding embodiment of fig. 5, and specifically please refer to fig. 5 and the related description in the corresponding embodiment of fig. 5, which are not repeated herein. In the embodiment of the present invention, the fourth apparent resistivity determining module 904 includes a first difference determining unit 1301, a first adding unit 1302, an apparent resistivity determining unit 1303 and a second averaging unit 1304.

A first difference determining unit 1301, configured to determine a difference between each original apparent resistivity and each corresponding measurement point in each third apparent resistivity, to form a second apparent resistivity data body.

The first adding unit 1302 is configured to add the apparent resistivity of each corresponding measurement point in the original apparent resistivity data body and the second apparent resistivity data body to obtain a third apparent resistivity data body.

The apparent resistivity determining unit 1303 is configured to determine apparent resistivities of a plurality of preset high-band frequency numbers in each measurement point in the third apparent resistivity data body.

And a second average unit 1304, configured to take an average apparent resistivity of a plurality of preset high-band frequency numbers in each measurement point as each fourth apparent resistivity.

In the embodiment of the present invention, the first difference determining unit 1301 and the first adding unit 1302 determine the third visual resistance data body based on each original visual resistance, each corresponding third visual resistance, and the visual resistance of the second visual resistance data body, and the second averaging unit 1304 further uses the average visual resistance of the visual resistances of the plurality of preset high-frequency band frequency numbers in each measurement point in the third visual resistance data body as the fourth visual resistance, and based on the average of the visual resistances of the plurality of high-frequency band frequency numbers, the fourth visual resistance can be quickly determined, thereby further improving the efficiency of static displacement correction.

Fig. 14 shows a schematic structural diagram of a second filtering module 905 in a static displacement correction device according to an embodiment of the present invention, and for convenience of explanation, only the portion relevant to the embodiment of the present invention is shown in detail as follows:

in an embodiment of the present invention, in order to further improve the effect of static displacement correction, referring to fig. 14, each unit included in the second filtering module 905 is configured to perform each step in the corresponding embodiment of fig. 6, and detailed descriptions in fig. 6 and the corresponding embodiment of fig. 6 are omitted herein. In the embodiment of the present invention, the second filtering module 905 includes a second interpolation unit 1401, a low-pass filtering unit 1402, and a second inverse interpolation unit 1403.

A second interpolation unit 1401, configured to perform kriging interpolation on each fourth apparent resistivity by using a regular interpolation grid, so as to obtain each second interpolation apparent resistivity; the ratio of the grid interval of the regular interpolation grid to the data interval of the fourth apparent resistivity is any multiple in a preset multiple interval.

The low-pass filtering unit 1402 is configured to perform gaussian low-pass filtering on each second interpolation apparent resistivity by using a second filtering window, so as to obtain each fifth apparent resistivity.

The second inverse interpolation unit 1403 is configured to perform inverse interpolation on each fifth apparent resistivity, so as to obtain a filtering result of each fourth apparent resistivity at the original position, and each sixth apparent resistivity.

In the embodiment of the present invention, the second interpolation unit 1401 performs kriging interpolation on each fourth apparent resistivity by using a regular interpolation grid to obtain each interpolated second apparent resistivity, and then the low-pass filtering unit 1402 performs gaussian low-pass filtering on each second interpolated apparent resistivity to obtain each corresponding fifth apparent resistivity, and finally the second inverse interpolation unit 1403 performs inverse interpolation processing on each fifth apparent resistivity to obtain a sixth apparent resistivity of a filtering result of each corresponding fifth apparent resistivity at an original position, and sequentially performs kriging interpolation, gaussian low-pass filtering and inverse interpolation processing on each fourth apparent resistivity of the regular interpolation grid, so that the filtering effect can be further improved, and the static displacement correction effect can be further improved.

Fig. 15 shows a schematic structural diagram of a correction result obtaining module 906 in the static displacement correction device according to the embodiment of the present invention, and for convenience of explanation, only the parts related to the embodiment of the present invention are shown, which is described in detail below:

in an embodiment of the present invention, in order to further improve the efficiency of the static displacement correction, referring to fig. 15, each unit included in the correction result obtaining module 906 is configured to perform each step in the corresponding embodiment of fig. 7, and detailed descriptions of the corresponding embodiment of fig. 7 are omitted herein. In the embodiment of the present invention, the correction result obtaining module 906 includes a second difference determining unit 1501 and a second adding unit 1502.

A second difference determining unit 1501, configured to determine a difference between each fourth apparent resistivity and each corresponding measurement point in each sixth apparent resistivity, to form a third apparent resistivity data body.

The second adding unit 1502 is configured to add the second apparent resistivity data body to the apparent resistivity of each corresponding measurement point in the third apparent resistivity data body to obtain a fourth apparent resistivity data body.

In the embodiment of the present invention, the second difference determining unit 1501 determines the difference between each fourth apparent resistivity and each corresponding measuring point in each corresponding sixth apparent resistivity to form a third apparent resistivity data body, and further the second adding unit 1502 adds the apparent resistivity of each corresponding measuring point in the second apparent resistivity data body and the third apparent resistivity data body to obtain a fourth apparent resistivity data body after static displacement correction, so that the apparent resistivity data after static displacement correction can be determined quickly, and the efficiency of static displacement correction can be further improved.

Fig. 16 shows another functional module of the static displacement correction device according to the embodiment of the present invention, and for convenience of explanation, only the parts related to the embodiment of the present invention are shown in detail as follows:

referring to fig. 16, each module included in the static displacement correction apparatus is configured to perform each step in the corresponding embodiment of fig. 8, and detailed descriptions of fig. 8 and the corresponding embodiment of fig. 8 are omitted herein. In the embodiment of the present invention, in order to further improve the efficiency of static displacement correction, the static displacement correction device further includes a logarithmic module 1601 on the basis of the above-mentioned module structure.

The logarithm module 1601 is configured to take a logarithm based on a preset value for the original apparent resistivity data body, to obtain a first apparent resistivity data body.

Accordingly, the original apparent resistivity determining module 901 is specifically configured to determine each original apparent resistivity in the first apparent resistivity data body including all the apparent resistivity data in the preset direction.

In the embodiment of the present invention, the log module 1601 takes the log with the preset value as the base for the original apparent resistivity data body to obtain the first apparent resistivity data body, and performs the static displacement correction processing in the log coordinates, so that the static displacement correction efficiency can be further improved.

In an embodiment of the present invention, to further improve the efficiency of the static displacement correction, as shown in fig. 16, the static displacement correction device further includes an anti-logarithmic module 1603 based on the above-mentioned module structure.

The antilog module 1603 is configured to perform an antilog operation on the fourth apparent resistivity data volume, and determine a corrected fifth apparent resistivity data volume of the original apparent resistivity data volume.

In the embodiment of the present invention, the antilog module 1603 performs antilog operation on the fourth apparent resistivity data body to determine the corrected fifth apparent resistivity data body of the original apparent resistivity data body, so that the efficiency of static displacement correction can be further improved.

Fig. 17 shows a schematic view of a plane contour of apparent resistivity at a frequency of 1.035Hz in the XY direction before static displacement correction in accordance with an embodiment of the present invention, and fig. 18 shows a schematic view of a plane contour of apparent resistivity at a frequency of 1.035Hz in the XY direction before static displacement correction in accordance with an embodiment of the present invention, and for convenience of explanation, only the portions relevant to the embodiment of the present invention are shown as follows:

as shown in FIG. 17, the plot is a visual resistivity plane contour of 1.035Hz frequency in the XY direction before static displacement correction, where x (m) is the geographic north-south coordinate and y (m) is the geographic east-west coordinate. As can be seen from fig. 17, there are a large number of distortion points caused by the static displacement phenomenon in the diagram, which are represented by high or low anomalies at high frequencies, and the distortion points in the diagram have an uncontrollable adverse effect on the whole data.

As shown in fig. 18, the chart is a schematic view resistivity plane contour line of 1.035Hz frequency in XY direction after the static displacement correction method provided by the present invention is used to correct the static displacement of the original view resistivity data body, and as can be seen from fig. 18, the distortion point in the original view resistivity is effectively eliminated, and the contour line is smooth. Meanwhile, the overall trend of the data is reserved, and the data accords with expectations.

Comparing fig. 17 and fig. 18, it can be obtained that the static displacement correction method provided by the invention can effectively eliminate the distortion point in the three-dimensional apparent resistivity, improve the static displacement correction effect, maintain the overall trend of the data, recover the normal distribution of the data, and have good retention effect on weak anomalies and excellent static displacement correction effect.

Fig. 19 shows a schematic view of a contour line of a apparent resistivity profile of a certain line in the XY direction before the static displacement correction according to an embodiment of the present invention, fig. 20 shows a schematic view of a contour line of a apparent resistivity profile of a certain line in the XY direction after the static displacement correction according to an embodiment of the present invention, and for convenience of explanation, only the portions relevant to the embodiment of the present invention are shown in detail below:

as shown in fig. 19, the abscissa in the figure is the offset distance, and the ordinate is the frequency. As can be seen from the figure, the static displacement shown in FIG. 19 is more messy in overall data due to the fact that a large number of 'noodle-shaped' anomalies caused by the static displacement phenomenon exist on the apparent resistivity profile of a certain number of measuring lines just before the static displacement, and the 'noodle-shaped' anomalies are represented as transversely arranged, strip-shaped high-frequency high-anomalies or low-anomalies in the overall background, and the existence of a large number of 'noodle-shaped' anomalies can have uncontrollable influence on the data.

As shown in FIG. 20, the graph is a line of sight resistivity plane contour of a certain number of test lines processed by the static displacement correction method according to the embodiment of the invention, wherein the abscissa is the offset distance and the ordinate is the frequency. As can be seen from fig. 20, the apparent resistivity plane contour line after the static displacement correction is overall smooth in transition, the data trend is obvious, and the abnormal shape of "noodle hanging" is effectively eliminated, so that the method meets the expectations.

Comparing fig. 19 and fig. 20, the static displacement correction method provided by the embodiment of the invention can effectively eliminate the abnormal shape of the hanging strip in the apparent resistivity, reserve the overall trend of the data, recover the normal distribution of the data, and has good reservation effect on weak anomalies and excellent static displacement correction effect.

Embodiments of the present invention also provide a computer-readable storage medium storing a computer program for executing the upper static displacement correction method.

In summary, in the embodiment of the present invention, the apparent resistivity of the corresponding position in the original apparent resistivity is replaced by the apparent resistivity of the second apparent resistivity having the relative error not less than the preset relative error threshold, so that the distortion point of the apparent resistivity can be eliminated based on the relative error, thereby improving the effect of correcting the static displacement of the apparent resistivity. In addition, the embodiment of the invention can eliminate the distortion point in the apparent resistivity only according to the relative error of the apparent resistivity, can quickly eliminate the distortion point without other extra processing, and can improve the static displacement correction efficiency.

It will be appreciated by those skilled in the art that embodiments of the present invention may be provided as a method, system, or computer program product. Accordingly, the present invention may take the form of an entirely hardware embodiment, an entirely software embodiment or an embodiment combining software and hardware aspects. Furthermore, the present invention may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, and the like) having computer-usable program code embodied therein.

The present invention is described with reference to flowchart illustrations and/or block diagrams of methods, apparatus (systems) and computer program products according to embodiments of the invention. It will be understood that each flow and/or block of the flowchart illustrations and/or block diagrams, and combinations of flows and/or blocks in the flowchart illustrations and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general purpose computer, special purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create means for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.

These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing apparatus to function in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including instruction means which implement the function specified in the flowchart flow or flows and/or block diagram block or blocks.

These computer program instructions may also be loaded onto a computer or other programmable data processing apparatus to cause a series of operational steps to be performed on the computer or other programmable apparatus to produce a computer implemented process such that the instructions which execute on the computer or other programmable apparatus provide steps for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.

The foregoing description of the embodiments has been provided for the purpose of illustrating the general principles of the invention, and is not meant to limit the scope of the invention, but to limit the invention to the particular embodiments, and any modifications, equivalents, improvements, etc. that fall within the spirit and principles of the invention are intended to be included within the scope of the invention.

Claims

1. A static displacement correction method, comprising:

determining a fourth apparent resistivity data body after static correction of the original apparent resistivity data body according to each fourth apparent resistivity, each sixth apparent resistivity and the second apparent resistivity data body;

filtering each original apparent resistivity to obtain each second apparent resistivity of each original apparent resistivity at the original position, wherein the filtering comprises the following steps:

performing Kriging interpolation on each original apparent resistivity by adopting a regular interpolation grid to obtain each first interpolation apparent resistivity; the ratio of the grid interval of the regular interpolation grid to the data interval of the original apparent resistivity is any multiple in a preset multiple interval;

performing moving average filtering on each first interpolation apparent resistivity by adopting a first filtering window to obtain each first apparent resistivity; the central position data of the first filtering window does not participate in filtering;

performing inverse interpolation on each first apparent resistivity to obtain a filtering result of each original apparent resistivity at an original position and each second apparent resistivity;

determining each fourth apparent resistivity in the third apparent resistivity data volume includes:

Determining a difference value between each original apparent resistivity and each corresponding measuring point in each third apparent resistivity to form a second apparent resistivity data body;

adding the original apparent resistivity data body and the apparent resistivity of each corresponding measuring point in the second apparent resistivity data body to obtain a third apparent resistivity data body;

determining the apparent resistivity of a plurality of preset high-frequency band frequency numbers in each measuring point in the third apparent resistivity data body;

and taking the average apparent resistivity of the apparent resistivities of a plurality of preset high-frequency band frequency numbers in each measuring point as each fourth apparent resistivity.

2. The method of claim 1, wherein determining each of the raw apparent resistivity data volumes comprising all of the apparent resistivity data in the predetermined direction comprises:

acquiring apparent resistivity of a plurality of preset intermediate frequency frequencies adjacent to a preset frequency in each measuring point in an original apparent resistivity data body;

and taking the average apparent resistivity of the apparent resistivity of a plurality of preset intermediate frequency frequencies adjacent to the preset frequency in each measuring point as each original apparent resistivity.

3. The method of claim 1, wherein replacing the apparent resistivity of the corresponding location in each original apparent resistivity with the apparent resistivity of each second apparent resistivity having a relative error not less than a predetermined relative error threshold based on the relative error of each original apparent resistivity and the apparent resistivity of each corresponding location in each second apparent resistivity, comprises:

Determining a relative error of each original apparent resistivity and the apparent resistivity of each corresponding position in each second apparent resistivity;

when the relative error of the apparent resistivity of each corresponding position is smaller than a preset relative error threshold, the apparent resistivity of the corresponding position in each original apparent resistivity is taken as the apparent resistivity of the corresponding position of each third apparent resistivity;

and when the relative error of the apparent resistivity of each corresponding position is not smaller than the preset relative error threshold, taking the apparent resistivity of the corresponding position in each second apparent resistivity as the apparent resistivity of the corresponding position of each third apparent resistivity.

4. The method of claim 1, wherein filtering each fourth apparent resistivity to obtain a filtered result of each fourth apparent resistivity at the home location comprises:

performing Kriging interpolation on each fourth apparent resistivity by adopting a regular interpolation grid to obtain each second interpolation apparent resistivity; the ratio of the grid interval of the regular interpolation grid to the data interval of the fourth apparent resistivity is any multiple in a preset multiple interval;

carrying out Gaussian low-pass filtering on each second interpolation apparent resistivity by adopting a second filtering window to obtain each fifth apparent resistivity;

And performing inverse interpolation on each fifth apparent resistivity to obtain a filtering result of each fourth apparent resistivity at the original position and each sixth apparent resistivity.

5. The method of claim 1, wherein determining a fourth apparent resistivity data volume after static correction of the original apparent resistivity data volume based on each fourth apparent resistivity and corresponding each sixth apparent resistivity, and the second apparent resistivity data volume, comprises:

determining a difference value between each fourth apparent resistivity and each corresponding measuring point in each sixth apparent resistivity to form a third apparent resistivity data body;

and adding the apparent resistivity of each corresponding measuring point in the second apparent resistivity data body and the third apparent resistivity data body to obtain a fourth apparent resistivity data body.

6. The method of claim 1, further comprising, prior to determining each of the original apparent resistivity data volumes comprising all of the apparent resistivity data in the predetermined direction:

taking the logarithm taking the preset value as the base for the original apparent resistivity data body to obtain a first apparent resistivity data body;

accordingly, determining each original apparent resistivity in the original apparent resistivity data volume including all the apparent resistivity data in the preset direction includes:

Each original apparent resistivity in a first apparent resistivity data volume including all of the apparent resistivity data in the predetermined direction is determined.

7. The method of claim 6, further comprising, after determining a fourth apparent resistivity data volume after the static correction of the original apparent resistivity data volume based on each fourth apparent resistivity and corresponding each sixth apparent resistivity, and the second apparent resistivity data volume:

and performing anti-logarithm operation on the fourth apparent resistivity data body to determine a fifth apparent resistivity data body corrected by the original apparent resistivity data body.

8. A static displacement correction device, comprising:

the correction result obtaining module is used for determining fourth visual resistivity data bodies after static correction on the original visual resistivity data bodies according to each fourth visual resistivity, each sixth visual resistivity and the second visual resistivity data bodies;

wherein the first filtering module comprises:

the first interpolation unit is used for performing Kriging interpolation on each original apparent resistivity by adopting a regular interpolation grid to obtain each first interpolation apparent resistivity; the ratio of the grid interval of the regular interpolation grid to the data interval of the original apparent resistivity is any multiple in a preset multiple interval;

The moving average filtering unit is used for carrying out moving average filtering on each first interpolation apparent resistivity by adopting a first filtering window to obtain each first apparent resistivity; the central position data of the first filtering window does not participate in filtering;

the first inverse interpolation unit is used for carrying out inverse interpolation on each first apparent resistivity to obtain each second apparent resistivity of the filtering result of each original apparent resistivity at the original position;

the fourth apparent resistivity determination module includes:

the first difference value determining unit is used for determining the difference value between each original apparent resistivity and each corresponding measuring point in each corresponding third apparent resistivity to form a second apparent resistivity data body;

the first adding unit is used for adding the apparent resistivity of each corresponding measuring point in the original apparent resistivity data body and the second apparent resistivity data body to obtain a third apparent resistivity data body;

the visual resistivity determining unit is used for determining visual resistivities of a plurality of preset high-frequency band frequency numbers in each measuring point in the third visual resistivity data body;

and the second average unit is used for taking the average apparent resistivity of the apparent resistivities of a plurality of preset high-frequency band frequency numbers in each measuring point as each fourth apparent resistivity.

9. The static displacement correction device of claim 8, wherein the raw apparent resistivity determination module comprises:

the visual resistivity acquisition unit is used for acquiring visual resistivity of a plurality of preset intermediate frequency frequencies adjacent to the preset frequency in each measuring point in the original visual resistivity data body;

and the first average unit is used for taking the average apparent resistivity of the preset plurality of intermediate frequency frequencies adjacent to the preset frequency in each measuring point as each original apparent resistivity.

10. The static displacement correction device of claim 8, wherein the replacement module comprises:

a relative error determination unit for determining a relative error of each original apparent resistivity and the apparent resistivity of each corresponding position in each second apparent resistivity;

the reservation unit is used for taking the apparent resistivity of the corresponding position in each original apparent resistivity as the apparent resistivity of the corresponding position of each third apparent resistivity when the relative error of the apparent resistivity of each corresponding position is smaller than a preset relative error threshold value;

and the replacing unit is used for taking the apparent resistivity of the corresponding position in each second apparent resistivity as the apparent resistivity of the corresponding position of each third apparent resistivity when the relative error of the apparent resistivity of each corresponding position is not smaller than the preset relative error threshold.

11. The static displacement correction apparatus of claim 8, wherein the second filtering module comprises:

the second interpolation unit is used for performing Kriging interpolation on each fourth apparent resistivity by adopting a regular interpolation grid to obtain each second interpolation apparent resistivity; the ratio of the grid interval of the regular interpolation grid to the data interval of the fourth apparent resistivity is any multiple in a preset multiple interval;

the low-pass filtering unit is used for carrying out Gaussian low-pass filtering on each second interpolation apparent resistivity by adopting a second filtering window to obtain each fifth apparent resistivity;

and the second inverse interpolation unit is used for carrying out inverse interpolation on each fifth apparent resistivity to obtain a filtering result of each fourth apparent resistivity at the original position and each sixth apparent resistivity.

12. The static displacement correction apparatus as claimed in claim 8, wherein the correction result obtaining module comprises:

the second difference value determining unit is used for determining the difference value between each fourth apparent resistivity and each corresponding measuring point in each corresponding sixth apparent resistivity to form a third apparent resistivity data body;

and the second adding unit is used for adding the apparent resistivity of each corresponding measuring point in the second apparent resistivity data body and the third apparent resistivity data body to obtain a fourth apparent resistivity data body.

13. The static displacement correction device as claimed in claim 8, further comprising:

the logarithmic module is used for taking the logarithm based on a preset value for the original apparent resistivity data body to obtain a first apparent resistivity data body;

correspondingly, the original apparent resistivity determining module is specifically configured to determine each original apparent resistivity in the first apparent resistivity data body including all the apparent resistivity data in the preset direction.

14. The static displacement correction device as claimed in claim 13, further comprising:

and the antilog module is used for carrying out antilog operation on the fourth visual resistivity data body and determining a fifth visual resistivity data body after the correction of the original visual resistivity data body.

15. A computer device comprising a memory, a processor and a computer program stored on the memory and executable on the processor, characterized in that the processor implements the static displacement correction method according to any of claims 1 to 7 when executing the computer program.

16. A computer readable storage medium, characterized in that the computer readable storage medium stores a computer program which, when executed by a processor, implements the static displacement correction method of any one of claims 1 to 7.