CN113093480A - 一种并行曝光抑制超衍射极限激光直写物镜 - Google Patents
一种并行曝光抑制超衍射极限激光直写物镜 Download PDFInfo
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- CN113093480A CN113093480A CN202110403505.2A CN202110403505A CN113093480A CN 113093480 A CN113093480 A CN 113093480A CN 202110403505 A CN202110403505 A CN 202110403505A CN 113093480 A CN113093480 A CN 113093480A
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- lens
- direct writing
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- laser direct
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- 230000001629 suppression Effects 0.000 title claims abstract description 27
- 230000004075 alteration Effects 0.000 claims abstract description 16
- 239000006185 dispersion Substances 0.000 claims abstract description 5
- 239000005331 crown glasses (windows) Substances 0.000 claims abstract description 4
- 239000005308 flint glass Substances 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims description 2
- 230000005764 inhibitory process Effects 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 4
- 230000003287 optical effect Effects 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 3
- 230000002401 inhibitory effect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000009022 nonlinear effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/0015—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/008—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras designed for infrared light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110403505.2A CN113093480B (zh) | 2021-04-15 | 2021-04-15 | 一种并行曝光抑制超衍射极限激光直写物镜 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110403505.2A CN113093480B (zh) | 2021-04-15 | 2021-04-15 | 一种并行曝光抑制超衍射极限激光直写物镜 |
Publications (2)
Publication Number | Publication Date |
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CN113093480A true CN113093480A (zh) | 2021-07-09 |
CN113093480B CN113093480B (zh) | 2024-02-13 |
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CN202110403505.2A Active CN113093480B (zh) | 2021-04-15 | 2021-04-15 | 一种并行曝光抑制超衍射极限激光直写物镜 |
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CN (1) | CN113093480B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113900227A (zh) * | 2021-10-09 | 2022-01-07 | 中国科学院苏州生物医学工程技术研究所 | 一种大视场高分辨宽波段的物镜 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5805344A (en) * | 1994-11-10 | 1998-09-08 | Nikon Corporation | Projection optical system and projection exposure apparatus |
US6104544A (en) * | 1994-12-14 | 2000-08-15 | Nikon Corporation | Exposure apparatus |
US20040017554A1 (en) * | 2002-05-14 | 2004-01-29 | Carl Zeiss Smt Ag | Projection exposure system |
CN109375480A (zh) * | 2018-12-30 | 2019-02-22 | 上海微电子装备(集团)股份有限公司 | 一种光刻投影物镜及光刻机 |
-
2021
- 2021-04-15 CN CN202110403505.2A patent/CN113093480B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5805344A (en) * | 1994-11-10 | 1998-09-08 | Nikon Corporation | Projection optical system and projection exposure apparatus |
US6104544A (en) * | 1994-12-14 | 2000-08-15 | Nikon Corporation | Exposure apparatus |
US20040017554A1 (en) * | 2002-05-14 | 2004-01-29 | Carl Zeiss Smt Ag | Projection exposure system |
CN109375480A (zh) * | 2018-12-30 | 2019-02-22 | 上海微电子装备(集团)股份有限公司 | 一种光刻投影物镜及光刻机 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113900227A (zh) * | 2021-10-09 | 2022-01-07 | 中国科学院苏州生物医学工程技术研究所 | 一种大视场高分辨宽波段的物镜 |
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Publication number | Publication date |
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CN113093480B (zh) | 2024-02-13 |
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Inventor after: Bai Jian Inventor after: Cui Zhiying Inventor after: Huang Muwang Inventor after: Wang Hongqing Inventor after: Liu Qiulan Inventor after: Kuang Cuifang Inventor after: Wei Zhen Inventor after: Ding Chenliang Inventor after: Liu Xu Inventor after: Li Haifeng Inventor after: Zhang Lingmin Inventor after: Xu Liang Inventor after: Zhu Dazhao Inventor before: Bai Jian Inventor before: Kuang Cuifang Inventor before: Wei Zhen Inventor before: Ding Chenliang Inventor before: Liu Xu Inventor before: Xu Liang Inventor before: Zhu Dazhao Inventor before: Wang Hongqing Inventor before: Liu Qiulan |
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