CN1130600C - Photosensitive plate with very thin photosensitive layer and its preparation and application - Google Patents
Photosensitive plate with very thin photosensitive layer and its preparation and application Download PDFInfo
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- CN1130600C CN1130600C CN 99119619 CN99119619A CN1130600C CN 1130600 C CN1130600 C CN 1130600C CN 99119619 CN99119619 CN 99119619 CN 99119619 A CN99119619 A CN 99119619A CN 1130600 C CN1130600 C CN 1130600C
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- diphenylamine
- plate
- light sensitive
- sensitive plate
- diazo
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- 238000002360 preparation method Methods 0.000 title claims description 15
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 claims abstract description 42
- 239000011347 resin Substances 0.000 claims abstract description 36
- 229920005989 resin Polymers 0.000 claims abstract description 36
- 238000000034 method Methods 0.000 claims abstract description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 12
- 239000004411 aluminium Substances 0.000 claims abstract description 12
- 239000004033 plastic Substances 0.000 claims abstract description 5
- 238000001338 self-assembly Methods 0.000 claims abstract description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 31
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 17
- 239000007864 aqueous solution Substances 0.000 claims description 15
- 239000000839 emulsion Substances 0.000 claims description 15
- 239000012954 diazonium Substances 0.000 claims description 14
- 235000011149 sulphuric acid Nutrition 0.000 claims description 13
- 238000009833 condensation Methods 0.000 claims description 11
- 230000005494 condensation Effects 0.000 claims description 11
- 239000001117 sulphuric acid Substances 0.000 claims description 11
- -1 diphenylamine diazonium salt Chemical class 0.000 claims description 7
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 4
- 229910052708 sodium Inorganic materials 0.000 claims description 4
- 239000011734 sodium Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims 1
- YOVCPQPAIVBIFV-UHFFFAOYSA-N formaldehyde;n-phenylaniline Chemical compound O=C.C=1C=CC=CC=1NC1=CC=CC=C1 YOVCPQPAIVBIFV-UHFFFAOYSA-N 0.000 claims 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 6
- 239000007788 liquid Substances 0.000 abstract description 6
- 239000003960 organic solvent Substances 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 239000003643 water by type Substances 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical class Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 6
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 206010070834 Sensitisation Diseases 0.000 description 4
- 239000000376 reactant Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 230000008313 sensitization Effects 0.000 description 4
- 235000011121 sodium hydroxide Nutrition 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229920004933 Terylene® Polymers 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 239000012047 saturated solution Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 235000005074 zinc chloride Nutrition 0.000 description 3
- 239000011592 zinc chloride Substances 0.000 description 3
- NDACNGSDAFKTGE-UHFFFAOYSA-N 3-hydroxydiphenylamine Chemical compound OC1=CC=CC(NC=2C=CC=CC=2)=C1 NDACNGSDAFKTGE-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 235000011167 hydrochloric acid Nutrition 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 229920002866 paraformaldehyde Polymers 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical class [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- 235000010288 sodium nitrite Nutrition 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- MKASXAGBWHIGCF-UHFFFAOYSA-N 3-methoxy-n-phenylaniline Chemical compound COC1=CC=CC(NC=2C=CC=CC=2)=C1 MKASXAGBWHIGCF-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 229920006221 acetate fiber Polymers 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910000474 mercury oxide Inorganic materials 0.000 description 1
- UKWHYYKOEPRTIC-UHFFFAOYSA-N mercury(ii) oxide Chemical compound [Hg]=O UKWHYYKOEPRTIC-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical compound [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
The present invention relates to a photosensitive plate with an ultrathin photosensitive layer, a manufacture method thereof and application thereof. The photosensitive layer is an ultrathin film formed on a printing aluminium plate or a plastic plate coated with a hydrophilic layer by diphenylamine diazotized resin or substituted diphenylamine diazotized resin in a self-assembly method. The thickness is from 0.005 mu m to 0.01 mu m, and is only about 0.5% to 1% of that of a common photosensitive plate. The photosensitive plate has high sensitivity, and the light exposure is only about 1/10 to 1/50 of that of the common photosensitive plate. The photosensitive plate has high printing resistance rate and is used for continuously printing 80000 to 90000 portions of presswork, and letters or images on the printing plate have no obvious change. The photosensitive plate has excellent lipophilicity, and plate moistening liquid does not need to be used from the print start and in the process. The water is used as developing liquid, and therefore, the photosensitive plate has no need of an organic solvent and no pollution. In addition, the photosensitive plate has the advantages of simple and convenient manufacture method, no need of a coating machine and low production cost.
Description
The present invention relates to a kind of light sensitive plate and method for making and purposes of very thin photosensitive layer.
The sensitization liquid that existing negative type printing is made up of emulsion, film-forming resin and organic solvent with light sensitive plate (bare female pattern pre-coating photosensitive plate) is coated with on aluminium plate in printing and forms.Emulsion majority wherein is a diphenylamine diazoresin, and it is that condensation in the concentrated sulphuric acid makes by diphenylamine-4-diazonium salt and formaldehyde.It is mixed with the film-forming resin of proper proportion, add organic solvent, form sensitization liquid.Sensitization liquid is coated on printing with on the aluminium plate through coating apparatus, treat solvent evaporates after, form photographic layer, its thickness is about 1-2 μ m, photographic layer can not be too thin, the too thin lipophilicity that influences writings and image.
The objective of the invention is, provide a kind of its used emulsion single, without organic solvent, without coating apparatus, and, prepare easy light sensitive plate.
Sensitization liquid of the present invention is water without organic solvent, and emulsion is diphenylamine diazoresin or substituted diphenylamine diazo resin.Negative is the system aluminium plate used of pre-coating light sensitive plate or the plastic duplicate plate that scribbles hydrophilic layer.Described hydrophilic layer has: the material that zinc paste and acetate fiber or other present technique field those of ordinary skill are known.By the method for self assembly, make emulsion on negative, form photographic layer, its thickness only is 5-10nm (0.005-0.01 μ m).Photographic layer combine with negative unusual compact and firm, use erasing rubber, it can not be wiped.The luminous sensitivity of light sensitive plate of the present invention is high especially, than the used usually high 10-50 of photosensitive printed board doubly.
The light sensitive plate of very thin photosensitive layer of the present invention comprises:
1. negative: for the used aluminium plate of preparation negative or prepainted relief photosensitive plate usually or scribble the plastic duplicate plate of hydrophilic layer.
2. photographic layer: be diphenylamine diazonium salt or substituted diphenylamine diazo salt and formaldehyde condensation in concentrated sulphuric acid medium, the diphenylamine diazoresin that makes or substituted diphenylamine diazo resin.
This light sensitive plate is the aqueous solution by described negative and emulsion, and by self-assembling method, formation photographic layer film constitutes on negative, and film thickness is 0.005-0.01 μ m.
The manufacture method of the light sensitive plate of very thin photosensitive layer of the present invention comprises:
1). the purifying industrial grade diphenylamine diazonium salt, for example, diphenylamine-4-diazonium salt or substituted diphenylamine-4-diazo salt etc., to be dissolved in ethanol under the technical grade diphenylamine diazonium salt lucifuge room temperature to be purified, make alcohol saturated solution, in wherein adding its volume 3-5 absolute ether doubly, the diazo salt that precipitates is filtered again, dry stand-by in the dark place.
2). with diphenylamine diazonium salt or substituted diphenylamine diazo salt and formaldehyde condensation in concentrated sulphuric acid medium, preparation diphenylamine diazoresin or substituted diphenylamine diazo resin.
3). diphenylamine diazoresin or substituted diphenylamine diazo resin is soluble in water, make the aqueous solution that weight concentration is 0.15-0.40%.
4). negative was soaked 3-6 minute in above-mentioned diazo resin aqueous solution, take out, dry in the dark place, promptly get the light sensitive plate of described very thin photosensitive layer, this kind practice is referred to as self-assembly method.
The purposes of the light sensitive plate of very thin photosensitive layer of the present invention comprises:
On described light sensitive plate, cover a negative photographic negative (or claiming mask), and press a glass thereon; Apart from its 15-25 centimeters, expose 5-10 second with 300 watts of high-pressure sodium lamps; Develop with clear water, dry after the washing, can on offset press or other printing machines, print.Exposure, the photographic plate after the development, the illumination part is hydrophilic, not illumination part oleophylic China ink.Obtain the image just in time opposite behind the last China ink with the black and white of egative film.
The excellent characteristics of the light sensitive plate of very thin photosensitive layer of the present invention and outstanding effect:
(1). the used emulsion of this light sensitive plate is single, without organic solvent, has avoided pollution, without coating apparatus, reduced production cost, photographic layer is ultra-thin, thickness is 0.005-0.01 μ m, and one of two percentages that only are the common photosensitive version are to one of percentage, the close and firm that is connected of negative and photographic layer.
(2). this light sensitive plate press resistance rate extra-high-speed, print eight to 90,000 parts continuously, literal on the galley or the no significant change of image.
(3). this light sensitive plate sensitivity is high, and exposure only is the 1/10-1/50 of common photosensitive version.
(4). preparation and all waters that develops avoided pollution fully, and preparation are to use self-assembling method, makes preparation flow become simple.
In order to be illustrated more clearly in the present invention, the embodiment that is listed below, but it does not have any restriction to scope of the present invention.
The preparation of example 1. 3-methoxy diphenylamine-4-diazo salt:
1. with 200 milliliters of aniline (2.20 moles), 55.6 milliliters of phosphoric acid (1.04 moles), 500 ml waters, be added in the autoclave of 2 liters of capacity, after stirring well, add again 220 the gram (2.00 moles) between-benzenediol and 200 ml waters, 100 milliliters of aniline, seal autoclave, be warmed up to 180 ℃, natural cooling after 2 hours obtains the 3-hydroxy diphenylamine, dry weight 300 grams, productive rate 81%.
2. 3-hydroxy diphenylamine crude product 300 grams (1.62 moles) that obtain more than inciting somebody to action are added in 1 liter of flask, add 500 ml waters, 150 gram sodium hydroxids (3.75 moles), be heated to 90-95 ℃, drip 190 milliliters of dimethyl suflfates (92.01 moles), added in 1 hour, reacted 5 hours down in boiling, the reactant layering divides oil-yielding stratum while hot again, sodium hydroxide solution washing oil layer with 100 milliliter 20%, decompression distillation again, the fraction of 160-170 ℃/0.3mmHg of collection is 3-methoxy diphenylamine (white solid), weigh 257 grams, productive rate 80%.
3. restrain (0.127 mole) 3-methoxy diphenylamines with 25.3,600 milliliter of 95% ethanol, 40 milliliters of concentrated hydrochloric acids mix, at 0-5 ℃, be dissolved in the aqueous solution of 20 ml waters in wherein dripping 10.8 gram (0.157 mole) sodium nitrites, after dripping, after continuing to react half an hour, reactant is poured in 500 milliliters of frozen water, is neutralized to pH=7 with NaOH, boil off most of ethanol after, use chloroform extraction, the pressure reducing and steaming chloroform gets brown oil, is 3-methoxyl-4-nitrosodiphenylamine.It directly is dissolved in the 30 gram toluene, adds the methyl alcohol hydrogen chloride saturated solution of 24 grams 32% again, in 20-25 ℃ of reaction 1 hour, the sodium hydrate aqueous solution of adding 20% is to pH＞7, after reacting 1 hour again, placement is spent the night, and toluene layer inclines, the water layer heating that contains solid with remainder, be neutralized to pH=9-10 with 30% sulfuric acid, be settled out brown solid, be 3-methoxyl-4 nitrodiphenyl amine, output 23.7 grams, productive rate 82%.
4. with 12 gram (0.053 mole) 3-methoxyl-4 nitrodiphenyl amines, 50 ml waters, 50 milliliter 20% sodium hydrate aqueous solution mixes, at 35 ℃, in wherein adding 20.6 gram sodium thiosulfate, temperature rises to 60-65 ℃ automatically, keeps 65 ℃, reacts half an hour, add 65 milliliters of hydrochloric acid, get faint yellow solid 9.65 grams, be 3-methoxyl-4-amido diphenylamine, productive rate 85%.
5. 9.65 gram (0.045 mole) 3-methoxyl-4-amido diphenylamine are added in the 30 gram frozen water, add 20 milliliter 30% sulfuric acid again, dropping 3.45 gram sodium nitrites are dissolved in the solution in 10 ml waters, and in 0-5 ℃, reaction is 2 hours under the lucifuge, in filtrate, add 10 gram zinc chloride saturated solutions, get yellow mercury oxide, the lucifuge airing weighs 14 grams, productive rate 80% is 3-methoxy diphenylamine-4-diazo salt (1/2 zine chloride double salt).
Example 2. can make other and replace the diamines diazo salt according to the described method of similar example 1:
For example, N-methyldiphenylamine-4-diazo salt, 2-nitro-N-methyldiphenylamine-4-diazo salt, 2-sulfonic acid diphenylamine-4-diazonium salt, N-methyldiphenylamine-2-diazo salt or other replacement diamines diazo salts.
The preparation of example 3. diphenylamine-4-diazo resin:
With 15.7 gram (0.055 mole) diphenylamine-4-diazonium salt hydrochlorides (1/2 zine chloride double salt), under the frozen water cooling and stirring, be added in the there-necked flask that fills 30 milliliters of concentrated sulphuric acids in batches, the hydrogen chloride that produces is taken out with water pump, after waiting to exhaust hydrogen chloride,, add 2.0 gram (0.067 mole) levigate paraformaldehydes in 0-5 ℃ in batches, keep 5 ℃, reacted 4 hours.Reactant is poured in 600 ml waters, treat diazo resin dissolving after, filter.Add the saturated aqueous solution of 20 gram (0.147 mole) zinc chloride in filtrate, getting yellow negative ion is diphenylamine-4-diazonium salt-formaldehyde resin (or the nitrogen resin of weighing) zine chloride double salt of bisulfate ion, weighs 15 grams, productive rate 72%.
The preparation of example 4. 3-aminoanisole-4-diazo resin:
20 milliliters of concentrated sulphuric acids are added in 100 milliliters of there-necked flasks, add 5.87 gram (0.015 mole) 3-methoxy diphenylamine-4-diazonium sulfate in batches,, add levigate paraformaldehyde 0.54 gram (0.018 mole) under the lucifuge in batches in 0-5 ℃, added in 5-10 minute, reacted again two hours.Reactant is poured in 100 milliliters of frozen water, filtered, adding 10 gram zinc chloride are dissolved in the solution in 10 ml waters in filtrate, filter, and get yellow 3-methoxy diphenylamine-4-diazo resin (1/2 zine chloride double salt) 4.90 grams, productive rate 81%.
The preparation of example 5. other substituted diphenylamine diazo resins:
According to example 4 described similar approach, can make: N-methyldiphenylamine-4-weight resin, 2-nitro-N-methyldiphenylamine-4-diazo resin, 2-sulfonic acid diphenylamine-4-diazo resin, N-methyldiphenylamine-2-diazo resin or other replacement diamines diazo resins.
The preparation of the light sensitive plate of example 6 very thin photosensitive layers of the present invention:
(1). the diphenylamine-4-diazo resin of 0.2 gram example, 3 preparations is dissolved in 100 ml waters, makes the diazo resin aqueous solution.The printing of one 4 * 6 square centimeters (thick 0.2 millimeters) with aluminium plate or scribble the terylene version of hydrophilic layer, is put into above-mentioned aqueous solution and soaked 5 minutes under lucifuge, take out airing, promptly get aluminium plate is the light sensitive plate of very thin photosensitive layer for the basic diphenylamine-4-diazo resin of version.
(2). 3-methoxy diphenylamine-4-diazo resin that 0.2 gram example 4 is made is dissolved in 100 ml waters, makes the diazo resin aqueous solution.With the printing of one 4 * 6 square centimeters (thick 0.2 millimeters) with aluminium plate or scribble the terylene version of hydrophilic layer, putting into above-mentioned aqueous solution under lucifuge soaked 5 minutes, take out airing, promptly getting aluminium plate is the light sensitive plate of very thin photosensitive layer for the basic 3-methoxy diphenylamine-4-diazo resin of version.
(3). adopt above same method, respectively the aqueous solution of the diphenylamine diazoresin that makes with example 5 with print with aluminium plate or scribble the terylene version of hydrophilic layer, all can make the light sensitive plate of very thin photosensitive layer of the present invention.
The application of the light sensitive plate of the very thin photosensitive layer of example 7. inventions:
On the light sensitive plate of prepared very thin photosensitive layer, cover a negative egative film that literal or image are arranged, and press a glass thereon, apart from its 25 centimetres with the exposure of 300 watts of high-pressure sodium lamps after 5 seconds, in water, developed 5 minutes, washing again, dry, can print on the offset press or on other printing machines.
Claims (9)
1. a printing light sensitive plate is characterized in that described light sensitive plate is a kind of light sensitive plate of very thin photosensitive layer, and this light sensitive plate comprises:
1). negative: for the used aluminium plate of preparation negative or prepainted relief photosensitive plate or scribble the plastic duplicate plate of hydrophilic layer;
2). emulsion: be diphenylamine diazonium salt or substituted diphenylamine diazo salt and formaldehyde diphenylamine diazoresin that condensation makes in concentrated sulphuric acid medium or substituted diphenylamine diazo resin;
This light sensitive plate is the aqueous solution by described negative and emulsion, and by the self assembly mode, formation photographic layer film constitutes on negative, and film thickness is 0.005-0.01 μ m.
2. according to the described light sensitive plate of claim 1, it is characterized in that described emulsion is diphenylamine-4-diazonium salt and formaldehyde condensation in concentrated sulphuric acid medium, the diphenylamine that makes-4-diazo resin.
3. according to the described light sensitive plate of claim 1, it is characterized in that described emulsion is 3-methoxy diphenylamine-4-diazo salt and formaldehyde condensation in concentrated sulphuric acid medium, the 3-that makes methoxy diphenylamine-4-diazo resin.
4. according to the described light sensitive plate of claim 1, it is characterized in that described emulsion is N-methyldiphenylamine-4-diazo salt and the formaldehyde N-that condensation makes in concentrated sulphuric acid medium methyldiphenylamine-4-diazo resin.
5. according to the described light sensitive plate of claim 1, it is characterized in that described emulsion is 2-nitro-N-methyldiphenylamine-4-diazo salt and formaldehyde condensation in concentrated sulphuric acid medium, the 2-that makes nitro-N-methyldiphenylamine-4-diazo resin.
6. according to the described light sensitive plate of claim 1, it is characterized in that described emulsion is 2-sulfonic acid diphenylamine-4-diazonium salt and formaldehyde condensation in concentrated sulphuric acid medium, the 2-sulfonic acid diphenylamine-4-diazo resin that makes.
7. according to the described light sensitive plate of claim 1, it is characterized in that described emulsion is N-methyldiphenylamine-2-diazo salt and formaldehyde condensation in concentrated sulphuric acid medium, the N-that makes methyldiphenylamine-2-diazo resin.
8. the preparation method of the described light sensitive plate of claim 1 is characterized in that, described method comprises:
(1). with diphenylamine diazonium salt or substituted diphenylamine diazo salt and formaldehyde condensation in concentrated sulphuric acid medium, preparation diphenylamine diazoresin or substituted diphenylamine diazo resin;
(2). the diphenylamine diazoresin or the substituted diphenylamine diazo resin that make is soluble in water, make the aqueous solution that weight concentration is 0.15-0.4%;
(3). will prepare the used aluminium plate of negative or prepainted relief photosensitive plate or scribble the plastic duplicate plate of hydrophilic layer, and soak 3-6 minute in above-mentioned aqueous solution, and take out, dry the dark place, promptly gets the light sensitive plate of described very thin photosensitive layer.
9. the purposes of the described light sensitive plate of claim 1 is characterized in that, is used for printing on offset press and the general printing machine, comprising: cover a negative photographic negative on described light sensitive plate, and press a glass thereon; In apart from its 15-25 centimeters, expose 5-10 second with 300 watts of high-pressure sodium lamps; Develop with clear water, after drying, can be used for printing on the printing machine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 99119619 CN1130600C (en) | 1999-09-22 | 1999-09-22 | Photosensitive plate with very thin photosensitive layer and its preparation and application |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 99119619 CN1130600C (en) | 1999-09-22 | 1999-09-22 | Photosensitive plate with very thin photosensitive layer and its preparation and application |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1289071A CN1289071A (en) | 2001-03-28 |
| CN1130600C true CN1130600C (en) | 2003-12-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 99119619 Expired - Fee Related CN1130600C (en) | 1999-09-22 | 1999-09-22 | Photosensitive plate with very thin photosensitive layer and its preparation and application |
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| Country | Link |
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| CN (1) | CN1130600C (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100448688C (en) * | 2003-12-26 | 2009-01-07 | 三井化学株式会社 | Lithographic printing original plate and lithographic printing plate |
| CN102375332B (en) * | 2010-08-19 | 2013-07-17 | 中国科学院上海微系统与信息技术研究所 | Suspension photoresist planarization technology for MEMS structure |
| CN102998900A (en) * | 2012-12-01 | 2013-03-27 | 刘华礼 | Manufacturing method of photosensitive plate with ultrathin photosensitive layer |
| CN106125507A (en) * | 2016-08-23 | 2016-11-16 | 浙江荣生科技有限公司 | A kind of preparation method of novel speed silk screen photosensitive emulsion |
| CN107145037B (en) * | 2017-07-07 | 2020-05-12 | 京东方科技集团股份有限公司 | Photoresist composition and preparation method thereof |
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1999
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