CN112987493A - Preparation device and preparation method of thin film with large depth-to-width ratio structure - Google Patents
Preparation device and preparation method of thin film with large depth-to-width ratio structure Download PDFInfo
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- CN112987493A CN112987493A CN202110293579.5A CN202110293579A CN112987493A CN 112987493 A CN112987493 A CN 112987493A CN 202110293579 A CN202110293579 A CN 202110293579A CN 112987493 A CN112987493 A CN 112987493A
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- microstructure
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- 238000002360 preparation method Methods 0.000 title abstract description 12
- 239000010409 thin film Substances 0.000 title abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 23
- 239000012528 membrane Substances 0.000 claims abstract description 10
- 239000003292 glue Substances 0.000 claims description 10
- 238000005530 etching Methods 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 238000004049 embossing Methods 0.000 claims description 4
- 230000006698 induction Effects 0.000 claims description 4
- 229910000838 Al alloy Inorganic materials 0.000 claims description 3
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 claims description 3
- 238000005086 pumping Methods 0.000 claims description 3
- 238000007493 shaping process Methods 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 229910001256 stainless steel alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 84
- 210000001951 dura mater Anatomy 0.000 abstract description 18
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 210000003934 vacuole Anatomy 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000002131 composite material Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 3
- 229920000307 polymer substrate Polymers 0.000 description 3
- 238000001723 curing Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000003362 replicative effect Effects 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
The invention discloses a preparation device and a preparation method of a thin film with a large depth-to-width ratio structure, wherein the preparation device comprises the following components: casing, structure mantle, dura mater and pneumatic pump, the casing top is provided with the open-ended recess, the sealed cover of structure mantle is in on the recess, vacuole formation between casing and the structure mantle, the dura mater lid is established on the structure mantle, it is fixed that structure mantle and dura mater are whole through anchor clamps, the mechanical properties of structure mantle is different with the mechanical properties of dura mater, the pneumatic pump is installed on the casing, and the output of pneumatic pump inserts in the cavity, this device utilizes the different mechanical properties of dura mater and structure mantle, make two-layer membrane in the deformation process produce the meeting an emergency of not equidimension, make the original microstructure that possesses on the film can stretch, thereby break through original microstructure depth of processing limit, obtain the microstructure of bigger aspect ratio.
Description
Technical Field
The invention relates to the technical field of film preparation, in particular to a preparation device and a preparation method of a film with a large depth-to-width ratio structure.
Background
The micro-nano imprinting technology is mainly divided into a hot imprinting method and an ultraviolet imprinting method. According to different structural forms of the equipment, the equipment mainly comprises three categories of plate-to-plate (P2P), Roll-to-plate (R2P) and Roll-to-Roll (R2R).
The hot embossing technique is a process of heating a polymer substrate above a glass transition temperature (Tg) or a melting point (Tm) of a crystalline polymer and replicating a microstructure of a mold to a surface of the polymer substrate by applying pressure directed perpendicularly to the polymer substrate to the mold having the microstructure. Since the hot stamping technology has the characteristics of low cost, high yield and high resolution, the hot stamping technology has attracted attention of researchers in all countries around the world and becomes a new research hotspot for polymer micro-nano manufacturing.
Ultraviolet imprint technology ultraviolet curing method of microstructure formation was proposed in 1999 by Grant Wilson at texas state university by attaching a layer of photosensitive material on a mold and using the photosensitive polymer material as an imprint material. In the imprinting process, the mold applies a small pressure on the photosensitive polymer resist, and the resist is irradiated and cured by ultraviolet light, so that the microstructure imprinted by the mold is cured and molded. The ultraviolet light curing imprinting process does not need to raise or lower the temperature of the mold and the molding material, so that the molding precision of the microstructure is avoided, wherein the microstructure is influenced by the thermal deformation of the mold and the molding material.
The above processes do not readily produce high aspect ratio structures due to the difficulty in demolding, and therefore, new methods for forming high aspect ratio structures are needed in the art.
Disclosure of Invention
The present invention is directed to at least one of the problems of the prior art, and provides a device for manufacturing a thin film with a high aspect ratio.
The invention also provides a preparation method of the film with the large depth-to-width ratio structure.
According to an embodiment of the first aspect of the present invention, there is provided a device for preparing a high aspect ratio structural thin film, including: casing, structure mantle, dura mater and pneumatic pump, the casing top is provided with the open-ended recess, the sealed cover of structure mantle is in on the recess, the casing with vacuole formation between the structure mantle, the dura mater lid is established on the structure mantle, the structure mantle with the dura mater is whole fixed through anchor clamps, the mechanical properties of structure mantle with the mechanical properties of dura mater is different, the pneumatic pump is installed on the casing, just the output of pneumatic pump inserts in the cavity.
Has the advantages that: the device for preparing the high-aspect-ratio structural film comprises: casing, structure mantle, dura mater and pneumatic pump, the casing top is provided with the open-ended recess, the sealed cover of structure mantle is in on the recess, vacuole formation between casing and the structure mantle, the dura mater lid is established on the structure mantle, it is fixed that structure mantle and dura mater are whole through anchor clamps, the mechanical properties of structure mantle is different with the mechanical properties of dura mater, the pneumatic pump is installed on the casing, and the output of pneumatic pump inserts in the cavity, this device utilizes the different mechanical properties of dura mater and structure mantle, make two-layer membrane in the deformation process produce the meeting an emergency of not equidimension, make the original microstructure that possesses on the film can stretch, thereby break through original microstructure depth of processing limit, obtain the microstructure of bigger aspect ratio.
According to the manufacturing device of the high aspect ratio structural film, the microstructure on the film surface of the structural soft film is processed in advance by an embossing or etching or electrically inducing method.
According to the manufacturing device of the high aspect ratio structural film, the shape of the microstructure on the film surface of the structural flexible film is circular or rectangular, the length range of the microstructure on the film surface of the structural flexible film is 50nm-500 μm, and the height range of the microstructure is 50nm-500 μm.
According to the manufacturing device of the high aspect ratio structural film, the young's modulus of the hard film is larger than the young's modulus of the structural soft film, the young's modulus of the hard film is in the range of 100Mpa-10000Mpa, and the young's modulus of the structural soft film is in the range of 10Mpa-1000 Mpa.
According to the device for preparing the high aspect ratio structural film, the hard film and the structural soft film are adhered by using the adhesive.
According to the manufacturing device of the high aspect ratio structural film, the vacuum limit range of the pneumatic pump is 20Kpa-101 Kpa.
According to the manufacturing device of the high aspect ratio structural film, the material of the structural soft film is ETFE or PET.
According to the manufacturing device of the high aspect ratio structural film, the shell is made of stainless steel or aluminum alloy, and the length of the groove of the shell ranges from 1mm to 100 mm.
A method for preparing a high-aspect-ratio structural film comprises the following steps:
s1: processing a microstructure array on the film by adopting an imprinting or etching or electric induction method to form a structural soft film;
s2: adhering the structural soft film and the hard film together to form a laminated film, transferring the laminated film to the shell, and clamping by using a clamp;
s3: opening an air valve of the pneumatic pump, pumping out the air in the cavity through the pneumatic pump, and forming a negative pressure of 20-101 Kpa in the cavity, wherein the structural soft membrane and the hard membrane generate strain simultaneously;
s4: keeping the air pressure pump to continue working for 10-60 min after the deformation is stable, and shaping;
s5: and opening the clamp, and separating the hard film from the structural soft film by using degumming agent to obtain the microstructure film with the large depth-to-width ratio.
According to the method for manufacturing a high aspect ratio structural film in the second embodiment of the present invention, in step S2, the structural soft film and the hard film are adhered by UV glue, and in step S5, the hard film and the structural soft film are separated by a debonding agent.
Drawings
The invention is further described below with reference to the accompanying drawings and examples;
FIG. 1 is a schematic diagram of an apparatus for manufacturing a thin film with a high aspect ratio according to an embodiment of the present invention.
Detailed Description
Reference will now be made in detail to the present preferred embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to like elements throughout.
In the description of the present invention, it should be understood that the orientation or positional relationship referred to in the description of the orientation, such as the upper, lower, front, rear, left, right, etc., is based on the orientation or positional relationship shown in the drawings, and is only for convenience of description and simplification of description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
In the description of the present invention, the meaning of a plurality of means is one or more, the meaning of a plurality of means is two or more, and larger, smaller, larger, etc. are understood as excluding the number, and larger, smaller, inner, etc. are understood as including the number. If the first and second are described for the purpose of distinguishing technical features, they are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present invention, unless otherwise explicitly limited, terms such as arrangement, installation, connection and the like should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meanings of the above terms in the present invention in combination with the specific contents of the technical solutions.
Referring to fig. 1, an apparatus for preparing a high aspect ratio structure thin film includes: a housing 100, a structural soft membrane 200, a hard membrane 300, and a pneumatic pump 500. Wherein, the casing 100 top is provided with open-ended recess 110, the sealed cover of structure mantle 200 is on recess 110, form the cavity between casing 100 and the structure mantle 200, the dura mater 300 lid is established on structure mantle 200, structure mantle 200 and dura mater 300 are whole to be fixed through anchor clamps 400, the mechanical properties of structure mantle 200 and the mechanical properties of dura mater 300 are different, pneumatic pump 500 installs on casing 100, and the output of pneumatic pump 500 inserts in the cavity, dura mater 300 and structure mantle 200 have different mechanical properties, produce the deformation of not equidimension simultaneously under pneumatic pump 500's work, finally make the structure on the structure mantle 200 obtain tensile, realize the big aspect ratio microstructure.
In some of these embodiments, the microstructure of the film surface of the structured soft film 200 is pre-machined by embossing or etching or electrically induced methods. The shape of the microstructure on the film surface of the soft structural film 200 is circular or rectangular, the length range of the microstructure on the film surface of the soft structural film 200 is 50nm-500 μm, and the height range is 50nm-500 μm.
It is easily understood that the young's modulus of the hard film 300 is greater than that of the structural soft film 200, the strain of the hard film 300 is less than that of the structural soft film 200 under the same stress, the young's modulus of the hard film 300 ranges from 100Mpa to 10000Mpa, and the young's modulus of the structural soft film 200 ranges from 10Mpa to 1000 Mpa. The hard film 300 and the structural soft film 200 are adhered by using an adhesive, such as glue, an ultraviolet adhesive, and the like. The vacuum limit range of the pneumatic pump 500 is 20Kpa to 101 Kpa. The material of the structural soft film 200 is ETFE or PET. The housing 100 is made of stainless steel or aluminum alloy, and the length of the groove 110 of the housing 100 ranges from 1mm to 100 mm.
The preparation device of the film with the large depth-to-width ratio structure has wide prospect in the aspects of production, manufacture and application of the microstructure.
A method for preparing a high-aspect-ratio structural film comprises the following steps:
s1: processing a microstructure array on the film by adopting an imprinting or etching or electric induction method to form a structural soft film 200;
s2: the structural soft film 200 and the hard film 300 are bonded together by UV glue to form a laminated film, and the laminated film is transferred to the shell 100 and clamped by a clamp 400;
s3: opening the air valve of the pneumatic pump 500, pumping the air in the cavity out through the pneumatic pump 500, and forming a negative pressure of 20-101 Kpa in the cavity, wherein the structural soft membrane 200 and the hard membrane are simultaneously strained;
s4: after the deformation is stable, keeping the pneumatic pump 500 to continue working for 10-60 min, and shaping;
s5: the fixture 400 is opened and the hard film 300 is separated from the structural soft film 200 using a debonding agent to obtain a high aspect ratio microstructured film.
Therein, in step S5, the hard film 300 is separated from the structural soft film 200 using a debonder.
In one embodiment, a method for preparing a high aspect ratio structure film comprises the following steps:
s1: providing a mold with a pattern to be imprinted on the surface, and obtaining a patterned structure soft film by an imprinting method by using a soft film;
s2: using a UV glue-releasing hard film, and tightly attaching one side of the UV glue-releasing hard film with the glue to one side of the patterned thin film with the pattern to form a composite film;
s3: heating the composite film to a temperature between the glass transition temperatures of the patterned structure soft film and the UV glue-releasing hard film through a heating device, vacuumizing one side of the composite film with the patterned structure soft film through an air pressure control device to enable the patterned structure soft film to generate plastic deformation, stopping heating, starting cooling, stopping vacuumizing and recovering to normal pressure after the temperature of the device is reduced to room temperature, and taking out the composite film;
s4: and placing the composite film in an ultraviolet environment for a period of time to release the glue, so that the patterned thin film and the UV glue release hard film are separated, and the structure with the increased depth-to-width ratio is obtained.
The embodiments of the present invention have been described in detail with reference to the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge of those skilled in the art without departing from the gist of the present invention.
Claims (10)
1. A device for preparing a high-aspect-ratio structural film is characterized by comprising:
the top end of the shell is provided with an open groove;
the structure soft film is covered on the groove in a sealing mode, and a cavity is formed between the shell and the structure soft film;
the hard film is covered on the structural soft film, the structural soft film and the hard film are integrally fixed through a clamp, and the mechanical property of the structural soft film is different from that of the hard film; and
the pneumatic pump is installed on the shell, and the output end of the pneumatic pump is inserted into the cavity.
2. The apparatus for preparing a high aspect ratio structural film according to claim 1, wherein: the microstructure on the surface of the film of the structural soft film is processed in advance by an embossing or etching or electric induction method.
3. The apparatus for preparing a high aspect ratio structural film according to claim 1, wherein: the shape of the microstructure on the surface of the film of the structural soft film is circular or rectangular, the length range of the microstructure on the surface of the film of the structural soft film is 50nm-500 mu m, and the height range of the microstructure is 50nm-500 mu m.
4. The apparatus for preparing a high aspect ratio structural film according to claim 1, wherein: the Young modulus of the hard film is larger than that of the structural soft film, the range of the Young modulus of the hard film is 100Mpa-10000Mpa, and the range of the Young modulus of the structural soft film is 10Mpa-1000 Mpa.
5. The apparatus for preparing a high aspect ratio structural film according to claim 1, wherein: the hard film and the structural soft film are adhered by adopting an adhesive.
6. The apparatus for preparing a high aspect ratio structural film according to claim 1, wherein: the vacuum limit range of the pneumatic pump is 20Kpa-101 Kpa.
7. The apparatus for preparing a high aspect ratio structural film according to claim 1, wherein: the structural soft film is made of ETFE or PET.
8. The apparatus for preparing a high aspect ratio structural film according to claim 1, wherein: the shell is made of stainless steel or aluminum alloy materials, and the length range of the groove of the shell is 1mm-100 mm.
9. A method for preparing a structural film with a large depth-to-width ratio is characterized by comprising the following steps:
s1: processing a microstructure array on the film by adopting an imprinting or etching or electric induction method to form a structural soft film;
s2: adhering the structural soft film and the hard film together to form a laminated film, transferring the laminated film to the shell, and clamping by using a clamp;
s3: opening an air valve of the pneumatic pump, pumping out the air in the cavity through the pneumatic pump, and forming a negative pressure of 20-101 Kpa in the cavity, wherein the structural soft membrane and the hard membrane generate strain simultaneously;
s4: keeping the air pressure pump to continue working for 10-60 min after the deformation is stable, and shaping;
s5: and opening the clamp, and separating the hard film from the structural soft film by using degumming agent to obtain the microstructure film with the large depth-to-width ratio.
10. The method for preparing a high aspect ratio structural film according to claim 9, wherein: in step S2, the structural soft film and the hard film are adhered by UV glue, and in step S5, the hard film and the structural soft film are separated by a debonding agent.
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| CN202110293579.5A CN112987493B (en) | 2021-03-19 | 2021-03-19 | Preparation device and preparation method of high-aspect-ratio structural film |
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| CN202110293579.5A CN112987493B (en) | 2021-03-19 | 2021-03-19 | Preparation device and preparation method of high-aspect-ratio structural film |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113858648A (en) * | 2021-10-13 | 2021-12-31 | 安徽晟华光学科技有限公司 | Production equipment of diffusion film for small display |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101208783A (en) * | 2005-05-26 | 2008-06-25 | 应用材料股份有限公司 | Method to increase silicon nitride film tensile stress using post PECVD deposition UV cure |
| DE102008002736A1 (en) * | 2008-06-27 | 2009-12-31 | Robert Bosch Gmbh | Device for processing plate in nano-structured mold part, has pressure generating unit for generating pressure or stress deformation, and nano-structured structure forming unit for forming nano-structured structure in area of mold part |
| CN103434127A (en) * | 2013-08-08 | 2013-12-11 | 西安交通大学 | High depth-to-width ratio nanofiber structure based on mechanical stretching and preparation method of high depth-to-width ratio nanofiber structure |
| CN206788551U (en) * | 2017-05-01 | 2017-12-22 | 青岛天仁微纳科技有限责任公司 | A kind of vacuum nano Embosser |
| CN110482481A (en) * | 2019-07-08 | 2019-11-22 | 南京航空航天大学 | Expand the preparation method of the bionical pasting material of micro structure array in a kind of end |
| CN110562909A (en) * | 2019-01-04 | 2019-12-13 | 西北工业大学 | method and device for preparing flexible micro-nano functional structure with large area and high depth-to-width ratio by vacuum pressure forming |
| CN111152448A (en) * | 2020-01-19 | 2020-05-15 | 神田工业(苏州)有限公司 | Novel hard film and soft film laminating device with hard film on upper part |
| CN214846228U (en) * | 2021-03-19 | 2021-11-23 | 华南理工大学 | Preparation device for thin film with large depth-to-width ratio structure |
-
2021
- 2021-03-19 CN CN202110293579.5A patent/CN112987493B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101208783A (en) * | 2005-05-26 | 2008-06-25 | 应用材料股份有限公司 | Method to increase silicon nitride film tensile stress using post PECVD deposition UV cure |
| DE102008002736A1 (en) * | 2008-06-27 | 2009-12-31 | Robert Bosch Gmbh | Device for processing plate in nano-structured mold part, has pressure generating unit for generating pressure or stress deformation, and nano-structured structure forming unit for forming nano-structured structure in area of mold part |
| CN103434127A (en) * | 2013-08-08 | 2013-12-11 | 西安交通大学 | High depth-to-width ratio nanofiber structure based on mechanical stretching and preparation method of high depth-to-width ratio nanofiber structure |
| CN206788551U (en) * | 2017-05-01 | 2017-12-22 | 青岛天仁微纳科技有限责任公司 | A kind of vacuum nano Embosser |
| CN110562909A (en) * | 2019-01-04 | 2019-12-13 | 西北工业大学 | method and device for preparing flexible micro-nano functional structure with large area and high depth-to-width ratio by vacuum pressure forming |
| CN110482481A (en) * | 2019-07-08 | 2019-11-22 | 南京航空航天大学 | Expand the preparation method of the bionical pasting material of micro structure array in a kind of end |
| CN111152448A (en) * | 2020-01-19 | 2020-05-15 | 神田工业(苏州)有限公司 | Novel hard film and soft film laminating device with hard film on upper part |
| CN214846228U (en) * | 2021-03-19 | 2021-11-23 | 华南理工大学 | Preparation device for thin film with large depth-to-width ratio structure |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113858648A (en) * | 2021-10-13 | 2021-12-31 | 安徽晟华光学科技有限公司 | Production equipment of diffusion film for small display |
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