CN112959005A - Method for manufacturing long-term efficient antireflection micro-nano structure on copper surface and application - Google Patents
Method for manufacturing long-term efficient antireflection micro-nano structure on copper surface and application Download PDFInfo
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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Abstract
The invention belongs to the technical field of high heat conduction media, and discloses a method for manufacturing a long-term high-efficiency anti-reflection micro-nano structure on a copper surface, which comprises the following steps: polishing the red copper and/or copper simple substance sample; placing the polished sample on a laser processing platform, scanning the polished sample by using a pulse laser through a preset path to obtain the surface of the sample with a micro-nano composite structure, and packaging the sample into a vacuum bag; and placing the obtained sample in a sample furnace of a magnetron sputtering device, and growing a layer of silicon dioxide protective film on the surface of the micro-nano structure to obtain the long-term efficient long-term high-efficiency antireflection micro-nano structure. According to the invention, a micro-nano structure with anti-reflection property is prepared on the surface of copper, and then an inert film is grown on the surface of the micro-nano structure for protection by a film coating method, so that the micro-nano structure has the long-term and efficient anti-reflection property; by controlling the coating time of magnetron sputtering, the thickness of the silicon dioxide protective layer is flexibly controlled, the protective layer with strength performance is provided, and the problem of failure of the anti-reflection structure on the copper surface is effectively solved.
Description
Technical Field
The invention belongs to the technical field of high-heat-conducting media, and particularly relates to a method for manufacturing a long-term efficient anti-reflection micro-nano structure on a copper surface and application of the method.
Background
At present, copper has excellent heat conduction characteristic, red copper is also called red copper, is industrial pure copper, has the electrical conductivity and the thermal conductivity which are only inferior to those of noble metal silver, is widely used for preparing electric conduction, heat conduction and heat dissipation devices, and is the most common high heat conduction medium on power heat dissipation devices such as CPU, GPU, LED, LD and the like.
However, neither copper nor copper alloys are highly efficient at absorbing visible, near infrared and long-wave infrared. The average reflectivity of copper is more than 50% in the visible light wave band (400 nm-700 nm), and the average reflectivity is more than 80% in the wavelength from 700nm to the middle infrared. Therefore, copper is generally used as a high reflection medium of light waves, such as copper mirrors for ancient cosmetics and copper film mirrors on modern optical lenses, and the reflectivity of the optimized copper film mirror is over 95%. The reflectance curve of an alloy such as copper is shown in FIG. 5.
In an environment with strong light or strong scattered light, the scattered light needs to be completely absorbed by an absorber, the absorbed scattered light is usually converted into heat, and the heat is taken away by a metal heat sink (a copper simple substance, a copper alloy, an aluminum alloy and the like) or other heat dissipation modes. The red copper is a heat conductor with excellent performance and is suitable for being used as a heat sink material; however, red copper has a very low absorptivity to electromagnetic radiation such as visible light, near infrared, and intermediate infrared, and thus a method for greatly reducing the reflectivity of the copper surface is needed.
The laser processed micro-nano structure surface has important application in the research of various functional devices, such as broad spectrum antireflection, sub-wavelength antireflection, super-hydrophilic/hydrophobic surfaces, optical polarization devices and the like. In general, the functional properties of the surface of a material depend mainly on the chemical composition and the surface structure of the material. For the same substrate material, its chemical composition already determines its intrinsic properties, and therefore the surface structure of the material plays a crucial role for the overall functional properties. No matter what kind of functional characteristics of the surface are realized, a specific micro-nano structure needs to be constructed on the surface, and meanwhile, the surface components of the micro-nano structure are regulated and controlled. Nanosecond laser, picosecond laser and femtosecond laser scan the surface of the material to generate a micro-nano multimodal structure, and a novel preparation method of an irreplaceable surface micro-nano structure is developed. At the end of the 90 s of the 20 th century, the Eric Mazur professor group reported and systematically studied "black silicon", a new material. Researches show that the femtosecond laser etching monocrystalline silicon can generate a periodic pointed cone micron structure on the surface of the monocrystalline silicon, and the structure greatly reduces the surface reflectivity of the silicon material. Meanwhile, the femtosecond laser parameters have obvious influence on the microstructure of the black silicon, different background gases and pulse width preparation conditions also have obvious influence on the light absorption characteristic of the black silicon, and the oxygen group elements have important roles and positions in doping and scattering in a silicon energy band in the infrared light absorption characteristic. The discovery draws great attention in academic circles, and researchers at home and abroad expand the discovery into the preparation of various functional micro-nano structures of different materials for more than ten years, so that a series of breakthrough progresses are obtained.
The nano-structure surface is prepared by using nanosecond or femtosecond pulse laser, so that the visible light and infrared light can be efficiently absorbed on the surfaces of metals such as titanium alloy, aluminum alloy, tungsten simple substance, platinum simple substance and the like. The reflectivity can be reduced to be within 5% by a nanosecond/femtosecond mixing method or a method combining high-absorption nano particles and the like, and part of metal can be reduced to be within 1%. The titanium sapphire laser, the Yb laser, the Nd laser and other lasers with different wavelengths are used for preparing the copper simple substance surface structure, and effective light absorption can be achieved. However, the problem of reflectivity degradation over time is always present: the color of the microstructure surface changes from dark black to purple or green after being placed in air for 3-4 weeks, which is caused by the oxidation of the microstructure on the copper surface. In order to prevent the oxidation of the surface micro-nano structure, the antireflection effect is ineffective.
Through the above analysis, the problems and defects of the prior art are as follows: due to the oxidation of the microstructure on the copper surface, the color of the microstructure surface changes from dark black to purple or green after being placed in air for 3-4 weeks, and the problem that the reflectivity is degraded along with time always exists.
The difficulty in solving the above problems and defects is: the microstructure on the copper surface is effectively isolated from the environment for a long time by using an effective method, so that the microstructure is prevented from carrying out chemical reaction with oxygen in the air, and the antireflection function of the microstructure on the copper surface induced by laser can be ensured not to be influenced.
The significance of solving the problems and the defects is as follows: the metal copper with high-efficiency antireflection performance on the surface is an important material for key functional parts in the fields of solar selective absorbers, infrared sensing, thermal radiation sources, radiation heat transfer equipment, biological optical devices, surface Raman enhancement and the like. The method solves the problem that the reflectivity of the copper surface degrades along with time, realizes the long-term and efficient antireflection characteristic of the copper surface, has wide application potential in the fields of photoelectrons, stealth, sensing, airborne/spaceborne equipment and the like, and has great significance for promoting the development of the aerospace industry and the civil photoelectric industry.
Disclosure of Invention
Aiming at the problems in the prior art, the invention provides a method for manufacturing a long-term high-efficiency anti-reflection micro-nano structure on the surface of copper, and particularly relates to a method for manufacturing a long-term high-efficiency anti-reflection micro-nano structure on the surface of copper by combining laser and a coating and application thereof.
The invention is realized in such a way that a method for manufacturing a long-term high-efficiency antireflection micro-nano structure on the surface of copper comprises the following steps:
firstly, polishing a red copper and/or copper simple substance sample;
secondly, placing the polished sample on a laser processing platform, scanning the polished sample by using a pulse laser through a preset path to obtain the surface of the sample with a micro-nano composite structure, and packaging the surface of the sample into a vacuum bag;
and step three, placing the sample obtained in the step two in a sample furnace of a magnetron sputtering device, and growing a layer of silicon dioxide protective film on the surface of the micro-nano structure to obtain the long-term efficient antireflection micro-nano structure.
Further, in the second step, nanosecond, picosecond or femtosecond laser with the wavelength of 200 nm-5000 nm is used, and a laser light source is focused on the surface of the copper sample through a lens, an f-theta field lens and a microscope objective;
further, in the second step, scanning is carried out on the surface of the copper through light beam swinging or sample moving, a square grid, a hexagonal grid and a two-dimensional groove structure are prepared on the surface of the copper, and a micron-nanometer composite structure can be formed on the surface based on an interaction mechanism of pulse laser and a substance;
further, in the third step, after the surface micro-nano structure is formed, a layer of silicon dioxide film or silicon carbide, silicon nitride and aluminum oxide film is sputtered on the surface of the micro-nano structure by using a magnetron sputtering method by using a silicon dioxide target material, and the sample is subjected to secondary treatment after vacuum packaging.
Furthermore, in the third step, the thickness of the silicon dioxide is between 10nm and 10 mu m.
The invention also aims to provide the anti-reflection micro-nano structure manufactured by the method for manufacturing the long-term efficient anti-reflection micro-nano structure on the copper surface.
The invention also aims to provide a conductive device prepared by the antireflection micro-nano structure.
The invention also aims to provide a heat conduction device prepared from the anti-reflection micro-nano structure.
The invention also aims to provide a heat dissipation device prepared from the anti-reflection micro-nano structure.
It is another object of the present invention to provide a heat sink power device having a device mounted thereon.
By combining all the technical schemes, the invention has the advantages and positive effects that: according to the method for manufacturing the long-term high-efficiency antireflection micro-nano structure on the copper surface, the micro-nano structure with the antireflection characteristic is prepared on the copper surface, and then an inert film is grown on the surface of the micro-nano structure for protection through a film coating method, so that the micro-nano structure has the long-term high-efficiency antireflection functional characteristic.
According to the invention, abundant micro-nano composite structures can be formed on the copper surface component through the high power density characteristic of the pulse laser, so that the high-efficiency antireflection characteristic of the metal surface is realized; the copper surface treated by the pulse laser is dark black in a visible light environment; by controlling the coating time of magnetron sputtering, the thickness of the silicon dioxide protective layer can be flexibly controlled, and the protective layer with strength performance can be provided, so that the anti-reflection characteristic surfaces with different application environments can be prepared. Meanwhile, the problem of failure of the anti-reflection structure on the surface of the copper is effectively solved by magnetron sputtering of silicon dioxide, silicon carbide or silicon nitride and other nano inert films on the surface of the prepared micro-nano structure.
According to the invention, the pulse laser is adopted to scan the surface of the copper simple substance, a regular micro-nano composite structure can be prepared on the surface of the copper, and then the inert film growth is carried out on the surface of the micro-nano structure, so that the micro-nano structure has the characteristic of long-term and efficient antireflection function. In addition, the processing laser has a wide selection range, and the application range is expanded.
Drawings
Fig. 1 is a flow chart of a method for manufacturing a long-term efficient antireflection micro-nano structure on a copper surface according to an embodiment of the invention.
Fig. 2 is a schematic view of a process for preparing a long-term anti-reflection structure on a copper surface according to an embodiment of the present invention.
Fig. 3(a) is a schematic diagram of a micro-nano structure prepared on the surface of red copper by nanosecond and femtosecond laser shot by a visible light camera according to an embodiment of the present invention.
Fig. 3(b) is a scanning electron microscope picture of a micro-nano structure prepared on the surface of red copper by nanosecond and femtosecond laser according to an embodiment of the invention, and the scanning electron microscope picture shows an array with a period of 20 μm.
FIG. 4 is a reflection characteristic curve of a micro-nano structure prepared on a red copper surface by femtosecond laser and SiO plating2The reflection characteristic curve of the protective film is shown schematically.
FIG. 5 is a graph showing the reflectance curve of an alloy such as copper according to an embodiment of the present invention.
Fig. 6 is a water droplet contact angle diagram of copper provided by an embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail with reference to the following embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Aiming at the problems in the prior art, the invention provides a method for manufacturing a long-term high-efficiency anti-reflection micro-nano structure on the surface of copper and an application thereof, and the invention is described in detail with reference to the attached drawings.
As shown in fig. 1, the method for manufacturing a long-term efficient antireflection micro-nano structure on a copper surface according to the embodiment of the present invention includes the following steps:
s101, polishing red copper and/or copper simple substance samples;
s102, placing the polished sample on a laser processing platform, scanning the polished sample by using a pulse laser through a preset path to obtain the surface of the sample with a micro-nano composite structure, and packaging the sample into a vacuum bag;
and S103, placing the sample obtained in the step S102 in a sample furnace of a magnetron sputtering device, and growing a layer of silicon dioxide protective film on the surface of the micro-nano structure to obtain the long-term efficient antireflection micro-nano structure.
The technical solution of the present invention is further described with reference to the following examples.
Example 1
1. The main structure and principle of the invention
The schematic diagram of the preparation process of the long-term anti-reflection structure on the copper surface is shown in fig. 2.
2. Objects of the invention
The invention aims to provide a long-term efficient anti-reflection micro-nano structure on a copper surface and a preparation method thereof. In addition, the processing laser has a wide selection range, and the application range is expanded.
According to the invention, various micro-nano processing is prepared on the surface of a copper simple substance by nanosecond, picosecond and femtosecond laser, the reflectivity is tested, the reflectivity is very low (< 5%) in a visible light wave band, and the near infrared reflectivity is reduced to be within 20%. A micro-nano structure is prepared on the surface of red copper or copper alloy by nanosecond, picosecond or femtosecond laser, so that visible light and near infrared light can be effectively absorbed; absorbed incident light energy is converted into heat, the high heat conduction characteristic of the red copper or the copper alloy can rapidly transfer the heat out, and then the heat is conducted into the environment through air cooling, water cooling or other heat sinks. However, the micro-nano structure has a large contact area with air, and is easy to generate chemical reactions such as oxidation and nitridation, so that the antireflection effect of the surface of the micro-nano structure is reduced; in order to avoid the degradation of the anti-reflection effect, a layer of inert thin films such as silicon dioxide, silicon carbide, silicon nitride, aluminum oxide and the like is grown on the surface of the micro-nano structure in a mode of magnetron sputtering, spraying, evaporation, vapor deposition, laser thin film deposition, electroplating and the like, so that the chemical reaction of the micro-nano surface structure and air is prevented, and the long-term effective anti-reflection effect of the micro-nano structure on the surface of copper is ensured.
The surface micro-nano structure prepared by laser sometimes has hydrophilicity or hydrophobicity, the water wetting property of the micro-nano structure can be degraded along with time when the micro-nano structure is placed in an air environment for a long time, the mechanism of the degradation is the same as that of the antireflection degradation, and the interface and certain components in the air are subjected to chemical reaction, so that the water wetting property is changed. The method for growing the inert film on the surface of the micro-nano structure is also effective for the problem of degradation of the wettability of the micro-nano structure prepared by laser.
3. Technical scheme
The technical solution of the invention is as follows: a method for manufacturing a long-term high-efficiency antireflection micro-nano structure on the surface of copper is characterized by comprising the following steps of: according to the two-step preparation method, the micro-nano structure with the anti-reflection characteristic is prepared on the surface of copper, and then an inert film is grown on the surface of the micro-nano structure for protection through a film coating method, so that the micro-nano structure has the long-term and efficient anti-reflection functional characteristic.
Firstly, using nanosecond, picosecond or femtosecond laser with the wavelength of 200 nm-5000 nm to focus a laser light source on the surface of a copper sample through a lens, an f-theta field lens, a microscope objective and other focusing lenses; scanning is carried out on the copper surface through light beam swinging or sample moving, structures such as square grids, hexagonal grids, two-dimensional grooves and the like are prepared on the copper surface, and a micron-nanometer composite structure can be formed on the surface based on an interaction mechanism of pulse laser and a substance (as shown in figure 3).
And secondly, after the surface micro-nano structure is formed, the sample is not exposed in the air for a long time, and the sample is subjected to secondary treatment after vacuum packaging. In the embodiment, a specific mode is that a layer of silicon dioxide film or silicon carbide, silicon nitride and aluminum oxide film is sputtered on the surface of the micro-nano structure by using a magnetron sputtering method and a silicon dioxide target material, so that the micro-nano surface structure is prevented from chemically reacting with air, and the anti-reflection effect of the micro-nano structure on the surface of copper is ensured to be effective for a long time. The thickness of the silicon dioxide is between 10nm and 10 mu m.
The method can be realized by the following steps:
(1) polishing a red copper (copper simple substance) sample;
(2) placing the polished sample on a laser processing platform, scanning the polished sample by using a pulse laser through a preset path to obtain the surface of the sample with a micro-nano composite structure, and packaging the sample into a vacuum bag;
(3) and (3) placing the sample obtained in the step (2) in a sample furnace of a magnetron sputtering device, and growing a layer of silicon dioxide protective film on the surface of the micro-nano structure to obtain the long-term efficient long-term high-efficiency antireflection micro-nano structure.
Example 2
The embodiment of the invention provides a method for manufacturing a long-term high-efficiency anti-reflection micro-nano structure on a copper surface, which comprises the following specific steps:
(1) and mechanically polishing the surface of the copper simple substance by using a polishing machine to obtain a processed sample.
(2) And (3) performing two-dimensional groove scanning on the surface of the copper sample by adopting nanosecond laser to obtain the surface of the antireflection micro-nano structure. Wherein the two-dimensional groove spacing is 30 μm; the parameters of the nanosecond laser are: the repetition frequency is 100kHz, the central wavelength is 532nm, the pulse width is 10ns, and the laser power is 20W.
(3) And (3) performing silicon dioxide protective layer coating on the surface of the sample obtained in the step (2) by adopting a magnetron sputtering method to obtain the antireflection micro-nano structure surface with the inert protective layer. Wherein the parameters of magnetron sputtering are as follows: the pressure is 0.5Pa, the argon flow is 38L/min, and the power is 160W.
Example 3
The embodiment of the invention provides a method for manufacturing a long-term high-efficiency anti-reflection micro-nano structure on a copper surface, which comprises the following specific steps:
(1) and mechanically polishing the surface of the copper simple substance by using a polishing machine to obtain a processed sample.
(2) And (3) scanning the square grid on the surface of the copper sample by adopting picosecond laser to obtain the surface of the antireflection micro-nano structure. Wherein the side length of the square grid is 20 mu m; parameters of the picosecond laser were: the repetition frequency is 200kHz, the central wavelength is 1030nm, the pulse width is 10ps, and the laser power is 2000 mW.
(3) And (3) performing silicon dioxide protective layer coating on the surface of the sample obtained in the step (2) by adopting a magnetron sputtering method to obtain the antireflection micro-nano structure surface with the inert protective layer. Wherein the parameters of magnetron sputtering are as follows: the pressure is 0.5Pa, the argon flow is 38L/min, and the power is 160W.
Example 4
The embodiment of the invention provides a method for manufacturing a long-term high-efficiency anti-reflection micro-nano structure on a copper surface, which comprises the following specific steps:
(1) and mechanically polishing the surface of the copper simple substance by using a polishing machine to obtain a processed sample.
(2) And (3) performing square grid scanning on the surface of the copper sample by adopting femtosecond laser to obtain the surface of the antireflection micro-nano structure. Wherein the side length of the square grid is 20 mu m; the parameters of the femtosecond laser are as follows: the repetition frequency is 200kHz, the central wavelength is 1030nm, the pulse width is 220fs, and the laser power is 1000 mW.
(3) And (3) performing silicon dioxide protective layer coating on the surface of the sample obtained in the step (2) by adopting a magnetron sputtering method to obtain the antireflection micro-nano structure surface with the inert protective layer. Wherein the parameters of magnetron sputtering are as follows: the pressure is 0.5Pa, the argon flow is 38L/min, and the power is 160W.
The reflection characteristic curve of the surface micro-nano structure of the steps (2) and (3) prepared in the embodiment is shown in fig. 4, and the reflection characteristic curve of the sample in the wavelength range of 250nm to 2000nm can be measured by a spectrophotometer with an integrating sphere.
Example 5
The method for manufacturing the long-term efficient hydrophobic micro-nano structure on the copper surface provided by the embodiment of the invention comprises the following specific steps:
(1) and mechanically polishing the surface of the copper simple substance by using a polishing machine to obtain a processed sample.
(2) And (3) performing square grid scanning on the surface of the copper sample by adopting femtosecond laser to obtain the surface of the antireflection micro-nano structure. Wherein the side length of the square grid is 20 mu m; the parameters of the femtosecond laser are as follows: the repetition frequency is 200kHz, the central wavelength is 1030nm, the pulse width is 220fs, and the laser power is 1000 mW.
(3) And (3) performing silicon dioxide protective layer coating on the surface of the sample obtained in the step (2) by adopting a magnetron sputtering method to obtain the antireflection micro-nano structure surface with the inert protective layer. Wherein the parameters of magnetron sputtering are as follows: the pressure is 0.5Pa, the argon flow is 38L/min, and the power is 160W.
The contact angle of the water drop of the micro-nano structure on the surface in the step (3) prepared in the embodiment is shown in fig. 6, and the contact angle of the water drop of the sample can be measured by a water drop angle tester.
The above description is only for the purpose of illustrating the present invention and the appended claims are not to be construed as limiting the scope of the invention, which is intended to cover all modifications, equivalents and improvements that are within the spirit and scope of the invention as defined by the appended claims.
Claims (10)
1. A method for manufacturing a long-term efficient antireflection micro-nano structure on a copper surface is characterized by comprising the following steps:
polishing the red copper and/or copper simple substance sample;
placing the polished sample on a laser processing platform, scanning the polished sample by using a pulse laser through a preset path to obtain the surface of the sample with a micro-nano composite structure, and filling the surface of the sample into a vacuum bag;
and placing the obtained sample in a sample furnace of a magnetron sputtering device, and growing a layer of silicon dioxide protective film on the surface of the micro-nano structure to obtain the antireflection micro-nano structure.
2. The method for manufacturing the long-term high-efficiency antireflection micro-nano structure on the copper surface according to claim 1, wherein nanosecond, picosecond or femtosecond laser with the wavelength of 200nm to 5000nm is used, and a laser light source is focused on the surface of a copper sample through a lens, an f-theta field lens and a microobjective.
3. The method for manufacturing the long-term high-efficiency antireflection micro-nano structure on the copper surface according to claim 1, wherein scanning is performed on the copper surface through light beam swinging or sample moving, a square grid, a hexagonal grid and a two-dimensional groove structure are prepared on the copper surface, and a micron-nanometer composite structure can be formed on the surface based on an interaction mechanism of pulse laser and a substance.
4. The method for manufacturing the long-term high-efficiency antireflection micro-nano structure on the copper surface according to claim 1, wherein after the surface micro-nano structure is formed, a layer of silicon dioxide film or a silicon carbide film, a silicon nitride film or an aluminum oxide film is sputtered on the surface of the micro-nano structure by a magnetron sputtering method, and the sample is subjected to secondary treatment after vacuum packaging.
5. The method for manufacturing the long-term high-efficiency antireflection micro-nano structure on the copper surface according to claim 1, wherein the thickness of the silicon dioxide is 10nm to 10 μm.
6. An anti-reflection micro-nano structure, characterized in that the anti-reflection micro-nano structure is manufactured by the method for manufacturing the long-term efficient anti-reflection micro-nano structure on the surface of copper according to any one of claims 1 to 5.
7. A conductive device, characterized in that the conductive device is prepared from the antireflective micro-nano structure of claim 6.
8. A thermally conductive device, characterized in that it is prepared from the antireflective micro-nano structure of claim 6.
9. A heat dissipation device, characterized in that the heat dissipation device is prepared from the antireflective micro-nano structure of claim 6.
10. A heat sink device characterised in that the device of any of claims 7, 8 or 9 is mounted on the heat sink device.
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| CN115261779A (en) * | 2022-07-14 | 2022-11-01 | 济南大学 | Metal micro-nano composite material for solar water heater and preparation method thereof |
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| CN115261779B (en) * | 2022-07-14 | 2023-09-22 | 济南大学 | Metal micro-nano composite material for solar water heater and preparation method thereof |
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