CN112886033A

CN112886033A - Polar plate structure, preparation method thereof, bipolar plate with polar plate structure and fuel cell

Info

Publication number: CN112886033A
Application number: CN202110112369.1A
Authority: CN
Inventors: 上官鹏鹏; 王海峰; 王利生
Original assignee: Fengyuan Xinchuang Technology Beijing Co ltd; Zhejiang Fengyuan Hydrogen Energy Technology Co ltd
Current assignee: Fengyuan Xinchuang Technology Beijing Co ltd; Zhejiang Fengyuan Hydrogen Energy Technology Co ltd
Priority date: 2021-01-27
Filing date: 2021-01-27
Publication date: 2021-06-01

Abstract

The application provides a polar plate structure, a preparation method thereof, a bipolar plate with the polar plate structure and a fuel cell with the polar plate structure, which comprises the following steps: the metal oxide layer is arranged on the surface of the metal substrate. According to the polar plate structure, the preparation method thereof, the bipolar plate with the polar plate structure and the fuel cell with the polar plate structure, the corrosion resistance of the metal polar plate can be effectively improved.

Description

Polar plate structure, preparation method thereof, bipolar plate with polar plate structure and fuel cell

Technical Field

The application belongs to the technical field of fuel cells, and particularly relates to a polar plate structure, a preparation method of the polar plate structure, a bipolar plate with the polar plate structure and a fuel cell with the polar plate structure.

Background

Currently, in the fuel cell industry, such as PEM electrolytic hydrogen production and PEMFC fuel cells, bipolar plates are one of the important components of fuel cells. In the past, the main material of the bipolar plate is graphite which is expensive, so that the cost of the bipolar plate material accounts for 25% -35% of the cost of the whole battery; and the graphite material also has the defect of poor machining performance, so the bipolar plate made of the metal material has the advantages of low price, good machining performance, good toughness and good strength. In the prior art, a method for modifying a metal substrate is to deposit a corrosion-resistant coating on the surface of the metal substrate by using a physical vapor deposition method and then deposit a conductive layer on the corrosion-resistant coating.

However, the metal bipolar plate manufactured by the technology has at least the following technical problems:

(1) because of the harsh operating environment of the metal bipolar plate, strict limitations are put on the conductivity and the corrosion resistance of the coating, and the currently selected conductive coating material has great defects in corrosion resistance or has better initial performance but shorter service life.

(2) The corrosion-resistant layer and the conductive coating have a pinhole phenomenon in the longitudinal direction, and in the corrosion environment of the fuel cell, a corrosion medium enters the film layer through the pinhole to reach the metal matrix and corrode the matrix.

Therefore, how to provide a plate structure capable of effectively improving the corrosion resistance of a metal plate, a preparation method thereof, and a bipolar plate and a fuel cell having the plate structure become problems to be solved by those skilled in the art.

Disclosure of Invention

Therefore, an object of the present invention is to provide a plate structure, a method for manufacturing the plate structure, and a bipolar plate and a fuel cell having the plate structure, which can effectively improve the corrosion resistance of a metal plate.

In order to solve the above problems, the present application provides a plate structure including:

a metal substrate;

and the metal oxide layer is arranged on the surface of the metal substrate.

Preferably, the plate structure further comprises a metal nitride layer disposed on the metal oxide layer.

Preferably, the plate structure further comprises an amorphous carbon film layer, and the amorphous carbon film layer is arranged on the metal nitride layer.

Preferably, the thickness of the amorphous carbon film layer is 50 nm-5 μm;

and/or the mass fraction of SP2 hybrid carbon in the amorphous carbon film layer is 60-90%;

and/or, the metal in the metal oxide is any one or two combinations of Ti and Al;

and/or the metal oxide is any one or combination of more of TiO2, TiO, Al2O3 and AlO;

and/or the metal nitride is any one or combination of Ti2N, TiN, Al2N3 and AlN;

and/or the thickness of the metal oxide layer is 20-100 nm;

and/or the thickness of the metal nitride layer is 10-90 nm;

and/or the metal substrate is made of any one of stainless steel, titanium alloy, aluminum alloy and nickel.

According to another aspect of the present application, there is provided a method for manufacturing a plate structure, including the steps of:

depositing a metal oxide on the surface of the metal substrate, and forming a metal oxide layer on the surface of the metal substrate.

Preferably, the method for preparing the plate structure further comprises: performing nitridation treatment on the metal oxide layer, and forming a metal nitride layer;

and/or, before depositing the metal oxide on the surface of the metal substrate, the method further comprises the following steps:

pretreating a metal substrate; the pretreatment comprises a first pretreatment, wherein the first pretreatment is used for sequentially carrying out oil removal, polishing, cleaning and drying treatment on the metal substrate;

preferably, the first pre-treatment comprises the steps of: and sequentially carrying out oil removal, polishing, cleaning and drying treatment on the metal substrate. Specifically, a first degreasing treatment is carried out on a selected metal substrate by using 1M sodium hydroxide solution at 80 ℃; after cleaning, performing secondary oil removal cleaning by using alcohol; then, grinding by adopting aluminum oxide or diamond polishing paste; and after polishing, cleaning with pure water, putting the cleaned metal substrate into the pure water for storage, and blowing clean nitrogen gas before use.

And/or, the step of depositing a metal oxide coating comprising: introducing argon gas and oxygen gas into a vacuum chamber of bias magnetic control multi-arc ion plating equipment, opening a titanium and/or aluminum multi-arc target, and depositing metal oxide on the surface of a metal substrate; preferably, the metal component in the metal oxide is any one or a combination of two of Ti and Al; preferably, the temperature of the metal substrate is 150-500 ℃; preferably, the thickness of the metal oxide layer is 20-100 nm; preferably, the flow rate of argon gas is 100-500sccm, the flow rate of oxygen gas is 5-50sccm, and the degree of vacuum is 0.1-0.5 Pa.

Preferably, depositing an amorphous carbon film on the metal nitride layer, and forming an amorphous carbon film layer;

and/or, the oil removal comprises the following steps: carrying out first oil removal treatment on the metal substrate by adopting a sodium hydroxide solution, and then carrying out second oil removal treatment on the metal substrate by adopting alcohol;

and/or, the polishing comprises the steps of: polishing by using alumina or diamond polishing paste;

and/or, the pre-treatment comprises a second pre-treatment; the second pretreatment comprises the following steps: carrying out sputtering treatment on the metal substrate after the first pretreatment;

and/or the nitriding treatment comprises the following steps: controlling the temperature of a substrate, introducing nitrogen, turning on a sputtering power supply, setting the current value to be 50-150A, setting negative bias of-80-300V, and carrying out nitridation treatment on the metal substrate; preferably, the temperature of the substrate is 150-500 ℃; preferably, the nitrogen flow is 30-100sccm, and the vacuum degree is 0.1-0.5 Pa; preferably, the nitriding treatment time is 30s to 200 s.

Preferably, the sputtering process comprises the steps of: heating a metal substrate in a vacuum chamber of bias magnetron multi-arc ion plating equipment, introducing inert gas, turning on a sputtering power supply, setting the current value to be 50-150A, setting negative bias of-600-1500V, and performing ion sputtering on the metal substrate; preferably, the inert gas is argon; the pressure of the inert gas is 0.1-0.5 Pa; preferably, the pressure of the inert gas is 0.1 Pa; preferably, the inert gas is argon; preferably, the vacuum degree of the vacuum chamber is 1.5X 10-3Pa to 3X 10-3 Pa; the temperature of the metal substrate is 150-500 ℃; the time of ion sputtering is 3-15 min;

or etching the metal substrate with 5% sulfuric acid or hydrochloric acid solution at 80 deg.C for 10-60min, cleaning with pure water, storing in pure water, and purging with clean nitrogen before use.

And/or, the step of depositing an amorphous carbon film on the metal nitride layer comprises: in the vacuum chamber of the bias magnetic control multi-arc ion plating equipment, the vacuum degree of the vacuum chamber is pumped to 1.5 multiplied by 10^-3Pa～3×10^-3Pa, introducing 100-300scc^mArgon gas of (2) set to bias^-150 to-900V, keeping the temperature of the metal substrate at 150 to 500 ℃, and depositing for 0.5 to 4 hours; preferably, the thickness of the amorphous carbon film layer is 50nm to 5 μm.

According to yet another aspect of the present application, there is provided a bipolar plate comprising a plate structure as described above.

According to still another aspect of the present application, there is provided a fuel cell including a bipolar plate, the bipolar plate being the bipolar plate described above.

According to the polar plate structure, the preparation method thereof, the bipolar plate with the polar plate structure and the fuel cell with the polar plate structure, due to the existence of oxygen, the volume of an oxide expands in the film forming process to form a compact coating, so that the defect of a pinhole is reduced; the corrosion resistance of the metal polar plate can be effectively improved; due to the compactness of the metal oxide, the coating has the minimum pinhole defect in the longitudinal direction, and the matrix material is effectively protected. Meanwhile, the coated bipolar plate is inevitably contacted with oxygen in the use process, and due to the unsaturation of the metal oxide oxygen, the coating material can further absorb the oxygen, the volume expands, the corrosion formed by hydrogen ions is repaired, and the service life of the bipolar plate is prolonged.

And the procedure of carrying out nitriding treatment on the surface of the metal oxide has the advantages that the conductivity of the oxide coating is remarkably improved, and the conductivity of the whole coating is improved. Meanwhile, after the nitriding treatment, the expansion coefficient of the metal oxidation-nitridation coating material is close to the valence of the amorphous carbon film, so that the binding force of the metal oxidation-nitridation coating material and the amorphous carbon film, namely the conducting layer, is improved. A nitride layer with good conductivity is formed on the surface of the thin oxide layer, so that the conductivity of the coating can be effectively improved. The metal nitride layer is entirely nitride.

The amorphous carbon film is deposited on the surface of the metal nitride layer, has low cost, is conductive and corrosion resistant, has small thickness, and can reduce the surface contact resistance of the bipolar plate to 1m omega/cm²The following. The amorphous carbon film has good conductivity and corrosion resistance.

The metal substrate is subjected to first pretreatment, so that the cleanliness and the surface flatness of the metal substrate can be effectively improved; after polishing in the first pretreatment, texture defects formed in the molding of the bipolar plate can be reduced; the cleanness and the roughness of the metal substrate can be improved, the specific surface area of the metal substrate is increased, and therefore the binding force between the metal substrate and the coating is enhanced.

Carrying out sputtering treatment on the metal substrate: the oxide on the surface of the metal substrate can be further removed; meanwhile, the roughness of the surface of the metal substrate can be further improved through ion sputtering and etching activation, the surface area is increased, and the binding force between the metal substrate and the coating is enhanced.

The method and the device improve the performance of the fuel cell, prolong the service life of the fuel cell and reduce the cost of the fuel cell.

Drawings

Fig. 1 is a schematic structural diagram of a plate structure according to an embodiment of the present application.

The reference numerals are represented as:

1. a metal substrate; 2. a metal oxide layer; 3. a metal nitride layer; 4. amorphous carbon film layer.

Detailed Description

Referring collectively to fig. 1, in accordance with an embodiment of the present application, a plate structure, comprises:

a metal substrate 1;

a metal oxide layer 2, the metal oxide layer 2 being disposed on a surface of the metal substrate 1.

Further, the plate structure further comprises a metal nitride layer 3, and the metal nitride layer 3 is disposed on the metal oxide layer 2.

Further, the plate structure further comprises an amorphous carbon film layer 4, and the amorphous carbon film layer 4 is arranged on the metal nitride layer 3.

Further, the thickness of the amorphous carbon film layer 4 is 50 nm-5 μm;

and/or the mass fraction of SP2 hybrid carbon in the amorphous carbon film layer 4 is 60-90%;

and/or the metal nitride is any one or combination of Ti2N, TiN, Al2N3 and AlN;

and/or the thickness of the metal oxide layer 2 is 20-100 nm;

and/or the thickness of the metal nitride layer 3 is 10-90 nm;

and/or the material of the metal substrate 1 is any one of stainless steel, titanium alloy, aluminum alloy and nickel.

According to an embodiment of the present application, a method for manufacturing a pole plate structure as described above includes the following steps:

the embodiment provides a preparation method of a metal bipolar plate, which specifically comprises the following steps:

step (I): the pretreatment specifically comprises the following steps:

1) first pretreatment: the metal substrate 1 is sequentially subjected to degreasing, etching, cleaning and drying. Specifically, the first degreasing treatment is performed on the selected metal substrate 1 at 80 ℃ with 1M sodium hydroxide solution; after cleaning, performing secondary oil removal cleaning by using alcohol; polishing the matrix by using brightening agents such as alumina polishing paste or diamond polishing paste and the like, then cleaning the matrix by using pure water, putting the cleaned metal substrate 1 into the pure water for storage, and blowing the metal substrate by using clean nitrogen before use;

2) second pretreatment: adopting bias magnetic control multi-arc ion plating equipment, putting a clamp provided with a metal substrate 1 into a vacuum chamber, vacuumizing to 3 x 10 < -3 > Pa-6 x 10 < -3 > Pa, preferably 5 x 10 < -5 > Pa, heating the metal substrate 1 to 150 plus material temperature of 200 ℃, introducing 0.5-1.5Pa, setting bias voltage at-200V-1200V, and carrying out surface ion sputtering and etching activation for 3min-45 min;

step (II): the method specifically comprises the following steps:

1) depositing a metal oxide layer 2, namely setting the flow of argon at 100-500sccm in bias magnetic control multi-arc ion plating equipment, and opening an argon control valve; setting the oxygen flow rate to be 5-50sccm, and opening an oxygen control valve; controlling the vacuum degree to be 0.1-0.5Pa, heating the metal substrate 1 to 150-500 ℃, and setting the bias voltage to-50V-700V; turning on a multi-arc titanium target power supply, and setting the current value to be 10-150A; and/or turning on a multi-arc aluminum target power supply, and setting the current value to be 10-150A. Depositing for 30s-10min to form a metal oxide layer 2;

2) nitriding treatment: controlling the temperature of the substrate to be 150-500 ℃, introducing nitrogen, wherein the flow rate of the nitrogen is 20-100sccm, and the vacuum degree is 0.1-0.5 Pa; setting the sputtering current to be 50-150A, setting negative bias voltage of-80 to-300V, and carrying out nitridation treatment on the metal oxide layer 2 on the metal substrate 1; the nitriding treatment time is between 30s and 200 s; forming a metal nitride layer 3;

and (3): the method for depositing the amorphous carbon film specifically comprises the following steps:

vacuumizing to 1.5 multiplied by 10 < -3 > Pa to 3 multiplied by 10 < -3 > Pa in a vacuum chamber in bias magnetic control multi-arc ion plating equipment, introducing 50-500sccm of argon, setting a bias voltage of-100 to-1500V, starting a magnetic control graphite target sputtering power supply, setting the current to be between 10A and 50A, setting the temperature of a metal substrate to be 150-500 ℃, and setting the deposition time to be 30-180 min to form an amorphous carbon film layer 4.

In the present application, the bonding force is measured for the bonding force of the coating and the substrate as a whole, i.e., the substrate. The bonding force was measured by a scratch test method. The method adopts an MFT-4000 type multifunctional material surface performance testing machine, the radius of a diamond pressure head is 200 microns, the loading speed is 100N/m, the scratch length is 5mm, according to a method of combining an acoustic emission signal and a friction force signal, the load when a coating is broken is an impending load, and an average value is taken as the binding force of the coating. The corrosion current and the corrosion potential are important indexes for representing the corrosion resistance of the material. See GB/T20042.6-2011

Example 1

The metal substrate 1 of the present embodiment is made of 316L stainless steel.

Step (1): carrying out first deoiling treatment on the metal substrate 1 by using 1mol/L sodium hydroxide solution at the temperature of 80 ℃; and then cleaning the metal substrate 1 after the first oil removal, and then performing second oil removal cleaning by using alcohol. Then, polishing the matrix by using alumina polishing paste, cleaning the polished matrix by using pure water, putting the cleaned metal substrate 1 into the pure water for storage, and blowing the cleaned metal substrate by using clean nitrogen before use;

step (2): adopting bias magnetic control arc ion plating equipment to send the treated metal substrate 1 in the step (1) into a vacuum chamber, and pumping the vacuum degree to 5 multiplied by 10 vacuum^-3Pa, heating the metal substrate 1 to 180 ℃, introducing argon gas of about 1Pa, and setting the bias voltage to-800V; carrying out surface ion sputtering, etching and activating on the metal substrate 1 for 5 min;

and (3): the flow rate of argon gas was set to 300sccm, and the argon control valve was opened. The oxygen flow rate was set to 10sccm, and the oxygen control valve was opened. The vacuum degree was controlled to 0.1-0.5Pa, the metal substrate 1 was heated to 180 ℃ and the bias was set at-200V. Turning on a multi-arc titanium target power supply, and setting the current value to be 50A; the deposition time was 10 min.

And (4): controlling the temperature of the substrate to be 180 ℃, introducing nitrogen gas, wherein the flow rate of the nitrogen gas is 50sccm, and the vacuum degree is 0.2 Pa; setting the sputtering current to be 30A, setting negative bias of-200V, and carrying out nitridation treatment on the metal substrate 1; the nitriding treatment time was 5 min.

And (5): closing a nitrogen valve, opening an argon gas valve, keeping the introduction amount of argon gas at 300sccm, maintaining the vacuum degree at 0.2Pa, opening a multi-arc graphite target power supply, adjusting the current to 10A, keeping a workpiece bias power supply in a working state, keeping a bias device at-380V, and keeping the temperature of a substrate at 200 ℃; the deposition time was 180 min.

After the test, the corrosion current of the sample is 5.8 multiplied by 10^-7A/cm²The corrosion potential is 335mV,

contact resistance of 1.5 m.OMEGA.cm²The bonding force was 48N.

Example 2

316L stainless steel is selected as the metal substrate 1 of the present embodiment.

Step (1): carrying out first deoiling treatment on the metal substrate 1 by using 1M sodium hydroxide solution at the temperature of 80 ℃; and then cleaning the metal substrate 1 after the first oil removal, and then performing second oil removal cleaning by using alcohol. Then, the substrate was polished with a diamond polishing paste, and after polishing, the substrate was washed with pure water, and the washed metal substrate 1 was stored in pure water and purged with clean nitrogen before use.

Step (2): adopting bias magnetic control arc ion plating equipment, sending the treated product in the step (1) into a vacuum chamber, and pumping the vacuum chamber to a vacuum degree of 5 multiplied by 10^-3Pa, heating the metal substrate 1 to 180 ℃, introducing argon gas of about 1Pa, and setting the bias voltage to-800V; and carrying out surface ion sputtering and etching activation on the metal substrate 1 for 5 min.

And (3): the flow rate of argon gas was set to 300sccm, and the argon control valve was opened. Setting the oxygen flow as 10sccm and opening the oxygen control valve; the vacuum degree is controlled to be 0.1-0.5Pa, the metal substrate 1 is heated to 180 ℃, and the bias voltage is set to-200V. Turning on a multi-arc titanium target power supply, and setting the current value to be 80A; the deposition time was 10 min.

And (4): controlling the temperature of the substrate to be 180 ℃, introducing nitrogen gas, wherein the flow rate of the nitrogen gas is 50sccm, and the vacuum degree is 0.2 Pa; setting sputtering current to be 50A, setting negative bias of-200V, and carrying out nitridation treatment on the metal substrate 1; the nitriding treatment time was 5 min.

After the test, the corrosion current of the sample is 8.3 multiplied by 10^-7A/cm²The corrosion potential is 332mV,

contact resistance of 1.6 m.OMEGA.cm²The bonding force was 49N.

Example 3

Step (1): carrying out first deoiling treatment on the metal substrate 1 by using 1M sodium hydroxide solution at the temperature of 80 ℃; and then cleaning the metal substrate 1 after the first oil removal, and then performing second oil removal cleaning by using alcohol. Then, the substrate was polished with an alumina polishing paste, and after polishing, the substrate was washed with pure water, and the washed metal substrate 1 was stored in pure water and purged with clean nitrogen before use.

Step (2): adopting bias magnetic control arc ion plating equipment to send the treated metal substrate 1 in the step (1) into a vacuum chamber, and pumping the vacuum degree to 5 multiplied by 10 vacuum^-3Pa, heating the metal substrate 1 to 180 ℃, introducing argon gas of about 1Pa, and setting the bias voltage to-800V; and carrying out surface ion sputtering and etching activation on the metal substrate 1 for 5 min.

And (3): the flow rate of argon gas was set to 300sccm, and the argon control valve was opened. Setting the oxygen flow as 10sccm and opening the oxygen control valve; the vacuum degree is controlled to be 0.1-0.5Pa, the metal substrate 1 is heated to 180 ℃, and the bias voltage is set to-200V. Turning on a multi-arc titanium target power supply, and setting the current value to be 50A; the deposition time was 10 min.

And (4): controlling the temperature of the substrate to be 180 ℃, introducing nitrogen gas, wherein the flow rate of the nitrogen gas is 50sccm, and the vacuum degree is 0.2 Pa; setting the sputtering current to be 30A, setting negative bias of-200V, and carrying out nitridation treatment on the metal substrate 1; the nitriding treatment time was 4 min.

After the test, the corrosion current of the sample is 4.3 multiplied by 10^-7A/cm²The corrosion potential was 341mV, and the contact resistance was 1.2 m.OMEGA.cm²The bonding force was 49N.

Example 4

Step (1): carrying out first oil removal treatment on the metal substrate 1 at 80 ℃ by using a 1M sodium hydroxide solution at a high temperature; and then cleaning the metal substrate 1 after the first oil removal, and then performing second oil removal cleaning by using alcohol. Then, the substrate was polished with an alumina polishing paste, and after polishing, the substrate was washed with pure water, and the washed metal substrate 1 was stored in pure water and purged with clean nitrogen before use.

And (3): the flow rate of argon gas was set to 300sccm, and the argon control valve was opened. The oxygen flow rate was set to 10sccm, and the oxygen control valve was opened. The vacuum degree is controlled to be 0.1-0.5Pa, the metal substrate 1 is heated to 180 ℃, and the bias voltage is set to-200V. Turning on a multi-arc titanium target power supply, and setting the current value to be 30A; the deposition time was 10 min.

After the test, the corrosion current of the sample is 4.8 multiplied by 10^-7A/cm²The corrosion potential was 329mV and the contact resistance was 1.4 m.OMEGA.cm²The bonding force was 48N.

Example 5

In the metal substrate 1 of the present embodiment, a titanium plate is selected.

After the test, the corrosion current of the sample is 3.3 multiplied by 10^-7A/cm²The corrosion potential was 343mV, and the contact resistance was 1.5 m.OMEGA.cm²The bonding force was 53N.

It is readily understood by a person skilled in the art that the advantageous ways described above can be freely combined, superimposed without conflict.

The present invention is not intended to be limited to the particular embodiments shown and described, but is to be accorded the widest scope consistent with the principles and novel features herein disclosed. The foregoing is only a preferred embodiment of the present application, and it should be noted that, for those skilled in the art, several modifications and variations can be made without departing from the technical principle of the present application, and these modifications and variations should also be considered as the protection scope of the present application.

Claims

1. A plate structure, comprising:

a metal substrate (1);

a metal oxide layer (2), the metal oxide layer (2) being disposed on a surface of the metal substrate (1).

2. The plate structure of claim 1, further comprising a metal nitride layer, said metal nitride layer (3) being disposed on said metal oxide layer (2).

3. The plate structure of claim 2, further comprising an amorphous carbon film layer (4), wherein the amorphous carbon film layer (4) is disposed on the metal nitride layer (3).

4. The plate structure of claim 3, wherein the thickness of the amorphous carbon film layer (4) is 50nm to 5 μm;

and/or the mass fraction of SP2 hybrid carbon in the amorphous carbon film layer (4) is 60-90%;

and/or the metal nitride is any one or combination of Ti2N, TiN, Al2N3 and AlN;

and/or the thickness of the metal oxide layer (2) is 20-100 nm;

and/or the thickness of the metal nitride layer (3) is 10-90 nm;

and/or the metal substrate (1) is made of any one of stainless steel, titanium alloy, aluminum alloy and nickel.

5. A preparation method of a polar plate structure is characterized by comprising the following steps:

depositing a metal oxide on the surface of a metal substrate (1), and forming a metal oxide layer (2) on the surface of the metal substrate (1).

6. The plate structure manufacturing method according to claim 5, further comprising: nitriding the metal oxide layer (2) and forming a metal nitride layer (3);

and/or, before depositing the metal oxide on the surface of the metal substrate (1), further comprising the following steps:

pre-treating the metal substrate (1); the pretreatment comprises a first pretreatment, wherein the first pretreatment is used for sequentially carrying out oil removal, polishing, cleaning and drying treatment on the metal substrate (1);

and/or, the step of depositing a metal oxide coating comprises: introducing argon gas and oxygen gas into a vacuum chamber of bias magnetic control multi-arc ion plating equipment, opening a titanium and/or aluminum multi-arc target, and depositing metal oxide on the surface of the metal substrate (1); preferably, the metal component in the metal oxide is any one or two combinations of Ti and Al; preferably, the temperature of the metal substrate (1) is 150-500 ℃; preferably, the thickness of the metal oxide layer (2) is 20-100 nm; preferably, the argon flow is 100-500sccm, the oxygen flow is 5-50sccm, and the vacuum degree is 0.1-0.5 Pa.

7. The method of manufacturing a plate structure according to claim 6, wherein an amorphous carbon film is deposited on the metal nitride layer (3) and an amorphous carbon film layer (4) is formed;

and/or, the oil removal comprises the following steps: carrying out first oil removal treatment on the metal substrate (1) by using a sodium hydroxide solution, and then carrying out second oil removal treatment on the metal substrate (1) by using alcohol;

and/or, the pre-treatment comprises a second pre-treatment; the second pretreatment comprises the following steps: carrying out sputtering treatment on the metal substrate (1) after the first pretreatment;

and/or the nitriding treatment comprises the following steps: controlling the temperature of a substrate, introducing nitrogen, turning on a sputtering power supply, setting the current value to be 50-150A, setting negative bias of-80-300V, and performing nitridation treatment on the metal substrate (1); preferably, the temperature of the substrate is 150-500 ℃; preferably, the nitrogen flow is 30-100sccm, and the vacuum degree is 0.1-0.5 Pa; preferably, the nitriding treatment time is 30s-200 s.

8. According to the claimsThe method for preparing the plate structure in claim 7 is characterized in that the sputtering treatment comprises the following steps: heating the metal substrate (1) in a vacuum chamber of bias magnetron multi-arc ion plating equipment, introducing inert gas, turning on a sputtering power supply, setting the current value to be 50A-150A, setting negative bias of-600V to-1500V, and performing ion sputtering on the metal substrate (1); preferably, the inert gas is argon; the pressure of the inert gas is 0.1-0.5 Pa; preferably, the pressure of the inert gas is 0.1 Pa; preferably, the inert gas is argon; preferably, the vacuum degree of the vacuum chamber is 1.5 × 10^-3Pa～3×10^-3Pa; the temperature of the metal substrate (1) is 150-500 ℃; the time of ion sputtering is 3-15 min;

and/or the step of depositing an amorphous carbon film on the metal nitride layer (3) comprises: in the vacuum chamber of the bias magnetic control multi-arc ion plating equipment, the vacuum degree of the vacuum chamber is pumped to 1.5 multiplied by 10^-3Pa～3×10^-3Pa, introducing 100-300scc^mArgon gas of (2) set to bias^-150 to-900V, keeping the temperature of the metal substrate (1) at 150 to 500 ℃, and keeping the deposition time at 0.5 to 4 hours; preferably, the thickness of the amorphous carbon film layer (4) is 50 nm-5 μm.

9. A bipolar plate comprising a plate structure, characterized in that the plate structure is as claimed in any one of claims 1 to 8.

10. A fuel cell comprising a bipolar plate, wherein the bipolar plate is the bipolar plate of claim 9.