CN112882357B - Alignment mark, mark search device, mark search method and photoetching equipment - Google Patents

Alignment mark, mark search device, mark search method and photoetching equipment Download PDF

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CN112882357B
CN112882357B CN201911206576.2A CN201911206576A CN112882357B CN 112882357 B CN112882357 B CN 112882357B CN 201911206576 A CN201911206576 A CN 201911206576A CN 112882357 B CN112882357 B CN 112882357B
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alignment mark
search
branch
mark
alignment
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CN112882357A (en
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吴远焰
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/708—Mark formation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Abstract

The invention provides an alignment mark, a mark searching device, a mark searching method and a photoetching device. The alignment mark is arranged on a substrate of the photoetching equipment and/or a reference plate of a substrate table, is L-shaped and comprises a first branch and a second branch which are vertically intersected, the first branch is formed by arranging first grating structures side by side, and a first included angle is formed between the first grating structures and the extension direction of the first branch; the second branch is formed by the second grating structures side by side, and the second grating structures and the extending direction of the second branch have a second included angle, and the first included angle and the second included angle are complementary angles. The mark searching method combines the shape of the alignment mark, firstly obtains the rough searching position of the alignment mark by spirally moving the substrate table, and then obtains the fine searching position of the alignment mark by diagonally moving the substrate table by combining the obtained rough searching position. The time consumption of the mark searching method is shortened by coarse searching and scanning, and the efficiency is improved; the precision search improves the accuracy of the marker search method.

Description

Alignment mark, mark search device, mark search method and photoetching equipment
Technical Field
The present invention relates to the field of lithographic apparatus for semiconductor devices, and more particularly, to an alignment mark, a mark search device, a mark search method, and a lithographic apparatus.
Background
Photolithography is the basis for large-scale integrated circuit fabrication techniques, which largely determine the degree of integration of integrated circuits. Lithography is realized by means of a lithographic apparatus. The basic steps of photolithography are a series of steps such as alignment, exposure, etching, and the like, until the pattern on the mask is exposed to a designated position on the substrate coated with the photoresist, so that the quality of the photolithography process directly affects the performance of the finally formed chip.
Because of the process requirements, multiple layers of exposures need to be performed on the same chip, and there is a certain positional relationship between the lines of the layers, which is very strict. In a conventional lithographic apparatus, in order to align a pattern on a mask plate with an alignment mark on a substrate or a reference plate on a substrate stage and generate highly accurate alignment scan information, an alignment mark capable of generating highly accurate alignment scan information, and a corresponding mark search device and mark search method are required.
In the prior art, one of the label search methods, fig. 1 is a branch of the complete label. In order to determine the actual position of the mark, the search path according to the diagram needs to be searched twice, and in order to ensure the search precision, the search step distance cannot be too large, and a smaller step distance can lead to longer search time when large-range search is carried out, so that the search efficiency and the search precision cannot be considered at the same time. Wherein, L1, L2, L3, L4, L5, L6 and L7 indicate the sequence of the search tracks. FIG. 1A and FIG. 1BRespectively, fig. 1a is a schematic diagram of light intensity information when the alignment mark is not scanned, and fig. 1C is a schematic diagram of light intensity when the light intensity information is scanned. WQmaxThe maximum value of the light intensity is represented,
Figure GDA0002364269420000011
WQmaxthe corresponding minimum position and maximum position are x1 and x2 respectively, and the alignment position is
Figure GDA0002364269420000012
Although the algorithm is simple to implement, the algorithm is easily interfered by noise, and has low precision, long time consumption and low efficiency. In a word, in the prior art, the time consumption is long when the alignment mark is searched, the efficiency is low, the function model cannot be combined for accurate calibration, and the accuracy is poor.
It is noted that the information disclosed in this background section is only for enhancement of understanding of the general background of the invention and should not be taken as an acknowledgement or any form of suggestion that this information forms the prior art already known to a person skilled in the art.
Disclosure of Invention
The invention aims to provide an alignment mark, a mark searching device, a mark searching method and a photoetching device, so as to solve the problem of searching efficiency and accuracy of the alignment mark in the prior art.
In order to achieve the above object, the present invention provides an alignment mark, which is implemented by the following technical scheme: an alignment mark for a lithographic apparatus, to be placed on a substrate of the lithographic apparatus and/or a reference plate of a substrate table,
the alignment mark is L-shaped and comprises a first branch and a second branch which are vertically crossed;
the extending direction of the first branch is a first direction and is used for determining the position of the alignment mark in the X direction through an alignment device;
the extending direction of the second branch is perpendicular to the extending direction of the first branch, and the second branch is used for determining the position of the alignment mark Y direction through the alignment device;
the first branch is formed by arranging first grating structures side by side, and a first included angle is formed between the first grating structures and the extending direction of the first branch;
the second branch is formed by second grating structures in parallel, and a second included angle is formed between the second grating structures and the extending direction of the second branch;
the first included angle and the second included angle are complementary angles.
Optionally, the intersection of the first and second branches coincides with a nominal position on the substrate or on a reference plate.
Optionally, the first branch and the second branch are both rectangular structures or parallelogram structures.
Optionally, the long sides of the first branch and the second branch are respectively arranged along the extending directions.
Optionally, the first branch and the second branch are mutually replaced by 90 ° with respect to the intersection point of the two, and the first included angle and the second included angle are both 45 °.
The invention also provides a mark searching device for a lithographic apparatus, comprising any one of the alignment marks, an alignment device for determining the position of the alignment mark, a position measurement system and a data processing unit, wherein the alignment device comprises a light source module, an illumination module, an imaging system and a photodetector,
a light source module providing an illumination beam required by the alignment device;
the illumination module transmits an illumination light beam of the light source module and illuminates the alignment mark on the substrate or/and the reference plate;
the imaging system generates interference signals to image the alignment marks, and the magnitude of the signal intensity is determined by the positions of the alignment marks;
the photoelectric detector is used for acquiring light intensity information when the alignment mark is imaged;
a position measurement system for acquiring position information of the substrate table;
a data processing unit for calculating the position of the alignment mark by a mark search method based on the light intensity information and the position information of the substrate stage;
wherein an intersection of the first branch and the second branch coincides with a nominal position on a reference plate of the substrate and/or substrate table;
the light intensity information has at least two orders including 1 order and one or more of 3, 5 and 7 orders.
Optionally, the light source module comprises a laser light source.
Optionally, the illumination beam comprises polarized beams of four wavelengths, red, green, near infrared and far infrared.
Optionally, the alignment apparatus further comprises a beam combiner for combining the four wavelengths of polarized light beams into an illumination light beam.
Optionally, the alignment device further comprises a beam splitter for splitting the diffracted light emitted by the imaging system into four polarized beams of red, green, near-infrared and far-infrared wavelengths.
Optionally, the illumination light beam irradiated onto the alignment mark by the illumination module is circularly polarized light.
Optionally, the illumination beam of the illumination module collimates the illumination beam to illuminate the alignment mark.
Optionally, the position measurement system comprises an interferometer or an encoder.
The present invention also provides a tag search method for the tag search apparatus as described in any one of the above, the tag search method comprising the steps of,
s1: spirally moving a substrate table to capture an image of an alignment mark, acquiring 1-order light intensity information of the two branches in the alignment mark when the substrate table moves by one position, and calculating a coarse search position of the alignment mark according to a deviation between the position of the substrate table at the maximum value of the light intensity information and a nominal position;
s2: diagonally moving the substrate table to capture the image of an alignment mark within a set coarse search range by taking the coarse search position as a center, acquiring 3-order, 5-order and/or 7-order light intensity information of the two branches of the alignment mark when the substrate table moves by one position, and performing weighted calculation to obtain a fine search position of the alignment mark according to a fine search position corresponding to the maximum light intensity information value of each order;
wherein an intersection of the first branch and the second branch coincides with a nominal position on a reference plate of the substrate and/or substrate table.
Alternatively, the method of spirally moving the substrate table to capture the image of the alignment mark in step S1, acquiring the light intensity information of the 1 st order of the two branches of the alignment mark for each position of the substrate table movement, calculating the coarse search position of the alignment mark based on the deviation between the position of the substrate table at the maximum of the light intensity information and the nominal position, comprises the steps of,
s1-1: determining a maximum possible deviation of the actual position of the alignment mark from the nominal position as a coarse search range of the spiraling substrate table;
s1-2: determining a step pitch of the coarse search along the X direction according to the width of a first branch of the alignment mark, and determining a step pitch of the coarse search along the Y direction according to the width of a second branch of the alignment mark, wherein the step pitch along the X direction is smaller than the width of the first branch, and the step pitch along the Y direction is smaller than the width of the second branch;
s1-3: spirally moving the substrate table within the coarse search range according to the coarse search step pitch to obtain 1-order light intensity information corresponding to two branches of the alignment mark at each position;
s1-4: calculating the position deviation of the substrate table corresponding to the maximum value of the light intensity information;
s1-5: and obtaining the coarse searching position according to the position deviation and the nominal position.
Optionally, the step distance along the X direction is one half of the width of the first branch of the alignment mark, and the step distance along the Y direction is one half of the width of the second branch.
Optionally, the width of the first branch is equal to the width of the second branch, and the step distance in the X direction is equal to the step distance in the Y direction.
Optionally, the method of spiraling the substrate table comprises moving the substrate table inside out or outside in the coarse search range according to the coarse search step until the entire coarse search range is scanned.
Optionally, the method of spirally moving the substrate table according to the coarse search step pitch within the coarse search range in step S1-3 includes displacing the substrate table in only the X direction or only the Y direction at two positions adjacent in sequence.
Optionally, said deriving said coarse search position from said position deviation and said nominal position comprises the following method,
coarPos＝nomiPos+actOffset；
wherein CoarPos is the coarse search position, nomiPos is the nominal position, and actOffset is the deviation of the position of the substrate table at the maximum of the intensity information from the nominal position.
Optionally, the step S2 is a method of moving the substrate table diagonally to capture an image of an alignment mark, obtaining light intensity information of 3, 5 and/or 7 orders of the two branches of the alignment mark when the substrate table is moved to different positions, and obtaining a fine search position of the alignment mark by a weighted calculation based on a deviation of a position of the substrate table at a maximum of the light intensity information of each order from a nominal position, comprising the steps of,
s2-1: determining a fine search range according to the width of the alignment mark in the horizontal direction and the width of a diagonal line;
s2-2: determining a fine search step according to a capture range of the alignment device, wherein the fine search step is smaller than the capture range;
s2-3: taking the rough searching position as a starting point, extending to a preset distance along the direction of the first included angle as a starting point of the fine search, and moving the substrate stage along the direction of the first included angle within the fine search range according to the fine search step pitch until the whole fine search range is scanned, wherein 3-order, 5-order and/or 7-order light intensity information of the two branches of the alignment mark is obtained when the substrate stage moves by one position;
s2-4: determining a test function of the alignment mark in the X direction according to the size of the first included angle, the width of the diagonal line of the first branch, the light intensity information of each level and the position of the substrate table, wherein the closer to the coarse search position, the larger the output of the test function is;
s2-5: determining a correlation function of the test function and the light intensity information;
s2-6: the derivative of the correlation function is obtained to obtain a derivative function of the correlation function;
s2-7: taking the derivative corresponding to the maximum value of the correlation function as the center, taking a preset number of fitting points from left to right to perform a linear fitting function in the X direction, and recording the linear fitting function as the linear fitting function in the X direction
D(X)＝a×X+b；
S2-8: judging whether the accuracy of the alignment signal meets a preset threshold value, if so, executing the step S2-9, otherwise, reducing the number of the fitting points, and continuing executing the step S2-7;
s2-9: finding X-direction zero crossing point X0The abscissa of the zero crossing point is marked as X0Then, then
Figure GDA0002364269420000061
S2-10: obtaining a linear fitting function in the Y direction according to the methods of the steps S2-4, S2-5, S2-6, S2-7 and S2-8, and recording the linear fitting function as
D(Y)＝c×Y+d；
S2-11: calculating the zero crossing point Y in Y direction0The abscissa of the zero crossing point is marked as Y0Then, then
Figure GDA0002364269420000062
S2-12: and calculating the fine searching position of the alignment mark.
Optionally, the radius of the fine search range is determined according to the width of the horizontal direction and the width of the diagonal line of the alignment mark, including the following method,
Figure GDA0002364269420000063
wherein MW is the diagonal width of the first branch or the second branch of the alignment mark; MW2 is the horizontal width of the alignment mark.
Optionally, determining a fine search step size based on the capture range of the alignment device, including the method,
Figure GDA0002364269420000064
where P2 is the fine search step and A is the capture range of the alignment device.
Optionally, the method of aligning signal accuracy, comprising,
Figure GDA0002364269420000071
Figure GDA0002364269420000072
Figure GDA0002364269420000073
Figure GDA0002364269420000074
where MCC is the alignment signal accuracy and N is the total number of fitting points.
Optionally, the calculating the fine search position of the alignment mark includes adding a coarse search to zero-crossing points of different levels to obtain fine search positions of different levels, and weighting the fine search positions of each level to obtain the fine search position.
Optionally, the method for calculating the fine search position includes,
FinPos＝W1×FinPos3+W2×FinPos5+W3×FinPos7
W1+W2+W3＝1
wherein, W1 is the weight of the 3-order light intensity information, FinPos3 is the fine search position of the 3-order light intensity information; w2 is the weight of 5-order light intensity information, FinPos5 is the fine search position of 5-order light intensity information; w3 is the weight of the light intensity information of the 7 th order, and FinPos7 is the fine search position of the light intensity information of the 7 th order.
The invention also provides a lithographic apparatus comprising a stage, a lens system and a substrate table, and further comprising a mark search device as described in any of the above,
the bearing platform bears the mask plate with the pattern to be exposed;
a lens system located between the stage and the substrate table for exposing the pattern to be exposed to the substrate located on the stage;
the substrate table is used for bearing a substrate and a reference plate, the substrate and/or the reference plate are/is provided with the alignment mark, and the substrate table can drive the alignment mark to move in multiple degrees of freedom;
an alignment device of a mark search device is located between the stage and the substrate stage.
The invention has the beneficial effects that:
the alignment mark provided by the invention has the advantages of simple structure and easy implementation
The alignment mark searching device provided by the invention is provided with the alignment mark, and the structure of the existing photoetching equipment is not required to be changed, so that the mark searching method is more efficient and accurate.
The invention provides a mark searching method, which adopts a two-step searching method by combining light intensity information, namely spiral coarse searching and diagonal fine searching. The search time is shortened during the coarse search, and the search efficiency is improved; when diagonal line type accurate search is carried out, accurate positioning can be carried out by constructing a function model, and the search accuracy is improved.
Drawings
FIG. 1 is a search path diagram illustrating a tag search method according to the prior art;
FIG. 1A is a diagram illustrating light intensity information corresponding to L1, L2, L6 and L7 when no alignment mark is scanned in FIG. 1;
FIG. 1B is a diagram illustrating light intensity information corresponding to L3 and L5 when no alignment mark is scanned in FIG. 1;
FIG. 1C is a diagram illustrating light intensity information corresponding to L4 when the alignment mark is scanned in FIG. 1;
FIG. 2A is a schematic diagram of an alignment mark according to an embodiment of the present invention;
FIG. 2B is a schematic diagram illustrating another alignment mark according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of an overall layout of a lithographic apparatus according to an embodiment of the invention;
FIG. 4 is a schematic view of an alignment process of the alignment apparatus shown in FIG. 3;
FIG. 5 is a flowchart illustrating a tag search method according to an embodiment of the present invention;
fig. 6 is a schematic flowchart of the rough search method in step S1 in the tag search method according to the embodiment of the present invention;
FIG. 7 is a schematic diagram of one of the movement traces of the substrate stage in the coarse search method of step S1 in the mark search method according to the embodiment of the present invention;
FIG. 8 is a schematic diagram of the relationship between light intensity information and deviation of the position of the substrate table in a coarse search;
FIG. 9 is a flowchart illustrating a fine search method of step S2 in the tag search method according to the embodiment of the present invention;
FIG. 10 is a schematic diagram of one of the movement traces of the substrate stage in the fine search method of step S2 in the mark search method according to the embodiment of the present invention;
FIG. 11 is a diagram illustrating a test function curve of a fine search method in the tag search method according to an embodiment of the present invention;
FIG. 12 is a schematic diagram of a linear fit of the test function curve of FIG. 11 to the light intensity information, the correlation function curve, the derivative function curve of the correlation function, and the derivative function;
wherein the content of the first and second substances,
FIG. 12(a) is a graph showing the relationship between the test function and the light intensity information in FIG. 11;
FIG. 12(b) is a graph illustrating one of the correlation functions calculated according to the test function and the light intensity information in FIG. 11;
FIG. 12(c) is a graph illustrating a derivative function of the correlation function of FIG. 12 (b);
FIG. 12(d) is a schematic diagram of one of the linear fits according to the derivative function of FIG. 12 (c);
wherein the reference numerals are as follows:
100-stage, 200-lens system, 300-substrate stage, 310-substrate, 320-reference plate, 500-mask pattern;
400-mark search means, 410-alignment means, 420-alignment mark, 430-position measurement system, 440-data processing unit;
421-first branch, 422-second branch, 421 a-first grating structure, 422 a-second grating structure, MW 2-width, MW-diagonal width, DP-nominal position;
411-light source module, 412-illumination module, 413-imaging system, 414-photodetector, 415-beam combiner, 416-beam splitter;
WQ-light intensity information, Pos-position information;
offset _ X-the difference between the X-direction position of the substrate table and the nominal position, Offset _ Y-the difference between the Y-direction position of the substrate table and the nominal position.
Detailed Description
To make the objects, advantages and features of the present invention clearer, an alignment mark, a mark search apparatus, a mark search method and a lithographic apparatus according to the present invention will be described in further detail with reference to the accompanying drawings. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention. It should be understood that the drawings are not necessarily to scale, showing the particular construction of the invention, and that illustrative features in the drawings, which are used to illustrate certain principles of the invention, may also be somewhat simplified. Specific design features of the invention disclosed herein, including, for example, specific dimensions, orientations, locations, and configurations, will be determined in part by the particular intended application and use environment. In the embodiments described below, the same reference numerals are used in common between different drawings to denote the same portions or portions having the same functions, and a repetitive description thereof will be omitted. In this specification, like reference numerals and letters are used to designate like items, and therefore, once an item is defined in one drawing, further discussion thereof is not required in subsequent drawings.
An alignment mark according to an embodiment of the present invention is provided for a lithographic apparatus, which is disposed on a substrate 310 and/or a reference plate 320 of a substrate table 300 of the lithographic apparatus shown in FIG. 3. As shown in FIG. 2A, the alignment mark according to an embodiment of the present invention is L-shaped and includes a first branch 421 and a second branch 422 intersecting perpendicularly; the extending direction of the first branch 421 is a first direction, which is used for determining the position of the alignment mark X direction by the alignment apparatus 410; the extension direction of the second branch 422 is perpendicular to the extension direction of the first branch 421, and the second branch 422 is used for determining the position of the alignment mark Y direction by the alignment apparatus 410.
The first branch 421 is formed by arranging first grating structures 421a side by side, and a first included angle, denoted as α 1, is formed between the first grating structures 421a and the extending direction of the first branch 421; the second branch 422 is formed by second grating structures 422a in parallel, and a second included angle, denoted as α 2, is formed between the second grating structures 422a and the extending direction of the second branch 422; the first included angle and the second included angle are complementary angles with each other, that is, α 1+ α 2 is 90 °, α 1 is greater than 0 and less than 90, and α 2 is greater than 0 and less than 90. Preferably, when the alignment mark is placed on the substrate 310 and/or the reference plate 320, the intersection of the first branch 421 and the second branch 422 coincides with the nominal position DP on the substrate 310 or the reference plate 320.
With continued reference to fig. 2A, in one embodiment, the first branch 421 and the second branch 422 are both parallelogram structures. The long sides of the first branch 421 and the second branch 422 are respectively arranged along the extending direction; in another embodiment, as shown in fig. 2B, the first branch 421 and the second branch 422 are both rectangular structures.
Preferably, the first branch 421 and the second branch 422 are each 90 ° displaced with respect to the intersection of the two. Preferably, the first included angle α 1 and the second included angle α 2 are both 45 °. The width values of the first branch 421 and the second branch 422 are both denoted as MW2, and the widths of the diagonal corners are denoted as MW. Obviously, those skilled in the art should understand that this is not a limitation of the present invention, and in other embodiments, the structures of the first branch 421 and the second branch 422 may be different.
Another embodiment of the present invention provides a mark search apparatus, comprising an alignment apparatus 410, a position measurement system 430, a data processing unit 440, and any one of the alignment marks 420 described above.
Specifically, referring to fig. 3 and 4, fig. 3 is a schematic diagram of an overall layout structure of a lithographic apparatus according to an embodiment of the present invention, and fig. 4 is a schematic diagram of an alignment flow of the alignment apparatus shown in fig. 3. The alignment device 410 is used for determining the position of the alignment mark 420, and includes a light source module 411, an illumination module 412, an imaging system 413, and a photodetector 414. Wherein the light source module 411 provides the illumination light beam required by the alignment device 410. Preferably, the light source module 411 includes a laser light source. Preferably, the alignment device 410 further includes a beam combiner 415. The light source module 411 provides polarized light beams with four wavelengths including red, green, near infrared and far infrared, the beam combiner 415 is configured to combine the polarized light beams with four wavelengths into an illumination light beam, the illumination module 413 transmits the illumination light beam of the light source module 411, further, the four linearly polarized light beams are scaled and converted into circularly polarized light, the alignment mark 420 on the substrate 310 or/and the reference plate 320 is illuminated in a collimated manner, and the vertical irradiation of the polychromatic light can generate diffraction; the imaging system 413 generates an interference signal to image the alignment mark 420, and the magnitude of the signal intensity is determined by the position of the alignment mark 420; still further, the alignment apparatus further includes a beam splitter 416, where the beam splitter 416 is configured to split the diffracted light emitted by the imaging system 413 into four separate polarized light beams with red, green, near-infrared and far-infrared wavelengths, and the photodetector performs photoelectric conversion and signal processing to obtain the light intensity information WQ when the alignment mark 420 is imaged.
The position measurement system 430 includes, but is not limited to, an interferometer or encoder for acquiring position information Pos of the substrate table 300; a data processing unit 440 for calculating the position of the alignment mark 420 by a mark search method based on the light intensity information WQ and the position information Pos of the substrate stage 300. Further, the intersection of the first 421 and second 422 branches of the alignment mark 420 coincides with a nominal position DP on the substrate 310 and/or on the reference plate 320; the light intensity information WQ has at least two orders including 1 order, and 3 orders, 5 orders the light intensity information has at least two orders including 1 order, and one or more of 3 orders, 5 orders, and 7 orders.
Yet another embodiment of the present invention provides a lithographic apparatus that is a machine that exposes a desired mask pattern onto a substrate. As shown in fig. 3, the lithographic apparatus provided by this embodiment comprises a stage 100, a lens system 200, and a substrate stage 300, and a mark search device 400 provided by any of the above embodiments.
Specifically, the carrying stage 100 is used for carrying a mask having a pattern 500 to be exposed; a lens system 200 located between the stage 100 and the substrate stage 300. The alignment device 410 of the mark search device 400 is located between the carrier table and the substrate table. The substrate stage 300 is used for carrying a substrate 310 and a reference plate 320, the alignment mark 420 is arranged on the substrate 310 and/or the reference plate 320, and the substrate stage 300 can drive the alignment mark 420 to move with multiple degrees of freedom.
A further embodiment of the invention provides a mark search method for a lithographic apparatus. As shown in fig. 5, executed by any one of the above-mentioned mark search devices, the mark search method provided by this embodiment includes the following steps,
s1: and spirally moving the substrate table to capture an image of the alignment mark, acquiring 1-order light intensity information of the two branches in the alignment mark when the substrate table moves by one position, and calculating the coarse searching position of the alignment mark according to the deviation between the position of the substrate table at the maximum value of the light intensity information and the nominal position.
S2: and diagonally moving the substrate table to capture the image of the alignment mark within a set coarse search range by taking the coarse search position as a center, acquiring the 3-order, 5-order and/or 7-order light intensity information of the two branches in the alignment mark when the substrate table moves by one position, and performing weighting calculation to obtain the accurate search position of the alignment mark according to the accurate search position corresponding to the maximum light intensity information value of each order.
Wherein an intersection of the first branch and the second branch coincides with a nominal position on a reference plate of the substrate and/or substrate table.
Specifically, for convenience of description, in this embodiment, referring to fig. 2A or fig. 2B, the first branch and the second branch of the alignment mark used are identical, and the width thereof is denoted by MW2, the width of the diagonal line is denoted by MW, and the first included angle and the second included angle are both 45 °. Obviously, the above is merely for convenience of description, and the same mark search method may be used when the first branch and the second branch of the alignment mark are not identical. And referring to fig. 6 and 7, wherein fig. 6 is a flowchart illustrating a coarse search method in step S1 in the mark search method of the present embodiment, and fig. 7 is a diagram illustrating one of the motion traces of the substrate stage in the coarse search method in step S1. The step S1 of the tag search method provided in this embodiment is a rough search method, which includes the following steps,
s1-1: the orientation R1 of the helical scan is determined. The maximum possible deviation of the actual position of the alignment mark from the nominal position is determined as the coarse search range R1 of the spirally moving substrate table.
S1-2: a search step P1 is determined. And determining the step pitch of the coarse search along the X direction according to the width of the first branch of the alignment mark, and determining the step pitch of the coarse search along the Y direction according to the width of the second branch of the alignment mark. In this embodiment, the step in the X direction is smaller than the width of the first branch, and the step in the Y direction is smaller than the width of the second branch. The step distance along the X direction is one half of the width of a first branch of the alignment mark, and the step distance along the Y direction is one half of the width of a second branch.
Figure GDA0002364269420000131
Obviously, the larger the step pitch P1, the higher the coarse search efficiency; the smaller the step pitch P1, the higher the coarse search precision, and the search step pitch is reasonably selected to give consideration to both the coarse search precision and the search efficiency.
S1-3: and spirally moving the substrate table within the coarse search range according to the coarse search step pitch, and acquiring 1-order light intensity information corresponding to two branches of the alignment mark at each position. Moving the substrate table within the coarse search range from inside-out or from outside-in according to the coarse search step until the entire coarse search range is scanned. In this embodiment, the substrate table moves spirally from inside to outside. As shown in FIG. 7, which is a schematic diagram of the motion trajectory of a substrate table, any two adjacent substrate tables have two positions of the substrate table that are adjacent in sequence, namely: the distance between two adjacent substrate table seek positions is P1, and any two adjacent substrate table seek positions are displaced in only the X direction or only the Y direction. The direction of the arrow in the figure is its search direction and R1 is its search range, and the black dots in the figure indicate the positions in the movement locus of the substrate stage where the light intensity information needs to be obtained. As can be seen from the figure, the motion trajectory of the substrate table is spiral-shaped, and therefore the method of coarsely searching for the mark is also called spiral scanning method.
S1-4: the position deviation of the substrate stage corresponding to the maximum value of the light intensity information WQ is calculated. FIG. 8 is a schematic diagram showing the relationship between the light intensity information and the deviation of the position of the substrate stage in the rough search. The position deviation of the substrate table corresponding to the highest of the histogram is denoted as actOffset.
S1-5: and obtaining the coarse searching position according to the position deviation and the nominal position. Specifically, coarPos ═ nomiPos + actOffset;
wherein CoarPos is the coarse search position, nomiPos is the nominal position, and actOffset is the deviation of the position of the substrate table at the maximum of the intensity information from the nominal position. Specifically, referring to fig. 8, taking the rough search position in the X direction of the alignment mark as an example, if the rough search position in the X direction is denoted as coarPos _ X, the nominal position is denoted as nomiPos _ X, and the position deviation in the X direction is denoted as Offset X, the rough search position in the X direction of the alignment mark is:
coarPos_X＝nomiPos_X+Offset X
similarly, a coarse search position in the Y direction of the alignment mark can be obtained.
Next, a specific method of the fine search in step S2 in the search labeling method will be described. The basic idea is to input the coarse search position coarPos in step S1, diagonally move the substrate table to capture the image of the alignment mark, obtain the 3 rd order, 5 th order and/or 7 th order light intensity information of the two branches of the alignment mark when the substrate table moves to different positions, and obtain the fine search position of the alignment mark by weighting calculation according to the deviation between the position of the substrate table at the maximum value of the light intensity information of each order and the nominal position. In particular, the diagonal slope of the diagonal scan is related to the angle between the grating structure and the respective extension direction of the alignment marks. Specifically, referring to fig. 9, 10, 11 and 12(a), 12(b), 12(c) and 12(d) of fig. 12, the following steps are included,
s2-1: the search range R2 for the diagonal scan is determined. Namely, the fine search range is determined according to the width of the alignment mark in the horizontal direction and the width of the diagonal line. In this embodiment, referring to fig. 2A or fig. 2B, and fig. 10, the radius of the fine search range is obtained by the following method:
Figure GDA0002364269420000151
wherein MW is the diagonal width of the first branch or the second branch of the alignment mark; MW2 is the horizontal width of the alignment mark.
S2-2: a fine search step P2 is determined. Specifically, P2 determines a fine search step from the capture range of the alignment device, the fine search step being smaller than the capture range. In the present embodiment, the fine search step P2 is obtained by the following method,
Figure GDA0002364269420000152
where P2 is the fine search step and A is the capture range of the alignment device.
S2-3: diagonal scanning is carried out to obtain light intensity information. And taking the rough search position as a starting point, extending to a preset distance along the direction of the first included angle as a starting point of the fine search, moving the substrate table along the direction of the first included angle within the fine search range according to the fine search step pitch until the whole fine search range is scanned, and acquiring the light intensity information of the 3 th order, the 5 th order and/or the 7 th order of the two branches of the alignment mark when the substrate table moves by one position (namely, at different positions). In this embodiment, referring to FIG. 10, the preset distance is the radius R2 of the fine search range, and the black dot in the figure is the position of the substrate stage in the moving track where the light intensity information needs to be obtained.
S2-4: and determining a test function of the alignment mark in the X direction according to the size of the first included angle, the width of the diagonal line of the first branch, the light intensity information of each level and the position of the substrate table, wherein the closer to the coarse search position, the larger the output of the test function is. In this embodiment, referring to fig. 11, which is a schematic diagram of a test function curve of this embodiment, and fig. 12(a) is a schematic diagram of a relationship between a test function and the light intensity information, it can be seen that there is a certain deviation between the light intensity information WQ and the test function. The maximum value of the curve is the maximum value of the light intensity information, wherein,
Figure GDA0002364269420000153
for the vertical width of one branch of the alignment mark, the width of XW or YW is
Figure GDA0002364269420000154
The mathematical expression of the test function is as follows:
Figure GDA0002364269420000161
s2-5: the correlation function between the test function and the light intensity information is determined, and as shown in fig. 12(b), the graph is a schematic diagram of the correlation function curve of the present embodiment, and the correlation function is a convolution of the test function and the light intensity information WQ. Is formulated as follows:
Figure GDA0002364269420000162
where maxWQ represents a maximum value of the light intensity information WQ at each diagonal movement position of the substrate stage, and Offset is a positional deviation of the substrate stage.
S2-6: a derivative function of the correlation function is determined. And determining to conduct derivation on the correlation function to obtain a derivative function of the correlation function. Fig. 12(c) is a schematic diagram of a derivative function of the correlation function in fig. 12(b), and the derivative method is expressed as follows:
Figure GDA0002364269420000163
s2-7: an X-direction linear fit is performed. As shown in fig. 12(d), taking the value of the derivative function corresponding to the maximum point of the correlation function as the center, performing a linear fitting function in the X direction on the left and right of a preset number of fitting points to obtain a straight line, which is recorded as
D(X)＝a×X+b
In this embodiment, the predetermined number is 10, and 21 points are taken for linear fitting.
S2-8: and calculating the value of the alignment signal accuracy, judging whether the alignment signal accuracy meets a preset threshold value, if so, executing the step S2-9, otherwise, reducing the number of the fitting points, and continuing to execute the step S2-7. The method for calculating the accuracy of the alignment signal comprises the following steps:
Figure GDA0002364269420000171
Figure GDA0002364269420000172
Figure GDA0002364269420000173
Figure GDA0002364269420000174
in this embodiment, as shown in step S2-7, N is 21, dcoriIs the ordinate, X, of 21 pointsiIs the abscissa of 21 points, and the value range of i is [0,20 ]]MCC is alignment signal accuracy.
Specifically, in the present embodiment, the preset threshold is 0.95. If MCC > 0.95, go on to step S2-9; if the MCC is less than or equal to 0.95, the number N of fitting points is reduced, for example, 9 points, 8 points, 7 points and the like are respectively taken at the left and right, and linear fitting is performed again until the MCC is more than 0.95.
S2-9: finding X-direction zero crossing point X0The abscissa of the zero crossing point is marked as X0Then, then
Figure GDA0002364269420000175
Wherein, X0Is the deviation of the actual position of the alignment mark in the X direction from the coarse search position in the X direction.
S2-10: obtaining a linear fitting function in the Y direction according to the methods of the steps S2-4, S2-5, S2-6, S2-7 and S2-8, and recording the linear fitting function as
D(Y)＝c×Y+d
S2-11: calculating the zero crossing point Y in Y direction0The abscissa of the zero crossing point is marked as Y0Then, then
Figure GDA0002364269420000176
S2-12: and calculating the fine searching position of the alignment mark. Specifically, the fine search positions of different orders are obtained by adding the coarse search to the zero-crossing points of different orders, that is, the zero-crossing points corresponding to each order of the light intensity information can be obtained. And weighting the fine search positions of each level to obtain the fine search position.
The method for calculating the fine search position comprises the following steps,
FinPos＝W1×FinPos3+W2×FinPos5+W3×FinPos7；
W1+W2+W3＝1；
wherein, W1 is the weight of the 3-order light intensity information, FinPos3 is the fine search position of the 3-order light intensity information; w2 is the weight of 5-order light intensity information, FinPos5 is the fine search position of 5-order light intensity information; w3 is the weight of the light intensity information of 7 orders, FinPos7 is the fine search position of the light intensity information of 7 orders; FinPos are the locations of the fine search.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In summary, the above embodiments have been described in detail on various configurations of an alignment mark, a mark searching apparatus, a mark searching method and a lithographic apparatus, it is to be understood that the above description is only a description of the preferred embodiments of the present invention, and is not intended to limit the scope of the present invention.

Claims (27)

1. An alignment mark for a lithographic apparatus, to be placed on a substrate of the lithographic apparatus and/or on a reference plate of a substrate table, characterized in that,
the alignment mark is L-shaped and comprises a first branch and a second branch which are vertically crossed;
the extending direction of the first branch is a first direction and is used for determining the position of the alignment mark in the X direction through an alignment device;
the extending direction of the second branch is perpendicular to the extending direction of the first branch, and the second branch is used for determining the position of the alignment mark Y direction through the alignment device;
the first branch is formed by arranging first grating structures side by side, and a first included angle is formed between the first grating structures and the extending direction of the first branch;
the second branch is formed by second grating structures in parallel, and a second included angle is formed between the second grating structures and the extending direction of the second branch;
the first included angle and the second included angle are complementary angles.
2. An alignment mark according to claim 1, wherein the intersection of the first and second branches coincides with a nominal position on the substrate or on a reference plate.
3. The alignment mark according to claim 2, wherein the first branch and the second branch are each a parallelogram structure.
4. The alignment mark according to claim 3, wherein the long sides of the first branch and the second branch are respectively disposed along respective extending directions.
5. The alignment mark according to claim 2, wherein the first branch and the second branch are 90 ° displaced from each other with respect to a point of intersection therebetween, and wherein the first angle and the second angle are both 45 °.
6. A mark search device for a lithographic apparatus, comprising an alignment mark according to any of claims 1-5, an alignment device for determining the position of the alignment mark, the alignment device comprising a light source module, an illumination module, an imaging system and a photodetector, a position measurement system and a data processing unit,
a light source module providing an illumination beam required by the alignment device;
the illumination module transmits an illumination light beam of the light source module and illuminates the alignment mark on the substrate or/and the reference plate;
the imaging system generates interference signals to image the alignment marks, and the magnitude of the signal intensity is determined by the positions of the alignment marks;
the photoelectric detector is used for acquiring light intensity information when the alignment mark is imaged;
a position measurement system for acquiring position information of the substrate table;
a data processing unit for calculating the position of the alignment mark by a mark search method based on the light intensity information and the position information of the substrate stage;
wherein an intersection of the first branch and the second branch coincides with a nominal position on a reference plate of the substrate and/or substrate table;
the light intensity information has at least two orders including 1 order and one or more of 3, 5 and 7 orders.
7. The mark search device as claimed in claim 6, wherein the light source module includes a laser light source.
8. The tag search apparatus of claim 6, wherein the illumination beam comprises four wavelengths of polarized light beams of red, green, near infrared and far infrared.
9. The apparatus of claim 8, wherein the alignment device further comprises a beam combiner for combining the four wavelengths of polarized light beams into an illumination beam.
10. The apparatus of claim 8, wherein the alignment device further comprises a beam splitter for splitting the diffracted light from the imaging system into four polarized beams of red, green, near infrared and far infrared wavelengths.
11. The mark search device according to claim 6, wherein the illumination light beam of the illumination module irradiated onto the alignment mark is circularly polarized light.
12. The mark search device as claimed in claim 11, wherein the alignment mark is illuminated by the illumination beam of the illumination module in a collimated manner.
13. The tag search apparatus of claim 6, wherein the position measurement system comprises an interferometer or an encoder.
14. A tag search method for the tag search apparatus according to claim 6, comprising the steps of,
s1: spirally moving a substrate table to capture an image of an alignment mark, acquiring 1-order light intensity information of the two branches in the alignment mark when the substrate table moves by one position, and calculating a coarse search position of the alignment mark according to a deviation between the position of the substrate table at the maximum value of the light intensity information and a nominal position;
s2: diagonally moving the substrate table to capture the image of an alignment mark within a set coarse search range by taking the coarse search position as a center, acquiring 3-order, 5-order and/or 7-order light intensity information of the two branches of the alignment mark when the substrate table moves by one position, and performing weighted calculation to obtain a fine search position of the alignment mark according to a fine search position corresponding to the maximum light intensity information value of each order;
wherein an intersection of the first branch and the second branch coincides with a nominal position on a reference plate of the substrate and/or substrate table.
15. The mark search method as claimed in claim 14, wherein the method of spirally moving the substrate stage to capture the image of the alignment mark in step S1, acquiring the light intensity information of the 1 st order of the two branches of the alignment mark for each position of the substrate stage movement, calculating the coarse search position of the alignment mark based on the deviation of the position of the substrate stage at the maximum of the light intensity information from the nominal position, comprises the steps of,
s1-1: determining a maximum possible deviation of the actual position of the alignment mark from the nominal position as a coarse search range of the spiraling substrate table;
s1-2: determining a step pitch of the coarse search along the X direction according to the width of a first branch of the alignment mark, and determining a step pitch of the coarse search along the Y direction according to the width of a second branch of the alignment mark, wherein the step pitch along the X direction is smaller than the width of the first branch, and the step pitch along the Y direction is smaller than the width of the second branch;
s1-3: spirally moving the substrate table within the coarse search range according to the coarse search step pitch to obtain 1-order light intensity information corresponding to two branches of the alignment mark at each position;
s1-4: calculating the position deviation of the substrate table corresponding to the maximum value of the light intensity information;
s1-5: and obtaining the coarse searching position according to the position deviation and the nominal position.
16. The mark search method according to claim 15, wherein the step in the X direction is one-half of a first width of the alignment mark, and the step in the Y direction is one-half of a second width of the alignment mark.
17. The tag search method of claim 16, wherein a width of the first branch is equal to a width of the second branch, and the step distance in the X direction is equal to the step distance in the Y direction.
18. The mark search method of claim 15, wherein the method of spiraling the substrate table comprises moving the substrate table inside out or outside in the coarse search range according to the coarse search step until the entire coarse search range is scanned.
19. The mark search method as claimed in claim 18, wherein the method of spirally moving the substrate stage according to the rough search step pitch in the rough search range in step S1-3 includes that the substrate stage is displaced in only the X direction or only the Y direction at two positions adjacent in sequence.
20. The tag search method of claim 15, wherein said deriving the coarse search position from the position deviation and the nominal position comprises,
coarPos＝nomiPos+actOffset；
wherein CoarPos is the coarse search position, nomiPos is the nominal position, and actOffset is the deviation of the position of the substrate table at the maximum of the intensity information from the nominal position.
21. The mark search method as claimed in claim 14, wherein the step S2 is a method of moving the substrate stage diagonally to capture an image of an alignment mark, acquiring light intensity information of 3, 5 and/or 7 orders of the two branches of the alignment mark when the substrate stage is moved to different positions, and weighting the position of the substrate stage at the maximum of the light intensity information of each order to obtain the fine search position of the alignment mark based on the deviation of the position of the substrate stage from the nominal position, comprising the steps of,
s2-1: determining a fine search range according to the width of the alignment mark in the horizontal direction and the width of a diagonal line;
s2-2: determining a fine search step according to a capture range of the alignment device, wherein the fine search step is smaller than the capture range;
s2-3: taking the rough searching position as a starting point, extending to a preset distance along the direction of the first included angle as a starting point of the fine search, and moving the substrate stage along the direction of the first included angle within the fine search range according to the fine search step pitch until the whole fine search range is scanned, wherein 3-order, 5-order and/or 7-order light intensity information of the two branches of the alignment mark is obtained when the substrate stage moves by one position;
s2-4: determining a test function of the alignment mark in the X direction according to the size of the first included angle, the width of the diagonal line of the first branch, the light intensity information of each level and the position of the substrate table, wherein the closer to the coarse search position, the larger the output of the test function is;
s2-5: determining a correlation function of the test function and the light intensity information;
s2-6: the derivative of the correlation function is obtained to obtain a derivative function of the correlation function;
s2-7: taking the derivative corresponding to the maximum value of the correlation function as the center, taking a preset number of fitting points from left to right to perform a linear fitting function in the X direction, and recording the linear fitting function as the linear fitting function in the X direction
D(X)＝a×X+b；
S2-8: judging whether the accuracy of the alignment signal meets a preset threshold value, if so, executing the step S2-9, otherwise, reducing the number of the fitting points, and continuing executing the step S2-7;
s2-9: finding X-direction zero crossing point X0The abscissa of the zero crossing point is marked as X0Then, then
Figure FDA0003492215240000051
S2-10: obtaining a linear fitting function in the Y direction according to the methods of the steps S2-4, S2-5, S2-6, S2-7 and S2-8, and recording the linear fitting function as
D(Y)＝c×Y+d；
S2-11: calculating the zero crossing point Y in Y direction0The abscissa of the zero crossing point is marked as Y0Then, then
Figure FDA0003492215240000052
S2-12: and calculating the fine searching position of the alignment mark.
22. The mark search method according to claim 21, wherein the radius of the fine search range is determined based on a width in a horizontal direction and a diagonal width of the alignment mark, comprising a method of,
Figure FDA0003492215240000053
wherein MW is the diagonal width of the first branch or the second branch of the alignment mark; MW2 is the horizontal width of the alignment mark.
23. The mark search method according to claim 21, wherein the fine search step is determined based on a capture range of the alignment device, comprising a method of,
Figure FDA0003492215240000054
where P2 is the fine search step and A is the capture range of the alignment device.
24. The mark searching method of claim 21, wherein the method of aligning signal accuracy comprises,
Figure FDA0003492215240000061
Figure FDA0003492215240000062
Figure FDA0003492215240000063
Figure FDA0003492215240000064
where MCC is the alignment signal accuracy and N is the total number of fitting points.
25. The method according to claim 21, wherein the calculating the fine search position of the alignment mark comprises adding a coarse search to zero-crossing points of different orders to obtain fine search positions of different orders, and weighting the fine search positions of each order to obtain the fine search position.
26. The tag search method of claim 21, wherein the fine search position calculation method comprises,
FinPos＝W1×FinPos3+W2×FinPos5+W3×FinPos7
W1+W2+W3＝1
wherein, W1 is the weight of the 3-order light intensity information, FinPos3 is the fine search position of the 3-order light intensity information; w2 is the weight of 5-order light intensity information, FinPos5 is the fine search position of 5-order light intensity information; w3 is the weight of the light intensity information of the 7 th order, and FinPos7 is the fine search position of the light intensity information of the 7 th order.
27. A lithographic apparatus comprising a stage, a lens system and a substrate table, characterized in that it further comprises a mark search device according to any one of claims 6-12,
the bearing platform bears the mask plate with the pattern to be exposed;
a lens system located between the stage and the substrate table for exposing the pattern to be exposed to the substrate located on the stage;
the substrate table is used for bearing a substrate and a reference plate, the substrate and/or the reference plate are/is provided with the alignment mark, and the substrate table can drive the alignment mark to move in multiple degrees of freedom;
an alignment device of a mark search device is located between the stage and the substrate stage.
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CN107015446A (en) * 2015-09-29 2017-08-04 台湾积体电路制造股份有限公司 Photoetching alignment mark and the device for semiconductor manufacturing

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