CN112859213B - Micro-nano optical element and design method thereof - Google Patents
Micro-nano optical element and design method thereof Download PDFInfo
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- CN112859213B CN112859213B CN202110190435.7A CN202110190435A CN112859213B CN 112859213 B CN112859213 B CN 112859213B CN 202110190435 A CN202110190435 A CN 202110190435A CN 112859213 B CN112859213 B CN 112859213B
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- 238000012876 topography Methods 0.000 claims abstract description 7
- 239000002086 nanomaterial Substances 0.000 claims description 14
- 238000004088 simulation Methods 0.000 claims description 13
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- G—PHYSICS
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- G02B3/00—Simple or compound lenses
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
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- G—PHYSICS
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Abstract
The present invention provides a micro-nano optical element comprising: the surface topography of the main body is provided with one or more microstructure pattern units which can project a preset light field; a preset pattern portion applied to the microstructure pattern unit. The invention also provides a design method of the micro-nano optical element. According to the embodiment of the invention, in order to facilitate identification and tracing in the aspect of anti-counterfeiting and avoid malicious copying and brushing, anti-counterfeiting marks are made on the microstructure on the basis of not substantially damaging the microstructure design of the device, for example, microstructure marks are added on the original structures of DOE and MLA. The designed microstructure mark is also part of the microstructure, and when the microstructure mark is subjected to malicious reproduction, the microstructure mark can be reproduced together, so that the subsequent recognition aspect is easier. In addition, the micro-structure mark has smaller size, compared with the original micro-structure mark, the micro-structure mark has smaller size, and can not have larger influence on the light field or the function of the element. The identification can be identified by using a conventional microscope, and is easy to find and identify.
Description
Technical Field
The present invention relates generally to the field of optical technologies, and in particular, to a micro-nano optical element with an anti-counterfeiting function and a design method of the micro-nano optical element.
Background
Compared with the traditional optical elements (such as lenses), the micro-nano optical elements such as a Diffraction Optical Element (DOE), a micro-lens array (MLA) and the like have the advantages of small size, thin thickness, light weight and the like, can replace the traditional optical elements to be beneficial to miniaturization and integration of an optical system, can modulate a more complex target light field, and has wide application prospects in the emerging technical fields of three-dimensional imaging, three-dimensional vision, augmented reality and the like. Compared with the traditional optical element, the micro-nano optical element has high design difficulty, the processing difficulty of the surface micro-nano morphology structure is high, and templates with specific micro-nano morphology structures are needed to be prepared on the surface of a semiconductor wafer or glass by utilizing methods such as a semiconductor photoetching process, laser direct writing or two-photon photoetching, so that the cost investment in the steps of research and development and template preparation is high, but after the templates are prepared, batch imprinting can be carried out by utilizing a micro-nano imprinting technology, and the research and development and template preparation cost in the early stage can be continuously spread along with the increase of the imprinting quantity, so that the cost is reduced. However, the micro-nano optical elements produced in batch by the micro-nano imprinting technology have the same (or complementary) micro-nano surface morphology structure with the template, so that illegal competitors can easily directly perform reproduction by using the micro-nano optical elements circulated in the market, thereby seriously infringed the interests of the original factories. The surface micro-nano morphology structure of the micro-nano optical element is a nano or micro microstructure, and the morphology of the whole morphology is difficult to distinguish, so that great difficulty is brought to evidence collection in the aspect of pursuing infringement reproduction.
The matters in the background section are only those known to the public and do not, of course, represent prior art in the field.
Disclosure of Invention
In view of at least one of the drawbacks of the prior art, the present invention provides a micro-nano optical element, comprising:
a body having a surface topography with one or more microstructured pattern elements configured to project a predetermined light field; and
a preset pattern portion applied to the microstructure pattern unit.
According to one aspect of the invention, the micro-nano optical element comprises a micro-lens array.
According to one aspect of the invention, the micro-nano optical element comprises a diffractive optical element.
According to an aspect of the present invention, the predetermined pattern part has a uniform height or depth.
According to one aspect of the present invention, the preset pattern portion corresponds to a letter, or a graphic identification.
According to an aspect of the present invention, the microstructure pattern unit of the diffractive optical element includes steps having different heights corresponding to different phases, and the height of the predetermined pattern portion is selected to correspond to the height of one of the steps.
According to one aspect of the invention, the step height is chosen such that the diffractive optical element has a number ratio of 0 phase steps to pi phase steps between 0.9:1 and 1.1:1, preferably a number ratio of 0 phase steps to pi phase steps between 0.95:1 and 1.05:1, within one of the microstructure pattern unit periods.
According to one aspect of the present invention, the area ratio of the preset pattern portion in the microstructure pattern unit is less than 2%, wherein it is preferable that the area ratio of the preset pattern portion in the microstructure pattern unit is less than 0.2%.
The invention also provides a design method of the micro-nano optical element, which comprises the following steps:
s101: according to a preset light field, calculating to obtain the surface morphology of the micro-nano optical element, wherein the surface morphology is provided with one or more microstructure pattern units which are configured to project the preset light field;
s102: applying a preset pattern portion on the microstructure pattern unit of the micro-nano optical element; and
s103: and simulating the micro-nano optical element applied with the preset pattern part, and adjusting the preset pattern part according to a simulation result.
According to one aspect of the invention, the micro-nano optical element comprises a micro-lens array or a diffractive optical element.
According to an aspect of the present invention, the predetermined pattern part has a uniform height or depth.
According to one aspect of the present invention, the preset pattern portion corresponds to a letter, or a graphic identification.
According to an aspect of the present invention, the micro-nano optical element includes a diffractive optical element, the micro-structural pattern unit of the diffractive optical element includes steps having different heights corresponding to different phases, and the height of the preset pattern portion is selected to correspond to the height of one of the steps.
According to one aspect of the invention, the step height is chosen such that the diffractive optical element has a number ratio of 0 phase steps to pi phase steps between 0.9:1 and 1.1:1, preferably a number ratio of 0 phase steps to pi phase steps between 0.95:1 and 1.05:1, within one of the microstructure pattern unit periods.
According to one aspect of the present invention, the step S102 includes: so that the area proportion of the preset pattern part in the microstructure pattern unit is less than 2%, wherein the area proportion of the preset pattern part in the microstructure pattern unit is preferably less than 0.2%.
According to one aspect of the present invention, the step S103 includes adjusting the preset pattern part by: and when the simulated light field is not matched with the preset light field, adjusting the size of the preset pattern part and/or the position of the preset pattern part on the micro-nano optical element micro-structure pattern unit until the simulated light field is matched with the preset light field.
According to the embodiment of the invention, in order to facilitate identification and tracing in the aspect of anti-counterfeiting and avoid malicious copying and brushing, anti-counterfeiting marks are made on the microstructure on the basis of not damaging the self microstructure design, for example, a microstructure mark such as UPhoton is added on the original structure of DOE and MLA. In this way, the designed microstructure identification itself is also part of the microstructure, and if there is a malicious reproduction, the microstructure identification will be reproduced together, which is easier for subsequent identification. In addition, the microstructure mark is smaller in size, and compared with the original microstructure mark, the microstructure mark is smaller in size, the light field is not influenced by the ratio, or the function of the element is not greatly influenced. Easy to find and identify. Can be identified by a conventional microscope.
Drawings
The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate the invention and together with the embodiments of the invention, serve to explain the invention. In the drawings:
FIG. 1 shows a schematic diagram of a diffractive optical element according to one embodiment of the present invention;
FIG. 2 shows a partial phase profile of a diffractive optical element;
FIG. 3 shows the application of the letter "UPhoton" on the microstructured pattern elements of a diffractive optical element;
FIGS. 4A-4C show simulation results for the effect of a light field when different proportions of pre-patterned portions are applied;
FIG. 5 illustrates a target gray scale map of a microlens array according to one embodiment of the present invention;
FIG. 6 shows a partial enlarged view of the target gray scale map of FIG. 5; and
fig. 7 illustrates a method of designing a micro-nano optical element according to one embodiment of the invention.
Detailed Description
Hereinafter, only certain exemplary embodiments are briefly described. As will be recognized by those of skill in the pertinent art, the described embodiments may be modified in various different ways without departing from the spirit or scope of the present invention. Accordingly, the drawings and description are to be regarded as illustrative in nature and not as restrictive.
In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more of the described features. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
In the description of the present invention, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be fixedly connected, detachably connected, or integrally connected, and may be mechanically connected, electrically connected, or may communicate with each other, for example; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
In the present invention, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is less level than the second feature.
The following disclosure provides many different embodiments, or examples, for implementing different features of the invention. In order to simplify the present disclosure, components and arrangements of specific examples are described below. They are, of course, merely examples and are not intended to limit the invention. Furthermore, the present invention may repeat reference numerals and/or letters in the various examples, which are for the purpose of brevity and clarity, and which do not themselves indicate the relationship between the various embodiments and/or arrangements discussed. In addition, the present invention provides examples of various specific processes and materials, but one of ordinary skill in the art will recognize the application of other processes and/or the use of other materials.
The embodiments of the present invention will be described below with reference to the accompanying drawings, and it should be understood that the embodiments described herein are for illustration and explanation of the present invention only, and are not intended to limit the present invention.
For the micro-nano optical structure, the micro-nano optical element circulated in the market can be directly utilized to directly carry out reproduction by a micro-nano embossing technology, and the surface micro-nano morphology structure of the micro-nano optical element is nano-scale or micro-scale microstructure, so that the morphology of the whole morphology is difficult to distinguish, and the reproduced micro-nano optical element is basically indistinguishable from the micro-nano optical element manufactured by a template. The invention provides a technical scheme for anti-counterfeiting of a micro-nano optical element, which is characterized in that a preset pattern part is applied to a micro-structure pattern unit of a micro-nano optical structure. If a third party is unauthorized to copy the micro-nano optical structure, the preset pattern parts are copied together, so that the detection is convenient, and malicious copying can be avoided. Various embodiments of the present invention are described in detail below with reference to the accompanying drawings.
Fig. 1 shows a schematic view of a diffractive optical element 10 according to an embodiment of the invention. As shown in fig. 1, the diffractive optical element 10 includes a main body 101, and micro-nano structures (may also be referred to as "steps") are formed on a surface of the main body 101, and a plurality of micro-nano structures may constitute a micro-structure pattern unit. The microstructure pattern elements have a period, and the surface of the body 101 may have one or more periods of microstructure pattern elements thereon. The micro-nano structures have heights corresponding to different amounts of phase retardation, so that when incident light rays are incident on the diffractive optical element 10, the micro-nano structures with different heights will be capable of generating a certain amount of phase retardation for the incident light rays, modulating the incident light rays, and thus integrally projecting a preset light field, including but not limited to uniform light fields, lines, characters, specific patterns, and the like.
The distribution and height of the micro-nano structure of the diffractive optical element 10 can be designed according to the light source parameters, the target light field, the size parameters, etc. in the design stage. Fig. 2 shows a local phase profile of a typical diffractive optical element.
According to the present invention, a predetermined pattern portion is applied to a microstructure pattern unit based on a conventional diffractive optical element. As shown in fig. 3, the letter "UPhoton" is applied to the microstructure pattern elements of the diffractive optical element 10. Additionally or alternatively, the preset pattern part may include a text or graphic mark, so long as it can be recognized.
As shown in fig. 3, the micro-nano structures of the diffractive optical element 10 have different heights (or phase distributions) around the predetermined pattern portion, and the predetermined pattern portion has a uniform height (in terms of distance from the surface of the body 101 of the diffractive optical element 10) or depth (in terms of distance from the surface of the highest micro-nano structure). The pre-patterned portion may also have a varying height, so long as it can be distinguished from the micro-nano structure surrounding the pre-patterned portion, for example in the letter "UPhoton", different letters may have different heights (or depths).
For diffractive optical elements, it is theoretically optimal to use a continuously varying surface topography, but a continuous surface topography is difficult to manufacture in practice, so a step-wise approach is usually used to simulate a continuous surface topography, with steps of different heights corresponding to different phases. As illustrated in fig. 1, the microstructure pattern unit of the diffractive optical element 10 includes micro-nano structures (i.e., steps) having different heights corresponding to different phases. For the diffractive optical element, a 2-step, 4-step, 8-step, or 16-step design (i.e., the surface of the diffractive optical element includes 2-height steps, 4-height steps, 8-height steps, or 16-height steps) may be employed, and generally the greater the number of steps, the higher the diffraction efficiency. For a general pattern, a 2-step diffractive optical element can be used.
The microstructure pattern of the preset pattern portion may be provided as a continuous topography having the same phase step height, that is, different phase step heights of the original design in the region of the preset pattern portion are modified to the same phase step height. The height of the pre-pattern portion may preferably be selected to correspond to the height of one of the steps when the pre-pattern portion is applied. Taking a 2-step design as an example of a diffractive optical element, which includes, for example, a 0-phase step and a pi-phase step, the height of the predetermined pattern portion may be selected to correspond to the height of the 0-phase step or to correspond to the height of the pi-phase step. It will be understood by those skilled in the art that the present invention is not limited thereto, and the height of the preset pattern portion may be selected to be different from the height of the existing steps, which are all within the scope of the present invention.
According to a preferred embodiment of the present invention, when the preset pattern portion is applied, there is no significant difference between the light field projected through the diffractive optical element and the preset light field by controlling the area ratio of the preset pattern portion in the microstructure pattern unit. The applicant of the present invention has found that when the proportion of the area of the pre-patterned portion in the microstructured pattern elements is less than 2%, preferably less than 0.2%, the application of the pre-patterned portion does not have a significant effect on the projected light field.
Fig. 4A-4C show simulation results for the effect of the light field when different proportions of the pre-patterned portions are applied. Where fig. 4A is a light field simulation diagram of an original design, such as a light field obtained by simulation of the diffractive optical element of fig. 2. Fig. 4B shows a simulation of the light field after adding a predetermined pattern portion with an area ratio of 0.18%, and comparing fig. 4B with fig. 4A, no significant difference is found between the two. Fig. 4C shows a light field simulation of adding a pre-pattern portion with an area ratio of 2%. The light field simulation of fig. 4C varies somewhat from that of fig. 4A, for example, creating a lower brightness line between two segments of line, zero order brightness becoming stronger, and noise increasing. However, in some application scenarios, the light field variation of fig. 4C is still acceptable. Therefore, according to the present embodiment, according to the simulation confirmation of the target light field, adding the microstructure of the preset pattern portion on the original phase diagram is still acceptable, because the microstructure of the preset pattern portion has smaller size and does not have a larger influence on the final light field, compared with the original light field.
In addition, the influence of the preset pattern part on the final light field can be reduced by adjusting the position of the preset pattern part on the microstructure pattern unit. Preferably, the predetermined pattern portion is disposed at a non-central position of the microstructure pattern, for example, at an edge or a corner. Therefore, although the preset pattern portion affects the original light field to some extent, the light field generated finally has no significant change due to the fact that the preset pattern portion is located in the edge or corner area or the size ratio is smaller.
In addition, the inventors of the present invention have found through practical experience accumulation that in the period range of one microstructure pattern unit of the diffractive optical element, if the ratio of the number of pixels of two phase step heights of 0 and pi is controlled to be about 1:1, it is exemplified that zero-order energy is suppressed. Thus, according to a preferred embodiment of the present invention, the size, position and/or height of the steps are chosen such that the number ratio of 0 phase steps to pi phase steps is between 0.9:1 and 1.1:1, preferably between 0.95:1 and 1.05:1, within one microstructure pattern unit period of the diffractive optical element when applying the pre-pattern.
A micro-nano optical element according to an embodiment of the present invention is described above by taking the diffractive optical element 10 as an example. According to another embodiment of the invention, the micro-nano optical element may further comprise a micro-lens array. The following description refers to the accompanying drawings.
Fig. 5 illustrates a target gray scale map of a microlens array according to an embodiment of the present invention, and fig. 6 illustrates a partial enlarged view of the target gray scale map of fig. 5.
The target gray scale map of fig. 5 is a gray scale map obtained by converting a lens file having a three-dimensional morphology into depth information according to a lens surface equation, and the microlens array can be processed using the target gray scale map of fig. 5. The target gray scale image of fig. 5 includes an upper half and a lower half, the gray scale lines of the two halves are perpendicular to each other, and a lenticular microlens array corresponding to two sets of extending directions perpendicular to each other can be used to project a reticle target light field. For example, the microlens array corresponding to the upper half may project vertical lines, and the microlens array corresponding to the lower half may project horizontal lines.
As shown in fig. 6, a corresponding preset pattern portion, such as a security mark 'UPhoton', is added to the micro-nano structure region of the target gray map. The microlens array is processed according to the target gray patterns of fig. 5 and 6, and the obtained microlens array will also have the preset pattern portion, i.e., the anti-counterfeit mark 'UPhoton'.
Unless otherwise indicated, the technical features and aspects described above with reference to the embodiments of fig. 1-4C are equally applicable to the embodiments of fig. 5 and 6 and are not repeated here.
After simulation confirmation according to the target light field, compared with the original light field, the anti-counterfeiting mark has smaller microstructure size and does not have larger influence on the final light field.
The foregoing describes a diffractive optical element and microlens array according to embodiments of the present invention in which, in order to facilitate identification and traceability in terms of security, to avoid malicious piracy, security marks are made on the microstructure without substantially destroying the microstructure design itself, such as the addition of a microstructure identifier like 'UPhoton' to the original structure of the DOE and MLA. In this way, the designed microstructure identification itself is also part of the microstructure, and if there is a malicious reproduction, the microstructure identification will be reproduced together, which is easier for subsequent identification. In addition, the microstructure mark is small in size, and compared with the original microstructure mark, the microstructure mark is small in size, the microstructure mark does not have great influence on a light field or functions of the element, and can be identified by using a conventional microscope, so that the microstructure mark is easy to find and identify.
The invention also relates to a method 100 for designing a micro-nano optical element, as shown in fig. 7. Described in detail below with reference to fig. 7.
In step S101: according to the preset light field, calculating to obtain the surface appearance of the micro-nano optical element, wherein the surface appearance is provided with one or more microstructure pattern units which are configured to project the preset light field.
The micro-nano optical element may be, for example, a micro-lens array or a diffractive optical element. The preset light field includes, but is not limited to, a uniform light field, a straight line, a broken line, a cross line, a specific pattern LOGO or text, etc.
In step S102: and applying a preset pattern part on the microstructure pattern unit of the micro-nano optical element. As shown in fig. 3 or 6, a predetermined pattern portion, such as a letter, or a graphic mark, is applied to the microstructure pattern unit designed in step S101.
In step S103: and simulating the micro-nano optical element applied with the preset pattern part, and adjusting the preset pattern part according to a simulation result.
The preset pattern portion may be adjusted, for example, in the following manner. And when the simulated light field is not matched with the preset light field, adjusting the size of the preset pattern part and/or the position of the preset pattern part on the micro-nano optical element micro-structure pattern unit until the simulated light field is matched with the preset light field. If there is no significant difference between the simulated light field and the preset light field, or if such difference is acceptable for the current application scenario, then it is indicated that the application of the preset pattern portion is successful or acceptable, and the micro-nano optical element can be manufactured according to the micro-structure pattern unit. If there is a significant difference between the simulated light field and the preset light field, or if the difference is not acceptable for the current application scene, then it is indicated that the preset pattern portion needs to be adjusted, for example, the size of the preset pattern portion may be reduced, and/or the preset pattern portion may be made to be closer to the edge or corner of the microstructure pattern unit, and the simulation is performed again until a receivable simulated light field is obtained. And then generating a processing diagram with a microstructure of the preset pattern part, and manufacturing the micro-nano optical element.
According to a preferred embodiment of the present invention, the predetermined pattern part has a uniform height or depth.
According to a preferred embodiment of the present invention, the micro-nano optical element includes a diffractive optical element, the micro-structure pattern unit of the diffractive optical element includes steps having different heights corresponding to different phases, and the height of the preset pattern portion is selected to correspond to the height of one of the steps.
According to a preferred embodiment of the invention, the step heights are chosen such that the ratio of the number of 0 phase steps to pi phase steps in one microstructure pattern unit period of the diffractive optical element is between 0.9:1 and 1.1:1, wherein the ratio of the number of 0 phase steps to pi phase steps is preferably between 0.95:1 and 1.05:1.
According to a preferred embodiment of the present invention, the step S102 includes: so that the area proportion of the preset pattern part in the microstructure pattern unit is less than 2%, wherein the area proportion of the preset pattern part in the microstructure pattern unit is preferably less than 0.2%.
The embodiment of the invention provides a technical scheme for anti-counterfeiting of the micro-nano optical element, which can effectively avoid infringement problems caused by malicious reproduction and piracy and is convenient for proving the right. The anti-counterfeiting mode is to add an anti-counterfeiting micro-nano structure on a designed processing diagram (GDS), so that the whole anti-counterfeiting mark is a part of the micro-nano structure and cannot be removed and eliminated. The technical scheme of the invention can be used for all micro-nano optical elements with small characteristic dimensions, such as DOE and MLA.
Finally, it should be noted that: the foregoing description is only a preferred embodiment of the present invention, and the present invention is not limited thereto, but it is to be understood that modifications and equivalents of some of the technical features described in the foregoing embodiments may be made by those skilled in the art, although the present invention has been described in detail with reference to the foregoing embodiments. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (13)
1. A micro-nano optical element comprising:
a body having a surface topography with one or more microstructured pattern elements configured to project a predetermined light field; and
a preset pattern part applied on the microstructure pattern unit;
the micro-nano optical element comprises a diffraction optical element;
wherein the microstructure pattern unit of the diffractive optical element includes steps having different heights corresponding to different phases, the height of the preset pattern part is selected to correspond to the height of one of the steps, and the micro-nano structure of the diffractive optical element has different heights or phase distribution around the preset pattern part; the area proportion of the preset pattern part in the microstructure pattern unit is less than 2%, the preset pattern part is arranged at a non-center position of the microstructure pattern, and the preset pattern part is used as an anti-counterfeiting mark for identifying the duplicated diffraction optical element.
2. The micro-nano optical element according to claim 1, wherein the pre-patterned portion has a uniform height or depth.
3. The micro-nano optical element according to claim 1, wherein the predetermined pattern portion corresponds to a letter, or a graphic mark.
4. The micro-nano optical element of claim 1, wherein the step height is selected such that the ratio of the number of 0 phase steps to pi phase steps in one of the microstructure pattern unit periods of the diffractive optical element is between 0.9:1 and 1.1:1.
5. The micro-nano optical element according to claim 4, wherein the ratio of the number of 0 phase steps to pi phase steps is between 0.95:1 and 1.05:1.
6. The micro-nano optical element according to claim 1, wherein the area ratio of the preset pattern portion in the microstructure pattern unit is less than 0.2%.
7. A method of designing a micro-nano optical element, wherein the micro-nano optical element comprises a diffractive optical element, the method comprising:
s101: according to a preset light field, calculating to obtain the surface morphology of the micro-nano optical element, wherein the surface morphology is provided with one or more microstructure pattern units which are configured to project the preset light field;
s102: applying a preset pattern part on the microstructure pattern unit of the micro-nano optical element, wherein the preset pattern part is used as an anti-counterfeiting mark for identifying the imprinted diffraction optical element, the area proportion of the preset pattern part occupied by the microstructure pattern unit is less than 2%, and the preset pattern part is arranged at a non-central position of the microstructure pattern; and
s103: simulating the micro-nano optical element applied with the preset pattern part, and adjusting the preset pattern part according to a simulation result;
wherein the microstructure pattern unit of the diffractive optical element includes steps having different heights corresponding to different phases, the height of the preset pattern portion is selected to correspond to the height of one of the steps, and the micro-nano structure of the diffractive optical element has different heights or phase distribution around the preset pattern portion.
8. The design method of claim 7, wherein the pre-pattern part has a uniform height or depth.
9. The design method of claim 7, wherein the predetermined pattern portion corresponds to a letter, or a graphic mark.
10. The design method of claim 7, wherein the step heights are selected such that the ratio of the number of 0 phase steps to pi phase steps is between 0.9:1 and 1.1:1 within one of the microstructure pattern unit periods of the diffractive optical element.
11. The design method according to claim 10, wherein a number ratio of 0-phase steps to pi-phase steps is between 0.95:1 and 1.05:1.
12. The design method according to claim 7, wherein the area ratio of the preset pattern portion in the microstructure pattern unit is less than 0.2%.
13. The design method according to claim 7, wherein the step S103 includes adjusting the preset pattern portion by: and when the simulated light field is not matched with the preset light field, adjusting the size of the preset pattern part and/or the position of the preset pattern part on the micro-nano optical element micro-structure pattern unit until the simulated light field is matched with the preset light field.
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