CN112850857B - electro-Fenton-autoxidation device and method for treating microelectronic wastewater - Google Patents

electro-Fenton-autoxidation device and method for treating microelectronic wastewater Download PDF

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CN112850857B
CN112850857B CN202110001817.0A CN202110001817A CN112850857B CN 112850857 B CN112850857 B CN 112850857B CN 202110001817 A CN202110001817 A CN 202110001817A CN 112850857 B CN112850857 B CN 112850857B
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microelectronic
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water inlet
water
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CN112850857A (en
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王志伟
陈妹
王雪野
查文桂
任乐辉
蔡可钰
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Tongji University
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/30—Organic compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C02F2201/4616—Power supply
    • C02F2201/4617—DC only
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/40—Liquid flow rate
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00—Use of specific compounds during water treatment
    • C02F2305/02—Specific form of oxidant
    • C02F2305/023—Reactive oxygen species, singlet oxygen, OH radical

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

The invention discloses an electro-Fenton-autoxidation device and a method for treating microelectronic wastewater2+And the feeding system is characterized in that the combined cathode comprises a membrane frame and a stainless steel screen. When the device is used for treating microelectronic wastewater, the wastewater can be treated according to H in inlet water2O2The concentration change of the aeration system adjusts the working state of the aeration system and Fe2+The addition amount of (A) to (B) is H2O2The persistent organic matters in the wastewater are effectively oxidized and removed by using the strong oxidizing substances generated in the decomposition process while the wastewater is efficiently decomposed; when H is in the reaction system2O2When the decomposition rate is too fast and the supply is insufficient, H is generated on the surface of the cathode material by the dissolved oxygen through intermittent aeration2O2Realization of H2O2Self-compensation; the device and the treatment method can realize H in the microelectronic wastewater with low consumption and high efficiency2O2And synchronously removing the refractory organics.

Description

electro-Fenton-autoxidation device and method for treating microelectronic wastewater
Technical Field
The invention belongs to the technical field of water treatment, and particularly relates to an electro-Fenton-autoxidation device and method for treating microelectronic wastewater.
Background
The chip manufacturing process is complex, various chemical reagents are needed, and the generated wastewater has the characteristics of large water quantity, various pollutant types, complex water quality characteristics and the like. Waste water discharged in the chip manufacturing process is generally divided into six types of general acid-base waste water (IWW), fluorine-containing waste water (FWW), copper-containing waste water (CuWW), grinding waste water (SLW), ammonia-containing waste water (AWW) and Organic Waste Water (OWW) according to different processes. Due to the complex water quality characteristics, the microelectronic wastewater treatment effect generated in the current chip manufacturing process is poor, and the reuse rate is low. Wherein, IWW water yield far surpasses other five waste water, accounts for more than 1/2 of total emission, and simultaneously this waste water still has characteristics such as pH is low, hydrogen peroxide solution concentration is high, pollutant concentration is lower but pollutant kind is many, has higher retrieval and utilization potentiality. How to realize the synchronous reduction of hydrogen peroxide and complex chemical pollutants and improve the quality of inlet water of a subsequent water treatment unit is the key of advanced treatment and efficient recycling of wastewater in the microelectronic industry. Therefore, there is an urgent need for an apparatus and method for treating microelectronic wastewater that simultaneously considers the low consumption, high efficiency, etc. of the technology.
Disclosure of Invention
Aiming at the defects, the invention provides the electro-Fenton-autoxidation device and the electro-Fenton-autoxidation method for treating the microelectronic wastewater, which can reduce the dosage of an iron source, reduce the generation of iron mud, effectively reduce the concentration of refractory organic matters in the wastewater, and have low consumption and high efficiency.
The invention provides the following technical scheme: the electro-Fenton-autoxidation device for treating microelectronic wastewater comprises a water inlet system, a reactor shell, a combined cathode, a first anode and a second anode which are positioned in the reactor shell, a direct-current power supply electrically connected with the combined cathode, the first anode and the second anode, an aeration system positioned at the bottom in the reactor shell, a water outlet system and a water outlet system, wherein the aeration system and the water outlet system can be used for treating microelectronic wastewater according to H in water2O2Concentration-adjusted dosage of Fe2+A dosing system; the combined cathode comprises a membrane frame and a stainless steel wire mesh cathode, a suction port communicated with the inner cavity of the membrane frame is arranged on the membrane frame, and the suction port is connected with a water outlet pipe of the water outlet system;
the stainless steel mesh cathode is arranged on one side of the membrane frame, the stainless steel mesh cathode is used as a filtering unit and a cathode at the same time, and the combined cathode is arranged between the first anode and the second anode;
the water inlet system comprises a water inlet groove arranged on one side of the reactor shell, and the Fe2+A water inlet of the adding system is arranged in the water inlet tank, and the Fe2+The adding system is based on H in the inlet water2O2Adjusting the amount of the added iron source according to the change of the concentration; the above-mentionedThe aeration system is based on the H in the water2O2The change of concentration adjusts the aeration condition.
Furthermore, the aperture of the stainless steel screen cathode is 40-200 μm.
Furthermore, the distance between the combined cathode and the first anode is 5-20 mm, and the distance between the combined cathode and the second anode is 5-20 mm.
Further, the anode is one of a graphite plate anode, an iridium tantalum oxide anode or a tin antimony oxide anode.
Further, the aeration system comprises an aeration pipe, a gas flow meter and an aeration pump, wherein the aeration pipe is positioned below the combined cathode, and the gas flow meter is used for adjusting the air inflow.
Further, the water outlet system also comprises a peristaltic pump connected with the water outlet pipe.
Furthermore, the water inlet system further comprises a water inlet pipe, a water inlet pump connected with the water inlet pipe, an overflow port arranged on the side surface of the water inlet tank and an H-shaped flow meter, and a water inlet of the water inlet pipe is arranged in the water inlet tank.
The invention also provides an electro-Fenton-autoxidation method for treating microelectronic wastewater by using the device, which comprises the following steps of:
1) the microelectronic wastewater first enters the water inlet tank through the water inlet pipe, and the flow meter monitors the flow rate of the inlet water:
2) detection of H in the device by manual monitoring or portable detector2O2Concentration of H in said feed water2O2When the concentration is too high, the aeration system is started and the Fe is controlled2+An iron source is added by an adding system, and H contained in the microelectronic wastewater2O2On the one hand, the removal can be realized by the decomposition reaction among the combined cathode, the first anode and the second anode interface and the decomposition reaction in a homogeneous system formed in the reactor shell, and the original H in the feed water2O2Fe capable of interfacing with cathodic stainless steel wire mesh2+Catalyst reaction to produce strong oxidantOH; the generated OH can oxidize organic matters without selectivity and initiate a free radical chain reaction, so that the organic matters which are difficult to degrade in the microelectronic wastewater are efficiently mineralized and removed after being degraded, and the Fe2+Fe in iron source added by adding system2+And H2O2Fe produced by the reaction3+The resulting electrons at the combined cathode are reduced to Fe2+Realizing the circulation of the iron source; the biodegradability of the treated microelectronic wastewater can be improved while the degradation and efficient mineralization removal of refractory organic matters in the microelectronic wastewater are realized,
3) when H is in the reactor shell of the device2O2When the decomposition rate is too high and the degradation requirement of the refractory organic matters in the microelectronic wastewater is difficult to meet, the aeration system is intermittently started to ensure that the dissolved oxygen in the solution in the reactor shell generates two-electron oxygen reduction reaction on the surface of the stainless steel wire mesh cathode to generate H2O2Realization of H2O2Self-compensation.
Further, the working voltage range of the direct current power supply is 0.5V-4V.
Furthermore, the retention treatment time of the microelectronic wastewater in the reactor shell is 1.5-3.0 h.
The invention has the beneficial effects that:
1. the invention adopts electro-Fenton-autoxidation technology to decompose H2O2Can effectively reduce H in the recycled water body2O2And the concentration provides guarantee for the stable operation of a subsequent treatment system.
2. The invention adopts electro-Fenton-autoxidation technology to decompose H2O2Can effectively reduce the dosage of the added iron source, and the added small amount of the added iron source is adsorbed on the surface of the cathode due to the electrostatic action and participates in and strengthens the iron circulation process (Fe) in the electro-Fenton process2+/Fe3+) The efficient utilization of the external iron source is realized, and the generation of iron mud is reduced.
3. The invention adopts electro-Fenton-autoxidation technology to decompose H2O2The process thereofDue to H2O2The hydroxyl free radicals generated by decomposition and the active high-valence iron oxide generated on the cathode can carry out oxidative decomposition on the pollutants difficult to degrade in the wastewater, thereby realizing the effective removal of the organic matters difficult to degrade.
4. The invention adopts electro-Fenton-autoxidation technology to treat microelectronic wastewater, the concentration of refractory organic matters in water is higher, and the original H in water2O2When the concentration is insufficient, the dissolved oxygen can generate two-electron oxygen reduction reaction on the surface of the cathode material to generate H through the operation mode of electrification and aeration2O2Realization of H2O2Self-compensation and then high-efficient degradation organic matter difficult to degrade.
5. The device and the method can be used for treating the microelectronic wastewater, can reduce the dosage of an iron source, reduce the generation of iron mud, effectively reduce the concentration of refractory organic matters in the wastewater, and have low consumption and high efficiency.
Drawings
The invention will be described in more detail hereinafter on the basis of embodiments and with reference to the accompanying drawings. Wherein:
FIG. 1 is a schematic structural view of an electro-Fenton-autoxidation apparatus for treating microelectronic wastewater according to the present invention;
FIG. 2 is a graph showing the effect of the apparatus of the present invention on the degradation of total phosphorus with/without an external iron source;
FIG. 3 shows the device of the present invention for H with/without an external iron source2O2The degradation effect of (2).
Detailed description of the preferred embodiments
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
As shown in fig. 1, the invention provides aThe electro-Fenton-autoxidation device for treating microelectronic wastewater comprises a water inlet system 1, a reactor shell 2, a combined cathode 3, a first anode 4 and a second anode 5 which are positioned in the reactor shell 2, a direct current power supply 6 electrically connected with the combined cathode 3, the first anode 4 and the second anode 5, an aeration system 7 positioned at the bottom in the reactor shell 2, and a water outlet system 8 capable of treating microelectronic wastewater according to H in the water2O2Concentration-adjusted dosage of Fe2+ A dosing system 9; the combined cathode 3 comprises a membrane frame 3-1 and a stainless steel wire mesh cathode 3-2, a suction port 3-3 communicated with the inner cavity of the membrane frame 3-1 is arranged on the membrane frame 3-1, and the suction port 3-3 is connected with a water outlet pipe 8-1 of a water outlet system 8;
the stainless steel mesh cathode 3-2 is arranged on one side of the membrane frame 3-1, the stainless steel mesh cathode 3-2 is used as a filtering unit and a cathode at the same time, and the combined cathode 3 is arranged between the first anode 4 and the second anode 5;
the water inlet system 1 comprises a water inlet tank 1-1 arranged at one side of the reactor shell 2, and Fe2+A water inlet of the adding system 9 is arranged in the water inlet tank 1-1, and Fe2+The adding system 9 is based on the H in the inlet water2O2Adjusting the amount of the added iron source according to the change of the concentration; the aeration system 7 is based on the H in the water2O2The change of concentration adjusts the aeration condition.
The aperture of the stainless steel wire mesh cathode 3-2 provided by the invention is 40-200 μm, the distance between the combined cathode and the first anode 4 is 5-20 mm, the distance between the combined cathode and the second anode 5 is 5-20 mm, and the anode can be one of a graphite plate anode, an iridium tantalum oxide anode or a tin antimony oxide anode.
The aeration system 7 in the device provided by the invention comprises an aeration pipe 7-1, a gas flowmeter 7-2 and an aeration pump 7-3, wherein the aeration pipe 7-1 is positioned below the combined cathode 3, and the gas flowmeter 7-2 is used for adjusting the air inflow.
The water outlet system 8 in the device provided by the invention also comprises a peristaltic pump 8-2 connected with the water outlet pipe 8-1.
The water inlet system 1 of the device provided by the invention also comprises a water inlet pipe 1-2, a water inlet pump 1-3 connected with the water inlet pipe 1-2, an overflow port 1-4 arranged on the side surface of the water inlet tank 1-1 and a flowmeter 1-5, wherein the water inlet of the water inlet pipe 1-2 is arranged in the water inlet tank 1-1.
The aperture of the stainless steel wire mesh cathode, the distance between the combined cathode and the first anode and the second anode and the material adopted by the anode of the device provided by the invention can be adjusted and set according to the microelectronic wastewater treatment effect to be actually achieved.
Example 2
This example provides the electro-fenton-autoxidation method of treating microelectronic wastewater with the apparatus of example 1, comprising the steps of:
1) the microelectronic wastewater firstly enters the water inlet tank 1-1 through the water inlet pipe 1-2, and the flow meter 1-5 monitors the flow rate of the inlet water;
2) detection of H in the device by manual monitoring or portable detector2O2Concentration, as H in the feed water2O2When the concentration is too high, the aeration system 7 is started and Fe is controlled2+An iron source and H contained in the microelectronic wastewater are added by an adding system 92O2On the one hand, the removal can be achieved by the decomposition reaction between the combined cathode 3, first anode 4 and second anode 5 interface and the decomposition reaction in a homogeneous system formed within the reactor shell 2, while the original H in the feed water is simultaneously removed2O2Fe capable of interfacing with cathodic stainless steel wire mesh2+The catalyst reacts to generate a strong oxidant OH; the generated OH can oxidize organic matters indiscriminately and initiate free radical chain reaction, so that the organic matters which are difficult to degrade in the microelectronic wastewater are efficiently mineralized and removed after degradation, and meanwhile, the biodegradability of the wastewater and Fe are improved2+Adding Fe in iron source added by the adding system 92+And H2O2Fe produced by the reaction3+Electrons obtained at the combined cathode 3 are reduced to Fe2+Realizing the circulation of the iron source;
3) when the reactor shell 2 of the device is internally H2O2When the decomposition rate is too fast and the degradation requirement of the refractory organic matters in the microelectronic wastewater is difficult to meet, the aeration system 7 is intermittently started to ensure that the dissolved oxygen in the solution in the reactor shell 2 generates two-electron oxygen reduction reaction on the surface of the stainless steel wire mesh cathode 3-2Raw H2O2Realization of H2O2Self-compensation.
The working voltage range of the direct current power supply is 0.5V-4V, and the residence treatment time of the microelectronic wastewater in the reactor shell 2 is 1.5 h-3.0 h. The working voltage of the direct current power supply and the retention and treatment time of the microelectronic wastewater in the reactor shell can be adjusted and set according to the microelectronic wastewater treatment effect to be actually achieved.
The microelectronic wastewater treatment method of example 2 was used with the electro-fenton-autoxidation apparatus provided in example 1, and the degradation effect of the apparatus on total phosphorus with/without an external iron source was examined, and the experimental parameters were set as follows: internal circulation operation mode J is 234 L.m-2·h-1And 3V of external voltage. The experimental result shows that under the condition of no external iron source, the electro-Fenton treatment system can realize higher TP treatment efficiency of more than 60% in 120 min; and adding Fe2+The removal rate of TP can be further improved; adding Fe in comparison with the non-adding group2+The H can be rapidly accelerated within 0-15 min2O2Removal of the decomposition.
The invention has simple structure, and can monitor H in the inlet water when the device is used for treating microelectronic wastewater2O2Concentration according to H in the feed water2O2The concentration change of the aeration system adjusts the working state of the aeration system and Fe2+The addition amount of not only can realize H2O2The high-efficiency decomposition of the waste water can also effectively utilize strong oxidizing substances (such as hydroxyl free radicals, high-valence iron oxides and the like) generated in the decomposition process to oxidize and remove the residual refractory organic matters in the waste water; at the same time, added Fe2+Iron oxides are formed on the cathode assembly due to electrostatic interaction, which participate and enhance the iron cycling process (Fe) in the electro-Fenton process2+/ Fe3+) Further realizing the efficient utilization of the external iron source and reducing the generation of iron mud; when H is in the reaction system2O2When the decomposition rate is too high and the degradation requirement of the refractory organic matter is insufficient, the dissolved oxygen can be subjected to two-electron oxygen reduction reaction on the surface of the cathode material by intermittent aeration to generate H2O2Realization of H2O2Self-compensation; the device and the treatment method can realize H in the microelectronic wastewater with low consumption and high efficiency2O2And synchronously removing the refractory organics.
All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It should be noted that the descriptions in this application as referring to "first", "second", etc. are for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In addition, technical solutions between various embodiments may be combined with each other, but must be realized by a person skilled in the art, and when the technical solutions are contradictory or cannot be realized, such a combination should not be considered to exist, and is not within the protection scope of the present application.
Next, all directional indicators (such as up, down, left, right, front, and back) in the embodiments of the present application are only used to explain the relative position relationship between the components, the movement situation, and the like in a specific posture (as shown in the drawings), and if the specific posture is changed, the directional indicator is changed accordingly, and the connection may be a direct connection or an indirect connection.
It should be understood that the detailed description of the invention is merely illustrative of the invention and is not intended to limit the invention to the specific embodiments described. It will be appreciated by those skilled in the art that the present invention may be modified or substituted equally as well to achieve the same technical result; as long as the use requirements are met, the method is within the protection scope of the invention.

Claims (6)

1. An electro-Fenton-autoxidation method for treating microelectronic wastewater is characterized in that an electro-Fenton-autoxidation device for treating microelectronic wastewater is adoptedThe device comprises a water inlet system (1), a reactor shell (2), a combined cathode (3), a first anode (4) and a second anode (5) which are positioned in the reactor shell (2), a direct current power supply (6) which is electrically connected with the combined cathode (3), the first anode (4) and the second anode (5), an aeration system (7) which is positioned at the bottom in the reactor shell (2), and a water outlet system (8) which can be used for discharging water according to the H in the water2O2Concentration-adjusted dosage of Fe2+A dosing system (9); the combined cathode (3) comprises a membrane frame (3-1) and a stainless steel wire mesh cathode (3-2), a suction port (3-3) communicated with the inner cavity of the membrane frame (3-1) is formed in the membrane frame (3-1), and the suction port (3-3) is connected with a water outlet pipe (8-1) of the water outlet system (8);
the stainless steel mesh cathode (3-2) is arranged on one side of the membrane frame (3-1), the stainless steel mesh cathode (3-2) is used as a filtering unit and a cathode at the same time, and the combined cathode (3) is arranged between the first anode (4) and the second anode (5);
the water inlet system (1) comprises a water inlet groove (1-1) arranged on one side of the reactor shell (2), and the Fe is2+A water inlet of the adding system (9) is arranged in the water inlet tank (1-1), and the Fe2+The adding system (9) is based on H in the inlet water2O2Adjusting the amount of the added iron source according to the change of the concentration; the aeration system (7) is based on the H in the inlet water2O2Adjusting aeration conditions by changing concentration;
the aeration system (7) comprises an aeration pipe (7-1), a gas flow meter (7-2) and an aeration pump (7-3), wherein the aeration pipe (7-1) is positioned below the combined cathode (3), and the gas flow meter (7-2) is used for adjusting the air inflow;
the water outlet system (8) also comprises a peristaltic pump (8-2) connected with the water outlet pipe (8-1);
the water inlet system (1) further comprises a water inlet pipe (1-2), a water inlet pump (1-3) connected with the water inlet pipe (1-2), an overflow port (1-4) arranged on the side surface of the water inlet tank (1-1) and a flowmeter (1-5), wherein a water inlet of the water inlet pipe (1-2) is arranged in the water inlet tank (1-1);
the electro-Fenton-autoxidation method for treating the microelectronic wastewater comprises the following steps of:
1) the microelectronic wastewater firstly enters the water inlet tank (1-1) through the water inlet pipe (1-2), and the flow meter (1-5) monitors the flow rate of the inlet water:
2) detection of H in the device by manual monitoring or portable detector2O2Concentration of H in said feed water2O2When the concentration is too high, the aeration system (7) is started and the Fe is controlled2+An iron source is added by an adding system (9), and H contained in the microelectronic wastewater2O2On the one hand, the removal is realized by the decomposition reaction among the combined cathode (3), the first anode (4) and the second anode (5) interface and the decomposition reaction in a homogeneous system formed in the reactor shell (2), and meanwhile, the original H in the inlet water2O2Fe capable of interfacing with cathodic stainless steel wire mesh2+The catalyst reacts to generate a strong oxidant ∙ OH; the generated ∙ OH can oxidize organic matters indiscriminately and initiate free radical chain reaction, so that the organic matters which are difficult to degrade in the microelectronic wastewater are efficiently mineralized and removed after being degraded, and the Fe2+Fe in iron source added by an adding system (9)2+And H2O2Fe produced by the reaction3+Electrons obtained at the combined cathode (3) are reduced to Fe2+Realizing the circulation of the iron source;
3) when H is in the reactor shell (2) of the device2O2When the decomposition rate is too high and the degradation requirement of the refractory organic matters in the microelectronic wastewater is difficult to meet, the aeration system (7) is intermittently started to ensure that the dissolved oxygen of the solution in the reactor shell (2) generates two-electron oxygen reduction reaction on the surface of the stainless steel wire mesh cathode (3-2) to generate H2O2Realization of H2O2Self-compensation.
2. electro-Fenton-autoxidation process for the treatment of microelectronic wastewater according to claim 1 characterized in that the stainless steel mesh cathode (3-2) has a pore size of 40-200 μm.
3. electro-Fenton-autoxidation process for the treatment of microelectronic wastewater according to claim 1 characterized in that the combined cathode is at a distance of 5mm to 20mm from the first anode (4) and the combined cathode is at a distance of 5mm to 20mm from the second anode (5).
4. The electro-Fenton-autoxidation process of claim 1 wherein the anode is one of a graphite plate anode, an iridium tantalum oxide anode or a tin antimony oxide anode.
5. An electro-Fenton-autoxidation process for treating microelectronic wastewater according to claim 1 wherein the operating voltage of the DC power supply is in the range of 0.5V to 4V.
6. electro-Fenton-autoxidation process to treat microelectronic wastewater according to claim 1 characterized in that the residence treatment time of the microelectronic wastewater in the reactor housing (2) is between 1.5h and 3.0 h.
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