CN112831758A - Aluminum or aluminum alloy antibacterial material - Google Patents
Aluminum or aluminum alloy antibacterial material Download PDFInfo
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- CN112831758A CN112831758A CN202110173816.4A CN202110173816A CN112831758A CN 112831758 A CN112831758 A CN 112831758A CN 202110173816 A CN202110173816 A CN 202110173816A CN 112831758 A CN112831758 A CN 112831758A
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- aluminum
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- aluminum alloy
- spherical storage
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 62
- 239000000463 material Substances 0.000 title claims abstract description 54
- 229910000838 Al alloy Inorganic materials 0.000 title claims abstract description 39
- 230000000844 anti-bacterial effect Effects 0.000 title claims abstract description 30
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 60
- 229910052751 metal Inorganic materials 0.000 claims abstract description 51
- 239000002184 metal Substances 0.000 claims abstract description 51
- 229910052709 silver Inorganic materials 0.000 claims abstract description 49
- 239000004332 silver Substances 0.000 claims abstract description 49
- 238000003860 storage Methods 0.000 claims abstract description 34
- 150000001875 compounds Chemical class 0.000 claims abstract description 30
- XNRNVYYTHRPBDD-UHFFFAOYSA-N [Si][Ag] Chemical compound [Si][Ag] XNRNVYYTHRPBDD-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000004793 Polystyrene Substances 0.000 claims description 77
- 238000005498 polishing Methods 0.000 claims description 60
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 34
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 33
- 238000005566 electron beam evaporation Methods 0.000 claims description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 29
- 238000001704 evaporation Methods 0.000 claims description 25
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 24
- 238000010438 heat treatment Methods 0.000 claims description 23
- 239000011324 bead Substances 0.000 claims description 22
- 239000010410 layer Substances 0.000 claims description 22
- 239000008188 pellet Substances 0.000 claims description 22
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 20
- 229920002223 polystyrene Polymers 0.000 claims description 20
- 230000008020 evaporation Effects 0.000 claims description 19
- 229910052710 silicon Inorganic materials 0.000 claims description 19
- 239000010703 silicon Substances 0.000 claims description 19
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 18
- 239000002356 single layer Substances 0.000 claims description 16
- 238000005406 washing Methods 0.000 claims description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 14
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 14
- 238000001035 drying Methods 0.000 claims description 14
- 238000002791 soaking Methods 0.000 claims description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 12
- 238000005238 degreasing Methods 0.000 claims description 12
- 239000000839 emulsion Substances 0.000 claims description 12
- 238000001020 plasma etching Methods 0.000 claims description 12
- 238000003756 stirring Methods 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 12
- 238000004140 cleaning Methods 0.000 claims description 10
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 239000011246 composite particle Substances 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 7
- 239000000178 monomer Substances 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 claims description 7
- 239000013077 target material Substances 0.000 claims description 7
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 6
- 239000008367 deionised water Substances 0.000 claims description 6
- 229910021641 deionized water Inorganic materials 0.000 claims description 6
- 238000007667 floating Methods 0.000 claims description 6
- 239000011812 mixed powder Substances 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 6
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 6
- 239000000843 powder Substances 0.000 claims description 6
- 238000003825 pressing Methods 0.000 claims description 6
- 238000005303 weighing Methods 0.000 claims description 6
- 239000011863 silicon-based powder Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910002065 alloy metal Inorganic materials 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 2
- 239000004411 aluminium Substances 0.000 claims 1
- -1 silver ions Chemical class 0.000 abstract description 14
- 239000011148 porous material Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 12
- 230000001954 sterilising effect Effects 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000011049 filling Methods 0.000 description 8
- 238000004659 sterilization and disinfection Methods 0.000 description 8
- 239000002245 particle Substances 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000010894 electron beam technology Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- RCEAADKTGXTDOA-UHFFFAOYSA-N OS(O)(=O)=O.CCCCCCCCCCCC[Na] Chemical compound OS(O)(=O)=O.CCCCCCCCCCCC[Na] RCEAADKTGXTDOA-UHFFFAOYSA-N 0.000 description 4
- 229910001069 Ti alloy Inorganic materials 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 239000002071 nanotube Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 238000001291 vacuum drying Methods 0.000 description 4
- 230000000845 anti-microbial effect Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005034 decoration Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000000992 sputter etching Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000010407 anodic oxide Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000002077 nanosphere Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000004599 antimicrobial Substances 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000001580 bacterial effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- GBMDVOWEEQVZKZ-UHFFFAOYSA-N methanol;hydrate Chemical compound O.OC GBMDVOWEEQVZKZ-UHFFFAOYSA-N 0.000 description 1
- 239000004005 microsphere Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 231100000956 nontoxicity Toxicity 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000013268 sustained release Methods 0.000 description 1
- 239000012730 sustained-release form Substances 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
Abstract
The invention provides an aluminum or aluminum alloy antibacterial material, which takes aluminum or aluminum alloy as a base material, wherein a metal intermediate layer is arranged on the surface of the base material, spherical storage spaces are uniformly distributed on the metal intermediate layer, organic silicon silver-containing compounds are arranged in the spherical storage spaces and on the metal intermediate layer, and the storage spaces can effectively control the release speed of silver ions, so that the long-acting bactericidal aluminum material is finally obtained.
Description
Technical Field
The invention relates to an aluminum or aluminum alloy antibacterial material, wherein a base material is aluminum or aluminum alloy, belongs to a metal nano-ion modified functional material, and particularly relates to silver-containing organic silicon composite particles deposited in nano-tube holes on the surface of the base material.
Background
Aluminum and aluminum alloy are one of the most widely used materials in nonferrous metals, and the aluminum alloy has a plurality of excellent properties such as low density, easy processing, low thermal expansion coefficient, high thermal conductivity, high specific stiffness and specific strength, and the like. The method is widely applied to daily production and life, and the fields of aviation, automobiles, high-speed rails, engine pistons, optical instruments, missile mosaic structures and the like. However, with the further development of industrial production, higher requirements are made on the surface properties of the aluminum alloy. The surface properties of aluminum alloys are often improved by applying an antimicrobial coating to the surface.
CN201210212975 Hunan Mei Ke New materials Co., Ltd discloses an electrochemical preparation method of a medical external aluminum alloy multifunctional coating. The medical external aluminum alloy coating prepared by the method has the multifunctional purposes of decoration, corrosion resistance, sterilization, self-cleaning and the like. The aluminum alloy base material is anodized and electrolytically colored to form a porous oxide film on the surface of the aluminum alloy and contain certain metals such as silver, copper, zinc and the like, and the surface layer of the oxide film contains self-cleaning nano titanium dioxide, so that the aluminum alloy has the functions of decoration, corrosion resistance, sterilization, self-cleaning and the like. The medical external aluminum alloy multifunctional coating prepared by the invention has the functions of decoration, corrosion resistance, sterilization and self-cleaning, and has the advantages of simple and environment-friendly process, no toxicity, high stability of the film layer and strong practicability, thereby meeting various requirements of the aluminum alloy in the medical external aspect and expanding the application range of the aluminum alloy. The multifunctional coating obtained by the method can ensure that the aluminum alloy can be applied to medical instruments, such as: the multifunctional medical wheelchair is used in the fields of disabled person stair handrails, medical carts, wheelchairs, stretchers, supports, intelligent calling and the like.
CN201911268522 discloses a substrate surface antibacterial structure for a space environment and a preparation method thereof, wherein the substrate is titanium or a titanium alloy, and belongs to the technical field of metal nano-ion modified functional materials and application thereof. The method is simple, the efficiency of generating the titanium dioxide nanotube is high, the obtained nanotube has a regular structure, and the specific surface area of the titanium and the titanium alloy is improved, so that the capability of loading antibacterial ions is enhanced. The organosilicon coated silver particles are deposited in the titanium dioxide nanotube by an electron beam evaporation deposition technology, so that the antimicrobial corrosion capacity of titanium and titanium alloy in a space environment is improved on the premise of not influencing the mechanical properties of titanium and titanium alloy matrixes.
The antibacterial bactericidal coating is prepared by obtaining an anodic oxide film, and bactericidal particles are filled in the pore channels of the anodic oxide film, but the process obviously has the following technical problems: the pore channel of the oxide film obtained by anodic oxidation is a nano pore channel which is straight up and down, the pore diameter is usually 50-150nm, the fresh pore channel is higher than the micron-sized anodic oxidation pore channel, the difficulty of directly filling the sterilizing particles is extremely high, and the sterilizing particles can not be completely filled, for example, CN201210212975, the biggest technical problem is filling, although CN201911268522 uses an electron beam evaporation technology, the anodic oxidation pore channel can be effectively filled and filled, and the releasing capacity of silver ions is controlled by adopting a mode of coating silver ions with organic silicon, so that the silver ions can have long-time antimicrobial corrosion resistance in a space environment, the actual control speed of the patent is not ideal, as shown in figure 1, because the anodic oxidation pore channel is straight up and down, the silver ions are almost diffused without obstruction in the releasing process, and the releasing capacity of the sterilizing ions is limited.
Disclosure of Invention
Based on the defects in the prior art, the invention provides the aluminum or aluminum alloy antibacterial material, and the metal spherical storage space is prepared through the PS template, and the storage space can effectively control the release speed of silver ions.
The antibacterial material of the aluminum or the aluminum alloy takes the aluminum or the aluminum alloy as a substrate, a metal intermediate layer is arranged on the surface of the substrate, spherical storage spaces are uniformly distributed on the metal intermediate layer, organic silicon silver-containing compounds are arranged in the spherical storage spaces and on the metal intermediate layer, wherein the spherical storage spaces are prepared by a PS template method, the diameter of each spherical storage space is 300-400nm, an opening is arranged at the upper part of each spherical storage space, the size of each opening is 40-100nm, the distance between every two adjacent spherical storage spaces is 80-120nm, and the metal layer is selected from one or more alloy metals of aluminum, copper, nickel, iron and the like.
Further, the substrate is pretreated as follows: rough polishing, degreasing, water washing, heat treatment and electrolytic polishing.
Further, the rough polishing is to polish the surface of the aluminum material by using 600-mesh and 800-mesh water-grinding abrasive paper in sequence;
the degreasing is cleaning and soaking by using an acetone solution;
the heat treatment is carried out under inert conditions at 450-oC, high-temperature treatment for 20-30 min;
the electrolytic polishing is 50g/L phosphoric acid, 20g/L sulfuric acid, 3g/L glycerol, voltage of 15V, time of 2-5min, and temperature of 45oC。
Go toThe PS template method comprises the following steps: weighing 0.1-0.3g of sodium dodecyl sulfate and 0.1g of potassium persulfate, dissolving in 70ml of a solution of methanol and water, wherein the ratio of methanol is 10: 2-10: 5, keeping the nitrogen atmosphere, magnetically stirring for 30min, raising the temperature to 75 DEGoAnd C, adding a polystyrene monomer which is extracted and washed three times by 10wt.% NaOH, reacting for 12 hours, and taking out the obtained white emulsion.
Further, slowly adding the white emulsion into 5-7wt.% of lauryl sodium sulfate deionized water solution through a syringe, fishing out the polystyrene monolayer floating on the water surface by using the pretreated aluminum material, and naturally drying to obtain the aluminum material with the polystyrene PS beads with 400-500nm monolayer adsorbed on the surface.
Further, the aluminum material with 400-500nm monolayer polystyrene spheres adsorbed on the surface is treated by reactive ion etching, and the parameters of the reactive ion etching are as follows: the radio frequency power is 20-40W, the pressure is 9-10Pa, the oxygen flow is 40-60 SCCM, and the diameter of the PS pellet finally obtained is 300-400 nm.
Further, the preparation process of the metal layer is as follows: performing electron beam evaporation metal treatment on the sample subjected to reactive ion etching, wherein the electron beam evaporation parameters are as follows: degree of vacuum 4 x 10-3-6*10-3The evaporation power is 15-20kW, the evaporation speed is 0.3-0.4nm/s, and the time is 15-30 min.
Further, after the electron beam evaporation treatment, chemical polishing treatment is also carried out, wherein the chemical polishing treatment is chemical mechanical polishing, the polishing removal amount is 200-300nm/min, and the polishing time is to expose a small part of PS globules.
Further, the spherical storage space is obtained by removing PS beads by the following removal process: and putting the sample into an organic solvent tetrahydrofuran solution, magnetically stirring and soaking for 15-20min to dissolve the PS globule, and washing and drying to remove the redundant residual liquid.
Further, the organosilicon silver-containing compound is evaporated on the surface of the aluminum material and in the spherical storage space by electron beams, and the electron beam evaporation process comprises the following steps: fully mixing the organic silicon powder and the silver-containing compound powder by using a mixer, and pressing the mixed powder into a cake shape by using a tablet pressAnd (3) a target material, namely obtaining composite particles of organic silicon and a silver-containing compound, wherein the mass ratio of the organic silicon to the silver-containing compound is 1: 2-3, electron beam evaporation vacuum degree of 2 x 10-3The evaporation speed is 0.2-0.3nm/s, and the power is 1-3 kW.
The preparation process of the present invention is explained as follows:
(1) pretreatment: rough polishing, degreasing, washing with water, heat treatment and electrolytic polishing;
the rough polishing is to polish the surface of the aluminum material by using 600-mesh and 800-mesh water-mill sandpaper in sequence;
the degreasing is cleaning and soaking by using an acetone solution;
the heat treatment is carried out under inert conditions at 450-oC, high-temperature treatment for 20-30 min;
the electrolytic polishing is 50g/L phosphoric acid, 20g/L sulfuric acid, 3g/L glycerol, voltage of 15V, time of 2-5min, and temperature of 45oC。
The main purpose of the pretreatment is to obtain a smooth and flat surface, obtain the flat surface primarily by rough polishing and grinding, then remove grease and pollution impurities in the rough polishing process, remove mechanical stress of the aluminum material by heat treatment at high temperature, make metal grains of aluminum larger, facilitate metal coating, and finally obtain the flat and smooth surface of the aluminum material by electrochemical polishing, wherein the surface is favorable for PS (polystyrene) globules to present single-layer distribution, and the single-layer distribution is crucial to the long-range order of a spherical storage space.
(2) Preparing PS beads: the preparation process of the PS bead tube comprises the following steps: weighing 0.1-0.3g of sodium dodecyl sulfate and 0.1g of potassium persulfate, dissolving in 70ml of a solution of methanol and water, wherein the ratio of methanol is 10: 2-10: 5, keeping the nitrogen atmosphere, magnetically stirring for 30min, raising the temperature to 75 DEGoC, adding a polystyrene monomer which is extracted and washed three times by 10wt.% NaOH, reacting for 12h, taking out the obtained white emulsion, slowly adding the white emulsion into 5-7wt.% lauryl sodium sulfate deionized water solution through an injector, fishing out the polystyrene single layer floating on the water surface by using the pretreated aluminum material, naturally drying to obtain the aluminum material with the polystyrene small balls with 400-500nm single layer adsorbed on the surface, and drying the aluminum material by using a stirrerThe diameter of the nanosphere is controlled by adjusting the relative proportion relation of the sodium dodecyl sulfate emulsifier, the potassium persulfate initiator, the monomer and the water phase oil phase, the pore diameter of the nanosphere directly influences the size of the storage space, the pore diameter of 50nm-1 micron can be randomly adjusted according to the pore diameter of PS, and the 400 nm-500 nm PS microspheres are preferred.
(3) The nano size of the PS pellets is reduced by adopting a reactive ion etching technology; the radio frequency power is 20-40W, the pressure is 9-10Pa, the oxygen flow is 40-60 SCCM, the size of the polystyrene is reduced by 20-40%, the reactive ion etching technology is a common method for reducing the nano size of the PS pellets in the prior art, and the PS pellets are reduced to 300-400nm by the reactive ion etching technology.
(4) Evaporating the metal layer by using an electron beam, wherein the thickness of the metal layer is larger than that of the PS pellets in the step (3); electron beam evaporation metal parameters: degree of vacuum 4 x 10-3-6*10-3The evaporation power is 15-20kW, the evaporation speed is 0.3-0.4nm/s, the time is 15-30min, the metal is selected from one or more alloy metals of aluminum, copper, nickel and iron, the method for obtaining the metal coating can be electroplating, electroless chemical plating and physical sputtering, the technology can realize metal plating among PS pellets, but for nanopores, the electroplating is not applicable due to uneven distribution of electric lines and high deep hole plating requirement of electroplating solution configuration, the binding force of the chemically plated coating is effective, the physical sputtering has obvious barrier due to the arc structure of the PS pellets, the electron beam evaporation can effectively solve the problems, and in consideration of the convenience of filling sterilizing particles into a spherical storage space, the invention preferably selects an electron beam evaporation metal layer, the thickness of the metal layer is more than the diameter of the PS pellets, i.e. completely covering the PS pellet.
(5) Polishing to expose PS beads, wherein the polishing is chemical mechanical polishing, the polishing removal amount is 200-300nm/min, the polishing time is to expose a small part of PS beads, nano-scale polishing treatment is realized by adopting chemical polishing liquid, the opening size of the top of the metal spherical storage space can be effectively controlled through the polishing treatment, the opening size determines the release speed of the silver ions, the larger the opening is, the release speed is consistent with the release speed recorded in CN201911268522, and the opening size is 1/5-1/4 which is the diameter of the metal spherical storage space is preferred.
(6) Removing PS beads, washing with water, and vacuum drying: putting a sample into an organic solvent tetrahydrofuran solution, magnetically stirring and soaking for 15-20min to dissolve PS beads, washing and drying to remove redundant residual liquid, polishing to obtain an opening at the upper part of the metal spherical storage space, allowing the organic solvent tetrahydrofuran solution to enter the spherical storage space through the opening to dissolve the PS beads in the spherical storage space, and finally obtaining a hollow spherical storage space with a controllable opening size.
(7) Electron beam evaporating organosilicon silver-containing compound on the surface of aluminum material; fully mixing the organic silicon powder and the silver-containing compound powder by using a mixer, and pressing the mixed powder into a cake shape by using a tablet press to be used as a target material to obtain composite particles of the organic silicon and the silver-containing compound, wherein the mass ratio of the organic silicon to the silver-containing compound is 1: 2-3, electron beam evaporation vacuum degree of 2 x 10-3The evaporation speed is 0.2-0.3nm/s, the power is 1-3kW, and the hollow spherical storage space is in a circular arc structure, so a low-power filling means is required to be ensured, and the slower the filling is, the more the filling is favorable for full filling.
(8) And (3) heat treatment: the heat treatment temperature is 100-150 DEG CoAnd C, under the protection of nitrogen, the time is 15-20min, the protective atmosphere needs to be strictly controlled, if the protective atmosphere contains oxygen, silver particles in the film are directly oxidized to lose the sterilization capability, of course, the temperature of the heat treatment is not high enough, the silver ions are agglomerated, and as is known in the art, the smaller the silver particles, the stronger the oxidizing property and the more outstanding the sterilization property.
Compared with the prior art, the invention has the following advantages:
(1) according to the invention, the PS is taken as the template, the spherical storage space formed by the metal surrounding knot is obtained, the narrowed opening of the metal space can effectively control the release speed of silver ions, and the long-acting sterilization performance is obtained.
(2) Through heat treatment, the organic silicon is stabilized, and the organic silicon has proper binding force with silver ions and good durability.
(3) By a template method, a uniform nano-pore array is obtained on the surface of the metal aluminum material, the array is simple and controllable, the technology for preparing the PS pellets in the prior art is mature, the required PS pellets with any size can be obtained by a person skilled in the art, and the size of the pellets directly corresponds to the pore structure, namely the pore size can be controlled by the method.
(4) The organosilicon-silver ions can be almost completely filled by controlling electron beam evaporation parameters.
Drawings
Fig. 1 is a schematic diagram of the possible release of silver ions from silicone in CN 201911268522.
Fig. 2 is a schematic diagram showing the release of silver ions in the spherical space in the present invention.
FIG. 3 is an SEM image of a sample treated in step (4) according to the present invention.
FIG. 4 is an SEM image of a long-acting bactericidal aluminum or aluminum alloy material obtained by the preparation method of the invention.
Detailed Description
As shown in the attached figure 2, the upper opening of the metal spherical storage space is narrowed and is made of metal, so that the diffusion of silver ions is obviously hindered, and the long-acting property and the sustained release property of the sterilization performance are facilitated.
As shown in fig. 3, PS beads are attached to the surface of the aluminum material in a single layer, and the alkalinity among them is effectively filled by the metal plating layer.
As shown in figure 4, the main sterilization component of the organosilicon-silver ions can be completely filled in the metal spherical storage space, and the filling effect is excellent.
Example 1
An aluminum or aluminum alloy antibacterial material is prepared by the following steps:
(1) pretreatment: rough polishing, degreasing, washing, heat treatment and electrolytic polishing:
and the rough polishing is to polish the surface of the aluminum material by using 600-mesh and 800-mesh water-mill sandpaper in sequence.
The degreasing is cleaning and soaking by using an acetone solution.
The heat treatment is carried out under inert conditions at 450 DEGoAnd C, high-temperature treatment for 20 min.
The electrolytic polishing is 50g/L phosphoric acid, 20g/L sulfuric acid, 3g/L glycerol, voltage of 15V, time of 2-5min, and temperature of 45oC。
(2) Weighing 0.1g of sodium dodecyl sulfate and 0.1g of potassium persulfate to dissolve in 70ml of a solution of methanol and water, wherein the ratio of the methanol is 10:2, keeping the nitrogen atmosphere, magnetically stirring for 30min, raising the temperature to 75 DEG, and self-assembling a single-layer PS pellet on the surface of the pretreated aluminum materialoAnd C, adding a polystyrene monomer which is extracted and washed three times by 10wt.% NaOH, reacting for 12 hours, and taking out the obtained white emulsion.
Slowly adding the white emulsion into 5wt.% of lauryl sodium sulfate deionized water solution through a syringe, fishing out the polystyrene monolayer floating on the water surface by using the pretreated aluminum material, and naturally drying.
(3) The reaction ion etching technology is adopted to reduce the nanometer size of the PS pellets: parameters of reactive ion etching: the radio frequency power is 20W, the pressure is 9Pa, and the oxygen flow is 40 SCCM.
(4) Evaporating a metal layer by using an electron beam, wherein the thickness of the metal layer is greater than that of the PS pellets in the step (3), and the metal parameters of the electron beam evaporation are as follows: degree of vacuum 4 x 10-3The evaporation power is 15kW, the evaporation speed is 0.3-nm/s, and the time is 15 min.
(5) Polishing to expose PS beads: the polishing is chemical mechanical polishing, the polishing removal amount is 200-300nm/min, and the polishing time is to expose a small part of PS beads.
(6) Removing the PS beads, washing with water, and vacuum drying: and putting the sample into an organic solvent tetrahydrofuran solution, magnetically stirring and soaking for 15min to dissolve the PS globule, and washing and drying to remove the redundant residual liquid.
(7) Electron beam evaporation of organosilicon silver-containing compounds on the surface of aluminum: electron beam evaporation of organosilicon silver-containing compounds on the surface of aluminum: fully mixing the organic silicon and the silver-containing compound powder by a mixer by adopting pressureAnd pressing the mixed powder into a cake shape by a sheet machine to be used as a target material to obtain the composite particles of the organic silicon and the silver-containing compound, wherein the mass ratio of the organic silicon to the silver-containing compound is 1: 2, electron beam evaporation vacuum degree of 2 x 10-3The evaporation speed is 0.2nm/s, and the power is 1 kW.
(8) And (3) heat treatment: heat treatment temperature of 100 deg.CoAnd C, protecting by nitrogen for 15 min.
Example 2
An aluminum or aluminum alloy antibacterial material is prepared by the following steps:
(1) pretreatment: rough polishing, degreasing, washing, heat treatment and electrolytic polishing:
and the rough polishing is to polish the surface of the aluminum material by using 600-mesh and 800-mesh water-mill sandpaper in sequence.
The degreasing is cleaning and soaking by using an acetone solution.
The heat treatment is carried out under inert conditions at 475oAnd C, high-temperature treatment for 25 min.
The electrolytic polishing is 50g/L phosphoric acid, 20g/L sulfuric acid, 3g/L glycerol, voltage of 15V, time of 3.5min, and temperature of 45oC。
(2) Weighing 0.2g of sodium dodecyl sulfate and 0.1g of potassium persulfate to dissolve in 70ml of a solution of methanol and water, wherein the ratio of the methanol is 10:3.5, keeping the nitrogen atmosphere, magnetically stirring for 30min, raising the temperature to 75 DEG, and self-assembling a single-layer PS pellet on the surface of the pretreated aluminum materialoAnd C, adding a polystyrene monomer which is extracted and washed three times by 10wt.% NaOH, reacting for 12 hours, and taking out the obtained white emulsion.
Slowly adding the white emulsion into 6wt.% lauryl sodium sulfate deionized water solution through a syringe, fishing out the polystyrene monolayer floating on the water surface by using the pretreated aluminum material, and naturally drying.
(3) The reaction ion etching technology is adopted to reduce the nanometer size of the PS pellets: parameters of reactive ion etching: the radio frequency power is 30W, the pressure is 9.5Pa, and the oxygen flow is 50 SCCM.
(4) Evaporating a metal layer by using an electron beam, wherein the thickness of the metal layer is greater than that of the PS pellets in the step (3), and the metal parameters of the electron beam evaporation are as follows:vacuum degree 5 x 10-3The evaporation power is 17.5kW, the evaporation speed is 0.35nm/s, the time is 22.5min, and the metal is nickel.
(5) Polishing to expose PS beads: the polishing is chemical mechanical polishing, the polishing removal amount is 250nm/min, and the polishing time is to expose a small part of PS beads.
(6) Removing the PS beads, washing with water, and vacuum drying: and putting the sample into an organic solvent tetrahydrofuran solution, magnetically stirring and soaking for 15-20min to dissolve the PS globule, and washing and drying to remove the redundant residual liquid.
(7) Electron beam evaporation of organosilicon silver-containing compounds on the surface of aluminum: electron beam evaporation of organosilicon silver-containing compounds on the surface of aluminum: fully mixing the organic silicon powder and the silver-containing compound powder by using a mixer, and pressing the mixed powder into a cake shape by using a tablet press to be used as a target material to obtain composite particles of the organic silicon and the silver-containing compound, wherein the mass ratio of the organic silicon to the silver-containing compound is 1: 2.5 electron beam evaporation vacuum degree of 2 x 10-3The evaporation speed is 0.25nm/s, and the power is 2 kW.
(8) And (3) heat treatment: the heat treatment temperature was 125 deg.CoAnd C, under the protection of nitrogen, wherein the time is 17.5 min.
Example 3
An aluminum or aluminum alloy antibacterial material is prepared by the following steps:
(1) pretreatment: rough polishing, degreasing, washing, heat treatment and electrolytic polishing:
and the rough polishing is to polish the surface of the aluminum material by using 600-mesh and 800-mesh water-mill sandpaper in sequence.
The degreasing is cleaning and soaking by using an acetone solution.
The heat treatment is carried out under inert conditions at 500 deg.CoAnd C, high-temperature treatment for 30 min.
The electrolytic polishing is 50g/L phosphoric acid, 20g/L sulfuric acid, 3g/L glycerol, voltage of 15V, time of 5min, and temperature of 45oC。
(2) Weighing 0.3g of sodium dodecyl sulfate and 0.1g of potassium persulfate to dissolve in 70ml of methanol-water solution, wherein the ratio of methanol is 10:5,keeping nitrogen atmosphere, magnetically stirring for 30min, and raising temperature to 75 deg.CoAnd C, adding a polystyrene monomer which is extracted and washed three times by 10wt.% NaOH, reacting for 12 hours, and taking out the obtained white emulsion.
The white emulsion was slowly added to a 7wt.% sodium dodecyl sulfate deionized water solution by syringe, and the polystyrene monolayer floating on the water surface was scooped up with the pretreated aluminum material and naturally dried.
(3) The reaction ion etching technology is adopted to reduce the nanometer size of the PS pellets: parameters of reactive ion etching: the radio frequency power is 40W, the pressure is 10Pa, and the oxygen flow is 60SCCM, so that the size of the polystyrene is reduced by 20-40%.
(4) Evaporating a metal layer by using an electron beam, wherein the thickness of the metal layer is greater than that of the PS pellets in the step (3), and the metal parameters of the electron beam evaporation are as follows: vacuum degree 6 x 10-3The evaporation power is 20kW, the evaporation speed is 0.4nm/s, the time is 30min, and the metal is selected from aluminum.
(5) Polishing to expose PS beads: the polishing is chemical mechanical polishing, the polishing removal amount is 300nm/min, and the polishing time is to expose a small part of PS beads.
(6) Removing the PS beads, washing with water, and vacuum drying: and putting the sample into an organic solvent tetrahydrofuran solution, magnetically stirring and soaking for 20min to dissolve the PS globule, and washing and drying to remove the redundant residual liquid.
(7) Electron beam evaporation of organosilicon silver-containing compounds on the surface of aluminum: electron beam evaporation of organosilicon silver-containing compounds on the surface of aluminum: fully mixing the organic silicon powder and the silver-containing compound powder by using a mixer, pressing the mixed powder into a cake shape by using a tablet press to be used as a target material to obtain composite particles of the organic silicon and the silver-containing compound, wherein the mass ratio of the organic silicon to the silver-containing compound is 1:3, and the electron beam evaporation vacuum degree is 2 x 10-3The evaporation speed is 0.3nm/s, and the power is 3 kW.
(8) And (3) heat treatment: the heat treatment temperature is 150 deg.CoAnd C, protecting by nitrogen for 20 min.
Comparative example 1
CN111074324A example 2 is used as comparative example 1
The pure titanium and TC4 test pieces are sequentially polished by 400#, 600#, 800#, 1000#, 1200#, 1500# and 2000# water mill paper and washed by distilled water. Binding a test piece by using a titanium wire, placing the test piece in an electrochemical oil removal groove of sodium hydroxide (30-50 g/L), sodium carbonate (30-50 g/L), trisodium phosphate (20-30 g/L) and sodium silicate (3-5 g/L), setting the solution temperature at 80 ℃, the current density at 5A/dm2, and removing oil for 2 min. The test piece was taken out from the oil removing tank and the surface thereof was washed clean with distilled water. After placing the sample in the solution formulation: soaking in 100 ml/L40% hydrofluoric acid and 100ml/L nitric acid at room temperature for 60 s. The test piece was taken out of the mixed acid solution and the surface thereof was washed clean with distilled water. And placing the test piece in a sulfuric acid solution with an electrolyte formula of 180-200 g/L, setting the solution temperature at-5 ℃, the oxidation voltage at 80V, the anodic oxidation time at 20min and the cathode at a lead plate. Drying in a drying oven at 60 ℃ for 2h, placing the dried sample in a vacuum chamber, sputtering the sample for 15min by adopting argon ions when the air pressure of the vacuum chamber is 10-3Pa, and then evaporating organic silicon: the mass ratio of silver bromide is 1: 1, depositing a silver-containing organic silicon antibacterial coating on the composite target material. And after the film coating is finished, taking out the sample from the vacuum chamber, and packaging and warehousing.
Since a specific coating process is not disclosed in the patent, the electron beam evaporation process of example 2 of the present invention was used.
The sample prepared in example 2 and comparative example 1 were immersed in a bacterial culture solution for an antibacterial property test according to GB/T21510-.
As can be seen from the above table, the bactericidal rate of the present invention is significantly higher, mainly because the silver content of example 2 is much greater than that of comparative document 1, the bactericidal rate of comparative document 1 is significantly decreased by the bactericidal test at day 150, the Ag release rate at day 30 of test example 2 is about 0.0327ppm, the Ag release rate at day 150 is about 0.0178ppm, and the release rate is only decreased by 45.56%, while the Ag release rate at day 30 of comparative example is about 0.0139ppm, the Ag release rate at day 150 is about 0.0012ppm, and the release rate is decreased to 91.37%, which effectively proves the long-lasting effect of the material of the present invention.
Although the present invention has been described above by way of examples of preferred embodiments, the present invention is not limited to the specific embodiments, and can be modified as appropriate within the scope of the present invention.
Claims (10)
1. The aluminum or aluminum alloy antibacterial material is characterized in that aluminum or aluminum alloy is used as a substrate, a metal intermediate layer is arranged on the surface of the substrate, spherical storage spaces are uniformly distributed on the metal intermediate layer, organic silicon silver-containing compounds are arranged in the spherical storage spaces and on the metal intermediate layer, the spherical storage spaces are prepared by a PS template method, the diameter of each spherical storage space is 300-400nm, an opening is formed in the upper portion of each spherical storage space, the size of each opening is 40-100nm, the distance between every two adjacent spherical storage spaces is 80-120nm, and the metal layer is selected from one or more alloy metals of aluminum, copper, nickel, iron and the like.
2. The antibacterial material of aluminum or aluminum alloy as claimed in claim 1, wherein the substrate is pretreated by: rough polishing, degreasing, water washing, heat treatment and electrolytic polishing.
3. An antibacterial material of aluminium or aluminium alloy according to claim 1, characterised in that
The rough polishing is to polish the surface of the aluminum material by using 600-mesh and 800-mesh water-mill sandpaper in sequence;
the degreasing is cleaning and soaking by using an acetone solution;
the heat treatment is carried out under inert conditions at 450-oC, high-temperature treatment for 20-30 min;
the electrolytic polishing is 50g/L phosphoric acid, 20g/L sulfuric acid, 3g/L glycerol and 15 g/L voltageV, time 2-5min, temperature 45oC。
4. An aluminum or aluminum alloy antibacterial material according to claim 3, wherein the PS template method is as follows: weighing 0.1-0.3g of sodium dodecyl sulfate and 0.1g of potassium persulfate, dissolving in 70ml of a solution of methanol and water, wherein the ratio of methanol is 10: 2-10: 5, keeping the nitrogen atmosphere, magnetically stirring for 30min, raising the temperature to 75 DEGoAnd C, adding a polystyrene monomer which is extracted and washed three times by 10wt.% NaOH, reacting for 12 hours, and taking out the obtained white emulsion.
5. The aluminum or aluminum alloy antibacterial material as claimed in claim 4, wherein the white emulsion is slowly added into 5-7wt.% sodium dodecyl sulfate deionized water solution by syringe, the polystyrene monolayer floating on the water surface is fished out by the pretreated aluminum material, and the aluminum material with 400-500nm monolayer polystyrene PS beads adsorbed on the surface is obtained by natural drying.
6. The aluminum or aluminum alloy antibacterial material as claimed in claim 5, wherein the aluminum material with 400-500nm monolayer polystyrene beads adsorbed on the surface is treated by reactive ion etching, and the parameters of the reactive ion etching are as follows: the radio frequency power is 20-40W, the pressure is 9-10Pa, the oxygen flow is 40-60 SCCM, and the diameter of the PS pellet finally obtained is 300-400 nm.
7. The aluminum or aluminum alloy antibacterial material according to claim 1, wherein the metal layer is prepared by the following steps: performing electron beam evaporation metal treatment on the sample subjected to reactive ion etching, wherein the electron beam evaporation parameters are as follows: degree of vacuum 4 x 10-3-6*10-3The evaporation power is 15-20kW, the evaporation speed is 0.3-0.4nm/s, and the time is 15-30 min.
8. The Al or Al alloy material as claimed in claim 7, wherein after the E-beam evaporation treatment, a chemical polishing treatment is further performed, wherein the chemical polishing treatment is a chemical mechanical polishing, the polishing removal amount is 200- "300 nm/min", and the polishing time is to expose a small portion of PS beads.
9. An aluminum or aluminum alloy antibacterial material as claimed in claim 1, wherein the spherical storage space is obtained by removing PS pellets by a process comprising: and putting the sample into an organic solvent tetrahydrofuran solution, magnetically stirring and soaking for 15-20min to dissolve the PS globule, and washing and drying to remove the redundant residual liquid.
10. The antibacterial material of claim 1, wherein the organosilicon silver-containing compound is evaporated on the surface of the aluminum material and in the spherical storage space by electron beam evaporation, and the electron beam evaporation process comprises the following steps: fully mixing the organic silicon powder and the silver-containing compound powder by using a mixer, and pressing the mixed powder into a cake shape by using a tablet press to be used as a target material to obtain composite particles of the organic silicon and the silver-containing compound, wherein the mass ratio of the organic silicon to the silver-containing compound is 1: 2-3, electron beam evaporation vacuum degree of 2 x 10-3The evaporation speed is 0.2-0.3nm/s, and the power is 1-3 kW.
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