CN112777676A - Blending tank liquid level control system and method for treating printing and dyeing wastewater by electron beams - Google Patents
Blending tank liquid level control system and method for treating printing and dyeing wastewater by electron beams Download PDFInfo
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- CN112777676A CN112777676A CN202011585376.5A CN202011585376A CN112777676A CN 112777676 A CN112777676 A CN 112777676A CN 202011585376 A CN202011585376 A CN 202011585376A CN 112777676 A CN112777676 A CN 112777676A
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/305—Treatment of water, waste water, or sewage by irradiation with electrons
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/40—Liquid flow rate
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/42—Liquid level
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Abstract
The invention discloses a blending tank liquid level control system for treating printing and dyeing wastewater by using an electron beam, which comprises a regulating tank, a primary sedimentation tank, a blending tank, an electron beam treatment system, a flow monitoring assembly, a liquid level monitoring assembly and a controller, wherein the regulating tank is connected with the primary sedimentation tank; the adjusting tank is communicated with the primary sedimentation tank through a lifting assembly, the primary sedimentation tank is communicated with the allocation tank through an overflow pipe, and the allocation tank is communicated with the electron beam treatment system through a plurality of water taking assemblies; the flow monitoring assembly is connected with the lifting assembly and the overflow pipe, the liquid level monitoring assembly is connected with the regulating tank and the allocation tank, and the lifting assembly, the flow monitoring assembly, the liquid level monitoring assembly, the water taking assembly and the electron beam processing system are all electrically connected with the controller. The invention also discloses a liquid level control method of the blending tank for treating printing and dyeing wastewater by using the electron beams.
Description
Technical Field
The invention relates to the technical field of electron beam wastewater treatment, in particular to a system and a method for controlling the liquid level of a mixing tank for treating printing and dyeing wastewater by using electron beams.
Background
The printing and dyeing wastewater has the characteristics of large discharge capacity, high organic pollutant content, large alkalinity, large water quality change and the like, contains components such as dye, sizing agent, auxiliary agent, oil agent, acid and alkali, fiber impurities, sand substances, inorganic salt and the like, and belongs to the industrial wastewater which is difficult to treat. Due to technical and economic factors, the prior printing and dyeing wastewater is mostly treated in a biological-physical mode, and the mode can only meet the most basic discharge requirement after treatment. In addition, the existing printing and dyeing wastewater treatment method has large floor area, high initial investment and high treatment cost, so that the production cost is high. The electron beam irradiation technology is to bombard or irradiate the treated object with accelerated electron beam to make it produce physical, chemical and biological reaction, which is difficult to initiate in conventional process, so as to raise product performance, purify matter, etc. The electron beam irradiation technology can be used for more effectively treating the wastewater which is difficult to treat by the traditional wastewater treatment scheme.
In the existing electron beam system for treating printing and dyeing wastewater, the structure of a blending tank is generally designed to be compact and the capacity is small in consideration of economy and applicability. Because the capacity of the allocation tank is small, the states of the electron beam devices are not completely controllable during the operation and treatment of the electron beams, the inflow amount of the front wastewater fluctuates to a certain extent, the liquid level of the allocation tank is greatly influenced by various working condition changes, and if the liquid level can not be kept stable, the treatment effect of the printing and dyeing wastewater is not facilitated. A liquid level system capable of effectively controlling a blending tank is lacked in the prior art.
Disclosure of Invention
In view of the above, an object of the present invention is to provide a blending tank liquid level control system for treating printing and dyeing wastewater by using electron beams, wherein a liquid level monitoring assembly is arranged to monitor liquid levels of a regulating tank and a blending tank, a flow monitoring assembly is arranged to monitor a flow entering the blending tank, and a working state of a water pump is controlled to maintain a stable and balanced liquid level in the blending tank.
The invention also aims to provide a liquid level control method of a blending tank for treating printing and dyeing wastewater by using electron beams, which maintains the stable and balanced liquid level of the blending tank by monitoring the flow and the liquid level state and combining the regulation of a water taking pump.
In order to achieve the aim, the invention provides a liquid level control system of a blending tank for treating printing and dyeing wastewater by using an electron beam, which comprises a regulating tank, a primary sedimentation tank, the blending tank, an electron beam treatment system, a flow monitoring assembly, a liquid level monitoring assembly and a controller, wherein the regulating tank is connected with the primary sedimentation tank; the adjusting tank is communicated with the primary sedimentation tank through a lifting assembly, the primary sedimentation tank is communicated with the allocation tank through an overflow pipe, and the allocation tank is communicated with the electron beam treatment system through a plurality of water taking assemblies; the flow monitoring assembly is connected with the lifting assembly and the overflow pipe, the liquid level monitoring assembly is connected with the regulating tank and the allocation tank, and the lifting assembly, the flow monitoring assembly, the liquid level monitoring assembly, the water taking assembly and the electron beam processing system are all electrically connected with the controller.
Preferably, the lifting assembly comprises a lifting pipe and a lifting pump, the regulating tank is communicated with the primary sedimentation tank through the lifting pipe, the lifting pump is installed on the lifting pipe, and the lifting pump is electrically connected with the controller.
Preferably, the water intake assembly comprises a water intake pipe and a water intake pump, the blending pool is communicated with the electron beam system through the water intake pipe, the water intake pump is installed on the water intake pipe, and the water intake pump is electrically connected with the controller.
Preferably, the liquid level monitoring assembly comprises a first liquid level monitoring device and a second liquid level monitoring device, and both the first liquid level monitoring device and the second liquid level monitoring device are electrically connected with the controller; the first liquid level monitoring device is installed in the regulating tank, and the second liquid level monitoring device is installed in the blending tank.
Preferably, the flow monitoring assembly comprises a first flow monitoring device and a second flow monitoring device, and both the first flow monitoring device and the second flow monitoring device are electrically connected with the controller; the first flow monitoring device is mounted on the lifting assembly and the second flow monitoring device is mounted on the overflow tube.
Preferably, the flow monitoring assembly comprises a first flow monitoring device and a second flow monitoring device, and both the first flow monitoring device and the second flow monitoring device are electrically connected with the controller; the first flow monitoring device is mounted on the riser tube, and the second flow monitoring device is mounted on the overflow tube.
The invention also provides a liquid level control method of the blending tank for treating printing and dyeing wastewater by using the electron beam, which comprises the following steps:
(A) the flow monitoring component monitors flow information of wastewater in the regulating tank flowing into the primary sedimentation tank through the lifting component and flow information of wastewater in the primary sedimentation tank flowing into the allocation tank through the overflow pipe, and feeds the monitored flow information back to the controller;
(B) synchronously with the step (A), the liquid level monitoring component monitors the liquid level information of the regulating tank and the blending tank, and feeds the monitored liquid level information back to the controller;
(C) the controller controls and adjusts the working states of the lifting assembly and the water taking assembly according to the received flow information and the liquid level information, controls and adjusts the working state of the electron beam system according to the working state of the water taking assembly, and maintains the stable and balanced liquid level of the allocation pool.
Compared with the prior art, the liquid level control system and the liquid level control method for the blending tank for treating printing and dyeing wastewater by using the electron beams have the advantages that: the liquid level control system of the blending tank for treating the printing and dyeing wastewater by the electron beam is comprehensive in monitoring, can effectively maintain the stable and balanced liquid level of the blending tank, and ensures the treatment effect of the printing and dyeing wastewater; the method for controlling the liquid level of the blending tank for treating the printing and dyeing wastewater by using the electron beam can effectively monitor the relevant working condition change of the liquid level of the blending tank, effectively adjust the liquid level in time, maintain the stable and balanced liquid level of the blending tank and ensure the treatment effect of the printing and dyeing wastewater.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a schematic diagram of a liquid level control system of a blending tank for treating printing and dyeing wastewater by using electron beams.
FIG. 2 is a flow chart of a method for controlling the liquid level of a mixing tank for treating printing and dyeing wastewater by using electron beams.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As shown in figure 1, the application relates to a blending pool liquid level control system for treating printing and dyeing wastewater by an electron beam, which comprises a regulating pool 1, a primary sedimentation pool 2, a blending pool 3, an electron beam treatment system 4, a flow monitoring assembly, a liquid level monitoring assembly and a controller, wherein the regulating pool 1 is communicated with the primary sedimentation pool 2 through a lifting assembly, the primary sedimentation pool 2 is communicated with the blending pool 3 through an overflow pipe 21, the blending pool 3 is communicated with the electron beam treatment system 4 through a plurality of water taking assemblies, the flow monitoring assembly is connected with the lifting assembly and the overflow pipe, the liquid level monitoring assembly is connected with the regulating pool 1 and the blending pool 3, the lifting assembly, the flow monitoring assembly, the liquid level monitoring assembly, the water taking assembly and the electron beam treatment system 4 are electrically connected with the controller. Waste water in the regulating reservoir 1 is pumped into a primary sedimentation tank 2 by a lifting assembly, the waste water in the primary sedimentation tank 2 flows into a blending tank 3 through an overflow pipe, the waste water is fed in proportion in the blending tank 3, is fully mixed through multi-stage stirring and aeration, and is extracted into an electron beam treatment system 4 through a water taking assembly for treatment. The flow monitoring component monitors flow information of wastewater in the regulating tank 1 flowing into the primary sedimentation tank 2 through the lifting component and flow information of wastewater in the primary sedimentation tank 2 flowing into the allocation tank 3 through the overflow pipe 21, and feeds the monitored flow information back to the controller; the liquid level monitoring component monitors the liquid level information of the regulating tank 1 and the blending tank 3, and feeds the monitored liquid level information back to the controller. The controller controls and adjusts the working states of the lifting assembly and the water taking assembly according to the received flow information and the liquid level information, and controls and adjusts the working state of the electron beam system 4 according to the working state of the water taking assembly so as to maintain the stable and balanced liquid level of the blending pool 3.
Specifically, the lifting assembly comprises a lifting pipe 11 and a lifting pump 111, the adjusting tank 1 is communicated with the primary sedimentation tank 2 through the lifting pipe 11, the lifting pump 111 is installed on the lifting pipe 11, and the lifting pump 111 is electrically connected with the controller. The water taking assembly comprises a water taking pipe 31 and a water taking pump 311, the blending pool 3 is communicated with the electron beam system 4 through the water taking pipe 31, the water taking pump 311 is installed on the water taking pipe 31, and the water taking pump 311 is electrically connected with the controller.
The liquid level monitoring assembly comprises a first liquid level monitoring device 51 and a second liquid level monitoring device 52, and the first liquid level monitoring device 51 and the second liquid level monitoring device 52 are electrically connected with the controller. The first liquid level monitoring device 51 is installed in the adjusting tank 1, and the second liquid level monitoring device 52 is installed in the blending tank 3. The first liquid level monitoring device 51 monitors the liquid level in the regulating reservoir 1 and feeds back liquid level information to the controller; the second liquid level monitoring device 52 monitors the liquid level in the blending tank 3; and feeds back the liquid level information to the controller.
The flow monitoring assembly comprises a first flow monitoring device 61 and a second flow monitoring device 62, and the first flow monitoring device 61 and the second flow monitoring device 62 are electrically connected with the controller. A first flow monitoring device 61 is mounted on the riser 11 and a second flow monitoring device 62 is mounted on the overflow tube 21. The first flow monitoring device 61 monitors the flow of the wastewater in the regulating tank 1 flowing into the primary sedimentation tank 2 through the lifting assembly, and feeds the flow information back to the controller; the second flow monitoring device 62 monitors the flow rate of the wastewater in the primary sedimentation tank 2 flowing into the allocation tank 3 through the overflow pipe 21, and feeds back the flow rate information to the controller.
The application provides a liquid level control method of a blending tank for treating printing and dyeing wastewater by using electron beams, which comprises the following steps:
(A) the flow monitoring component monitors flow information of wastewater in the regulating tank flowing into the primary sedimentation tank through the lifting component and flow information of wastewater in the primary sedimentation tank flowing into the allocation tank through the overflow pipe, and feeds the monitored flow information back to the controller;
(B) synchronously with the step (A), the liquid level monitoring component monitors the liquid level information of the regulating tank and the blending tank, and feeds the monitored liquid level information back to the controller;
(C) the controller controls and adjusts the working states of the lifting assembly and the water taking assembly according to the received flow information and the liquid level information, controls and adjusts the working state of the electron beam system according to the working state of the water taking assembly, and maintains the stable and balanced liquid level of the allocation pool.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (7)
1. A liquid level control system of a blending tank for treating printing and dyeing wastewater by using an electron beam is characterized by comprising a regulating tank, a primary sedimentation tank, a blending tank, an electron beam treatment system, a flow monitoring assembly, a liquid level monitoring assembly and a controller; the adjusting tank is communicated with the primary sedimentation tank through a lifting assembly, the primary sedimentation tank is communicated with the allocation tank through an overflow pipe, and the allocation tank is communicated with the electron beam treatment system through a plurality of water taking assemblies; the flow monitoring assembly is connected with the lifting assembly and the overflow pipe, the liquid level monitoring assembly is connected with the regulating tank and the allocation tank, and the lifting assembly, the flow monitoring assembly, the liquid level monitoring assembly, the water taking assembly and the electron beam processing system are all electrically connected with the controller.
2. The system for controlling the liquid level of a mixing tank for treating printing and dyeing wastewater by using electron beams as claimed in claim 1, wherein the lifting assembly comprises a lifting pipe and a lifting pump, the regulating tank is communicated with the primary sedimentation tank through the lifting pipe, the lifting pump is mounted on the lifting pipe, and the lifting pump is electrically connected with the controller.
3. A pond level control system for electron beam treatment of printing and dyeing wastewater according to claim 1 wherein said water intake assembly comprises a water intake pipe and a water intake pump, said pond is in communication with said electron beam system through said water intake pipe, said water intake pump is mounted on said water intake pipe, and said water intake pump is electrically connected to said controller.
4. The system for controlling the liquid level of a mixing tank for treating printing and dyeing wastewater by using electron beams as claimed in claim 1, wherein the liquid level monitoring assembly comprises a first liquid level monitoring device and a second liquid level monitoring device, and the first liquid level monitoring device and the second liquid level monitoring device are both electrically connected with the controller; the first liquid level monitoring device is installed in the regulating tank, and the second liquid level monitoring device is installed in the blending tank.
5. The system for controlling the liquid level of a mixing tank for treating printing and dyeing wastewater by using electron beams as claimed in claim 1, wherein the flow monitoring assembly comprises a first flow monitoring device and a second flow monitoring device, and the first flow monitoring device and the second flow monitoring device are both electrically connected with the controller; the first flow monitoring device is mounted on the lifting assembly and the second flow monitoring device is mounted on the overflow tube.
6. The system for controlling the liquid level of a mixing tank for treating printing and dyeing wastewater by using electron beams as claimed in claim 2, wherein the flow monitoring assembly comprises a first flow monitoring device and a second flow monitoring device, and the first flow monitoring device and the second flow monitoring device are both electrically connected with the controller; the first flow monitoring device is mounted on the riser tube, and the second flow monitoring device is mounted on the overflow tube.
7. A method for controlling the liquid level of a mixing tank for treating printing and dyeing wastewater by using an electron beam as defined in any one of claims 1 to 6, the method comprising the steps of:
(A) the flow monitoring component monitors flow information of wastewater in the regulating tank flowing into the primary sedimentation tank through the lifting component and flow information of wastewater in the primary sedimentation tank flowing into the allocation tank through the overflow pipe, and feeds the monitored flow information back to the controller;
(B) synchronously with the step (A), the liquid level monitoring component monitors the liquid level information of the regulating tank and the blending tank, and feeds the monitored liquid level information back to the controller;
(C) the controller controls and adjusts the working states of the lifting assembly and the water taking assembly according to the received flow information and the liquid level information, controls and adjusts the working state of the electron beam system according to the working state of the water taking assembly, and maintains the stable and balanced liquid level of the allocation pool.
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CN202011585376.5A CN112777676A (en) | 2020-12-28 | 2020-12-28 | Blending tank liquid level control system and method for treating printing and dyeing wastewater by electron beams |
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CN202011585376.5A CN112777676A (en) | 2020-12-28 | 2020-12-28 | Blending tank liquid level control system and method for treating printing and dyeing wastewater by electron beams |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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DE19904493A1 (en) * | 1999-01-27 | 2000-08-03 | High Voltage Environmental App | Plant for purifying waters and sludges includes main electron-beam reactor tank with air-cooled window from which ozone is fed to pre- and post-reaction stages to break contaminants down completely, with high energy efficiency |
CN106774127A (en) * | 2016-12-29 | 2017-05-31 | 南京大学盐城环保技术与工程研究院 | A kind of industrial park enterprise wastewater receives the intelligent monitoring system and monitoring method of pipe |
CN108257705A (en) * | 2018-03-16 | 2018-07-06 | 中广核达胜加速器技术有限公司 | A kind of irradiation industrial wastewater control process system |
CN108622976A (en) * | 2018-07-11 | 2018-10-09 | 中广核达胜加速器技术有限公司 | A kind of device for irradiating liquids |
CN110865661A (en) * | 2019-12-04 | 2020-03-06 | 深圳市智水智能系统有限公司 | Wastewater level control system |
CN214360373U (en) * | 2020-12-28 | 2021-10-08 | 中广核达胜加速器技术有限公司 | Blending tank liquid level control system for treating printing and dyeing wastewater by electron beams |
-
2020
- 2020-12-28 CN CN202011585376.5A patent/CN112777676A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19904493A1 (en) * | 1999-01-27 | 2000-08-03 | High Voltage Environmental App | Plant for purifying waters and sludges includes main electron-beam reactor tank with air-cooled window from which ozone is fed to pre- and post-reaction stages to break contaminants down completely, with high energy efficiency |
CN106774127A (en) * | 2016-12-29 | 2017-05-31 | 南京大学盐城环保技术与工程研究院 | A kind of industrial park enterprise wastewater receives the intelligent monitoring system and monitoring method of pipe |
CN108257705A (en) * | 2018-03-16 | 2018-07-06 | 中广核达胜加速器技术有限公司 | A kind of irradiation industrial wastewater control process system |
CN108622976A (en) * | 2018-07-11 | 2018-10-09 | 中广核达胜加速器技术有限公司 | A kind of device for irradiating liquids |
CN110865661A (en) * | 2019-12-04 | 2020-03-06 | 深圳市智水智能系统有限公司 | Wastewater level control system |
CN214360373U (en) * | 2020-12-28 | 2021-10-08 | 中广核达胜加速器技术有限公司 | Blending tank liquid level control system for treating printing and dyeing wastewater by electron beams |
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