CN112750694A - Sealing door device and photoetching equipment - Google Patents
Sealing door device and photoetching equipment Download PDFInfo
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- CN112750694A CN112750694A CN201911063171.8A CN201911063171A CN112750694A CN 112750694 A CN112750694 A CN 112750694A CN 201911063171 A CN201911063171 A CN 201911063171A CN 112750694 A CN112750694 A CN 112750694A
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- 238000007789 sealing Methods 0.000 title claims abstract description 183
- 238000001259 photo etching Methods 0.000 title abstract description 10
- 238000003379 elimination reaction Methods 0.000 claims abstract description 28
- 239000000463 material Substances 0.000 claims abstract description 24
- 230000005540 biological transmission Effects 0.000 claims abstract description 23
- 230000008030 elimination Effects 0.000 claims abstract description 21
- 230000033001 locomotion Effects 0.000 claims description 22
- 238000005224 laser annealing Methods 0.000 abstract description 14
- 230000009286 beneficial effect Effects 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 26
- 238000009434 installation Methods 0.000 description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
- 229910052710 silicon Inorganic materials 0.000 description 14
- 239000010703 silicon Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 9
- 230000001960 triggered effect Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000000872 buffer Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 239000011435 rock Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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Abstract
The invention discloses a sealing door device and a photoetching device, wherein the sealing door device comprises a sealing plate and a sealing door, a material transmission port is arranged on the sealing plate, the sealing door has a closing state for shielding the material transmission port and an opening state for leaving the material transmission port, and the sealing door device also comprises: cylinder slip table, guide rail and depth of parallelism error elimination subassembly, cylinder slip table and guide rail setting are in material transmission mouth both sides, and sealing door one end is connected with the cylinder slip table, and the other end is connected with the slider of guide rail, and the depth of parallelism error elimination subassembly sets up between sealing door and cylinder slip table and/or sealing door and slider. The sealing door device can effectively improve the laser annealing efficiency and is beneficial to improving the yield of the photoetching equipment. Correspondingly, the invention also provides the photoetching equipment.
Description
Technical Field
The invention relates to the technical field of integrated circuit manufacturing, in particular to a sealing door device and a photoetching device.
Background
The laser annealing process can anneal on the back without damaging the front device, has high activation efficiency, and gradually replaces the traditional annealing process in the manufacturing fields of insulated gate bipolar transistors, thin film transistors, image sensors and the like. During laser annealing, laser can be irradiated out through a wafer library device transmitted by a silicon wafer, and the safety of operators can be affected, so that a sealing door device needs to be added in a silicon wafer transmission channel. Generally, sealing door device includes sealing door, cylinder slip table and guide rail, and cylinder slip table and guide rail set up respectively in the both sides of sealing door, and the cylinder slip table provides drive power, drives the sealing door and slides on the guide rail to realize that sealing door opens or closes. When the laser is opened, the sealing door is closed to prevent laser leakage; when the laser is closed, the sealing door is opened, and the silicon wafer transmission manipulator can execute wafer loading and unloading operations. However, because the interval between cylinder slip table and the guide rail is great, and the length of cylinder slip table and the self of guide rail is longer, hardly guarantee that cylinder slip table and guide rail installation are absolutely parallel, it is difficult for the motion of sealing door to appear often in the use, the dead phenomenon of card even, seriously influences laser annealing efficiency, and then influences lithography apparatus productivity.
Disclosure of Invention
The invention aims to provide a sealing door device to solve the technical problem that the traditional sealing door device has unsmooth movement to influence the laser annealing efficiency and the yield of a photoetching device.
It is another object of the invention to provide a lithographic apparatus that can improve laser annealing efficiency and improve apparatus yield.
To achieve the purpose, on one hand, the invention adopts the following technical scheme:
the utility model provides a sealing door device, includes closing plate and sealing door, the material transmission mouth has been seted up on the closing plate, sealing door has and shelters from the closed condition of material transmission mouth and leaves the open mode of material transmission mouth, this sealing door device still includes: the device comprises an air cylinder sliding table, a guide rail and a parallelism error elimination assembly, wherein the air cylinder sliding table and the guide rail are arranged on two sides of a material transmission port, one end of a sealing door is connected with the air cylinder sliding table, the other end of the sealing door is connected with a sliding block of the guide rail, and the parallelism error elimination assembly is arranged between the sealing door and the air cylinder sliding table and/or between the sealing door and the sliding block.
In one embodiment, the parallelism error-elimination assembly comprises: sealing door connecting piece, slider connecting piece, first gyro wheel and second gyro wheel, sealing door connecting piece with sealing door connects, the slider connecting piece with the slider is connected, first gyro wheel with the second gyro wheel is followed sealing door's direction of motion sets up the both sides of slider connecting piece, first gyro wheel with the equal one end of second gyro wheel is connected with sealing door connecting piece, and the other end and slider connecting piece butt.
In one embodiment, the first roller and the second roller are connected to the sealing door connector by a fastener.
In one embodiment, the slider connecting piece comprises a moving plate and a baffle, the moving plate is arranged between the first roller and the second roller and connected with the slider, the baffle is arranged on the moving plate, and the baffle is positioned on the outer sides of the first roller and the second roller.
In one embodiment, the parallelism error elimination assembly further comprises a floating joint, wherein a joint body of the floating joint is connected with the sealing door piece, and a floating head of the floating joint is connected with the sealing door connecting piece.
In one embodiment, the sealing door device further comprises a stopping cylinder, and the stopping cylinder is configured to limit the movement of the cylinder sliding table when the sealing door is in an opening state.
In one embodiment, both ends of the cylinder sliding table and both ends of the guide rail are provided with buffers.
In one embodiment, the sealing door device further comprises a closing in-place sensor and an opening in-place sensor, the closing in-place sensor is arranged on the cylinder sliding table or the guide rail, and the closing in-place sensor is used for detecting whether the sealing door is in the closing state; the opening in-place sensor is arranged on the air cylinder sliding table or the guide rail and used for detecting whether the sealing door is in the opening state or not.
In one embodiment, the sealing door device further comprises a mechanical blade fork safety sensor, the mechanical blade fork safety sensor is arranged on the sealing plate, and the mechanical blade fork safety sensor is arranged adjacent to the material transmission port.
In another aspect, the present invention also provides a lithographic apparatus comprising a sealed door arrangement as described in any one of the preceding claims.
The parallelism error eliminating assembly can move towards the offset direction along with the sliding block when the guide rail and/or the cylinder sliding table have the linearity error, so that the parallelism error between the cylinder sliding table and the guide rail can be eliminated, the sealing door can smoothly move on the guide rail, the clamping phenomenon can not occur, the laser annealing efficiency can be effectively improved, and the yield of the photoetching equipment can be improved.
By applying the sealing door device, the laser annealing efficiency can be improved, and the equipment yield can be improved.
Drawings
FIG. 1 is a schematic view of a sealing door apparatus in one embodiment;
FIG. 2 is a schematic diagram of a parallelism error-elimination assembly in one direction in one embodiment;
FIG. 3 is a schematic diagram of a parallelism error-elimination assembly in another orientation, under an embodiment;
FIG. 4 is a schematic diagram of the parallelism error-eliminating assembly shown in FIG. 3 showing the relationship between the compensation amounts in the X-direction and the Y-direction and the inclination angle of the guide rail;
FIG. 5 is a schematic diagram of the operation of the parallelism error-elimination assembly shown in FIGS. 2 and 3;
FIG. 6 is a schematic diagram of a parallelism error elimination assembly in another embodiment;
FIG. 7 is a schematic diagram of the operation of the parallelism error-elimination assembly shown in FIG. 6;
fig. 8 is a schematic structural view of a sealing door apparatus in another embodiment;
FIG. 9 is a schematic view of the installation of the sealing door apparatus shown in FIG. 8 in an embodiment in which both the cylinder slide and the guide rail are installed in parallel in an ideal installation state;
FIG. 10 is a schematic view of the installation of the sealing door apparatus shown in FIG. 8 in an embodiment in which the cylinder slide and the guide rail are not actually installed in parallel in the direction of motion of the sealing door;
fig. 11 is a schematic view showing an operation state of the sealing door in an actual installation state of the cylinder slide table and the guide rail shown in fig. 10;
fig. 12 is a schematic view showing a state of movement of a sealing door of the sealing door apparatus shown in fig. 8 in a state where a linearity error occurs between the cylinder slide table and the guide rail in one embodiment.
Description of reference numerals:
10-a sealing plate, 20-a sealing door, 30-a cylinder sliding table, 40-a guide rail, 50-a parallelism error elimination assembly, 60-a screw, 70-a stop cylinder, 80-a closing in-place sensor, 90-an opening in-place sensor and 100-a mechanical arm piece fork safety sensor;
11-a material conveying port, 31-a limit stop part, 41-a slide block, 51-a sealing door connecting piece, 52-a slide block connecting piece, 53-a first roller, 54-a second roller and 55-a floating joint;
521-moving plate, 522-baffle, 551-connector body, 552-floating head.
Detailed Description
The technical scheme of the invention is further explained by the specific implementation mode in combination with the attached drawings.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention.
The invention provides a sealing door device which is applied to a laser annealing process, the sealing door device is arranged on a silicon wafer transmission channel, the sealing door device is closed when a laser is opened to prevent laser leakage and ensure personnel safety, and after laser annealing is completed, the sealing door is opened and materials (silicon wafers) are continuously transmitted. Specifically, referring to fig. 1 to 5, the sealing door apparatus of an embodiment includes a sealing plate 10 and a sealing door 20, the sealing plate 10 is provided with a material conveying port 11, and the sealing door 20 has a closed state for shielding the material conveying port 11 and an open state for leaving the material conveying port 11. This sealing door device still includes cylinder slip table 30, guide rail 40 and depth of parallelism error elimination subassembly 50, and cylinder slip table 30 and guide rail 40 set up in material transmission mouth 11 both sides, and sealing door 20 one end is connected with cylinder slip table 30, and the other end is connected with the slider 41 of guide rail 40 through depth of parallelism error elimination subassembly 50.
According to the sealing door device, the parallelism error elimination assembly 50 is arranged between the sealing door 20 and the guide rail 40, the parallelism error elimination assembly 50 can move towards the offset direction along with the sliding block when the guide rail 40 and the cylinder sliding table 30 are not parallel and/or coplanar, and the guide rail 40 and/or the cylinder sliding table 30 have the straightness error, so that the parallelism error between the cylinder sliding table 30 and the guide rail 40 can be eliminated, the sealing door 20 can smoothly move on the guide rail 40, the clamping phenomenon is avoided, the laser annealing efficiency can be effectively improved, and the yield of the photoetching equipment is improved.
Specifically, in the above embodiment, the parallelism error elimination assembly 50 is disposed between the seal door 20 and the slider 41, in other embodiments, the parallelism error elimination assembly 50 may also be disposed between the seal door 20 and the cylinder sliding table 30, or the parallelism error elimination assemblies 50 may also be disposed between the seal door 20 and the cylinder sliding table 30 and between the seal door 20 and the slider 41, and both technical effects of eliminating the parallelism error between the cylinder sliding table 30 and the guide rail 40 can be achieved, and the above embodiment is not particularly limited.
Specifically, the moving direction of the sealing door 20 is perpendicular to the installation direction of the sealing door 20, and for convenience of description, the moving direction of the sealing door 20 is referred to as the Z direction, the installation direction of the sealing door 20 is referred to as the X direction, and a third direction spatially perpendicular to both the X direction and the Z direction is referred to as the Y direction.
In one embodiment, the parallelism error elimination assembly 50 includes a sealing door connector 51, a slider connector 52, a first roller 53 and a second roller 54, the sealing door connector 51 is connected with the sealing door 20, the slider connector 52 is connected with the slider 41, the first roller 53 and the second roller 54 are disposed on both sides of the slider connector 52 along the moving direction (i.e., Z direction) of the sealing door 20, and one end of each of the first roller 53 and the second roller 54 is connected with the sealing door connector 51, and the other end abuts against the slider connector 52. Specifically, the first roller 53 and the second roller 54 may be, but are not limited to, steel ball rollers, the first roller 53 and the second roller 54 are both disposed on the sealing door connector 51, the first roller 53 and the second roller 54 are disposed oppositely along the Z direction, and the first roller 53 and the second roller 54 are both abutted to two sides of the slider connector 52 through a spherical pair. The two side surfaces of the slide block connecting piece 52 are respectively abutted with the spherical pair of the first roller 53 and the spherical pair of the second roller 54, the two side surfaces of the slide block connecting piece 52 are parallel to each other, the slide block connecting piece 52 can move between the first roller 53 and the second roller 54 along the direction X, Y, and when the guide rail 40 and the cylinder sliding table 30 are installed in a non-parallel mode, the slide block connecting piece 52 can move along with the slide block 41 in the direction X, Y to compensate for a parallelism error between the guide rail 40 and the cylinder sliding table 30. Further, first gyro wheel 53 and second gyro wheel 54 are along the Z to butt in the both sides of slider connecting piece 52, and first gyro wheel 53 and second gyro wheel 54 do not all have the clearance along Z to with between the slider connecting piece 52 to can make slider connecting piece 52 upwards can not take place to rock at Z, also can not have after the sealing door 20 stops and rock from top to bottom, can realize slider connecting piece 52 and sealing door connecting piece 51 rigid connection, further guarantee sealing door 20 motion stable and reliable.
As shown in fig. 5, in this embodiment, the cylinder sliding table 30 is vertically installed along the Z direction, and the cylinder sliding table 30 has no installation error, but the guide rail 40 has an installation error, the guide rail 40 is inclined along the Z direction, the guide rail 40 is inclined gradually to the right from top to bottom, and the guide rail 40 and the cylinder sliding table 30 have a parallelism error along the X direction. Specifically, the left arrow in the figure indicates the moving direction of the cylinder sliding table 30 during the movement of the seal door 20 from the open state to the closed state, and the right arrow indicates the moving direction of the slider 41 (i.e., the arrangement direction of the guide rail 40) during the movement of the seal door 20 from the open state to the closed state. When the sealing door 20 moves from top to bottom, that is, the sealing door 20 moves from the open state to the closed state, the distance between the guide rail 40 and the cylinder sliding table 30 gradually increases, and the slider 41 can gradually pull the slider connecting piece 52 to move towards the right side to compensate the parallelism error between the guide rail 40 and the cylinder sliding table 30 along the X direction, so that the slider 41 can stably slide on the slide rail 40, and the clamping cannot occur. Further, when the seal door 20 moves from bottom to top, that is, the seal door 20 moves from the closed state to the open state, the distance between the guide rail 40 and the cylinder sliding table 30 gradually decreases, and in this process, the slider 41 gradually pushes the slider connecting member 52 to move to the left side to compensate for the parallelism error between the guide rail 40 and the cylinder sliding table 30.
Furthermore, the slider connecting element 52 can move between the first roller 53 and the second roller 54 in the left-right direction along the X direction, and the slider connecting element 52 can also move between the first roller 53 and the second roller 54 in the Y direction, when there is a parallelism error between the guide rail 40 and the cylinder slide table 30 along the Y direction, for example, when the mounting surface of the guide rail 40 and the mounting surface of the cylinder slide table 30 are not on the same plane, the slider connecting element 52 can move along with the slider 41 in the Y direction between the first roller 53 and the second roller 54 to compensate the parallelism error between the guide rail 40 and the cylinder slide table 30 along the Y direction, so as to further ensure the smooth operation of the sealing door 20 and avoid the occurrence of motion jamming of the sealing door 20. Further, if the thickness of the products of the guide rail 40 and the cylinder sliding table 30 are different, or when the parallelism error exists between the guide rail 40 and the cylinder sliding table 30 along the Y direction due to the defect of uneven thickness of the product of the guide rail 40 or the cylinder sliding table 30, the defect error compensation can be performed between the first roller 53 and the second roller 54 along the Y direction by the slider connecting piece 52, so that the problem that the sealing door 20 is jammed due to different thicknesses of the products of the guide rail 40 and the cylinder sliding table 30 or uneven thickness of the product of the guide rail 40 and/or the cylinder sliding table 30 can be effectively avoided.
Specifically, as shown in fig. 2 and 3, in the present embodiment, the number of the first rollers 53 and the second rollers 54 is two, in other embodiments, the number of the first rollers 53 and the second rollers 54 may be more than two or less than two, and the first rollers 53 and the second rollers 54 are not limited to being arranged in one row, and may also be arranged in multiple rows to increase the connection rigidity of the sealing door 20. In practical applications, the number of the first roller 53 and the second roller 54 can be selected according to the length of the slider link 52, and if the length of the slider link 52 is longer, the number of the first roller 53 and the second roller 54 can be increased, and if the length of the slider link 52 is shorter, the number of the first roller 53 and the second roller 54 can be decreased. Therefore, the specific number of the first roller 53 and the second roller 54 can be selected according to actual needs, as long as the number of the first roller 53 and the second roller 54 is the same, and the embodiment is not particularly limited.
In one embodiment, the first roller 53 and the second roller 54 are both connected to the connector 51 of the sealing door 20 by fasteners. Specifically, as shown in fig. 2 and 3, the fastener may be, but is not limited to, a screw 60. The first roller 53 and the second roller 54 are fixed on the sealing door connecting piece 51 through screws 60, and the distance between the first roller 53 and the second roller 54 which are correspondingly arranged can be adjusted through adjusting the screws 60, so that the sealing door connecting piece can be matched with the sliding block connecting pieces 52 with different thicknesses; on the other hand, the requirement on the installation accuracy of the guide rail 40 can be reduced, the assembly efficiency is improved, when the first roller 53 and the second roller 54 are respectively assembled with the slider connecting piece 52, the adjusting screw 60 only needs to enable the spherical pair of each first roller 53 and each second roller 54 to be respectively abutted with the slider connecting piece 52, and even if the guide rail 40 inclines along the Z direction, the slider 41 inclines along the X direction, the abutting of the first roller 53 and the second roller 54 can be ensured to be stable and reliable.
In one embodiment, the slider link 52 includes a moving plate 521 and a baffle 522, the moving plate 521 is disposed between the first roller 53 and the second roller 54, the moving plate 521 is connected to the slider 41, the moving plate 521 can be driven by the slider 41 to translate along the X direction and/or the Y direction between the first roller 53 and the second roller 54, the baffle 522 is disposed on the moving plate 521, and the baffle 522 is located outside the first roller 53 and the second roller 54. Specifically, the baffle 522 can limit the movement of the moving plate 521, so as to prevent the slider connector 52 from sliding out from between the first roller 53 and the second roller 54, and ensure that the slider connector 52 is stably and reliably connected with the first roller 53 and the second roller 54, respectively. Further, as shown in fig. 4, the guide rail 20 is inclined at an angle equal to the horizontalThe relation of the error compensation quantity of the degree of motion is as follows: x0＝Lcosα，Y0Lcos beta, wherein X0The parallelism error compensation quantity in the X direction; y is0The parallelism error compensation quantity in the Y direction; l is the length of the guide rail 20; α is the inclination angle of the guide rail 20 in the X direction; beta is the inclined angle of the guide rail in the Y direction. The parallelism error elimination assembly 50 needs to completely compensate for the parallelism error, and therefore, as shown in fig. 3, the distance d between the shutter 522 and the first and second rollers 53 and 54 in the X directionXParallelism error compensation X not less than X direction0The distance d between the shutter 522 and the first and second rollers 53 and 54, respectively, in the Y directionYParallelism error compensation Y not less than Y direction0Therefore, dX≥Lcosα，dY≥Lcosβ。
In one embodiment, the sealing door apparatus further includes a stop cylinder 70, and the stop cylinder 70 is configured to limit the movement of the cylinder slide 30 when the sealing door 20 is in the open state. Specifically, the cylinder sliding table 30 is provided with a limit stop portion 31, and the limit stop portion 31 is provided with a through hole through which a piston rod of the stop cylinder 70 can pass. When the cylinder sliding table 30 moves to the open state and moves in place, the piston rod of the locking cylinder 70 extends out and penetrates through the through hole in the limiting locking part 31 to limit and fix the cylinder sliding table 30, and the sealing door 20 is prevented from falling off under the condition of abnormal gas cut-off. When the sealing door 20 needs to be closed, the piston rod of the stop cylinder 70 retracts, and the cylinder sliding table 30 can drive the sealing door 20 to move downwards.
In one embodiment, both ends of the cylinder sliding table 30 and both ends of the guide rail 40 are also provided with buffers. Specifically, the buffer may be, but is not limited to, a hydraulic buffer, and after the sealing door 20 is opened or closed in place, the sealing door 20 is decelerated by the hydraulic buffer and then stops, so that the sealing door 20 can be ensured to stop stably, and the motion stability of the sealing door 20 is further improved.
In one embodiment, the sealing door apparatus further includes a close-in-place sensor 80 and an open-in-place sensor 90, the close-in-place sensor 80 is disposed on the cylinder sliding table 30, and the close-in-place sensor 80 is used for detecting whether the sealing door 20 is in a closed state; the open-in-place sensor 90 is provided on the cylinder slide table 30, and the open-in-place sensor 90 is used for detecting whether the seal door 20 is in an open state. In this embodiment, the in-place closing sensor 80 and the in-place opening sensor 90 are arranged to detect whether the sealing door 20 is in place or in place to ensure personnel safety and material transportation safety. Specifically, when the sealing door 20 is detected to be closed in place, the laser is opened to perform laser annealing treatment on the silicon wafer, so that laser is prevented from leaking. Further, after the laser annealing process is completed, silicon wafer transmission operation is performed after the sealing door 20 is detected to be opened in place, so that the safety of material transmission can be ensured. Furthermore, the piston rod of the stop cylinder 70 is extended to limit and fix the cylinder sliding table 30 after detecting that the sealing door 20 is opened in place. In this embodiment, both the in-place closing sensor 80 and the in-place opening sensor 90 are disposed on the cylinder sliding table 30, in other embodiments, the in-place closing sensor 80 and the in-place opening sensor 90 may also be disposed on the guide rail 40, one of the in-place closing sensor 80 and the in-place opening sensor 90 may also be disposed on the cylinder sliding table 30, and the other one of the in-place closing sensor 80 and the in-place opening sensor 90 may be disposed on the guide rail 40.
In one embodiment, the sealing door apparatus further comprises a robot blade fork safety sensor 100, the robot blade fork safety sensor 100 is disposed on the sealing plate 10, and the robot blade fork safety sensor 100 is disposed adjacent to the material transfer port 11. Specifically, the silicon wafer is transferred by a transfer robot, and the transfer robot can load and unload the silicon wafer from the silicon wafer stage to perform silicon wafer transfer. In this embodiment, the robot blade fork safety sensor 100 is disposed at a position on the sealing plate 10 close to the material transfer port 11, and is capable of detecting whether the transfer robot is in a wafer loading and unloading state, so that the sealing door 20 can be controlled not to be closed when the transfer robot is in the wafer loading and unloading state, and thus the robot blade fork safety is ensured, and further the silicon wafer transfer safety is ensured. Specifically, when the sealing door 20 is closed, the close-in-place sensor 80 is triggered, and the transfer robot cannot load and unload wafers from the wafer stage; when the sealing door 20 is opened in place, the in-place opening sensor 90 is triggered, at the moment, the transmission manipulator can get on and off the wafer from the wafer table, the transmission manipulator acts, the manipulator wafer fork safety sensor 100 is triggered, and when the manipulator wafer fork safety sensor 100 is triggered, the sealing door 20 cannot execute closing operation so as to ensure the safety of the manipulator wafer fork. Therefore, the safety interlock strategy of the sealing door 20 and the transfer robot is: the operation of the transfer robot is hard interlocked with the open state of the sealing door 20, and the state of the sealing door 20 needs to be detected before the operation of the transfer robot. The in-place opening sensor 90 is not triggered, the manipulator piece fork safety sensor 100 is triggered, and the transmission manipulator needs to be suddenly stopped; when the in-place sensor 90 is started to trigger, the transmission manipulator can carry out loading and unloading on the silicon wafer platform, and the loading and unloading of the silicon wafer platform are not allowed in other states. Further, the closing state of the sealing door 20 and the opening of the laser are hard interlocked, the closing in-place sensor 80 is triggered, the exposure lens can be exposed, and the exposure is not allowed in other states; the exposure lens laser is closed and the sealing door 20 is allowed to open. Further, the seal door 20 operation is hard interlocked with the transfer robot state, and it is necessary to confirm that the transfer robot is not in the wafer stage interface area when the seal door 20 is closed.
As shown in fig. 6 to 8, in another embodiment, the parallelism error-eliminating assembly further includes a floating joint 55, a joint body 551 of the floating joint 55 is connected to the sealing door 20, and a floating head 552 of the floating joint 55 is connected to the sealing door connector 51. Specifically, as shown in fig. 7, there may be manufacturing errors in the cylinder slide table 30 or the guide rail 40 itself, and there may be a straightness error in the guide rail 40 due to the bending of the product itself, and the longer the guide rail 40 is, the larger the straightness error is. If there is a linearity error in the guide rail 40, and the moving track of the slider 41 is shown by a dotted line in fig. 7 during the movement of the sealing door 20, in this embodiment, a floating joint 55 is disposed between the sealing door connector 51 and the sealing door 20, the floating head 552 of the floating joint 55 can swing in Rx and Ry directions by a certain angle, the degree of freedom in Rx and Ry directions and the degree of freedom in the direction X, Y of the parallelism error elimination assembly are achieved through the floating joint 55, and the degree of freedom in the Z direction of the guide rail 40 can adapt to the certain linearity error of the guide rail 40, so that the sliding of the sealing door 20 in the stroke range can be ensured to be smooth, the requirement on the precision of the linearity of the guide rail 40 can be reduced, and the cost can be saved. Further, the parallelism error elimination assembly of the present embodiment is different from the parallelism error elimination assembly of the previous embodiment only in that a floating joint 55 is disposed between the sealing door connector 51 and the sealing door 20, and other structures and components are the same and will not be described again.
The operation of the sealing door device shown in fig. 8 will be further described with reference to fig. 9 to 12. Specifically, as shown in fig. 9, it is a schematic view of the installation of the sealing door apparatus shown in fig. 8 when the cylinder slide table 30 and the guide rail 40 are both in an ideal installation state and the installation is parallel. If the cylinder sliding table 30 and the guide rail 40 are both in an ideal installation state, the cylinder sliding table 30 and the guide rail 40 are arranged in parallel along the Z direction, and the installation plane of the cylinder sliding table 30 and the installation plane of the guide rail 40 are on the same plane, under the installation condition, the slider connecting piece 52 cannot displace along the X direction or the Y direction between the first roller 53 and the second roller 54 in the movement process of the sealing door 20, and the parallelism error eliminating assembly only moves along with the sealing door 20 and does not perform error compensation eliminating action.
Further, as shown in fig. 10 and 11, the two figures are respectively a schematic view of the installation of the sealing door device shown in fig. 8 when the cylinder sliding table 30 and the guide rail 40 are actually installed and are not parallel along the moving direction of the sealing door 20, and a schematic view of the operation state of the sealing door 20 in the process of moving from the open state to the sealing state. If the cylinder sliding table 30 and the guide rail 40 are actually installed and are not parallel in the Z direction, in the moving process of the sealing door 20, the parallelism error eliminating assembly eliminates the parallelism error between the guide rail 40 and the cylinder sliding table 30, and the smooth operation of the sealing door is ensured.
Specifically, as shown in fig. 10, in the present embodiment, the cylinder sliding table 30 is inclined from top to bottom to the left side, the guide rail 40 is inclined from top to bottom to the right side, when the sealing door 20 moves from the open state to the closed state, the distance between the cylinder sliding table 30 and the guide rail 40 is gradually increased, when the sealing door 20 moves, the slider connecting member 52 follows the slider 41, when the slider 41 moves downward along the guide rail 40, the slider connecting member 52 gradually pulls the slider connecting member 52 to move to the right side, and the slider connecting member 52 moves between the first roller 53 and the second roller 54 to move to the right side along the X direction, so as to increase the distance between the slider connecting member 52 and the sealing member 51, so as to compensate for the parallelism error between the guide rail 40; further, when the seal door 20 moves from bottom to top, i.e. during the movement from the open state to the closed state, the distance between the guide rail 40 and the cylinder sliding table 30 gradually decreases, during the movement of the seal door 20, the upward movement of the slider 41 along the guide rail 40 gradually pushes the slider connecting member 52 to move to the left, and the slider connecting member 52 moves between the first roller 53 and the second roller 54 to the left along the X direction to decrease the distance between the slider connecting member 52 and the seal connecting member 51, so as to compensate for the parallelism error between the guide rail 40 and the cylinder sliding table 30.
Further, if there is a parallelism error between the guide rail 40 and the cylinder slide 30 in the Y direction, for example, if the mounting surface of the guide rail 40 and the mounting surface of the cylinder slide 30 are not on the same plane, the slider link 52 will move with the slider 41 in the Y direction between the first roller 53 and the second roller 54 to compensate for the parallelism error between the guide rail 40 and the cylinder slide 30 in the Y direction. Specifically, when the mounting plane of the guide rail 40 is higher than that of the cylinder slide table 30, the slider link 52 moves between the first roller 53 and the second roller 54 in the Y direction to approach the sealing plate 10; on the contrary, when the mounting plane of the guide rail 40 is lower than the mounting plane of the cylinder slide table 30, the slider link 52 moves between the first roller 53 and the second roller 54 in the Y direction away from the sealing plate 10.
Still further, as shown in fig. 12, it is a schematic view of the movement state of the sealing door 20 of the sealing door apparatus shown in fig. 8 when there is a straightness error state between the cylinder slide table 30 and the guide rail 40. If the cylinder sliding table 30 and the guide rail 40 still have linearity errors, in the moving process of the sealing door 20, the floating head 552 of the floating joint 55 can swing in the joint body 551 along the directions Rx and Ry, the degree of freedom of the floating joint 55 in the directions Rx and Ry is matched with the degree of freedom of the parallelism error eliminating assembly along the direction X, Y, and the degree of freedom of the guide rail 40 in the direction Z overcomes the linearity errors of the guide rail 40 and the cylinder sliding table 30, so that the sliding of the sealing door 20 in the stroke range is ensured to be smooth, and the sealing door 20 cannot be jammed due to the linearity errors of the cylinder sliding table 30 and the guide rail 40.
In another aspect, the invention also provides a lithographic apparatus comprising a sealing gate arrangement according to any of the embodiments described above. According to the photoetching equipment, by applying the sealing door device, the laser annealing efficiency can be improved, and the equipment yield can be improved.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. The utility model provides a sealing door device, includes sealing plate (10) and sealing door (20), material transmission mouth (11) have been seted up on sealing plate (10), sealing door (20) have shelter from the closed condition of material transmission mouth (11) and leave the open condition of material transmission mouth (11), its characterized in that still includes: cylinder slip table (30), guide rail (40) and parallelism error elimination subassembly (50), cylinder slip table (30) with guide rail (40) set up material transmission mouth (11) both sides, sealing door (20) one end with cylinder slip table (30) are connected, the other end with slider (41) of guide rail (40) are connected, parallelism error elimination subassembly (50) set up sealing door (20) with cylinder slip table (30) and/or sealing door (20) with between slider (41).
2. The sealing door apparatus according to claim 1, wherein the parallelism error-elimination assembly (50) comprises: sealing door connecting piece (51), slider connecting piece (52), first gyro wheel (53) and second gyro wheel (54), sealing door connecting piece (51) with sealing door (20) are connected, slider connecting piece (52) with slider (41) are connected, first gyro wheel (53) with second gyro wheel (54) are followed the direction of motion setting of sealing door (20) is in the both sides of slider connecting piece (52), first gyro wheel (53) with equal one end of second gyro wheel (54) is connected with sealing door connecting piece (51), and the other end and slider connecting piece (52) butt.
3. Sealing door arrangement according to claim 2, characterized in that the first roller (53) and the second roller (54) are connected with the sealing door connection (51) by means of fasteners.
4. The sealing door apparatus according to claim 2, wherein the slider link (52) comprises a moving plate (521) and a stopper (522), the moving plate (521) is disposed between the first roller (53) and the second roller (54), and the moving plate (521) is connected to the slider (41), the stopper (522) is disposed on the moving plate (521), and the stopper (522) is located outside the first roller (53) and the second roller (54).
5. The sealing door apparatus as claimed in claim 2, wherein the parallelism error-elimination assembly (50) further comprises a floating joint (55), a joint body (551) of the floating joint (55) being connected with the sealing door (20), and a floating head (552) of the floating joint (55) being connected with the sealing door connector (51).
6. The sealing door apparatus according to any one of claims 1 to 5, further comprising a stop cylinder (70), wherein the stop cylinder (70) is configured to limit the movement of the cylinder ramp (30) when the sealing door (20) is in an open state.
7. The sealing door apparatus according to any one of claims 1 to 5, wherein both ends of the cylinder slide table (30) and both ends of the guide rail (40) are provided with dampers.
8. The sealing door apparatus according to any one of claims 1 to 5, further comprising a closing in-place sensor (80) and an opening in-place sensor (90), the closing in-place sensor (80) being provided on the cylinder slide (30) or on the guide rail (40), the closing in-place sensor (80) being configured to detect whether the sealing door (20) is in the closed state; the opening in-place sensor (90) is arranged on the cylinder sliding table (30) or the guide rail (40), and the opening in-place sensor (90) is used for detecting whether the sealing door (20) is in the opening state or not.
9. The sealing door apparatus as claimed in any one of claims 1 to 5, further comprising a robot blade fork safety sensor (100), wherein the robot blade fork safety sensor (100) is disposed on the sealing plate (10), and wherein the robot blade fork safety sensor (100) is disposed adjacent to the material transfer port (11).
10. A lithographic apparatus comprising a sealing gate arrangement as claimed in any one of claims 1 to 9.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911063171.8A CN112750694B (en) | 2019-10-31 | 2019-10-31 | Sealing door device and lithographic apparatus |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911063171.8A CN112750694B (en) | 2019-10-31 | 2019-10-31 | Sealing door device and lithographic apparatus |
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| CN112750694B CN112750694B (en) | 2024-05-17 |
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| TW201034028A (en) * | 2009-03-06 | 2010-09-16 | Hon Hai Prec Ind Co Ltd | Length measuring device |
| CN202639976U (en) * | 2012-05-21 | 2013-01-02 | 典发食品（苏州）有限公司 | Double-cylinder movement socket buffering device |
| CN205843591U (en) * | 2016-07-18 | 2016-12-28 | 湖南科技大学 | A kind of Three Degree Of Freedom displacement tracking measurement platform |
| CN209465838U (en) * | 2018-11-28 | 2019-10-08 | 大族激光科技产业集团股份有限公司 | A kind of loading and unloading transfer sealing structure and laser cutting device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201034028A (en) * | 2009-03-06 | 2010-09-16 | Hon Hai Prec Ind Co Ltd | Length measuring device |
| CN202639976U (en) * | 2012-05-21 | 2013-01-02 | 典发食品（苏州）有限公司 | Double-cylinder movement socket buffering device |
| CN205843591U (en) * | 2016-07-18 | 2016-12-28 | 湖南科技大学 | A kind of Three Degree Of Freedom displacement tracking measurement platform |
| CN209465838U (en) * | 2018-11-28 | 2019-10-08 | 大族激光科技产业集团股份有限公司 | A kind of loading and unloading transfer sealing structure and laser cutting device |
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| CN112750694B (en) | 2024-05-17 |
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