CN112662487A - Cleaning agent for thinned and polished TFT substrate - Google Patents
Cleaning agent for thinned and polished TFT substrate Download PDFInfo
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Abstract
The invention belongs to the technical field of flat panel display manufacturing, and particularly relates to a thinning and polishing cleaning agent used in a TFT (thin film transistor) manufacturing process. The thinned and polished cleaning agent comprises the following components in percentage by weight: 5-10% of inorganic base, 5-10% of organic auxiliary agent, 3-15% of alkyl diglycoside nonionic surfactant, 1-5% of alkyl diglycoside succinic ester salt and the balance of deionized water. The thinned and polished cleaning agent is compounded by nonionic and anionic alkyl disaccharide glycoside surfactants, and has a good and efficient cleaning effect on the surface of the thinned and polished glass substrate. The cleaning agent has safe and stable components, is environment-friendly, and has biodegradability and biocompatibility.
Description
Technical Field
The invention belongs to the technical field of flat panel display manufacturing, and particularly relates to a thinning and polishing cleaning agent used in a TFT (thin film transistor) manufacturing process.
Background
In the current flat panel display industry, products such as mobile phones, notebooks, flat panels, portable displays and the like have lighter and thinner portability requirements, and taking a mobile phone as an example, the thickness of the substrate glass of the current display screen is about 0.12-0.3 mm. The thickness of the glass substrate produced by the float process represented by Asahi glass is about 0.1-2.5 mm in the glass substrate production line, and the thickness of the glass produced by the flow hole down-draw method represented by electric glass is about 0.3-2.5 mm in the glass substrate production line. Most of the substrate glass produced by the two processes needs to be chemically thinned by Hydrogen Fluoride (HF) in the manufacturing process, and then the glass substrate which is smooth and flat and meets the requirement of thickness is obtained by the polishing process. In the polishing process, the back surface of the glass substrate is adsorbed by a sucker of a polishing machine, and the front surface of the glass substrate is rubbed with a polishing pad and polishing liquid under high-speed rotation. Polishing liquid can adhere to the back of the glass substrate, the glass substrate is dried and adhered to the surface of the glass along with friction heating in the polishing process, meanwhile, the sucker is aged when being in contact with the polishing liquid for a long time in use, and aged rubber particles can adhere to the back of the glass substrate under huge suction; simultaneously because the centrifugal force that produces during rotatory polishing, the positive pollutant that produces in the polishing process is piled up more easily at the edge to the glass substrate, and the glass after the polishing is at the in-process of placing along with the volatilizing glass bits formation pollutant of polishing solution moisture, and the caking is stubborn attached to on the glass substrate. If the contaminants are not removed effectively, the yield of the subsequent process is greatly affected. At present, the method of sequentially cleaning with acetone and ethanol and then washing with deionized water, which is commonly used in the industry, has limited effect on removing the pollution of the above types and also pollutes the environment.
Disclosure of Invention
The invention aims to overcome the problems in the prior art and provide the thinning and polishing cleaning agent used in the TFT manufacturing process, the cleaning agent has good removal capability on pollutants such as polishing powder, glass chips, small rubber particles and the like on a thinned and polished glass substrate, and the cleaning efficiency after thinning and polishing is greatly improved. In addition, the cleaning agent is compounded by adopting green and safe alkyl disaccharide glycoside nonionic and anionic surfactant, has excellent stability and biodegradability, and is environment-friendly. In order to achieve the purpose, the invention adopts the following technical scheme:
the utility model provides a panel display is with attenuate back cleaner of polishing which characterized in that: the cleaning agent after thinning and polishing comprises the following components in percentage by mass, wherein the sum of the mass percentages is 100 percent:
5% -10% of inorganic base;
5% -10% of an organic auxiliary agent;
3% -15% of alkyl diglycoside nonionic;
1% -5% of alkyl diglycoside succinate;
the balance being deionized water.
The inorganic alkali is one of potassium hydroxide or sodium hydroxide. The inorganic base has a very good cleaning effect on inorganic salts and metal oxides, and the potassium hydroxide or sodium hydroxide has a higher cost advantage.
The organic auxiliary agent is one of sodium gluconate, potassium gluconate, sodium citrate and potassium citrate. The organic auxiliary agent can form a buffer system with inorganic base, has stable and lasting pH, has the function of a chelating agent, and has a strong cleaning effect on stubborn polishing powder pollutants.
The structural formula of the alkyl disaccharide glycoside (AGP) nonionic surfactant is shown as follows:
(ii) a R is an alkyl chain of C12-14.
The alkyl diglycoside is synthesized from renewable resources, namely natural fatty alcohol and glucose, is a surfactant with comprehensive performance, and has the advantages of high surface activity, good compatibility and ecological safety, alkali resistance, salt resistance and strong detergency.
The structural formula of the alkyl diglycoside succinate (AGP-SS) is as follows:
(ii) a R is an alkyl chain of C12-14, and AGP-SS is an anionic surfactant.
The deionized water has a resistivity of not less than 18M omega at 25 ℃.
Compared with the prior art, the invention has the following progressive effects: the environment-friendly nonionic surfactant alkyl diglycoside and the anionic surfactant alkyl diglycoside sulfosuccinate (APG-SS) form an anionic-nonionic compound effect, and the thinning and polishing cleaning agent obtained by adding the organic auxiliary agent with the buffering effect and the chelating effect can effectively remove pollutants such as polishing powder, glass chips, rubber micromolecules and the like attached to a thinned and polished glass substrate, and meanwhile, the surfactant has excellent stability and biodegradability and is environment-friendly.
Drawings
FIG. 1 is a surface tension curve of a compounded system of APG and APG-SS with different molar ratios.
Detailed Description
The chemical raw materials used in the invention can be purchased from the following companies:
potassium hydroxide, from Shenzhen Jipinghua chemical Co., Ltd
Sodium hydroxide from Shenzhen Jipinghua chemical Co., Ltd
Sodium carbonate purchased from Shenzhen Jipinghua chemical Co., Ltd
Sodium gluconate purchased from Jipinghua chemical Co., Ltd, Shenzhen City
Potassium gluconate purchased from Jipinghua chemical Co., Ltd, Shenzhen City
Sodium citrate purchased from Shenzhen Jipinghua chemical Co., Ltd
Potassium citrate purchased from Shenzhen Jipinghua chemical Co., Ltd
Alkyl diglycoside nonionic surfactant, available from Quanzhou City, Bituo Fine chemical Limited
Alkyl diglycoside succinate-from Quanzhou City, Bituo Fine chemical Limited
Fatty alcohol polyoxyethylene (4) ether (MOA-4) purchased from Haian petrochemical plant of Jiangsu province
Fatty alcohol polyoxyethylene ether (penetrant JFC) — purchased from Haian petrochemical plant of Jiangsu province
Deionized water-self-made
The thinned and polished cleaning agent is prepared by uniformly mixing the components and then filtering the mixture by a filter element of 5 mu.
The invention is further illustrated by the following examples, which are not intended to limit the scope of the invention.
In the following is an implementation, the percentages or mixing ratios are on a weight basis unless otherwise noted.
Examples
The cleaning agent after thinning and polishing is prepared according to the formula shown in the table 1, and the specific preparation method comprises the steps of adding deionized water into a stirring kettle at normal temperature, sequentially adding inorganic base, organic auxiliary agent, alkyl diglycoside nonionic surfactant and alkyl diglycoside succinate at the rotating speed of 120r/m, stirring until a system is clarified, and adding the next material. Stirring for 30 minutes after all the components are added, and filtering by a filter element with the aperture of 5 mu m.
TABLE 1 dosage table of each component of cleaning agent after thinning and polishing
The designation C12-AGP in Table 1 refers to AGP with R being a C12 alkyl chain, and so forth.
Firstly, compounding of surface active agent
Due to the combination of two or more surfactants, the physical and chemical properties of the solution are obviously changed, and the properties are not possessed by a single surfactant. The compound surfactant has better application effect than a single surfactant. The anionic-nonionic surfactant is compounded to form mixed micelle in water solution, and the nonionic surfactant molecules are inserted between the surfactant ions of the ionic surfactant to change the physical and chemical properties. The alkyl diglycoside sulfosuccinate ester salt (APG-SS) is prepared by introducing two hydrophilic groups of carboxyl and sulfonic acid group into the molecule of alkyl diglycoside, so that the advantages of mild and safe alkyl diglycoside are maintained, the defects of poor water solubility and hard water intolerance are improved, and the application advantages and the application field of the alkyl diglycoside are greatly expanded. However, the introduction of hydrophilic groups leads to a slight decrease in physicochemical properties such as surface tension. APG-SS and APG can form anion-nonionic compound effect. The surface tension (gamma) of the mixed solution with different molar ratios is continuously measured by a surface tension meter by using a hanging piece, and the surface tension curve of a compound system with different molar ratios of APG-SS and APG is shown in figure 1. With the increase of the surfactant concentration, the surface tension decreases rapidly, and when a certain concentration is reached, the surface tension tends to be flat, and finally reaches a plateau. The surface tension of the mixed system is lower than that of the APG-SS single surfactant, which shows that the surface tension of the APG-SS can be reduced by mixing the two surfactants in any proportion, the surface performance of the APG-SS is improved, and the synergistic effect is better.
Second, determination of performance of thinner polished cleaning agent
1. Cleaning effect test 1:
diluting the thinning and polishing cleaning solution prepared according to the proportion to 5% of aqueous solution by using deionized water. Respectively adding the mixture into an ultrasonic cleaning tank, heating to 40 ℃, and setting the ultrasonic frequency to be 25 kHz. Immersing the thinned and polished substrate into an ultrasonic cleaning tank, soaking for 5 minutes, cleaning with deionized water, putting the substrate into a 105 ℃ dust-free oven for drying moisture for 30 minutes, and observing the cleaning effect by an electron microscope (OM). The criteria are as follows:
it: the glass surface is smooth and clean and has no pollutants;
o: the surface of the glass has individual points with pollutants
X: the glass surface has obvious pollutant adhesion
2. Cleaning effect test 2:
performing water drop angle test on the dried glass by using a water drop angle tester (Sandingding precision SDC-200S water drop angle dynamometer)
The criteria are as follows:
it: the water drop angle is less than 7 degrees;
x: the water drop angle is more than 7 degrees.
3. And (3) testing the removal effect of the polishing powder:
1mL of the polishing solution was dropped on the surface of the glass substrate, and the glass substrate was placed in an oven at 80 ℃ for 15 minutes. After being taken out, the cleaning is carried out according to a normal flow (a flow of a cleaning effect test 1), an electron microscope is used for observing the cleaning effect, and the evaluation standards are respectively as follows:
it: the glass surface is smooth and clean and has no pollutants;
o: the surface of the glass has individual points with pollutants
X: the glass surface has obvious pollutant adhesion
4. The process temperature range is as follows:
taking 40mL of the cleaning agent after thinning and polishing into a 100mL beaker, putting the beaker into a magnetic stirring water bath kettle, slowly heating the beaker under the stirring condition, measuring the temperature of a developing solution in the beaker by using an electronic thermometer, observing the change of the heating condition of the cleaning agent, and taking the following evaluation criteria according to the following temperatures:
it: clarifying at 60 deg.C or above, and wide temperature range
O: clarifying at 40-60 ℃ and moderate temperature range
X: clarifying below 40 deg.C, and having narrow temperature range
The test results are shown in table 2.
TABLE 2 cleaning agent Performance test results after thinning and polishing
From the examples 1 to 5, it can be seen that in a proper proportion range, the alkyl glycoside anion-nonionic compound system has a good cleaning effect on pollutants on the surface of glass, and the synergistic effect generated by compounding is proved to reduce the surface tension and improve the cleaning capability. The chelating effect of the added organic auxiliary agent can effectively remove the pollution caused by the residual polishing powder. Meanwhile, the process temperature adjustment range of the cleaning agent after thinning and polishing is wide. Each property is superior to the corresponding property in the comparative example.
From comparative examples 1 to 6, it can be further seen that the cleaning effect is directly influenced by the disappearance of the synergistic effect of the surfactant due to the absence of an anion-nonionic compound system. The chelating effect of the organic auxiliary agent on the polishing powder has a remarkable effect on cleaning pollutants. If other nonionic surfactants are used, the synergistic effect of alkyl glycoside anion-nonionic combination cannot be achieved, and the process temperature stability of the product system is also reduced.
The above description is only for the preferred embodiment of the present invention, and it should be understood by those skilled in the art that the present invention is not limited by the claims, and all equivalent changes and modifications made by the present invention in the specification and other related fields can be directly or indirectly applied to the present invention, and the same shall be included in the scope of the present invention.
Claims (6)
1. The utility model provides a TFT base plate attenuate polishing back cleaner which characterized in that: the cleaning agent after thinning and polishing comprises the following components in percentage by mass, wherein the sum of the mass percentages is 100 percent:
5% -10% of inorganic base;
5% -10% of an organic auxiliary agent;
3% -15% of alkyl diglycoside nonionic surfactant;
1% -5% of alkyl diglycoside succinate;
the balance being deionized water.
2. The cleaning agent for the TFT substrate after thinning and polishing as claimed in claim 1, wherein: the inorganic alkali is one of potassium hydroxide or sodium hydroxide.
3. The cleaning agent for the TFT substrate after thinning and polishing as claimed in claim 1, wherein: the organic auxiliary agent is one of sodium gluconate, potassium gluconate, sodium citrate and potassium citrate.
4. The cleaning agent for the TFT substrate after thinning and polishing as claimed in claim 1, wherein: the structural formula of the alkyl disaccharide glycoside nonionic surfactant AGP is as follows:
；
r is an alkyl chain of C12-14.
5. The cleaning agent for the TFT substrate after thinning and polishing as claimed in claim 1, wherein: the structural formula of the alkyl diglycoside succinate AGP-SS is as follows:
；
r is an alkyl chain of C12-14.
6. The cleaning agent for the TFT substrate after thinning and polishing as claimed in claim 1, wherein: the deionized water has a resistivity of not less than 18M omega at 25 ℃.
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| CN114806726A (en) * | 2022-05-31 | 2022-07-29 | 福建省佑达环保材料有限公司 | Dewaxing liquid for LED (light-emitting diode) manufacturing process |
| WO2024073209A1 (en) * | 2022-09-30 | 2024-04-04 | Versum Materials Us, Llc | Modified water-soluble polysaccharides having different cation types for slurries in chemical mechanical planarization |
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