CN112636140B - 一种功率、脉宽同时锁定飞秒激光器 - Google Patents
一种功率、脉宽同时锁定飞秒激光器 Download PDFInfo
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- CN112636140B CN112636140B CN202011502528.0A CN202011502528A CN112636140B CN 112636140 B CN112636140 B CN 112636140B CN 202011502528 A CN202011502528 A CN 202011502528A CN 112636140 B CN112636140 B CN 112636140B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
- H01S3/06716—Fibre compositions or doping with active elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
- H01S3/06712—Polarising fibre; Polariser
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/0675—Resonators including a grating structure, e.g. distributed Bragg reflectors [DBR] or distributed feedback [DFB] fibre lasers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/1022—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
- H01S3/1024—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping for pulse generation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1106—Mode locking
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- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202011502528.0A CN112636140B (zh) | 2020-12-17 | 2020-12-17 | 一种功率、脉宽同时锁定飞秒激光器 |
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CN202011502528.0A CN112636140B (zh) | 2020-12-17 | 2020-12-17 | 一种功率、脉宽同时锁定飞秒激光器 |
Publications (2)
Publication Number | Publication Date |
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CN112636140A CN112636140A (zh) | 2021-04-09 |
CN112636140B true CN112636140B (zh) | 2021-11-05 |
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CN202011502528.0A Active CN112636140B (zh) | 2020-12-17 | 2020-12-17 | 一种功率、脉宽同时锁定飞秒激光器 |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5144630A (en) * | 1991-07-29 | 1992-09-01 | Jtt International, Inc. | Multiwavelength solid state laser using frequency conversion techniques |
DE4446970A1 (de) * | 1993-12-28 | 1995-06-29 | Ando Electric | Lichtfrequenzsteuergerät |
WO1998022997A2 (en) * | 1996-11-22 | 1998-05-28 | Jmar Technology Co. | Solid state laser system for ultra-violet micro-lithography |
CN101840125A (zh) * | 2010-04-21 | 2010-09-22 | 北京大学 | 一种负色散脉冲展宽光纤放大装置 |
CN204088868U (zh) * | 2014-10-30 | 2015-01-07 | 上海朗研光电科技有限公司 | 一种780nm的高功率光纤飞秒激光器 |
CN209766848U (zh) * | 2019-03-14 | 2019-12-10 | 苏州龙格库塔光电科技有限公司 | 基于全保偏光纤系统的780nm飞秒激光器 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7505196B2 (en) * | 2004-03-31 | 2009-03-17 | Imra America, Inc. | Method and apparatus for controlling and protecting pulsed high power fiber amplifier systems |
US7486705B2 (en) * | 2004-03-31 | 2009-02-03 | Imra America, Inc. | Femtosecond laser processing system with process parameters, controls and feedback |
US7667889B2 (en) * | 2007-02-21 | 2010-02-23 | Pyrophotonics Lasers Inc. | Methods and systems for gain control in pulsed optical amplifiers |
EP2019461A1 (de) * | 2007-07-24 | 2009-01-28 | High Q Laser Production GmbH | Detektion von Mehrfachpulsen in einem LD-gepumpten Solitonlaser |
-
2020
- 2020-12-17 CN CN202011502528.0A patent/CN112636140B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5144630A (en) * | 1991-07-29 | 1992-09-01 | Jtt International, Inc. | Multiwavelength solid state laser using frequency conversion techniques |
DE4446970A1 (de) * | 1993-12-28 | 1995-06-29 | Ando Electric | Lichtfrequenzsteuergerät |
WO1998022997A2 (en) * | 1996-11-22 | 1998-05-28 | Jmar Technology Co. | Solid state laser system for ultra-violet micro-lithography |
CN101840125A (zh) * | 2010-04-21 | 2010-09-22 | 北京大学 | 一种负色散脉冲展宽光纤放大装置 |
CN204088868U (zh) * | 2014-10-30 | 2015-01-07 | 上海朗研光电科技有限公司 | 一种780nm的高功率光纤飞秒激光器 |
CN209766848U (zh) * | 2019-03-14 | 2019-12-10 | 苏州龙格库塔光电科技有限公司 | 基于全保偏光纤系统的780nm飞秒激光器 |
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Address after: 430000 Anyang laser high power ultrafast fiber laser production base project (all for self use), No. 101 fiber building / unit, No. 1-3 floor workshop, No. 6, photoelectric Park Second Road, zuoling street, Donghu New Technology Development Zone, Wuhan, Hubei Province Applicant after: Wuhan Anyang Laser Technology Co.,Ltd. Address before: Room 253, 2nd floor, building 1, phase I optoelectronic supporting industrial park, 117 zuoling Road, zuoling Town, China (Hubei) free trade zone, Donghu New Technology Development Zone, Wuhan, Hubei 430000 Applicant before: WUHAN YANGTZE SOTON LASER Co.,Ltd. |
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