CN112596346B - Control method of exposure system and exposure system - Google Patents
Control method of exposure system and exposure system Download PDFInfo
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- CN112596346B CN112596346B CN202011428844.8A CN202011428844A CN112596346B CN 112596346 B CN112596346 B CN 112596346B CN 202011428844 A CN202011428844 A CN 202011428844A CN 112596346 B CN112596346 B CN 112596346B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
Abstract
The invention provides a control method of an exposure system and the exposure system, the method comprises the following steps: acquiring an exposure dose input value of a photosensitive material of an exposure system, wherein the exposure dose input value is smaller than an exposure dose threshold value; controlling the output power of the laser according to the exposure dose input value; determining the scanning step length of the moving platform according to the input value of the exposure dose; controlling the spatial light modulator or the laser according to the scanning step length, and obtaining the display duration of the spatial light modulator or the laser opening duration according to the scanning step length; and in each scanning step, detecting that the exposure time reaches the display time or the opening time, and controlling the spatial light modulator or the laser to be closed. The control method of the exposure system of the embodiment of the invention can maximally utilize the power of the laser, improve the productivity of the exposure system, solve the problem of exposure smear caused by the increase of the scanning step length and improve the exposure quality.
Description
Technical Field
The invention relates to the field of maskless lithography, in particular to a control method of an exposure system and the exposure system.
Background
Maskless lithography, also known as Laser Direct Imaging (LDI), is a technique that uses a Spatial Light Modulator (SLM) to transfer an exposure pattern onto a photosensitive material for Imaging.
The scanning exposure system adopts the uniform motion of a motion platform and refreshes the spatial light modulator with a certain scanning step length to realize the exposure. The throughput of the scanning exposure system is determined by the scanning speed of the motion stage, which is determined by the product of the refresh frequency of the spatial light modulator and the scanning step size of the motion stage. The refreshing frequency of the spatial light modulator is limited by the performance of the device, and the feasibility of improving the refreshing frequency of the spatial light modulator and the scanning speed of the motion platform is low. Therefore, the scanning speed can be increased by increasing the scanning step length of the moving platform, but because the spatial light modulation in one scanning step length is not refreshed, the uniform motion of the moving platform causes smear, and the image exposure quality is influenced.
When the scanning system is exposed, the laser with small dose of photosensitive material adopts smaller output power, the laser with large dose of photosensitive material adopts larger output power, and the output power of the lasers with different photosensitive materials is different. For small doses of photosensitive material, there may be a margin in laser power, resulting in wasted laser power. And in the exposure process, the pattern of the spatial light modulator is not refreshed, the laser is always in an open state, and the problem of smear occurs, so that the exposure quality is influenced.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art. Therefore, an object of the present invention is to provide a method for controlling an exposure system, which can maximize the utilization of laser power, avoid the smear problem caused by increasing the scanning step length, and improve the quality of the exposed pattern.
A second object of the present invention is to provide an exposure system.
In order to achieve the above object, a first embodiment of the present invention provides a control method for an exposure system, the exposure system including a controller, a laser, a spatial light modulator, an objective lens, a moving platform and a substrate coated with a photosensitive material, the method including obtaining an exposure dose input value of the photosensitive material of the exposure system, wherein the exposure dose input value is smaller than an exposure dose threshold; controlling the output power of the laser according to the exposure dose input value; determining the scanning step length of the motion platform according to the exposure dose input value; controlling the spatial light modulator or the laser according to the scanning step length, and obtaining the display duration of the spatial light modulator or the opening duration of the laser according to the scanning step length; and in each scanning step, detecting that the exposure time reaches the display time or the opening time, and controlling the spatial light modulator or the laser to be closed.
According to the control method of the exposure system, on the premise that the exposure dose input value is smaller than the exposure dose threshold value, the laser is controlled to output the maximum allowable output power or the normal working power, namely, the scanning step length and the scanning speed are determined according to the relation between the exposure dose input value and the exposure dose threshold value, when the exposure dose input value is smaller, the exposure dose threshold value is unchanged, and the scanning step length is related to the exposure dose input value, so that when the exposure dose input value is smaller, the scanning step length can be determined to be increased, the scanning speed is also increased, the over-frequency effect is achieved, and the productivity of the exposure system is improved. And determining the display duration of the spatial light modulator according to the scanning step length, controlling the spatial light modulator or the laser to be closed when the exposure duration reaches the display duration, namely controlling the light modulator or the laser to be closed in the latter half of the scanning step length, so that the light in the latter half is reflected out of the imaging light path, thereby avoiding the spatial light modulator or the laser from being in an open state for a long time, reducing the problem of smear and improving the exposure quality of an exposure figure.
In some embodiments, determining a scan step size of the motion stage from the exposure dose input value comprises: obtaining a dose ratio value according to the exposure dose input value and the exposure dose threshold value; and obtaining the scanning step length according to the dose ratio and the display distance of the spatial light modulator or the opening distance of the laser.
In some embodiments, obtaining the display duration of the spatial light modulator according to the scanning step comprises: obtaining the scanning speed of the moving platform according to the scanning step length and the refreshing frequency of the spatial light modulator; and obtaining the display duration according to the display distance and the scanning speed.
In some embodiments, controlling the spatial light modulator to turn off comprises: sending a leveling signal to the spatial light modulator; or sending a data zero value to the spatial light modulator, or sending a zero clearing instruction to the spatial light modulator. Therefore, the spatial light modulator is prevented from being in an open state for a long time, and the smear is reduced.
In some embodiments, sending data zeros to the spatial light modulator comprises: and determining that the scanning step size is less than or equal to five times of the display distance, and loading data zero values to the spatial light modulator by means of load 4. Thereby reducing the spatial light modulator turn-off time.
In some embodiments, the spatial light modulator comprises a digital micromirror array, controlling the spatial light modulator to turn off, comprising: sending a clear command to each digital micromirror in the digital micromirror array. Thereby, a fast switching off of the spatial light modulator is achieved.
In some embodiments, the exposure system further comprises a shutter or an attenuator disposed in an optical path from the laser to the spatial light modulator, controlling the laser to turn off, comprising: and controlling the shutter to be closed, or controlling the attenuator to be started to reduce the laser energy irradiated to the spatial light modulator by the laser, or controlling the power supply of the laser to perform pulse switch modulation. In order to achieve the above object, a second aspect of the present invention provides an exposure system, including: the device comprises a controller, a laser, a spatial light modulator, an objective lens, a moving platform, a substrate coated with photosensitive materials, and the controller, wherein the controller is connected with the laser, the spatial light modulator and the moving platform and is used for carrying out exposure control according to the control method in the embodiment.
According to the exposure system disclosed by the embodiment of the invention, the controller is used for controlling the laser, the spatial light modulator and the motion platform to realize the control method of the exposure system disclosed by the embodiment, when the input value of the exposure dose is smaller, the threshold value of the exposure dose is unchanged, the input value of the exposure dose is smaller, the scanning step length can be determined to be increased, the scanning speed is also increased, the over-frequency effect is achieved, and the productivity of the exposure system is improved. And determining the display duration of the spatial light modulator according to the scanning step length, controlling the spatial light modulator or the laser to be closed when the exposure duration reaches the display duration, namely controlling the light modulator or the laser to be closed in the latter half of the scanning step length, so that the light in the latter half is reflected out of the imaging light path, thereby avoiding the spatial light modulator or the laser from being in an open state for a long time, reducing the problem of smear and improving the exposure quality of an exposure figure.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 is a schematic diagram of the structure of an exposure system according to an embodiment of the present invention;
fig. 2 is a flowchart of a control method of an exposure system according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a non-overdrive spatial light modulator modulation in accordance with one embodiment of the present invention;
FIG. 4 is a schematic diagram of the modulation of an over-frequency temporal spatial light modulator according to one embodiment of the present invention;
FIG. 5 is a schematic illustration of the modulation of a data-loaded null spatial light modulator according to one embodiment of the present invention;
FIG. 6 is a schematic diagram of a modulator for spatial light modulation receiving clear commands, according to one embodiment of the present invention;
fig. 7 is a schematic diagram of a pulse modulation scheme according to an embodiment of the present invention.
Detailed Description
Embodiments of the present invention are described in detail below, and the embodiments described with reference to the drawings are exemplary.
In the embodiment, as shown in fig. 1, a schematic diagram of a structure of an exposure system according to an embodiment of the present invention is shown. In the working process of the exposure system 1, after the light beam is subjected to spatial light modulation by the light source energy and the platform control means, the pattern on the spatial light modulator is irradiated on a photosensitive material such as photoresist through an objective lens, so that the transfer of an exposure image to the photoresist is realized, namely, the controller 14 controls the laser power and the power switch, controls the motion platform 13 to move, and sends pattern frame data or a command to the spatial light modulator 11. The moving platform 13 generates a position synchronization signal according to a certain scanning step length, and the position synchronization signal is used for controlling the refreshing of the spatial light modulator 11 or controlling the power supply of the laser 10 to be switched on and off. The spatial light modulator 11 receives the pattern data generated by the controller 14 and refreshes the pattern in accordance with the synchronization signal generated by the stage 13, transferring the pattern to the photosensitive material on the photosensitive material coated substrate 15 on the moving stage 13 via the objective lens 12. Based on the operating principle of the exposure system, a control method of the exposure system according to an embodiment of the first aspect of the present invention is described below with reference to fig. 2 to 7. As shown in fig. 2, the control method of the exposure system of the embodiment of the invention at least includes steps S1 to S5.
Step S1, an exposure dose input value of the photosensitive material of the exposure system is acquired, wherein the exposure dose input value is smaller than the exposure dose threshold.
In an embodiment, the exposure dose threshold D0 is the maximum exposure dose achievable by the exposure system without over-clocking, which can be understood as the capability of the exposure system. Namely, the exposure dose threshold D0 is:
wherein, Pm can be the maximum power of the laser; fa is the laser power utilization ratio; pw is the spatial light modulator projection width, and V0 is the scan speed without over-clocking.
For different photosensitive materials such as photoresist or dry film, the input value of exposure dose is different for different materials, the exposure dose is that the photosensitive material receives light energy with specific wavelength in unit area during exposure, and the exposure dose of the scanning exposure system is the laser power in unit area. The photosensitive material is determined and its exposure dose input value is determined accordingly. The exposure dose input value of the photosensitive material with a small dose is small, the exposure dose input value of the photosensitive material with a large dose is large, the exposure dose input value of the photosensitive material is, for example, D1, and in the case of over-frequency, the exposure dose input value D1 is, in consideration of the influence of the spatial light modulator being turned off in the second half of the scanning step:
where V1 is the overdrive scanning speed, Dr is the duty cycle, which represents the ratio of the display distance to the scanning step, and Dr is:
in step S2, the output power of the laser is controlled according to the exposure dose input value.
In an embodiment, the output power of the laser may be a maximum allowed output power or an output power that satisfies normal operation of the laser. For the photosensitive material with larger exposure dose and the photosensitive material with smaller exposure dose, the laser is controlled to output the maximum allowable power or the power meeting the normal working, and the exposure system can reach an overclocking state on the premise that the exposure dose input value D1 is smaller than the exposure dose threshold value D0.
And step S3, determining the scanning step size of the moving platform according to the current exposure dose input value.
In an embodiment, when the exposure dose input value D1 is smaller than the exposure dose threshold value D0, that is, on the premise that the exposure dose input value D1 does not exceed the maximum exposure dose of the exposure system, the change of the scanning step Sw of the moving platform is determined based on the relationship between the exposure dose input value D1 and the exposure dose threshold value D0, that is, when the exposure dose input value D1 is smaller, the scanning step Sw of the moving platform is determined to be larger according to the exposure dose input value D1 and the exposure dose threshold value D0; when the exposure dose input value D1 is larger, the scanning step Sw of the moving platform is determined according to the exposure dose input value D1 and the exposure dose threshold value D0, the scanning speed is determined by determining the change condition of the scanning step Sw, and the productivity of the exposure system is improved when the over-frequency is achieved.
And step S4, controlling the spatial light modulator or the laser according to the scanning step length, and obtaining the display duration of the spatial light modulator or the laser opening duration according to the scanning step length.
In the embodiment, the motion platform moves at a constant speed, and the mode of synchronously refreshing the pattern of the spatial light modulator according to the determined scanning step length is realized. The scanning step length Sw of the moving platform is related to the input value D1 of the exposure dose and the exposure dose threshold value D0, the exposure dose threshold value D0 is unchanged, the smaller the input value D1 of the exposure dose is, the larger the scanning step length Sw is, the refresh frequency f of the spatial light modulator is limited by the device itself and does not change, so that the productivity of the exposure system is improved when the scanning speed increasing system achieves an over-frequency effect.
And the display duration of the spatial light modulator is noted as T1, for example, the size of the display duration T1 is related to the scanning step Sw, and the display duration T1 of the spatial light modulator is determined according to the scanning step Sw.
In step S5, in each scanning step, when the exposure time reaches the display time or the on time, the spatial light modulator or the laser is controlled to be turned off.
In an embodiment, as shown in fig. 3, a modulation diagram of a non-overdrive spatial light modulator according to an embodiment of the present invention is shown. If the display distance Dw is equal to the scanning step Sw without over-clocking, the scanning speed V0 is expressed as:
v0 ═ Dw f formula (4)
When the display distance Dw is not exceeded, the refresh frequency f of the spatial light modulator is not changed, and the scanning speed V0 is not changed, however, in each scanning step Sw, the spatial light modulator is turned on, and the problem of smear occurs.
Fig. 4 is a schematic diagram illustrating the modulation of the over-frequency spatial light modulator according to an embodiment of the present invention. By determining the display duration T1 of the spatial light modulator, when the exposure duration reaches the display duration T1, the spatial light modulator is closed, that is, the spatial light modulator is closed in the latter half of the scanning step Sw, so that the problem of smear caused by long-time opening of the spatial light modulator is avoided, and the analysis of an exposure graph is influenced. According to the control method of the exposure system of the embodiment of the invention, on the premise that the exposure dose input value D1 is smaller than the exposure dose threshold value D0, the laser is controlled to output the maximum allowable output power or the normal working power, namely, the scanning step Sw and the scanning speed V1 are determined according to the relation between the exposure dose input value D1 and the exposure dose threshold value D0, when the exposure dose input value D1 is smaller, the exposure dose threshold value D0 is not changed, and the scanning step Sw is related to the exposure dose input value D1, so that the scanning step Sw can be determined to be increased, the scanning speed V1 is also increased, the over-frequency effect is achieved, and the productivity of the exposure system is improved. And determining the display duration T1 of the spatial light modulator according to the scanning step Sw, and controlling the spatial light modulator or the laser to be closed when the exposure duration reaches the display duration T1, namely controlling the light modulation or the laser to be closed in the latter half of the scanning step Sw, so that the light in the latter half is reflected out of the imaging optical path, thereby avoiding the spatial light modulator or the laser from being in an open state for a long time, reducing the problem of smear and improving the exposure quality of an exposure figure.
In some embodiments, as shown in fig. 4, the scanning speed V1 at the over-clocking is related to the scanning step Sw, the larger the scanning step Sw is, the larger the scanning speed V1 is, the scanning speed V1 is obtained from the scanning step Sw and the spatial light modulator refresh frequency f, and the formula of the scanning speed V1 is:
v1 ═ Sw f formula (5)
In some embodiments, when the exposure dose input value D1 is different for different photosensitive materials, and the scanning step Sw of the moving platform is determined according to the exposure dose input value D1, the dose ratio obtained according to the exposure dose input value D1 and the exposure dose threshold value D0 is denoted as Ra, formula (4) is substituted into formula (1), and formula (3) and formula (5) are substituted into formula (2), and the dose ratio Ra is obtained as:
as shown in the formula (6), the exposure dose threshold D0 is a fixed value, and the dose ratio Ra is determined by the current exposure dose D1. In order to determine the relationship between the dose ratio Ra and the scanning step Sw, the relationship between the dose ratio Ra and the scanning step Sw needs to be obtained.
A scanning step Sw is obtained according to the dose ratio Ra and the display distance of the spatial light modulator, for example, denoted Dw, and is:
the distance Dw is shown to be constant, and the smaller the exposure dose input value D1, the smaller the dose ratio Ra, and the larger the scanning step Sw of the motion stage. Wherein the display distance Dw is a development distance of the pattern. Thus, on the premise that the exposure dose input value D1 is smaller than the exposure dose threshold value D0, the stage scanning step Sw is controlled by controlling the exposure dose input value D1 of the exposure system. The relationship between the dose ratio Ra, the display distance Dw and the scanning step Sw needs to be derived through a formula.
Further, substituting the formula (7) into the formula (5) results in the relationship between the scanning speed V1 of the moving platform at the over-frequency time and the display distance Dw and the dose ratio Ra, wherein the scanning speed V1 is:
and then further calculating the display time length of the spatial light modulator, wherein the display time length T1 is related to the display distance Dw and the scanning speed V1, the display time length T1 is obtained according to the display distance Dw and the scanning speed V1, and the display time length T1 is as follows:
as can be seen from the formulas (7), (8) and (9), when the refresh frequency f and the display distance Dw of the spatial light modulator are fixed, the scan step Sw, the scan speed V1 and the display duration T1 of the overdrive are determined by the ratio Ra of the input exposure doses D1 to D0.
The display time period T1 is determined from the scanning speed V1, and as can be seen from formula (9), the larger the scanning speed V1, the shorter the display time period T1. By determining the display duration T1, when the exposure duration reaches the display duration T1, the spatial light modulator is closed, so that when the exposure dose D1 is different, the display distances Dw of different scanning steps Sw are the same, and the problem of figure smear caused by the increase of the scanning steps Sw is avoided, thereby causing poor figure analysis and influencing the exposure quality.
In some embodiments, as shown in FIG. 5, a schematic diagram of the modulation of a data-loaded null spatial light modulator of one embodiment of the present invention. The calculation of the scanning step Sw, the scanning speed V1 and the display time T1 when the spatial light modulator is loaded with a data zero value over-clocking will be described with reference to fig. 3 and 5.
In a platform scanning step length, the spatial light modulator receives a position synchronization signal of a moving platform to start displaying a current frame, after a distance is displayed, the spatial light modulator is closed by loading a data zero value and displaying the data zero value, and then the next frame is loaded. The time during which the spatial light modulator in FIG. 5 is turned off to display a data null and load the next frame is consistent with the time during which the spatial light modulator in FIG. 3 displays the current frame and loads the next frame, i.e., the time during which the spatial light modulator is turned off to display the current frame and loads the next frame is consistent with the time during which the spatial light modulator in FIG. 3 is turned off to display the current frame and loads the next frame
When the over-frequency is obtained from the equation (10), the scanning speed of the stage V1 is V1:
the dose ratio Ra of the loading data zero value overdrive exposure dose input value D1 to the exposure dose threshold value D0 is:
then, as can be seen from equation (12), using the zero value of the loading data, the maximum scan step Sw obtained from the input exposure dose input value D1 is:
the maximum scanning speed V1 is:
the display duration T1 is:
to speed up the closing of loading data zeros, data zeros are loaded by load4, that is, loading one row of data zeros can actually load4 rows of data zeros, then the time for loading data zeros in the display stage of fig. 5 showing the current frame and the load4 mode is at least greater than or equal to one quarter of the time for displaying the current frame and loading the next frame in fig. 3, that is, the time for loading data zeros is at least equal to the time for loading data zeros in the next frame, that is, the time for loading data zeros is less than the time for loading data zeros in the display stage of fig. 5
Will be provided with
Substituting into the substitution equation (16) to obtain the relationship between the scanning step Sw and the display distance Dw, i.e.
Sw is less than or equal to 5X Dw formula (17)
And loading data zero value overclocking by a load4 mode, and determining that the scanning step size Sw does not exceed 5 times of the scanning step size without overclocking at maximum.
In some embodiments, as shown in fig. 6, a modulator diagram for receiving clear commands for spatial light modulation according to an embodiment of the present invention. The spatial light modulator comprises a digital micro-mirror array, and a clear command is sent to each digital micro-mirror in the digital micro-mirror array to control the spatial light modulator to be closed. The spatial light modulator receives a platform position synchronization signal to start displaying a current frame within a platform scanning step length by receiving a zero clearing instruction, and after a distance is displayed, the spatial light modulator is closed by clearing and displaying zero, and then a next frame is loaded. It can be known from fig. 5 and fig. 6 that the modulation timing of the spatial light modulator is the same when the data zero value is loaded and the zero clearing mode overclocking, but the zero clearing time is much shorter than the time when the data zero value is loaded in the load4 mode. Therefore, the zero-clearing mode overclocking scanning step size Sw, the scanning speed V1 and the display duration T1 have the same calculation mode as the zero-value overclocking calculation mode of the loaded data, but the zero-clearing mode overclocking scanning step size Sw is not limited by the formula (17).
In some embodiments, the exposure system further comprises a shutter or an attenuator disposed in the optical path of the laser to the spatial light modulator, and the smear is reduced by closing the shutter or by turning on the attenuator to turn off the laser during the exposure period to display period T1, i.e., during the second half of the scanning pulse period of the moving platform.
And, as shown in fig. 7, it is a schematic diagram of a pulse modulation method according to an embodiment of the present invention. Controlling the laser to be turned off performs pulse switch modulation by controlling the power supply of the laser, and the pulse modulation mode of the laser is shown in fig. 7 within one scanning step Sw. The laser starts to be turned on after receiving the platform synchronous signal, and the level is correspondingly high; the laser turn-on time reaches display time T1 and is off, corresponding to a low level.
In summary, according to the control method of the exposure system of the embodiment of the present invention, the scan speed V1 of the exposure system is increased by increasing the scan step Sw of the exposure system without increasing the refresh frequency f of the spatial light modulator, so as to achieve the effect of over-clocking. By increasing the scanning step Sw to increase the scanning speed V1, the limitation of the scanning speed V1 of the exposure system by the refresh frequency f of the spatial light modulator can be broken, and the second half of the scanning step Sw is free from smear by turning off the spatial light modulator or the laser. This approach decouples the smear from the scanning step Sw, only in relation to the display distance Dw, and can greatly increase the scanning step Sw and the scanning speed V1. And in order to obtain the maximum scanning step length Sw, the output power of the laser is maximized during overclocking, the surplus laser power is converted into the capacity of an exposure system, and the laser power is utilized to the maximum extent. And, according to the exposure system 1 of the embodiment of the present invention, the controller 14 controls the laser 10, the spatial light modulator 11 and the moving platform 13 to implement the control method of the exposure system mentioned in the above embodiment, when the exposure dose input value D1 is smaller, the exposure dose threshold value D0 is unchanged, and the scanning step Sw is related to the exposure dose input value D1, so that it can be determined that the scanning step Sw is increased, and the scanning speed V1 is also increased, thereby achieving the over-clocking effect and improving the productivity of the exposure system. And determining the display duration T1 of the spatial light modulator according to the scanning step Sw, and controlling the spatial light modulator or the laser to be closed when the exposure duration reaches the display duration T1, namely controlling the light modulation or the laser to be closed in the latter half of the scanning step Sw, so that the light in the latter half is reflected out of the imaging optical path, thereby avoiding the spatial light modulator or the laser from being in an open state for a long time, reducing the problem of smear and improving the exposure quality of an exposure figure.
In the description of the present specification, reference to the description of "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example.
While embodiments of the present invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.
Claims (7)
1. A control method of an exposure system including a controller, a laser, a spatial light modulator, an objective lens, a moving stage, and a substrate coated with a photosensitive material, the control method comprising:
acquiring an exposure dose input value of a photosensitive material of the exposure system, wherein the exposure dose input value is smaller than an exposure dose threshold value;
controlling the output power of the laser according to the exposure dose input value;
determining a scan step size of the motion stage from the exposure dose input value, comprising: obtaining a dose ratio value according to the exposure dose input value and the exposure dose threshold value; obtaining the scanning step length according to the dose ratio and the display distance of the spatial light modulator or the opening distance of a laser;
controlling the spatial light modulator or the laser according to the scanning step length, and obtaining the display duration of the spatial light modulator or the laser opening duration according to the scanning step length;
and in each scanning step, detecting that the exposure time reaches the display time or the opening time, and controlling the spatial light modulator or the laser to be closed.
2. The control method according to claim 1, wherein obtaining the display duration of the spatial light modulator according to the scanning step comprises:
obtaining the scanning speed of the moving platform according to the scanning step length and the refreshing frequency of the spatial light modulator;
and obtaining the display duration according to the display distance and the scanning speed.
3. The method of claim 1, wherein controlling the spatial light modulator to turn off comprises:
sending a leveling signal to the spatial light modulator;
or, sending data zeros to the spatial light modulator;
or sending a clear instruction to the spatial light modulator.
4. The method of claim 3, wherein sending data zeros to the spatial light modulator comprises:
and determining that the scanning step size is less than or equal to five times of the display distance, and loading data zero values to the spatial light modulator by a load4 mode, wherein the load4 mode is that 1 row of data zero values can be loaded, and 4 rows of data zero values can be loaded actually.
5. The method of claim 3, wherein the spatial light modulator comprises a digital micromirror array, and controlling the spatial light modulator to turn off comprises:
sending a clear command to each digital micromirror in the digital micromirror array.
6. The control method according to claim 1, wherein the exposure system further comprises: a shutter or an attenuator disposed on an optical path from the laser to the spatial light modulator to control the laser to be off, comprising:
and controlling the shutter to be closed, or controlling the attenuator to be started to reduce the laser energy irradiated to the spatial light modulator by the laser, or controlling the power supply of the laser to perform pulse switch modulation.
7. An exposure system, comprising:
the device comprises a controller, a laser, a spatial light modulator, an objective lens, a motion platform and a substrate coated with photosensitive materials;
the controller is connected with the laser, the spatial light modulator and the motion platform and is used for carrying out exposure control according to the control method of any one of claims 1 to 6.
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| US6753947B2 (en) * | 2001-05-10 | 2004-06-22 | Ultratech Stepper, Inc. | Lithography system and method for device manufacture |
| KR20030036254A (en) * | 2001-06-13 | 2003-05-09 | 가부시키가이샤 니콘 | Scanning exposure method and scanning exposure system, and device production method |
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