CN112582243A - Ion implanter, focusing apparatus, and graphite guard ring - Google Patents
Ion implanter, focusing apparatus, and graphite guard ring Download PDFInfo
- Publication number
- CN112582243A CN112582243A CN201910926007.9A CN201910926007A CN112582243A CN 112582243 A CN112582243 A CN 112582243A CN 201910926007 A CN201910926007 A CN 201910926007A CN 112582243 A CN112582243 A CN 112582243A
- Authority
- CN
- China
- Prior art keywords
- graphite
- guard ring
- graphite block
- hole
- block
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention provides an ion implanter, a focusing device and a graphite guard ring. This graphite guard ring includes: the graphite block comprises a plurality of graphite blocks, wherein the graphite blocks are spliced into a ring shape. The graphite guard ring is arranged in the focusing device and used for blocking partial ion beams, because the ion beams generally irradiate all places of the graphite guard ring unevenly, the position with the maximum accumulated irradiation amount of the graphite guard ring generally becomes the thinnest, when the thickness of the position is as thin as the position needing to be replaced, only the graphite block at the position needs to be replaced, and the whole graphite guard ring does not need to be replaced, so that a large amount of graphite materials can be saved, and the consumption of the graphite materials is reduced.
Description
Technical Field
The present invention relates generally to ion implantation protection technology, and more particularly, to ion implanters, focusing apparatus, and graphite guard rings.
Background
The ion implanter is a high-pressure compact accelerator. The ion source obtains the needed ions, and the ions are accelerated to obtain ion beam current which is used for ion implantation of semiconductor materials, large-scale integrated circuits and devices, and is also used for surface modification and film making of metal materials.
The ion implanter includes a focusing assembly. The focusing means may be electrostatic quadrupole lenses (electrostatic quadruple lenses). The focusing device is used for focusing the ion beam, so that the ion beam is constrained into a beam with a smaller diameter. A graphite plate is typically mounted on the focusing assembly and positioned adjacent to the path of the ion beam to block excess ions from impinging directly on the metal walls of the focusing assembly and causing metal contamination within the chamber.
When the redundant ions directly hit the graphite plate, the graphite plate is slowly thinned, and the graphite plate needs to be replaced when the thickness of the thinnest part of the graphite plate is smaller than the threshold value, so that metal pollution in the chamber caused by the fact that the thickness of the thinnest part of the graphite plate is smaller than the threshold value is avoided. The graphite plate is actually a consumable material of the ion implanter, and how to reduce the consumption of the graphite plate to save the cost is an urgent problem to be solved.
The above information disclosed in this background section is only for enhancement of understanding of the background of the invention and therefore it may contain information that does not constitute prior art that is already known to a person of ordinary skill in the art.
Disclosure of Invention
In this summary, concepts in a simplified form are introduced that are further described in the detailed description. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used as an aid in determining the scope of the claimed subject matter.
It is a primary object of the present invention to overcome at least one of the above-mentioned deficiencies of the prior art and to provide a graphite guard ring for an ion implanter, comprising: the graphite block comprises a plurality of graphite blocks, wherein the graphite blocks are spliced into a ring shape.
According to one embodiment of the invention, the plurality of graphite blocks has at least a first graphite block and a second graphite block;
the first graphite block comprises a first straight part and two first extending parts which respectively extend from two ends of the first straight part to the same direction;
the second graphite block comprises a second straight strip part and two second extending parts which respectively extend out from two ends of the second straight strip part to the same direction;
wherein, two first protruding portions can align each other and the tip of two first protruding portions can interconnect with the tip of two second protruding portions respectively with two second protruding portions respectively.
According to one embodiment of the present invention, the end of the first protruding portion is provided with a first connecting portion on which a first through hole is provided;
a second connecting part is arranged at the end part of the second extending part, and a second through hole is formed in the second connecting part;
when the first connection part overlaps the second connection part, the first through hole and the second through hole may be aligned with each other to facilitate connection by a screw or a bolt.
According to one embodiment of the present invention, the first protrusion includes a first side surface and a second side surface opposite to the first side surface;
the second extension includes a third side flush with the first side and a fourth side flush with the second side;
one side surface of the first connecting part is flush with the first side surface, and one side surface of the second connecting part is flush with the fourth side surface;
wherein a sum of thicknesses of the first connection portion and the second connection portion is equal to a thickness of the first protrusion portion.
According to an embodiment of the invention, the length of the first connection portion is equal to the length of the second connection portion.
According to one embodiment of the invention, the mass of the first graphite block is greater than the mass of the second graphite block;
the second graphite block is arranged in a region which receives more ion beam energy, and the first graphite block is arranged in a region which receives less ion beam energy.
According to one embodiment of the invention, the mass of the first graphite block is greater than or equal to twice the mass of the second graphite block.
According to one embodiment of the invention, a plurality of third through holes are further arranged on one side of the first straight strip part, which is far away from the first extending part;
one side of the second straight strip part departing from the second extending part is also provided with a plurality of fourth through holes.
The invention also provides a focusing device which comprises the graphite guard ring.
The invention also provides an ion implanter which comprises the focusing device.
According to the technical scheme, the graphite protective ring has the advantages and positive effects that:
the graphite guard ring is arranged in the focusing device and used for blocking partial ion beams, because the ion beams generally irradiate all places of the graphite guard ring unevenly, the position with the maximum accumulated irradiation amount of the graphite guard ring generally becomes the thinnest, when the thickness of the position is as thin as the position needing to be replaced, only the graphite block at the position needs to be replaced, and the whole graphite guard ring does not need to be replaced, so that a large amount of graphite materials can be saved, and the consumption of the graphite materials is reduced.
Drawings
Various objects, features and advantages of the present invention will become more apparent from the following detailed description of preferred embodiments of the invention, when considered in conjunction with the accompanying drawings. The drawings are merely exemplary of the invention and are not necessarily drawn to scale. In the drawings, like reference characters designate the same or similar parts throughout the different views. Wherein:
FIG. 1 is a disassembled schematic view of a graphite guard ring shown in accordance with an exemplary embodiment.
FIG. 2 is an assembly schematic diagram illustrating a graphite guard ring according to an exemplary embodiment.
Wherein the reference numerals are as follows:
1. a graphite guard ring; 11. a first graphite block; 111. a first straight portion; 112. a first extension portion; 113. a first connection portion; 114. a first through hole; 116. a third through hole; 117. a second side surface; 12. a second graphite block; 121. a second straight portion; 122. a second protruding portion; 123. a second connecting portion; 124. a second through hole; 125. a fourth via hole; 127. a fourth side surface.
Detailed Description
Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and thus their detailed description will be omitted.
The present embodiments disclose an ion implanter including a focusing apparatus. The focusing device is used for focusing the ion beam, so that the ion beam is constrained into a beam with a smaller diameter. The focusing assembly includes a graphite guard ring 1. The graphite guard ring 1 is configured in a ring shape. The graphite guard ring 1 is arranged in the path of an ion beam, and the ion beam can pass through a hole in the middle of the graphite guard ring 1. When the redundant ions at the edge of the ion beam irradiate the graphite protective ring 1, the redundant ions are blocked by the graphite protective ring 1, so that the ions are prevented from hitting the metal shell of the focusing device and causing metal pollution to a processing chamber of the ion implanter.
The graphite guard ring 1 is formed by splicing a plurality of graphite blocks. The number of the graphite blocks forming the graphite guard ring 1 is more than two, and can be two, three or four. The graphite blocks are preferably strip-shaped, and the graphite blocks are spliced end to form a ring. The annular graphite guard ring 1 may be a rectangular ring.
The graphite guard ring 1 is arranged in the focusing device and used for blocking partial ion beams, because the ion beams generally irradiate all places of the graphite guard ring 1 unevenly, the position with the maximum accumulated irradiation amount of the graphite guard ring 1 generally becomes thinnest, when the thickness of the position is as thin as the position needing to be replaced, only the graphite block at the position needs to be replaced, and the whole graphite guard ring 1 does not need to be replaced, so that a large amount of graphite materials can be saved, and the consumption of the graphite materials is reduced.
In the present embodiment, the plurality of graphite blocks includes at least a first graphite block 11 and a second graphite block 12. The first graphite block 11 and the second graphite block 12 can be enclosed into a ring shape.
The first graphite block 11 and the second graphite block 12 are each provided in a substantially U-shaped configuration. The first graphite block 11 includes a first straight portion 111 and two first projecting portions 112. The first straight portion 111 has a straight shape, and may have a straight structure having a rectangular cross section. The two first extending portions 112 extend in the same direction from both ends of the first straight portion 111. The first extension 112 has a straight bar shape, and the cross section of the first extension 112 may be rectangular. The extending directions of the two first protruding portions 112 are parallel to each other. The first protrusion 112 may be perpendicular to the first straight portion 111.
The second graphite block 12 includes a second straight portion 121 and two second projecting portions 122. The second straight portion 121 is a straight bar, and may be a straight bar structure having a rectangular cross section. The shape of the second straight portion 121 may be identical to the shape of the first straight portion 111. The two second extending portions 122 extend in the same direction from both ends of the second straight portion 121. The second extension portion 122 has a straight bar shape, and may have a straight bar structure with a rectangular cross section. The two second protrusions 122 are parallel to each other. Second extension 122 may be perpendicular to second straight portion 121.
In use, it is only necessary to align the two first projecting portions 112 of the first graphite block 11 with the two second projecting portions 122 of the second graphite block 12, respectively, and to connect the end portions of the two first projecting portions 112 with the end portions of the two second projecting portions 122, respectively. Therefore, the first graphite block 11 and the second graphite block 12 form a complete rectangular ring for blocking redundant ions, when any one of the first graphite block 11 and the second graphite block 12 is thinned by ion beams in the using process to be replaced, only one of the graphite blocks needs to be replaced, but not all of the graphite blocks need to be replaced, and therefore consumption of graphite materials is reduced.
Further, an end of the first protruding part 112 is provided with a first connecting part 113. The first connecting portion 113 is provided in a flat plate shape, for example, a rectangular flat plate. The thickness of the first connection portion 113 is smaller than that of the first extension portion 112. The first connection portion 113 is provided with a first through hole 114. The first through hole 114 vertically penetrates the first connection portion 113. The first through hole 114 may be disposed at a middle portion of the first connection portion 113.
The end of the second protrusion 122 is provided with a second connection part 123. The second connection portion 123 is provided in a flat plate shape, and the shape of the second connection portion 123 may be the same as that of the first connection portion 113. The thickness of the second connection part 123 is smaller than that of the second extension part 122. The second connecting portion 123 is provided with a second through hole 124. The second through hole 124 vertically penetrates the second connection part 123. The second through hole 124 may be disposed at a middle portion of the second connection portion 123.
When the first connecting portion 113 and the second connecting portion 123 are overlapped with each other, the first through hole 114 of the first connecting portion 113 and the second through hole 124 of the second connecting portion 123 can be aligned with each other, and the first through hole 114 and the second through hole 124 communicate with each other to form a passage through which a screw or a bolt can pass to fix the first connecting portion 113 and the second connecting portion 123 together. The screws or bolts can also be directly connected to the metal housing of the focusing assembly to secure the first graphite block 11 and the second graphite block 12 to the metal housing. In particular, the first connecting portion 113 and the second connecting portion 123 are overlapped and connected together, so that the joint between the first graphite block 11 and the second graphite block 12 has no gap for the ion beam to pass through, and the ion beam is prevented from bombarding the metal shell of the focusing device.
Further, the first protrusion 112 includes a first side surface (not shown) and a second side surface 117 opposite to the first side surface. The first and second sides 117 are planar and parallel to each other.
The second protruding portion 122 includes a third side (not shown in the drawings) and a fourth side 127. The third side is flush with the first side of the first extension 112. The fourth side 127 is flush with the second side 117 of the first extension 112. The thickness between the first protrusion 112 and the second protrusion 122 is equal.
One side of the first connecting portion 113 is flush with the first side, and one side of the second connecting portion 123 is flush with the fourth side 127. The sum of the thicknesses of the first connection portion 113 and the second connection portion 123 is equal to the thickness of the first protrusion portion 112.
When the first connecting portion 113 and the second connecting portion 123 overlap each other, the overall thickness of the first connecting portion 113 and the second connecting portion 123 is equal to the thickness of the first protruding portion 112, and the graphite guard ring 1 forms a substantially flat plate, and the thickness of the graphite guard ring 1 is more uniform throughout.
Further, the length of the first connection portion 113 is equal to the length of the second connection portion 123.
Thus, when the first connection portion 113 and the second connection portion 123 are connected to each other, the top of the first connection portion 113 can abut against the end of the second protruding portion 122, and the top of the second connection portion 123 can abut against the end of the first protruding portion 112. There is no gap between the first connecting portion 113 and the second protruding portion 122, and there is no gap between the second connecting portion 123 and the first protruding portion 112.
Further, the mass of the first graphite block 11 is larger than that of the second graphite block 12. The mass of the first graphite block 11 may be equal to or greater than twice the mass of the second graphite block 12.
The second graphite block 12 is disposed in a region where the energy of the received ion beam is large, and the first graphite block 11 is disposed in a region where the energy of the received ion beam is small. In this way, the second graphite block 12 is replaced more frequently than the first graphite block 11, but since the mass of the second graphite block 12 is smaller than the mass of the first graphite block 11, the loss of graphite material can be further reduced.
Further, the first straight portion 111 is provided with a plurality of third through holes 116. The third through hole 116 penetrates the first straight portion 111. The axis of the third through hole 116 is parallel to the axis of the first through hole 114. The number of the third through holes 116 may be two. The third through holes 116 are disposed on a side of the first straight portion 111 away from the first protruding portion 112.
The second straight portion 121 is further provided with a plurality of fourth through holes 125. The fourth through hole 125 penetrates the second straight portion 121. The fourth through-hole 125 is parallel to the second through-hole 124. The number of the fourth through-holes 125 may be two. Two fourth through holes 125 are provided on the side of second straight portion 121 facing away from second protruding portion 122, respectively. Two fourth through holes 125 may be provided at two corners of second straight portion 121 facing away from second protrusion 122.
The third through hole 116 and the fourth through hole 125 are for passing a screw or a bolt. In this way, the first graphite block 11 can be fixed to the metal housing of the focusing device by a bolt or screw passing through the third through hole 116, and the second graphite block 12 can also be fixed to the metal housing of the focusing device by a bolt or screw passing through the fourth through hole 125.
Although the present invention has been disclosed with reference to certain embodiments, numerous variations and modifications may be made to the described embodiments without departing from the scope and ambit of the present invention. It is to be understood, therefore, that this invention is not limited to the particular embodiments disclosed, but it is intended to cover modifications within the scope of the appended claims and their equivalents.
Claims (10)
1. A graphite guard ring for an ion implanter, comprising: the graphite block comprises a plurality of graphite blocks, wherein the graphite blocks are spliced into a ring shape.
2. The graphite guard ring of claim 1, wherein the plurality of graphite blocks has at least a first graphite block and a second graphite block;
the first graphite block comprises a first straight part and two first extending parts which respectively extend from two ends of the first straight part to the same direction;
the second graphite block comprises a second straight strip part and two second extending parts which respectively extend out from two ends of the second straight strip part to the same direction;
wherein, two first protruding portions can align each other and the tip of two first protruding portions can interconnect with the tip of two second protruding portions respectively with two second protruding portions respectively.
3. The graphite guard ring of claim 2, wherein the end of the first extension is provided with a first connection, the first connection being provided with a first through hole;
a second connecting part is arranged at the end part of the second extending part, and a second through hole is formed in the second connecting part;
when the first connection part overlaps the second connection part, the first through hole and the second through hole may be aligned with each other to facilitate connection by a screw or a bolt.
4. The graphite guard ring of claim 3, wherein the first extension includes a first side and a second side opposite the first side;
the second extension includes a third side flush with the first side and a fourth side flush with the second side;
one side surface of the first connecting part is flush with the first side surface, and one side surface of the second connecting part is flush with the fourth side surface;
wherein a sum of thicknesses of the first connection portion and the second connection portion is equal to a thickness of the first protrusion portion.
5. The graphite guard ring of claim 4, wherein the length of the first connection portion is equal to the length of the second connection portion.
6. The graphite guard ring of claim 2, wherein the mass of the first graphite block is greater than the mass of the second graphite block;
the second graphite block is arranged in a region which receives more ion beam energy, and the first graphite block is arranged in a region which receives less ion beam energy.
7. The graphite guard ring of claim 6, wherein the mass of the first graphite block is greater than or equal to twice the mass of the second graphite block.
8. The graphite guard ring of claim 3, wherein a third plurality of through holes are further provided in a side of the first linear portion facing away from the first extension;
one side of the second straight strip part departing from the second extending part is also provided with a plurality of fourth through holes.
9. A focusing assembly comprising the graphite guard ring of any one of claims 1 to 8.
10. An ion implanter comprising the focusing apparatus of claim 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910926007.9A CN112582243A (en) | 2019-09-27 | 2019-09-27 | Ion implanter, focusing apparatus, and graphite guard ring |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910926007.9A CN112582243A (en) | 2019-09-27 | 2019-09-27 | Ion implanter, focusing apparatus, and graphite guard ring |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112582243A true CN112582243A (en) | 2021-03-30 |
Family
ID=75110554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910926007.9A Pending CN112582243A (en) | 2019-09-27 | 2019-09-27 | Ion implanter, focusing apparatus, and graphite guard ring |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112582243A (en) |
-
2019
- 2019-09-27 CN CN201910926007.9A patent/CN112582243A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5559337A (en) | Plasma ion source mass analyzing apparatus | |
| US10892138B2 (en) | Multi-beam inspection apparatus with improved detection performance of signal electrons | |
| US20110079731A1 (en) | Multipole lens for electron column | |
| CN210296289U (en) | Ion implanter, focusing apparatus, and graphite guard ring | |
| US20100140495A1 (en) | Cathode having electron production and focusing groves, ion source and related method | |
| CN112582243A (en) | Ion implanter, focusing apparatus, and graphite guard ring | |
| US7473905B2 (en) | Electrostatic deflector | |
| KR100482899B1 (en) | Faraday device | |
| US20140110596A1 (en) | Apparatus for treating ion beam | |
| US7598498B2 (en) | Electric field lens and ion implanter having the same | |
| US20080067398A1 (en) | Analyzing electromagnet | |
| GB850527A (en) | Improvements in and relating to magnetic means for deflecting electron beams | |
| US6334258B1 (en) | Inspection device for examining a piece of aperture graphite of an extraction electrode | |
| US4967078A (en) | Rutherford backscattering surface analyzer with 180-degree deflecting and focusing permanent magnet | |
| CN220474565U (en) | Ion implanter | |
| JPH10125267A (en) | Energy filter | |
| EP1037252B1 (en) | Energy filter | |
| EP4322198A2 (en) | Simple spherical aberration corrector for sem | |
| EP4322197A1 (en) | Simple spherical aberration corrector for sem | |
| JP7429154B2 (en) | Microwave ion source and particle acceleration system equipped with it | |
| JPH08124515A (en) | Ion implantation device | |
| JP2004234961A (en) | Multipole lens and charged particle beam device | |
| JPH0251836A (en) | Ion implanter | |
| JP2002231168A (en) | Wien filter | |
| JPS6188438A (en) | Fly's eye lens manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |