CN112462455A - Sub-wavelength aperture array structure optical filter, display and preparation method thereof - Google Patents
Sub-wavelength aperture array structure optical filter, display and preparation method thereof Download PDFInfo
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- CN112462455A CN112462455A CN202011226095.0A CN202011226095A CN112462455A CN 112462455 A CN112462455 A CN 112462455A CN 202011226095 A CN202011226095 A CN 202011226095A CN 112462455 A CN112462455 A CN 112462455A
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- aperture array
- light
- wavelength aperture
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- 230000003287 optical effect Effects 0.000 title claims abstract description 18
- 238000002360 preparation method Methods 0.000 title claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 27
- 239000002184 metal Substances 0.000 claims abstract description 27
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 238000004806 packaging method and process Methods 0.000 claims abstract description 11
- 238000001465 metallisation Methods 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 18
- 238000001259 photo etching Methods 0.000 claims description 10
- 230000005540 biological transmission Effects 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000000206 photolithography Methods 0.000 claims description 3
- 238000004080 punching Methods 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 abstract description 12
- 230000000694 effects Effects 0.000 abstract description 2
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
- 239000012141 concentrate Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 241001522301 Apogonichthyoides nigripinnis Species 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/008—Surface plasmon devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
Abstract
The invention relates to the field of metal periodic pattern aperture array structures, and discloses a sub-wavelength aperture array structure optical filter, a display and a preparation method thereof, wherein the sub-wavelength aperture array structure optical filter comprises: the light resistance processing layer is arranged on the drive circuit substrate after the packaging is finished, and an annular through groove is formed in the light resistance processing layer; and a metal deposition layer deposited above the photoresist processing layer and having a light-passing hole formed at the center thereof. The invention utilizes the surface plasma effect generated by coupling light on the surface of the periodic pattern of the metal film, the half-peak width of transmitted light is small, and the color gamut is larger.
Description
Technical Field
The invention relates to the field of metal periodic pattern aperture array structures, in particular to a sub-wavelength aperture array structure optical filter, a display and a preparation method thereof.
Background
A color filter using surface plasmon, a liquid crystal display device, and a method of manufacturing the same are disclosed in the related art with respect to such a filter, the color filter including: a metal layer; and a transmissive pattern formed in the metal layer, the transmissive pattern including a plurality of sub-wavelength holes having a period, wherein light of a desired color is output by selectively transmitting light of a specific wavelength using surface plasmon, and the plurality of sub-wavelength holes are arranged in a triangular lattice having a predetermined number of holes most adjacent to the central hole.
The color filter in the prior art adopts a periodic circular hole design, so that the light transmission is poor, the half-peak width of transmitted light is large, and the color gamut is small.
Disclosure of Invention
The invention provides a sub-wavelength aperture array structure optical filter, a display and a preparation method thereof.
In order to achieve the purpose, the technical scheme of the invention is realized as follows:
a sub-wavelength aperture array structured filter, the sub-wavelength aperture array structured filter comprising: the light resistance processing layer is arranged on the drive circuit substrate after the packaging is finished, and an annular through groove is formed in the light resistance processing layer; and a metal deposition layer deposited above the photoresist processing layer and having a light-passing hole formed at the center thereof.
Preferably, the material of the metal deposition layer is configured of silver and aluminum.
Preferably, the aperture size of the light through hole is 100 nm.
In addition, the invention provides a preparation method of the sub-wavelength aperture array structure optical filter, which comprises the following steps: coating a light resistance layer on the drive circuit substrate after the packaging is finished; photoetching the photoresist layer to form an annular through groove; depositing a metal layer above the photoresist layer; and forming a light-transmitting hole on the metal layer.
Preferably, the method of forming the light transmission hole on the metal layer includes: punching the center of the metal layer by using a focused ion beam to form a light-transmitting hole; or perforating the center of the metal layer by photoetching and etching to form a light transmission hole.
Preferably, the method for forming the annular through groove by photoetching the photoresist layer comprises the following steps: and exposing, developing, baking and curing the photoresist layer to form an annular through groove.
In addition, the invention provides a display, which comprises the filter with the sub-wavelength aperture array structure.
Compared with the prior art, the periodic aperture array structure of the invention adopts a circular ring periodic pattern target center structure to concentrate light with the wavelength designed by the optical filter around the central aperture, so as to form local electric field enhancement and play a role of a plasma antenna, the external quantum efficiency is higher than that of a circular hole periodic arrangement pattern, and simultaneously, the half-peak width of transmitted light is small and the color gamut is larger.
Additional features and advantages of the invention will be set forth in the detailed description which follows.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate an embodiment of the invention and, together with the description, serve to explain the invention and not to limit the invention. In the drawings:
FIG. 1 is a schematic cross-sectional view of a sub-wavelength aperture array structured filter according to the present invention;
FIG. 2 is a schematic top view of the filter with sub-wavelength aperture array structure according to the present invention;
FIG. 3 is a schematic cross-sectional view of a packaged driving circuit substrate according to the present invention;
FIG. 4 is a schematic cross-sectional structure diagram of the structure after the photoresist layer is subjected to photolithography according to the present invention;
FIG. 5 is a schematic cross-sectional view of a deposited metal layer according to the present invention; and
fig. 6 is a flow chart of a method for manufacturing the optical filter with a sub-wavelength aperture array structure according to the present invention.
Description of reference numerals:
1. a substrate; 2. a drive circuit; 3. a light emitting layer; 4. a packaging layer; 5. a photoresist layer; 6. a metal layer; 7. and (7) a light hole.
Detailed Description
The following detailed description of embodiments of the invention refers to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating the present invention, are given by way of illustration and explanation only, not limitation.
The invention provides a sub-wavelength aperture array structure optical filter, which comprises: the light resistance processing layer is arranged on the drive circuit substrate after the packaging is finished, an annular through groove is formed in the light resistance processing layer, the light resistance processing layer is arranged on the drive circuit substrate after the packaging is finished, the drive circuit substrate after the packaging is finished is shown in figure 3 and comprises a substrate 1, a drive circuit 2, a light emitting layer 3 and a packaging layer 4 which are sequentially processed from bottom to top, and the cross section of the light resistance processing layer after the light resistance processing layer is added is shown in figure 4; and a metal deposition layer deposited on the photoresist processing layer, wherein a light through hole 7 is formed at the center of the metal deposition layer, the metal layer is deposited on the photoresist layer, a through groove similar to the annular through groove is formed after the metal deposition layer is deposited, as shown in fig. 5, and a structure with a light through hole formed at the center is shown in fig. 1, and a top view thereof is shown in fig. 2.
The invention uses the metal periodic pattern aperture array to realize the function of the optical filter, and replaces the traditional dye-doped optical filter. The process is simple: the traditional dye-doped filter process needs 3 times of photoetching, and the metal periodic array pattern only needs one time of photoetching plus Focused Ion Beam (FIB) or 2 times of photoetching process; can meet the requirement of higher resolution: the smaller the pixel of the dye-doped optical filter is, the lower the light stability of the dye is, the more serious the crosstalk between pixels is, the problem of the metal periodic array optical filter does not exist, and the pixel <1um can be realized; the process compatibility is good: the metal periodic array filter process is compatible with a normal process, and a color film process does not need to be redeveloped. As mentioned above, the "bulls-eye" structure concentrates the light with the wavelength designed by the optical filter around the central aperture, forms a local electric field enhancement, and plays the role of a plasma antenna, the external quantum efficiency is higher than that of the circular hole periodic arrangement pattern, and meanwhile, the half-peak width of the transmitted light is small, and the color gamut is larger.
Preferably, the material of the metal deposition layer is configured of silver and aluminum.
Preferably, the aperture size of the light through hole is 100 nm.
In addition, as shown in fig. 6, the present invention provides a method for manufacturing an optical filter with a sub-wavelength aperture array structure, the method comprising:
s101, coating a light resistance layer on the drive circuit substrate after packaging is finished;
s102, photoetching is carried out on the photoresist layer 5 to form an annular through groove, as shown in FIG. 4;
s103, depositing a metal layer 6 above the photoresist layer 5; and
s104, a light-transmitting hole 7 is formed in the metal layer 6, as shown in fig. 5.
Preferably, the method of forming the light transmission hole 7 on the metal layer 6 includes: punching the center of the metal layer 6 by using a focused ion beam to form a light transmission hole 7; or the center of the metal layer 6 is perforated by photolithography and etching to form the light transmission hole 7. Wherein, the light holes can be formed by the two methods. The two modes can be automatically switched according to requirements.
Preferably, the method for forming the annular through groove by photoetching the photoresist layer comprises the following steps: and exposing, developing, baking and curing the photoresist layer to form an annular through groove.
In addition, the invention also provides a display, which comprises the filter with the sub-wavelength aperture array structure.
Compared with the prior art, the display provided by the invention has the same distinguishing technical characteristics and technical effects as the filter with the sub-wavelength aperture array structure, and the details are not repeated herein.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (7)
1. A sub-wavelength aperture array structured filter, the sub-wavelength aperture array structured filter comprising:
the light resistance processing layer is arranged on the drive circuit substrate after the packaging is finished, and an annular through groove is formed in the light resistance processing layer; and
and the metal deposition layer is deposited above the light resistance processing layer, and a light through hole is formed in the center of the metal deposition layer.
2. The sub-wavelength aperture array structured filter of claim 1, wherein the material of the metal deposition layer is configured as silver and aluminum.
3. The sub-wavelength aperture array structure filter according to claim 1, wherein the aperture size of the light passing hole is 100 nm.
4. A preparation method of a sub-wavelength aperture array structure optical filter is characterized by comprising the following steps:
coating a light resistance layer on the drive circuit substrate after the packaging is finished;
photoetching the photoresist layer to form an annular through groove;
depositing a metal layer above the photoresist layer; and
and a light transmission hole is formed on the metal layer.
5. The method for manufacturing the sub-wavelength aperture array structure filter according to claim 4, wherein the method for forming the light transmission holes on the metal layer comprises:
punching the center of the metal layer by using a focused ion beam to form a light-transmitting hole; or
And perforating the center of the metal layer by photoetching and etching to form a light transmitting hole.
6. The method for manufacturing the sub-wavelength aperture array structure optical filter according to claim 4, wherein the step of performing photolithography on the photoresist layer to form the annular through groove comprises:
and exposing, developing, baking and curing the photoresist layer to form an annular through groove.
7. A display comprising the sub-wavelength aperture array structured filter of any one of claims 1 to 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011226095.0A CN112462455A (en) | 2020-11-05 | 2020-11-05 | Sub-wavelength aperture array structure optical filter, display and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011226095.0A CN112462455A (en) | 2020-11-05 | 2020-11-05 | Sub-wavelength aperture array structure optical filter, display and preparation method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN112462455A true CN112462455A (en) | 2021-03-09 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011226095.0A Pending CN112462455A (en) | 2020-11-05 | 2020-11-05 | Sub-wavelength aperture array structure optical filter, display and preparation method thereof |
Country Status (1)
| Country | Link |
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| CN (1) | CN112462455A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113359220A (en) * | 2021-06-10 | 2021-09-07 | 浙江大学 | Spectral filter based on three-dimensional annular structure and application |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102103223A (en) * | 2009-12-18 | 2011-06-22 | 乐金显示有限公司 | Color filter using surface plasmons, liquid crystal display device and method for fabricating the same |
| US20120226480A1 (en) * | 2011-03-04 | 2012-09-06 | Ricoh Co., Ltd. | Design of Filter Modules for Aperture-coded, Multiplexed Imaging Systems |
| CN106098910A (en) * | 2016-08-24 | 2016-11-09 | 苏州大学 | Based on fluorescence ceramics and polarized white light LED of double-layer nanometer optical grating construction |
-
2020
- 2020-11-05 CN CN202011226095.0A patent/CN112462455A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102103223A (en) * | 2009-12-18 | 2011-06-22 | 乐金显示有限公司 | Color filter using surface plasmons, liquid crystal display device and method for fabricating the same |
| US20120226480A1 (en) * | 2011-03-04 | 2012-09-06 | Ricoh Co., Ltd. | Design of Filter Modules for Aperture-coded, Multiplexed Imaging Systems |
| CN106098910A (en) * | 2016-08-24 | 2016-11-09 | 苏州大学 | Based on fluorescence ceramics and polarized white light LED of double-layer nanometer optical grating construction |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113359220A (en) * | 2021-06-10 | 2021-09-07 | 浙江大学 | Spectral filter based on three-dimensional annular structure and application |
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20210309 |
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| RJ01 | Rejection of invention patent application after publication |