CN112415798B - Display panel, manufacturing method thereof and display device - Google Patents
Display panel, manufacturing method thereof and display device Download PDFInfo
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- CN112415798B CN112415798B CN202011246006.9A CN202011246006A CN112415798B CN 112415798 B CN112415798 B CN 112415798B CN 202011246006 A CN202011246006 A CN 202011246006A CN 112415798 B CN112415798 B CN 112415798B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/13338—Input devices, e.g. touch panels
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
Abstract
The application provides a display panel, a manufacturing method thereof and a display device, wherein the display panel comprises a liquid crystal panel and a touch panel, the touch panel comprises a substrate, a plurality of touch sensors and a light control sensor, the touch sensors are composed of a plurality of rows of transmitting electrodes and receiving electrodes, the light control sensor comprises a plurality of gate electrodes, the receiving electrodes and the gate electrodes are arranged in a layered mode, orthographic projection areas of the receiving electrodes on the substrate are respectively overlapped with orthographic projection areas of the gate electrodes on the substrate to form a plurality of overlapping areas, two adjacent receiving electrodes in the same row of receiving electrodes, which are located in the overlapping areas, are connected through a conductive electrode arranged on one side, far away from the gate electrodes, of the receiving electrodes of the touch sensors and the gate electrodes of the light control sensor, therefore, the parasitic capacitance between the receiving electrodes of the touch sensors and the gate electrodes of the light control sensor is reduced, the influence of the light control sensor on signal crosstalk of the touch sensors is reduced, and the accuracy and the sensitivity of touch of the display panel integrated with the light control sensor and the touch sensor are improved.
Description
Technical Field
The invention relates to the technical field of display, in particular to a display panel, a manufacturing method of the display panel and a display device.
Background
With the development of display technology, it is also a trend to integrate sensors into display panels. Touch and the optical sensor that adopt at present all are with the sensor laminating in display panel's outside, not only can reduce display panel's light transmissivity like this, still can promote manufacturing cost, and integrated in display panel with the sensor then can effectively reduce the loss of light, can also reduce manufacturing cost.
In the existing display panel that synchronously integrates a light-operated sensor and a touch sensor, the touch sensor is usually a mutual capacitance structure, and is composed of multiple rows of transversely arranged transmitting electrodes and multiple rows of longitudinally arranged receiving electrodes, each row of transmitting electrodes or receiving electrodes includes multiple transmitting electrodes or receiving electrodes connected by a signal wire arranged on the same layer as the transmitting electrodes or receiving electrodes, and an overlapping region exists between a gate electrode of the light-operated sensor and the multiple rows of longitudinally arranged receiving electrodes and between the signal wires connected between the receiving electrodes, so that a parasitic capacitance exists between the receiving electrodes and the gate electrode of the light-operated sensor, which causes the light-operated sensor to generate signal crosstalk to the touch sensor, affects the normal operation of the touch sensor, and reduces the accuracy and sensitivity of the touch of the display panel.
In summary, the existing display panel integrating the light control sensor and the touch sensor has the problem that the light control sensor generates signal crosstalk to the touch sensor, which results in the reduction of the accuracy and sensitivity of the touch of the display panel. Therefore, it is necessary to provide a display panel, a method for manufacturing the same, and a display device to improve the defect.
Disclosure of Invention
The embodiment of the application provides a display panel, a manufacturing method thereof and a display device, and aims to solve the problem that the accuracy and the sensitivity of touch control of the display panel are reduced due to signal crosstalk generated by a touch sensor by the light sensor in the existing display panel integrating the light sensor and the touch sensor.
The embodiment of the application provides a display panel, which comprises a liquid crystal panel and a touch panel arranged on the liquid crystal panel, wherein the touch panel comprises a substrate and a plurality of touch sensors and a light control sensor which are alternately arranged on the substrate in an array mode, the touch sensors are composed of a plurality of rows of transmitting electrodes arranged at intervals in a first direction and a plurality of rows of receiving electrodes arranged at intervals in a direction perpendicular to the first direction, and each light control sensor comprises a plurality of array-arranged gate electrodes;
the receiving electrodes and the gate electrode of the light-operated sensor are arranged in a layered mode, orthographic projection areas of the receiving electrodes on the substrate are overlapped with orthographic projection areas of the gate electrode on the substrate respectively to form a plurality of overlapping areas, and two adjacent receiving electrodes in the same column of the receiving electrodes, which are located in the overlapping areas, are connected through a conducting electrode arranged on one side, far away from the gate electrode, of the receiving electrodes.
According to an embodiment of the present application, the light control sensor includes a plurality of thin film transistors, the emitting electrode and the gate electrode are disposed on the same layer, and the receiving electrode and the source and the drain of the thin film transistor are disposed on the same layer.
According to an embodiment of the application, touch panel including in proper order range upon range of set up in gate insulation layer, passivation protective layer, optical cement layer and the apron on the base plate, the gate electrode set up in the base plate is close to on one side of gate insulation layer, thin film transistor's active layer set up in the gate insulation layer is kept away from on one side of base plate, the source electrode with the drain electrode set up in the gate insulation layer is kept away from on one side of base plate to overlap joint respectively in the both sides of active layer.
According to an embodiment of the application, be equipped with a plurality of via holes on the passivation protective layer, the via hole exposes to be located adjacent two of overlap area receiving electrode, conductive electrode set up in the passivation protective layer is kept away from one side of base plate, and passes through the via hole is with adjacent two receiving electrode connects.
According to an embodiment of the application, the passivation protective layer with be equipped with interlayer insulation between the optics glue film, the via hole runs through interlayer insulation with the passivation protective layer, conductive electrode set up in interlayer insulation keeps away from on one side of base plate.
According to an embodiment of the application, the thin film transistor comprises a light sensing thin film transistor and a switch thin film transistor, and active layers of the light sensing thin film transistor and the switch thin film transistor are both made of amorphous silicon materials.
According to an embodiment of the application, one side of the passivation protection layer, which is far away from the gate insulation layer, is further provided with a plurality of black matrixes which are arranged in an array manner, and an orthographic projection area of the black matrixes on the substrate covers an orthographic projection area of an active layer of the switch thin film transistor on the substrate.
The embodiment of the application provides a display device, which comprises a device main body and the display panel arranged on the device main body.
The embodiment of the present application further provides a manufacturing method of a display panel, including:
providing a substrate, and forming a plurality of rows of emission electrodes and patterned gate electrodes which are arranged at intervals along a first direction on one side surface of the substrate;
forming a gate insulating layer covering the emitting electrode and the gate electrode on the substrate, forming a plurality of rows of receiving electrodes, patterned active layers, source electrodes and drain electrodes which are arranged at intervals along the first direction on one side of the gate insulating layer away from the substrate, wherein orthographic projection areas of the receiving electrodes on the substrate are respectively overlapped with orthographic projection areas of the gate electrode on the substrate to form a plurality of overlapping areas;
forming a passivation protection layer covering the receiving electrode, the active layer, the source electrode and the drain electrode on one side of the gate insulation layer away from the substrate, and forming a plurality of black matrixes arranged in an array on the passivation protection layer;
etching the passivation protection layer to form a plurality of via holes, wherein the via holes expose two adjacent receiving electrodes in the overlapping area;
forming a conductive electrode on one side of the passivation protection layer far away from the substrate, wherein the conductive electrode connects two adjacent receiving electrodes in the overlapping area through the via hole;
coating a side, far away from the substrate, of the passivation protection layer to form a first optical adhesive layer, and attaching the cover plate through the first optical adhesive layer; and
and providing a liquid crystal panel, coating a second optical adhesive layer on one side of the substrate far away from the cover plate, and attaching the substrate to one side of the light emergent surface of the liquid crystal panel through the second optical adhesive layer.
According to an embodiment of the present application, the manufacturing method further includes:
before the passivation protection layer is etched, an interlayer insulating layer is formed on one side, away from the substrate, of the passivation protection layer, and the interlayer insulating layer and the passivation protection layer are etched to form a plurality of through holes.
The beneficial effects of the embodiment of the application are as follows: according to the embodiment of the application, two adjacent receiving electrodes in the same row of receiving electrodes, which are positioned in an overlapping area formed by the gate electrode of the light-operated sensor, are connected through the conductive electrode arranged on one side of the electrode away from the gate electrode, so that the parasitic capacitance between the receiving electrode of the touch-control sensor and the gate electrode of the light-operated sensor is reduced, the influence of signal crosstalk of the light-operated sensor on the touch-control sensor is reduced, and the touch accuracy and the touch sensitivity of the display panel integrated with the light-operated sensor and the touch-control sensor are improved.
Drawings
In order to illustrate the embodiments or the technical solutions in the prior art more clearly, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the application, and it is obvious for those skilled in the art that other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a display panel according to an embodiment of the present disclosure;
fig. 2 is a schematic structural diagram of a touch panel according to an embodiment of the present disclosure;
fig. 3 is a schematic circuit structure diagram of a light control sensor provided in an embodiment of the present application;
fig. 4 is a schematic structural diagram of a display device according to an embodiment of the present application;
fig. 5A to 5G are schematic structural diagrams of a display panel corresponding to a manufacturing method of the display panel provided in the embodiment of the present application.
Detailed Description
The following description of the various embodiments refers to the accompanying drawings, which are included to illustrate specific embodiments that can be implemented by the application. Directional phrases used in this application, such as [ upper ], [ lower ], [ front ], [ rear ], [ left ], [ right ], [ inner ], [ outer ], [ side ], etc., refer only to the directions of the attached drawings. Accordingly, the directional terminology is used for purposes of illustration and understanding, and is in no way limiting. In the drawings, elements having similar structures are denoted by the same reference numerals.
The present application is further described with reference to the following drawings and detailed description.
An embodiment of the present application provides a display panel, which is described in detail below with reference to fig. 1 to 3, where fig. 1 is a schematic structural diagram of the display panel provided in the embodiment of the present application, fig. 2 is a schematic structural diagram of a touch panel provided in the embodiment of the present application, and fig. 3 is a schematic circuit structural diagram of a light control sensor provided in the embodiment of the present application.
The display panel 1 provided by the embodiment of the application comprises a liquid crystal panel 11 and a touch panel 12 arranged on the liquid crystal panel 11, wherein the touch panel 12 is attached to the liquid crystal panel 11 through an optical adhesive layer 13. The touch panel 12 includes a substrate 120 and a plurality of touch sensors 121 and light control sensors 122 alternately arranged on the substrate 120, and by integrating the touch sensors 121 and the light control sensors 122 into the display panel 1, the functions of short-range touch and long-range light control of the display panel 1 can be realized.
In the embodiment of the present application, the touch sensor 121 is a mutual capacitance touch sensor, and the plurality of touch sensors 121 disposed on the substrate 120 are composed of a plurality of rows of transmitting electrodes 1211 arranged at intervals along a first direction and a plurality of rows of receiving electrodes 1212 arranged at intervals along a direction perpendicular to the first direction, where the first direction is a horizontal transverse direction. The intersection of the transmitting electrode 1211 and the receiving electrode 1212 forms a capacitor, when a finger of a user touches the touch panel, the coupling between the two electrodes at the intersection of the transmitting electrode 1211 and the receiving electrode 1212 is affected, so as to change the capacitance between the two electrodes, the coordinates of each touch point can be calculated by detecting the two-dimensional capacitance variation data of the touch panel 12, and a corresponding touch signal is generated, and the display panel responds accordingly according to the touch signal, so that the short-range touch function of the display panel can be realized.
In the embodiment of the present application, the light control sensor 122 includes a plurality of gate electrodes 1221 arranged in an array, as shown in fig. 2, the receiving electrodes 1212 and the gate electrodes 1221 of the light control sensor 122 are disposed on different film layers, the orthographic projection areas of the plurality of receiving electrodes 1212 disposed on the substrate 120 overlap with the orthographic projection areas of the gate electrodes 1221 on the substrate 120, respectively, and form a plurality of overlapping areas 123, adjacent two receiving electrodes 1212 in the overlapping areas 123 in the same column of receiving electrodes are connected by the conductive electrode 129 disposed on the side of the receiving electrode 1212 away from the gate electrode 1221, and the receiving electrodes 1212 not having overlapping areas with the gate electrode 1221 are connected by the signal trace disposed on the same layer as the receiving electrode 1212, so as to increase the distance between the conductive electrode 129 connected to the adjacent two receiving electrodes 1212 in the overlapping areas 123 and the gate electrode 1221, thereby reducing the parasitic capacitance between the gate electrode 1221 and the receiving electrode 1212 in the overlapping areas 123, thereby reducing the influence of the light control sensor 122 on the signal crosstalk of the touch sensor 121, and improving the accuracy and the sensitivity and the display panel 121 integrating the touch sensor with the touch sensor.
Specifically, as shown in fig. 2, the light control sensor 122 includes a plurality of thin film transistors, the emission electrode 1211 of the touch sensor 121 and the gate electrode 1221 of the light control sensor 122 are disposed on the same layer, the emission electrode 1211 and the gate electrode 1221 have the same film structure, the receiving electrode 1212 and the source and drain electrodes 1223 and 1224 of the thin film transistors are disposed on the same layer, and the receiving electrode 1212 and the source and drain electrodes 1223 and 1224 have the same film structure, and the emission electrode 1211, the receiving electrode 1212, the gate electrode 1221, the source 1223, and the drain electrode 1224 may all have a stacked structure of a plurality of metal materials such as Cu, al, mo, and the like, so that the emission electrode 1211 and the receiving electrode 1212 of the touch sensor 121 may be simultaneously formed by using the processes of the gate electrode 1221, the source electrode 1223, and the drain electrode 1224, and the light control sensor 122 and 121 may be integrated in the display panel without increasing the extra processes.
Further, as shown in fig. 2, the touch panel 12 includes a gate insulating layer 124, a passivation layer 125, an optical glue layer 127 and a cover plate 128 sequentially stacked on the substrate 120, a gate electrode 1221 is disposed on a side of the substrate 120 close to the gate insulating layer 124, an active layer 1222 of a thin film transistor is disposed on a side of the gate insulating layer 124 away from the substrate 120, and a source 1223 and a drain 1224 of the thin film transistor are disposed on a side of the gate insulating layer 124 away from the substrate 120 and respectively connected to two sides of the active layer 1222.
In the embodiment of the present application, a plurality of via holes are disposed on the passivation protection layer 125, the via holes expose two adjacent receiving electrodes 1212 located in the overlapping area 123, and the conductive electrode 129 is disposed on a side of the passivation protection layer 125 away from the substrate 120 and connects the two adjacent receiving electrodes 1212 located in the overlapping area through the via holes.
Preferably, in the embodiment of the present application, an interlayer insulating layer 126 should be further disposed between the passivation protecting layer 125 and the optical adhesive layer 127, the via hole penetrates through the interlayer insulating layer 126 and the passivation protecting layer 125 and exposes two adjacent receiving electrodes 1212 located at the bottom of the passivation protecting layer 125 and located in the overlapping area, the conductive electrode 129 is disposed on one side of the interlayer insulating layer 126 away from the substrate 120 and covered by the optical adhesive layer 127, and the two adjacent receiving electrodes 1212 located in the overlapping area are connected through the via hole.
Specifically, the material of the interlayer insulating layer 126 is an organic transparent material with a low dielectric constant, which may be an organic transparent photoresist material commonly used in the liquid crystal panel manufacturing process, but may also be other organic transparent materials in some embodiments, and is not limited herein. By filling the organic transparent material with a low dielectric constant between the conductive electrode 129 and the gate electrode 1221 as a filler, the parasitic capacitance between the conductive electrode 129 and the gate electrode 1221 can be further reduced compared to the original filled passivation protection material, thereby reducing the parasitic capacitance between the receiving electrode 1212 and the gate electrode 1221.
Further, in the embodiment of the present application, the thickness of the interlayer insulating layer 126 is 3 μm. In some embodiments, the thickness of the interlayer insulating layer 126 may also be 1 μm or 5 μm, or may range from 1 μm to 5 μm, and the specific value of the film thickness of the interlayer insulating layer 126 may be set according to actual requirements, which is not limited herein.
In this embodiment, a transparent electrode 1291 is further disposed on a side of the interlayer insulating layer 126 away from the passivation protection layer 125, and the transparent electrode 1291 connects the drain electrode 1224 of the thin film transistor in the light control sensor 122 to the reading unit of the touch panel 12 through a via hole disposed on the interlayer insulating layer 126 and penetrating through the interlayer insulating layer 126 and the passivation protection layer 125. The transparent electrode 1291 is made of the same material as the conductive electrode 129, so that the conductive electrode 129 can be formed by using the existing process, thereby avoiding the need of additionally increasing the process, and reducing the difficulty of the manufacturing process and the production cost.
In the embodiment of the application, as shown in fig. 2 and fig. 3, the tft includes a photo sensor tft T1 and a switch tft T2, the photo sensor 122 is composed of a photo sensor tft T1, a switch tft T2 and a storage capacitor C, a source 1223 of the photo sensor tft T1 is connected to a first scan line for providing the first voltage signal Vdata, a gate electrode of the photo sensor tft T1 is connected to a second scan line, a drain 1224 of the photo sensor tft T1 is connected to the source 1223 of the switch tft T2, a gate electrode of the switch tft T2 is connected to a third scan line for providing the second voltage signal Vgate, and a drain 1224 of the switch tft T2 is connected to the reading unit of the touch panel 12. The photo-sensing tft T1 is an infrared-sensing tft, and can generate a corresponding photocurrent according to light irradiated onto the active layer 1222 thereof, and a reading unit connected to the drain 1224 of the switching tft T2 reads a voltage value output by the photo-sensing sensor 122 to determine whether the photo-sensing sensor 122 is touched by an infrared light pen or a finger of a user, so as to implement remote photo-control of the display panel.
In the embodiment of the present invention, the light-sensing thin film transistor T1 and the switching thin film transistor T2 have the same material as the active layer 1222, and are both made of amorphous silicon material, so that the light-sensing thin film transistor T1 and the switching thin film transistor T2 can be simultaneously formed by the same process, and the extra photolithography process for forming the active layer 1222 is not required to be added, thereby reducing the production cost.
Further, as shown in fig. 2, a side of the passivation layer 125 away from the gate insulating layer 124 is provided with a plurality of black matrixes 1292 arranged in an array, and an orthographic projection area of the black matrixes 1292 on the substrate 120 covers an orthographic projection area of the active layer 1222 of the switching thin film transistor T2 on the substrate 120. By providing the black matrix 1292, light can be prevented from irradiating the active layer 1222 of the switching thin film transistor T2, so as to effectively improve the stability of the light control sensor 122 and improve the touch accuracy of the display panel 1.
Of course, in some embodiments, the material of the active layer 1222 of the light sensing thin film transistor T1 is an amorphous silicon material, and the material of the active layer 1222 of the switching thin film transistor T2 may be a polysilicon or metal oxide material commonly used in the art, and the specific material may be selected according to practical requirements, and is not limited herein.
In the embodiment of the present application, the liquid crystal panel 11 is a liquid crystal display panel with a Non-COA structure, and the display mode thereof is an IPS mode. Of course, in some embodiments, the liquid crystal panel may also be a COA-based liquid crystal display panel, and the display mode thereof may be VA, IPS, TN, FFS, or the like. The type and display mode of the display panel can be selected and set according to actual requirements, which is not limited herein.
The beneficial effects of the embodiment of the application are as follows: the display panel provided by the embodiment of the application is characterized in that two adjacent receiving electrodes in the same row of receiving electrodes, which are positioned in an overlapping area formed by the gate electrode of the light-operated sensor, are connected through the conductive electrode arranged on one side of the electrode away from the gate electrode, so that the parasitic capacitance between the receiving electrode of the touch sensor and the gate electrode of the light-operated sensor is reduced, the influence of signal crosstalk of the light-operated sensor on the touch sensor is reduced, and the touch accuracy and the touch sensitivity of the display panel integrated with the light-operated sensor and the touch sensor are improved.
An embodiment of the present application further provides a display device, as shown in fig. 4, fig. 4 is a schematic structural diagram of the display device provided in the embodiment of the present application, the display device 2 includes a device main body 21 and a display panel 22, the device main body 21 includes parts of a frame assembly, a power supply, a processor, and the like of the display device, and the display panel 22 is disposed on the device main body 21. The display panel 22 provided in the embodiment of the present application is the display panel provided in the above embodiment, and the display device provided in the embodiment of the present application can also achieve the same technical effects as the display panel provided in the above embodiment, and details are not repeated here.
The embodiment of the present application further provides a manufacturing method of a display panel, which is described in detail below with reference to fig. 5A to 5G, and fig. 5A to 5G are schematic structural diagrams of the display panel corresponding to the manufacturing method of the display panel provided in the embodiment of the present application. The manufacturing method of the display panel provided by the embodiment of the application comprises the following steps:
step S1: as shown in fig. 5A, providing a substrate 120, depositing a metal material on a surface of one side of the substrate 120 by a physical vapor deposition method, and forming a plurality of rows of emitter electrodes 1211 and a plurality of patterned gate electrodes 1221 arranged at intervals along a first direction by a first photolithography process;
step S2: as shown in fig. 5B, a gate insulating layer 124 covering the emitter electrode 1211 and the gate electrode 1221 is formed on the substrate 120, an active layer 1222 is formed on a side of the gate insulating layer 124 away from the substrate 120 by chemical vapor deposition, a metal material is deposited by physical vapor deposition, a plurality of rows of receiving electrodes 1212 and patterned source and drain electrodes 1223 and 1224 are formed by a second photolithography process, the receiving electrodes 1212 and the patterned source and drain electrodes 1224 are arranged at intervals in a direction perpendicular to the first direction, and the orthographic projection areas of the receiving electrodes 1212 on the substrate respectively overlap with the orthographic projection areas of the gate electrode 1221 on the substrate and form a plurality of overlapping areas 123;
and step S3: as shown in fig. 5C, a passivation layer 125 covering the receiving electrode 1212, the active layer 1222, the source electrode 1223 and the drain electrode 1224 is formed on a side of the gate insulating layer 124 away from the substrate 120, a black photoresist is coated on the passivation layer 125, and a third photolithography process is performed to form a plurality of black matrixes 1292 arranged in an array;
and step S4: as shown in fig. 5D, forming the interlayer insulating layer 126 on the side of the passivation protection layer 125 far from the substrate 120, and etching the interlayer insulating layer 126 and the passivation protection layer 125 by a fourth photolithography process to form a via hole V1 penetrating through the interlayer insulating layer 126 and the passivation protection layer 125 and exposing two adjacent receiving electrodes 1212 at the overlapping region and a via hole V2 exposing the drain electrode 1224;
step S5: as shown in fig. 5E, depositing a transparent conductive material on the side of the interlayer insulating layer 126 away from the substrate 120, and etching to form a conductive electrode 129 connecting two adjacent receiving electrodes 1212 in the overlapping region and a transparent electrode 1291 connecting the drain electrode 1224 through a fifth photolithography process;
step S6: as shown in fig. 5F, a first optical adhesive layer 127 is formed on a side of the interlayer insulating layer 126 away from the substrate 120, and the cover plate 128 is attached to the interlayer insulating layer 126 through the first optical adhesive layer 127, so as to form the touch panel 12; and
step S7: as shown in fig. 5G, a liquid crystal panel 11 is provided, a second optical adhesive layer 13 is formed on a side of the substrate 120 away from the cover plate 128, and the substrate 120 is attached to a side of the light emitting surface of the liquid crystal panel 11 through the second optical adhesive layer 13.
In the embodiment of the present application, the transmitting electrode 1211 and the receiving electrode 1212 together form a touch sensor of the touch panel 11 of the display panel 1, the gate electrode 1221 and the active layer 1222, the source electrode 1221 and the drain electrode 1224 form a photo tft, a switching tft and a storage capacitor, and the photo tft, the switching tft and the storage capacitor together form a light control sensor of the touch panel 12.
In the embodiment of the present application, in step S1, the film structures of the emitter electrode 1211 and the gate electrode 1221 are the same, and in step S2, the film structures of the receiver electrode 1212, the source electrode 1223, and the drain electrode 1224 are also the same, and are all stacked structures of multiple metal materials such as Cu, al, and Mo. By disposing the emitting electrode 1211 of the touch sensor 121 and the gate electrode 1221 of the light control sensor 122 on the same layer, and disposing the receiving electrode 1212 and the source 1223 and the drain 1224 of the thin film transistor on the same layer, the emitting electrode 1211 and the receiving electrode 1212 of the touch sensor 121 can be formed at the same time by using the processes of the gate electrode 1221, the source 1223, and the drain 1224, respectively, so that the light control sensor 122 and the touch sensor 121 can be integrated in the display panel without increasing an extra process.
In this embodiment, in step S4, an interlayer insulating layer 126 is formed between the etching passivation layers 125 and on a side of the passivation layer 25 away from the substrate 120, where the interlayer insulating layer is made of an organic transparent material with a low dielectric constant, and the organic transparent material may be an organic transparent photoresist material commonly used in a liquid crystal panel manufacturing process, but in some embodiments, other organic transparent materials may also be used, which is not limited herein. By filling the organic transparent material with a low dielectric constant between the conductive electrode 129 and the gate electrode 1221 as a filler, compared with the original filled passivation layer material, the parasitic capacitance between the conductive electrode 129 and the gate electrode 1221 can be further reduced, so that the parasitic capacitance between the receiving electrode 1212 and the gate electrode 1221 is reduced, the influence of the optical control sensor on the signal crosstalk of the touch sensor is reduced, and the accuracy and sensitivity of the touch of the display panel integrated with the optical control sensor and the touch sensor are improved.
Further, in the embodiment of the present application, the thickness of the interlayer insulating layer 126 is 3 μm. In some embodiments, the thickness of the interlayer insulating layer 126 may also be 1 μm or 5 μm, or between 1 μm and 5 μm, and the specific value of the film thickness of the interlayer insulating layer 126 may be set according to practical requirements, which is not limited herein.
In step S5, the transparent electrode 1291 is made of the same material as the conductive electrode 129, so that the conductive electrode 129 can be formed by using the existing process, thereby reducing the difficulty of the manufacturing process and the production cost without adding an additional process.
In the embodiment of the present application, the liquid crystal panel 11 is a liquid crystal display panel of Non-COA architecture, and the display mode thereof is an IPS mode. Of course, in some embodiments, the liquid crystal panel may also be a COA-based liquid crystal display panel, and the display mode thereof may be VA, IPS, TN, FFS, or the like. The type and display mode of the display panel can be selected and set according to actual requirements, which is not limited herein.
The beneficial effects of the embodiment of the application are as follows: according to the manufacturing method of the display panel, the adjacent two receiving electrodes in the same row of receiving electrodes, which are positioned in the overlapping area formed by the receiving electrodes and the gate electrode of the light-operated sensor, are connected through the conductive electrode arranged on the side, away from the gate electrode, of the electrode, so that the parasitic capacitance between the receiving electrodes of the touch sensor and the gate electrode of the light-operated sensor is reduced, the influence of the light-operated sensor on signal crosstalk of the touch sensor is reduced, and the touch accuracy and the touch sensitivity of the display panel integrated with the light-operated sensor and the touch sensor are improved.
In summary, although the present application has been described with reference to the preferred embodiments, the above-described preferred embodiments are not intended to limit the present application, and those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present application, so that the scope of the present application is defined by the appended claims.
Claims (10)
1. A display panel is characterized by comprising a liquid crystal panel and a touch panel arranged on the liquid crystal panel, wherein the touch panel comprises a substrate and a plurality of touch sensors and a light control sensor which are alternately arranged on the substrate in an array mode, the touch sensors are composed of a plurality of rows of transmitting electrodes arranged at intervals along a first direction and a plurality of rows of receiving electrodes arranged at intervals vertical to the first direction, and each light control sensor comprises a plurality of gate electrodes arranged in an array mode;
the receiving electrodes and the gate electrode of the light-operated sensor are arranged in a layered mode, orthographic projection areas of the receiving electrodes on the substrate are overlapped with orthographic projection areas of the gate electrode on the substrate respectively to form a plurality of overlapping areas, and two adjacent receiving electrodes in the same column of the receiving electrodes, which are located in the overlapping areas, are connected through a conducting electrode arranged on one side, far away from the gate electrode, of the receiving electrodes.
2. The display panel according to claim 1, wherein the light control sensor includes a plurality of thin film transistors, the emission electrode is disposed at the same layer as the gate electrode, and the reception electrode is disposed at the same layer as source and drain electrodes of the thin film transistors.
3. The display panel according to claim 2, wherein the touch panel includes a gate insulating layer, a passivation protective layer, an optical adhesive layer, and a cover plate sequentially stacked on the substrate, the gate electrode is disposed on a side of the substrate close to the gate insulating layer, the active layer of the thin film transistor is disposed on a side of the gate insulating layer away from the substrate, and the source electrode and the drain electrode are disposed on a side of the gate insulating layer away from the substrate and are respectively overlapped on both sides of the active layer.
4. The display panel according to claim 3, wherein a plurality of via holes are formed in the passivation layer, the via holes expose two adjacent receiving electrodes located in the overlapping region, and the conductive electrode is disposed on a side of the passivation layer away from the substrate and connects two adjacent receiving electrodes through the via holes.
5. The display panel according to claim 4, wherein an interlayer insulating layer is disposed between the passivation protective layer and the optical adhesive layer, the via hole penetrates through the interlayer insulating layer and the passivation protective layer, and the conductive electrode is disposed on a side of the interlayer insulating layer away from the substrate.
6. The display panel according to claim 3, wherein the thin film transistors comprise a light-sensing thin film transistor and a switching thin film transistor, and active layers of the light-sensing thin film transistor and the switching thin film transistor are made of amorphous silicon materials.
7. The display panel according to claim 6, wherein a side of the passivation protection layer away from the gate insulating layer is further provided with a plurality of black matrixes arranged in an array, and an orthographic projection area of the black matrixes on the substrate covers an orthographic projection area of the active layer of the switching thin film transistor on the substrate.
8. A display device comprising a device body including a power supply, a processor, and a frame assembly, and the display panel according to any one of claims 1 to 7 provided on the device body.
9. A method for manufacturing a display panel is characterized by comprising the following steps:
providing a substrate, and forming a plurality of rows of emission electrodes and patterned gate electrodes which are arranged at intervals along a first direction on one side surface of the substrate;
forming a gate insulating layer covering the emitting electrode and the gate electrode on the substrate, forming a plurality of rows of receiving electrodes, patterned active layers, source electrodes and drain electrodes which are arranged at intervals along a direction perpendicular to the first direction on one side of the gate insulating layer away from the substrate, wherein orthographic projection areas of the receiving electrodes on the substrate are respectively overlapped with orthographic projection areas of the gate electrode on the substrate to form a plurality of overlapped areas;
forming a passivation protection layer covering the receiving electrode, the active layer, the source electrode and the drain electrode on one side of the gate insulation layer away from the substrate, and forming a plurality of black matrixes arranged in an array on the passivation protection layer;
etching the passivation protection layer to form a plurality of via holes, wherein the via holes expose two adjacent receiving electrodes in the overlapping area;
forming a conductive electrode on one side of the passivation protection layer far away from the substrate, wherein the conductive electrode connects two adjacent receiving electrodes in the overlapping area through the via hole;
coating a side, far away from the substrate, of the passivation protection layer to form a first optical adhesive layer, and attaching the cover plate through the first optical adhesive layer; and
and providing a liquid crystal panel, coating a second optical adhesive layer on one side of the substrate far away from the cover plate, and attaching the substrate to one side of the light emergent surface of the liquid crystal panel through the second optical adhesive layer.
10. The method for manufacturing a display panel according to claim 9, further comprising:
before the passivation protective layer is etched, an interlayer insulating layer is formed on one side, far away from the substrate, of the passivation protective layer, and the interlayer insulating layer and the passivation protective layer are etched to form a plurality of through holes.
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| CN113156678B (en) * | 2021-04-28 | 2023-02-28 | 深圳市华星光电半导体显示技术有限公司 | Array substrate and display panel |
| CN113625900A (en) * | 2021-08-26 | 2021-11-09 | 京东方科技集团股份有限公司 | Touch module, preparation method thereof and display device |
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| US7924272B2 (en) * | 2006-11-27 | 2011-04-12 | Microsoft Corporation | Infrared sensor integrated in a touch panel |
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