CN112410765A - Cluster type equipment control method and device and storage medium - Google Patents
Cluster type equipment control method and device and storage medium Download PDFInfo
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- CN112410765A CN112410765A CN202011225800.5A CN202011225800A CN112410765A CN 112410765 A CN112410765 A CN 112410765A CN 202011225800 A CN202011225800 A CN 202011225800A CN 112410765 A CN112410765 A CN 112410765A
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- 238000000034 method Methods 0.000 title claims abstract description 151
- 238000003860 storage Methods 0.000 title claims abstract description 8
- 230000008569 process Effects 0.000 claims abstract description 129
- 238000001514 detection method Methods 0.000 claims description 16
- 230000005540 biological transmission Effects 0.000 claims description 10
- 238000012546 transfer Methods 0.000 claims description 9
- 238000012163 sequencing technique Methods 0.000 claims description 6
- 238000004590 computer program Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 230000009286 beneficial effect Effects 0.000 abstract description 4
- 238000000151 deposition Methods 0.000 description 27
- 230000008021 deposition Effects 0.000 description 27
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 20
- 239000010408 film Substances 0.000 description 7
- 238000007599 discharging Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
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- 238000002360 preparation method Methods 0.000 description 2
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- 238000011161 development Methods 0.000 description 1
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- 238000007306 functionalization reaction Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
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- -1 solar energy Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention discloses a cluster type equipment control method and device and a storage medium, belonging to the technical field of cluster type equipment control and comprising the following steps: when a workpiece group enters cluster type equipment, acquiring identification information corresponding to the workpiece group; matching an instruction sequence to be executed of the workpiece group according to a preset rule and the identification information; the cluster type equipment transmits the workpiece group to the working chamber according to the instruction sequence, the current working state of the working chamber and the priority of the workpiece group to execute a preset process, and transmits the workpiece group out of the cluster type equipment after all instructions are executed; the beneficial effects are that: by decomposing each process flow into an instruction sequence, each process instruction can be independently edited, modified and executed, the flexibility of the process is improved, the yield of products is improved, and the production efficiency of equipment is improved.
Description
Technical Field
The present invention relates to the field of cluster-type device control technologies, and in particular, to a cluster-type device control method and apparatus, and a storage medium.
Background
With the rapid development of solar power generation technology, the preparation of high-efficiency and low-cost crystalline silicon solar cells has important significance for the utilization of solar energy, wherein Plasma Enhanced Chemical Vapor Deposition (PECVD) equipment is also key equipment for preparing high-efficiency crystalline silicon solar cells. The principle of PECVD technology is to decompose and react gases using plasma generated by glow discharge to produce a thin film.
The plasma enhanced chemical vapor deposition film process has the advantages of low process temperature, good film forming quality, high compactness of a deposited film and the like, the cluster type deposition equipment is an important structural form of PECVD deposition equipment, and has the advantages of high capacity, high functionalization and modularization degree, strong expandability and the like, so the cluster type deposition equipment is widely applied to the preparation fields of various films such as solar energy, semiconductors and the like, the existing cluster type deposition equipment has the defects of single control on process flow, low automation degree, insufficient process flexibility, incapability of supplementing and executing residual process flow when abnormal interruption occurs in the deposition process, integral scrapping of workpiece groups, incapability of editing and modifying instructions in the process of the process, incapability of simultaneously entering the deposition equipment for workpiece groups of different processing processes, incapability of effectively and reasonably scheduling when a plurality of workpiece groups are processed simultaneously, is not beneficial to improving the productivity of the equipment.
Disclosure of Invention
According to the above problems in the prior art, a cluster-type device control method, a cluster-type device control device and a storage medium are provided, each process flow is decomposed into an instruction sequence, each process instruction can be edited, modified and executed independently, the flexibility of the process is improved, the product yield is improved, meanwhile, multiple groups of workpiece groups can enter the device simultaneously, flexible allocation can be performed according to the priority of the workpiece groups, more workpiece groups are arranged in unit time to enter the device, and therefore the production efficiency of the device is improved.
The technical scheme specifically comprises the following steps:
a cluster tool control method for controlling a process group performing a predetermined process in a plurality of work chambers in a cluster tool, comprising the steps of:
receiving a plurality of groups of editable instruction sequences, wherein each workpiece group corresponds to identification information;
when the workpiece group enters the cluster type equipment, acquiring the identification information corresponding to the workpiece group;
matching the instruction sequence to be executed by the workpiece group according to a preset rule and the identification information;
transferring the workpiece group to the working chamber to execute the predetermined process according to the instruction sequence, the current working state of the working chamber and the priority of the workpiece group;
and after all the instructions are executed, conveying the workpiece group out of the cluster type equipment.
Preferably, the instruction sequence includes a plurality of sequentially arranged execution instructions, each of the execution instructions corresponds to a predetermined work chamber, and the cluster apparatus sequentially reads the execution instructions to transfer the workpiece group to the corresponding work chamber.
Preferably, each of the execution instructions further includes a process parameter to be set by the corresponding work chamber, and after the workpiece group is transferred to the work chamber, the work chamber executes a predetermined process according to the process parameter.
Preferably, wherein the transferring the workpiece group to the work chamber to perform the predetermined process according to the instruction sequence, the current work state of the work chamber and the priority of the workpiece group further comprises:
reading the instruction sequence corresponding to the workpiece group according to the priority of the workpiece group;
sequentially reading the execution instructions in the instruction sequence;
detecting the working state of the working chamber corresponding to the execution instruction, and conveying the workpiece group into the corresponding working chamber when the working chamber is in an idle state;
and performing parameter setting on the working chamber according to the process parameters in the execution instruction so as to complete the preset process.
Preferably, in the process of executing the predetermined process, the cluster device records and updates the execution progress of the current process in real time, and stores the execution progress in association with the workpiece group.
A cluster type equipment control device is used for controlling a workpiece group in cluster type equipment to execute a preset process in a plurality of working chambers, wherein each workpiece group corresponds to identification information, and the cluster type equipment control device further comprises:
the receiving module is used for receiving a plurality of groups of instruction sequences;
the editing module is connected with the receiving module and is used for editing the instruction sequence;
an obtaining module, configured to obtain the identification information corresponding to the workpiece group when the workpiece group enters the cluster device;
the matching module is connected with the acquisition module and the receiving module and is used for matching the instruction sequence to be executed by the workpiece group according to a preset rule and the identification information;
the detection module is used for detecting the current working state of each working chamber in real time;
the sequencing module is connected with the acquisition module and used for generating the priority of the workpiece group according to the identification information of the workpiece group;
the control module is connected with the matching module, the detection module and the sequencing module and is used for generating corresponding control signals according to the instruction sequence, the current working state of the working chamber and the priority of the workpiece group;
and the transmission module is connected with the control module and used for transmitting the workpiece group to the working chamber according to the control signal so as to execute the preset process and transmitting the workpiece group out of the cluster type equipment after all instructions are executed.
Preferably, the instruction sequence includes a plurality of sequentially arranged execution instructions, each of the execution instructions corresponds to a predetermined working chamber, and the control module sequentially reads the execution instructions and generates corresponding control signals according to the execution instructions;
each execution instruction further comprises corresponding process parameters required to be set by the working chamber, and after the transmission module transmits the workpiece group to the working chamber, the control module controls the working chamber to execute a preset process according to the process parameters.
Preferably, wherein the control module further comprises:
the extracting unit is used for extracting the instruction sequence corresponding to the workpiece group according to the priority of the workpiece group;
the reading unit is connected with the extracting unit and is used for sequentially reading the execution instructions in the instruction sequence;
the detection unit is connected with the reading unit and used for detecting whether the working chamber pointed by the execution instruction is in an idle state or not and generating a detection result;
the generating unit is connected with the detecting unit and the reading unit and generates the control signal when the detection result shows that the working chamber is idle;
and the setting unit is connected with the reading unit and the generating unit and is used for carrying out parameter setting on the working chamber pointed by the control signal according to the process parameters in the execution instruction.
Preferably, the method further comprises the following steps:
and the recording module is used for recording and updating the execution progress of the current process in real time in the process of executing the preset process, and associating and storing the execution progress and the workpiece group.
A readable storage medium, in which a computer program is stored, which when executed implements the above-described device control method.
The beneficial effects of the above technical scheme are that:
the cluster type equipment control method, the cluster type equipment control device and the storage medium are provided, each process flow is decomposed into the instruction sequence, each process instruction can be independently edited, modified and executed, the flexibility of the process is improved, the product yield is improved, meanwhile, a plurality of groups of workpiece groups can enter the equipment at the same time, flexible allocation can be carried out according to the priority of the workpiece groups, more workpiece groups are arranged in unit time to enter the equipment, and therefore the production efficiency of the equipment is improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a schematic structural view of a cluster type plasma enhanced chemical vapor deposition apparatus;
FIG. 2 is a flow chart illustrating the steps of a cluster tool control method according to a preferred embodiment of the present invention;
FIG. 3 is a flow chart of the substeps of step S3 based on FIG. 2 in the preferred embodiment of the present invention;
FIG. 4 is a schematic structural diagram of a cluster tool control apparatus according to a preferred embodiment of the present invention;
fig. 5 is a schematic diagram of the internal structure of the control module based on fig. 4 in the preferred embodiment of the present invention.
Detailed Description
The embodiments of the present application will be described in detail below with reference to the accompanying drawings.
The following description of the embodiments of the present application is provided by way of specific examples, and other advantages and effects of the present application will be readily apparent to those skilled in the art from the disclosure herein. It is to be understood that the embodiments described are only a few embodiments of the present application and not all embodiments. The present application is capable of other and different embodiments and its several details are capable of modifications and/or changes in various respects, all without departing from the spirit of the present application. It is to be noted that the features in the following embodiments and examples may be combined with each other without conflict. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It is noted that various aspects of the embodiments are described below within the scope of the appended claims. It should be apparent that the aspects described herein may be embodied in a wide variety of forms and that any specific structure and/or function described herein is merely illustrative. Based on the present application, one skilled in the art should appreciate that one aspect described herein may be implemented independently of any other aspects and that two or more of these aspects may be combined in various ways. For example, an apparatus may be implemented and/or a method practiced using any number of the aspects set forth herein. Additionally, such an apparatus may be implemented and/or such a method may be practiced using other structure and/or functionality in addition to one or more of the aspects set forth herein.
It should be noted that the drawings provided in the following embodiments are only for illustrating the basic idea of the present application, and the drawings only show the components related to the present application rather than the number, shape and size of the components in actual implementation, and the type, amount and ratio of the components in actual implementation may be changed arbitrarily, and the layout of the components may be more complicated.
In addition, in the following description, specific details are provided to facilitate a thorough understanding of the examples. However, it will be understood by those skilled in the art that the aspects may be practiced without these specific details.
In a cluster tool control method, wherein the cluster tool includes a plurality of working chambers, the cluster tool performs a predetermined process by transferring different workpiece groups to the different working chambers, and a plurality of editable instruction sequences are pre-stored in the cluster tool, and each workpiece group corresponds to an identification information, as shown in fig. 2, in a preferred embodiment of the invention, the tool control method further includes the following steps:
step S1, receiving a plurality of groups of editable instruction sequences, wherein each workpiece group corresponds to one identification information, and acquiring the identification information corresponding to the workpiece group when the workpiece group enters cluster type equipment;
step S2, matching the instruction sequence to be executed by the workpiece group according to the preset rule and the identification information;
step S3, transferring the workpiece group to the work chamber to execute the predetermined process according to the instruction sequence, the current work state of the work chamber and the priority of the workpiece group;
in step S4, after all the instructions are executed, the workpiece group is transferred out of the cluster tool.
It should be noted that, the step numbers are only numbers used for indicating the sequence of the steps in one specific embodiment of the present invention, and should not be construed as limiting the technical solution disclosed in the present invention.
As a preferred embodiment, the cluster type device pointed out by the invention can be a cluster type plasma enhanced chemical vapor deposition device, and can also be extended to other cluster type devices, including but not limited to a cluster type magnetron sputtering device, a cluster type thermal evaporation device and the like. The embodiments of the present invention will be described with reference to cluster plasma enhanced chemical vapor deposition apparatuses as examples, and it should be understood that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Specifically, in this embodiment, as shown in fig. 1, the cluster-type plasma enhanced chemical vapor deposition apparatus includes a plurality of working chambers, and in an embodiment of the present invention, the plurality of working chambers are further divided into: the device comprises a wafer inlet chamber a1, a wafer outlet chamber a2, a central conveying chamber a3, an I1 layer deposition chamber a4, an I2 layer deposition chamber a5, a P layer deposition chamber a6 and an N layer deposition chamber a7, wherein each working chamber is responsible for completing different functions in the process flow. The central conveying chamber is responsible for conveying the workpiece groups among other working chambers, the central conveying chamber a3 is arranged in the middle, the wafer inlet chamber a1, the wafer outlet chamber a2, the I1 layer deposition chamber a4, the I2 layer deposition chamber a5, the P layer deposition chamber a6 and the N layer deposition chamber a7 are respectively connected to the periphery of the central conveying chamber so as to form the whole structure of the cluster PECVD equipment, the mechanical arm conveying mechanism is arranged in the central conveying chamber, and the cluster PECVD equipment can put the workpiece groups into the working chambers through the mechanical arm to complete corresponding functions. The mechanical arm has a multilayer structure and can place a plurality of glass substrates, and the glass substrates which can be placed by the mechanical arm at one time are called a group of workpiece groups. The glass substrate is transferred between the working chambers in the PECVD device in the form of a workpiece group. The cluster type PECVD equipment comprises a platform which divides the equipment into an upper layer and a lower layer. Wherein the control cabinet and the vacuum pump set which are arranged on the upper layer are arranged on the platform. Each working chamber corresponds to one control cabinet, and automatic control devices such as a Programmable Logic Controller (PLC) and the like are installed in each control cabinet, so that the corresponding working chambers are automatically controlled. The radio frequency power supply is arranged in a power supply cabinet, and the radio frequency power supply cabinet is arranged in four chambers (I1 layer deposition chamber, I2 layer deposition chamber, P layer deposition chamber and N layer deposition chamber) which need to be subjected to process deposition. Each working chamber has an independent vacuum pump unit, which is also mounted on the platform. The cluster type PECVD equipment also comprises an external transmission line, specifically an automatic sheet feeding transmission line corresponding to the sheet feeding chamber and an automatic sheet discharging transmission line corresponding to the sheet discharging chamber, and is responsible for transmitting the workpiece group into the sheet feeding working chamber and receiving the workpiece group which is positioned in the sheet discharging working chamber and finishes the process.
Specifically, in this embodiment, a plurality of groups of editable instruction sequences are stored in the cluster type device in advance, each group of instruction sequences corresponds to one process recipe, the instruction sequences can be generated by inputting in advance through a process editor, and the instruction sequences of each group are distinguished by names. Meanwhile, in order to distinguish each workpiece group entering the PECVD equipment, identification information is preset for each workpiece group, the identification information can be serial numbers, the serial numbers can be automatically generated according to the time when the workpiece groups enter the PECVD equipment, can also be automatically generated according to the serial numbers of the workpiece groups entering the PECVD equipment on the same day, and can also be generated by artificial marking so as to identify and distinguish each workpiece group.
When the workpiece group enters the cluster type equipment, firstly, the identification information on the workpiece group is read to identify the workpiece group, and then, a corresponding instruction sequence is matched for each workpiece group according to a preset rule, wherein the preset rule can be preset according to the actual condition of the workpiece group. After the process recipe required to be executed by the current workpiece group is obtained, the cluster type equipment is combined with the current idle state of each working chamber, and when a plurality of groups of workpiece groups are required to execute the same process, the workpiece groups are conveyed into the proper working chambers according to the preset priority of each workpiece group in the device so as to execute the preset process. And after the instructions corresponding to all the processes are executed, conveying the workpiece group out of the cluster type equipment.
In a preferred embodiment of the present invention, the command sequence includes a plurality of sequentially arranged execution commands, each execution command corresponds to a predetermined working chamber, and the cluster tool sequentially reads the execution commands to transfer the workpiece groups to the corresponding working chambers.
Specifically, in this embodiment, each set of instruction sequence includes a plurality of sequentially arranged execution instructions, each of which is directed to a predetermined working chamber, for example, in the PECVD apparatus indicated in the above embodiments, a P-layer process deposition instruction is directed to a P-layer deposition chamber, an N-layer process deposition instruction is directed to an N-layer deposition chamber, two instructions of wafer-in and preheating are directed to a wafer-in chamber, and a wafer-out instruction is directed to a wafer-out chamber.
In a preferred embodiment of the present invention, each of the execution instructions further includes a process parameter required to be set by the corresponding working chamber, and after the workpiece group is transferred to the working chamber, the working chamber executes a predetermined process according to the process parameter.
Specifically, in this embodiment, each of the execution instructions further includes a plurality of editable process parameters, for example, the P-layer process deposition instruction includes setting a plurality of process parameters such as temperature, pressure, rf power, reactant gas type and flow rate, and further includes a specific opening vacuum gate valve, which is used to transfer the workpiece set from the central transfer chamber robot to the P-layer deposition chamber, closing the vacuum gate valve, performing the P-layer process deposition, and after the film deposition is completed, opening the vacuum gate valve to transfer the workpiece set to the central transfer chamber robot. The set parameters related to the process are used as the process parameters of the instruction, such as the process pressure corresponding to the P-layer deposition, the process gas flow, the power supply power, and so on. Also, the heating instruction requires setting parameters such as heating temperature and time for each section, etc. which are required for heating. The sheet feeding command requires setting parameters such as vacuum degree to be achieved after the workpiece group enters the chamber and is exhausted.
And compiling each execution instruction in the instruction sequence according to actual process requirements, and setting corresponding process parameters in the execution instructions, wherein one formula has a process formula name to form an instruction sequence. This editing function is done by an editor internal to the cluster device or an editor provided externally. Meanwhile, the editor also supports functions of importing, deleting, saving and the like. In a specific embodiment, the cluster type device comprises an upper industrial personal computer, and a plurality of instruction sequences can exist in industrial control software of the upper industrial personal computer. And the upper industrial control unit downloads the execution instruction in the instruction sequence and the parameters in the execution instruction to the programmable logic controllers in the control cabinets corresponding to the working chambers. The upper industrial personal computer can be communicated with the programmable logic controllers corresponding to all the working chambers and has the functions of data acquisition and monitoring control.
In a preferred embodiment of the present invention, as shown in fig. 3, step S3 further includes:
step S31, reading the instruction sequence corresponding to the workpiece group according to the priority of the workpiece group;
step S32, sequentially reading the execution instructions in the instruction sequence;
step S33, detecting the working state of the working chamber corresponding to the execution instruction, and transferring the workpiece group into the corresponding working chamber when the working chamber is in an idle state;
and step S34, setting parameters of the working chamber according to the process parameters in the execution instruction, and further completing the preset process.
Specifically, in this embodiment, after the identification information of the workpiece group is obtained, the instruction sequence corresponding to the workpiece group is read according to the priority of the workpiece group, and the upper industrial personal computer reads the execution instruction according to the identification information of the current workpiece group and the corresponding instruction sequence. Multiple groups of workpieces may have the phenomenon that one working chamber needs to be occupied at the same time when the same instruction is executed. When two or more groups of workpieces in the equipment need to occupy the same working chamber to execute the process command, scheduling needs to be performed according to a selected processing principle, for example, it is determined that the currently executed group of workpieces has more commands, i.e., the group of workpieces is close to completion, is preferentially executed, and other groups of workpieces wait or execute other set process commands, e.g., wait in a film feeding chamber or wait in other idle chambers. Or directly appointing a workpiece group with a certain number to be executed preferentially. Other groups of the tools are to avoid the designated group of tools.
After the workpiece group enters the working chamber, the process parameters of the instruction are requested according to the current execution instruction of the workpiece group, and the process flow is executed according to the parameters. The execution can be performed according to the original instruction sequence in the process. The instructions to be executed next and later on by the workpiece can be changed at any time by modifying the execution instructions in the instruction sequence. After the current execution instruction content is executed by the workpiece group, when a next instruction is requested, the instruction is changed, the function of replacing the process formula can be realized, and the execution instructions corresponding to the rest process flows or other process flows can be executed in a supplementing manner when the process is abnormally interrupted. The PECVD equipment judges whether the next process instruction can be executed immediately or needs to wait and send the process instruction into a buffer area, process pause or interrupt and other operations after the current instruction is finished according to the name of the next instruction, the working states (standby, instruction execution, fault and other states) of each working chamber and the central transmission chamber, and the execution conditions, the execution priority and the scheduling principle of other workpiece groups.
In step S3, in the process of executing the predetermined process, the cluster-based device records and updates the execution schedule of the current process in real time, and stores the execution schedule in association with the workpiece group.
Specifically, in this embodiment, after the execution of one execution instruction is completed, the cluster-type device records and updates the execution progress of the current process, in a specific embodiment, a data block is established for each group of components, and after the execution of each instruction is completed, the cluster-type device records and updates data information in the data block corresponding to the group of components, or adds data information according to the execution condition of the execution instruction, including but not limited to data information such as the time when the process starts to be executed, the end time, whether the process normally ends, and the like. After the workpiece group finishes the process, the cluster type equipment stores the current data block information, and can transmit the current data block information to a manufacturing process executing device of a manufacturing enterprise on the downstream of the production line and the like for subsequent operation processes.
A cluster tool control apparatus, applied to a cluster tool, wherein the cluster tool includes a plurality of working chambers, the cluster tool performs a predetermined process by transferring different workpiece groups to the different working chambers, each workpiece group corresponding to an identification information, as shown in fig. 4, and further includes:
the system comprises a receiving module 1, wherein a plurality of groups of instruction sequences are stored in the receiving module 1 in advance;
the editing module 2 is connected with the receiving module 1 and is used for editing and modifying the instruction sequence;
the acquisition module 3 is used for acquiring identification information corresponding to the workpiece group when the workpiece group enters the cluster type equipment;
the matching module 4 is connected with the acquisition module 3 and the receiving module 1 and is used for matching the instruction sequence to be executed of the workpiece group according to the preset rule and the identification information;
the detection module 5 is used for detecting the current working state of each working chamber in real time;
the sequencing module 6 is connected with the acquisition module 3 and used for generating the priority of the workpiece group according to the identification information of the workpiece group;
the control module 7 is connected with the matching module 4, the detection module 5 and the sequencing module 6 and is used for generating corresponding control signals according to the instruction sequence, the current working state of the working chamber and the priority of the workpiece group;
and the transmission module 8 is connected with the control module 7 and used for transmitting the workpiece group to the working chamber according to the control signal so as to execute a preset process, and transmitting the workpiece group out of the cluster type equipment after all instructions are executed.
As a preferred embodiment, a plurality of sets of editable instruction sequences are stored in the receiving module 1 in advance, each set of instruction sequences corresponds to a process recipe, the instruction sequences can be input and generated in advance through the editing module 2, and the instruction sequences of the sets are distinguished through names.
When a workpiece group enters cluster type equipment, firstly, the acquisition module 3 reads identification information on the workpiece group to identify the workpiece group, and then the matching module 4 matches corresponding instruction sequences for each workpiece group according to a preset rule, wherein the preset rule can be preset according to the actual condition of the workpiece group. After obtaining the process recipe to be executed by the current workpiece group, the detection module 5 detects the current idle state of each working chamber of the cluster type equipment, and when a plurality of groups of workpiece groups need to execute the same process, the sorting module 6 sorts the priority of each workpiece group according to the preset rule in the device, finally the control module 7 generates a control signal according to the information, the transmission module 8 transmits the workpiece groups into the proper working chambers according to the control signal to execute the preset process, and transmits the workpiece groups out of the cluster type equipment after the execution of the instructions corresponding to all the processes is finished.
In a preferred embodiment of the present invention, the command sequence includes a plurality of sequentially arranged execution commands, each execution command corresponds to a predetermined working chamber, and the control module 7 sequentially reads the execution commands and generates corresponding control signals according to the execution commands.
In a preferred embodiment of the present invention, each execution instruction further includes a process parameter to be set for the corresponding working chamber, and after the transfer module 8 transfers the workpiece group to the working chamber, the control module 7 controls the working chamber to execute a predetermined process according to the process parameter.
In a preferred embodiment of the present invention, as shown in fig. 5, the control module 7 further comprises:
an extracting unit 70, configured to extract an instruction sequence corresponding to the workpiece group according to the priority of the workpiece group;
a reading unit 71, connected to the extracting unit 70, for sequentially reading the execution instructions in the instruction sequence;
the detection unit 72 is connected with the reading unit 71 and is used for detecting whether the working chamber pointed by the execution instruction is in an idle state or not and generating a detection result;
a generating unit 73, connected to the detecting unit 72 and the reading unit 71, for generating a control signal when the detection result indicates that the working chamber is idle;
and the setting unit 74 is connected with the reading unit 71 and the generating unit 73 and is used for carrying out parameter setting on the working chamber pointed by the control signal according to the process parameters in the execution instruction.
Specifically, in this embodiment, after obtaining the identification information of the workpiece group, the extracting unit 70 extracts the instruction sequence corresponding to the workpiece group according to the priority of the workpiece group, because the PECVD apparatus can support one group of workpieces, and two groups of workpieces and multiple groups of workpieces automatically execute the process flow in the apparatus at the same time. Multiple groups of workpieces may have the phenomenon that one working chamber needs to be occupied at the same time when the same instruction is executed. When two or more groups of workpieces in the equipment need to occupy the same working chamber to execute the process command, scheduling needs to be performed according to a selected processing principle, for example, it is determined that the currently executed group of workpieces has more commands, i.e., the group of workpieces is close to completion, is preferentially executed, and other groups of workpieces wait or execute other set process commands, e.g., wait in a film feeding chamber or wait in other idle chambers. Or directly appointing a workpiece group with a certain number to be executed preferentially. Other workpiece groups need to avoid the specified workpiece group, and the extracting unit 70 preferentially extracts the instruction sequence corresponding to the workpiece group with the specified number.
In a preferred embodiment of the present invention, the method further comprises:
the recording module 9 is configured to record and update the execution progress of the current process in real time during the process of executing the predetermined process, and store the execution progress in association with the workpiece group.
Specifically, in this embodiment, the recording module 9 establishes a data block for each group of workpieces, after the execution of the execution instruction is completed, the recording module 9 writes the execution progress of the current process into the data block, and after the execution of each instruction is completed, the recording module 9 records and updates data information in the data block corresponding to the workpiece group.
The beneficial effects of the above technical scheme are that:
the cluster type equipment control method and the cluster type equipment control device have the advantages that each process flow is decomposed into the instruction sequence, each process instruction can be independently edited, modified and executed, the flexibility of the process is improved, the product yield is improved, meanwhile, a plurality of groups of workpiece groups can enter the equipment at the same time, the flexible allocation can be carried out according to the priority of the workpiece groups, more workpiece groups are arranged in unit time to enter the equipment, and the production efficiency of the equipment is improved.
The above description is only for the specific embodiments of the present application, but the scope of the present application is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present application should be covered within the scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.
Claims (10)
1. A cluster tool control method for controlling a process group to perform a predetermined process in a plurality of work chambers in a cluster tool, comprising the steps of:
receiving a plurality of groups of editable instruction sequences, wherein each workpiece group corresponds to identification information;
when the workpiece group enters the cluster type equipment, acquiring the identification information corresponding to the workpiece group;
matching the instruction sequence to be executed by the workpiece group according to a preset rule and the identification information;
transferring the workpiece group to the working chamber to execute the predetermined process according to the instruction sequence, the current working state of the working chamber and the priority of the workpiece group;
and after all the instructions are executed, conveying the workpiece group out of the cluster type equipment.
2. The cluster tool control method of claim 1, wherein the sequence of instructions includes a plurality of sequentially arranged execution instructions, each of the execution instructions corresponding to a predetermined one of the working chambers, and the cluster tool sequentially reads the execution instructions to transfer the workpiece groups to the corresponding working chambers.
3. The cluster tool control method according to claim 2, wherein each of the execution commands further includes a process parameter to be set for the corresponding working chamber, and after the workpiece group is transferred to the working chamber, the working chamber performs a predetermined process according to the process parameter.
4. The cluster tool control method of claim 3, wherein said transferring the set of workpieces to the work chamber to perform the predetermined process according to the instruction sequence, the current working status of the work chamber and the priority of the set of workpieces, further comprises:
reading the instruction sequence corresponding to the workpiece group according to the priority of the workpiece group;
sequentially reading the execution instructions in the instruction sequence;
detecting the working state of the working chamber corresponding to the execution instruction, and conveying the workpiece group into the corresponding working chamber when the working chamber is in an idle state;
and performing parameter setting on the working chamber according to the process parameters in the execution instruction so as to complete the preset process.
5. The cluster tool control method according to claim 1, wherein the cluster tool records and updates the execution progress of the current process in real time during the execution of the predetermined process, and stores the execution progress in association with the workpiece group.
6. A cluster type equipment control device is used for controlling a workpiece group in cluster type equipment to execute a preset process in a plurality of working chambers, and is characterized in that each workpiece group corresponds to identification information, and the cluster type equipment control device further comprises:
the receiving module is used for receiving a plurality of groups of instruction sequences;
the editing module is connected with the receiving module and is used for editing the instruction sequence;
an obtaining module, configured to obtain the identification information corresponding to the workpiece group when the workpiece group enters the cluster device;
the matching module is connected with the acquisition module and the receiving module and is used for matching the instruction sequence to be executed by the workpiece group according to a preset rule and the identification information;
the detection module is used for detecting the current working state of each working chamber in real time;
the sequencing module is connected with the acquisition module and used for generating the priority of the workpiece group according to the identification information of the workpiece group;
the control module is connected with the matching module, the detection module and the sequencing module and is used for generating corresponding control signals according to the instruction sequence, the current working state of the working chamber and the priority of the workpiece group;
and the transmission module is connected with the control module and used for transmitting the workpiece group to the working chamber according to the control signal so as to execute the preset process and transmitting the workpiece group out of the cluster type equipment after all instructions are executed.
7. The cluster tool control device of claim 6, wherein the command sequence comprises a plurality of sequentially arranged execution commands, each of the execution commands corresponds to a predetermined working chamber, and the control module sequentially reads the execution commands and generates the corresponding control signals according to the execution commands;
each execution instruction further comprises corresponding process parameters required to be set by the working chamber, and after the transmission module transmits the workpiece group to the working chamber, the control module controls the working chamber to execute a preset process according to the process parameters.
8. The cluster tool control apparatus of claim 7, wherein the control module further comprises:
the extracting unit is used for extracting the instruction sequence corresponding to the workpiece group according to the priority of the workpiece group;
the reading unit is connected with the extracting unit and is used for sequentially reading the execution instructions in the instruction sequence;
the detection unit is connected with the reading unit and used for detecting whether the working chamber pointed by the execution instruction is in an idle state or not and generating a detection result;
the generating unit is connected with the detecting unit and the reading unit and generates the control signal when the detection result shows that the working chamber is idle;
and the setting unit is connected with the reading unit and the generating unit and is used for carrying out parameter setting on the working chamber pointed by the control signal according to the process parameters in the execution instruction.
9. The cluster tool control apparatus according to claim 6, further comprising:
and the recording module is used for recording and updating the execution progress of the current process in real time in the process of executing the preset process, and storing the execution progress and the workpiece group in a correlation manner.
10. A readable storage medium, characterized in that a computer program is stored therein, which when executed implements the device control method of any one of claims 1 to 5.
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