CN112337529A

CN112337529A - Grain polishing device

Info

Publication number: CN112337529A
Application number: CN202011350101.3A
Authority: CN
Inventors: 马相阳
Original assignee: Individual
Current assignee: Individual
Priority date: 2020-11-26
Filing date: 2020-11-26
Publication date: 2021-02-09
Anticipated expiration: 2040-11-26
Also published as: CN112337529B

Abstract

The invention provides a grain polishing device, which comprises a frame body, a rotary drum, a polishing device and a polishing device, wherein the rotary drum is rotatably arranged on the frame body and comprises a polygonal framework and a screen coated on the polygonal framework, and a polishing channel for grain circulation is formed by the screen; and a plurality of partition plates which are blocked on the grain circulation path are fixedly arranged in the polishing channel, two adjacent partition plates and the screen mesh between the two adjacent partition plates form a polishing cavity, and each partition plate is provided with a circulation hole for the grain to circulate in the two adjacent polishing cavities. The grain polishing device does not need to use easily-damaged consumables such as polishing cloth and the like, and has lower use and maintenance cost.

Description

Grain polishing device

Technical Field

The invention relates to the technical field of grain polishing equipment, in particular to a grain polishing device.

Background

In the seed processing and agricultural and sideline product processing industries, the surfaces of crops such as beans, grains and the like need to be polished, the conventional polishing machine adopts a mode that polishing cloth is fixed on a spiral shaft, and the polishing cloth is driven by the rotation of the spiral shaft to rub with materials, so that the materials are polished; the existing polishing machine has the defects that: the polishing cloth on the spiral shaft needs to be frequently replaced, the screen on the polishing machine needs to be frequently replaced, and the maintenance cost is high.

Disclosure of Invention

In view of this, the present invention provides a grain polishing apparatus, so as to avoid using consumables and reduce the maintenance cost.

In order to achieve the purpose, the technical scheme of the invention is realized as follows:

a grain polishing device, comprising:

a frame body;

the rotary drum is rotatably arranged on the frame body and comprises a multi-side framework and a screen coated on the multi-side framework, and the screen is surrounded into a polishing channel for grain circulation; and a plurality of partition plates which are blocked on the grain circulation path are fixedly arranged in the polishing channel, two adjacent partition plates and the screen mesh between the two adjacent partition plates form a polishing cavity, and each partition plate is provided with a circulation hole for the grain to circulate in the two adjacent polishing cavities.

Further, the volume of each polishing chamber is set to change along the axial direction of the roller, and along the grain circulation direction, the volume of each polishing chamber is set to increase and then decrease.

Furthermore, the multi-side framework comprises a rotating shaft which is rotatably arranged on the framework body and a framework which is sleeved on the rotating shaft, the framework is supported and fixed on the rotating shaft through a supporting rod, and the screen is coated on the periphery of the framework.

Furthermore, a feeding disc is fixedly arranged on the frame body, a central hole for the rotating shaft to pass through is formed in the feeding disc, a sleeving hole for rotating is formed in an end plate of the feeding end of the roller, the sleeving hole is formed in the feeding disc, and a feeding channel for allowing external grains to enter the polishing channel is formed in the feeding disc.

Further, the flow holes of each of the separators are polygonal holes, and at least two of the flow holes of the separators have different sizes.

Furthermore, each side wall of the circulation hole is fixedly provided with a material stopping plate which is inclined towards the feeding end of the roller and the middle part of the circulation hole.

Furthermore, the grain polishing device also comprises a dust cover fixedly arranged on the frame body, the roller is accommodated in the dust cover, a plurality of ventilation holes are formed in the dust cover, and the grain polishing device also comprises a draught fan which is used for exhausting air from the dust cover through the ventilation holes.

Furthermore, a plurality of isolation plates are arranged in the dust cover, and each isolation plate is used for separating the inner space of the dust cover into a plurality of dust removal cabins along the axial direction of the roller.

Furthermore, a material cleaning structure is arranged in the roller and is used for emptying grains in the roller when the roller rotates reversely.

Further, the material cleaning structure comprises material cleaning holes formed in the edge of each partition plate, and the side wall of the rear side of each material cleaning hole inclines towards the feeding end of the roller along the direction of reverse rotation of the roller; the material cleaning holes on the partition plates are arranged in a staggered manner; when the roller rotates reversely along the flow direction of the grains, the material cleaning hole on the rear clapboard is positioned behind the material cleaning hole on the front clapboard; the material cleaning structure further comprises a material guide plate connected between every two adjacent material cleaning holes, and one side of the material guide plate is attached to the screen.

Compared with the prior art, the invention has the following advantages:

according to the grain polishing device, the plurality of partition plates are arranged in the polishing channel surrounded by the screen, the polishing channel is divided into the plurality of polishing chambers by the partition plates, grains can be fully rubbed with each other in the polishing chambers, namely, the grains can be polished by the mutual friction among the grains, the grain polishing device does not need to use polishing cloth and other easily-damaged consumables, the grain polishing device can be low in later-stage use cost, and the maintenance difficulty is reduced.

Drawings

The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate an embodiment of the invention and, together with the description, serve to explain the invention and not to limit the invention. In the drawings:

fig. 1 is a front view of a grain polishing apparatus according to an embodiment of the present invention;

FIG. 2 is an isometric view of the internal structure of a polygonal grain polishing apparatus according to an embodiment of the present invention;

FIG. 3 is an isometric view of the interior of a drum according to an embodiment of the invention;

FIG. 4 is an enlarged view of a portion of FIG. 2 at A;

FIG. 5 is an enlarged view of a portion of FIG. 3 at B;

FIG. 6 is a front view of a drum according to an embodiment of the present invention;

fig. 7 is a schematic view illustrating the matching of the material cleaning holes and the material guide plates according to the embodiment of the invention;

FIG. 8 is a schematic structural diagram of a material intercepting tank according to an embodiment of the present invention;

fig. 9 is a schematic view illustrating a state in which the drum shown in fig. 7 is rotated counterclockwise by a certain angle.

Description of reference numerals:

1-frame body, 11-feeding disc, 101-center hole, 102-mounting hole, 2-roller, 21-polygonal framework, 211-rotating shaft, 212-frame, 213-supporting rod, 214-feeding end plate, 215-discharging end plate, 22-screen, 201-sleeving hole, 3-partition plate, 31-material blocking plate, 32-first flat plate, 33-second flat plate, 34-sixth flat plate, 35-material guiding plate, 301-circulating hole, 302-material cleaning hole, 4-feeding hopper, 5-material blocking disc, 6-material blocking plate, 61-limiting plate, 601-material blocking groove, 7-dust cover and 701-vent hole.

Detailed Description

To facilitate an understanding of the invention, the invention will now be described more fully with reference to the accompanying drawings. Several embodiments of the invention are shown in the drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.

It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

The embodiment relates to a grain polishing device, which is shown in fig. 1 to 3 and comprises a frame body 1 and a rotary drum 2 arranged on the frame body 1 in a rotatable manner; the roller 2 comprises a polygonal framework 21 and a screen 22 coated on the polygonal framework 21, and the screen 22 encloses a polishing channel for grain circulation; a plurality of clapboards 3 which are blocked on the grain flow path are fixedly arranged in the polishing channel, two adjacent clapboards 3 and the screen 22 between the two clapboards 3 form a polishing cavity, and each clapboard 3 is provided with a circulation hole 301 for grain to circulate in the two adjacent polishing cavities.

In this embodiment, the polygonal frame 21 specifically includes a rotating shaft 211 rotatably disposed on the frame body 1, and a frame 212 sleeved on the rotating shaft 211, the frame 212 is supported and fixed on the rotating shaft 211 via a supporting rod 213, and the screen 22 is specifically wrapped and fixed on the outer periphery of the frame 212. Referring to fig. 3, the frame 212 of the present embodiment includes a hexagonal prism-shaped frame body, and end plates respectively fixed to two ends of the frame body, wherein the hexagonal prism-shaped frame 212 means that a cross section of the frame 212 perpendicular to a length direction thereof is a regular hexagon; the screen 22 on the outer periphery of the frame 212 is also in a hexagonal prism shape, the screen 22 encloses the polishing channel, or the inner hole of the screen 22 forms the polishing channel, a feeding channel for feeding the grain into the polishing channel is formed on an end plate at one end of the frame, a discharging channel for discharging the grain from the polishing channel is formed on an end plate at the other end of the screen 22, for convenience of description, the end plate with the feeding channel is referred to as a feeding end plate 214, and the other end plate is referred to as a discharging end plate 215.

In this embodiment, a preferable feeding and discharging structure is provided, as shown in fig. 2 to 4, a feeding tray 11 is fixedly disposed on a frame body 1, a central hole 101 for a rotating shaft 211 on a drum 2 to pass through is formed in the feeding tray 11, a bearing is fixedly disposed on the frame body 1, and the rotating shaft 211 passes through the central hole 101 and then is inserted into the bearing; and the above-mentioned bearings are spaced from the central hole 101 so that the rotary shaft 211 is supported only by the bearings and not by the feed tray 11 when rotating on the frame body 1. A sleeve hole 201 is formed in the feeding end plate 214 to be capable of being sleeved on the feeding disc 11, the sleeve hole 201 is disposed through the feeding end plate 214 along a thickness direction of the feeding end plate 214, and the sleeve hole 201 is spaced from the feeding disc 11 so that the feeding end plate 214 can rotate relative to the feeding disc 11. In summary, the drum 2 of the present embodiment is supported only by the bearing and not by the feed tray 11, so that the drum 2 of the present embodiment can rotate relative to the feed tray 11.

In the present embodiment, the feeding channel is disposed on the feeding tray 11, and specifically, as shown in fig. 1, fig. 2 and fig. 4, the feeding hopper 4 is fixedly disposed on the feeding tray 11, one end of the feeding hopper 4 is located outside the feeding tray 11, and the other end of the feeding hopper 4 extends to the inside of the feeding tray 11 through a mounting hole 102 configured on the feeding tray 11, and the feeding channel is specifically formed by an inner hole of the feeding hopper 4. Similarly, a discharge tray may be fixedly disposed on the frame body 1, and the arrangement of the discharge tray is the same as the arrangement principle of the feeding tray 11, which will not be described herein again.

Through setting up feeding structure and row material structure according to above-mentioned mode, compare in present grain burnishing device and need accomplish the polishing of the material in a storehouse just can carry out the polishing of next storehouse material after polishing, when grain burnishing device's of this embodiment cylinder 2 rotates in order to polish its inside grain, feeding disk 11 and feed channel, row material disk and row material channel remain static for support body 1, the outside still can be convenient realization to the interior feeding of polishing passageway, the grain that discharges after this grain burnishing device polishing also can be convenient collects, cooperate with the grain polishing mode of this embodiment, the grain burnishing device of this embodiment sustainable completion feeding, polishing and row material; therefore, the grain polishing device of the embodiment can greatly improve the grain polishing efficiency; particularly can be matched with a subsequent grain processing device to realize continuous production.

Referring to fig. 3, each partition 3 of the present embodiment is also in a regular hexagon shape, each partition 3 is fixed on the frame, and the periphery of each partition 3 is attached to the screen 22 to prevent grains from passing between the partition 3 and the screen 22, and two adjacent partitions 3 and the screen 22 therebetween form a polishing chamber; and the middle part of each partition plate 3 is provided with a circulation hole 301 for grains to flow into the next polishing chamber from the current polishing chamber.

The grain can enter the next polishing chamber after being fully rubbed with each other in each polishing chamber by dividing the polishing channel into a plurality of polishing chambers, and the grain is continuously polished; and through setting up each polishing cavity, can avoid polished grain and the unpolished grain cross contamination of new income to can make this grain burnishing device have better polishing effect. On this basis, this implementation provides a preferred polishing cavity's arrangement, specifically speaking, the volume of each polishing cavity is set to change along the axial of cylinder 2, through setting up the volume of each polishing cavity to change along the axial of cylinder for when grain is polished in the polishing cavity of different volumes, the time and the frictional force of rubbing each other between the grain are different, thereby can be more abundant carry out the mutual friction between the grain.

The present embodiment also provides an arrangement for providing a better effect of the partition, in particular, along the axial direction of the drum 2, i.e. along the direction of circulation of the grains, the volume of each polishing chamber is arranged to increase and then decrease; that is, the partitions 3 may be arranged in such a manner that the distances between adjacent two partitions are sequentially increased and then decreased in the circulation direction of the grains.

By setting the volume of each polishing chamber in the above manner, the following advantages can be obtained: firstly, the volume of the polishing chamber at the front end is set to be smaller, so that the polishing chamber at the front end can be quickly stockpiled, grain crushing caused by direct impact of grains on the screen 22 is reduced, and the floating soil on the surface of the grains can be conveniently removed; secondly, the volume of the polishing chamber in the middle part is set to be larger, so that grains can have longer friction time in the polishing chamber in the middle part, and firm dust on the surfaces of the grains can be removed; finally, because the polishing chamber in the middle has fully removed the dust on the surface of the grain, the grain in the polishing chamber reaching the rear end is clean grain, and the volume of the polishing chamber at the rear end is set to be smaller, so that the grain can be quickly rubbed again to improve the smoothness of the grain surface.

The present embodiment provides a way of arranging the partition plates 3 with a good effect, specifically, the number of the partition plates 3 is seven, and the partition plates 3, the feed end plate 214 and the discharge end plate 215 divide eight polishing chambers; along the flow direction of the grains, the volume ratio of each polishing chamber is 1: 3.8-4.2: 4.8-5.2: 1.8-2.2: 0.8-1; and further preferably 1:4:5:5:2:1:1: 1. A specific example is that, along the flow direction of the grain, the distance between the first partition plate 3 and the feeding end plate 214 is 200mm, the distance between the subsequent partition plate 3 and the previous partition plate 3 is sequentially 800mm, 1000mm, 400mm, 200mm, and the distance between the discharging end plate 215 and the last partition plate 3 is 200 mm. By arranging the partition plates 3 in the above manner, it is verified that grains can have a good polishing effect in the grain polishing device of the embodiment.

In this embodiment, in the grain flow direction, the size of the flow holes 301 on the middle partition boards 3 is larger than the size of the flow holes 301 on the two end partition boards 3; the size of the flow hole 301 in the rear separator 3 is larger than the size of the flow hole 301 in the front separator 3; by arranging the flow holes 301 in the above manner, firstly, the arrangement of the flow holes 301 with different sizes is also beneficial to changing the mutual friction and impact force of grains in different polishing chambers, so that the mutual friction among the grains is more sufficient and comprehensive, and the grains have better polishing effect; secondly, the size of the circulation holes 301 on the middle partition plate 3 is set to be larger than the size of the circulation holes 301 on the partition plates 3 at the two ends, so that grains can be sufficiently rubbed with each other; the reason why the sizes of the circulation holes 301 on the partition boards 3 at the rear end are set to be larger than the sizes of the circulation holes 301 on the partition boards 3 at the front end is that grains are already net beams in the polishing cavities at the rear end, and the grains can be rapidly rubbed to provide grain surface smoothness by setting the larger sizes of the circulation holes 301.

A specific example is that each partition plate 3 adopts a regular hexagonal plate with a side length of 660mm, and along the flow path of the grain, the flow hole 301 on the partition plate 3 at the first position adopts a regular hexagonal hole with a side length of 343mm, the flow holes 301 on the partition plates 3 at the second position to the fifth position adopt a regular hexagonal hole with a side length of 543mm, and the flow holes 301 on the partition plates 3 at the sixth position to the eighth position adopt a regular hexagonal hole with a side length of 443 mm. When the frame has an octagonal prism shape or another shape, the flow holes 301 preferably have a corresponding shape.

Referring to fig. 5, the baffle plates 31 inclined toward the middle of the circulation hole 301 and the feed end of the drum 2 are fixedly disposed on each side wall of the circulation hole 301, and the end portions of the baffle plates 31 on each side wall of the same circulation hole 301 form a hexagon with a cross-sectional area smaller than that of the circulation hole 301 itself.

By arranging the material blocking plates 31 on the side walls of the flow through hole 301, the situation that materials flow into the next polishing cavity from the current polishing cavity too fast can be avoided, so that the residence time of grains in a single polishing cavity is prolonged, and the contact condition between the grains can be locally changed by arranging the material blocking plates 31, so that the friction force and the impact force between the grains can be changed, and the grains have better polishing effect in each polishing cavity.

In this embodiment, at least one of the polishing chambers is provided with a material blocking disc 5 fixedly sleeved on the rotating shaft 211 for slowing down the flow rate of the grains; therefore, the detention time in the grain polishing channel is prolonged, so that mutual friction among grains can be more sufficient, and the grain polishing device has a better polishing effect. In this embodiment, the material blocking tray 5 is one and is disposed between the last partition 3 and the previous partition 3.

This embodiment still provides one kind and can make this hinder charging tray 5 play the structure of better effect, refer to fig. 6 and show, what this embodiment hindered charging tray 5 is discoid, and should hinder charging tray 5 edge to this grain burnishing device's feed end and to should hinder charging tray 5 outside slope extension, or, should hinder charging tray 5 and be the loudspeaker form of horn mouth towards the feed end, through hindering charging tray 5 to set up according to above-mentioned structure, can be under the same size, further prolong the residence time of grain in the polishing passageway, improve the grain burnishing device's of this embodiment polishing effect.

In this embodiment, a better way of arranging the supporting rod 213 is further provided, as shown in fig. 6, at least a part of the polishing chamber is provided with the supporting rod 213 obliquely, so that the supporting rod 213 can support the frame body and stir the grains in the polishing chamber along with the rotation of the drum 2, thereby changing the relative positions of the grains in the polishing chamber, changing the movement track of the grains, and changing the friction force between the grains, and in general, the polishing effect of the grain polishing apparatus of this embodiment can be improved.

Referring to fig. 6 and 7, in the embodiment, in the polishing chambers with larger sizes in the middle, two groups of the support rods 213 are provided, each group of the support rods 213 is provided in a plurality of annular, uniform and spaced arrangement along the axis of the rotating shaft 211, one end of each support rod 213 is fixedly connected with the rotating shaft 211, and the other end thereof extends obliquely to be fixedly connected with the frame, so that the grain in the polishing chambers can be stirred more sufficiently, that is, the polishing effect can be better.

In this embodiment, a material cleaning structure is arranged in the roller 2 and used for emptying grains in the roller 2 when the roller 2 rotates reversely. Through setting up this clear material structure for the grain burnishing device of this embodiment is when stopping using or need polish another kind of grain, the antiport of accessible cylinder 2, and the convenient grain to in the cylinder 2 is evacuated, thereby makes things convenient for the use of the grain burnishing device of this embodiment.

Referring to fig. 7, the cleaning structure of the present embodiment includes cleaning holes 302 formed on the edge of each partition 3, and the side wall of the rear side of each cleaning hole 302 is inclined toward the feed end of the drum 2 in the direction of reverse rotation of the drum 2 (indicated by an arrow in fig. 7); the material cleaning holes 302 on each partition plate 3 are arranged in a staggered manner, and when the roller 2 rotates reversely along the flow direction of grains, the material cleaning hole 302 on the next partition plate 3 is positioned behind the material cleaning hole 302 on the previous partition plate 3; the material cleaning structure further comprises a material guide plate 35 connected between every two adjacent material cleaning holes 302 and used for guiding the grains to circulate between every two adjacent material cleaning holes 302, and the material cleaning structure further comprises a partition plate 3 arranged at the rear end and a material stopping groove arranged between the material discharging end plates 215 and used for guiding the grains to move from the material cleaning holes 302 on the partition plate 3 at the rear end to the material discharging channels on the material discharging end plates 215.

Specifically, taking the separator 3 as an example of a regular hexagon, for convenience of description, the separator 3 closest to the feed end plate 214 will be referred to as a first separator, and the subsequent separators 3 will be referred to as second to seventh separators 3 in turn; meanwhile, six trapezoidal surfaces on each partition plate 3, which are divided by a connecting line of the center of each partition plate 3 and each side, are sequentially called as a first flat plate 32 to a sixth flat plate 34 along the counterclockwise direction; and the flat plates on each partition 3 are opposite, that is, when the first flat plate 32 on the first partition 3 rotates to the lowermost part of the drum 2, the first flat plates 32 on the remaining partitions 3 also rotate to the lowermost part of the drum 2. The drum 2 of the present embodiment rotates clockwise in its normal rotation direction and counterclockwise in its reverse rotation direction.

In this embodiment, the material cleaning hole 302 of the first partition plate 3 is located between the first flat plate 32 and the second flat plate 33, and the side edge of the first flat plate 32 close to the second flat plate 33 is inclined toward the material feeding end, so that the material cleaning hole 302 of the first partition plate 3 is formed by the space formed between the first flat plate 32 and the second flat plate 33; the material cleaning holes 302 on the second partition board 3 are located between the sixth flat board 34 and the first flat board 32, the side edge of the sixth flat board 34 close to the first flat board 32 is inclined towards the feeding end, so that the interval formed between the sixth flat board and the first flat board 32 forms the material cleaning holes 302 on the second partition board 3, and the forming mode of the material cleaning holes 302 on the third partition board to the seventh partition board is the same as the forming mode of the material cleaning holes 302 on the first partition board 3 and the second partition board 3, and therefore, the description is omitted.

In this embodiment, the structure of the material guiding plate 35 between the first partition plate and the second partition plate is as shown in fig. 7, one end of the material guiding plate 35 is connected to the rear sidewall of the material cleaning hole 302 on the first partition plate 3, the other end is connected to the rear sidewall of the material cleaning hole 302 on the second partition plate 3, and the sidewall of one side of the material guiding plate 35 is attached to the screen 22; preferably, a baffle orthogonal to the guide plate 35 is disposed on the side wall of the other side of the guide plate 35; the arrangement of the material guiding plates 35 between two adjacent partition plates 3 is the same, and the description thereof is omitted.

Referring to fig. 8, the cut-off groove of the present embodiment includes a cut-off plate 6 connected between the seventh partition plate and the discharge end plate 215, and a plurality of limiting plates 61 defining a cut-off groove 601, which are disposed on one side of the inside of the cut-off plate 6.

The operating principle of the clear material structure of this embodiment does: as shown in fig. 7 and 9, when the drum 2 rotates forward, the flat plate (e.g. the first flat plate 32 on the first partition plate 3) inclined toward the feeding end on each partition plate 3 rotates downward to enter the interior of the grain, the grain is pushed away toward the feeding end, the polishing circulation of the grain is not affected, and the material guide plate 35 can also block the material and cooperate with the circulation hole 301 on the partition plate 3 to make the grain uniformly flow from the previous polishing chamber into the next polishing chamber, so as to avoid the increase of damage rate due to the forward dispersion of the grain.

When the drum 2 rotates reversely, the flat plate (for example, the first flat plate 32 on the first partition) inclined toward the feeding end on each partition 3 rotates downward to enter the interior of the grain, the grain will enter between the cleaning holes 302, when the drum 2 continues to rotate and rotates from the state of fig. 7 to the state of fig. 9, the grain entering the cleaning holes 302 on the first partition will flow into the cleaning holes 302 on the second partition via the material guide plate 35, and so on, the grain will enter the cleaning holes 302 on the next partition 3 guided by the cleaning holes 302 on the previous partition 3 via the material guide plate 35; when grain flows into the material cleaning hole 302 on the seventh partition plate, the grain falls downwards onto the material cutting plate 6, and along with the rotation of the drum 2, the grain on the material cutting plate 6 is discharged out of the grain polishing device through the material cutting groove 601, so that the grain is completely emptied, when the grain polishing device rotates in the positive direction, the material cutting plate 6 pushes the grain, the grain is discharged out of the discharge hole on the material discharge end plate 215, namely, the grain discharge when the material cutting plate 6 does not influence the positive rotation of the grain polishing device.

Referring to fig. 1, the grain polishing apparatus of the present embodiment further includes a dust cover 7 fixedly disposed on the frame body 1, and the drum 2 is accommodated in the dust cover 7; and a plurality of ventilation holes 701 are opened on the dust cover 7, the grain polishing device further comprises an induced draft fan for exhausting air from the dust cover 7 through the ventilation holes 701, so that dust formed in the grain polishing process is extracted from the dust cover 7, and secondary pollution to grains is avoided.

The embodiment further provides a dust cover 7 with a better using effect, in particular to a plurality of isolating plates which are fixedly arranged inside the dust cover 7 and are provided with inner holes for accommodating the rotation of the roller 2; each partition plate divides the space in the dust cover 7 into a plurality of stages in the axial direction of the drum 2, and the above-described vent hole 701 is formed in each stage. In the grain polishing process, more dust is formed in the front section polishing process, less dust is formed in the rear section polishing process, and therefore, the dust cover 7 is divided into a plurality of dust removal cabins, dust removal processing is performed respectively, cross contamination of dust in the dust removal cabins can be reduced, and the partition boards are not shown in the drawing of the embodiment because understanding is not affected.

In this embodiment, since the drum 2 is polygonal and the rotation track is circular, the inner hole of the partition plate is slightly larger than the circular track formed by the rotation of the drum 2 in order to enable the drum 2 to rotate; that is, the dust-collecting chambers between the partition plates will have larger communication openings, so that a certain degree of cross contamination still exists between the dust-collecting chambers. Therefore, in the embodiment, a plurality of circular rings opposite to each partition plate are fixedly sleeved on the periphery of the roller 2, the maximum outer diameter of the rotation track of the roller 2 is the outer diameter of the circular rings, at the moment, each partition plate is respectively opposite to each circular ring, and the outer diameter of each circular ring is slightly smaller than the diameter of the inner hole of each partition plate, so that the isolation effect among all the dust removal cabins can be improved, and the cross contamination of dust in all the dust removal cabins can be reduced.

In conclusion, the grain polishing device of the embodiment, through set up a plurality of baffles in the polishing passageway that is enclosed by the screen cloth, separate into a plurality of polishing cavities with the polishing passageway by each baffle for grain can be in each polishing cavity abundant looks mutual friction, also is the polishing of the mutual friction completion grain between the accessible grain, and this grain polishing device need not to use consumptive material such as polishing cloth easily to be damaged, can reduce later stage use cost, reduces and maintains the degree of difficulty.

The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.

Claims

1. A grain polishing device, characterized by comprising:

a frame body;

2. The grain polishing apparatus as set forth in claim 1, wherein: the volume of each polishing chamber is set to change along the axial direction of the roller, and along the grain circulation direction, the volume of each polishing chamber is set to increase and then decrease.

3. The grain polishing apparatus as set forth in claim 1, wherein: the multi-side framework comprises a rotating shaft which is rotatably arranged on the framework body and a frame which is sleeved on the rotating shaft, the frame is supported and fixed on the rotating shaft through a supporting rod, and the screen is coated on the periphery of the frame.

4. The grain polishing apparatus as set forth in claim 3, wherein: the feeding device is characterized in that a feeding disc is fixedly arranged on the frame body, a central hole for the rotating shaft to pass through is formed in the feeding disc, a sleeving hole for rotating is formed in an end plate at the feeding end of the roller, and a feeding channel for external grains to enter the polishing channel is formed in the feeding disc.

5. The grain polishing apparatus as set forth in claim 1, wherein: the flow holes in each of the separators are polygonal holes, and the flow holes in at least two of the separators are different in size.

6. The grain polishing apparatus as set forth in claim 5, wherein: and each side wall of the circulation hole is fixedly provided with a material stopping plate respectively, and each material stopping plate inclines towards the feeding end of the roller.

7. The grain polishing apparatus as set forth in claim 1, wherein: the grain polishing device also comprises a dust cover fixedly arranged on the frame body, the roller is accommodated in the dust cover, a plurality of ventilation holes are formed in the dust cover, and the grain polishing device also comprises a draught fan which is used for exhausting air from the dust cover through the ventilation holes.

8. The grain polishing apparatus as set forth in claim 7, wherein: and a plurality of isolation plates are arranged in the dust cover, and each isolation plate is used for separating the inner space of the dust cover into a plurality of dust removal cabins along the axial direction of the roller.

9. The grain polishing apparatus as claimed in any one of claims 1 to 8, wherein: the inside of the roller is provided with a material cleaning structure for emptying grains in the roller when the roller rotates reversely.

10. The grain polishing apparatus as set forth in claim 9, wherein: the material cleaning structure comprises material cleaning holes formed in the edges of the partition plates, and the side wall of the rear side of each material cleaning hole inclines towards the feeding end of the roller along the direction of reverse rotation of the roller; the material cleaning holes on the partition plates are arranged in a staggered manner; when the roller rotates reversely along the flow direction of the grains, the material cleaning hole on the rear clapboard is positioned behind the material cleaning hole on the front clapboard; the material cleaning structure further comprises a material guide plate connected between every two adjacent material cleaning holes, and one side of the material guide plate is attached to the screen.