CN112310324A - Display device, display substrate and preparation method thereof - Google Patents
Display device, display substrate and preparation method thereof Download PDFInfo
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- CN112310324A CN112310324A CN202011193932.4A CN202011193932A CN112310324A CN 112310324 A CN112310324 A CN 112310324A CN 202011193932 A CN202011193932 A CN 202011193932A CN 112310324 A CN112310324 A CN 112310324A
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
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- H10K50/856—Arrangements for extracting light from the devices comprising reflective means
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
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Abstract
The embodiment of the invention provides a display device, a display substrate and a preparation method thereof, and relates to the technical field of display, so that the cleaning frequency of an FMM (frequency modulation mechanism) is reduced, and the risk of poor color mixing of a product is reduced. The display substrate comprises a substrate and a plurality of sub-pixels, wherein each sub-pixel comprises a transparent first electrode and a second electrode positioned on one side of the first electrode, which is far away from the substrate; wherein the first sub-pixel further comprises: a first reflective layer between the substrate and the first electrode, a first insulating layer between the first reflective layer and the first electrode, a first buffer pattern and a first light emitting pattern between the first electrode and the second electrode; the second sub-pixel further includes: a second reflective layer between the substrate and the first electrode, and a second buffer pattern and a second light emitting pattern between the first electrode and the second electrode; the third sub-pixel further includes: a third reflective layer between the substrate and the first electrode, and a third buffer pattern and a third light emitting pattern between the first electrode and the second electrode.
Description
Technical Field
The invention relates to the technical field of display, in particular to a display device, a display substrate and a preparation method thereof.
Background
The electroluminescent display device has the advantages of self-luminescence, low power consumption, wide viewing angle, high response speed, high contrast and the like, so that the electroluminescent display device is widely applied to intelligent products such as mobile phones, televisions, notebook computers and the like. In addition, the electroluminescent display device has the characteristics of light weight, thin thickness and bending resistance, so that the electroluminescent display device becomes the research focus of numerous scholars at home and abroad at present.
As shown in fig. 1, the main structure of the electroluminescent display device includes an anode 01, a hole injection layer 02, a hole transport layer 03, a buffer layer 04, a light emitting layer 05, a hole blocking layer 06, an electron transport layer 07, an electron injection layer 08, and a cathode 09, which are sequentially stacked. When a voltage is applied to the anode 01 and the cathode 09, holes generated by the anode 01 and electrons generated by the cathode 09 recombine in the light emitting layer 05 and emit light, and photons with different energies can be emitted according to the material of the light emitting layer 05 and the excitation energy, so that light with different colors can be emitted. In detail, the light emitting layer 05 includes a red light emitting layer 051, a green light emitting layer 052 and a blue light emitting layer 053, light emitted from the red light emitting layer 051, the green light emitting layer 052 and the blue light emitting layer 053 is emitted from the cathode 09 side, the buffer layer 04 under the light emitting layers 05 of different colors is different in material and thickness, and the buffer layer 04 mainly plays a role of energy level matching and electron blocking.
However, in the process of fabricating the electroluminescent display device by using the evaporation process, since the overall thickness of the red light emitting layer and the buffer layer under the red light emitting layer and the overall thickness of the green light emitting layer and the buffer layer under the green light emitting layer are thicker, the red light emitting layer and the buffer layer under the red light emitting layer need to be evaporated twice in different chambers by using Fine Mask (FMM) respectively, and the green light emitting layer and the buffer layer under the green light emitting layer need to be evaporated twice in different chambers by using FMM respectively, such process flow needs more organic chambers of the evaporation equipment and more FMMs, and the cost is higher; meanwhile, in the process of evaporating the luminescent layer and the buffer layer, the corresponding FMMs need to be aligned, and poor color mixing of the product is easily caused by two-time alignment.
Disclosure of Invention
The embodiment of the invention provides a display device, a display substrate and a preparation method thereof, which are used for reducing the cleaning frequency of an FMM (frequency modulation mechanism) and reducing the risk of poor color mixing of products and are low in cost.
In order to achieve the above purpose, the embodiment of the invention adopts the following technical scheme:
in a first aspect, the present invention provides a substrate for display, comprising: a substrate; a plurality of sub-pixels disposed on a substrate, the plurality of sub-pixels comprising: the display device comprises a first sub-pixel, a second sub-pixel and a third sub-pixel which are different in light-emitting color, wherein each sub-pixel comprises a transparent first electrode and a second electrode which is positioned on one side of the first electrode, which is far away from a substrate; wherein the first sub-pixel further comprises: a first reflective layer between the substrate and the first electrode, a first insulating layer between the first reflective layer and the first electrode, a first buffer pattern and a first light emitting pattern between the first electrode and the second electrode; the second sub-pixel further includes: a second reflective layer between the substrate and the first electrode, and a second buffer pattern and a second light emitting pattern between the first electrode and the second electrode; the third sub-pixel further includes: a third reflective layer between the substrate and the first electrode, and a third buffer pattern and a third light emitting pattern between the first electrode and the second electrode.
In some embodiments, the second sub-pixel further comprises: a second insulating layer between the second reflective layer and the first electrode; and/or the third sub-pixel further comprises: and a third insulating layer between the third reflective layer and the first electrode.
In some embodiments, in the case where the second sub-pixel includes the second insulating layer and the third sub-pixel includes the third insulating layer, the thicknesses of the first, second and third insulating layers are the same.
In some embodiments, the first reflective layer, the second reflective layer, and the third reflective layer belong to the same layer; the first insulating layer, the second insulating layer and the third insulating layer belong to the same layer, and the first insulating layer, the second insulating layer and the third insulating layer are connected.
In some embodiments, in the case where the second sub-pixel includes the second insulating layer and the third sub-pixel includes the third insulating layer, the thickness of the first insulating layer is greater than that of the second insulating layer, and the thickness of the second insulating layer is greater than that of the third insulating layer.
In some embodiments, the first insulating layer comprises: the first insulating sublayer, the second insulating sublayer and the third insulating sublayer are sequentially stacked along the direction far away from the substrate; the second insulating layer includes: the fourth insulating sublayer and the fifth insulating sublayer are sequentially stacked along the direction far away from the substrate; the third insulating sublayer, the fifth insulating sublayer and the third insulating layer belong to the same layer, and the third insulating sublayer, the fifth insulating sublayer and the third insulating layer are connected; the second insulating sublayer and the fourth insulating sublayer belong to the same layer, and the second insulating sublayer and the fourth insulating sublayer are connected.
In some embodiments, the surface of the first buffer pattern near the first light emitting pattern is in contact with the surface of the first light emitting pattern near the first buffer pattern and the projections of the two on the substrate completely overlap; the surface of the second buffer pattern close to the second light-emitting pattern is in contact with the surface of the second light-emitting pattern close to the second buffer pattern, and the projections of the second buffer pattern and the second light-emitting pattern on the substrate are completely overlapped; the surface of the third buffer pattern close to the third light emitting pattern is in contact with the surface of the third light emitting pattern close to the third buffer pattern and the projections of the third light emitting pattern and the third light emitting pattern on the substrate are completely overlapped.
The invention provides a display substrate, which comprises a substrate and a plurality of sub-pixels arranged on the substrate, wherein each sub-pixel comprises a transparent first electrode and a second electrode positioned on one side of the first electrode far away from the substrate. The plurality of sub-pixels comprise a first sub-pixel, a second sub-pixel and a third sub-pixel, wherein the first sub-pixel comprises a first reflecting layer positioned between the substrate and the first electrode, a first insulating layer positioned between the first reflecting layer and the first electrode, a first buffer pattern positioned between the first electrode and the second electrode and a first light emitting pattern; the second sub-pixel includes a second reflective layer between the substrate and the first electrode, a second buffer pattern between the first electrode and the second electrode, and a second light emitting pattern; the third sub-pixel includes a third reflective layer between the substrate and the first electrode, a third buffer pattern between the first electrode and the second electrode, and a third light emitting pattern. Here, the second electrode is semitransparent, that is, light emitted from a side of the second electrode close to the substrate is partially transmitted through the second electrode and partially reflected by the second electrode. At this time, since the first electrode is transparent and the first reflective layer, the second reflective layer and the third reflective layer are disposed between the first electrode and the substrate, the cavity length of the first sub-pixel is the distance between the first reflective layer and the second electrode, the cavity length of the second sub-pixel is the distance between the second reflective layer and the second electrode, and the cavity length of the third sub-pixel is the distance between the third reflective layer and the second electrode. Compared with the prior art, the cavity length of the first sub-pixel, the cavity length of the second sub-pixel and the cavity length of the third sub-pixel are increased by the thickness of the transparent first electrode, so that the overall thickness of the first buffer pattern, the first light-emitting pattern, the second buffer pattern, the second light-emitting pattern, the third buffer pattern and the third light-emitting pattern can be reduced, and the cleaning frequency of the corresponding FMM can be reduced; in addition, a first insulating layer is arranged between the first reflecting layer and the first electrode, so that the requirement of the first sub-pixel on the cavity length can be met by adjusting the thickness of the first insulating layer, the thicknesses of the first buffer pattern and the first light-emitting pattern are thinner, the first buffer pattern and the first light-emitting pattern can be further subjected to evaporation in a single cavity by sharing one FMM, the risk of poor color mixing of a product is reduced, and the cost is reduced.
In a second aspect, the present invention also provides a method for manufacturing a substrate for display, including: providing a plurality of sub-pixels on a substrate, the plurality of sub-pixels comprising: the display device comprises a first sub-pixel, a second sub-pixel and a third sub-pixel which are different in light-emitting color, wherein each sub-pixel comprises a transparent first electrode and a second electrode which is positioned on one side of the first electrode, far away from the substrate; wherein the first sub-pixel further comprises: a first reflective layer between the substrate and the first electrode, a first insulating layer between the first reflective layer and the first electrode, a first buffer pattern and a first light emitting pattern between the first electrode and the second electrode; the second sub-pixel further includes: a second reflective layer between the substrate and the first electrode, and a second buffer pattern and a second light emitting pattern between the first electrode and the second electrode; the third sub-pixel further includes: a third reflective layer between the substrate and the first electrode, and a third buffer pattern and a third light emitting pattern between the first electrode and the second electrode.
In some embodiments, disposing a plurality of subpixels on a substrate comprises: forming a first reflective layer, a second reflective layer and a third reflective layer on a substrate; forming an insulating film covering the first reflective layer, the second reflective layer and the third reflective layer; forming a first electrode layer including a plurality of first electrodes on the substrate on which the insulating film is formed; the part of the insulating film between the first reflecting layer and one first electrode is a first insulating layer, the part of the insulating film between the second reflecting layer and one first electrode is a second insulating layer, and the part of the insulating film between the third reflecting layer and one first electrode is a third insulating layer; forming a first buffer pattern and a first light emitting pattern belonging to a first sub-pixel, a second buffer pattern and a second light emitting pattern belonging to a second sub-pixel, and a third buffer pattern and a third light emitting pattern belonging to a third sub-pixel on the substrate on which the first electrode layer is formed; and forming a second electrode layer, wherein the part of the second electrode layer corresponding to one sub-pixel is a second electrode.
In some embodiments, disposing a plurality of subpixels on a substrate comprises: forming a first reflective layer belonging to a first sub-pixel on a substrate; forming a first insulating film covering the first reflective layer; forming a second reflective layer belonging to a second sub-pixel on the first insulating film; forming a second insulating film covering the second reflective layer; forming a third reflective layer belonging to a third sub-pixel on the second insulating film; forming a third insulating film covering the third reflective layer; forming a first electrode layer over a substrate on which a first insulating film, a second insulating film, and a third insulating film are formed, the first electrode layer including a plurality of first electrodes; the part of the first insulating film, the part of the second insulating film and the third insulating film, which is positioned between the first reflecting layer and one first electrode, is a first insulating layer, the part of the second insulating film and the third insulating film, which is positioned between the second reflecting layer and one first electrode, is a second insulating layer, and the part of the third insulating film, which is positioned between the third reflecting layer and one first electrode, is a third insulating layer; forming a first buffer pattern and a first light emitting pattern belonging to a first sub-pixel, a second buffer pattern and a second light emitting pattern belonging to a second sub-pixel, and a third buffer pattern and a third light emitting pattern belonging to a third sub-pixel on the substrate on which the first electrode layer is formed; and forming a second electrode layer, wherein the part of the second electrode layer corresponding to one sub-pixel is a second electrode.
Compared with the prior art, the preparation method of the display substrate provided by the invention has the same beneficial effects as the display substrate provided by the technical scheme, and the details are not repeated herein.
In a third aspect, the present invention also provides a display device, including the above substrate for display.
Compared with the prior art, the beneficial effects of the display device provided by the invention are the same as those of the display substrate provided by the technical scheme, and are not repeated herein.
Drawings
In order to more clearly illustrate the embodiments of the present invention or technical solutions in related arts, the drawings used in the description of the embodiments or related arts will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a schematic structural diagram of a display substrate in the prior art;
fig. 2 is a first schematic structural diagram of a substrate for display according to an embodiment of the present invention;
fig. 3 is a schematic structural diagram of a display substrate according to an embodiment of the present invention;
fig. 4 is a schematic structural diagram of a substrate for display according to a third embodiment of the present invention;
fig. 5 is a fourth schematic structural diagram of a substrate for display according to an embodiment of the present invention;
fig. 6 is a partial cross-sectional view of a display substrate at a first sub-pixel according to an embodiment of the present invention;
FIG. 7 is a first flowchart illustrating a first step of a method for fabricating a substrate for display according to an embodiment of the present invention;
FIG. 8 is a flowchart illustrating a second step of a method for fabricating a substrate for display according to an embodiment of the present invention;
fig. 9 is a first flowchart illustrating a method for manufacturing a substrate for display according to an embodiment of the present invention;
fig. 10 is a second flowchart illustrating a method for manufacturing a substrate for display according to an embodiment of the present invention.
Reference numerals:
01-an anode; 02-hole injection layer; 03-a hole transport layer; 04-a buffer layer; 05-a light-emitting layer; 051-red luminous layer; 052-green light-emitting layer; 053-a blue light-emitting layer; 06-a hole blocking layer; 07-an electron transport layer; 08-electron injection layer; 09-a cathode; 10-a substrate; 11-a pixel defining layer; 12-a substrate base plate; 13-a planar layer; 14-a drive transistor; 20-a first sub-pixel; 21-a first reflective layer; 22-a first insulating layer; 23-a first buffer pattern; 24-a first light emission pattern; 30-a second sub-pixel; 31-a second reflective layer; 32-a second buffer pattern; 33-a second light emitting pattern; 34-a second insulating layer; 40-a third sub-pixel; 41-a third reflective layer; 42-a third buffer pattern; 43-a third light emitting pattern; 44-a third insulating layer; 50-a first electrode; 60-a second electrode; 70-a light extraction layer; 80-electron transport layer; 90-electron injection layer; 100-hole transport layer; 110-hole injection layer.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
An embodiment of the present invention further provides a substrate for display, as shown in fig. 2 and 4 or fig. 3 and 5, including: a substrate 10; a plurality of sub-pixels disposed on the substrate 10, the plurality of sub-pixels including: a first sub-pixel 20, a second sub-pixel 30 and a third sub-pixel 40 which emit light with different colors, wherein each sub-pixel comprises a transparent first electrode 50 and a second electrode 60 which is positioned at one side of the first electrode 50 far away from the substrate 10; wherein, the first sub-pixel 20 further includes: a first reflective layer 21 between the substrate 10 and the first electrode 50, a first insulating layer 22 between the first reflective layer 21 and the first electrode 50, a first buffer pattern 23 and a first light emitting pattern 24 between the first electrode 50 and the second electrode 60; the second sub-pixel 30 further includes: a second reflective layer 31 between the substrate 10 and the first electrode 50, a second buffer pattern 32 and a second light emitting pattern 33 between the first electrode 50 and the second electrode 60; the third sub-pixel 40 further includes: a third reflective layer 41 between the substrate 10 and the first electrode 50, and third buffer patterns 42 and third light emitting patterns 43 between the first electrode 50 and the second electrode 60.
The second electrode 60 is semitransparent, that is, light emitted from a side of the second electrode 60 close to the substrate 10 is partially transmitted through the second electrode 60 and partially reflected by the second electrode 60. At this time, since the first electrode 50 is transparent and the first reflective layer 21, the second reflective layer 31 and the third reflective layer 41 are disposed between the first electrode 50 and the substrate 10, the cavity length of the first sub-pixel 20 is the distance between the first reflective layer 21 and the second electrode 60, the cavity length of the second sub-pixel 30 is the distance between the second reflective layer 31 and the second electrode 60, and the cavity length of the third sub-pixel 40 is the distance between the third reflective layer 41 and the second electrode 60. Compared with the prior art, the display substrate provided by the invention has the advantages that the cavity lengths of the first sub-pixel 20, the second sub-pixel 30 and the third sub-pixel 40 are increased by the thickness of the transparent first electrode 50, so that the overall thicknesses of the first buffer pattern 23 and the first light-emitting pattern 24, the second buffer pattern 32 and the second light-emitting pattern 33, and the third buffer pattern 42 and the third light-emitting pattern 43 can be reduced, and the cleaning frequency of the corresponding FMM can be reduced; in addition, the first insulating layer 22 is further disposed between the first reflective layer 21 and the first electrode 50, so that the requirement of the first sub-pixel 20 on the cavity length can be met by adjusting the thickness of the first insulating layer 22, and the thicknesses of the first buffer pattern 23 and the first light-emitting pattern 24 are made to be thinner, so that the first buffer pattern 23 and the first light-emitting pattern 24 can share one FMM for evaporation in one chamber, thereby reducing the risk of poor color mixing of products and reducing the cost.
The emission color of the first sub-pixel 20, the emission color of the second sub-pixel 30, and the emission color of the third sub-pixel 40 are not limited. Illustratively, the light emission color of the first sub-pixel 20 is red, the light emission color of the second sub-pixel 30 is green, and the light emission color of the third sub-pixel 40 is blue. On the basis, if the cavity lengths of the first sub-pixel 20, the second sub-pixel 30 and the third sub-pixel 40 are the same, the luminance of the light actually emitted by the first sub-pixel 20, the second sub-pixel 30 and the third sub-pixel 40 is different from the preset luminance. Accordingly, when designing the display substrate, the cavity lengths of the first sub-pixel 20, the second sub-pixel 30, and the third sub-pixel 40 should be different.
Here, in order to satisfy the cavity length requirement of the second sub-pixel 30 and ensure that the thicknesses of the second buffer pattern 32 and the second light emitting pattern 33 are thinner as a whole, in some embodiments, the second sub-pixel 30 further includes a second insulating layer 34 located between the second reflective layer 31 and the first electrode 50, so that the cavity length requirement of the second sub-pixel 30 can be satisfied by adjusting the thickness of the second insulating layer 34, and the thicknesses of the second buffer pattern 32 and the second light emitting pattern 33 are thinner, thereby reducing the cleaning frequency of the corresponding FMM, reducing the materials and the evaporation time of the second buffer pattern 32 and the second light emitting pattern 33, and reducing the manufacturing cost.
In order to meet the cavity length requirement of the third sub-pixel 40 and ensure that the thicknesses of the third buffer pattern 42 and the third light emitting pattern 43 are thinner as a whole, in some embodiments, the third sub-pixel 40 further includes a third insulating layer 44 located between the third reflective layer 41 and the first electrode 50, so that the requirement of the third sub-pixel 40 on the cavity length can be met by adjusting the thickness of the third insulating layer 44, and the thicknesses of the third buffer pattern 42 and the third light emitting pattern 43 are made thinner, thereby reducing the cleaning frequency of the corresponding FMM, reducing the material and the evaporation time length of the third buffer pattern 42 and the third light emitting pattern 43, and reducing the manufacturing cost.
Further, in order to ensure that the first buffer patterns 23 and the first light-emitting patterns 24 can share one FMM for evaporation in one chamber, in some embodiments, the surface of the first buffer patterns 23 near the first light-emitting layer is in contact with the surface of the first light-emitting layer near the first buffer layer and the projections of the two on the substrate 10 completely overlap; in this way, the first buffer pattern 23 and the first light-emitting pattern 24 can be obtained by the same FMM evaporation in one chamber, so that the number of chambers and FMMs is reduced, and the cost is reduced; meanwhile, the first buffer pattern 23 and the first light-emitting pattern 24 only need to be aligned once by the FMM, so that the risk of poor color mixing of the product is reduced.
Also, in order to ensure that the second buffer pattern 32 and the second light emitting pattern 33 can be evaporated in one chamber by using one FMM in common, in some embodiments, the surface of the second buffer pattern 32 near the second light emitting pattern 33 is in contact with the surface of the second light emitting pattern 33 near the second buffer pattern 32 and the projections of the two on the substrate 10 completely overlap; in this way, the second buffer pattern 32 and the second light-emitting pattern 33 can be obtained by the same FMM evaporation in one chamber, so that the number of chambers and FMMs is reduced, and the cost is reduced; meanwhile, the second buffer pattern 32 and the second light-emitting pattern 33 only need to be aligned once by the FMM, so that the risk of poor color mixing of the product is reduced.
Similarly, in order to ensure that the third buffer pattern 42 and the third light emitting pattern 43 can be evaporated in one chamber by using one FMM in common, in some embodiments, the surface of the third buffer pattern 42 close to the third light emitting pattern 43 is in contact with the surface of the third light emitting pattern 43 close to the third buffer pattern 42 and the projections of the two on the substrate 10 completely overlap; in this way, the third buffer pattern 42 and the third light emitting pattern 43 can be obtained by using the same FMM evaporation in one chamber, thereby reducing the number of chambers and FMMs and reducing the cost; meanwhile, the third buffer pattern 42 and the third light emitting pattern 43 only need to be aligned once by the FMM, so that the risk of poor color mixing of the product is reduced.
Here, the thicknesses of the first insulating layer 22, the second insulating layer 34, and the third insulating layer 44 are not limited. In some embodiments, the first, second, and third insulating layers 22, 34, 44 have a thickness in the range of 0nm to 100 nm. Here, the insulating layer with a thickness of 0nm represents that the cavity length of the sub-pixel is short, and the overall thickness of the buffer pattern and the light emitting pattern of the sub-pixel is thin enough to satisfy the basic requirement without adding an insulating layer. Illustratively, the thickness of the first insulating layer 22 may be 100nm, the thickness of the second insulating layer 34 may be 50nm, and the thickness of the third insulating layer 44 may be 10 nm.
The materials of the first insulating layer 22, the second insulating layer 34, and the third insulating layer 44 are not limited. In some embodiments, the material of the first, second and third insulating layers 22, 34 and 44 is a transparent organic or inorganic insulating material, and for example, the material of the first, second and third insulating layers 22, 34 and 44 may be any one of polyimide, epoxy resin, silicon nitride, silicon oxide or silicon oxynitride.
In addition, the surfaces of the first insulating layer 22, the second insulating layer 34, and the third insulating layer 44 away from the substrate 10 may be flat, and at this time, the first insulating layer 22, the second insulating layer 34, and the third insulating layer 44 may be referred to as a Planarization (PLN) layer, so that the first electrode 50 may be formed on the flat surface.
In the case where the second subpixel 30 includes the second insulating layer 34 and the third subpixel 40 includes the third insulating layer 44, the distribution of the first insulating layer 22, the second insulating layer 34, and the third insulating layer 44 is not unique.
In some embodiments, as shown in fig. 2 and 4, the thicknesses of the first, second, and third insulating layers 22, 34, 44 are the same. The first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 belong to the same layer; the first, second and third insulating layers 22, 34, 44 belong to the same layer, and the first, second and third insulating layers 22, 34, 44 are connected. In this way, the first insulating layer 22, the second insulating layer 34, and the third insulating layer 44 are formed in the same layer, and an insulating film covering the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 is formed at one time by a coating process, a portion of the insulating film between the first reflective layer 21 and one of the first electrodes 50 is the first insulating layer 22, a portion of the insulating film between the second reflective layer 31 and one of the first electrodes 50 is the second insulating layer 34, and a portion of the insulating film between the third reflective layer 41 and one of the first electrodes 50 is the third insulating layer 44, so that the process is simple.
In other embodiments, as shown in fig. 3 and 5, the thickness of first insulating layer 22 is greater than the thickness of second insulating layer 34, and the thickness of second insulating layer 34 is greater than the thickness of third insulating layer 44. In this way, when the light emitting color of the first sub-pixel 20 is red, the light emitting color of the second sub-pixel 30 is green, and the light emitting color of the third sub-pixel 40 is blue, the thickness of the first buffer pattern 23 belonging to the first sub-pixel 20 and the thickness of the second buffer pattern 32 belonging to the second sub-pixel 30 may be the same as the thickness of the third buffer pattern 42 of the third sub-pixel 40, and both are relatively thin, so that the material and the evaporation time of the buffer layer may be reduced, which is beneficial to evaporation in one chamber by using one FMM in common, and the cost is relatively low.
Further, the first insulating layer 22 includes: the first insulating sublayer, the second insulating sublayer and the third insulating sublayer are sequentially stacked along the direction far away from the substrate 10; the second insulating layer 34 includes: the fourth insulating sub-layer and the fifth insulating sub-layer are sequentially stacked along the direction far away from the substrate 10; the third insulating sublayer, the fifth insulating sublayer and the third insulating layer 44 belong to the same layer, and the third insulating sublayer, the fifth insulating sublayer and the third insulating layer 44 are connected; the second insulating sublayer and the fourth insulating sublayer belong to the same layer, and the second insulating sublayer and the fourth insulating sublayer are connected. In this case, the third insulating sub-layer, the fifth insulating sub-layer, and the third insulating layer 44 may be formed at one time using a coating process, and the second insulating sub-layer and the fourth insulating sub-layer may be formed at one time using a coating process, which is simple in process.
The first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 may be continuous, that is, the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 may be a single layer or may be discontinuous, which is not limited thereto. In some embodiments, the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 completely overlap with a projection of the first electrode 50 on the substrate 10. In this case, when the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 are provided in the same layer, the same FMM as that used for the first electrode 50 can be used for the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41.
It will be understood by those skilled in the art that, as shown in fig. 4 and 6, the substrate 10 is further provided with a pixel defining layer 11, and the pixel defining layer 11 includes a plurality of openings, one opening exposing one first electrode 50. In fig. 6, the first sub-pixel 20 is taken as an example.
Here, as shown in fig. 6, the substrate 10 includes a substrate base 12 and a plurality of driving circuits provided on the substrate base 12, one driving circuit being electrically connected to one first electrode 50. The drive circuit includes a plurality of thin film transistors, and the drain of a thin film transistor of the plurality of thin film transistors, which is the drive transistor 14, is electrically connected to the first electrode 50.
On this basis, as shown in fig. 6, the substrate 10 further includes a planarization layer 13 disposed on the side of the driving circuit away from the substrate base 12, and the surface of the first reflective layer 21 away from the second electrode 60 is in contact with the surface of the planarization layer 13 away from the substrate base 12.
Here, the materials of the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 are not limited, and the materials of the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 may be the same or different. In some embodiments, the materials of the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 are pure metals or alloys. For example, the material of the first, second, and third reflective layers 21, 31, and 41 may be silver, aluminum, or a silver-aluminum alloy thereof.
The thicknesses of the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 are not limited, and the thicknesses of the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 may be the same or different. In some embodiments, the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 have a thickness in a range of 50nm to 200 nm. Illustratively, the thicknesses of the first, second, and third reflective layers 21, 31, and 41 may be 200nm, 100nm, and 50nm, respectively.
In some embodiments, the first electrode 50 is a cathode and the second electrode 60 is an anode. In other embodiments, the first electrode 50 is an anode and the second electrode 60 is a cathode.
Here, the material of the first electrode 50 and the second electrode 60 is not limited, and in some embodiments, the material of the first electrode 50 and the second electrode 60 may be a metal, a metal oxide, or an alloy. For example, the material of the first electrode 50 and the second electrode 60 may be any one of indium tin oxide, indium zinc oxide, silver, aluminum, copper, molybdenum, and the like.
In some embodiments, the substrate for display further includes a light extraction layer 70, and the light extraction layer 70 is disposed on a side of the second electrode 60 away from the first electrode 50 to reduce surface plasmon loss so that more light exits from the light extraction layer 70 side.
In fig. 6, the first electrode 50 is exemplified as an anode and the second electrode 60 is exemplified as a cathode. The display substrate further includes one or more layers of an electron transport layer 80 (ETL), an electron injection layer 90 (EIL), a hole transport layer 100 (HTL), and a hole injection layer 110 (HIL). As shown in fig. 6, in the case where the first electrode 50 is an anode and the second electrode 60 is a cathode, the electron injection layer 90 and the electron transport layer 80 are disposed between the second electrode 60 and the light emitting layer, and the hole injection layer 110 and the hole transport layer 100 are disposed between the first electrode 50 and a buffer layer, which can function as a hole blocking layer and may be referred to as a hole blocking layer; meanwhile, the buffer layer can also play a role in energy level matching.
In the case where the first electrode 50 is a cathode and the second electrode 60 is an anode, the electron injection layer 90 and the electron transport layer 80 are disposed between the first electrode 50 and a buffer layer, the hole injection layer 110 and the hole transport layer 100 are disposed between the second electrode 60 and the light emitting layer, and the buffer layer can function as an electron blocking layer and may be referred to as an electron blocking layer; meanwhile, the buffer layer can also play a role in energy level matching. In a case where the first electrode 50 is an anode and the second electrode 60 is a cathode, the first, second, and third light emitting patterns 24, 33, and 43 all belong to the light emitting layer, and the first, second, and third buffer patterns 23, 32, and 42 all belong to the buffer layer.
The embodiment of the invention also provides a display device which is used for displaying images (namely pictures) and can be a product comprising the display substrate. For example, the Display device may be a Flat Panel Display (FPD), a micro Display, or the like. The display may be a transparent display or an opaque display, depending on whether the user can see the scene division at the back of the display. The display may be a flexible display or a normal display (which may be referred to as a rigid display) depending on whether the display can be bent or rolled. The display device may also be a product comprising a display, for example: computer monitors, televisions, billboards, laser printers with display capability, telephones, cell phones, Personal Digital Assistants (PDAs), laptop computers, Digital cameras, camcorders, viewfinders, vehicles, large area walls, theater screens or stadium signs, and the like.
Compared with the prior art, the beneficial effects of the display device provided by the embodiment of the invention are the same as those of the display substrate provided by the embodiment, and the description is omitted here.
The embodiment of the invention also provides a preparation method of the substrate for display, which is used for preparing the substrate for display and comprises the following steps:
in step S100, a plurality of sub-pixels are provided on a substrate. Wherein the plurality of sub-pixels include: the display device comprises a first sub-pixel, a second sub-pixel and a third sub-pixel which are different in light-emitting color, wherein each sub-pixel comprises a transparent first electrode and a second electrode which is positioned on one side of the first electrode, which is far away from a substrate; wherein the first sub-pixel further comprises: a first reflective layer between the substrate and the first electrode, a first insulating layer between the first reflective layer and the first electrode, a first buffer pattern and a first light emitting pattern between the first electrode and the second electrode; the second sub-pixel further includes: a second reflective layer between the substrate and the first electrode, and a second buffer pattern and a second light emitting pattern between the first electrode and the second electrode; the third sub-pixel further includes: a third reflective layer between the substrate and the first electrode, and a third buffer pattern and a third light emitting pattern between the first electrode and the second electrode.
As shown in fig. 7 and 9, in some embodiments, the step S100 specifically includes:
step S110: a first reflective layer 21, a second reflective layer 31, and a third reflective layer 41 are formed on the substrate 10. In detail, the metal reflective film may be formed by a sputtering process, and then the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41 may be obtained by exposure, development, and etching.
Step S111: an insulating film is formed covering the first reflective layer 21, the second reflective layer 31, and the third reflective layer 41. In detail, the insulating film may be formed using a coating process.
Step S112: forming a first electrode layer including a plurality of first electrodes on the substrate on which the insulating film is formed; here, a portion of the insulating film between the first reflective layer 21 and one of the first electrodes is a first insulating layer 22, a portion of the insulating film between the second reflective layer 31 and one of the first electrodes is a second insulating layer 34, and a portion of the insulating film between the third reflective layer 41 and one of the first electrodes is a third insulating layer 44. Here, the surface of the insulating film remote from the substrate is flat, so that the first electrode layer can be formed on the flat surface. In detail, the first electrode layer may be formed using a sputtering process.
Step S113: a first buffer pattern and a first light emitting pattern belonging to a first sub-pixel, a second buffer pattern and a second light emitting pattern belonging to a second sub-pixel, and a third buffer pattern and a third light emitting pattern belonging to a third sub-pixel are formed on the substrate on which the first electrode layer is formed. In detail, a first buffer pattern and a first light emitting pattern are formed in one chamber using an evaporation process using one FMM, a second buffer pattern and a second light emitting pattern are formed in one chamber using an evaporation process using one FMM, and a third buffer pattern and a third light emitting pattern are formed in one chamber using an evaporation process using one FMM.
Step S114: and forming a second electrode layer, wherein the part of the second electrode layer corresponding to one sub-pixel is a second electrode. In detail, the second electrode layer may be formed using a sputtering process.
As shown in fig. 8 and 10, in another embodiment, the step S100 specifically includes:
step S120: a first reflective layer 21 belonging to a first sub-pixel is formed on the substrate 10. In detail, the first metal reflective film may be formed by a sputtering process, and then the first reflective layer may be obtained by exposure, development and etching.
Step S121: a first insulating film covering the first reflective layer 21 is formed. In detail, the first insulating film may be formed using a coating process.
Step S122: a second reflective layer 31 belonging to a second sub-pixel is formed on the first insulating film. In detail, the second metal reflective film may be formed by a sputtering process, and then the second reflective layer 31 may be obtained by exposure, development and etching.
Step S123: a second insulating film is formed to cover the second reflective layer 31. In detail, the second insulating film may be formed using a coating process.
Step S124: a third reflective layer 41 belonging to a third sub-pixel is formed on the second insulating film. In detail, the third metal reflective film may be formed by a sputtering process, and then the third reflective layer 41 may be obtained by exposure, development, and etching.
Step S125: a third insulating film is formed to cover the third reflective layer 41. In detail, the second insulating film may be formed using a coating process.
Step S126: forming a first electrode layer 21 including a plurality of first electrodes on the substrate 10 on which the first insulating film, the second insulating film, and the third insulating film are formed; among them, the part of the first insulating film, the second insulating film and the third insulating film between the first reflective layer 21 and one of the first electrodes is the first insulating layer 22, the part of the second insulating film and the third insulating film between the second reflective layer 31 and one of the first electrodes is the second insulating layer 34, and the part of the third insulating film between the third reflective layer 41 and one of the first electrodes is the third insulating layer 44. In detail, the first electrode may be formed using a sputtering process.
Step S127: a first buffer pattern and a first light emitting pattern belonging to a first sub-pixel, a second buffer pattern and a second light emitting pattern belonging to a second sub-pixel, and a third buffer pattern and a third light emitting pattern belonging to a third sub-pixel are formed on the substrate on which the first electrode layer is formed. In detail, a first buffer pattern and a first light emitting pattern are formed in one chamber using an evaporation process using one FMM, a second buffer pattern and a second light emitting pattern are formed in one chamber using an evaporation process using one FMM, and a third buffer pattern and a third light emitting pattern are formed in one chamber using an evaporation process using one FMM.
Step S128: and forming a second electrode layer, wherein the part of the second electrode layer corresponding to one sub-pixel is a second electrode. In detail, the second electrode layer may be formed using a sputtering process.
The preparation method of the display substrate provided by the embodiment of the invention has the same characteristics and technical effects as the display substrate of the embodiment, and reference can be made to the embodiment, which is not repeated herein.
The above description is only for the specific embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.
Claims (11)
1. A substrate for display, comprising:
a substrate;
a plurality of sub-pixels disposed on the substrate, the plurality of sub-pixels comprising: the display device comprises a first sub-pixel, a second sub-pixel and a third sub-pixel, wherein the first sub-pixel, the second sub-pixel and the third sub-pixel are different in light-emitting color, and each sub-pixel comprises a transparent first electrode and a second electrode located on one side, far away from a substrate, of the first electrode;
wherein the first sub-pixel further comprises: a first reflective layer between the substrate and the first electrode, a first insulating layer between the first reflective layer and the first electrode, a first buffer pattern and a first light emitting pattern between the first electrode and the second electrode;
the second sub-pixel further includes: a second reflective layer between the substrate and the first electrode, and a second buffer pattern and a second light emitting pattern between the first electrode and the second electrode;
the third sub-pixel further includes: a third reflective layer between the substrate and the first electrode, and a third buffer pattern and a third light emitting pattern between the first electrode and the second electrode.
2. The substrate for display according to claim 1, wherein the second subpixel further comprises: a second insulating layer between the second reflective layer and the first electrode;
and/or the presence of a gas in the gas,
the third sub-pixel further includes: a third insulating layer between the third reflective layer and the first electrode.
3. The substrate according to claim 2, wherein when the second subpixel comprises the second insulating layer and the third subpixel comprises the third insulating layer, thicknesses of the first insulating layer, the second insulating layer, and the third insulating layer are the same.
4. The substrate according to claim 3, wherein the first reflective layer, the second reflective layer, and the third reflective layer are of the same layer;
the first insulating layer, the second insulating layer and the third insulating layer belong to the same layer, and the first insulating layer, the second insulating layer and the third insulating layer are connected.
5. The substrate according to claim 2, wherein when the second subpixel comprises the second insulating layer and the third subpixel comprises the third insulating layer,
the thickness of the first insulating layer is greater than that of the second insulating layer, and the thickness of the second insulating layer is greater than that of the third insulating layer.
6. The substrate for display according to claim 5, wherein the first insulating layer comprises: the first insulating sublayer, the second insulating sublayer and the third insulating sublayer are sequentially stacked along the direction far away from the substrate;
the second insulating layer includes: the fourth insulating sublayer and the fifth insulating sublayer are sequentially stacked along the direction far away from the substrate;
the third insulating sublayer, the fifth insulating sublayer and the third insulating layer belong to the same layer, and the third insulating sublayer, the fifth insulating sublayer and the third insulating layer are connected;
the second insulating sublayer and the fourth insulating sublayer belong to the same layer, and the second insulating sublayer and the fourth insulating sublayer are connected.
7. The substrate according to claim 1, wherein a surface of the first buffer pattern adjacent to the first light-emitting pattern is in contact with a surface of the first light-emitting pattern adjacent to the first buffer pattern, and projections of the first light-emitting pattern and the first light-emitting pattern on the substrate completely overlap;
the surface of the second buffer pattern close to the second light-emitting pattern is in contact with the surface of the second light-emitting pattern close to the second buffer pattern, and the projections of the second light-emitting pattern and the second light-emitting pattern on the substrate completely overlap;
the surface of the third buffer pattern close to the third light emitting pattern is in contact with the surface of the third light emitting pattern close to the third buffer pattern and the projections of the third light emitting pattern and the third light emitting pattern on the substrate are completely overlapped.
8. A method for manufacturing a substrate for display, comprising:
providing a plurality of sub-pixels on a substrate, the plurality of sub-pixels comprising: the display device comprises a first sub-pixel, a second sub-pixel and a third sub-pixel which are different in light-emitting color, wherein each sub-pixel comprises a transparent first electrode and a second electrode which is positioned on one side of the first electrode, far away from the substrate;
wherein the first sub-pixel further comprises: a first reflective layer between the substrate and the first electrode, a first insulating layer between the first reflective layer and the first electrode, a first buffer pattern and a first light emitting pattern between the first electrode and the second electrode;
the second sub-pixel further includes: a second reflective layer between the substrate and the first electrode, and a second buffer pattern and a second light emitting pattern between the first electrode and the second electrode;
the third sub-pixel further includes: a third reflective layer between the substrate and the first electrode, and a third buffer pattern and a third light emitting pattern between the first electrode and the second electrode.
9. The method of manufacturing a substrate for display according to claim 8, wherein the providing a plurality of sub-pixels on a substrate comprises:
forming the first, second, and third reflective layers on the substrate;
forming an insulating film covering the first reflective layer, the second reflective layer, and the third reflective layer;
forming a first electrode layer over the substrate on which the insulating film is formed, the first electrode layer including a plurality of first electrodes; wherein a portion of the insulating film between the first reflective layer and one of the first electrodes is the first insulating layer, a portion of the insulating film between the second reflective layer and one of the first electrodes is the second insulating layer, and a portion of the insulating film between the third reflective layer and one of the first electrodes is the third insulating layer;
forming a first buffer pattern and a first light emitting pattern belonging to the first sub-pixel, a second buffer pattern and a second light emitting pattern belonging to the second sub-pixel, and a third buffer pattern and a third light emitting pattern belonging to the third sub-pixel on the substrate on which the first electrode layer is formed;
and forming a second electrode layer, wherein the part of the second electrode layer corresponding to one sub-pixel is one second electrode.
10. The method of manufacturing a substrate for display according to claim 8, wherein the providing a plurality of sub-pixels on a substrate comprises:
forming a first reflective layer belonging to the first sub-pixel on the substrate;
forming a first insulating film covering the first reflective layer;
forming a second reflective layer belonging to the second sub-pixel on the first insulating film;
forming a second insulating film covering the second reflective layer;
forming a third reflective layer belonging to the third sub-pixel on the second insulating film;
forming a third insulating film covering the third reflective layer;
forming a first electrode layer over the substrate on which the first insulating film, the second insulating film, and the third insulating film are formed, the first electrode layer including a plurality of first electrodes; wherein a portion of the first insulating film, the second insulating film, and the third insulating film between the first reflective layer and one of the first electrodes is the first insulating layer, a portion of the second insulating film and the third insulating film between the second reflective layer and one of the first electrodes is the second insulating layer, and a portion of the third insulating film between the third reflective layer and one of the first electrodes is the third insulating layer;
forming a first buffer pattern and a first light emitting pattern belonging to the first sub-pixel, a second buffer pattern and a second light emitting pattern belonging to the second sub-pixel, and a third buffer pattern and a third light emitting pattern belonging to the third sub-pixel on the substrate on which the first electrode layer is formed;
and forming a second electrode layer, wherein the part of the second electrode layer corresponding to one sub-pixel is one second electrode.
11. A display device comprising the substrate for display according to any one of claims 1 to 7.
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