CN112265996A - Low RDA friction type silicon dioxide and preparation method thereof - Google Patents
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- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
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- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
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- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q11/00—Preparations for care of the teeth, of the oral cavity or of dentures; Dentifrices, e.g. toothpastes; Mouth rinses
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Abstract
The invention belongs to the technical field of silicon dioxide, and particularly relates to low RDA friction type silicon dioxide and a preparation method thereof. The invention adopts water glass solution with modulus of 3 and concentration of 0.71-0.77mol/L for reaction, then carries out neutralization reaction by dripping alkali in acid and adds silane coupling agent KH570 in the process, thus preparing the friction type silicon dioxide with low RDA. The copper consumption value of 15% dispersion of the friction type silicon dioxide in 70% concentration sorbitol in 10000 times of brush grinding can be as low as 1.2mg, the RDA value is 120-130, the water absorption capacity is 12-16mL/20g, the oil absorption value is 86-101mL/100g, the apparent density is 0.47-0.51g/mL, and the friction capacity of the silicon dioxide is reduced. The toothpaste prepared by the silicon dioxide provided by the invention is suitable for people with weak dentin, such as the old, children and the like.
Description
Technical Field
The invention belongs to the technical field of silicon dioxide, and particularly relates to low RDA friction type silicon dioxide and a preparation method thereof.
Background
The silicon dioxide has very stable physical and chemical properties, acid and alkali resistance, high temperature resistance, no pollution to the environment, good cleaning performance, good compatibility with raw materials in the toothpaste and higher fluorine compatibility, thereby replacing other raw materials such as calcium carbonate and the like as an abrasive and a thickening agent of the toothpaste.
Thickening silica is respectively added into the toothpaste in the current market according to a certain proportion to thicken and shape; and is matched with friction type silicon dioxide to be used as an abrasive to enhance the cleaning capability. In order to ensure the stability of the physical properties of the toothpaste, the addition amount of the silica is generally fixed. However, the friction type silicon dioxide prepared by a precipitation method has generally strong friction performance, the dentin friction value (RDA) is more than 150, 10000 times of copper sheets in 15% sorbitol dispersion liquid are abraded by about 10mg, and the root cause of the high dentin friction value of the friction type silicon dioxide is that the silicon dioxide is subjected to fast polycondensation of ionized monomers or oligomers under an alkaline condition, silicon-oxygen bonds among silicon-oxygen tetrahedrons are less in connection, and no obvious aggregation and chain forming process exists due to the charge repulsion effect, so that the friction of the silicon dioxide is high. Due to the fact that friction force is too strong, the toothpaste is likely to cause damage to people with weak teeth such as old people and children, taste of the toothpaste is poor if the using amount of the silicon dioxide is changed, user experience is affected, and production cost of the toothpaste is increased.
Patent publication No. CN110980747A discloses a low-viscosity high-transparency friction type silica for toothpaste and a preparation method thereof, wherein the preparation method of the silica comprises the following steps: adding a sodium sulfate solution into a reaction tank, raising the temperature, simultaneously dropwise adding a sodium silicate solution and a sulfuric acid solution under the stirring state, controlling the pH value in the reaction process, adding a silane coupling agent in the middle of the reaction, continuously dropwise adding the sulfuric acid solution after the dropwise adding of the raw materials is finished until the pH value is 3.5-5.5, aging, press-filtering, washing, drying and crushing to obtain the silicon dioxide. Patent publication No. CN109485054A discloses a friction type silica with low oil absorption value and high specific surface area and a preparation method thereof, wherein the preparation method of the silica comprises the following steps: adding a sodium sulfate solution and a sodium silicate solution into a reaction kettle, heating, simultaneously dropwise adding the sodium silicate solution and a sulfuric acid solution, maintaining the pH value to be 11.2-11.6, stopping adding acid after the sodium silicate solution is dropwise added, aging, continuously dropwise adding the sulfuric acid solution until the pH value is 4.0-5.0, aging, carrying out filter pressing on the prepared silicon dioxide, washing, drying and crushing to obtain the low-oil-absorption-value high-specific-surface-area friction-type silicon dioxide. The silicon dioxide prepared by the two preparation methods of the friction type silicon dioxide has good friction performance, but the prepared silicon dioxide has high dentin friction value and is applied to people who are not suitable for weak teeth in toothpaste.
In summary, the technical problems that the dentin friction value is high, the toothpaste viscosity, the shape and the taste are changed due to formula adjustment, the consumer experience is influenced, the toothpaste production cost is increased and the like generally exist in the prior art.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention aims to provide low RDA friction type silicon dioxide and a preparation method thereof. The invention reduces the friction of the friction type silicon dioxide on the premise of keeping the original oil absorption value of the friction type silicon dioxide by adjusting the production process of the precipitated silicon dioxide and the surfactant, thereby being applicable to any dentin consumers in the toothpaste.
In order to achieve the purpose, the technical scheme of the invention is as follows:
a preparation method of low RDA friction type silicon dioxide comprises the following steps:
s1, preparing a sulfuric acid solution with the concentration of 0.70-0.80 mol/L;
s2, adding water into the water glass for dilution and dissolution, aging for 5-8h, and adding water into the aged water glass for dilution to prepare a water glass solution with the concentration of 0.71-0.77 mol/L;
S3、adding the mixture into a reaction tank with the volume of 12m3Starting a stirring device for the sulfuric acid solution prepared in the step S1, and heating to 40-45 ℃;
s4, dropwise adding the water glass solution prepared in the step S2 into the sulfuric acid solution heated in the step S3, wherein the adding amount of the water glass solution is 0.8m3Adding a silane coupling agent, and continuously dripping a water glass solution under the stirring state until gel is formed to initially form silicon dioxide;
and S5, performing filter pressing and washing on the silicon dioxide formed in the step S4, and drying and crushing to obtain the silicon dioxide.
Further, the modulus of the water glass in the step S2 of the preparation method of the low RDA friction type silica is 3.
Further, the stirring frequency of the stirring device in the step S3 of the preparation method of the low RDA friction type silicon dioxide is 35-40 Hz.
Further, the dropping speed of the water glass solution in the step S4 of the preparation method of the low RDA friction type silicon dioxide is 22-25m3/h。
Further, in the step S4 of the preparation method of the low RDA friction type silicon dioxide, the adding amount of the silane coupling agent is 25-35L, and the model of the silane coupling agent is KH 570.
Further, the pressure of the pressure filtration washing in the step S5 of the preparation method of the low RDA friction type silicon dioxide is 0.14-0.16MPa, and the particle size of the silicon dioxide after crushing is 10-12 μm.
The invention also provides silicon dioxide prepared by the preparation method of the low RDA friction type silicon dioxide.
According to the invention, the water glass solution with the modulus of 3 and the sulfuric acid solution are used as reaction raw materials, and the silane coupling agent is added in the reaction process to prepare the low RDA friction type silicon dioxide, so that the technical defects that the friction type silicon dioxide prepared by the existing precipitation method has strong friction force, the prepared toothpaste is not suitable for old people and children, the viscosity, the appearance and the taste of the toothpaste are changed due to the adjustment of the formula, and the experience of consumers and the production cost are influenced are overcome.
The invention adopts water with the modulus of 3 and the molar concentration of 0.71-0.77mol/LThe glass solution is reacted, neutralization reaction is carried out by dripping alkali into acid, silane coupling agent KH570 is added in the process, the process adopts a gel method to prepare silicon dioxide, and water glass is hydrolyzed to obtain SiO (OH) in the acid process3)]-. Under acidic conditions, the polymerization process proceeds slowly, and the adjacent silicon hydroxyl groups in the polymer undergo condensation polymerization, thereby leading to further ring-closure reaction to form a compact three-dimensional product, which constitutes the precursor core of the gel particles. After that, the particles grow, the particles are linked with each other to form a chain or a network structure, the whole system forms gel, and SiOH exists on the surface of the particles. Meanwhile, because the reaction conditions are acidic, the silica particles stop growing when the volume is small, and the particles are combined to construct a three-dimensional network sol-gel structure. The silane coupling agent is added before the flocculent precipitate appears, so that the hydroxyl on the surface of the product can be improved, the product is more hydrophilic, the surface wettability is better, the friction force of the silicon dioxide is reduced, and the silicon dioxide is more tightly combined with a liquid phase in the toothpaste.
Compared with the prior art, the low RDA friction type silicon dioxide and the preparation method thereof provided by the invention have the following advantages:
(1) the copper consumption value of 15% dispersion liquid of the friction type silicon dioxide in 70% sorbitol in 10000 times of brush grinding can be as low as 1.2mg, the RDA value is 120-130, and the friction capacity of the silicon dioxide is greatly reduced;
(2) the water absorption capacity of the silicon dioxide prepared by the invention is 12-16mL/20g, the oil absorption value is 86-101mL/100g, the apparent density is 0.47-0.51g/mL, and the silicon dioxide accords with the relevant regulations of friction type silicon dioxide;
(3) the preparation method of the silicon dioxide provided by the invention has the advantages of low reaction temperature, low production energy consumption, simple reaction steps and controllable conditions, and can not cause the viscosity, the appearance and the taste of the toothpaste to change when being applied to the toothpaste, thereby influencing the experience of consumers, further reducing the production cost of the toothpaste and being suitable for industrial mass production.
Detailed Description
The present invention will be further described below by way of specific embodiments, but the present invention is not limited to only the following examples. Various modifications can be made by those skilled in the art based on the basic idea of the invention, but it is within the scope of the invention as long as it does not depart from the basic idea of the invention.
In the preparation method of the low RDA friction silica in this embodiment, the modulus of the water glass in step S2 is 3; the silane coupling agent is of type KH 570.
Example 1 Low RDA Friction silica and Process for making same
The preparation method of the low RDA friction type silicon dioxide comprises the following steps:
s1, preparing a sulfuric acid solution with the molar concentration of 0.70 mol/L;
s2, adding deionized water into the water glass for dilution and dissolution, aging for 5 hours, and adding water into the aged water glass for dilution to prepare a water glass solution with the mass concentration of 0.71 mol/L;
s3, adding the mixture into a reaction tank with the volume of 12m3Starting a stirring device for the sulfuric acid solution prepared in the step S1, wherein the stirring frequency is 35Hz, and heating to 40 ℃;
s4, adding the water glass solution prepared in the step S2 into the sulfuric acid solution heated in the step S3 dropwise, wherein the dropping speed of the water glass solution is 22m3H, and the addition amount in the water glass solution is 0.8m3Adding a silane coupling agent, wherein the adding amount of the silane coupling agent is 25L, and continuously dripping a water glass solution under the stirring state until gel is formed to initially form silicon dioxide;
s5, performing filter pressing and washing on the silicon dioxide formed in the step S4, wherein the pressure is 0.14MPa, drying, and crushing to obtain the silicon dioxide with the particle size of 10 microns.
Example 2 Low RDA Friction silica and Process for making same
The preparation method of the low RDA friction type silicon dioxide comprises the following steps:
s1, preparing a sulfuric acid solution with the molar concentration of 0.74 mol/L;
s2, adding deionized water into water glass for dilution and dissolution, aging for 6.5 hours, and adding water into the aged water glass for dilution to prepare a water glass solution with the mass concentration of 0.75 mol/L;
s3, adding the mixture into a reaction tank with the volume of 12m3Starting a stirring device for the sulfuric acid solution prepared in the step S1, wherein the stirring frequency is 38Hz, and heating to 43 ℃;
s4, adding the water glass solution prepared in the step S2 into the sulfuric acid solution heated in the step S3 dropwise, wherein the dropping speed of the water glass solution is 24m3H, and the addition amount in the water glass solution is 0.8m3Adding a silane coupling agent, wherein the adding amount of the silane coupling agent is 30L, and continuously dripping a water glass solution under the stirring state until gel is formed to initially form silicon dioxide;
s5, performing filter pressing and washing on the silicon dioxide formed in the step S4, wherein the pressure is 0.15MPa, drying, and crushing to obtain the silicon dioxide with the particle size of 11 microns.
Example 3 Low RDA Friction silica and method of making
The preparation method of the low RDA friction type silicon dioxide comprises the following steps:
s1, preparing a sulfuric acid solution with the molar concentration of 0.80 mol/L;
s2, adding deionized water into the water glass for dilution and dissolution, aging for 8 hours, and adding water into the aged water glass for dilution to prepare a water glass solution with the mass concentration of 0.77 mol/L;
s3, adding the mixture into a reaction tank with the volume of 12m3Starting a stirring device for the sulfuric acid solution prepared in the step S1, wherein the stirring frequency is 40Hz, and heating to 45 ℃;
s4, adding the water glass solution prepared in the step S2 into the sulfuric acid solution heated in the step S3 dropwise, wherein the dropping speed of the water glass solution is 25m3H, and the addition amount in the water glass solution is 0.8m3Adding a silane coupling agent, wherein the adding amount of the silane coupling agent is 35L, and continuously dripping a water glass solution under the stirring state until gel is formed to initially form silicon dioxide;
s5, performing filter pressing and washing on the silicon dioxide formed in the step S4, wherein the pressure is 0.16MPa, drying, and crushing to obtain the silicon dioxide with the particle size of 12 microns.
Comparative example 1, a friction type silica and a method for preparing the same
The method of making the friction silica described in this comparative example was similar to example 2.
The comparative example differs from example 2 in that: the modulus of the water glass described in this comparative example was 3.5.
Comparative example 2, a friction type silica and a method for preparing the same
The method of making the friction silica described in this comparative example was similar to example 2.
The comparative example differs from example 2 in that: the silica production method described in this comparative example does not add a silane coupling agent in step S4.
Comparative example 3, a silica of friction type and a method for preparing the same
The method of making the friction silica described in this comparative example was similar to example 2.
The comparative example differs from example 2 in that: the molar concentration of the water glass solution in step S2 of the silica production method described in this comparative example was 1.05 mol/L.
Test example, Friction Performance test of Low RDA Friction silica
Test materials: silicas obtained in examples 1 to 3 and comparative examples 1 to 3;
the test method comprises the following steps: RDA value: determining the RDA value of the test material by adopting a radioactive tracing method; detecting the water absorption capacity, oil absorption value and apparent density of a test sample by referring to GB/T32661-2016 spherical silica micro powder;
the method for measuring the copper loss value comprises the following steps: dispersing the test material in 70% of sorbitol (silicon dioxide: sorbitol is 1:6), rubbing the test material on a copper sheet immersed with the dispersion liquid back and forth 10000 times by an excessively hard particle tester modified in a laboratory, and weighing the loss value of the copper sheet before and after rubbing to obtain the copper loss value. Generally, the copper loss value of the ordinary silica is within 2.0mg, and the copper loss value of the medium friction silica is between 2.0 and 10.0 mg.
And (3) test results: the test results are shown in Table 1.
TABLE 1 Friction Capacity test results for Low RDA Friction silica
As can be seen from Table 1, the low RDA friction type silicon dioxide provided by the invention has the RDA value of 120-130, the water absorption capacity of 12-16mL/20g, the oil absorption value of 86-101mL/100g, the apparent density of 0.47-0.51g/mL, and the copper consumption value of 15% dispersion liquid in 70% sorbitol in 10000 times of brushing and grinding is 1.2-1.5 mg. Among them, the silica prepared in example 2 has the lowest RDA value, the best water absorption capacity, oil absorption value and apparent density, and the lowest copper loss value, and is the best example of the present invention.
Comparative example 1 changed the modulus of water glass compared to example 2, but the water absorption and oil absorption values of the produced silica increased, the apparent density decreased, and the RDA value and copper loss value increased.
Compared with the example 2, the silane coupling agent is not added in the comparative example 2, the RDA value and the copper consumption value of the prepared silicon dioxide are increased, the water absorption capacity and the oil absorption value are also increased, and the apparent density is reduced, which shows that the silane coupling agent can improve the hydroxyl on the surface of the product in the preparation process of the invention, so that the product is more hydrophilic, the surface wettability is better, and the friction force of the silicon dioxide is reduced.
Compared with the example 2, the concentration of the water glass solution is changed in the comparative example 3, but the RDA value and the copper consumption value of the prepared silicon dioxide are increased, the water absorption capacity and the oil absorption capacity are also increased, and the apparent density is reduced, because the concentration of the water glass is increased, the acidic condition of the reaction system is locally influenced in the dropping process, so that the ring-closing reaction is damaged, the structure of gel particles is changed, and the particle size of the silicon dioxide is increased.
The foregoing embodiments are merely illustrative of the principles and utilities of the present invention and are not intended to limit the invention. Those skilled in the art will recognize that changes may be made to the embodiments described above without departing from the spirit and scope of the invention. Therefore, it is intended that all equivalent modifications or changes which can be made by those skilled in the art without departing from the technical spirit of the present invention are covered by the claims of the present invention.
Claims (8)
1. A preparation method of low RDA friction type silicon dioxide is characterized by comprising the following steps:
s1, preparing a sulfuric acid solution with the concentration of 0.70-0.80 mol/L;
s2, adding water into the water glass for dilution and dissolution, aging for 5-8h, and adding water into the aged water glass for dilution to prepare a water glass solution with the concentration of 0.71-0.77 mol/L;
s3, adding the mixture into a reaction tank with the volume of 12m3Starting a stirring device for the sulfuric acid solution prepared in the step S1, and heating to 40-45 ℃;
s4, dropwise adding the water glass solution prepared in the step S2 into the sulfuric acid solution heated in the step S3, wherein the adding amount of the water glass solution is 0.8m3Adding a silane coupling agent, and continuously dripping a water glass solution under the stirring state until gel is formed to initially form silicon dioxide;
and S5, performing filter pressing and washing on the silicon dioxide formed in the step S4, and drying and crushing to obtain the silicon dioxide.
2. The method of claim 1, wherein the water glass of step S2 has a modulus of 3.
3. The method according to claim 1, wherein the stirring frequency of the stirring device in step S3 is 35-40 Hz.
4. The method for preparing a low RDA friction silica according to claim 1, wherein the dropping speed of the water glass solution in step S4 is 22-25m3/h。
5. The method of claim 1, wherein the silane coupling agent is added in an amount of 25 to 35L in step S4.
6. The method of claim 5, wherein the silane coupling agent is KH 570.
7. The method of claim 1, wherein the pressure of the pressure filtration washing in step S5 is 0.14-0.16MPa, and the particle size of the crushed silica is 10-12 μm.
8. A silica prepared according to the process for preparing a low RDA friction silica as claimed in any one of claims 1 to 7.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114199712A (en) * | 2021-11-26 | 2022-03-18 | 金三江(肇庆)硅材料股份有限公司 | Method for measuring oil absorption value of silicon dioxide |
| CN115849395A (en) * | 2022-11-16 | 2023-03-28 | 金三江(肇庆)硅材料股份有限公司 | Abrasion-resistant silicon dioxide and preparation method and application thereof |
| CN117263193A (en) * | 2023-09-04 | 2023-12-22 | 金三江(肇庆)硅材料股份有限公司 | Porous silicon dioxide and preparation method and application thereof |
| CN117323241A (en) * | 2023-10-24 | 2024-01-02 | 金三江(肇庆)硅材料股份有限公司 | Silica particles for oral cavity as well as preparation method and application thereof |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4632826A (en) * | 1984-07-07 | 1986-12-30 | Henkel Kommanditgesellschaft Auf Aktien | Polishing composition and dentifrice |
| US5531822A (en) * | 1993-03-01 | 1996-07-02 | Morizane; Toshinori | Modifier for porous materials and method of modifying porous materials |
| US20060120941A1 (en) * | 2004-12-02 | 2006-06-08 | Jianfeng Chen | Silica support material, its application in a polyalkene catalyst, and its preparation process |
| CN1842569A (en) * | 2003-06-30 | 2006-10-04 | 日本瑞翁株式会社 | Rubber composition containing silica and method for production therof |
| CN101087659A (en) * | 2004-12-23 | 2007-12-12 | J.M.休伯有限公司 | Methods of producing improved cleaning abrasives for dentifrices |
| CN105113290A (en) * | 2015-09-16 | 2015-12-02 | 广东溢达纺织有限公司 | Natural dye mordanting dyeing or mordanting printing product and preparation method thereof |
| CN105935158A (en) * | 2016-06-24 | 2016-09-14 | 宏杰内衣股份有限公司 | Vertical cotton breathable bra cup pad with silica gel net and preparation method thereof |
| US20170105913A1 (en) * | 2013-03-15 | 2017-04-20 | J.M. Huber Corporation | High Cleaning Silica With Low Abrasion And Method Of Making Same |
| CN107418054A (en) * | 2017-08-02 | 2017-12-01 | 汕头市贝斯特科技有限公司 | A kind of high transparency low-friction coefficient bonding-prevention master batch and preparation method thereof |
| CN108190893A (en) * | 2017-12-28 | 2018-06-22 | 广州市飞雪材料科技有限公司 | A kind of preparation method of baffle plate of lead acid storage battery silica |
| CN109264728A (en) * | 2018-11-13 | 2019-01-25 | 广州市飞雪材料科技有限公司 | A kind of low abrasion high cleaning friction type silica and preparation method thereof |
| CN111757850A (en) * | 2018-02-23 | 2020-10-09 | 瓦克化学股份公司 | Highly dispersed precipitated silica |
-
2020
- 2020-10-23 CN CN202011146012.7A patent/CN112265996B/en active Active
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4632826A (en) * | 1984-07-07 | 1986-12-30 | Henkel Kommanditgesellschaft Auf Aktien | Polishing composition and dentifrice |
| US5531822A (en) * | 1993-03-01 | 1996-07-02 | Morizane; Toshinori | Modifier for porous materials and method of modifying porous materials |
| CN1842569A (en) * | 2003-06-30 | 2006-10-04 | 日本瑞翁株式会社 | Rubber composition containing silica and method for production therof |
| US20060120941A1 (en) * | 2004-12-02 | 2006-06-08 | Jianfeng Chen | Silica support material, its application in a polyalkene catalyst, and its preparation process |
| CN101087659A (en) * | 2004-12-23 | 2007-12-12 | J.M.休伯有限公司 | Methods of producing improved cleaning abrasives for dentifrices |
| US20170105913A1 (en) * | 2013-03-15 | 2017-04-20 | J.M. Huber Corporation | High Cleaning Silica With Low Abrasion And Method Of Making Same |
| CN105113290A (en) * | 2015-09-16 | 2015-12-02 | 广东溢达纺织有限公司 | Natural dye mordanting dyeing or mordanting printing product and preparation method thereof |
| CN105935158A (en) * | 2016-06-24 | 2016-09-14 | 宏杰内衣股份有限公司 | Vertical cotton breathable bra cup pad with silica gel net and preparation method thereof |
| CN107418054A (en) * | 2017-08-02 | 2017-12-01 | 汕头市贝斯特科技有限公司 | A kind of high transparency low-friction coefficient bonding-prevention master batch and preparation method thereof |
| CN108190893A (en) * | 2017-12-28 | 2018-06-22 | 广州市飞雪材料科技有限公司 | A kind of preparation method of baffle plate of lead acid storage battery silica |
| CN111757850A (en) * | 2018-02-23 | 2020-10-09 | 瓦克化学股份公司 | Highly dispersed precipitated silica |
| CN109264728A (en) * | 2018-11-13 | 2019-01-25 | 广州市飞雪材料科技有限公司 | A kind of low abrasion high cleaning friction type silica and preparation method thereof |
Non-Patent Citations (5)
| Title |
|---|
| S.K.WASON，ET AL: "Cosmetic properties and structure of fine-particle synthetic precipitated silicas", 《JOURNAL OF THE SOCIETY OF COSMETIC CHEMISTS》 * |
| SCHEMEHORN BRUCE R,ET AL: "Abrasion, polishing, and stain removal characteristics of various commercial dentifrices in vitro", 《THE JOURNAL OF CLINICAL DENTISTRY》 * |
| 王维等: "KH570原位改性纳米SiO2球状颗粒的制备及疏水效果评价", 《中国粉体技术》 * |
| 苏二强: "沉淀法合成牙膏摩擦剂二氧化硅", 《中国优秀硕士学位论文全文数据库 工程科技I辑 B018-63》 * |
| 苏瑞彩等: "硅烷偶联剂KH570对纳米SiO2的表面改性及其分散稳定性", 《化工进展》 * |
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| CN114199712A (en) * | 2021-11-26 | 2022-03-18 | 金三江(肇庆)硅材料股份有限公司 | Method for measuring oil absorption value of silicon dioxide |
| CN115849395A (en) * | 2022-11-16 | 2023-03-28 | 金三江(肇庆)硅材料股份有限公司 | Abrasion-resistant silicon dioxide and preparation method and application thereof |
| CN115849395B (en) * | 2022-11-16 | 2023-06-30 | 金三江(肇庆)硅材料股份有限公司 | Abrasion-resistant silicon dioxide and preparation method and application thereof |
| CN117263193A (en) * | 2023-09-04 | 2023-12-22 | 金三江(肇庆)硅材料股份有限公司 | Porous silicon dioxide and preparation method and application thereof |
| CN117263193B (en) * | 2023-09-04 | 2024-04-30 | 金三江(肇庆)硅材料股份有限公司 | Porous silicon dioxide and preparation method and application thereof |
| CN117323241A (en) * | 2023-10-24 | 2024-01-02 | 金三江(肇庆)硅材料股份有限公司 | Silica particles for oral cavity as well as preparation method and application thereof |
| CN117323241B (en) * | 2023-10-24 | 2024-05-28 | 金三江(肇庆)硅材料股份有限公司 | Silica particles for oral cavity as well as preparation method and application thereof |
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