CN112229513B - Three-grating splicing system - Google Patents
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- 230000007246 mechanism Effects 0.000 claims abstract description 78
- 238000002955 isolation Methods 0.000 claims abstract description 16
- 239000010453 quartz Substances 0.000 claims description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 29
- 239000003292 glue Substances 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 17
- 238000012544 monitoring process Methods 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 5
- 229910000831 Steel Inorganic materials 0.000 claims description 4
- 239000010959 steel Substances 0.000 claims description 4
- 238000005188 flotation Methods 0.000 claims description 3
- 238000001514 detection method Methods 0.000 description 11
- 238000005259 measurement Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000013519 translation Methods 0.000 description 3
- 238000012937 correction Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
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- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0235—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using means for replacing an element by another, for replacing a filter or a grating
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0243—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows having a through-hole enabling the optical element to fulfil an additional optical function, e.g. a mirror or grating having a throughhole for a light collecting or light injecting optical fiber
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
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Abstract
A three-grating splicing system, comprising: the interferometer wavefront measuring system comprises a laser interferometer and a two-dimensional angle adjusting mechanism, wherein the two-dimensional angle adjusting mechanism is arranged below the slope of the laser interferometer, the grating splicing mechanism comprises an air floatation vibration isolation platform, a supporting and horizontal coarse adjusting mechanism, a parallel support, a bottom plate and a grating position adjusting and positioning mechanism, the air floatation vibration isolation platform is arranged right below the laser interferometer, the supporting and horizontal coarse adjusting mechanism is arranged on the air floatation vibration isolation platform and located on the periphery of the laser interferometer, the four positioning supports of the supporting and horizontal coarse adjusting mechanism are located on the same horizontal plane, the parallel support is arranged on the supporting and horizontal coarse adjusting mechanism, the bottom plate is arranged on the parallel support, and the grating position adjusting and positioning mechanism is arranged on the bottom plate. The three-grating splicing system is high in splicing precision and splicing efficiency.
Description
Technical Field
The invention relates to the technical field of precision manufacturing of optical devices, in particular to a three-grating splicing system.
Background
The grating is used as a core device of a spectrum instrument, is widely applied to observation and material detection technologies in the fields of astronomy, national defense and civil high-tech, and plays a key role in related instruments. With the development of national economy, the development of spectral instruments is also towards the high tip, in particular, astronomical spectrometers need larger-area gratings to improve the resolution, and a plurality of manufacturing bottlenecks exist when the size of a single large-area grating exceeds the meter level. Therefore, medium area grating splicing techniques are known as an effective means for the continued expansion of the grating fabrication area. Grating stitching imposes more stringent requirements on the multidimensional adjustment precision of the grating and the adjusted copy manufacturing.
The existing splicing technology mainly focuses on a multi-dimensional adjustment splicing technology for two gratings, and does not consider the procedures and technical difficulties of copying and manufacturing after splicing, and particularly, the procedures of splicing precision adjustment, splicing state detection, positioning, copying and curing and the like of the gratings in the splicing of more than three gratings are the precondition for whether the spliced gratings can be successfully applied.
The existing splicing technology focuses on splicing two small-size gratings, and a splicing state with high precision can be obtained, but the state is a variable state, is supported by a plurality of adjusting devices, cannot be moved to an application occasion, and is poor in stability.
The existing splicing technology mainly focuses on the face-up of a grating, an interferometer directly obtains the precision state of the splicing wavefront of the grating, but the requirement can be met only by a plurality of adjusting mechanisms through multidimensional adjustment due to the fact that no uniform high-precision reference face exists, the complexity of a system is increased, and the stability of the precision after splicing is influenced.
Disclosure of Invention
Based on the three-grating splicing precision on-line monitoring and positioning copying device, the three-grating splicing precision on-line monitoring and positioning copying device is provided, and the technical problems of high multi-grating splicing difficulty, low splicing precision and low splicing efficiency in the prior art are solved.
In order to solve the above technical problem, the present application provides a three-grating splicing system, the three-grating splicing system includes: an interferometer wavefront measuring system and a grating splicing mechanism,
the interferometer wavefront measuring system comprises a laser interferometer and a two-dimensional angle adjusting mechanism, wherein the two-dimensional angle adjusting mechanism is arranged on the oblique lower surface of the laser interferometer,
the grating splicing mechanism comprises an air-floatation vibration isolation platform, a supporting and horizontal coarse adjustment mechanism, a parallel bracket, a bottom plate and a grating position adjusting and positioning mechanism, the air-floatation vibration isolation platform is arranged right below the laser interferometer,
the supporting and horizontal coarse adjustment mechanism is arranged on the air floatation vibration isolation platform and located on the periphery of the laser interferometer, four positioning supports of the supporting and horizontal coarse adjustment mechanism are located on the same horizontal plane, the parallel supports are arranged on the supporting and horizontal coarse adjustment mechanism, the bottom plate is arranged on the parallel supports, and the grating position adjustment and positioning mechanism is arranged on the bottom plate.
Furthermore, the grating position adjusting and positioning mechanism comprises a positioning frame, a fine adjustment screw, a first supporting spring and a quartz substrate high-precision plane,
the positioning frame is rigidly fixed on the horizontal fine adjustment mechanism, the three gratings are arranged in the positioning frame, a coarse adjustment knob is arranged right in front of the positioning frame to realize coarse adjustment of the position of the gratings, fine adjustment screws are arranged on the left side and the right side of the positioning frame to realize fine adjustment of the position of the gratings, one end of the first support spring is abutted to the inner side right behind the positioning frame, and the other end of the first support spring is abutted to the three gratings.
Further, a second supporting spring is arranged between the adjacent gratings.
Furthermore, the grating splicing mechanism further comprises a horizontal fine adjustment mechanism, the horizontal fine adjustment mechanism is supported on the bottom plate at three points by a horizontal fine adjustment screw with a steel ball tip, and the horizontal fine adjustment mechanism is adjusted through the horizontal fine adjustment screw.
Furthermore, the laser interferometer emits diffraction light to the high-precision plane of the quartz substrate, a reference light spot is formed on a processing system of the laser interferometer, the reference light spot is adjusted to be parallel by the high-precision plane of the quartz substrate and the horizontal fine adjustment mechanism, the reference light spot is positioned in the center of the high-precision plane of the quartz substrate, a liquid glue layer is uniformly coated on the high-precision plane of the quartz substrate, and the surfaces of the three gratings face downwards and are arranged on the liquid glue layer.
Further, the liquid glue curing device further comprises an ultraviolet curing system, wherein the ultraviolet curing system is used for realizing rapid curing of the liquid glue at the normal temperature.
Furthermore, the laser interferometer has an effective monitoring aperture of 150mm and is provided with a wavefront monitoring and analyzing software system.
Further, the grating splicing mechanism is arranged in the emergent light direction of the laser interferometer.
Further, the two-dimensional angle adjusting mechanism comprises coarse adjustment and fine adjustment, the coarse adjustment is used for changing the emergent light direction of a collimating lens of the laser interferometer, and the fine adjustment is used for accurately positioning the deviation degree of the diffraction light spot.
Furthermore, the three gratings are high-quality gratings evaporated in the same batch by a single odd/even generation plate from a unified master plate, and the lines of the three gratings are vertical to the arrangement direction of the three gratings.
The beneficial effects of the technical scheme of the application are that: the application provides a three-grating splicing system; the method takes a high-precision plane of a quartz substrate as a reference, takes liquid glue as a grating nondestructive buckling and moving medium, and realizes online dynamic adjustment and splicing; the position is fixed through the air-floatation vibration isolation platform, the supporting and horizontal coarse adjustment mechanism, the parallel support, the horizontal fine adjustment mechanism and the grating position adjustment and positioning mechanism, so that the influences of a translation error, an angle deviation error and a flatness error of flatness in the process of splicing three gratings are effectively avoided, and meanwhile, the invention has larger load capacity and is suitable for the combined splicing of larger plane gratings; the three-grating splicing precision on-line detection device utilizes a laser interferometer and a quartz substrate high-precision plane to realize exposure of the grating, respectively forms a reference light spot, a measurement light spot and an interference fringe, compares the distribution position of the light spots and the parallelism of the interference fringe, provides correction data for the splicing error of the grating, and further realizes detection of the three-grating splicing precision on-line detection device. In addition, the three-grating splicing system uses a laser interferometer and a quartz substrate high-precision plane to realize the incident detection measurement of the same incident angle, and the three-grating splicing positioning copying device is greatly simplified.
Drawings
FIG. 1 is a schematic view of a combination of an interferometer wavefront measurement system and a grating stitching mechanism of a three-grating stitching system according to an embodiment of the present disclosure;
fig. 2 is a top view of a position adjustment and positioning mechanism of a three-grating stitching system according to an embodiment of the present disclosure;
fig. 3 is a schematic diagram of positioning and copying of a three-grating stitching system according to an embodiment of the present application.
The meaning of the reference symbols in the drawings is:
101-a laser interferometer; 102-a two-dimensional angle adjustment mechanism; 103-an air flotation vibration isolation platform;
104-supporting and horizontal coarse adjusting mechanism; 105-a parallel support; 106-a backplane; 107-horizontal fine adjustment mechanism;
108-a position adjustment positioning mechanism; 109-a positioning frame; 110-a fine adjustment screw; 111-support springs;
112-quartz substrate high precision plane; 113-a grating; 114-liquid glue layer;
Detailed Description
To facilitate an understanding of the invention, the invention will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present invention are shown in the drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.
Example 1:
the embodiment of the application provides a three-grating splicing system, adopt the laser interferometer through detecting three grating diffraction wavefront concatenation real-time status through the quartz base high accuracy plane bottom, realize the system that three grating relative position pinpointed and duplicate, use quartz base high accuracy plane as the benchmark, use liquid glue as the grating not damaged to detain and put and remove the medium, realize online dynamic adjustment and splice, and then solve the technical problem that many grating concatenation degree of difficulty is big, concatenation precision and concatenation efficiency all hang down that prior art exists.
A three-grating stitching system, comprising: the interferometer wavefront measuring system comprises a laser interferometer 101 and a two-dimensional angle adjusting mechanism 102, wherein the two-dimensional angle adjusting mechanism 102 is arranged obliquely below the laser interferometer 101, and specifically, the laser interferometer 101 has an effective detection aperture of 150mm and is provided with a wavefront detection and analysis software system.
The two-dimensional angle adjustment mechanism 102 includes coarse adjustment and fine adjustment, the coarse adjustment is disposed below the fine adjustment, the coarse adjustment is used for changing the emergent light direction of the collimating lens of the laser interferometer 101, and the fine adjustment is used for accurately positioning the offset of the diffraction spot.
The grating splicing mechanism comprises an air-floatation vibration isolation platform 103, a supporting and horizontal coarse adjustment mechanism 104, a parallel bracket 105, a bottom plate 106, a grating position adjusting and positioning mechanism 108 and a horizontal fine adjustment mechanism 107;
the air-floatation vibration isolation platform 103 is arranged right below the laser interferometer 101 and used for adjusting the levelness of the laser interferometer 101 and ensuring that the parallelism of the laser interferometer 101 and the air-floatation vibration isolation platform 103 is consistent;
the supporting and horizontal coarse adjustment mechanism 104 is arranged on the air-floatation vibration isolation platform 103 and located around the laser interferometer 101, four positioning brackets of the supporting and horizontal coarse adjustment mechanism 104 are located on the same horizontal plane, the height parallelism of the positioning brackets is adjusted through screws, rubber is mounted at the tops of the positioning brackets, the parallel bracket 105 is arranged on the supporting and horizontal coarse adjustment mechanism 104, and in this embodiment, the parallel bracket 105 is made of mixed steel; the bottom plate 106 is arranged on the parallel bracket 105, the horizontal fine adjustment mechanism 107 is a fine adjustment screw with a steel ball tip and is supported on the bottom plate 106 at three points, the horizontal fine adjustment mechanism 107 is accurately adjusted to be in a horizontal state through the fine adjustment screw, and the grating position adjustment and positioning mechanism 108 is arranged on the bottom plate 106.
The grating position adjusting and positioning mechanism 108 comprises a positioning frame 109, a fine tuning screw 110, a supporting spring 111 and a quartz substrate high-precision plane 112;
the quartz substrate high-precision plane 112 can be used as a Z-direction positioning reference during grating splicing to reduce the grating splicing freedom degree; the quartz substrate high-precision plane 112 is a reference plane, and the two-dimensional measurement of 320mm × 120mm can be realized on the quartz substrate high-precision plane 112.
The positioning frame 109 is rigidly fixed to the horizontal fine adjustment mechanism 107, the three gratings 113 are arranged in the positioning frame 109, a coarse adjustment knob is arranged right in front of the positioning frame 109 to realize coarse adjustment of the position of the gratings, fine adjustment screws 110 are arranged on the left side and the right side of the positioning frame 109 to realize fine adjustment of the relative position of the three gratings 113, one end of the support spring 111 abuts against the inner side right behind the positioning frame 109, and the other end abuts against the three gratings 113.
Further, a support spring 111 is also disposed between the adjacent gratings. Support springs 111 are provided between the positioning frame 109 and the gratings, and between adjacent gratings, and serve to urge the gratings in a specific direction.
In the embodiment of the application, the combination of the laser interferometer 101, the quartz substrate high-precision plane 112, the three gratings 113, the liquid glue layer 114 and the ultraviolet curing system realizes the positioning and copying functions of the gratings to form a positioning and copying device, and the ultraviolet curing system comprises an ultraviolet lamp array, a sliding block and a power adjusting module, and can realize the rapid curing of the liquid ultraviolet glue at normal temperature; specifically, the method comprises the following steps:
the laser interferometer 101 emits diffraction light to the quartz substrate high-precision plane 112, a reference light spot is formed on a processing system of the laser interferometer 101, parallelism is adjusted by the quartz substrate high-precision plane 112 and the horizontal fine adjustment mechanism 107, the reference light spot is positioned in the center of the quartz substrate high-precision plane 112, a liquid glue layer 114 is uniformly coated on the quartz substrate high-precision plane 112, the surface of the three gratings 113 is downwards placed on the liquid glue layer 114, and small bubbles are prevented from being generated through slight extrusion. The laser interferometer 101 emits diffracted light to the quartz substrate high-precision plane 112 and the liquid glue layer 114, and a measuring light spot is formed in a processing system of the laser interferometer 101; the reference light spot and the measurement grating are overlapped by the grating position adjusting and positioning mechanism 108.
The processing system of the laser interferometer 101 forms an upper group of interference fringes and a lower group of interference fringes, and the parallelism of the three groups of interference fringes is kept consistent through fine adjustment of the grating position adjusting and positioning mechanism 108; the three grating splicing parts are kept still, and an ultraviolet curing system is started to move along the direction of the guide rail and uniformly cure; closing the three grating curing parts and separating the gratings; and correcting the splicing of the grating according to the light spots and the interference fringes, and eliminating the translation error, the angle deviation error and the flatness error of the grating so as to keep the parallelism of the light spots and the fringes of the three gratings consistent.
In the embodiment of the present application, the three gratings 113 include three diffraction gratings with the same scribed grating lines, and the three gratings 113 are single odd/even generation gratings from the same master mask and high quality gratings evaporated in the same batch, so that the grating lines are perpendicular to the grating arrangement direction, and the grating grooves are all placed downward on the quartz substrate high precision plane 112. The quality of the interference wave front measured by the interferometer wave front measuring system is that the interferometer obtains the wave front states of the three downward-arranged gratings at a certain diffraction angle through the quartz substrate and the liquid glue layer 114.
The application provides a three-grating splicing system, which takes a quartz substrate high-precision plane 112 as a reference, takes liquid glue as a non-damage grating buckling and moving medium, and realizes online dynamic adjustment and splicing; the position is fixed through the air-floatation vibration isolation platform 103, the supporting and horizontal coarse adjustment mechanism 104, the parallel support 105, the horizontal fine adjustment mechanism 107 and the grating position adjustment and positioning mechanism 108, so that the influences of a translation error, an angle deviation error and a flatness error of flatness in the three-grating splicing process are effectively avoided, and meanwhile, the invention has larger load capacity and is suitable for the combined splicing of larger plane gratings; the three-grating splicing precision online detection device utilizes the laser interferometer 101 and the quartz substrate high-precision plane 112 to realize exposure of the grating, respectively forms a reference light spot, a measurement light spot and an interference fringe, compares the distribution position of the light spots and the parallelism of the interference fringe, provides correction data for the splicing error of the grating, and further realizes precision online detection of a three-grating splicing system. In addition, the three-grating splicing system uses a laser interferometer 101 and a quartz substrate high-precision plane 112 to realize the incident detection measurement of the same incident angle, and the three-grating splicing positioning copying device is greatly simplified.
The technical features of the above embodiments can be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the above embodiments are not described, but should be considered as the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above examples only express preferred embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (9)
1. A three-grating stitching system, comprising: an interferometer wavefront measuring system and a grating splicing mechanism,
the interferometer wavefront measuring system comprises a laser interferometer and a two-dimensional angle adjusting mechanism, wherein the two-dimensional angle adjusting mechanism is arranged on the oblique lower surface of the laser interferometer,
the grating splicing mechanism comprises an air-floatation vibration isolation platform, a supporting and horizontal coarse adjustment mechanism, a parallel bracket, a bottom plate and a grating position adjusting and positioning mechanism,
the air-flotation vibration isolation platform is arranged right below the laser interferometer, the supporting and horizontal coarse adjustment mechanism is arranged on the air-flotation vibration isolation platform and is positioned at the periphery of the laser interferometer, four positioning supports of the supporting and horizontal coarse adjustment mechanism are positioned on the same horizontal plane, the parallel supports are arranged on the supporting and horizontal coarse adjustment mechanism, the bottom plate is arranged on the parallel supports, and the grating position adjustment and positioning mechanism is arranged on the bottom plate;
the grating position adjusting and positioning mechanism comprises a positioning frame, a fine adjustment screw, a first supporting spring and a quartz substrate high-precision plane,
the grating splicing mechanism also comprises a horizontal fine adjustment mechanism,
the positioning frame is rigidly fixed on the horizontal fine adjustment mechanism, the three gratings are arranged in the positioning frame, a coarse adjustment knob is arranged right in front of the positioning frame to realize coarse adjustment of the position of the gratings, fine adjustment screws are arranged on the left side and the right side of the positioning frame to realize fine adjustment of the position of the gratings, one end of the first support spring is abutted to the inner side right behind the positioning frame, and the other end of the first support spring is abutted to the three gratings.
2. The system of claim 1, wherein a second support spring is disposed between adjacent gratings.
3. The system of claim 1, wherein the horizontal fine adjustment mechanism is supported at three points on the base plate by a horizontal fine adjustment screw having a steel ball tip, and the horizontal fine adjustment mechanism is adjusted by the horizontal fine adjustment screw.
4. The system for splicing three gratings according to claim 3, wherein the laser interferometer emits diffracted light to the high-precision plane of the quartz substrate to form a reference spot on the laser interferometer processing system, the reference spot is adjusted to be parallel by the high-precision plane of the quartz substrate and the horizontal fine adjustment mechanism, the reference spot is located at the center of the high-precision plane of the quartz substrate, a liquid glue layer is uniformly coated on the high-precision plane of the quartz substrate, and the three gratings are placed on the liquid glue layer with their surfaces facing downward.
5. The three-grating splicing system of claim 4, further comprising an ultraviolet curing system, wherein the ultraviolet curing system is used for realizing rapid curing of the liquid glue at a normal temperature.
6. The system of claim 1, wherein the laser interferometer has an effective monitoring aperture of 150mm and is provided with a wavefront monitoring and analysis software system.
7. The system of claim 1, wherein the grating splicing mechanism is disposed in the direction of light emitted from the laser interferometer.
8. The system of claim 1, wherein the two-dimensional angle adjustment mechanism comprises a coarse adjustment and a fine adjustment, the coarse adjustment is used for changing the emergent light direction of the collimating lens of the laser interferometer, and the fine adjustment is used for accurately positioning the offset degree of the diffraction spot.
9. The system of claim 1, wherein the three gratings are formed from a single odd/even version of a uniform master source of a batch of evaporated high quality gratings, and the lines of the three gratings are perpendicular to the alignment direction of the three gratings.
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| CN202011051435.0A CN112229513B (en) | 2020-09-29 | 2020-09-29 | Three-grating splicing system |
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| CN114694519B (en) * | 2022-04-24 | 2023-10-20 | 湖北长江新型显示产业创新中心有限公司 | Panel splicing system and panel splicing method |
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