CN112198565A - Optical antireflection film with ultralow reflectivity - Google Patents
Optical antireflection film with ultralow reflectivity Download PDFInfo
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- 230000003287 optical effect Effects 0.000 title claims abstract description 70
- 238000002310 reflectometry Methods 0.000 title claims abstract description 57
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 76
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract description 76
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims abstract description 76
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims abstract description 75
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims abstract description 75
- 239000005304 optical glass Substances 0.000 claims abstract description 25
- FDJWFATWVVLERO-UHFFFAOYSA-L [F-].[F-].F.F.F.[Mg+2] Chemical compound [F-].[F-].F.F.F.[Mg+2] FDJWFATWVVLERO-UHFFFAOYSA-L 0.000 claims description 3
- IUBGCAIAAJMNJS-UHFFFAOYSA-J dimagnesium;tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Mg+2].[Mg+2] IUBGCAIAAJMNJS-UHFFFAOYSA-J 0.000 claims description 3
- GJOMWUHGUQLOAC-UHFFFAOYSA-L magnesium difluoride hydrofluoride Chemical compound [H+].[F-].[F-].[F-].[Mg++] GJOMWUHGUQLOAC-UHFFFAOYSA-L 0.000 claims description 3
- 230000003667 anti-reflective effect Effects 0.000 claims 2
- 230000035945 sensitivity Effects 0.000 abstract description 8
- 238000013461 design Methods 0.000 abstract description 4
- 230000026676 system process Effects 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 196
- 238000002834 transmittance Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000010923 batch production Methods 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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Abstract
The invention discloses an optical antireflection film with ultralow residual reflectivity, which comprises an antireflection film main body for fixing to optical glass, wherein the antireflection film main body is provided with a near end for fixing to the optical glass and a far end far away from the optical glass; the antireflection film main body comprises thirteen film layers, the thirteen film layers comprise seven magnesium fluoride film layers and six lanthanum titanate film layers, and the magnesium fluoride film layers and the lanthanum titanate film layers are sequentially and alternately stacked and distributed from near to far. The design of 13 layers of films is adopted, and two high-refractive index film layers and low-refractive index film layers of a lanthanum titanate film layer and a magnesium fluoride film layer are alternately distributed. Has the advantages of low residual reflectivity, low film layer sensitivity, no thin layer and good film system process stability.
Description
Technical Field
The invention relates to the technical field of optical antireflection films, in particular to an optical antireflection film with ultralow reflectivity.
Background
When the electromagnetic wave is transmitted from one medium to another medium, the energy of the electromagnetic field is redistributed on the interface due to the difference of the physical properties of the media, and the function of the antireflection film is to influence the energy distribution in the light transmission process by changing the boundary condition of the interface between the optical glass and the air, thereby achieving the effect of enhancing the transmitted light.
The reflectivity of the common optical glass is up to more than 4% under the condition that the surface of the common optical glass is not coated with a film, along with the higher performance requirement of an optical system, 20 optical lenses are possibly needed in one zoom optical system, if no antireflection film is arranged, the energy transmittance of the system is only 20%, and 4% of reflected light can be refracted and reflected for multiple times in the optical system to form stray light, which seriously affects the actual performance of the optical system. At present, the residual reflectivity of the mainstream optical antireflection film is about 0.5%, and then the energy transmittance of an optical system of 20 lenses is about 82%. This is a result of considering only the reflection at the surface of the lens, and if the absorption rate of the optical material, the absorption rate of the film layer, the vignetting of the optical system, etc. are taken into consideration, the total system transmittance will be lower. And if the residual reflectivity of the optical antireflection film can be controlled to be below 0.1%, the theoretical energy transmittance of an optical system of 20 lenses can reach 96%, and is obviously improved compared with the residual reflectivity of 0.5%. The analysis shows that the residual reflectivity of the optical antireflection film is further reduced, so that not only can system stray light caused by residual reflection light be effectively inhibited, but also the transmittance performance of the optical system can be ensured, and the imaging capability of the optical system in a low-light-level environment or even a night environment can be obviously improved.
Disclosure of Invention
The invention mainly aims to provide an optical antireflection film with ultralow reflectivity, and aims to solve the technical problem that the residual reflectivity of the optical antireflection film technology is too high in the prior art.
In order to achieve the above object, the present invention provides an optical antireflection film with ultra-low residual reflectivity, which is applied to optical glass, and includes an antireflection film main body for fixing to the optical glass, wherein the antireflection film main body has a proximal end for fixing to the optical glass and a distal end away from the optical glass;
the antireflection film main body comprises thirteen film layers, the thirteen film layers comprise seven magnesium fluoride film layers and six lanthanum titanate film layers, and the magnesium fluoride film layers and the lanthanum titanate film layers are sequentially and alternately stacked and distributed from near to far.
Optionally, each of the thirteen film layers has a thickness greater than 10 nm.
Optionally, the seven magnesium fluoride film layers are respectively a first magnesium fluoride film layer, a second magnesium fluoride film layer, a third magnesium fluoride film layer, a fourth magnesium fluoride film layer, a fifth magnesium fluoride film layer, a sixth magnesium fluoride film layer and a seventh magnesium fluoride film layer from near to far;
the thickness of the first magnesium fluoride film layer is 26.85nm-27.05 nm; and/or the presence of a gas in the gas,
the thickness of the second magnesium fluoride film layer is 204.04nm-204.24 nm; and/or the presence of a gas in the gas,
the thickness of the third magnesium trifluoride film layer is 15.90nm-16.10 nm; and/or the presence of a gas in the gas,
the thickness of the second magnesium tetrafluoride film layer is 54.66nm-54.86 nm; and/or the presence of a gas in the gas,
the thickness of the second magnesium pentafluoride film layer is 83.14nm-83.34 nm; and/or the presence of a gas in the gas,
the thickness of the sixth magnesium fluoride film layer is 14.90nm-15.20 nm; and/or the presence of a gas in the gas,
the seventh magnesium fluoride film layer is 97.41nm-97.61nm in thickness.
Optionally, the thickness of the first magnesium fluoride film layer is 26.95nm, the thickness of the second magnesium fluoride film layer is 204.14nm, the thickness of the third magnesium fluoride film layer is 16.00nm, the thickness of the fourth magnesium fluoride film layer is 54.76nm, the thickness of the first magnesium fluoride film layer is 83.24nm, the thickness of the sixth magnesium fluoride film layer is 15.00nm, and the thickness of the seventh magnesium fluoride film layer is 97.51 nm.
Optionally, the six lanthanum titanate film layers are respectively a first lanthanum titanate film layer, a second lanthanum titanate film layer, a third lanthanum titanate film layer, a fourth lanthanum titanate film layer, a fifth lanthanum titanate film layer and a sixth lanthanum titanate film layer from near to far;
the thickness of the first lanthanum titanate film layer is 14.98nm-15.18 nm; and/or the presence of a gas in the gas,
the thickness of the second lanthanum titanate film layer is 17.91nm-18.11 nm; and/or the presence of a gas in the gas,
the third lanthanum titanate film layer is 112.53nm-112.73nm in thickness; and/or the presence of a gas in the gas,
the thickness of the fourth lanthanum titanate film layer is 14.90nm-15.10 nm; and/or the presence of a gas in the gas,
the fifth lanthanum titanate film layer is 43.36nm-43.56nm in thickness; and/or the presence of a gas in the gas,
the sixth lanthanum titanate film layer is 61.39nm-61.59nm in thickness.
Optionally, the first lanthanum titanate film layer thickness is 15.08nm, the second lanthanum titanate film layer thickness is 18.01nm, the third lanthanum titanate film layer thickness is 112.63nm, the fourth lanthanum titanate film layer thickness is 15.00nm, the fifth lanthanum titanate film layer thickness is 43.46nm, and the sixth lanthanum titanate film layer thickness is 61.49 nm.
Optionally, the magnesium fluoride film layer has a refractive index of 1.364-1.384.
Optionally, the refractive index of the magnesium fluoride film layer is 1.374.
Optionally, the refractive index of the lanthanum titanate film layer is 2.054-2.074.
Optionally, the refractive index of the lanthanum titanate film layer is 2.064.
In the technical scheme provided by the invention, a 13-layer film design is adopted, and the MGF2 film layers and the H4 film layers with high refractive index and low refractive index are alternately distributed. The high-quality low-residual-reflectivity optical antireflection film has the residual reflectivity lower than 0.1% in the ultra-wide wavelength range of 410-740 nm, and is flat in reflectivity curve and free of obvious reflection peaks. The invention can effectively reduce the residual reflectivity of the lens surface, inhibit the stray light of the system, be more beneficial to ensuring the transmittance performance of the optical system and obviously improve the imaging capability of the optical system in the low-light and even night environment.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the structures shown in the drawings without creative efforts.
FIG. 1 is a schematic structural view of an embodiment of an ultra-low reflectivity optical antireflection film according to the present invention;
FIG. 2 is a graph of residual reflectivity of the ultra-low reflectivity optical antireflection film of FIG. 1;
FIG. 3 is a graph showing the sensitivity of each layer of the ultra-low reflectivity optical antireflection film of FIG. 1.
The reference numbers illustrate:
| reference numerals | Name (R) | Reference numerals | Name (R) |
| 100 | Optical antireflection film with |
101 | Optical glass |
The implementation, functional features and advantages of the objects of the present invention will be further explained with reference to the accompanying drawings.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that, if directional indication is involved in the embodiment of the present invention, the directional indication is only used for explaining the relative positional relationship, the motion situation, and the like between the components in a certain posture, and if the certain posture is changed, the directional indication is changed accordingly.
In addition, if there is a description of "first", "second", etc. in an embodiment of the present invention, the description of "first", "second", etc. is for descriptive purposes only and is not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In addition, the meaning of "and/or" appearing throughout includes three juxtapositions, exemplified by "A and/or B" including either A or B or both A and B. Also, the technical solutions in the embodiments may be combined with each other, but must be based on the realization of those skilled in the art, and when the technical solutions are contradictory or cannot be realized, the combination of the technical solutions should be considered to be absent and not be within the protection scope of the present invention.
When the electromagnetic wave is transmitted from one medium to another medium, the energy of the electromagnetic field is redistributed on the interface due to the difference of the physical properties of the media, and the function of the antireflection film is to influence the energy distribution in the light transmission process by changing the boundary condition of the interface between the optical glass and the air, thereby achieving the effect of enhancing the transmitted light.
The reflectivity of the common optical glass is up to more than 4% under the condition that the surface of the common optical glass is not coated with a film, along with the higher performance requirement of an optical system, 20 optical lenses are possibly needed in one zoom optical system, if no antireflection film is arranged, the energy transmittance of the system is only 20%, and 4% of reflected light can be refracted and reflected for multiple times in the optical system to form stray light, which seriously affects the actual performance of the optical system. At present, the residual reflectivity of the mainstream optical antireflection film is about 0.5%, and then the energy transmittance of an optical system of 20 lenses is about 82%. This is a result of considering only the reflection at the surface of the lens, and if the absorption rate of the optical material, the absorption rate of the film layer, the vignetting of the optical system, etc. are taken into consideration, the total system transmittance will be lower. And if the residual reflectivity of the optical antireflection film can be controlled to be below 0.1%, the theoretical energy transmittance of an optical system of 20 lenses can reach 96%, and is obviously improved compared with the residual reflectivity of 0.5%. The analysis shows that the residual reflectivity of the optical antireflection film is further reduced, so that not only can system stray light caused by residual reflection light be effectively inhibited, but also the transmittance performance of the optical system can be ensured, and the imaging capability of the optical system in a low-light-level environment or even a night environment can be obviously improved.
In view of this, the present invention provides an optical antireflection film with an ultra-low reflectivity, which aims to solve the technical problem in the prior art that the residual reflectivity of the optical antireflection film technology is too high. Fig. 1 to fig. 3 show an embodiment of an optical antireflection film with ultra-low reflectivity according to the present invention.
In the ultra-low reflectivity optical antireflection film 100 of the present embodiment, the ultra-low residual reflectivity optical antireflection film 100 includes an antireflection film main body for being fixed to an optical glass 101, the antireflection film main body has a proximal end for being fixed to the optical glass and a distal end away from the optical glass; the antireflection film main body comprises thirteen film layers, the thirteen film layers comprise seven magnesium fluoride film layers and six lanthanum titanate film layers, and the magnesium fluoride film layers and the lanthanum titanate film layers are sequentially and alternately stacked and distributed from near to far. By adopting a 13-layer film design, two high-refractive-index film layers and a low-refractive-index film layer are alternately distributed, namely a magnesium fluoride film layer (MGF2) and a lanthanum titanate film layer (H4). The optical antireflection film has the advantages of low residual reflectivity, low film layer sensitivity, no thin layer and good film system process stability. The maximum advantage is that the residual reflectivity of the film in the ultra-wide wavelength range of 410 nm-740 nm is lower than 0.1%, compared with a common antireflection film, the film can effectively reduce the residual reflectivity of the lens surface, inhibit the stray light of the system, be more beneficial to ensuring the transmittance performance of the optical system, and obviously improve the imaging capability of the corresponding optical system in the low-light and even night environment.
Fig. 1 is a schematic structural view of an optical antireflection film 100 with low residual reflectivity, which comprises 13 film systems with high refractive index and low refractive index alternately distributed, wherein the substrate material of the film system is common optical glass 101H-ZF4A _ SCHOTT, and the refractive index of the film system at 550nm is 1.733. The 13-layer film system structure is G | (LH)6L | A, wherein G represents the base optical glass 101H-ZF4A, L represents the low-refractive-index magnesium fluoride film layer (MGF2), H represents the high-refractive-index lanthanum titanate film layer (H4), and A represents air. A low refractive index magnesium fluoride film layer (MGF2) and a high refractive index lanthanum titanate film layer (H4). The two coating materials adopted in the optical antireflection film with low residual reflectivity are common coating materials, have the advantages of stable performance and small extinction coefficient, and are beneficial to ensuring the quality of a film system.
Further, in this embodiment, the thickness of each of the thirteen film layers is greater than 10 nm. Generally speaking, thin layers in an antireflection film system are sensitive, the thinnest layer is generally required to be not less than 10nm, and the thinnest layer in the 13-layer film system is 15nm, so that the problem of processing stability caused by excessively thin film layers is solved.
Further, in this embodiment, the seven magnesium fluoride film layers include, from near to far, a first magnesium fluoride film layer, a second magnesium fluoride film layer, a third magnesium fluoride film layer, a fourth magnesium fluoride film layer, a sixth magnesium fluoride film layer, and a seventh magnesium fluoride film layer. The thickness of the first magnesium fluoride film layer is 26.85nm-27.05 nm; the thickness of the second magnesium fluoride film layer is 204.04nm-204.24 nm; the thickness of the third magnesium trifluoride film layer is 15.90nm-16.10 nm; the thickness of the second magnesium tetrafluoride film layer is 54.66nm-54.86 nm; the thickness of the second magnesium pentafluoride film layer is 83.14nm-83.34 nm; the thickness of the sixth magnesium fluoride film layer is 14.90nm-15.20 nm; the seventh magnesium fluoride film layer is 97.41nm-97.61nm in thickness.
Further, in this embodiment, the thickness of the first magnesium fluoride film layer is 26.95nm, the thickness of the second magnesium fluoride film layer is 204.14nm, the thickness of the third magnesium fluoride film layer is 16.00nm, the thickness of the fourth magnesium fluoride film layer is 54.76nm, the thickness of the first magnesium fluoride film layer is 83.24nm, the thickness of the sixth magnesium fluoride film layer is 15.00nm, and the thickness of the seventh magnesium fluoride film layer is 97.51 nm.
Further, in this embodiment, the six lanthanum titanate film layers are, from near to far, a first lanthanum titanate film layer, a second lanthanum titanate film layer, a third lanthanum titanate film layer, a fourth lanthanum titanate film layer, a fifth lanthanum titanate film layer, and a sixth lanthanum titanate film layer, respectively; the thickness of the first lanthanum titanate film layer is 14.98nm-15.18 nm; the thickness of the second lanthanum titanate film layer is 17.91nm-18.11 nm; the third lanthanum titanate film layer is 112.53nm-112.73nm in thickness; the thickness of the fourth lanthanum titanate film layer is 14.90nm-15.10 nm; the fifth lanthanum titanate film layer is 43.36nm-43.56nm in thickness; the sixth lanthanum titanate film layer is 61.39nm-61.59nm in thickness.
Further, in this embodiment, the thickness of the first lanthanum titanate film layer is 15.08nm, the thickness of the second lanthanum titanate film layer is 18.01nm, the thickness of the third lanthanum titanate film layer is 112.63nm, the thickness of the fourth lanthanum titanate film layer is 15.00nm, the thickness of the fifth lanthanum titanate film layer is 43.46nm, and the thickness of the sixth lanthanum titanate film layer is 61.49 nm.
The residual reflectivity of the film system is lower than 0.1% in the wide wavelength range of 410 nm-740 nm, the reflectivity curve is relatively flat, and no obvious reflection peak exists.
Further, in the present embodiment, the refractive index of the magnesium fluoride film layer is 1.364 to 1.384.
Specifically, the refractive index of the magnesium fluoride film layer is 1.374. The actually measured refractive indexes of the magnesium fluoride film layer in the production of a coating machine are respectively 1.374. The refractive index of the base optical glass 101 was 1.733, the test wavelength was 550nm, and the light incidence angle was 0 °.
Further, in this embodiment, the refractive index of the lanthanum titanate film layer is 2.054-2.074.
Specifically, the refractive index of the lanthanum titanate film layer is 2.064. The actually measured refractive indexes of the lanthanum titanate film layers in the production of the coating machine are 2.064 respectively. The refractive index of the substrate optical glass is 1.733, the test wavelength is 550nm, and the light incidence angle is 0 degree.
By adopting a 13-layer film system structure, the thickness of the 1 st layer of MGF2 film layer is as follows: 26.95 nm; the thickness of the 2 nd H4 film layer is: 15.08 nm; the thickness of the MGF2 film layer of the 3 rd layer is as follows: 204.14 nm; the thickness of the 4 th H4 film layer is as follows: 18.01 nm; the thickness of the 5 th MGF2 film layer is as follows: 16.00 nm; the thickness of the 6 th H4 film layer is as follows: 112.63 nm; the thickness of the 7 th MGF2 film layer is as follows: 54.76 nm; the thickness of the 8 th H4 film layer is: 15.00 nm; the thickness of the film layer of the 9 th MGF2 is as follows: 83.24 nm; the thickness of the 10 th H4 film layer is as follows: 43.46 nm; the thickness of the 11 th MGF2 film layer is as follows: 15.00 nm; the thickness of the 12 th H4 film layer is as follows: 61.49 nm; the thickness of the MGF2 film layer at the 13 th layer is as follows: 97.51 nm.
Fig. 2 shows the residual reflectivity curve of the optical antireflection film according to the present invention, which shows that the optical antireflection film according to the present invention has the following advantages: the curve of the residual reflectivity is very flat, the residual reflectivity is lower than 0.1% in the ultra-wide wavelength range of 410nm to 740nm, and no obvious reflection peak exists, so that the high-quality low-residual-reflectivity optical antireflection film has no obvious film color. The optical antireflection film can effectively reduce the residual reflectivity on the surface of the lens, inhibit the stray light of the system and be more beneficial to ensuring the transmittance performance of the optical system. The wavelength range of the residual reflectivity constrained in the design is wider than the common waveband range of 420 nm-680 nm, the main purpose is to leave a sufficient tolerance range for the processing technology of the film layer, and when the film system is applied to the lens with a smaller curvature radius, the performance of the film layer at the edge of the lens is fully ensured.
The first and second order sensitivities of the membrane layers of the membrane system according to the invention are given in fig. 3, where the abscissa indicates the different membrane layers and the ordinate indicates the sensitivity of the membrane layers. The larger the sensitivity coefficient, the more sensitive the film. It can be seen that the sensitivity coefficient of the 13-layer film is in the order of 10-6, the sensitivity of the surface film layer is low, that is, even if a certain error occurs during actual processing, the performance of the film system cannot be obviously influenced, so that the high-quality low-residual-reflectivity optical antireflection film has good stability and meets the requirement of batch production in a certain scale.
The above description is only an alternative embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications and equivalents made by the contents of the present specification and drawings, or directly/indirectly applied to other related technical fields, are included in the scope of the present invention.
Claims (10)
1. An optical antireflection film with ultralow residual reflectivity is applied to optical glass, and is characterized in that the optical antireflection film with ultralow residual reflectivity comprises an antireflection film body for being fixed to the optical glass, wherein the antireflection film body is provided with a near end for being fixed to the optical glass and a far end far away from the optical glass;
the antireflection film main body comprises thirteen film layers, the thirteen film layers comprise seven magnesium fluoride film layers and six lanthanum titanate film layers, and the magnesium fluoride film layers and the lanthanum titanate film layers are sequentially and alternately stacked and distributed from near to far.
2. The ultra-low residual reflectivity optical antireflection film of claim 1 wherein the thickness of each of said thirteen film layers is greater than 10 nm.
3. The optical antireflection film with ultralow residual reflectivity according to claim 1, wherein the seven magnesium fluoride film layers are respectively a first magnesium fluoride film layer, a second magnesium fluoride film layer, a third magnesium fluoride film layer, a fourth magnesium fluoride film layer, a fifth magnesium fluoride film layer, a sixth magnesium fluoride film layer and a seventh magnesium fluoride film layer from near to far;
the thickness of the first magnesium fluoride film layer is 26.85nm-27.05 nm; and/or the presence of a gas in the gas,
the thickness of the second magnesium fluoride film layer is 204.04nm-204.24 nm; and/or the presence of a gas in the gas,
the thickness of the third magnesium trifluoride film layer is 15.90nm-16.10 nm; and/or the presence of a gas in the gas,
the thickness of the second magnesium tetrafluoride film layer is 54.66nm-54.86 nm; and/or the presence of a gas in the gas,
the thickness of the second magnesium pentafluoride film layer is 83.14nm-83.34 nm; and/or the presence of a gas in the gas,
the thickness of the sixth magnesium fluoride film layer is 14.90nm-15.20 nm; and/or the presence of a gas in the gas,
the seventh magnesium fluoride film layer is 97.41nm-97.61nm in thickness.
4. The ultra-low residual reflectivity optical antireflection film of claim 3, wherein the first magnesium fluoride film layer thickness is 26.95nm, the second magnesium fluoride film layer thickness is 204.14nm, the third magnesium fluoride film layer thickness is 16.00nm, the fourth magnesium fluoride film layer thickness is 54.76nm, the third magnesium fluoride film layer thickness is 83.24nm, the sixth magnesium fluoride film layer thickness is 15.00nm, and the seventh magnesium fluoride film layer thickness is 97.51 nm.
5. The optical antireflection film with ultralow residual reflectivity of claim 1, wherein the six lanthanum titanate film layers are respectively a first lanthanum titanate film layer, a second lanthanum titanate film layer, a third lanthanum titanate film layer, a fourth lanthanum titanate film layer, a fifth lanthanum titanate film layer and a sixth lanthanum titanate film layer from near to far;
the thickness of the first lanthanum titanate film layer is 14.98nm-15.18 nm; and/or the presence of a gas in the gas,
the thickness of the second lanthanum titanate film layer is 17.91nm-18.11 nm; and/or the presence of a gas in the gas,
the third lanthanum titanate film layer is 112.53nm-112.73nm in thickness; and/or the presence of a gas in the gas,
the thickness of the fourth lanthanum titanate film layer is 14.90nm-15.10 nm; and/or the presence of a gas in the gas,
the fifth lanthanum titanate film layer is 43.36nm-43.56nm in thickness; and/or the presence of a gas in the gas,
the sixth lanthanum titanate film layer is 61.39nm-61.59nm in thickness.
6. The optical antireflection film with ultra-low residual reflectivity of claim 5, wherein the first lanthanum titanate film layer thickness is 15.08nm, the second lanthanum titanate film layer thickness is 18.01nm, the third lanthanum titanate film layer thickness is 112.63nm, the fourth lanthanum titanate film layer thickness is 15.00nm, the fifth lanthanum titanate film layer thickness is 43.46nm, and the sixth lanthanum titanate film layer thickness is 61.49 nm.
7. The ultra-low residual reflectivity optical antireflection film of claim 1 wherein the refractive index of the magnesium fluoride film layer is in the range of 1.364-1.384.
8. The ultra-low residual reflectivity optical antireflective film of claim 7, wherein the refractive index of the magnesium fluoride film layer is 1.374.
9. The ultra-low residual reflectivity optical antireflection film of claim 1 wherein the refractive index of the lanthanum titanate film layer is 2.054-2.074.
10. The ultra-low residual reflectivity optical antireflective film of claim 9, wherein the lanthanum titanate film layer has a refractive index of 2.064.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202011228090.1A CN112198565A (en) | 2020-11-05 | 2020-11-05 | Optical antireflection film with ultralow reflectivity |
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