CN112191610A - ITO (indium tin oxide) plane target ultrasonic cleaning frame and manufacturing method thereof - Google Patents
ITO (indium tin oxide) plane target ultrasonic cleaning frame and manufacturing method thereof Download PDFInfo
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- CN112191610A CN112191610A CN202010932280.5A CN202010932280A CN112191610A CN 112191610 A CN112191610 A CN 112191610A CN 202010932280 A CN202010932280 A CN 202010932280A CN 112191610 A CN112191610 A CN 112191610A
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- support frame
- ito
- ultrasonic cleaning
- bottom plate
- frame
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
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Abstract
The invention relates to the technical field of ITO target production equipment, and discloses an ITO plane target ultrasonic cleaning frame which comprises a bottom plate and a support frame vertically connected to the bottom plate, wherein the support frame comprises a first support frame and a second support frame which are arranged in parallel, vertical convex teeth are arranged on the first support frame and the second support frame, and a clamping gap for supporting an ITO plane target is formed between every two adjacent convex teeth. The invention also provides a manufacturing method of the ITO plane target ultrasonic cleaning rack, which comprises the steps of manufacturing a cuboid plastic block A with the thickness of 200mm, the length of 280mm and the width of 180 mm; cutting the plastic block A to obtain a plastic frame A with a bottom plate and two support plates vertically connected to the opposite sides of the bottom plate, wherein the thickness of the bottom plate is 5mm, and the thickness, length and width of the support plates are 15mm, 280mm and 180 mm; and cutting the supporting plate to remove a notch with the height of 180mm, the width of 15mm and the length of 20mm from the length direction at intervals of 30mm to obtain the cleaning frame. The invention can reduce the production cost of producing the ITO target material.
Description
Technical Field
The invention relates to the technical field of ITO target production equipment, in particular to an ITO plane target ultrasonic cleaning frame and a manufacturing method thereof.
Background
ITO is an N-type oxide semiconductor, namely indium tin oxide, and an ITO film, namely an indium tin oxide semiconductor transparent conductive film, generally has two performance indexes of resistivity and light transmittance. ITO is an abbreviation for Indium TinOxides. The ITO is nano indium tin metal oxide, has good conductivity and transparency, and can filter out electronic radiation, ultraviolet rays and far infrared rays which are harmful to human bodies. Therefore, indium tin oxide is generally sprayed on glass, plastic and electronic display panels to be used as a transparent conductive film while reducing electron radiation harmful to the human body and ultraviolet and infrared rays. The ITO target has high performance advantage and high thermal shock resistance, does not damage equipment in use, and has high purity. At present, a flat panel display is used in a plurality of electronic products in the market, liquid crystal computers and liquid crystal televisions enter thousands of households, the quality of liquid crystal products is high in appearance and texture, and energy consumption can be reduced.
At present, there are two kinds of ITO targets, one is a planar indium tin oxide target, and the other is a rotary indium tin oxide target. However, the utilization rate of the planar indium tin oxide target can only reach 40 percent at present, and the utilization rate of the target can reach 70 percent at present by rotation. At present, plane ITO target can come out through batch production, and production efficiency improves greatly, but in the production process of ITO plane target, need use ultrasonic cleaning to wash ITO plane target, current ultrasonic cleaner cleaning efficiency to ITO plane target is low, can't satisfy the output demand of ITO plane target, extravagant manpower and materials.
Disclosure of Invention
The invention aims to provide an ITO (indium tin oxide) plane target ultrasonic cleaning frame and a manufacturing method thereof, which can improve the cleaning efficiency of an ITO plane target.
In order to achieve the purpose, the invention provides an ITO (indium tin oxide) plane target ultrasonic cleaning frame which comprises a bottom plate and a support frame vertically connected to the bottom plate, wherein the support frame comprises a first support frame and a second support frame which are arranged in parallel, vertical convex teeth are arranged on the first support frame and the second support frame, and a clamping gap for supporting an ITO plane target is formed between every two adjacent convex teeth.
As a preferred scheme, the first support frame and the second support frame comprise strip-shaped underframe which is transversely arranged, and the convex teeth are vertically connected to the strip-shaped underframe.
As a preferred scheme, the strip-shaped bottom frames of the first support frame and the second support frame are connected to the bottom plate.
As a preferred scheme, the bottom plate is rectangular, and the bottom frames of the first support frame and the second support frame are connected to a pair of edges of the bottom plate.
Preferably, the gap between the adjacent convex teeth of the first support frame and the second support frame is 10mm to 30 mm.
Preferably, the gap between the adjacent convex teeth of the first support frame and the second support frame is 20 mm.
Preferably, the height of the convex teeth is 150mm to 210 mm.
Preferably, the height of the convex teeth is 180 mm.
The invention also provides a manufacturing method of the ITO plane target ultrasonic cleaning rack, which comprises the following steps:
s100, cutting the plastic block to obtain a cuboid plastic block A with the thickness of 200mm, the length of 280mm and the width of 180 mm;
s200, cutting the plastic block A to obtain a plastic frame A with a bottom plate and two support plates vertically connected to the opposite sides of the bottom plate, wherein the thickness of the bottom plate is 5mm, and the thickness, length and width of the support plates are 15mm, 280mm and 180 mm;
s300, cutting and removing a notch with the height of 180mm, the width of 15mm and the length of 20mm from the supporting plate at intervals of 30mm from the length direction to obtain the cleaning frame.
Preferably, in the method for manufacturing the ITO flat target ultrasonic cleaning rack, in step S200, a plastic block B having a length of 280mm, a width of 150mm and a thickness of 195mm is cut and removed from a middle line of an end surface of the rectangular plastic block a in the thickness direction, and the rest material is the plastic rack a.
The invention provides an ITO plane target ultrasonic cleaning frame which has the following beneficial effects:
1. the ITO plane target can be cleaned without specially producing an expensive ultrasonic cleaner for cleaning the target, so that the production cost is reduced;
2. the cleaning frame can be placed in a cleaning pool of an existing ultrasonic cleaning machine on the market for direct use, so that the ITO plane target is cleaned by ultrasonic waves, the use is convenient, and the equipment cost and the labor cost are greatly saved;
3. the cleaning frame can be used as a fixing piece for supporting and placing the ITO planar target before cleaning, and then the cleaning frame and the ITO planar target can be integrally placed into a cleaning tank of an ultrasonic cleaning machine for cleaning, so that the modular cleaning degree is improved, and the cleaning efficiency of the ITO planar target is improved;
4. the cleaning frame can support and place the ITO plane target after cleaning, can be used as a target material circulation piece of a production flow for cyclic utilization, and improves the production efficiency of the ITO plane target.
The invention also provides a manufacturing method of the ITO plane target ultrasonic cleaning rack, the cleaning rack for cleaning the ITO plane target can be manufactured by cutting the plastic block, the production cost is low, the production process is flexible, the expensive production process of die sinking and injection molding is avoided, and the cleaning efficiency of the ITO plane target is improved.
Drawings
Fig. 1 is a schematic perspective view of an ultrasonic cleaning rack for ITO planar targets in embodiments 1 and 2 of the present invention;
fig. 2 is a schematic top view of an ultrasonic cleaning rack for ITO planar targets in embodiments 1 and 2 of the present invention;
FIG. 3 is a schematic diagram of a production process of an ultrasonic cleaning rack for ITO flat targets in example 2 of the present invention;
in the figure, 100, the base plate; 110. a support plate; 120. a notch; 130. a cleaning frame; 200. a support frame; 201. a convex tooth; 202. a clamping gap; 203. a chassis; 210. a first support frame; 220. a second support frame.
Detailed Description
The following detailed description of embodiments of the present invention is provided in connection with the accompanying drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
Example 1
As shown in fig. 1, the ultrasonic cleaning frame for ITO planar targets according to preferred embodiment 1 of the present invention can improve the cleaning efficiency of ITO planar targets.
Based on the above technical scheme, this embodiment 1 provides an ITO plane target ultrasonic cleaning frame, including bottom plate 100 and the support frame 200 of vertical connection on bottom plate 100, bottom plate 100 uses as the base, can be with two support frames 200 interconnect stably.
Specifically, the supporting frame 200 includes a first supporting frame 210 and a second supporting frame 220 that are parallel to each other, and the first supporting frame 210 and the second supporting frame 220 are parallel to each other, so that the first supporting frame 210 and the second supporting frame 220 can stably support the ITO planar target, and the ITO planar target is prevented from being inclined on the first supporting frame 210 and the second supporting frame 220.
Specifically, first support frame 210, be equipped with vertical dogtooth 201 on the second support frame 220, form the centre gripping clearance 202 that is used for supporting ITO plane target 300 between the adjacent dogtooth 201, when using, put into ultrasonic equipment's washing tank with this washing tank earlier, then put ITO plane target immediately on the washing tank, through placing ITO plane target in centre gripping clearance 202 promptly, make ITO plane target can keep stable under the support of dogtooth 201, then put into the cleaner in the washing tank, the cooperation ultrasonic wave vibrates, the realization is to the washing of ITO plane target.
When the cleaning frame is used, the cleaning frame can be used as a circulation frame for the ITO target material, and the ITO plane target material is convenient to fix and use.
And before the target is cleaned, the cleaning frame and the ITO plane target can be firstly formed into a module, and when the cleaning frame and the ITO plane target are cleaned, the module formed by the cleaning frame and the ITO plane target is directly placed into a cleaning tank of an ultrasonic cleaning machine to start cleaning the ITO plane target, so that the modularization degree is improved, and the cleaning efficiency of the ITO plane target is improved.
In the prior art, the ITO planar target is cleaned mainly by a special ultrasonic cleaning machine, so that when the ITO planar target is cleaned, the ITO planar target needs to be fixed in the ultrasonic cleaning machine to be matched with the ultrasonic cleaning machine, and then the ITO planar target is cleaned. The cleaning mode needs a manufacturer to purchase a special ultrasonic cleaning machine, and is expensive; the size of the target is also limited by the size of the special ultrasonic cleaning machine; in the cleaning process, the target material needs to be placed at the position matched with the ultrasonic cleaning machine, a large amount of manpower and material resources need to be consumed, and the production cost is increased.
Preferably, the first support frame 210 and the second support frame 220 comprise a strip-shaped bottom frame 203 arranged transversely, and the convex teeth 201 are vertically connected to the bottom frame 203. The underframe 203 can be arranged horizontally, the underframe 203 of the first support frame 210 and the underframe 203 of the second support frame 220 are arranged in parallel, the convex teeth 201 are vertically arranged on the underframe 203, and the convex teeth 201 are fixedly and vertically arranged through the underframe 203.
Preferably, the bottom frames 203 of the first support frame 210 and the second support frame 220 are connected to the bottom plate 100, and the two bottom frames 203 are connected to each other through the bottom plate 100 and further kept in a parallel position, so that the two bottom frames 203 are fixed.
The underframe 203, the convex teeth 201 and the bottom plate 100 are of an integrated structure, so that the structural stability can be ensured, and the service life of the cleaning frame is prolonged.
Preferably, the bottom plate 100 is rectangular, the bottom plate 100 with a rectangular structure is convenient to produce, process and place, and the use space of the cleaning tank of the ultrasonic cleaning machine is saved. The bottom frames 203 of the first support frame 210 and the second support frame 220 are connected to a pair of edges of the bottom plate 100, so that the bottom frames 203 of the first support frame 210 and the second support frame 220 can be arranged in parallel, and the production and the processing are convenient.
Preferably, as shown in fig. 2, a gap K between adjacent convex teeth 201 of the first support frame 210 and the second support frame 220 is 10mm to 30mm, and the gap may also be 10mm, 15mm, 20mm, 25mm or 30mm, so as to adapt to ITO planar targets with different sizes.
Preferably, as shown in fig. 2, a gap K between adjacent teeth 201 of the first and second support frames 210 and 220 is 20 mm. Accordingly, as shown in fig. 2, the thickness D of the teeth 201 of the first and second support frames 210 and 220 is 30 mm.
Preferably, the height of the convex teeth 201 is 150mm to 210mm, and the height of the convex teeth 201 can be 150mm, 160mm, 170mm, 180mm, 190mm, 200mm or 210mm
Preferably, the height of the teeth 201 is 180 mm.
Example 2
As shown in fig. 2 and 3, a preferred embodiment 2 of the present invention provides a method for manufacturing the ITO planar target ultrasonic cleaning rack, including the following steps:
s100, cutting the plastic block to obtain a cuboid plastic block A with the thickness of 200mm, the length of 280mm and the width of 180 mm. The material for producing the cuboid plastic block A can be a PVC material, is suitable for cutting and processing, and has the advantages of easily available raw materials and low price. As shown in FIG. 2, the length L is 280mm and the width M is 180 mm. As shown in FIG. 1, the thickness H is 200 mm.
S200, cutting the plastic block A by a material removing method to obtain the plastic frame A with the bottom plate 100 and the two support plates 110 vertically connected to the opposite sides of the bottom plate 100, wherein the thickness of the bottom plate 100 is 5mm, and the thickness of the support plates 110 is 15mm, the length of the support plates is 280mm, and the width of the support plates is 180 mm. Here, the plastic block a is cut by a plastic cutter, which reduces the processing cost of the plastic block a.
As shown in fig. 1 and 2, the bottom plate 100 has a thickness H1 of 5mm, the support plate 110 has a thickness M1 of 15mm, a length L of 280mm, and a width H2 of 180 mm. In this connection, it is possible to use,
s300, cutting and removing a notch 120 with the height of 180mm, the width of 15mm and the length of 20mm from the supporting plate 110 at intervals of 30mm from the length direction to obtain the cleaning frame 130, wherein the structure formed by the notch 120 is the clamping gap 202, and the ITO plane target can be processed through the clamping gap 202.
Here, as shown in FIGS. 1 and 2, the cut-out notch 120 has a height H2 of 180mm, a width M1 of 15mm, and a length K of 20 mm.
Preferably, in step S200, the method of processing by cutting out material is: a plastic block B with the length of 280mm, the width of 150mm and the thickness of 195mm is cut and removed from the middle line of the end surface of the cuboid plastic block A in the thickness direction, and the rest material is a plastic frame A. Through excision plastic parcel B, can process into plastic rack A promptly, realized the quick production and processing to plastic rack A, improved the production efficiency to the wash rack.
Here, as shown in FIGS. 1 and 2, the plastic block B had a length L of 280mm, a width M2 of 150mm and a thickness H3 of 195 mm.
The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and substitutions can be made without departing from the technical principle of the present invention, and these modifications and substitutions should also be regarded as the protection scope of the present invention.
Claims (10)
1. The ITO plane target ultrasonic cleaning frame is characterized by comprising a base plate (100) and a support frame (200) vertically connected onto the base plate (100), wherein the support frame (200) comprises a first support frame (210) and a second support frame (220) which are arranged in parallel, vertical convex teeth (201) are arranged on the first support frame (210) and the second support frame (220), and a clamping gap (202) used for supporting an ITO plane target (300) is formed between every two adjacent convex teeth (201).
2. The ultrasonic cleaning rack for the ITO flat target according to claim 1, wherein the first support frame (210) and the second support frame (220) comprise strip-shaped bottom frames (203) which are transversely arranged, and the convex teeth (201) are vertically connected to the strip-shaped bottom frames (203).
3. The ultrasonic cleaning rack for the ITO flat target according to claim 2, wherein the strip-shaped bottom frames (203) of the first support frame (210) and the second support frame (220) are connected to the bottom plate (100).
4. The ultrasonic cleaning rack for ITO flat targets according to claim 3, wherein the bottom plate (100) is rectangular, and the bottom frames (203) of the first support frame (210) and the second support frame (220) are connected to a set of opposite edges of the bottom plate (100).
5. The ultrasonic cleaning rack for the ITO flat target according to claim 4, wherein the gap between the adjacent convex teeth (201) of the first support frame (210) and the second support frame (220) is 10mm to 30 mm.
6. The ultrasonic cleaning rack for the ITO flat target according to claim 5, wherein the gap between the adjacent convex teeth (201) of the first support frame (210) and the second support frame (220) is 20 mm.
7. The ultrasonic cleaning rack for the ITO flat target according to claim 6, wherein the height of the convex teeth (201) is 150mm to 210 mm.
8. The ultrasonic cleaning rack for the ITO flat target according to claim 7, wherein the height of the convex teeth (201) is 180 mm.
9. The manufacturing method of the ITO flat target ultrasonic cleaning rack according to any one of claims 1 to 8, comprising the following steps:
s100, cutting the plastic block to obtain a cuboid plastic block A with the thickness of 200mm, the length of 280mm and the width of 180 mm;
s200, cutting the plastic block A to obtain a plastic frame A with a bottom plate (100) and two support plates (110) vertically connected to the opposite sides of the bottom plate (100), wherein the thickness of the bottom plate (100) is 5mm, and the thickness, length and width of the support plates (110) are 15mm, 280mm and 180 mm;
s300, cutting and removing a notch (120) with the height of 180mm, the width of 15mm and the length of 20mm from the supporting plate (110) at intervals of 30mm from the length direction to obtain the cleaning rack (130).
10. The method for manufacturing the ultrasonic cleaning rack for the ITO flat target according to claim 9, wherein in step S200, a plastic block B with a length of 280mm, a width of 150mm and a thickness of 195mm is cut and removed from a middle line of an end face of a rectangular plastic block A in the thickness direction, and the rest material is the plastic rack A.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010932280.5A CN112191610A (en) | 2020-09-08 | 2020-09-08 | ITO (indium tin oxide) plane target ultrasonic cleaning frame and manufacturing method thereof |
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|---|---|---|---|
| CN202010932280.5A CN112191610A (en) | 2020-09-08 | 2020-09-08 | ITO (indium tin oxide) plane target ultrasonic cleaning frame and manufacturing method thereof |
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