CN112188716B - Plasma beam generating apparatus and method of generating plasma beam - Google Patents
Plasma beam generating apparatus and method of generating plasma beam Download PDFInfo
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- CN112188716B CN112188716B CN201910584763.8A CN201910584763A CN112188716B CN 112188716 B CN112188716 B CN 112188716B CN 201910584763 A CN201910584763 A CN 201910584763A CN 112188716 B CN112188716 B CN 112188716B
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- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
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- H05H1/26—Plasma torches
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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- Y02E30/10—Nuclear fusion reactors
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Abstract
The present disclosure relates to a plasma beam generating apparatus and a method of generating a plasma beam. A plasma beam generating apparatus comprising: a first gas source for providing a first gas; a second gas source for providing a second gas; and a plasma generator for ionizing a mixed gas comprising a first gas and a second gas to form a plasma beam, wherein the plasma beam generates Z-axis pinch, the first gas comprises hydrogen, and the second gas comprises at least one of the following gases: inert gas and nitrogen.
Description
Technical Field
The present disclosure relates to a plasma beam generating method and a plasma beam generating apparatus.
Background
At present, the application of plasma is more and more extensive. For example, nuclear fusion can be achieved by collision of multiple high-energy hydrogen plasma beams. The high-energy hydrogen plasma beam is adopted to bombard a target material such as heavy metal, and a neutron beam can be generated, so that the target material can be used as a neutron source.
Disclosure of Invention
According to an aspect of the present disclosure, there is provided a plasma beam generating apparatus including: a first gas source for providing a first gas; a second gas source for providing a second gas; and a plasma generator for ionizing a mixed gas comprising a first gas and a second gas to form a plasma beam, wherein the plasma beam generates Z-axis pinch, the first gas comprises hydrogen, and the second gas comprises at least one of the following gases: inert gas and nitrogen.
According to another aspect of the present disclosure, there is provided a method of generating a plasma beam, including: mixing the first gas and the second gas to obtain mixed gas; ionizing the mixed gas to form a plasma beam; and causing the plasma beam to Z-axis pinch, wherein the first gas comprises hydrogen and the second gas comprises at least one of: inert gas and nitrogen.
Other features of the present disclosure and advantages thereof will become more apparent from the following detailed description of exemplary embodiments thereof, which proceeds with reference to the accompanying drawings.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the disclosure and together with the description, serve to explain the principles of the disclosure.
The present disclosure may be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings, in which:
fig. 1 shows a schematic view of a plasma beam generating apparatus according to one or more exemplary embodiments of the present disclosure.
Fig. 2 shows a schematic view of a plasma beam generating apparatus according to one or more exemplary embodiments of the present disclosure.
Fig. 3 shows a schematic diagram of the plasma beam Z-pinch occurring.
Fig. 4 illustrates a flow diagram of a method of generating a plasma beam in accordance with one or more exemplary embodiments of the present disclosure.
Fig. 5 shows a schematic diagram of temperature and pressure distributions of a hydrogen plasma and an argon plasma in a plasma beam according to an exemplary embodiment of the present disclosure.
Note that in the embodiments described below, the same reference numerals are used in common between different drawings to denote the same portions or portions having the same functions, and a repetitive description thereof will be omitted. In some cases, similar reference numbers and letters are used to denote similar items, and thus, once an item is defined in one figure, it need not be discussed further in subsequent figures.
For convenience of understanding, the positions, sizes, ranges, and the like of the respective structures shown in the drawings and the like do not sometimes indicate actual positions, sizes, ranges, and the like. Therefore, the present disclosure is not limited to the positions, dimensions, ranges, and the like disclosed in the drawings and the like.
Detailed Description
Various exemplary embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings. It should be noted that: the relative arrangement of the components and steps, the numerical expressions, and numerical values set forth in these embodiments do not limit the scope of the present disclosure unless specifically stated otherwise.
The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the disclosure, its application, or uses. That is, the structures and methods herein are shown by way of example to illustrate different embodiments of the structures and methods of the present disclosure. Those skilled in the art will understand, however, that they are merely illustrative of exemplary ways in which the disclosure may be practiced and not exhaustive. Furthermore, the figures are not necessarily to scale, some features may be exaggerated to show details of particular components.
Techniques, methods, and apparatus known to those of ordinary skill in the relevant art may not be discussed in detail but are intended to be part of the specification where appropriate.
In all examples shown and discussed herein, any particular value should be construed as merely illustrative, and not limiting. Thus, other examples of the exemplary embodiments may have different values.
Fig. 1 shows a schematic view of a plasma beam generating apparatus according to one embodiment of the present disclosure. As shown in fig. 1, the plasma beam generating apparatus includes a gas source 104, a negative electrode 101, a positive electrode 102, a chamber 103, a temperature measuring instrument 108, a scatterometer 109, a doppler meter 110, and the like.
Wherein gas (e.g., hydrogen, etc.) from a gas source 104 enters the chamber 103 through an inlet 106. The pressure of the chamber 103 may be about 0.1Pa to about 100Pa. A high voltage is applied between the negative electrode 101 and the positive electrode 102. Under the action of the electric field, the lean gas in the chamber 103 is ionized into plasma and forms a plasma beam 105 flowing from the negative electrode 101 to the positive electrode 102. After passing through the positive electrode 102, the plasma beam 105 exits the chamber 103 through an exit 107.
In the plasma beam 105, the electrons traveling in the direction of the arrow exert coulomb force on nearby positively charged nuclei, thereby attracting the positively charged nuclei to travel in the direction of the arrow against the electric field between the negative electrode 101 and the positive electrode 102. When the current of the plasma beam 105 reaches, for example, thousands of amperes, a Z-axis pinch effect of the plasma beam may be observed. That is, the plasma current interacts with the magnetic field generated by itself, causing the plasma current path to shrink and become thinner.
The interaction between the strong current flowing through the plasma and the magnetic field created by this current causes the plasma to compress toward the center region and increase the plasma density and temperature, an effect known as the pinch effect. The pinch effect has two main forms, namely an angular pinch (θ -ping) and a Z-pinch (Z-ping).
Fig. 3 shows a schematic view of the Z pinch. As shown in the left side of fig. 3, when the current direction of the plasma beam is positive along the z-axis, a magnetic field surrounding the plasma beam is induced. Under the influence of the magnetic field, the plasma beam is pinched in the radial direction (r-axis) as shown on the right side of fig. 3.
Returning to the plasma beam generating apparatus shown in fig. 1, the state of the plasma beam 105 can be detected by various instruments. For example, the temperature of the plasma beam 105 may be measured by the temperature gauge 108. By a scatterometer 109 (e.g. CO) 2 Laser scatterometer) can measure the electron density of the plasma beam 105, thereby enabling the derivation of an average density of positive ions. The electron velocity of the plasma can be measured by the doppler meter 110. The density of the plasma tends to be greatly increased after the Z pinch, so that the positively charged atomic nucleus (positive ion) moves in the same direction along with the electron under the action of local coulomb force. Doppler can also be used to estimate the velocity of motion of positive ions.
Fig. 2 shows a schematic diagram of a plasma beam generating apparatus according to one embodiment of the present disclosure. As shown in fig. 2, the plasma beam generating apparatus includes a first gas source 204, a second gas source 214, a chamber 203, a negative electrode 201, a positive electrode 202, a thermometer 208, a scatterometer 209, a doppler meter 210, and the like.
Wherein the chamber 203, the negative electrode 201, the positive electrode 202, and the like constitute a plasma generator according to the present disclosure. The gases provided by the first gas source 204 and the second gas source 214 are mixed to form a mixed gas, for example, at the inlet 206. The mixed gas enters the chamber 203 through the inlet 206. The pressure of the chamber 203 may be about 0.1Pa to about 100Pa. A high voltage (e.g., 300V-3000V) is applied between the negative electrode 201 and the positive electrode 202. Under the action of the electric field, the lean gas in the chamber 203 is ionized into plasma and forms a plasma beam 205 flowing from the negative electrode 201 to the positive electrode 202. After passing through the positive electrode 202, the plasma beam 205 exits the chamber 203 through an outlet 207.
In some embodiments according to the present disclosure, the gas provided by first gas source 204 is, for example, hydrogen. The gas provided by the second gas source 214 may be at least one of an inert gas and nitrogen. The inventors of the present disclosure have found that the plasma beam generating apparatus shown in fig. 2 can obtain a higher density of hydrogen plasma in the vicinity of the central axis, as compared to the plasma beam generating apparatus shown in fig. 1 using a single gas source 101 (hydrogen gas).
Fig. 4 illustrates a flow diagram of a method of generating a plasma beam in accordance with some embodiments of the present disclosure. As shown in fig. 4, first, the gases in the first gas source 204 and the second gas source 214 are mixed to obtain a mixed gas (step 401).
The mixed gas is then ionized to form a plasma beam (step 402). For example, the mixed gas is introduced into the chamber 203 of the plasma generator through the inlet 206. The pressure within the chamber 203 may be maintained at 0.1Pa-100Pa, and a voltage of, for example, about 300V-3000V is applied between the negative electrode 201 and the positive electrode 202, such that the mixed gas is ionized to form a plasma beam 205 flowing from the negative electrode 201 to the positive electrode 202. The current intensity between the negative electrode 201 and the positive electrode 202 may be up to, for example, 10 3 Ampere-10 6 In amperes.
Finally, during the period that the plasma beam 205 flows from the negative electrode 201 to the positive electrode 202, Z-axis pinch of the plasma beam 205 occurs under the induced magnetic field of the current (step 403), thereby increasing the density of the plasma near the central axis. For example, the plasma density near the central axis of the plasma beam may reach about 20 20 -20 25 /m 3 . The thickness of the Z-axis pinched plasma beam is only about 1-100mm.
For example, in some embodiments according to the present disclosure, the gas provided by the first gas source 204 is hydrogen and the gas provided by the second gas source 214 is argon (Ar). Wherein, the flow ratio of the argon and the hydrogen can be controlled to be 10:1 to 1: within 10. For example, in one exemplary embodiment, the flow ratio of argon to hydrogen is 1:1, wherein the flow rate of argon is 2000sccm, and the flow rate of hydrogen is 2000sccm. The pressure in the chamber 203 is maintained at about 5Pa. When a voltage of 1000V is applied between the negative electrode 201 and the positive electrode 202, a plasma beam 205 is generated. The current between the negative electrode 201 and the positive electrode 202 is 10 4 In amperes. The thickness of the Z-axis pinched plasma beam 205 is only 10mm. The temperature of the plasma, as measured by the temperature gauge 208, is about 5 x 10 4 K. By scatterometer 209 (e.g. CO) 2 Laser scattering apparatus) can measureThe center average density of positive ions in the resulting Z-axis pinched plasma beam 205 is about 10 23 /m 3 . In the plasma beam, although containing both argon ions and hydrogen ions, the inventors found that the hydrogen ions will mainly be concentrated near the central axis of the plasma beam.
Fig. 5 shows the current at a higher current intensity (about 10) 5 Amperes) of the plasma, and a graph of the temperature distribution and pressure distribution of the hydrogen plasma and the argon plasma in the plasma beam along the radial direction, which is possible to achieve according to computer simulation. In fig. 5, the abscissa represents the distance from the central axis of the plasma beam, the left-hand ordinate represents the temperature, and the right-hand ordinate represents the pressure. Curve 1 is a temperature-distance relationship curve of the hydrogen plasma, curve 2 is a pressure-distance relationship curve of the hydrogen plasma, curve 3 is a temperature-distance relationship curve of the argon plasma, and curve 4 is a pressure-distance relationship curve of the argon plasma.
As shown in curve 1 of fig. 5, the temperature of the hydrogen plasma is higher in a region near the central axis and rapidly decreases with distance. As shown in curve 3 of fig. 5, the temperature of the argon plasma is distributed at a position away from the central axis. As shown in curve 2 of fig. 5, the pressure distribution of the hydrogen plasma is near the central axis. As shown in curve 4 of fig. 5, the pressure of the argon plasma is distributed at a position away from the central axis. Therefore, as can be seen from curves 1 to 4 in fig. 5, in the plasma beam generated using the mixed gas of hydrogen and argon, hydrogen ions are concentrated near the central axis, and argon ions are distributed at the periphery. Therefore, the density of hydrogen ions near the central axis can be further increased by using the mixed gas as compared with the case where only hydrogen gas is used as a gas source for generating the plasma beam.
In addition, hydrogen can adopt various isotopes of hydrogen, such as protium, deuterium, tritium and the like, according to actual needs. Protium, deuterium and tritium can all be used as fuels for nuclear fusion. In some embodiments according to the present disclosure, two or more plasma beams containing deuterium ions or tritium ions may be collided, thereby achieving nuclear fusion. In such a nuclear fusion device, a plurality of plasma generation devices according to embodiments of the present disclosure may be provided.
In some embodiments according to the present disclosure, the gas provided by first gas source 204 is hydrogen gas and the gas provided by second gas source 214 is helium (He). Wherein, the flow ratio of helium and hydrogen can be controlled in the range of 1:10 to 1:100. for example, in one exemplary embodiment, the flow rate of helium is 200sccm and the flow rate of hydrogen is 2000sccm. The pressure in the chamber 203 is maintained at about 5Pa. When a voltage of 1500V is applied between the negative electrode 201 and the positive electrode 202, a plasma beam 205 is generated. The current between the negative electrode 201 and the positive electrode 202 is about 10 5 In amperes. The thickness of the Z-axis pinched plasma beam is only 20mm. The temperature of the plasma, as measured by the temperature gauge 208, is about 10 deg.f 5 K. By scatterometer 209 (e.g. CO) 2 Laser scatterometer) may measure a center average density of about 10 of positive ions in the Z-axis pinched plasma beam 205 23 /m 3 。
Some embodiments according to the present disclosure are given above, it being understood that the present disclosure is not limited to the above-described embodiments. For example, the second gas source may also provide other inert gases, such as neon (Ne), and the like. In addition, the second gas source may provide, for example, nitrogen (N) 2 ). According to other embodiments of the present disclosure, the gases provided by the first gas source and the second gas source may be mixed in the mixing chamber in advance to be uniform, and then delivered to the plasma generator for ionization. In some embodiments according to the present disclosure, the second gas source may provide a mixed gas composed of a plurality of gases, for example, in one embodiment, the second gas source may provide a mixed gas of helium and argon. In another embodiment, the second gas source may provide a mixed gas of argon and nitrogen. In embodiments according to the present disclosure, further gas sources may also be provided, such as a third gas source, etc., each gas source providing a different gas.
Furthermore, in some embodiments according to the present disclosure, the chamber 203 may be kept airtight, i.e., the inlet 206 and the outlet 207 are closed, during operation (i.e., while generating the plasma beam). When the gas in the chamber 203 contains, for example, a radioactive element such as tritium, diffusion of the radioactive element from the outlet to the outside can be avoided.
According to some embodiments of the present disclosure, the following technical solutions may be further included:
1. a plasma beam generating apparatus comprising:
a first gas source for providing a first gas;
a second gas source for providing a second gas; and
a plasma generator for ionizing a mixed gas including a first gas and a second gas to form a plasma beam,
wherein the plasma beam is subject to Z-axis pinching, the first gas comprises hydrogen, and the second gas comprises at least one of: inert gas and nitrogen.
2. The plasma beam generating apparatus according to claim 1, wherein the inert gas includes at least one of helium, neon, and argon.
3. The plasma beam generating apparatus according to 1 or 2, wherein the hydrogen gas contains at least one of deuterium and tritium.
4. The plasma beam generating apparatus according to claim 1, wherein,
the second gas comprises argon, and the flow ratio of the argon to the hydrogen is 10:1 to 1:10.
5. the plasma beam generating apparatus according to 1 or 4, wherein,
the second gas comprises helium, and the flow ratio of the helium to the hydrogen is 1:10 to 1:100.
6. the plasma beam generating apparatus according to any one of 1, 4 and 5, wherein,
the second gas comprises nitrogen, and the flow ratio of the nitrogen to the hydrogen is 1:10 to 10:1.
7. the plasma beam generating apparatus according to 1, wherein,
the plasma generator includes a chamber in which the mixed gas is ionized, and a gas pressure in the chamber is 0.1 to 100Pa.
8. A method of generating a plasma beam, comprising:
mixing the first gas and the second gas to obtain mixed gas;
ionizing the mixed gas to form a plasma beam; and
causing Z-axis pinching of the plasma beam,
wherein the first gas comprises hydrogen and the second gas comprises at least one of: inert gas and nitrogen.
9. The method of claim 8, wherein the inert gas comprises at least one of helium, neon, argon.
10. The method of 8 or 9, wherein the hydrogen gas comprises at least one of deuterium and tritium.
11. The method of claim 8, wherein,
the second gas comprises argon, and the flow ratio of the argon to the hydrogen is 10:1 to 1:10.
12. the method of claim 8 or 11, wherein,
the second gas comprises helium, and the flow ratio of the helium to the hydrogen is 1:10 to 1:100.
13. the method of any one of claims 8, 11, and 12,
the second gas comprises nitrogen, and the flow ratio of the nitrogen to the hydrogen is 1:10 to 10:1.
14. the method of claim 8, wherein,
the gas pressure of the mixed gas is 0.1Pa to 100Pa.
15. The method of claim 8, wherein,
ionizing the mixed gas at an ionization intensity of 10 3 Ampere to 10 6 In amperes.
16. A nuclear fusion device comprising a plurality of plasma beam generating devices according to any one of the above 1-7.
The terms "front," "back," "top," "bottom," "over," "under," and the like in the description and in the claims, if any, are used for descriptive purposes and not necessarily for describing permanent relative positions. It is to be understood that the terms so used are interchangeable under appropriate circumstances such that the embodiments of the disclosure described herein are, for example, capable of operation in other orientations than those illustrated or otherwise described herein.
As used herein, the word "exemplary" means "serving as an example, instance, or illustration," and not as a "model" that is to be replicated accurately. Any implementation exemplarily described herein is not necessarily to be construed as preferred or advantageous over other implementations. Furthermore, the disclosure is not limited by any expressed or implied theory presented in the preceding technical field, background, brief summary or the detailed description.
As used herein, the term "substantially" is intended to encompass any minor variation resulting from design or manufacturing imperfections, device or component tolerances, environmental influences, and/or other factors. The word "substantially" also allows for differences from a perfect or ideal situation due to parasitics, noise, and other practical considerations that may exist in a practical implementation.
In addition, the foregoing description may refer to elements or nodes or features being "connected" or "coupled" together. As used herein, unless expressly stated otherwise, "connected" means that one element/node/feature is directly connected to (or directly communicates with) another element/node/feature, either electrically, mechanically, logically, or otherwise. Similarly, unless expressly stated otherwise, "coupled" means that one element/node/feature may be mechanically, electrically, logically or otherwise joined to another element/node/feature in a direct or indirect manner to allow interaction, even though the two features may not be directly connected. That is, to "couple" is intended to include both direct and indirect joining of elements or other features, including connection with one or more intermediate elements.
In addition, "first," "second," and like terms may also be used herein for reference purposes only, and thus are not intended to be limiting. For example, the terms "first," "second," and other such numerical terms referring to structures or elements do not imply a sequence or order unless clearly indicated by the context.
It will be further understood that the terms "comprises/comprising," "includes" and/or "including," when used herein, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
In the present disclosure, the term "providing" is used broadly to encompass all ways of obtaining an object, and thus "providing an object" includes, but is not limited to, "purchasing," "preparing/manufacturing," "arranging/setting," "installing/assembling," and/or "ordering" the object, and the like.
Those skilled in the art will appreciate that the boundaries between the above described operations merely illustrative. Multiple operations may be combined into a single operation, single operations may be distributed in additional operations, and operations may be performed at least partially overlapping in time. Moreover, alternative embodiments may include multiple instances of a particular operation, and the order of operations may be altered in various other embodiments. However, other modifications, variations, and alternatives are also possible. The specification and drawings are, accordingly, to be regarded in an illustrative rather than a restrictive sense.
Although some specific embodiments of the present disclosure have been described in detail by way of example, it should be understood by those skilled in the art that the foregoing examples are for purposes of illustration only and are not intended to limit the scope of the present disclosure. The various embodiments disclosed herein may be combined in any combination without departing from the spirit and scope of the present disclosure. It will also be appreciated by those skilled in the art that various modifications may be made to the embodiments without departing from the scope and spirit of the disclosure. The scope of the present disclosure is defined by the appended claims.
Claims (8)
1. A hydrogen plasma beam generating device comprising:
a first gas source for providing a first gas;
a second gas source for providing a second gas; and
a plasma generator for ionizing a mixed gas including a first gas and a second gas to form a plasma beam,
wherein the plasma beam is subject to Z-axis pinching, the first gas comprises hydrogen, and the second gas comprises at least one of: an inert gas and a nitrogen gas are added,
the hydrogen ions in the plasma beam are concentrated near the central axis of the plasma beam, the second gas is distributed at the periphery,
wherein the inert gas comprises at least one of helium, neon and argon,
the flow ratio of the argon gas to the hydrogen gas is 10:1 to 1:10,
the flow ratio of the helium gas to the hydrogen gas is 1:10 to 1:100,
the flow ratio of the nitrogen to the hydrogen is 1:10 to 10:1.
2. a hydrogen plasma beam generating device according to claim 1, wherein said hydrogen gas contains at least one of deuterium and tritium.
3. A hydrogen plasma beam generating device according to claim 1,
the plasma generator includes a chamber in which the mixed gas is ionized, and a gas pressure in the chamber is 0.1 to 100Pa.
4. A method of generating a hydrogen plasma beam comprising:
mixing the first gas and the second gas to obtain mixed gas;
ionizing the mixed gas to form a plasma beam; and
causing Z-axis pinching of the plasma beam,
wherein the first gas comprises hydrogen and the second gas comprises at least one of: an inert gas and a nitrogen gas are added,
the hydrogen ions in the plasma beam are concentrated near the central axis of the plasma beam, the second gas is distributed at the periphery,
wherein the inert gas comprises at least one of helium, neon and argon,
the flow ratio of the argon to the hydrogen is 10:1 to 1:10,
the flow ratio of the helium gas to the hydrogen gas is 1:10 to 1:100,
the flow ratio of the nitrogen to the hydrogen is 1:10 to 10:1.
5. the method of claim 4, wherein the hydrogen gas comprises at least one of deuterium and tritium.
6. The method of claim 4, wherein,
the gas pressure of the mixed gas is 0.1Pa to 100Pa.
7. The method of claim 4, wherein,
the current intensity for ionizing the mixed gas is 10 3 Ampere to 10 6 And amperes.
8. A nuclear fusion device comprising a plurality of hydrogen plasma beam generating devices according to any one of claims 1 to 3.
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