CN112147139B - Evaluation method for protection effect of lunar dust protection material - Google Patents
Evaluation method for protection effect of lunar dust protection material Download PDFInfo
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- CN112147139B CN112147139B CN202010834889.9A CN202010834889A CN112147139B CN 112147139 B CN112147139 B CN 112147139B CN 202010834889 A CN202010834889 A CN 202010834889A CN 112147139 B CN112147139 B CN 112147139B
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Abstract
The application discloses an evaluation method for the protection effect of a lunar dust protection material. The evaluation method comprises the following steps: s1, placing a sample covered with lunar dust particles under a metallographic microscope for observation, and obtaining a microscopic image before centrifugation; s2, placing the sample covered with the lunar dust particles in a glue homogenizing machine, and carrying out centrifugal treatment; s3, placing the centrifuged sample under a metallographic microscope for observation to obtain a centrifuged microscopic image; and S4, processing the area of the outline covered by the lunar dust of the sample before and after centrifugation by using a digital image processing technology, and counting the area change condition and averaging to obtain the relative dustproof efficiency. The method has the advantages that the centrifugal force and the digital image processing technology are combined to evaluate the dustproof efficiency, the dustproof efficiency of the material can be rapidly represented, the method is simple and reliable, the practicability is high, and the possibility is provided for effective evaluation of the protection effect of the lunar dust-proof material and even the dustproof material.
Description
Technical Field
The application relates to the technical field of dustproof protection of material surfaces, in particular to an evaluation method for the protection effect of a lunar dust protection material.
Background
Human lunar exploration has very important significance. The moon contains abundant mineral resources, and the moon surface contains metals such as silicon, iron, calcium, aluminum, magnesium, potassium, sodium and the like. The moon is the celestial body closest to the earth, and is certainly the first choice for space exploration. Meanwhile, the detection activities of the moon and other stars can not only reveal the scientific mystery, but also drive the rapid development of other scientific technologies in related fields. However, in the lunar exploration project, the influence of lunar dust presents a great challenge to the whole lunar exploration project. As early as the Apollo era, lunar dust and its dust on the surface of the moon pose extremely serious challenges to the reliability of spacecraft. To ensure the smooth implementation of the Apollo lunar planning, the united states has studied lunar dust, the cause of lunar dust environment, environmental effects, and ground simulation methods in the fifties of the 20 th century. The lunar dust particles are small in size, charged and strong in adhesion, so that the lunar dust particles are difficult to remove when being adhered to lunar exploration engineering devices such as movable joints of space suits, surface thermal control materials of lunar probes, solar cell arrays, optical cameras and optical sensors, and normal operation of the devices is influenced. Therefore, how to remove the lunar dust adhered to the surface of the device and how to protect the surface of the device so that the lunar dust cannot be adhered to the lunar dust has important influence on the normal work of the whole device and even the smooth implementation of the whole lunar exploration plan.
A great deal of research is already carried out on researchers at home and abroad for removing the dust of the lunar dust, and a plurality of dust removing and dust preventing methods are also provided. The dust prevention method comprises the following steps: lunar surface curing, electrostatic protection, lotus leaf coating protection, and the like. The dust removal mode comprises liquid flushing, air injection, ultrasonic, adhesion, laser pulse dust removal, electric curtain dust removal and the like. Most of these methods are still in the starting phase, and some methods are difficult to implement due to the complex environment of the moon.
The evaluation of the dustproof efficiency does not have a complete systematic evaluation method at present, and the method for evaluating the dustproof effect of the dustproof material provided by the invention can well make up for the defect and provide a good foundation for the development of the dustproof technology in the future.
Disclosure of Invention
The main purpose of the present application is to provide a method for evaluating the protection effect of a lunar dust protective material, which makes it possible to effectively evaluate the protection performance of a lunar dust protective material and even a dustproof material.
In order to achieve the above purpose, the embodiments of the present application provide a method for evaluating a protection effect of a lunar dust protection material.
The evaluation method for the protection effect of the lunar dust protection material comprises the following steps:
s1, placing a sample covered with lunar dust particles under a metallographic microscope for observation, and obtaining a microscopic image before centrifugation;
s2, placing the sample covered with the lunar dust particles in a glue homogenizing machine, and carrying out centrifugal treatment;
s3, placing the centrifuged sample under a metallographic microscope for observation to obtain a centrifuged microscopic image;
and S4, processing the area of the outline covered by the lunar dust of the sample before and after centrifugation by using a digital image processing technology, and averaging the statistical area change conditions to obtain the relative dustproof efficiency.
Optionally, the method for obtaining the sample covering the lunar dust particles in step S1 includes: and placing the sample in a culture dish containing the lunar dust particles to enable the lunar dust to sink over the surface of the sample, and fixing the culture dish in an oscillator to vibrate so that the lunar dust particles uniformly cover the surface of the test sample.
Optionally, the sample is divided into cells on the surface by using a white grid knife, and microscopic images of three cells are selected as images of the lunar dust covering reference cells before and after centrifugation.
Optionally, the processing method in step S4 includes:
s41, calculating an image gradient by adopting a Laplace operator;
s42, removing noise of the result of the S41 by Gaussian blur;
s43, obtaining a binary result graph by adopting a maximum inter-class variance method;
and S44, carrying out corrosion expansion operation on the binary result to remove small-area noise.
According to the evaluation method for the protection effect of the lunar dust protection material, the dustproof efficiency is evaluated by combining the centrifugal force with the digital image processing technology, the method can rapidly represent the dustproof efficiency of the material, is simple, reliable and high in practicability, provides possibility for effective evaluation of the protection effect of the lunar dust protection material and even the dustproof material, and lays a scientific evaluation foundation for further research of subsequent dustproof materials. The method can effectively evaluate the protection performance, is beneficial to effectively protecting and removing the lunar dust on the surfaces of the lunar landing device and the space suit, and ensures the safe and effective work of the landing device, the space vehicle and the space suit.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, serve to provide a further understanding of the application and to enable other features, objects, and advantages of the application to be more apparent. The drawings and the description of the exemplary embodiments of the present application are provided for explaining the present application and do not constitute an undue limitation on the present application. In the drawings:
FIG. 1 is a flowchart of a method for evaluating the protective effect of a lunar dust protective material according to example 1 of the present application;
FIG. 2 is a flow chart of a method for evaluating the protection effect of the lunar dust prevention material according to embodiment 2 of the present application;
FIG. 3 is a flowchart of a method for evaluating the protective effect of a lunar dust protective material according to embodiment 3 of the present application;
FIG. 4 is a diagram of a method for counting monthly dust according to an embodiment of the present application;
FIG. 5 is a distribution diagram of lunar dust particles before centrifugation according to example 4 of the present application;
FIG. 6 is a distribution diagram of post-centrifugation lunar dust particles according to example 4 of the present application;
FIG. 7 is a distribution diagram of lunar dust particles before centrifugation according to example 5 of the present application;
FIG. 8 is a distribution diagram of lunar dust particles after centrifugation according to example 5 of the present application.
Detailed Description
In order to make the technical solutions of the present application better understood by those skilled in the art, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only some embodiments of the present application, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It should be noted that the terms "first," "second," and the like in the description and claims of this application and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It should be understood that the data so used may be interchanged under appropriate circumstances such that embodiments of the application described herein may be used. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
In this application, the terms "upper", "lower", "inner", "middle", "outer", "front", "rear", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings. These terms are used primarily to better describe the present application and its embodiments, and are not used to limit the indicated devices, elements or components to a particular orientation or to be constructed and operated in a particular orientation.
Moreover, some of the above terms may be used to indicate other meanings besides the orientation or positional relationship, for example, the term "on" may also be used to indicate some kind of attachment or connection relationship in some cases. The specific meaning of these terms in this application will be understood by those of ordinary skill in the art as appropriate.
Furthermore, the terms "disposed," "connected," "disposed," and "in communication with" are to be construed broadly. For example, "connected" may be a fixed connection, a detachable connection, or a unitary construction; can be a mechanical connection, or an electrical connection; may be directly connected, or indirectly connected through intervening media, or may be in internal communication between two devices, elements or components. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present application will be described in detail below with reference to the embodiments with reference to the attached drawings.
Example 1
The evaluation method for the protection effect of the lunar dust protection material according to the application is shown in figure 1 and comprises the following steps:
s1, placing a sample covered with lunar dust particles under a metallographic microscope for observation, and obtaining a microscopic image before centrifugation;
s2, placing the sample covered with the lunar dust particles in a glue homogenizing machine, and carrying out centrifugal treatment;
s3, placing the centrifuged sample under a metallographic microscope for observation to obtain a centrifuged microscopic image;
and S4, processing the area of the outline covered by the lunar dust of the sample before and after centrifugation by using a digital image processing technology, and counting the area change condition and averaging to obtain the relative dustproof efficiency.
The application provides a protection effect evaluation method which mainly adopts a centrifugal method, and the related device mainly comprises a metallographic microscope and a glue homogenizing machine (centrifugal equipment). And an image processing technology is utilized to obtain a sample surface image obtained under a metallographic microscope, so that the change condition of dust adhered to the surface of the sample before and after centrifugation is known.
Example 2
The evaluation method of the protection effect of the lunar dust protection material according to the application, referring to fig. 2, comprises the following steps:
s1, placing a sample in a culture dish containing lunar dust particles to enable the lunar dust to sink over the surface of the sample, fixing the culture dish in an oscillator to vibrate, and enabling the lunar dust particles to uniformly cover the surface of a test sample;
s2, placing the sample covered with the lunar dust particles under a metallographic microscope for observation, and obtaining a microscopic image before centrifugation;
s3, placing the sample covered with the lunar dust particles in a glue homogenizing machine, and carrying out centrifugal treatment;
s4, placing the centrifuged sample under a metallographic microscope for observation to obtain a centrifuged microscopic image;
and S5, processing the area of the outline covered by the lunar dust of the sample before and after centrifugation by using a digital image processing technology, and counting the area change condition and averaging to obtain the relative dustproof efficiency.
Example 3
The evaluation method for the protection effect of the lunar dust protection material according to the application, referring to fig. 3, comprises the following steps:
s1, dividing a sample surface into grids by using a hundred-grid cutter, and selecting microscopic images of three small grids as lunar dust covering reference small-grid images before and after centrifugation;
s2, placing the sample in a culture dish containing the lunar dust particles to enable the lunar dust to sink over the surface of the sample, fixing the culture dish in an oscillator to vibrate, and enabling the lunar dust particles to uniformly cover the surface of the test sample;
s3, placing the sample covered with the lunar dust particles under a metallographic microscope for observation, and obtaining a microscopic image before centrifugation;
s4, placing the sample covered with the lunar dust particles in a glue homogenizing machine, and carrying out centrifugal treatment;
s5, placing the centrifuged sample under a metallographic microscope for observation, and obtaining a centrifuged microscopic image;
s6, processing the area of the outline covered by the lunar dust of the sample before and after centrifugation by using a digital image processing technology, and counting the area change condition and averaging to obtain the relative dustproof efficiency.
Specifically, as an embodiment of the present application, a processed sample is first divided into grids by a hundred-grid knife, and three small grids are selected as observation objects; placing the aluminum sheets with the divided lattices into an oscillator to perform rotary oscillation for about 1min, and taking out the aluminum sheets to slowly tilt for 90 degrees; observing under a metallographic microscope, and counting the number of moondusts in the specific three small squares (see fig. 4 corresponding to the area of the shaded part in the figure); after counting, placing the sample in a spin coater, and setting corresponding rotating speed and time; taking out the sample and observing under a microscope to count the residual quantity of the lunar dust.
Specifically, in some embodiments of the present application, a processing method using a digital image processing technique includes:
(1) Calculating the image gradient by adopting a Laplace operator;
(2) Removing noise from the S41 result by Gaussian blur;
(3) Obtaining a binary result graph by adopting a maximum inter-class variance method;
(4) And carrying out corrosion expansion operation on the binary result to remove small-area noise.
The evaluation method will be described below with reference to specific examples.
Example 4
The (1060 type) aluminum sheet obtained by using a certain surface treatment method was tested for dust-proofing effect by a centrifugal method. Images of the attached lunar dust particles on the surface of a cell before and after centrifugation are shown in FIGS. 5-6. In the embodiment, the area attached to the lunar dust adopts a method of measuring the number of pixels, and the unit is pixel ^2. The total area of the surface lunar dust of the cell before centrifugation is 190118, the total area after centrifugation is 97707, and the residual rate is 51.39%.
Example 5
The dust control effect was tested by centrifugation using untreated (type 1060) aluminum sheets. Images of the attached lunar dust particles on the surface of a cell before and after centrifugation are shown in FIGS. 7-8. In this embodiment, the area attached to the lunar dust adopts a method of measuring the number of pixels, and the unit is pixel ^2. The total area of the surface lunar dust of the cell before centrifugation is 188182, the total area after centrifugation is 173732, and the residual rate is 92.32%.
As can be seen from the examples 4-5, the centrifugal force used in the method is combined with the image processing method, so that the dustproof efficiency of the material can be quickly represented, and the method is simple and effective.
The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (1)
1. The evaluation method for the protection effect of the lunar dust protection material is characterized by comprising the following steps:
s1, placing a sample in a culture dish containing lunar dust particles, enabling the lunar dust to sink over the surface of the sample, fixing the culture dish in an oscillator for oscillation, enabling the lunar dust particles to uniformly cover the surface of a test sample, placing the sample covering the lunar dust particles under a metallographic microscope for observation, obtaining a microscopic image before centrifugation, dividing the sample on the surface by using a white grid knife before covering the lunar dust particles, selecting the microscopic image of three small grids as a lunar dust covering reference small grid image before and after centrifugation, placing an aluminum sheet with divided grids in the oscillator for convolution oscillation for 1min, taking out the aluminum sheet with slow inclination of 90 degrees, observing under the metallographic microscope, and counting the number of the lunar dust in specific three small grids;
s2, placing the sample covered with the lunar dust particles in a homogenizing machine, and centrifuging;
s3, placing the centrifuged sample under a metallographic microscope for observation, obtaining a microscopic image after centrifugation, and counting the number of residual lunar dust;
s4, processing the area of the outline covered by the lunar dust of the sample before and after centrifugation by using a digital image processing technology, and averaging the statistical area change conditions to obtain relative dustproof efficiency;
wherein, the area attached with the lunar dust adopts a method of measuring the number of pixel points;
the processing method in the step S4 comprises the following steps:
s41, calculating the image gradient by adopting a Laplace operator;
s42, removing noise from the result of S41 by Gaussian blur;
s43, obtaining a binary result graph by adopting a maximum inter-class variance method;
and S44, carrying out corrosion expansion operation on the binary result to remove small-area noise.
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| WO2012095351A1 (en) * | 2011-01-13 | 2012-07-19 | Transvideo | Optical image acquisition system comprising a device for protecting and cleaning a surface |
| CN105642615A (en) * | 2016-03-30 | 2016-06-08 | 哈尔滨工业大学（威海） | Photoelectric scavenging system for lunar dust on surface of lunar probe |
| CN109374645A (en) * | 2018-12-27 | 2019-02-22 | 山东建筑大学 | Photovoltaic panel dust detection system and method |
| CN210401115U (en) * | 2019-06-27 | 2020-04-24 | 南昌理工学院 | Moon dust detector |
| CN111471995A (en) * | 2020-05-21 | 2020-07-31 | 中物院成都科学技术发展中心 | Moonproof material and application thereof |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012095351A1 (en) * | 2011-01-13 | 2012-07-19 | Transvideo | Optical image acquisition system comprising a device for protecting and cleaning a surface |
| CN105642615A (en) * | 2016-03-30 | 2016-06-08 | 哈尔滨工业大学（威海） | Photoelectric scavenging system for lunar dust on surface of lunar probe |
| CN109374645A (en) * | 2018-12-27 | 2019-02-22 | 山东建筑大学 | Photovoltaic panel dust detection system and method |
| CN210401115U (en) * | 2019-06-27 | 2020-04-24 | 南昌理工学院 | Moon dust detector |
| CN111471995A (en) * | 2020-05-21 | 2020-07-31 | 中物院成都科学技术发展中心 | Moonproof material and application thereof |
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