CN112130241B

CN112130241B - Band-pass filter

Info

Publication number: CN112130241B
Application number: CN202011053182.0A
Authority: CN
Inventors: 苏炎; 李昱; 陈居凯
Original assignee: Suzhou Zhongwei Photoelectric Co ltd
Current assignee: Suzhou Zhongwei Photoelectric Co ltd
Priority date: 2020-09-29
Filing date: 2020-09-29
Publication date: 2022-11-11
Anticipated expiration: 2040-09-29
Also published as: CN112130241A

Abstract

The invention provides a band-pass filter, which comprises a base layer and a film system stacked on the base layer, wherein the film system structure of the film system comprises a plurality of Fabry-Perot cavities and connecting layers, each Fabry-Perot cavity is cascaded with the next Fabry-Perot cavity through the connecting layers, and the connecting layers are low-refractive-index layers with optical thickness not equal to one quarter wavelength; the structure of the Fabry-Perot cavity is as follows: ahhll 2HLHLH, bhhlhl 2HLHL3HLHLH, chlhl 2 hlhlhlhlh, dhhl 2HLHLA. The passband insertion loss or transmittance of the bandpass filter provided by the invention has linear change, the function that the insertion loss is linearly changed along with the wavelength in a specific wavelength range is realized in a passband, and the function of wavelength identification is realized in the specific wavelength range. The scheme can also be applied to the fields of interferometers, imaging instruments, detecting instruments, data centers, optical communication, industrial laser, wavelength identification and the like.

Description

Band-pass filter

Technical Field

The invention relates to the technical field of optics, in particular to a band-pass filter.

Background

The devices currently used for wavelength identification include grating devices, bandpass filter combination devices, and the like. The bandpass filter transmits light of a specific wavelength or a narrow band, but light outside the passband is not transmitted. Generally, the bandpass filter is applied to the use direction of light splitting and the like, and generally, the bandpass filter requires that the passband insertion loss or transmittance of the bandpass filter be as flat as possible and the ripple be small.

Conventionally, the pass band of the band-pass filter requires flat ripple waves, and the filter is formed by alternately stacking high-refractive index and low-refractive index dielectric film layers with the optical thickness of 1/4 to form multistage cascade Fabry-Perot cavities. Due to the characteristics of the band-pass filter, the band-pass filter is difficult to realize the linear change of the insertion loss along with the wavelength, and the band-pass filter in the prior art can not realize the linear change of the insertion loss along with the wavelength in a pass band.

Disclosure of Invention

Aiming at the defects in the prior art, the invention aims to provide a band-pass filter.

The technical scheme of the invention is summarized as follows:

the invention provides a band-pass filter, which comprises a base layer and a film system stacked on the base layer, wherein the film system structure of the film system comprises a plurality of Fabry-Perot cavities and connecting layers; the structure of the Fabry-Perot cavity is as follows: ahhlhl 2HLHLH, bhhlhl 2HLHL3 HLHLHLH, cHLHLHL2 hlhlhlhlh, dhhl 2HLHLA, wherein dhhl 2HLHLA is the last layer fabry-perot cavity; h is a high refractive index layer of quarter-center wavelength optical thickness, L is a low refractive index layer of quarter-center wavelength optical thickness; 2H is two quarter-center wavelength optical thicknesses, a is a high refractive index layer of non-quarter optical thickness; a. b, c, d are coefficients of the optical thickness of the quarter-center wavelength of the first high refractive index layer of each of said fabry-perot cavities; the Fabry-Perot cavities are cascaded through the connecting layer, and the connecting layer is a low-refractive-index layer which is not one-quarter wavelength and has optical thickness.

Further, the factor of the quarter-center wavelength optical thickness of the first high refractive index layer of the fabry-perot cavity is optimized by the optical thickness of the last layer of the last fabry-perot cavity.

Further, a, b, c and d are 0.974-1.009, the optical thickness of the quarter-center wavelength of the first high refractive index layer of the fabry-perot cavity is 0.974-1.009 quarter-wavelength optical thickness, so as to make the transmittance at the end of the layer reach an extreme value, and the extreme value monitoring is adopted in the coating monitoring, so that the subsequent film layers of the optical thickness of each quarter-wavelength can be monitored by the extreme value method.

Further, the optical thickness of the connecting layer is a non-integer number of quarter-wavelengths of optical thickness in the range of 0.675-2.450.

Further, the insertion loss of the optical filter increases or decreases linearly with the wavelength under the incident angle of 0-13.5 degrees.

Furthermore, the insertion loss of the optical filter in the 1304.5-1317nm waveband range is gradually increased from-5 dB to-0.2 dB by the slope of 0.3846 dB/nm.

Further, the number of the fabry-perot cavities is 9.

Further, the material of the high-refractive-index layer is at least one of Ta2O5, nb2O5 and TiO2, and the refractive index of the high-refractive-index layer ranges from 1.85 to 2.5 in the range of 1304.5-1317 nm.

Further, the material of the low-refractive-index layer is at least one of SiO2, al2O3 and MgF2, and the refractive index of the low-refractive-index layer ranges from 1.38 to 1.6 in the range of 1304.5-1317 nm.

Further, the base layer is a silicon dioxide material or a silicon material substrate, and the refractive index of the base layer is 1.45-3.5 in the range of 1304.5-1317 nm.

Compared with the prior art, the invention has the beneficial effects that:

the bandpass filter provided by the invention has the advantages that the insertion loss or transmittance of the passband has linear change, the insertion loss is linearly changed along with the wavelength in a specific wavelength range in the passband, the function of identifying the wavelength in the specific wavelength range is realized, and the bandpass filter has obvious advantages in cost compared with the technical scheme of a grating and bandpass filter combined device. The scheme can also be applied to the fields of interferometers, imaging instruments, detecting instruments, data centers, optical communication, industrial laser, wavelength identification and the like.

The foregoing description is only an overview of the technical solutions of the present invention, and in order to make the technical solutions of the present invention more clearly understood and to make the technical solutions of the present invention practical in accordance with the contents of the specification, the following detailed description is given of preferred embodiments of the present invention with reference to the accompanying drawings. The detailed description of the present invention is given in detail by the following examples and the accompanying drawings.

Drawings

The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the invention and together with the description serve to explain the invention and do not constitute a limitation of the invention. In the drawings:

FIG. 1 is a schematic diagram of a bandpass filter with linearly varying insertion loss according to the present invention;

FIG. 2 is a schematic diagram of the slope of a target in the present invention;

FIG. 3 is a graph of the relationship between the wavelength of 0 degree incidence and the insertion loss and the target slope in the range of 0-30dB according to an embodiment of the bandpass filter with linearly varying insertion loss provided by the present invention;

FIG. 4 is a graph of the relationship between the wavelength of 0 degree incidence and the insertion loss and the target slope in the range of 0-6dB according to an embodiment of the bandpass filter with linearly varying insertion loss provided by the present invention;

FIG. 5 is a graph of the relationship between the insertion loss and the target slope at 13.5 degree incidence in the range of 0-30dB according to a second embodiment of the bandpass filter with linearly varying insertion loss provided by the present invention;

fig. 6 is a graph of the relationship between the wavelength of 13.5 degree incidence in the range of 0-6dB and the insertion loss, and the target slope, for an embodiment of the bandpass filter with linearly changing insertion loss according to the present invention.

Reference numerals are as follows: 1. a base layer; 2. a high refractive index layer; 3. a low refractive index layer; 4. a connecting layer; 5. fabry-perot cavities.

Detailed Description

The foregoing and other objects, features, aspects and advantages of the present invention will become more apparent from the following detailed description of the present invention when taken in conjunction with the accompanying drawings, wherein like reference characters designate like parts throughout the several views. In the drawings, the shape and size may be exaggerated for clarity, and the same reference numerals will be used throughout the drawings to designate the same or similar components. In the following description, terms such as center, thickness, height, length, front, back, rear, left, right, top, bottom, upper, lower, and the like are used based on the orientation or positional relationship shown in the drawings. In particular, "height" corresponds to the dimension from top to bottom, "width" corresponds to the dimension from left to right, and "depth" corresponds to the dimension from front to back. These relative terms are for convenience of description and are not generally intended to require a particular orientation. Terms concerning attachments, coupling and the like (e.g., "connected" and "attached") refer to a relationship wherein structures are secured or attached, either directly or indirectly, to one another through intervening structures, as well as both movable or rigid attachments or relationships, unless expressly described otherwise.

The present invention will be further described with reference to the accompanying drawings and the detailed description, and it should be noted that any combination of the embodiments or technical features described below can be used to form a new embodiment without conflict. It will be understood that terms such as "having," "including," and "comprising," as used herein, do not preclude the presence or addition of one or more other elements or groups thereof.

Bandpass Filters (Bandpass Filters) are only transparent to light of a particular wavelength or narrow band, and are opaque to light outside the passband. The optical indexes of the band-pass filter are mainly as follows: center Wavelength (CWL), half bandwidth (FWHM). The method is divided into the following steps according to the bandwidth size: a narrow-band filter with the bandwidth less than 30 nm; the bandwidth is more than 60nm and is a broadband filter.

Filters are optical devices used to select a desired wavelength band of radiation. The optical filter is formed by stacking a substrate and a plurality of film layers on the substrate, and the thickness of the film layers can be divided into two description modes of physical thickness and optical thickness. Physical thickness refers to thickness on a physical scale, such as 100nm or the like; the optical thickness refers to the path traveled by the light, which relates to the refractive index of the material and the wavelength of the light QW = (n x d)/λ, where n is the refractive index of the material traveled by the light, d is the physical thickness, and λ is the wavelength of the light.

The devices currently used for wavelength identification include grating devices, bandpass filter combination devices, and the like. The bandpass filter is generally applied to the use directions of light splitting and the like, the passband insertion loss or transmittance of the bandpass filter is generally required to be as flat as possible, the ripple wave is small, the bandpass filter is difficult to realize the linear change of the insertion loss along with the wavelength due to the characteristics of the bandpass filter, and the bandpass filter in the prior art can not realize the linear change of the insertion loss along with the wavelength in the passband. Therefore, an object of the present invention is to provide a bandpass filter with linearly changing insertion loss, which realizes the function of linearly changing insertion loss or transmittance with wavelength in a specific wavelength range in a passband, and realizing the function of wavelength discrimination in the specific wavelength range, and can obtain the wavelength of the measuring light by measuring the size of the insertion loss value. Meanwhile, due to the characteristics of the band-pass filter, high-isolation cutoff can be performed on the wavelength outside the band-pass, and the influence of stray light on a test result is reduced.

As shown in fig. 1, the bandpass filter with linearly-varying insertion loss of the present invention includes a base layer 1 and a film system stacked on the base layer, where the film system structure of the film system includes a plurality of fabry-perot cavities 5 and a connecting layer 4, each fabry-perot cavity 5 is cascaded with the next fabry-perot cavity 5 through the connecting layer 4, and the connecting layer 4 is a low refractive index layer with an optical thickness other than a quarter wavelength;

the structure of the Fabry-Perot cavity is as follows: ahhlhl 4HLHLH, bhhlhl 4HLHL3HLHLH, chlhl 4 hlhlhlhlh, dhhl 4HLHLA, wherein dhhl 4HLHLA is the last fabry-perot cavity;

h is a high refractive index layer of quarter-center wavelength optical thickness, L is a low refractive index layer of quarter-center wavelength optical thickness; 4H is the four quarter-center wavelength optical thicknesses, a is a high refractive index layer of non-quarter optical thickness; a. b, c, d are coefficients of the optical thickness of the quarter-center wavelength of the first high refractive index layer of each of said fabry-perot cavities.

The insertion loss of the wavelength of the optical filter is increased or decreased linearly along with the wavelength under the incident angle of 0-13.5 degrees.

The insertion loss of the filter in the wave band range of 1304.5-1317nm is increased from-5 dB to-0.2 dB at the slope of 0.3846 dB/nm.

The number of fabry-perot cavities is 9.

The factor of the optical thickness of the quarter-center wavelength of the first high-index layer of the fabry-perot cavity is optimized by the optical thickness of the last layer of the last of said fabry-perot cavities. a. b, c and d are integers of 1 or approximate 1. The purpose of this design is to better cascade with the connecting layer 4 (i.e. a refractive index layer that is not one-quarter of the optical thickness). And the optical thickness of approximate quarter wavelength is used for compensating the transmittance of the central wavelength at the end of the layer to reach an extreme value, and an extreme value method is adopted for monitoring in coating monitoring, so that the subsequent film layer with the optical thickness of the quarter wavelength of each layer can be monitored by the extreme value method, the optical thickness can be accurately controlled, and the optical filter with the accurate linear transmittance change can be obtained.

Specifically, a, b, c and d are 0.974-1.015, namely the optical thickness of the quarter-center wavelength of the first high-refractive-index layer of the Fabry-Perot cavity is 0.974-1.015 quarter-wavelength optical thickness, so that the transmittance of the layer reaches an extreme value when the layer is finished, an extreme value method is adopted for monitoring the change trend of light intensity in coating monitoring, and the light intensity signal is switched to the next layer after the light intensity signal reaches an extreme value point; this algorithm has the function of compensating for the errors of the front film layer.

The optical thickness of the connecting layer is a non-integer number of quarter-wavelengths of optical thickness from 0.675 to 2.451. The connection layer 4 is used for monitoring the coating by a crystal control/time control method, and the process curves are monitored by various monitoring methods so as to achieve the required filtering effect, errors cannot be accumulated, and the accuracy in the thickness of the film layer in the band-pass filter is improved.

The principle of the crystal control/time control method is as follows: in the film coating process, a film layer can be deposited on the surface of a crystal oscillator wafer of the crystal controller; the oscillation frequency of the crystal oscillator wafer can change along with the increase of the thickness of the film layer on the upper surface of the crystal oscillator wafer; the thickness change of the film layer on the crystal oscillator is obtained by obtaining the change of the oscillation frequency of the crystal oscillator plate on the crystal oscillator controller. The control method has the defect that the control precision often cannot meet the requirement of a high-precision optical film, so that the control method is often only used for controlling the deposition rate of a coating process. For a high-precision optical filter, it is often considered to control the film thickness by using a direct light control method. The reason is that the characteristics of the film layer often deviate from the theoretical characteristics due to the inherent characteristics of the film and the differences of the production process and equipment in the film coating process, for example, the refractive index of the film layer is lower compared with that of the bulk material, and the refractive index of the film layer is different due to different processes. And the final application of the filter is light, it is contemplated that the optical thickness can be controlled by monitoring the light signal during the deposition process.

Preferably, the material of the high refractive index layer is at least one of Ta2O5, nb2O5 and TiO2, and the refractive index of the high refractive index layer is 1.85-2.5 in the range of 1304.5-1317 nm.

The material of the low-refractive-index layer is at least one of SiO2, al2O3 and MgF2, and the refractive index of the low-refractive-index layer ranges from 1.38 to 1.6 in the range of 1304.5-1317 nm.

The base layer is made of silicon dioxide material or silicon material substrate, and the refractive index of the base layer is 1.45-3.5 in the range of 1304.5-1317 nm. The base layer is at least one of D263T, WMS-15, BK7, FS and Si. Preferably, the substrate material is ordinary K9 optical glass.

The specific embodiment is as follows:

the embodiment is one of band-pass filters. FIG. 2 is a graph showing the relationship between the wavelength and the insertion loss at the target slope of the insertion loss in the pass band range of the present embodiment, wherein the slope is 0.3846dB/nm, and the insertion loss in the 1304.5-1317nm range is increased from-5 dB to-0.2 dB at the slope of 0.3846dB/nm according to the target slope curve in Table 1.

TABLE 1 target slope Curve

Fig. 3 and 4 are graphs comparing the actual insertion loss value in the 1304.5-1317nm range with the target insertion loss value in the first example under the condition of the incident angle of 0 degree. The solid line is a product insertion loss curve actually measured by the product, the black points are insertion loss target values of different wavelengths, and fig. 3 is a relation diagram of the wavelength of 0-degree incidence in the range of 0-30dB, the insertion loss and the target slope in the embodiment; FIG. 4 is a graph of wavelength at 0 degree incidence versus insertion loss and target slope for the present example in the 0-6dB range.

The film system structure comprises 138 layers of film systems formed by stacking two materials. The initialization structure with 1314nm as the characteristic wavelength is as follows:

HLHL2HLHLHB

HLHLHL2HLHLHLHB

HLHLHLHL2HLHLHLHLHB

HLHLHLHL2HLHL3HLHLHB

HLHLHLHL2HLHLHLHLHB

HLHLHL2HLHLHLHB

HLHL2HLHLAB

wherein the structure of the Fabry-Perot cavity with 1314nm as characteristic wavelength is as follows: ahhlhl 2HLHLH, bhhlhlhl 2HLHL3 HLHLHLH, chhlhl 2HLHLHLH, dhhl 2HLHLA, wherein dhhl 2HLHLA is the last layer fabry-perot cavity.

The optical fiber is formed by cascading 9 Fabry-Perot cavities through a low-refractive-index material B with a non-1/4 optical thickness; a is a high-refractive-index material with a non-1/4 optical thickness, and the thickness of A and B and the thickness of the first H of the next Fabry-Perot cavity are optimized to obtain a corresponding film system. The control method of the stacking layer sequence and the film thickness of each layer is shown in the following table 2:

TABLE 2 film system structure and control mode of example one

In this example, the material of the high refractive index layer was Ta2O5, and the refractive index in the vicinity of 1314nm was 2.134. The material of the low refractive index layer was SiO2, and the refractive index in the vicinity of 1314nm was 1.453. The substrate material is common K9 optical glass, and the refractive index is 1.52.

As can be seen from fig. 3-4, the wavelength of the band-pass filter changes linearly with the insertion loss at an incidence angle of 0 degrees. The band-pass filter of the first embodiment can meet the linear change of insertion loss with a certain slope at an angle of 0 degrees; the hard medium film coating of sputtering or ion beam assisted deposition is adopted, and the requirements of communication products and automobile products on friction resistance, high temperature resistance and high humidity resistance can be met.

The second specific example is as follows:

the second embodiment is a bandpass filter. FIG. 2 is a graph showing the relationship between the wavelength and the insertion loss of the present embodiment at the target slope of the insertion loss in the passband, wherein the slope is 0.3846dB/nm, and the insertion loss in the 1304.5-1317nm range is gradually increased from-5 dB to-0.2 dB at the slope of 0.3846dB/nm according to the target slope curve of Table 1.

Fig. 5 and 6 are graphs comparing the actual insertion loss value in the 1304.5-1317nm range of this example with the target insertion loss value under the condition of 13.5 degree incident angle. The solid line is a product insertion loss curve actually measured by the product, the black points are insertion loss target values of different wavelengths, and fig. 5 is a relationship diagram of the 13.5-degree incident wavelength and insertion loss and the target slope in the range of 0-30dB in the embodiment; FIG. 6 is a graph of wavelength at 13.5 degrees of incidence versus insertion loss, and target slope for this example over the 0-6dB range.

The film structure comprises 138 layers of film system formed by stacking two materials. The initialization structure with 1325nm as the characteristic wavelength is as follows:

HLHL2HLHLHB

HLHLHL2HLHLHLHB

HLHLHLHL2HLHL3HLHLHB

HLHLHL2HLHLHLHB

HLHL2HLHLAB

the structure of the Fabry-Perot cavity with 1325nm as the characteristic wavelength is as follows: ahhlhl 2HLHLH, bhhlhlhl 2HLHL3 HLHLHLH, chhlhl 2HLHLHLH, dhhl 2HLHLA, wherein dhhl 2HLHLA is the last layer fabry-perot cavity.

The optical fiber is formed by cascading 9 Fabry-Perot cavities through a low-refractive-index material B with a non-1/4 optical thickness; a is a high-refractive-index material with a non-1/4 optical thickness, and the thickness of A and B and the thickness of the first H of the next Fabry-Perot cavity are optimized to obtain a corresponding film system. The order of the layers of the stack and the control of the film thickness of each layer are shown in table 2 below:

TABLE 3 film system structure and control mode of example two

The material of the high refractive index layer used in this example was Ta2O5, and the refractive index in the vicinity of 1325nm was 2.134. The material of the low refractive index layer was SiO2, and the refractive index in the vicinity of 1325nm was 1.453. The substrate material is common K9 optical glass and the refractive index is 1.52.

As can be seen from fig. 5-6, the wavelength of the bandpass filter changes linearly with the insertion loss at an incident angle of 13.5 degrees. The second embodiment can satisfy the linear change of the insertion loss with a certain slope at an angle of 13.5 degrees; the hard medium film coating by sputtering or ion beam assisted deposition can meet the requirements of communication and automobile products on friction resistance, high temperature and high humidity resistance and reliability.

It should be noted that: the precedence order of the above embodiments of the present invention is only for description, and does not represent the merits of the embodiments. And specific embodiments thereof have been described above. Other embodiments are within the scope of the following claims. In some cases, the actions or steps recited in the claims may be performed in a different order than in the embodiments and still achieve desirable results.

All the embodiments in the present specification are described in a progressive manner, and the same and similar parts among the embodiments are referred to each other, and each embodiment focuses on the differences from other embodiments.

The foregoing description has disclosed fully preferred embodiments of the present invention. It should be noted that those skilled in the art will be able to make modifications to the embodiments of the present invention without departing from the scope of the appended claims. Accordingly, the scope of the appended claims should not be limited to the description of the embodiments contained herein.

Claims

1. A band-pass filter comprises a base layer and a film system stacked on the base layer, and is characterized in that the film system structure of the film system comprises a plurality of Fabry-Perot cavities and connecting layers; the structure of the Fabry-Perot cavity is as follows: ahhlhl 2HLHLH, bhhlhl 2HLHL3HLHLH, chlhl 2HLHLHLH, dhhl 2HLHLA, wherein dhhl 2HLHLA is the last layer fabry-perot cavity; the last layer of Fabry-Perot cavity comprises a connecting layer;

h is a high refractive index layer of quarter-center wavelength optical thickness, L is a low refractive index layer of quarter-center wavelength optical thickness; 2H is two quarter-center wavelength optical thicknesses, a is a high refractive index layer of non-quarter optical thickness; a. b, c, d are coefficients of the optical thickness of the quarter-center wavelength of the first high refractive index layer of each of said fabry-perot cavities;

a, b, c, d are 0.974-1.009, and the optical thickness of the quarter-wave center of the first high refractive index layer of the fabry-perot cavity is 0.974-1.009 quarter-wave optical thicknesses, so that the transmission at the end of this layer reaches the limit value;

the Fabry-Perot cavities are cascaded through the connecting layer, and the connecting layer is a low-refractive-index layer which is not one-quarter wavelength in optical thickness;

the connecting layer has an optical thickness of a non-integer number of quarter-wavelengths from 0.675-2.450.

2. A bandpass filter as recited by claim 1, wherein the index of the quarter-center wavelength optical thickness of the first high index layer of said fabry-perot cavity is optimized by the optical thickness of the last layer of the last of said fabry-perot cavities.

3. The bandpass filter of claim 1 wherein the monitoring of the coating is carried out by extrema, so that subsequent layers of quarter wavelength optical thickness can be monitored by extrema.

4. The bandpass filter according to claim 1, wherein the filter has a wavelength insertion loss that increases or decreases linearly with wavelength at an incident angle of 0 to 13.5 degrees.

5. The bandpass filter according to claim 1, wherein the insertion loss of the filter in the 1304.5-1317nm band increases from-5 dB to-0.2 dB with a slope of 0.3846 dB/nm.

6. A bandpass filter as recited by claim 1, wherein the number of fabry-perot cavities is 9.

7. The bandpass filter according to claim 1, wherein the material of the high refractive index layer is at least one of Ta2O5, nb2O5, and TiO2, and the refractive index of the high refractive index layer is 1.85 to 2.5 in a range of 1304.5 to 1317 nm.

8. The bandpass filter according to claim 1, wherein the material of the low refractive index layer is at least one of SiO2, al2O3, mgF2, and the refractive index of the low refractive index layer is 1.38 to 1.6 in a range of 1304.5 to 1317 nm.

9. The bandpass filter according to claim 1, wherein the base layer is a silicon dioxide material or a silicon material substrate, and the refractive index of the base layer is in the range of 1304.5 to 1317nm and is 1.45 to 3.5.