CN112126899A - Evaporation source shelters from device and evaporation equipment - Google Patents
Evaporation source shelters from device and evaporation equipment Download PDFInfo
- Publication number
- CN112126899A CN112126899A CN201910555156.9A CN201910555156A CN112126899A CN 112126899 A CN112126899 A CN 112126899A CN 201910555156 A CN201910555156 A CN 201910555156A CN 112126899 A CN112126899 A CN 112126899A
- Authority
- CN
- China
- Prior art keywords
- evaporation source
- cylinder
- evaporation
- shielding
- pin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001704 evaporation Methods 0.000 title claims abstract description 178
- 230000008020 evaporation Effects 0.000 title claims abstract description 178
- 230000007246 mechanism Effects 0.000 claims abstract description 36
- 230000000630 rising effect Effects 0.000 claims abstract description 8
- 230000009471 action Effects 0.000 claims description 6
- 230000003028 elevating effect Effects 0.000 claims description 2
- 230000009916 joint effect Effects 0.000 claims description 2
- 230000000903 blocking effect Effects 0.000 claims 3
- 238000000034 method Methods 0.000 abstract description 20
- 230000008569 process Effects 0.000 abstract description 18
- 239000000758 substrate Substances 0.000 abstract description 16
- 230000009467 reduction Effects 0.000 abstract description 15
- 230000003749 cleanliness Effects 0.000 abstract description 8
- 230000000694 effects Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000001174 ascending effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides an evaporation source shielding device and evaporation equipment. The shielding device comprises a lifting fixing mechanism and a shielding mechanism, wherein the lifting fixing mechanism is movably connected with the shielding mechanism and is used for fixing the evaporation source and driving the evaporation source to move up and down; the shielding mechanism is used for opening along with the rising of the evaporation source so as to expose the evaporation source, and is also used for closing along with the falling of the evaporation source so as to shield the evaporation source. The evaporation source shielding device can not only prevent evaporant of the evaporation source from being plated on the inner wall of the process chamber, thereby ensuring the cleanliness of the chamber; meanwhile, the plated substrate exposed in the evaporation area can be prevented from being plated in the temperature rise stage and the temperature reduction stage, so that the plated substrate can be exposed in the evaporation area in the temperature rise stage and the temperature reduction stage.
Description
Technical Field
The invention belongs to the technical field of solar cell preparation, and particularly relates to an evaporation source shielding device and evaporation equipment.
Background
In the preparation process of the thin-film solar cell, the problem of large film stress exists in a back metal electrode film layer structure obtained by sputtering, and the film layer stress can be effectively controlled by the back metal electrode film layer obtained by an evaporation coating mode.
The evaporation coating process generally comprises three stages: in order to ensure the uniformity of evaporation, evaporation is mostly carried out in the constant temperature stage, and the plated substrate is required to be prevented from being exposed in the evaporation area in the temperature rise stage and the temperature reduction stage. At present, a method of keeping a plated substrate away from an evaporation region in a temperature rising stage and a temperature lowering stage is mostly adopted. However, this method can cause evaporant to plate on the inner walls of the process chamber, affecting chamber cleanliness.
Disclosure of Invention
The invention provides an evaporation source shielding device and evaporation equipment aiming at the problems in the prior art. The shielding device can not only prevent evaporant of the evaporation source from being plated on the inner wall of the process chamber, thereby ensuring the cleanliness of the chamber; meanwhile, the plated substrate exposed in the evaporation area can be prevented from being plated in the temperature rise stage and the temperature reduction stage, so that the plated substrate can be exposed in the evaporation area in the temperature rise stage and the temperature reduction stage.
The invention provides an evaporation source shielding device which comprises a lifting fixing mechanism and a shielding mechanism, wherein the lifting fixing mechanism is movably connected with the shielding mechanism and is used for fixing an evaporation source and driving the evaporation source to move up and down; the shielding mechanism is used for opening along with the rising of the evaporation source so as to expose the evaporation source, and is also used for closing along with the falling of the evaporation source so as to shield the evaporation source.
Preferably, the lifting fixing mechanism comprises a first fixing part, a second fixing part and a hollow plate, the first fixing part is movably connected with the second fixing part, and the second fixing part is used for fixing the bottom of the evaporation source; the second fixing part can reciprocate along the extension direction of the first fixing part so as to drive the evaporation source to lift;
the hollow plate is connected with the first fixing part, a through hole is formed in the hollow plate, a first cylinder is arranged on the hollow plate at a position corresponding to the through hole, and the central axis of the first cylinder is superposed with the central axis of the through hole;
the evaporation source penetrates through the through hole and is partially positioned in the first cylinder.
Preferably, the shielding mechanism includes a second cylinder and a shielding plate, the second cylinder is nested in the first cylinder, a limiting groove is arranged at the bottom of the first cylinder, which is in contact with the hollow plate, the bottom end of the second cylinder is embedded in the limiting groove, the evaporation source is located in the second cylinder, the evaporation source is movably connected with the second cylinder through a first connecting piece, and the second cylinder can rotate relative to the first cylinder under the movable connection effect of the first connecting piece and the lifting effect of the evaporation source driven by the second fixing part;
the sunshade set up in first barrel with keeping away from of second barrel the top of hollow slab, the sunshade with through second connecting piece swing joint between the first barrel, the sunshade with through third connecting piece swing joint between the second barrel, the sunshade can the second connecting piece with the swing joint effect of third connecting piece and the second fixed part drives open or close under the elevating action of evaporation source, with right the evaporation source exposes or shelters from.
Preferably, the first connecting piece comprises a first pin shaft arranged on the outer wall of the evaporation source and a first chute arranged on the inner wall of the second cylinder,
the first pin shaft is embedded in the first sliding groove, and the first pin shaft can move along the first sliding groove along with the lifting of the evaporation source.
Preferably, the first sliding chute comprises a first section and a second section which are distributed from bottom to top along the lifting direction of the evaporation source, and the first section is butted with the second section;
the first section extends in a spiral arc shape from bottom to top along the lifting direction of the evaporation source, and the second section extends in a straight line from bottom to top along the lifting direction of the evaporation source.
Preferably, the first pin comprises a plurality of pins.
Preferably, the second connecting member includes a second pin shaft disposed at the top end of the first cylinder and a second chute disposed on the shielding plate, the second pin shaft is embedded in the second chute, and the second pin shaft can move along the second chute;
the third connecting piece comprises a third pin shaft arranged at the top end of the second barrel and a shaft hole arranged on the shielding plate, the third pin shaft is nested with the shaft hole, and the third pin shaft can rotate in the shaft hole.
Preferably, the shield comprises a plurality of pieces, and the second connecting member and the third connecting member each comprise a plurality of sets;
the second sliding groove extends linearly from the central axis of the first cylinder to the cylinder wall direction.
Preferably, the hollow plate has a vacuum cavity, and the second fixing portion is hermetically connected to the through hole of the hollow plate through a bellows.
The invention also provides evaporation equipment which comprises the evaporation source and the evaporation source shielding device, wherein the evaporation source shielding device can shield the evaporation source in a temperature rising stage and a temperature reducing stage and can expose the evaporation source in a constant temperature stage.
The invention has the beneficial effects that: according to the evaporation source shielding device provided by the invention, the lifting fixing mechanism and the shielding mechanism are arranged, so that the evaporation source can be shielded in the temperature rising stage and the temperature reducing stage, evaporated substances of the evaporation source are prevented from being plated on the inner wall of the process chamber, and the cleanliness of the chamber is further ensured; meanwhile, the plated substrate exposed in the evaporation area can be prevented from being plated in the temperature rise stage and the temperature reduction stage, so that the plated substrate can be exposed in the evaporation area in the temperature rise stage and the temperature reduction stage.
According to the evaporation equipment provided by the invention, by adopting the evaporation source shielding device, evaporation materials of the evaporation source can be prevented from being plated on the inner wall of the process chamber, so that the cleanliness of the chamber is ensured; meanwhile, the plated substrate exposed in the evaporation area can be prevented from being plated in the temperature rise stage and the temperature reduction stage, so that the plated substrate can be exposed in the evaporation area in the temperature rise stage and the temperature reduction stage.
Drawings
FIG. 1 is a side view of an evaporation source shielding apparatus according to an embodiment of the present invention;
FIG. 2 is a sectional view of an evaporation source shielding apparatus according to an embodiment of the present invention;
FIG. 3 is an enlarged view of a portion A of FIG. 2;
FIG. 4 is a schematic structural diagram of a second cylinder of the evaporation source shielding device in an embodiment of the present invention;
FIG. 5 is a schematic structural diagram of an embodiment of an evaporation source shielding apparatus according to the present invention when a shutter is closed;
FIG. 6 is a top view of a partial structure of an evaporation source shielding apparatus according to an embodiment of the present invention;
FIG. 7 is a top view of a shutter of an evaporation source shielding apparatus according to an embodiment of the present invention;
FIG. 8 is a schematic structural diagram illustrating an embodiment of an evaporation source shielding device according to the present invention when a shielding plate is opened;
fig. 9 is a schematic structural diagram of an evaporation source shielding device during evaporation according to an embodiment of the present invention.
Wherein the reference numerals are:
1. a lifting fixing mechanism; 10. a first fixed part; 11. a second fixed part; 12. a hollow slab; 120. a through hole; 13. a first cylinder; 14. a bellows; 2. a shielding mechanism; 20. a second cylinder; 21. a shutter; 22. a first connecting member; 220. a first pin shaft; 221. a first chute; 2210. a first stage; 2211. a second stage; 23. a second connecting member; 230. a second pin shaft; 231. a second chute; 24. a third connecting member; 240. a third pin shaft; 241. a shaft hole; 3. an evaporation source.
Detailed Description
In order to make the technical solutions of the present invention better understood by those skilled in the art, the evaporation source shielding device and the evaporation apparatus of the present invention are further described in detail below with reference to the accompanying drawings and the detailed description.
The embodiment of the invention provides an evaporation source shielding device, which comprises a lifting fixing mechanism 1 and a shielding mechanism 2, wherein the lifting fixing mechanism 1 is movably connected with the shielding mechanism 2, and the lifting fixing mechanism 1 is used for fixing an evaporation source 3 and driving the evaporation source 3 to move up and down; the shielding mechanism 2 is configured to be opened to expose the evaporation source 3 as the evaporation source 3 is raised, and is configured to be closed to shield the evaporation source 3 as the evaporation source 3 is lowered.
The lifting fixing mechanism 1 and the shielding mechanism 2 are arranged, so that the evaporation source 3 can be shielded in a heating stage and a cooling stage, evaporated substances of the evaporation source 3 are prevented from being plated on the inner wall of the process chamber, and the cleanliness of the chamber is further ensured; meanwhile, the plated substrate exposed in the evaporation area can be prevented from being plated in the temperature rise stage and the temperature reduction stage, so that the plated substrate can be exposed in the evaporation area in the temperature rise stage and the temperature reduction stage.
In this embodiment, the lifting fixing mechanism 1 includes a first fixing portion 10, a second fixing portion 11 and a hollow plate 12, the first fixing portion 10 is movably connected to the second fixing portion 11, and the second fixing portion 11 is used for fixing the bottom of the evaporation source 3; the second fixing part 11 can reciprocate along the extending direction of the first fixing part 10 to drive the evaporation source 3 to lift; the hollow plate 12 is connected with the first fixing part 10, a through hole 120 is formed in the hollow plate 12, a first cylinder 13 is arranged on the hollow plate 12 at a position corresponding to the through hole 120, and the central axis of the first cylinder 13 is overlapped with the central axis of the through hole 120; the evaporation source 3 penetrates through the through hole 120 and is partially located in the first cylinder 13.
Wherein, the first fixing portion 10 is provided with a sliding groove, the second fixing portion 11 is provided with a sliding rail, and the sliding rail and the sliding groove are matched with each other, so that the second fixing portion 11 can reciprocate along the extending direction of the first fixing portion 10, thereby driving the evaporation source 3 to move up and down.
In addition, in the present embodiment, the hollow plate 12 has a vacuum chamber, and the second fixing portion 11 is hermetically connected to the through hole 120 of the hollow plate 12 through the bellows 14. In the actual evaporation process, the upper side of the hollow plate 12 is in a vacuum environment (i.e. in a vacuum process chamber), and the lower side is in a normal atmospheric environment, so that the hollow plate 12 with the vacuum cavity can ensure that the evaporation source 3 is completely in the vacuum environment at the evaporation stage, and cannot be affected by the non-vacuum environment at the lower side. The bellows 14 can realize the sealing of the vacuum environment on the upper side of the hollow plate 12, and can ensure that the evaporation source 3 is always in the sealed vacuum environment during the lifting process, so as to avoid the evaporation source 3 from being in the external atmosphere environment to influence the evaporation effect.
In this embodiment, the shielding mechanism 2 includes a second cylinder 20 and a shielding plate 21, the second cylinder 20 is nested in the first cylinder 13, a limiting groove is disposed at a bottom of the first cylinder 13 contacting the hollow plate 12, a bottom end of the second cylinder 20 is embedded in the limiting groove, the evaporation source 3 is located in the second cylinder 20, the evaporation source 3 is movably connected to the second cylinder 20 through a first connecting member 22, and the second cylinder 20 can rotate relative to the first cylinder 13 under the movable connection effect of the first connecting member 22 and the lifting effect of the evaporation source 3 driven by the second fixing portion 11.
The shielding plate 21 is disposed on the top ends of the first cylinder 13 and the second cylinder 20 far away from the hollow plate 12, the shielding plate 21 is movably connected with the first cylinder 13 through a second connecting piece 23, the shielding plate 21 is movably connected with the second cylinder 20 through a third connecting piece 24, and the shielding plate 21 can be opened or closed under the movable connection effect of the second connecting piece 23 and the third connecting piece 24 and the lifting effect of the evaporation source 3 driven by the second fixing portion 11, so as to expose or shield the evaporation source 3.
Preferably, in this embodiment, as shown in fig. 4 and 5, the first connecting member 22 includes a first pin 220 disposed on an outer wall of the evaporation source 3 and a first sliding groove 221 disposed on an inner wall of the second cylinder 20, the first pin 220 is embedded in the first sliding groove 221, and the first pin 220 can move along the first sliding groove 221 along with the lifting of the evaporation source 3.
The first chute 221 includes a first section 2210 and a second section 2211 distributed from bottom to top along the lifting direction of the evaporation source 3, and the first section 2210 and the second section 2211 are butted; the first segment 2210 extends in a spiral arc shape from bottom to top along the ascending and descending direction of the evaporation source 3, and the second segment 2211 extends in a straight line from bottom to top along the ascending and descending direction of the evaporation source 3. With this arrangement, when the evaporation source 3 rises, the first pin 220 is forced to move along the first section 2210 from bottom to top, and since the first section 2210 is in a spiral arc shape, the first pin 220 moves in the first section 2210 from bottom to top to push the second barrel 20 to rotate counterclockwise, until the first pin 220 reaches the joint point of the first section 2210 and the second section 2211, the rotation is stopped.
Further preferably, the first pin 220 includes a plurality of pins. The arrangement of the plurality of first pins 220 can enhance the pushing force of the first pins 220 on the second cylinder 20 when moving along the first section 2210, so that the second cylinder 20 can rotate more easily and more quickly. Of course, there may be one first pin 220.
In this embodiment, as shown in fig. 6 and 7, the second connecting member 23 includes a second pin 230 disposed at the top end of the first cylinder 13 and a second sliding slot 231 disposed on the shielding plate 21, the second pin 230 is embedded in the second sliding slot 231, and the second pin 230 can move along the second sliding slot 231; the third connecting member 24 includes a third pin 240 disposed at the top end of the second cylinder 20 and a shaft hole 241 disposed on the shielding plate 21, the third pin 240 is embedded in the shaft hole 241, and the third pin 240 can rotate in the shaft hole 241.
Wherein, the shielding plate 21 comprises a plurality of pieces, and the second connecting piece 23 and the third connecting piece 24 respectively comprise a plurality of sets; the second slide groove 231 extends linearly from the center axis of the first cylinder 13 toward the cylinder wall.
The second connecting piece 23 and the third connecting piece 24 are arranged so that the third pin shaft 240 rotates counterclockwise in the shaft hole 241 under the driving action of the counterclockwise rotation of the second cylinder 20 in the process that the evaporation source 3 rises; meanwhile, the second pin 230 moves along the second sliding slot 231 from the central axis of the first cylinder 13 to the cylinder wall direction, thereby pushing the shutter 21 to open.
It should be noted that when the first pin 220 is at the lowest point of the first section 2210, the shutter 21 is fully closed, as shown in fig. 5. When the first pin 220 moves to the point where the first section 2210 meets the second section 2211, the shutter 21 is fully opened, as shown in fig. 8. As the evaporation source 3 continues to rise, when the first pin 220 continues to move from bottom to top in the second section 2211, the evaporation source 3 extends out of the second cylinder 20, so that the evaporation port of the evaporation source 3 is exposed out of the second cylinder 20 and the first cylinder 13 until the first pin 220 moves to the highest point of the second section 2211, the evaporation source 3 does not rise any more, and at this time, the evaporation source 3 enters a constant temperature stage, and evaporation starts, as shown in fig. 9.
In this embodiment, the evaporation source 3 is driven to ascend by the second fixing portion 11, and the shutter 21 can be opened by the pushing action of the second connecting member 23 and the third connecting member 24. On the contrary, when the evaporation source 3 is driven by the second fixing portion 11 to descend, the shutter 21 can be closed by the reverse process of the above process under the pushing action of the second connecting member 23 and the third connecting member 24.
Based on the above-mentioned structure that the evaporation source sheltered from the device, this concrete working process who shelters from the device was:
before evaporation and in the temperature rise stage, the evaporation source 3 is at a low position, and the shutter 21 is in a closed state (see fig. 5).
After the temperature of the evaporation source 3 reaches the constant temperature stage, the second fixing portion 11 is started to drive the evaporation source 3 to ascend, so that the first pin 220 linearly ascends, the second cylinder 20 is driven to rotate counterclockwise under the action of the first pin 220 and the first section 2210 of the first sliding groove 221, and the third pin 240 also rotates counterclockwise in the shaft hole 241. Under the interaction of the second pin 230 and the second sliding slot 231, the shutters 21 are driven to rotate counterclockwise around the third pin 240, so that the shutters 21 are opened, fig. 8 shows a state where the shutters 21 are fully opened, and the first pin 220 is located at the joint of the first section 2210 and the second section 2211 of the first sliding slot 221.
After the shutter 21 is completely opened, the second fixing portion 11 continues to ascend, and the first pin 220 moves linearly along the second segment 2211 of the first sliding slot 221 until reaching a predetermined height, as shown in fig. 9, and then the evaporation process is performed.
After the evaporation is completed and before the evaporation source 3 is cooled, the second fixing part 11 is started to descend, so that the components are driven to perform the reverse process of the motion process until the shutter 21 is closed.
The beneficial effects of this embodiment: according to the evaporation source shielding device provided by the embodiment, the lifting fixing mechanism and the shielding mechanism are arranged, so that the evaporation source can be shielded in the temperature rising stage and the temperature reducing stage, evaporated substances of the evaporation source are prevented from being plated on the inner wall of the process chamber, and the cleanliness of the chamber is further ensured; meanwhile, the plated substrate exposed in the evaporation area can be prevented from being plated in the temperature rise stage and the temperature reduction stage, so that the plated substrate can be exposed in the evaporation area in the temperature rise stage and the temperature reduction stage.
The embodiment of the invention also provides evaporation equipment which comprises an evaporation source and the evaporation source shielding device in the embodiment, wherein the evaporation source shielding device can shield the evaporation source in the temperature rising stage and the temperature lowering stage and can expose the evaporation source in the constant temperature stage.
By adopting the evaporation source shielding device, the evaporation equipment can prevent evaporant of the evaporation source from being plated on the inner wall of the process chamber, thereby ensuring the cleanliness of the chamber; meanwhile, the plated substrate exposed in the evaporation area can be prevented from being plated in the temperature rise stage and the temperature reduction stage, so that the plated substrate can be exposed in the evaporation area in the temperature rise stage and the temperature reduction stage.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.
Claims (10)
1. An evaporation source shielding device is characterized by comprising a lifting fixing mechanism (1) and a shielding mechanism (2), wherein the lifting fixing mechanism (1) is movably connected with the shielding mechanism (2), and the lifting fixing mechanism (1) is used for fixing an evaporation source (3) and driving the evaporation source (3) to move up and down; the shielding mechanism (2) is used for opening along with the rising of the evaporation source (3) so as to expose the evaporation source (3), and is also used for closing along with the falling of the evaporation source (3) so as to shield the evaporation source (3).
2. The evaporation source shielding device according to claim 1, wherein the lifting fixing mechanism (1) comprises a first fixing portion (10), a second fixing portion (11) and a hollow plate (12), the first fixing portion (10) is movably connected with the second fixing portion (11), and the second fixing portion (11) is used for fixing the bottom of the evaporation source (3); the second fixing part (11) can reciprocate along the extension direction of the first fixing part (10) to drive the evaporation source (3) to lift;
the hollow plate (12) is connected with the first fixing part (10), a through hole (120) is formed in the hollow plate (12), a first cylinder (13) is arranged on the hollow plate (12) at a position corresponding to the through hole (120), and the central axis of the first cylinder (13) is superposed with the central axis of the through hole (120);
the evaporation source (3) penetrates through the through hole (120) and is partially positioned in the first cylinder (13).
3. The evaporation source shielding device according to claim 2, wherein the shielding mechanism (2) comprises a second cylinder (20) and a shielding plate (21), the second cylinder (20) is nested in the first cylinder (13), a limiting groove is arranged at the bottom of the first cylinder (13) contacting with the hollow plate (12), the bottom end of the second cylinder (20) is embedded in the limiting groove, the evaporation source (3) is located in the second cylinder (20), the evaporation source (3) and the second cylinder (20) are movably connected through a first connecting piece (22), and the second cylinder (20) can rotate relative to the first cylinder (13) under the movable connection action of the first connecting piece (22) and the lifting action of the evaporation source (3) driven by the second fixing portion (11);
shutter (21) set up in first barrel (13) with keeping away from of second barrel (20) the top of hollow slab (12), shutter (21) with through second connecting piece (23) swing joint between first barrel (13), shutter (21) with through third connecting piece (24) swing joint between second barrel (20), shutter (21) can be in second connecting piece (23) with the swing joint effect of third connecting piece (24) and second fixed part (11) drive open or close under the elevating action of evaporation source (3), with right evaporation source (3) expose or shelter from.
4. The evaporation source shielding device according to claim 3, wherein the first connecting member (22) comprises a first pin (220) disposed on the outer wall of the evaporation source (3) and a first sliding slot (221) disposed on the inner wall of the second cylinder (20),
the first pin shaft (220) is embedded in the first sliding groove (221), and the first pin shaft (220) can move along the first sliding groove (221) along with the lifting of the evaporation source (3).
5. The evaporation source shielding device according to claim 4, wherein the first sliding chute (221) comprises a first section (2210) and a second section (2211) distributed from bottom to top along the lifting direction of the evaporation source (3), and the first section (2210) and the second section (2211) are butted;
the first section (2210) extends in a spiral arc shape from bottom to top along the lifting direction of the evaporation source (3), and the second section (2211) extends in a straight line from bottom to top along the lifting direction of the evaporation source (3).
6. The evaporation source shielding device according to claim 4, wherein the first pin (220) comprises a plurality of pins.
7. The evaporation source shielding device according to claim 3, wherein the second connecting member (23) comprises a second pin (230) disposed at a top end of the first cylinder (13) and a second sliding slot (231) disposed on the shutter (21), the second pin (230) is embedded in the second sliding slot (231), and the second pin (230) is movable along the second sliding slot (231);
the third connecting piece (24) is including setting up third round pin axle (240) and the setting on the top of second barrel (20) are in shaft hole (241) on sunshade (21), third round pin axle (240) with shaft hole (241) are nested mutually, just third round pin axle (240) can rotate in shaft hole (241).
8. An evaporation source shielding device according to claim 7, wherein the shutter (21) comprises a plurality of pieces, and the second connecting member (23) and the third connecting member (24) comprise a plurality of sets, respectively;
the second sliding groove (231) extends linearly from the central axis of the first cylinder (13) to the cylinder wall direction.
9. An evaporation source shielding device according to claim 2, wherein the hollow plate (12) has a vacuum cavity, and the second fixing portion (11) is hermetically connected to the through hole (120) of the hollow plate (12) through a bellows (14).
10. An evaporation apparatus comprising an evaporation source, further comprising the evaporation source blocking device according to any one of claims 1 to 9, the evaporation source blocking device being capable of blocking the evaporation source in a temperature rise stage and a temperature fall stage and exposing the evaporation source in a constant temperature stage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910555156.9A CN112126899A (en) | 2019-06-25 | 2019-06-25 | Evaporation source shelters from device and evaporation equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910555156.9A CN112126899A (en) | 2019-06-25 | 2019-06-25 | Evaporation source shelters from device and evaporation equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112126899A true CN112126899A (en) | 2020-12-25 |
Family
ID=73849438
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910555156.9A Pending CN112126899A (en) | 2019-06-25 | 2019-06-25 | Evaporation source shelters from device and evaporation equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112126899A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113463189A (en) * | 2021-06-21 | 2021-10-01 | 湖南烁科晶磊半导体科技有限公司 | Double-shutter molecular beam epitaxy source furnace system and molecular beam epitaxy equipment |
-
2019
- 2019-06-25 CN CN201910555156.9A patent/CN112126899A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113463189A (en) * | 2021-06-21 | 2021-10-01 | 湖南烁科晶磊半导体科技有限公司 | Double-shutter molecular beam epitaxy source furnace system and molecular beam epitaxy equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102354975B1 (en) | Plasma enhanced chemical vapor deposition device and display apparatus using the same | |
| KR100667598B1 (en) | Apparatus for semiconductor process | |
| JP4848845B2 (en) | Vacuum robot, processing apparatus, motor manufacturing method, and motor | |
| US9663855B2 (en) | Plasma-enhanced chemical vapor deposition apparatus and method of manufacturing display apparatus using the same | |
| TWI760096B (en) | Miniaturized semiconductor manufacturing system | |
| US10487389B2 (en) | Evaporation device and evaporation method using the same | |
| US20160329228A1 (en) | Cassette positioning device and semiconductor processing apparatus | |
| CN112126899A (en) | Evaporation source shelters from device and evaporation equipment | |
| CN108352289B (en) | Vacuum treatment installation and mass spectrometer | |
| JP3350234B2 (en) | Object buffer device, processing device using the same, and method of transporting the same | |
| US10968511B2 (en) | Substrate bearing assembly and magnetron sputtering device | |
| KR100925172B1 (en) | Apparatus and method for opening and closing lid | |
| KR20180002348A (en) | Deposition device having apparatus to prevent sagging of substrate | |
| KR100596332B1 (en) | Gate valve of vacuum processing apparatus | |
| KR101020154B1 (en) | Vacuum chamber of side open type | |
| KR100661433B1 (en) | The high temperature aging appratus for implementing the moving picture of the organic el module of the round conveyor type | |
| US10276835B2 (en) | Filling apparatus used in an evaporator system and filling method | |
| JPH10340938A (en) | Semiconductor manufacturing apparatus | |
| KR20050120930A (en) | Bake system | |
| KR101982726B1 (en) | Thermal treatment device for substrate | |
| JP4895005B2 (en) | Liquid crystal injection device | |
| KR101707975B1 (en) | Sputtering Apparatus | |
| CN105762098B (en) | Film conveying system and semiconductor processing equipment | |
| KR102401365B1 (en) | Shelf unit and stocker including the same | |
| KR101101224B1 (en) | Apparatus and method for opening and closing |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20211025 Address after: Unit 611, unit 3, 6 / F, building 1, yard 30, Yuzhi East Road, Changping District, Beijing 102208 Applicant after: Zishi Energy Co.,Ltd. Address before: Room A129-1, No. 10 Zhongxing Road, Changping District Science and Technology Park, Beijing 102200 Applicant before: DONGTAI HI-TECH EQUIPMENT TECHNOLOGY Co.,Ltd. |
|
| TA01 | Transfer of patent application right | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20201225 |
|
| WD01 | Invention patent application deemed withdrawn after publication |