CN112090840B - Follow-up cleaning tank on silicon wafer chamfering machine - Google Patents

Follow-up cleaning tank on silicon wafer chamfering machine Download PDF

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Publication number
CN112090840B
CN112090840B CN202010935495.2A CN202010935495A CN112090840B CN 112090840 B CN112090840 B CN 112090840B CN 202010935495 A CN202010935495 A CN 202010935495A CN 112090840 B CN112090840 B CN 112090840B
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China
Prior art keywords
water tank
shaft
driving
cleaning tank
rod
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CN202010935495.2A
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Chinese (zh)
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CN112090840A (en
Inventor
魏运秀
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Hunan Jingbo Solar Energy Technology Development Co ltd
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Ganzhou Yerun Automation Equipment Co ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00Accessories or details of general applicability for machines or apparatus for cleaning
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Abstract

The invention discloses a follow-up cleaning tank on a silicon wafer chamfering machine, which comprises a rectangular water tank, wherein an inlet is formed at the upper end of the left side wall of the water tank, a plurality of longitudinal rolling shafts are inserted into the water tank, two ends of each rolling shaft are inserted and fixed on the water tank, each rolling shaft consists of a group of obliquely distributed feeding rolling shafts and a group of horizontally distributed supporting rolling shafts, and the feeding rolling shafts are positioned at the left side of the water tank; the shaping has the export on the basin preceding lateral wall in the dead ahead of bearing roller bearing, and it has two sets of pushing away work or material rest to peg graft on the basin between the bearing roller bearing, and pushing away work or material rest comprises a plurality of vertical lifter, and the lifter upper end articulates through the round pin axle has the guide pulley, and the gyro wheel is inserted and is established in the basin, and the centre of a circle of gyro wheel distributes in same inclined plane.

Description

Follow-up cleaning tank on silicon wafer chamfering machine
Technical Field
The invention relates to the technical field of chamfering machines, in particular to a follow-up cleaning tank on a silicon wafer chamfering machine.
Background
At present, a semiconductor is generally referred to as a silicon wafer, and a finished product after the silicon wafer is processed and produced is generally referred to as a round wafer. The silicon wafer is from quartz sand, and the production process of the monocrystalline silicon wafer comprises single crystal pulling, outer ring grinding, slicing, annealing, chamfering, grinding or lapping and CMP. Chamfering is needed to be carried out on the monocrystalline silicon wafer: and polishing the annealed silicon wafer into an arc shape to prevent the edge of the silicon wafer from cracking and the generation of lattice defects and increase the flatness of the epitaxial layer and the photoresist layer. In the chamfering process, emulsion is sprayed on the outer ring of the silicon wafer cut by the cutter, so that the temperature can be reduced and the silicon wafer can be lubricated, and residues can be washed away; however, the silicon wafer after chamfering still has residues, some chamfering machines lift and utilize a chain belt which can vertically lift and circulate to drive a plurality of movable water tanks, the chamfering is completed, the silicon wafer is placed into the water tank at the upper end of the chain belt, then the silicon wafer is moved to the lower end of the chain belt, the silicon wafer in the water tank is taken out, and the surface of the silicon wafer can be cleaned. But the water tank requires a device capable of realizing mechanized discharging.
Disclosure of Invention
The invention aims to overcome the defects in the prior art and provides a follow-up cleaning tank on a silicon wafer chamfering machine, which is provided with a device capable of driving a silicon wafer in a water tank to be output and can clean the chamfered silicon wafer by utilizing a movable water tank.
In order to achieve the purpose, the technical scheme adopted by the invention is as follows:
a follow-up cleaning tank on a silicon wafer chamfering machine comprises a rectangular water tank, wherein an inlet is formed in the upper end of the left side wall of the water tank, a plurality of longitudinal rolling shafts are inserted into the water tank, two ends of each rolling shaft are fixedly inserted into the water tank in an inserting mode, each rolling shaft consists of a group of obliquely distributed feeding rolling shafts and a group of horizontally distributed supporting rolling shafts, and the feeding rolling shafts are located on the left side of the water tank; an outlet is formed in the front side wall of the water tank right in front of the bearing rolling shafts, two groups of material pushing frames are inserted into the water tank between the bearing rolling shafts, each material pushing frame is composed of a plurality of vertical lifting rods, the upper ends of the lifting rods are hinged to guide wheels through pin shafts, the idler wheels are inserted into the water tank, and the circle centers of the idler wheels are distributed in the same inclined plane; the lower end of the lifting rod extends out of the water tank and is fixed on a transverse connecting rod, and a longitudinal driving shaft is fixedly inserted on the connecting rod; two transverse driving rods are inserted between the lifting rods on the lower side of the water tank, transverse driving grooves are formed in the driving rods, the driving shafts are inserted into the driving grooves of the driving rods, the left ends of the driving rods are hinged to the supporting seats through hinged shafts, the supporting seats are fixed on the lower end face of the water tank, the right ends of the driving rods extend out of the water tank and are fixedly connected with supporting shafts in an inserting mode, and idler wheels are inserted on the supporting shafts in a sleeved mode.
Preferably, the roller is sleeved with a roller sleeve in an inserting manner, and the roller sleeve at the left upper end of one side of the feeding roller is exposed out of the lower end face of the inlet.
Preferably, the length of the lifting rod on the material pushing frame extending into the water tank is gradually decreased from the front side of the water tank to the rear side of the water tank.
Preferably, the distance from the top end of the lifting rod to the lower end face of the outlet of the water tank is smaller than the length of the lifting rod on the lower side of the water tank.
Preferably, the guide wheel at the upper end of the lifting rod is positioned at the lower side of the supporting roller.
Preferably, one end of the driving rod, which is close to the hinge shaft, is spliced with a longitudinal positioning shaft, the support is spliced with a longitudinal rotating shaft, the rotating shaft is spliced with a limit bolt, the tail end of the limit bolt is in threaded connection with the positioning shaft, a pressure spring is inserted and sleeved on the limit bolt, and two ends of the pressure spring are pressed on the positioning shaft and the rotating shaft respectively.
Preferably, the driving rod is horizontal, and the width of the driving groove on the driving rod is equal to the diameter of the driving shaft.
The invention has the beneficial effects that: the device is designed with a device which can drive the silicon wafers in the water tank to be output, and the silicon wafers after chamfering can be cleaned by utilizing the movable water tank.
Drawings
FIG. 1 is a schematic perspective view of the present invention;
FIG. 2 is a front view of the present invention;
FIG. 3 is a schematic bottom view of the present invention;
FIG. 4 is a schematic top view of the present invention;
fig. 5 is a schematic sectional view at a-a in fig. 4.
In the figure: 1. a water tank; 11. an inlet; 12. an outlet; 2. a roller; 21. a feed roller; 22. a bearing roller; 3. a lifting rod; 4. a guide wheel; 5. a connecting rod; 6. a drive shaft; 7. a drive rod; 71. a drive slot; 8. a support; 9. hinging a shaft; 10. a fulcrum; 20. a roller; 30. a pressure spring; 40. a rotating shaft; 50. a limit bolt; 60. and (5) pressing a spring.
Detailed Description
Example (b): as shown in fig. 1 to 5, the following cleaning tank for the silicon wafer chamfering machine comprises a rectangular water tank 1, wherein an inlet 11 is formed at the upper end of the left side wall of the water tank 1, a plurality of longitudinal rollers 2 are inserted into the water tank 1, two ends of each roller 2 are inserted and fixed on the water tank 1, each roller 2 consists of a group of obliquely distributed feeding rollers 21 and a group of horizontally distributed supporting rollers 22, and the feeding rollers 21 are positioned at the left side of the water tank 1; an outlet 12 is formed in the front side wall of the water tank 1 in front of the bearing rolling shafts 22, two groups of material pushing frames are inserted in the water tank 1 between the bearing rolling shafts 22, each material pushing frame is composed of a plurality of vertical lifting rods 3, the upper ends of the lifting rods 3 are hinged to guide wheels 4 through pin shafts, the guide wheels 4 are inserted in the water tank 1, and the circle centers of the roller wheels 4 are distributed in the same inclined plane; the lower end of the lifting rod 3 extends out of the water tank 1 and is fixed on a transverse connecting rod 5, and a longitudinal driving shaft 6 is fixedly inserted on the connecting rod 5; two transverse driving rods 7 are inserted between the lifting rods 3 on the lower side of the water tank 1, transverse driving grooves 71 are formed in the driving rods 7, the driving shaft 6 is inserted into the driving grooves 71 of the driving rods 7, the left end of each driving rod 7 is hinged to the corresponding support 8 through a hinge shaft 9, the corresponding support 8 is fixed to the lower end face of the water tank 1, a support shaft 10 is inserted and fixed to the right end of each driving rod 7, extending out of the water tank 1, and a roller 20 is inserted and sleeved on each support shaft 10.
The roller 2 is inserted and sleeved with a roller sleeve, and the roller sleeve at the left upper end of one side of the feeding roller 21 is exposed out of the lower end face of the inlet 11.
The length of the lifting rod 3 on the material pushing frame extending into the water tank 1 is gradually reduced from the front side of the water tank 1 to the rear side of the water tank 1.
The distance from the top end of the lifting rod 3 to the lower end face of the outlet 12 of the water tank 1 is less than the length of the lifting rod 3 at the lower side of the water tank 1.
The guide wheel 4 at the upper end of the lifting rod 3 is positioned at the lower side of the supporting roller 22.
One end of the driving rod 7 close to the hinge shaft 9 is inserted with a longitudinal positioning shaft 30, the support 8 is inserted with a longitudinal rotating shaft 40, the rotating shaft 40 is inserted with a limit bolt 50, the tail end of the limit bolt 50 is screwed on the positioning shaft 30, the limit bolt 50 is inserted with a pressure spring 60, and two ends of the pressure spring 60 are pressed on the positioning shaft 30 and the rotating shaft 40 respectively.
The driving rod 7 is horizontal, and the width of the driving groove 71 on the driving rod 7 is equal to the diameter of the driving shaft 6.
The working principle is as follows: the invention relates to a follow-up cleaning tank on a silicon wafer chamfering machine, which can be arranged on a vertical conveying chain belt through a bracket, when the upper end of the conveying chain belt is arranged, a silicon wafer can be input from a water tank 1, the silicon wafer falls down along a feeding roller 21, falls on a bearing roller 22 and enters water at the same time, and auxiliary residues on the surface of the silicon wafer are removed by using the water;
when the silicon wafer is moved to the lower end of the conveying chain belt, a fixed stop block can be arranged at the lower end of the conveying chain belt, the roller 20 on the device of the water tank 1 is abutted against the stop block and can drive the driving rod 7 to rotate upwards around the hinge shaft 9, the driving rod 7 rotates upwards to realize the upward movement of the lifting rod 3, the silicon wafer can be jacked up by the guide wheel 4 which is distributed on the upper end of the lifting rod 3 in an inclined plane, and the silicon wafer slides downwards after being jacked up and is output from the outlet of the water tank 1; meanwhile, the water tank 1 moves downwards continuously, the roller 20 is separated from the stop block, and the lifting rod 3 resets.
The examples are intended to illustrate the invention, but not to limit it. The described embodiments may be modified by those skilled in the art without departing from the spirit and scope of the present invention, and therefore, the scope of the appended claims should be accorded the full scope of the invention as set forth in the appended claims.

Claims (6)

1. The utility model provides a retinue washing tank on silicon chip beveler, includes basin (1) of rectangle, and the upper end shaping of basin (1) left side wall has inlet (11), its characterized in that: a plurality of longitudinal rollers (2) are inserted into the water tank (1), two ends of each roller (2) are fixedly inserted into the water tank (1), each roller (2) consists of a group of obliquely distributed feeding rollers (21) and a group of horizontally distributed bearing rollers (22), and the feeding rollers (21) are positioned on the left side of the water tank (1); an outlet (12) is formed in the front side wall of the water tank (1) in front of the bearing rolling shafts (22), two groups of material pushing frames are inserted into the water tank (1) between the bearing rolling shafts (22) and are composed of a plurality of vertical lifting rods (3), guide wheels (4) are hinged to the upper ends of the lifting rods (3) through pin shafts, the guide wheels (4) are inserted into the water tank (1), and the circle centers of the guide wheels (4) are distributed in the same inclined plane; the lower end of the lifting rod (3) extends out of the water tank (1) and is fixed on a transverse connecting rod (5), and a longitudinal driving shaft (6) is fixedly inserted on the connecting rod (5); two transverse driving rods (7) are inserted between the lifting rods (3) on the lower side of the water tank (1), a transverse driving groove (71) is formed in each driving rod (7), the driving shaft (6) is inserted into the driving groove (71) of each driving rod (7), the left end of each driving rod (7) is hinged to the support (8) through the hinge shaft (9), the support (8) is fixed on the lower end face of the water tank (1), the right end of each driving rod (7) extends out of the water tank (1) and is fixedly connected with the support shaft (10) in an inserted mode, and the roller (20) is inserted and sleeved on each support shaft (10);
one end of the driving rod (7) close to the hinged shaft (9) is spliced with a longitudinal positioning shaft (30), the support (8) is spliced with a longitudinal rotating shaft (40), the rotating shaft (40) is spliced with a limit bolt (50), the tail end of the limit bolt (50) is in threaded connection with the positioning shaft (30), a pressure spring (60) is sleeved on the limit bolt (50), and two ends of the pressure spring (60) are pressed on the positioning shaft (30) and the rotating shaft (40) respectively.
2. The portable cleaning tank of claim 1, wherein the portable cleaning tank comprises: the roller (2) is inserted and sleeved with a roller sleeve, and the roller sleeve at the left upper end of one side of the feeding roller (21) is exposed out of the lower end face of the inlet (11).
3. The portable cleaning tank of claim 1, wherein the portable cleaning tank comprises: the length of the lifting rod (3) on the material pushing frame extending into the water tank (1) is gradually reduced from the front side of the water tank (1) to the rear side of the water tank (1).
4. The portable cleaning tank of claim 3, wherein the portable cleaning tank comprises: the distance from the top end of the lifting rod (3) to the lower end face of the outlet (12) of the water tank (1) is less than the length of the lifting rod (3) on the lower side of the water tank (1).
5. The portable cleaning tank of claim 4, wherein the portable cleaning tank comprises: the guide wheel (4) at the upper end of the lifting rod (3) is positioned at the lower side of the bearing rolling shaft (22).
6. The portable cleaning tank of claim 1, wherein the portable cleaning tank comprises: the driving rod (7) is horizontal, and the width of the driving groove (71) on the driving rod (7) is equal to the diameter of the driving shaft (6).
CN202010935495.2A 2020-09-08 2020-09-08 Follow-up cleaning tank on silicon wafer chamfering machine Active CN112090840B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010935495.2A CN112090840B (en) 2020-09-08 2020-09-08 Follow-up cleaning tank on silicon wafer chamfering machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010935495.2A CN112090840B (en) 2020-09-08 2020-09-08 Follow-up cleaning tank on silicon wafer chamfering machine

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CN112090840B true CN112090840B (en) 2022-02-18

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Publication number Priority date Publication date Assignee Title
CN112517990B (en) * 2020-11-27 2021-12-24 宁波银象汽车配件制造有限公司 But climbing equipment manufacturing's automatically regulated numerically controlled fraise machine system device

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* Cited by examiner, † Cited by third party
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CN203304220U (en) * 2013-01-23 2013-11-27 洛阳尚德太阳能电力有限公司 Silicon wafer cleaning equipment
CN203227626U (en) * 2013-03-25 2013-10-09 上海超硅半导体有限公司 Large-size silicon slice washing device
JP2019018355A (en) * 2017-07-11 2019-02-07 京セラドキュメントソリューションズ株式会社 Recording head and inkjet recording device including the same
CN209577571U (en) * 2019-02-21 2019-11-05 浙江艾能聚光伏科技股份有限公司 A kind of Chained cleaning machine with integral type idler wheel

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Effective date of registration: 20220706

Address after: 413063 Henglong new area, Heshan District, Yiyang City, Hunan Province

Patentee after: Hunan Jingbo solar energy technology development Co.,Ltd.

Address before: 341003 Ganzhou yerun automation equipment Co., Ltd. north of Gongyi Road, Hong Kong Industrial Park, Ganzhou Economic Development Zone, Ganzhou City, Jiangxi Province

Patentee before: Ganzhou yerun automation equipment Co.,Ltd.

TR01 Transfer of patent right