CN112083521A - Preparation method of diffuse reflection device and diffuse reflection device - Google Patents
Preparation method of diffuse reflection device and diffuse reflection device Download PDFInfo
- Publication number
- CN112083521A CN112083521A CN201910509077.4A CN201910509077A CN112083521A CN 112083521 A CN112083521 A CN 112083521A CN 201910509077 A CN201910509077 A CN 201910509077A CN 112083521 A CN112083521 A CN 112083521A
- Authority
- CN
- China
- Prior art keywords
- diffuse reflection
- water glass
- layer
- particles
- diffuse
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
- G02B5/0242—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Elements Other Than Lenses (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention provides a preparation method of a diffuse reflection device and the diffuse reflection device, wherein the preparation method of the diffuse reflection device comprises the following steps: s1: after mixing the diffuse reflection particles and an organic carrier into slurry, coating the slurry on a heat conduction substrate layer and pre-drying the slurry at a first temperature; s2: sintering the slurry coated on the heat-conducting substrate layer into a diffuse reflection powder layer at a second temperature; s3: and sintering the diffuse reflection powder layer soaked by the water glass into a diffuse reflection layer at a third temperature. According to the invention, high-fluidity water glass is used as a binder to fill the gaps among the particles, and a compact film layer is formed after curing, and meanwhile, high-strength bonding can be formed with the heat-conducting substrate layer, so that higher reflectivity and lower thermal resistance are realized, and the efficiency of the diffuse reflection device is higher.
Description
Technical Field
The invention relates to a preparation method of a diffuse reflection device and the diffuse reflection device, and belongs to the technical field of optical materials.
Background
At present, a diffuse reflection layer of a mainstream diffuse reflection device is formed by mixing and sintering white diffuse reflection particles and glass powder. In order to ensure a high reflectivity, a diffuse reflection layer with a high content of diffuse reflection particles is generally used, or a thicker diffuse reflection layer is used. However, when the content of the diffuse reflection particles is high, the bonding force between the diffuse reflection layer and the heat conduction substrate is poor, and the reliability is low; and the thicker diffuse reflection layer has higher thermal resistance, so that the diffuse reflection layer structure of the existing diffuse reflection device is difficult to have the characteristics of high reflection and low thermal resistance at the same time, and is not beneficial to the improvement of the efficiency of the diffuse reflection device.
In order to make the diffuse reflection layer have high reflection characteristics relative to visible light, the particle size of the white diffuse reflection particles is generally required to be in a submicron range of 0.1-0.5 μm, and the glass powder used as the adhesive can only provide particles with the particle size close to 1 μm due to process limitations, the original particles are large, the particle size of the large adhesive particles influences the distribution of the white diffuse reflection particles in the sintering process, the adhered white diffuse reflection particles are difficult to form a close packing structure, and the reflectivity of the diffuse reflection layer is difficult to further improve. Fig. 1 is a partial SEM image of a diffuse reflection layer in the prior art, as shown in fig. 1, glass powder does not form a completely melted flowing state after sintering, the original particle size is substantially maintained, the size is about 1 μm, white diffuse reflection particles with a particle size of 0.1 μm to 0.5 μm are adhered around glass particles, and due to the spacing effect of large glass particles, the white diffuse reflection particles cannot completely cover the glass particles, so that a large number of holes are left, the bonding strength is not high, and the prepared diffuse reflection layer has a thick thickness and high thermal resistance, so that the diffuse reflection layer cannot meet the requirements of high reflectivity and low thermal resistance.
Disclosure of Invention
Aiming at the defects of the prior art, the invention provides a preparation method of a diffuse reflection device and the diffuse reflection device, wherein high-fluidity water glass is used as a binder to fill the gaps among particles, and a compact film layer is formed after curing, and meanwhile, high-strength bonding can be formed between the high-fluidity water glass and a heat-conducting substrate layer, so that higher reflectivity and lower thermal resistance are realized, and the efficiency of the diffuse reflection device is higher; the potassium water glass adopted by the invention has high adhesive force with the heat-conducting substrate layer, and the water resistance and reliability of the potassium water glass can be obviously improved by modifying the potassium water glass with silicon phosphate.
The technical problem to be solved by the invention is realized by the following technical scheme:
the invention provides a preparation method of a diffuse reflection device, which comprises the following steps: s1: after mixing the diffuse reflection particles and an organic carrier into slurry, coating the slurry on a heat conduction substrate layer and pre-drying the slurry at a first temperature; s2: sintering the slurry coated on the heat-conducting substrate layer into a diffuse reflection powder layer at a second temperature; s3: and sintering the diffuse reflection powder layer soaked by the water glass into a diffuse reflection layer at a third temperature.
Preferably, the diffuse reflection particles include first white diffuse reflection particles including one or more of titanium oxide, zinc oxide, yttrium oxide, and zirconium oxide, and second white diffuse reflection particles including one or more of aluminum oxide, barium sulfate, and aluminum silicate.
Preferably, the first white diffuse reflective particles are titanium oxide of a rutile structure.
In order to make the diffuse reflection layer have high reflection characteristics with respect to visible light, the first white diffuse reflection particles and the second white diffuse reflection particles each have an average particle diameter of 0.1 μm to 0.5 μm.
Preferably, the first temperature is 60 ℃ to 150 ℃, the second temperature is 400 ℃ to 600 ℃, and the third temperature is 100 ℃ to 300 ℃.
In order to make the water glass sufficiently wet the diffuse reflection powder layer, in S3, the wetting method includes: spraying the water glass on the diffuse reflection powder layer, dropwise adding the water glass on the diffuse reflection powder layer or immersing the diffuse reflection powder layer in the water glass for a preset time and then taking out the water glass.
In order to further improve the adhesion between the diffuse reflection layer and the heat conducting substrate layer, the water glass is potassium water glass, and the modulus of the potassium water glass is 3-7.
In order to improve the water resistance of the diffuse reflection device, the potash water glass is silicon phosphate modified potash water glass or sodium fluosilicate modified potash water glass.
Preferably, the mass fraction of the silicon phosphate is 5% -20%, and the mass fraction of the sodium fluosilicate is less than or equal to 5%.
The invention also provides a diffuse reflection device, which comprises a heat conduction substrate layer and a diffuse reflection layer arranged on the heat conduction substrate layer, wherein the diffuse reflection layer is prepared by adopting the preparation method of the diffuse reflection device.
In order to avoid cracking while ensuring the reflectivity of the diffuse reflection means, the thickness of the diffuse reflection layer is 40 μm to 90 μm.
In conclusion, the high-fluidity water glass is used as the binder to fill the gaps among the particles, and the high-strength bonding can be formed between the high-fluidity water glass and the heat-conducting substrate layer while the high-fluidity water glass forms a compact film layer after curing, so that the high-reflectivity and the low thermal resistance are realized, and the efficiency of the diffuse reflection device is higher; the potassium water glass adopted by the invention has high adhesive force with the heat-conducting substrate layer, and the water resistance and reliability of the potassium water glass can be obviously improved by modifying the potassium water glass with silicon phosphate.
The technical solution of the present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
Drawings
FIG. 1 is a partial SEM image of a diffuse reflective layer of the prior art;
FIG. 2 is a partial SEM image of a diffuse reflective layer of the present invention;
FIG. 3 is a schematic structural diagram of the diffuse reflection apparatus according to the present invention;
fig. 4 is a schematic production flow diagram of the diffuse reflection device of the present invention.
Detailed Description
All of the starting materials of the present invention, without particular limitation as to their source, may be purchased commercially or prepared according to conventional methods well known to those skilled in the art.
FIG. 2 is a partial SEM image of a diffuse reflective layer 10 of the present invention; fig. 3 is a schematic structural diagram of the diffuse reflection device of the present invention. As shown in fig. 2 and 3, the present invention provides a diffuse reflection apparatus comprising a thermally conductive substrate layer 20 and a diffuse reflection layer 10 disposed on the thermally conductive substrate layer 20.
The heat conducting substrate layer 20 is made of alumina ceramics, sapphire crystals, aluminum nitride ceramics, silicon carbide ceramics, silicon nitride ceramics or boron nitride ceramics with the heat conductivity higher than 10W/m.K. In addition, in order to reduce the cost and enhance the adhesion between the heat-conducting substrate layer 20 and the diffuse reflection layer 10, the heat-conducting substrate layer 20 may also be made of aluminum.
The diffuse reflection layer 10 comprises diffuse reflection particles and water glass 13, the diffuse reflection particles preferably comprise first white diffuse reflection particles 11 and second white diffuse reflection particles 12, wherein the average particle diameter of the first white diffuse reflection particles 11 and the average particle diameter of the second white diffuse reflection particles 12 are both 0.1-0.5 μm, and the packing density of the first white diffuse reflection particles 11 and the second white diffuse reflection particles 12 preferably reaches tap density. The first white diffuse reflection particles 11 include one or more of titanium oxide, zinc oxide, yttrium oxide, and zirconium oxide, and when the first white diffuse reflection particles 11 include titanium oxide, titanium oxide having a rutile structure is preferable. The second white diffuse reflection particles 12 include one or more of alumina, barium sulfate, and aluminum silicate.
Because the conventional diffuse reflection layer 10 is formed by mixing and sintering glass powder and diffuse reflection particles on a heat conduction substrate, the diffuse reflection particles cannot be densely packed, and the high-temperature fluidity of glass liquid is poor, so that the bonding is easy to be weak under the condition of high diffuse reflection particle content. According to the invention, firstly, the diffuse reflection powder layer 10' without glass powder adhesive is prepared, a close packing structure can be basically realized among diffuse reflection particles, then the water glass 13 is adopted as the inorganic adhesive, the high fluidity of the water glass 13 is utilized to fill gaps among the diffuse reflection particles, and the solidified water glass, the first white diffuse reflection particles 11 and the second white diffuse reflection particles 12 form the compact diffuse reflection layer 10 together.
In order to further improve the adhesion between the diffuse reflective layer 10 and the thermally conductive substrate layer 20, the water glass 13 is preferably a potassium water glass, which preferably has a modulus of 3 to 7. More preferably, the silicon phosphate modified potash water glass or the sodium fluorosilicate modified potash water glass, when selected, can significantly improve the water resistance of the diffuse reflection apparatus. Preferably, the mass fraction of the silicon phosphate is 5% -20%, and the mass fraction of the sodium fluosilicate is less than or equal to 5%.
Preferably, since the diffuse reflection layer 10 has a thickness of more than 90 μm, the reflectance is not increased and is easily cracked, and has a thickness of less than 40 μm, the reflectance is severely decreased, and thus, in the present invention, the diffuse reflection layer 10 has a thickness of 40 μm to 90 μm.
Fig. 4 is a schematic production flow diagram of the diffuse reflection device of the present invention. As shown in fig. 4, the present invention further provides a method for manufacturing the diffuse reflection apparatus, the method comprising:
s1: after the first white diffuse reflection particles 11 and the second white diffuse reflection particles 12 are mixed with an organic carrier to form slurry, the slurry is coated on the heat conduction substrate layer 20 and is pre-dried at a first temperature;
s2: sintering the slurry coated on the heat conductive substrate layer 20 into a diffuse reflection powder layer 10' at a second temperature;
s3: and sintering the diffuse reflection powder layer 10' soaked by the water glass 13 into a diffuse reflection layer at a third temperature.
In S1, the organic carrier includes, but is not limited to, one or more of silicone oil, ethanol, ethylene glycol, xylene, ethyl cellulose, acetyl tributyl citrate, terpineol, butyl carbitol acetate, polyvinyl alcohol (PVA), polyvinyl butyral (PVB), polyacrylic acid (PAA), polyethylene glycol (PEG) of various systems such as phenyl, methyl, etc. The temperature (first temperature) of the pre-drying is preferably 60 ℃ to 150 ℃, and the time of the pre-drying is preferably 0.5 to 4 hours, so that the sizing agent is shaped. It is necessary to supplement that the slurry is allowed to stand for a period of time, preferably 1-3 hours, before being pre-dried, in order to homogenize the slurry.
It should be added that the coating in S1 can be performed in various manners, such as dip coating, spray coating or deposition, and since the reflectance of the diffuse reflection device prepared by coating the first white diffuse reflection particles and the second white diffuse reflection particles by deposition is low, dip coating or spray coating is preferred.
In S2, the sintering temperature (second temperature) is preferably 400 ℃ to 600 ℃, and the sintering time is preferably 0.5 to 3 hours, so that the organic vehicle is decomposed and eliminated during the sintering process, and the influence of the organic vehicle on the diffuse reflection layer 10 is reduced, and only the diffuse reflection powder layer 10' consisting of the first white diffuse reflection particles 11 and the second white diffuse reflection particles 12 is left on the heat conductive substrate layer 20.
In S3, the temperature of the sintering (third temperature) is preferably 100 ℃ to 300 ℃, and the sintering time is preferably 0.5 to 3 hours. The manner of impregnating the diffuse reflection powder layer 10 'with the water glass 13 is various, the invention is not limited to the specific manner of mixing, and the skilled person can select the manner according to the actual requirement, for example, the diffuse reflection powder layer 10' can be impregnated with the water glass 13 by spraying, dipping or dripping, etc. Specifically, the water glass 13 may be sprayed on the diffuse reflection powder layer 10 ', the water glass 13 may be dropped on the diffuse reflection powder layer 10 ', or the diffuse reflection powder layer 10 ' may be immersed in the water glass 13 for a predetermined time, and then taken out, the predetermined time being preferably 0.5 to 12 hours.
In order to accelerate the wetting of the water glass 13 with the diffuse reflection powder layer 10', the water glass 13 may be heated, thereby shortening the wetting time.
Or water glass 13 can be dripped on the diffuse reflection powder layer 10 'to soak the diffuse reflection powder layer 10'; alternatively, the diffuse reflection powder layer 10 'may be immersed in the water glass 13 and then pulled up to form the diffuse reflection powder layer 10' infiltrated with the water glass 13.
Diffuse reflection layers (sample 1, sample 2, sample 3 and sample 4) with different thicknesses are prepared by adopting the preparation method, diffuse reflection layers (inorganic diffuse reflection 1 and inorganic diffuse reflection 2) with different thicknesses are prepared by adopting glass powder sintering adhesives, diffuse reflection layers (organic diffuse reflection 1 and organic diffuse reflection 2) with different thicknesses are prepared by adopting organic silica gel adhesives, and the relation between the relative reflectivity and the thickness of different diffuse reflection layers is shown in table 1 by taking an SRS-010 blue phenanthrene standard white board as reference.
TABLE 1
| Thickness/mum | Relative reflectivity | |
| Sample 1 | 65-64 | 102.0％ |
| Sample 2 | 69-70 | 103.3％ |
| Sample 3 | 57-60 | 102.8％ |
| Sample No. 4 | 70-73 | 103.4％ |
| Inorganic diffuse reflection 1 | 63-60 | 100.4％ |
| Inorganic diffuse reflection 2 | 59-58 | 100.3％ |
| Organic diffuse reflection 1 | 50-55 | 100.8％ |
| Organic diffuse reflection 2 | 70-76 | 101.1％ |
As can be seen from table 1, the relative reflectance of the diffuse reflection layer prepared according to the present invention is higher than that of the diffuse reflection layer using the glass frit sintered adhesive and the organic silica gel adhesive, compared to the relative reflectance test of the diffuse reflection layer using the inorganic glass frit sintered and the organic silica gel bonded.
In conclusion, the high-fluidity water glass is used as the binder to fill the gaps among the particles, and the high-strength bonding can be formed between the high-fluidity water glass and the heat-conducting substrate layer while the high-fluidity water glass forms a compact film layer after curing, so that the high-reflectivity and the low thermal resistance are realized, and the efficiency of the diffuse reflection device is higher; the potassium water glass adopted by the invention has high adhesive force with the heat-conducting substrate layer, and the water resistance and reliability of the potassium water glass can be obviously improved by modifying the potassium water glass with silicon phosphate.
Claims (10)
1. A method for preparing a diffuse reflection device, the method comprising:
s1: after mixing the diffuse reflection particles and an organic carrier into slurry, coating the slurry on a heat conduction substrate layer and pre-drying the slurry at a first temperature;
s2: sintering the slurry coated on the heat-conducting substrate layer into a diffuse reflection powder layer at a second temperature;
s3: and sintering the diffuse reflection powder layer soaked by the water glass into a diffuse reflection layer at a third temperature.
2. The method of claim 1, wherein the diffuse reflection particles comprise first white diffuse reflection particles comprising one or more of titanium oxide, zinc oxide, yttrium oxide, and zirconium oxide, and second white diffuse reflection particles comprising one or more of aluminum oxide, barium sulfate, and aluminum silicate.
3. The method of manufacturing a diffuse reflection apparatus according to claim 2, wherein said first white diffuse reflection particles are titanium oxide of a rutile structure.
4. The method of manufacturing a diffuse reflection apparatus according to claim 2, wherein the first white diffuse reflection particles and the second white diffuse reflection particles each have an average particle diameter of 0.1 μm to 0.5 μm.
5. The method of making a diffuse reflective device according to claim 1, wherein said first temperature is in the range of 60 ℃ to 150 ℃, said second temperature is in the range of 400 ℃ to 600 ℃, and said third temperature is in the range of 100 ℃ to 300 ℃.
6. The method of claim 1, wherein in S3, the wetting comprises: spraying the water glass on the diffuse reflection powder layer, dropwise adding the water glass on the diffuse reflection powder layer or immersing the diffuse reflection powder layer in the water glass for a preset time and then taking out the water glass.
7. The method of making a diffuse reflective device according to claim 1, wherein said water glass is a potash water glass having a modulus of 3 to 7.
8. The method of making a diffuse reflective device according to claim 7, wherein said potash water glass is a silicon phosphate modified potash water glass or a sodium fluorosilicate modified potash water glass.
9. The method for producing a diffuse reflection device according to claim 8, wherein the silicon phosphate is 5 to 20% by mass, and the sodium fluorosilicate is 5% by mass or less.
10. A diffuse reflective device comprising a thermally conductive substrate layer and a diffuse reflective layer disposed on said thermally conductive substrate layer, wherein said diffuse reflective layer is produced using the method of producing a diffuse reflective device according to any one of claims 1-9.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910509077.4A CN112083521A (en) | 2019-06-13 | 2019-06-13 | Preparation method of diffuse reflection device and diffuse reflection device |
| PCT/CN2020/090819 WO2020248772A1 (en) | 2019-06-13 | 2020-05-18 | Preparation method for diffuse reflection device and diffuse reflection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910509077.4A CN112083521A (en) | 2019-06-13 | 2019-06-13 | Preparation method of diffuse reflection device and diffuse reflection device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112083521A true CN112083521A (en) | 2020-12-15 |
Family
ID=73733410
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910509077.4A Pending CN112083521A (en) | 2019-06-13 | 2019-06-13 | Preparation method of diffuse reflection device and diffuse reflection device |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN112083521A (en) |
| WO (1) | WO2020248772A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114296166A (en) * | 2021-12-03 | 2022-04-08 | 中山大学 | Reflection rotating wheel device and application thereof in laser speckle elimination |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106154365A (en) * | 2015-04-16 | 2016-11-23 | 深圳市光峰光电技术有限公司 | The preparation method of a kind of diffusing reflection layer and Wavelength converter |
| CN107631272A (en) * | 2016-07-13 | 2018-01-26 | 深圳市光峰光电技术有限公司 | A kind of Wavelength converter and preparation method thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1058170A (en) * | 1991-08-24 | 1992-01-29 | 刘年树 | A kind of crystal brick and manufacture method thereof |
| US20070248810A1 (en) * | 2006-04-25 | 2007-10-25 | Mcgee Dennis E | Coated polymeric film |
| TWI382206B (en) * | 2008-09-09 | 2013-01-11 | Coretronic Corp | Reflective film |
| CN104595852B (en) * | 2013-10-30 | 2016-08-24 | 深圳市绎立锐光科技开发有限公司 | A kind of Wavelength converter, diffusing reflection layer, light-source system and optical projection system |
-
2019
- 2019-06-13 CN CN201910509077.4A patent/CN112083521A/en active Pending
-
2020
- 2020-05-18 WO PCT/CN2020/090819 patent/WO2020248772A1/en active Application Filing
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106154365A (en) * | 2015-04-16 | 2016-11-23 | 深圳市光峰光电技术有限公司 | The preparation method of a kind of diffusing reflection layer and Wavelength converter |
| CN107631272A (en) * | 2016-07-13 | 2018-01-26 | 深圳市光峰光电技术有限公司 | A kind of Wavelength converter and preparation method thereof |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114296166A (en) * | 2021-12-03 | 2022-04-08 | 中山大学 | Reflection rotating wheel device and application thereof in laser speckle elimination |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020248772A1 (en) | 2020-12-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11053161B2 (en) | Glass fluorescent powder slice with multi-layer structure and preparation method therefor, and light-emitting device | |
| US20210404631A1 (en) | Wavelength conversion device, manufacturing method thereof, and related illumination device | |
| KR101997113B1 (en) | Wavelength conversion device and related light-emitting device thereof | |
| EP3244238B1 (en) | Diffuse reflection material, diffuse reflection layer, wavelength conversion device and light source system | |
| CN104595852B (en) | A kind of Wavelength converter, diffusing reflection layer, light-source system and optical projection system | |
| CN106154365B (en) | A kind of preparation method and Wavelength converter of diffusing reflection layer | |
| CN102986032B (en) | Ray structure and preparation method thereof | |
| EP3486958B1 (en) | Wavelength converter and manufacturing method thereof | |
| JP2008541465A (en) | Light emission conversion type LED | |
| CN105716039A (en) | Light conversion device and preparation method and application thereof | |
| CN105762239A (en) | Light conversion device, manufacture method therefor and application thereof | |
| JPWO2019098057A1 (en) | Wavelength converter | |
| CN112083521A (en) | Preparation method of diffuse reflection device and diffuse reflection device | |
| CN102569603A (en) | Light emitting diode (LED) ceramic substrate and production method thereof | |
| CN102746032B (en) | Method for repairing medium temperature coating (1000 to 1400 DEG C) of silicon carbide base composite material toughened by carbon fiber | |
| CN107331763A (en) | Quantum dot LED packagings and light fixture | |
| CN104124324A (en) | LED (Light-Emitting Diode) packaging glass and preparation method and application thereof | |
| CN205282499U (en) | Pottery fluorescence base plate and illuminator | |
| CN110261942A (en) | Wavelength converter and preparation method thereof | |
| CN109424944A (en) | A kind of Wavelength converter and light source | |
| WO2020088162A1 (en) | Wavelength conversion device and preparation method therefor, light emitting device, and projecting device | |
| CN105047795A (en) | Preparation methods for fluorescent substrate and light-emitting device | |
| CN201820795U (en) | High-power LED encapsulating structure | |
| CN110927844A (en) | Diffuse reflection device, preparation method thereof and wavelength conversion device | |
| CN115113310A (en) | Wavelength conversion device and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |