CN112068101B - Target scattering separation method based on mode filtering - Google Patents
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Abstract
The invention provides a target scattering separation method based on mode filtering, which mainly solves the problem that the prior art can not accurately separate the scattering of each area of a target through single-frequency point measurement. The implementation scheme is as follows: acquiring field data of the whole space of the whole scatterer and preprocessing the field data; unfolding a far-field directional diagram on the whole space based on spherical waves to obtain spherical wave mode coefficients; and filtering high-order mode items in the spherical wave mode coefficient through a mode filter, and finally obtaining the filtered scattering field of each region of the whole scatterer. The invention only needs single-frequency point scattering data of the whole scatterer, so that the scattering field of each region of the whole scatterer can be separated from measurement scenes with extremely narrow bandwidth such as UHF/VHF, and meanwhile, the scattering measurement efficiency of each region is improved. Can be used for target subregion scattering measurement.
Description
Technical Field
The invention belongs to the technical field of electromagnetism, and particularly relates to a target scattering separation method which can be used for target subarea scattering measurement.
Background
The scattering measurement of the airplane is one of the main methods for judging the coating failure of the airplane body, the airplane may damage a coating at a certain part after executing a flight task once, so that the scattering performance changes, the airplane body can be divided into regions conventionally, the regions are detected for multiple times, and the scattering performance of each region before and after executing the task is compared respectively to judge the damaged region of the coating. However, this method may cause secondary damage during disassembly and transportation inspection. When scattering is measured outdoors, a large measurement error may be formed due to the harsh electromagnetic environment.
For example, a patent application with application publication number CN201910767035.0 entitled "a time domain gate transformation method and apparatus" discloses a method for separating and removing stray influence outside a target region, which is mainly based on a time domain gate technology, and is characterized by acquiring frequency domain RCS data of a target to be detected, converting the frequency domain RCS data into time domain RCS data according to a frequency domain time domain transformation method, acquiring a time domain gate function for time domain gating, applying the time domain gate function to the time domain RCS data to obtain time domain gating data, converting the time domain gating data into frequency domain data according to a time domain frequency domain transformation method, and performing renormalization processing on the frequency domain data to remove data aliasing.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a target scattering separation method based on mode filtering, which aims to solve the problem of accurately separating the scattering of each region of a target through single-frequency point measurement and improve the scattering measurement efficiency of each region.
In order to achieve the purpose, the technical scheme adopted by the invention comprises the following steps:
(1) Sampling scattered field data of the whole scatterer to obtain a far field directional diagram covering scattered field data of a spherical area of a partTo far field directional diagramCoordinate translation operation and directional diagram zero filling operation are carried out to obtain a far field directional diagram on the whole spaceWherein theta is a pitch angle in a rectangular coordinate system of a measuring space,measuring the azimuth angle in the space rectangular coordinate system;
(2) For far field directional diagram in the whole spaceBased on the spherical wave expansion, obtaining a spherical wave mode expansion coefficient:
(2a) For far field directional diagram in the whole spaceBased on spherical wave expansion, the expansion expression is:
wherein s represents an emergent wave, a represents an incident wave, m is a mode term mark having a value of 0 to infinity, n is a mode term mark having a value of 1 to infinity,the m-n spherical wave expansion coefficient of the outgoing wave of the transverse electric wave TE,is the m.n term spherical wave expansion coefficient of TE incident wave,is an m-n term spherical wave expansion coefficient of the outgoing wave of the transverse magnetic wave TM,is the m & n spherical wave expansion coefficient of TM incident wave,m.n terms of TE emergent wave mode,is a TE incident wave mode of m-n terms,is an m.n term TM emergent wave mode,is an m.n term TM incident wave mode, and j is an imaginary number symbol;
(2b) Cutting out the aboveThe A term and the B term in the spherical wave expansion expression of the method obtain a complete scattering information far-field directional diagram capable of containing a target scatterer to be separated
Wherein B =2 nextpow2(MN) ,MN=[kR 0 ]+ u, A =2B, u is a self-defined integer, R 0 Is the radius of the smallest sphere which takes the origin of the measurement coordinate as the center and surrounds the object to be separated;
(2c) For the complete scattering information far-field directional diagram containing the target scatterer to be separatedPerforming expansion to obtain spherical wave expansion coefficient of TE waveAnd the spherical wave expansion coefficient of TM wave
Wherein i = s or a, k is the wave number;
(3) Filtering out high-order mode items of spherical waves to obtain a far-field directional diagram of the target to be separated after filtering
(3a) Obtaining the number of truncation modes N of the spherical wave function 0 :N 0 =[kR 1 ]+v,
Wherein [ kR ] 1 ]Is kR 1 Integer rounded up, R 1 Taking the aperture center of the target to be separated as an origin and the radius of a minimum ball surrounding the target to be separated, wherein v is a self-setting integer;
(3b) Selecting a mode Filter (n) to Filter out the spherical wave expansion coefficient of the TE waveAnd spherical wave expansion coefficient of TM waveObtaining the TE wave mode coefficient representing the target to be separated from the medium-high order mode coefficientAnd TM wave mode coefficient
(3c) Intercepting the complete scattering information far field directional diagram containing the target scatterer to be separated2N in spherical wave expansion expression 0 2 Term, obtaining far-field directional diagram of target to be separated after filtering
(4) Obtaining far field directional diagram of target to be separated in arrayAnd the far-field directional diagram of the target to be separated after filtering is obtainedAnd far field pattern of object to be separated in arrayAnd comparing, namely successfully separating the scattering field of the target to be separated from the scattering field of the whole scatterer when the horizontal section pattern curves or the vertical section pattern curves of the two can be matched.
Compared with the prior art, the invention has the following advantages:
according to the invention, single-frequency point scattered field data of the whole scatterer are sampled, and a scattered field directional diagram is expanded and filtered based on spherical waves, so that scattered fields of all parts in the whole scatterer can be obtained through a mathematical post-processing method, the requirement on a broadband measurement system is reduced, and the scattering measurement efficiency and precision of all parts are improved; meanwhile, the requirement on a broadband measurement system is reduced, so that the scattering fields of all parts of the whole scatterer can be separated for UHF/VHF frequency band measurement scenes.
Drawings
FIG. 1 is a flow chart of an implementation of an embodiment of the present invention;
FIG. 2 is a diagram of a three-unit metal patch array model in a scatterer to be measured according to the present invention;
fig. 3 is a two-station RCS cross-sectional pattern of a three-element metal patch array in a scatterer under test of the present invention;
fig. 4 is an in-array two-station RCS cross-sectional pattern of one cell in a three-cell metal patch array in a scatterer to be measured according to the present invention;
fig. 5 is a cross-sectional view of a dual station RCS of a cell isolated from a three-cell metal patch array in a scatterer under test using the present invention;
FIG. 6 is a comparison diagram of the total field pattern of the three-unit metal patch array in the scatterer to be measured, the in-array pattern of one unit, and the unit pattern separated from the array in the vertical azimuth plane;
fig. 7 is a comparison graph of the total field pattern of the three-element metal patch array coated with the wave-absorbing material in the scatterer to be measured of the present invention, the in-array pattern of one element, and the element pattern separated from the array in the vertical azimuth plane.
Detailed Description
Embodiments and effects of the present invention are described in further detail below with reference to the accompanying drawings.
Referring to FIG. 2, the scatterer used in this example is three identical metal patch units M, M placed in the XOY plane from the three-dimensional coordinate system XYZ 2 ,M 3 Formed patch array M = [ M = 1 ,M 2 ,M 3 ]Directly above it is a unit amplitude plane wave, M 2 The aperture center of the unit is located at the origin of coordinates of XYZ of a three-dimensional coordinate system, M 1 And M 3 The distance from the aperture center of the unit to the coordinate origin of the three-dimensional coordinate system XYZ is p, and the size of each patch unit is lambda multiplied by lambda, wherein lambda is the wavelength.
Referring to fig. 1, the implementation steps of the invention are as follows:
step 1, scattering field measurement data of a scatterer are obtained and preprocessed to obtain a far field pattern on the whole space
(1a) Sampling scattered field data of the whole scatterer, namely sampling scattered field data of a three-unit metal patch array M, wherein the sampling of the scattered field data needs to be performed by a scanning mode to perform area sampling:
the existing scanning modes include plane scanning, cylindrical scanning and spherical scanningThe existing scanning area has a near field, a quasi far field and a far field, the scanning mode of the embodiment adopts but is not limited to plane scanning, and the sampling area adopts but is not limited to the far field; obtaining the far field directional diagram of the three-unit metal patch array MWherein theta is a pitch angle in a rectangular coordinate system of a measuring space,measuring the azimuth angle in the space rectangular coordinate system;
(1b) Will direct far field patternTranslating to the aperture center of the patch unit to be separated to obtain a translated far-field directional diagram
Wherein, (x, y, z) is the caliber center coordinate of the patch unit to be separated,representing the phase of coordinate translation, j is an imaginary number symbol, and k is a wave number;
(1c) For far field directional diagram obtained after translationCarrying out directional diagram zero filling operation to obtain a far field directional diagram on the whole space
Step 2, aiming far field directional diagram on the whole spaceBased on the spherical wave expansion, obtaining a spherical wave mode expansion coefficient:
(2a) For far field directional diagram in the whole spaceBased on the spherical wave expansion, namely expanding into the superposition of a series of spherical wave mode terms, the expansion expression is as follows:
wherein s represents an emergent wave, a represents an incident wave, m is a mode term mark having a value of 0 to infinity, n is a mode term mark having a value of 1 to infinity,the m-n spherical wave expansion coefficient of the outgoing wave of the transverse electric wave TE,is the m.n term spherical wave expansion coefficient of TE incident wave,is an m-n term spherical wave expansion coefficient of the outgoing wave of the transverse magnetic wave TM,is the m & n spherical wave expansion coefficient of TM incident wave,is a TE emergent wave mode of m-n terms,is a TE incident wave mode of m.n terms,is an m.n term TM emergent wave mode,is m.n term TM incident wave mode;
the front A term and the front B term of a series of spherical wave mode terms in the expansion expression contain complete scattering information of the three-unit metal patch array M;
(2b) Cutting out the aboveThe first A term and the B term in the spherical wave expansion expression are used for obtaining a complete scattering information far field directional diagram capable of containing a to-be-three-unit metal patch array M
Wherein B =2 nextpow2(MN) ,MN=[kR 0 ]+ u, A =2B, u is a self-defined integer, R 0 The radius of the minimum sphere which takes the origin of the measurement coordinate as the center and surrounds the paster unit to be separated; when separating M 1 ,M 3 When the scattered field of the patch unit is present,when separating M 2 When the scattered field of the patch unit is present,
(2c) According to the complete scattering information far-field directional diagram containing the target scatterer to be separatedObtaining a spherical wave expansion coefficient of the TE waveAnd the spherical wave expansion coefficient of TM wave
Wherein i = s or a.
Step 3, filtering high-order mode items of spherical waves to obtain a far field directional diagram of the target to be separated after filtering
(3a) Obtaining the number of truncated modes N of the spherical wave function 0 :
(3a1) Setting an integer v, wherein the integer v depends on the coordinate position relation of the source point and the field point and the required precision;
(3a2) Acquiring the radius of a minimum ball which takes the aperture center of the target to be separated as an origin and surrounds the target to be separated:
(3a3) Calculating the number of truncated modes N of the spherical wave function from the results of (3 a 1) and (3 a 2) 0
N 0 =[kR 1 ]+ v, wherein, [ kR 1 ]Is kR 1 An integer rounded up;
(3b) Selecting a mode Filter (n) to Filter out the spherical wave expansion coefficient of the TE waveAnd the spherical wave expansion coefficient of TM waveHigher order mode coefficient of medium:
existing modeThe Filter has a rectangular window, a cosine square window, a Hanning window, a Hamming window, a Blackman window, etc., and the mode Filter (n) of the present embodiment adopts but is not limited to a rectangular window, i.e., a rectangular window
TE wave mode coefficient representing target to be separated is obtained through rectangular windowAnd TM wave mode coefficient
(3c) Intercepting the spherical wave expansion expression in the step (2 b)Spherical wave mode front 2N in 0 2 Item, obtaining far field directional diagram of the filtered patch unit to be separated
And 4, carrying out visual analysis on the far-field directional diagram of the to-be-separated patch unit obtained after filtering, and determining whether to finally separate the scattered field of the to-be-separated patch unit from the whole scattered field of the three-unit metal patch M.
(4.1) for the Patch Unit to be separated in the three-Unit Metal Patch array MThe scattered field data is sampled, in this example, the first element M in a three-element metal patch array M 1 Sampling the scattered field of the unit to obtain the far field directional diagram of the unit in the arrayAnd the scattered field of the to-be-separated patch unit is used as a reference for judging whether the scattered field is separated from the whole scattered field of the three-unit metal patch array M or not;
(4.2) obtaining the far field directional diagram of the to-be-separated patch unit after filteringWith reference far field patternAnd comparing, namely successfully separating the scattered field of the to-be-separated patch unit from the integral scattered field of the three-unit metal patch array M when the vertical azimuth plane directional diagram curves of the three-unit metal patch array M can be matched.
The technical effects of the invention are further explained by combining simulation experiments as follows:
1. the experimental environment is as follows:
experimental software: FEKO + WinProp2018, MATLAB R2017a,
configuration of an experimental computer: intel (R) Core (TM) i7-8700K CPU 3.70GHZ, windows 10 (Pro)
The experimental conditions are as follows: a plane wave of unit amplitude with a frequency of 2GHZ is irradiated to a three-unit metal patch array M along a Z-axis direction of a three-dimensional coordinate system XYZ.
2. The experimental contents are as follows:
experiment 1, measuring a scattering field of a three-unit metal patch array M by using FEKO + WinProp2018 software to obtain a double-station RCS (radar cross section) directional diagram of the three-unit metal patch array M, as shown in FIG. 3;
experiment 2, the second unit M in the three-unit metal patch array M is processed by FEKO + WinProp2018 software 2 Measuring the scattered field of the unit to obtain M 2 The dual station RCS cross-sectional pattern of the cell, as shown in fig. 4;
experiment 3, using MATLAB R2017a software, the scattered field of the three-unit metal patch array M is expanded and mode-filtered based on spherical waves, and M separated from fig. 3 is obtained 2 The dual station RCS cross-sectional pattern of the cell, as shown in fig. 5;
the far-field patterns in the vertical azimuth plane obtained in experiment 1, experiment 2 and experiment 3 were compared, as shown in fig. 6.
Comparing fig. 4 and 5, the shadow distribution of the two is substantially the same, M in the three-unit metal patch array M in fig. 6 2 Far field directional diagram of unit in vertical azimuth plane and M separated from three-unit metal patch array M 2 The unit is jointed with the far field directional diagram curve on the vertical azimuth surface, the goodness of fit is high, and M is successfully matched 2 The scattered field of the unit is separated from the whole scattered field of the three-unit metal patch array M.
Experiment 4, M in three-unit metal patch array 1 ,M 3 The patch unit is coated with the wave-absorbing material, and the experiment 1, the experiment 2 and the experiment 3 are repeated, and the result is shown in fig. 7.
As can be seen from FIG. 7, M in the three-unit metal patch array coated with the wave-absorbing material 2 Far field directional pattern of unit in vertical azimuth plane and M separated from three-unit metal patch array coated with wave absorbing material 2 The unit is jointed with the far field directional diagram curve on the vertical azimuth surface, the goodness of fit is high, and M is successfully matched 2 The scattered field of the unit is separated from the integral scattered field of the three-unit metal patch array coated with the wave-absorbing material.
Claims (6)
1. A target scattering separation method based on mode filtering is characterized by comprising the following steps:
(1) Sampling scattered field data of the whole scatterer to obtain a far field directional diagram covering scattered field data of a spherical area of a partTo far field directional diagramCoordinate translation operation and directional diagram zero filling operation are carried out to obtain a far field directional diagram on the whole spaceWherein theta is a pitch angle in a rectangular coordinate system of a measuring space,measuring the azimuth angle in the space rectangular coordinate system;
(2) For far field directional diagram in the whole spaceBased on the spherical wave expansion, obtaining a spherical wave mode expansion coefficient:
(2a) For far field directional diagram in the whole spaceBased on spherical wave expansion, the expansion expression is:
wherein s represents an emergent wave, a represents an incident wave, m is a mode term mark having a value of 0 to infinity, n is a mode term mark having a value of 1 to infinity,the m-n spherical wave expansion coefficient of the outgoing wave of the transverse electric wave TE,is the m.n term spherical wave expansion coefficient of TE incident wave,is an m-n term spherical wave expansion coefficient of the outgoing wave of the transverse magnetic wave TM,is the m.n spherical wave expansion coefficient of the TM incident wave,m.n terms of TE emergent wave mode,is a TE incident wave mode of m.n terms,is an m.n term TM emergent wave mode,is an m.n term TM incident wave mode, and j is an imaginary number symbol;
(2b) Cutting out the aboveThe A term and the B term in the spherical wave expansion expression of the method are used for obtaining a complete scattering information far-field directional diagram capable of containing a target scatterer to be separated
Wherein B =2 nextpow2(MN) ,MN=[kR 0 ]+ u, A =2B, u is a self-defined integer, R 0 Is the radius of the smallest sphere which takes the origin of the measurement coordinate as the center and surrounds the object to be separated;
(2c) For the complete scattering information far-field directional diagram containing the target scatterer to be separatedProcessing to obtain spherical wave expansion coefficient of TE waveAnd spherical wave expansion coefficient of TM wave
Wherein i = s or a, k is the wave number;
(3) Filtering out spherical wave high-order mode items to obtain a far field directional diagram of the target to be separated after filtering
(3a) Obtaining the number of truncation modes N of the spherical wave function 0 :N 0 =[kR 1 ]+v,
Wherein, [ kR ] 1 ]Is kR 1 Integer rounded up, R 1 Taking the aperture center of the target to be separated as an origin and the radius of a minimum ball surrounding the target to be separated, wherein v is a self-setting integer;
(3b) Selecting a mode Filter (n) to Filter out the spherical wave expansion coefficient of the TE waveAnd the spherical wave expansion coefficient of TM waveObtaining the TE wave mode coefficient representing the target to be separated from the medium-high order mode coefficientAnd TM wave mode coefficient
(3c) Intercepting the complete scattering information far field directional diagram containing the target scatterer to be separated2N in spherical wave expansion expression 0 2 Term, obtaining far field pattern of the filtered object to be separated
(4) Obtaining far field patterns of objects to be separated in the whole scattererAnd the far field directional diagram of the target to be separated after filteringFar field pattern in array with object to be separatedAnd comparing, namely successfully separating the scattering field of the target to be separated from the scattering field of the whole scatterer when the horizontal section pattern curves or the vertical section pattern curves of the two can be matched.
2. The method of claim 1, wherein the scattered field data of the entire scatterer is sampled in (1) in a scanning manner selected from one of a plane, a cylinder, and a sphere, and the sampled region is selected from one of a near field, a quasi-far field, and a far field.
3. The method of claim 1, wherein (1) the far-field pattern is alignedCoordinate translation operation is carried out by converting far-field directional diagramTranslating to the aperture center of the target to be separated to obtain a translated scattered field directional diagramIs represented as follows:
4. The method of claim 1, wherein the mode Filter (n) in (3 b) is selected from any one of a rectangular window, a cosine square window, a hanning window, a hamming window, and a blackman window.
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