CN112023431B - Gas phase distribution device, gas equivalent distribution device, rectifying column and cluster rectifying tower - Google Patents
Gas phase distribution device, gas equivalent distribution device, rectifying column and cluster rectifying tower Download PDFInfo
- Publication number
- CN112023431B CN112023431B CN202010893373.1A CN202010893373A CN112023431B CN 112023431 B CN112023431 B CN 112023431B CN 202010893373 A CN202010893373 A CN 202010893373A CN 112023431 B CN112023431 B CN 112023431B
- Authority
- CN
- China
- Prior art keywords
- gas
- channel pipe
- distribution device
- porous
- phase distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/14—Fractional distillation or use of a fractionation or rectification column
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/14—Fractional distillation or use of a fractionation or rectification column
- B01D3/32—Other features of fractionating columns ; Constructional details of fractionating columns not provided for in groups B01D3/16 - B01D3/30
Abstract
The invention relates to a gas phase distribution device, a gas equivalent distribution device, a rectifying column and a bundling rectifying tower. Compared with the prior art, the gas phase distribution device has more uniform distribution and smaller device volume, and is suitable for gas distribution of a small-diameter rectification column; when the gas equal-quantity distribution device provided with the gas equal-quantity distribution device is used for gas distribution of a bundled rectifying tower, the gas equal-quantity distribution device has good robustness, stability and uniformity, can provide stable and even gas quantity for a plurality of rectifying columns, provides uniform distribution for each part of gas of each rectifying column and enables the bundled rectifying tower to operate stably.
Description
Technical Field
The invention relates to the field of rectification equipment, in particular to a gas phase distribution device, a gas equivalent distribution device and a bundling rectification tower thereof.
Background
The diameter of a small-scale rectifying tower in a laboratory is usually within 50mm, gas-liquid exchange is sufficient, and the separation efficiency is high. In industrial production, the unit efficiency of the industrial rectifying tower is far inferior to that of a small rectifying tower in a laboratory due to the fact that the diameter of the tower is increased and the amplification effect is prominent. The proposal of the cluster rectification concept is to eliminate the amplification effect, maintain the efficiency of the laboratory rectification tower and improve the productivity to a certain extent. The cluster rectifying tower is a rectifying tower which is arranged in parallel with two or more rectifying columns with the same diameter and the same height on the same tower kettle and is filled with packing with the same height and the same specification. At present, the technology is mainly used for the separation process with high separation difficulty, low yield demand and high product added value.
Based on the concept of bundle rectification, the method has the characteristic that a plurality of small-diameter rectification columns are connected in parallel. Therefore, in order to ensure the stable and efficient operation of each rectifying column in the cluster rectification, the uniform and stable distribution of the ascending gas phase of the tower bottom to each rectifying column is particularly important.
Patent CN106914027B discloses a gas phase distribution device for gas phase distribution of a baffle tower, which comprises a pressure drop adjusting plate, a liquid level automatic control system, a gas lifting pipe tray and a pressure drop adjusting pipe. The method mainly controls the flow of the gas by adjusting the opening of the pressure drop adjusting plate, so that the gas is distributed according to the requirement.
Patent CN103691144B discloses a novel baffle tower gas distribution device. The device detects the gas flow value through the flow detection device and transmits the acquired signal to the controller, and the controller drives the valve plate through the motor according to the flow deviation signal to adjust the gas flow area in the gas inlet channel, so that the gas flow value in the gas channel is changed.
Patent CN205145640U discloses a gas distribution device for a dividing wall rectifying column. The device adjusts the opening area of the partition plate arranged on the air inlet channel through the controller according to the actual flow of the air in the air inlet channel by measuring the actual flow, and finally adjusts the flow of the air.
The technical solutions in the above three patents have a gas distribution feature, but all have a feature of distributing gas into two parts for the design of the separator tower, and cannot be applied to the occasion where more than two parts need to be distributed. Meanwhile, the implementation mode of the device needs the matching of equipment with larger volume, and the diameter of each rectifying column in the bundled rectification is usually within 150mm, so that the device cannot be installed in the bundled rectification device.
Patent CN102441289B discloses a cluster rectification device, which comprises a cluster rectification disc distribution table for ensuring uniform rising of gas flow. However, it is not enough to ensure the stable and efficient operation of each rectification column by only ensuring the uniform rising of the gas flow and not distributing the gas to each rectification column in an equal amount and stably. Also, the specific structure and features of the disk dispensing table are not further described in this patent.
Patent CN104289006B discloses a bundled rectification plant with side-draw reactor, and no gas phase distributor is mentioned in the plant.
Patent CN104857896B discloses a gas distributor for a fixed bed reactor, which uses a main pipe with small holes and branch pipes connected with the main pipe to perform gas distribution.
There is therefore still a need in the art to develop a gas distribution apparatus that allows more uniform distribution and smaller apparatus volumes, while at the same time requiring a gas distribution that is suitable for use in small diameter rectification columns.
Disclosure of Invention
The present invention is directed to overcome the above-mentioned drawbacks of the prior art and to provide a gas phase distributor, a gas equal-quantity distributor, a rectifying column and a cluster rectifying tower, wherein the gas equal-quantity distributor can equally divide the gas into two or more parts and uniformly distribute each part of the gas. The gas equivalent distribution device is used for gas phase distribution of the bundled rectifying tower, has good robustness, stability and uniformity, can provide stable and even gas quantity for a plurality of rectifying columns, provides uniform distribution for gas in each rectifying column, and ensures stable operation of the bundled rectifying tower.
The purpose of the invention can be realized by the following technical scheme:
gas phase distribution device structure
The gas phase distribution device is arranged in the rectification column.
The gas phase distribution device comprises a porous gas lifting channel pipe, a liquid overflow channel pipe, a top plate and a bottom plate, wherein specifically:
the liquid overflow channel pipe axially penetrates through the porous gas lifting channel pipe;
the top plate and the bottom plate are both of annular plate structures, wherein the shapes of the inner side and the outer side of the annular plate are determined by the shapes of the parts connected by the side edges, and the aim is to form a tight sealing connection structure.
The top plate is connected between the outer wall of the top of the liquid overflow channel pipe and the inner wall of the top of the porous gas lifting channel pipe to form an annular closed surface;
the bottom plate is connected between the outer wall of the bottom of the porous gas lifting channel pipe and the inner wall of the rectification column to form an annular closed surface.
Furthermore, the porous gas lifting channel pipe and the liquid overflow channel pipe are both pipe bodies with holes in the upper and lower directions.
Further, the porous gas lifting channel pipe is a sizing pipe or a reducing pipe.
Further, the liquid overflow channel pipe is a sizing pipe or a reducing pipe.
Further, the liquid overflow channel tube has a length greater than that of the porous lift gas channel tube.
Further preferably, the liquid overflow channel tube is coaxial with the porous lift gas channel tube.
Further, the geometric profile of any axial cross-section of the porous lift gas channel tube may comprise a rectangle, trapezoid, arch or semicircle.
Further, the hollow geometric body of the porous lift gas channel pipe comprises a hollow cylinder, a round table, a cuboid or a hemisphere.
Further preferably, the uppermost end of the liquid overflow channel tube is flush with the uppermost end of the porous riser channel tube.
Further preferably, the uppermost end of the liquid overflow channel tube is higher than the uppermost end of the porous lift gas channel tube.
Furthermore, the through holes on the porous gas lifting channel pipe are distributed in a multilayer mode along the axial direction of the porous gas lifting channel pipe.
Further, the number of layers of the through holes is 1-10, preferably 2-9, more preferably 3-8, and most preferably 4-7.
Furthermore, the hydraulic diameter of the through hole is 0.1-5 mm, preferably 0.8-3 mm.
Further, the through holes in each layer are uniformly distributed in a ring shape.
Further, the number of through holes in adjacent layers is the same or different.
Further preferably, the number of through holes of the next layer is the same as or increased from that of the previous layer in the vertically downward direction.
Further preferably, the distance between the through holes of the next layer and the through holes of the previous layer is 1-100 mm, preferably 10-80 mm, more preferably 15-60 mm, preferably 20-50 mm, and most preferably 25-40 mm.
Further preferably, the distance between the through hole of the next layer and the through hole of the previous layer gradually increases.
Further, the hole shape and size of the through holes in each layer are the same.
Further, the hole shape of the through hole comprises a round hole, a square hole and a polygonal hole.
Furthermore, an air guide ring is arranged above the through holes in the first layer to the second layer from bottom to top in the vertical direction. Namely, the gas guide ring is positioned between the next layer of through holes and the previous layer of through holes, and the number of the gas guide ring is one less than the number of the layers of the through holes.
Further, the width of the gas guide ring is 2-30 mm.
Further, the included angle formed between each gas guide ring and the horizontal plane is the same or different, and the value range of the included angle a is 0 to 89 degrees, see fig. 1, preferably 5 to 70 degrees, more preferably 10 to 60 degrees, preferably 15 to 50 degrees, and most preferably 25 to 45 degrees.
Further preferably, the included angle a gradually decreases in a vertically downward direction.
Further, the gas guide ring is a thin sheet, and the inner side of the gas guide ring is connected with the porous gas lifting channel pipe.
Further, the widths of the gas deflector rings may be all the same, partially the same, or completely different.
Further preferably, the sheet is an annular sheet having an equal width.
Furthermore, the liquid guide plate is supported above the liquid overflow channel pipe through an iron wire.
Further, the maximum radial sectional area of the liquid guide vane is not less than the radial sectional area of the upper end of the liquid overflow channel pipe.
Further, the liquid deflector is centered on the axis of the liquid overflow channel tube.
Further, the center of the liquid deflector and the center of the bottom plate are both on the axis of the porous lift gas channel pipe.
Further, the vertically downward projected area of the liquid guiding plate completely comprises the uppermost cross-sectional area of the liquid overflow channel pipe.
Further, have 1~10 outage on the bottom plate, preferably 2~ 5, better be 3 ~ 4. The outage is used for the liquid on the exhaust bottom plate, prevents the hydrops.
More preferably, the hydraulic diameter of the liquid discharge hole is 0.1 to 3mm, preferably 0.5 to 2.5mm, more preferably 0.7 to 2mm, further preferably 0.9 to 1.5mm, and most preferably 1 to 1.2 mm.
Further preferably, the liquid overflow channel pipe is provided with a liquid seal device.
Rectifying column structure
The rectification column is a small-diameter rectification column, the diameter of the rectification column is 15-200 mm, and the gas phase distribution device is arranged in the rectification column, so that the gas is uniformly distributed.
Further, the ratio of the radial sectional area of the porous lift gas channel tube to the radial sectional area of the rectification column is 20% to 60%, preferably 25% to 55%, more preferably 30% to 40%.
Further, the ratio of the radial maximum sectional area of the porous gas-lifting channel tube to the radial sectional area of the rectifying column is 40-90%, preferably 45-80%, more preferably 50-70%.
Further, the ratio of the radial minimum sectional area of the porous lift gas channel pipe to the radial sectional area of the rectification column is 5 to 50%, preferably 10 to 40%, more preferably 15 to 30%.
Further, the maximum outer diameter of the gas phase distribution device is 20-150 mm.
Further, the outer side of the bottom plate is hermetically connected with the inner side of the rectification column.
Gas equivalent distribution device structure
The gas equal-quantity distribution device comprises a supporting plate and a gas phase distribution device arranged on the supporting plate, so that the equal-quantity distribution of the gas in each rectification column is realized. The supporting plate is provided with a connecting hole, and the bottom plate is connected to the supporting plate through the matching of the connecting fixing piece and the connecting hole.
The gas equal distribution device comprises a supporting plate and the gas phase distribution devices on the supporting plate, the number of the gas phase distribution devices is two or more, each gas phase distribution device is the same, the gas phase distribution devices are positioned above the supporting plate, the supporting plate is connected with the inner wall of the rectifying tower cylinder in a sealing manner, and the gas phase distribution devices are arranged on the supporting plate according to a certain rule.
Further, the lower end face of the bottom plate is connected with the upper end face of the supporting plate in a sealing mode.
Further, the supporting plate is provided with a hole with the same shape as the bottom plate, and the outer side of the bottom plate is connected with the inner side of the hole in the supporting plate.
Further, the horizontal height of each gas phase distribution device on the pallet is uniform.
Further, the gas phase distribution devices on the supporting plate are arranged according to central symmetry or axial symmetry.
Further, the gas phase distribution devices on the pallet are arranged in a linear, rectangular or triangular manner.
Furthermore, the supporting plate is provided with 1-20 liquid discharge holes, and the liquid discharging effect is achieved.
Cluster rectifying tower structure
The cluster distillation tower structure comprises the gas equivalent distribution device. When the gas equivalent distribution device is used for gas phase distribution of a bundled rectifying tower, the gas equivalent distribution device has good robustness, stability and uniformity, can provide stable and even gas quantity for a plurality of rectifying columns, and provides uniform distribution for each part of gas of each rectifying column, so that the bundled rectifying tower is stable in operation.
Furthermore, the number of the gas phase distribution devices on the supporting plate is the same as that of the rectifying columns of the cluster rectifying tower, and the gas phase distribution devices correspond to the rectifying columns one to one and have coincident axes.
Further, the gas phase distribution device is positioned at the lower end of the corresponding rectification column.
Further, the gas phase distribution device is partially located inside the corresponding rectification column.
Further, the maximum outer diameter of each gas phase distribution device is smaller than the inner diameter of the corresponding rectification column.
Further, the ratio of the radial maximum sectional area of each gas phase distribution device to the radial sectional area of the corresponding rectifying column is 40 to 90 percent, preferably 45 to 80 percent, and more preferably 50 to 70 percent.
Furthermore, a gap of 5-150 mm, preferably 10-120 mm, more preferably 15-100 mm, preferably 20-70 mm, and most preferably 30-50 mm is left between the lower end of the rectification column and the supporting plate.
Compared with the prior art, the invention has the following technical advantages:
1) the gas phase distribution device has small volume and uniform gas distribution, and is suitable for gas phase distribution of a 15-200 mm small-diameter rectification column;
2) the gas equivalent distribution device can divide the gas into two parts or more than two parts in an equivalent manner;
3) when the gas equal-quantity distribution device is used for gas phase distribution of the bundling rectifying tower, the gas can be equally distributed to each rectifying column, and the gas in each rectifying column can be uniformly distributed.
Drawings
FIG. 1 is a schematic view of a perforated lift tube in one example of the invention;
FIG. 2 is a schematic view of a gas phase distribution apparatus according to an embodiment of the present invention installed in a rectification column;
FIG. 3 is a schematic top view of a gas equal-distribution device for use in an example of gas phase distribution in a cluster distillation column according to the present invention;
fig. 4 is a schematic front view of a section a-a in the illustrative example of fig. 3.
In the figure: 1-a rectification column; 2-a liquid deflector; 3-a porous lift gas channel tube; 4-liquid overflow channel pipe; 5-a bottom plate; 6-gas guide ring; 7-a through hole; 8-rectifying column cylinder; 9-gas phase distribution means; 10-a supporting plate.
Detailed Description
The invention is described in detail below with reference to the figures and specific embodiments.
The gas phase distribution device 9 comprises a porous gas-lifting channel pipe 3, a liquid overflow channel pipe 4, a top plate and a bottom plate 5, wherein the porous gas-lifting channel pipe 3 is arranged inside a rectification column 1; the liquid overflow channel pipe 4 axially penetrates through the porous gas lifting channel pipe 3; the top plate is connected between the outer wall of the top of the liquid overflow channel pipe 4 and the inner wall of the top of the porous gas lifting channel pipe 3 to form an annular closed surface; the bottom plate 5 is connected between the outer wall of the bottom of the porous gas-lifting channel pipe 3 and the inner wall of the rectification column 1 to form an annular closed surface, the porous gas-lifting channel pipe 3 and the liquid overflow channel pipe 4 are both pipes with holes opened up and down, the porous gas-lifting channel pipe 3 is a fixed diameter pipe or a variable diameter pipe, and the liquid overflow channel pipe 4 is an equal diameter pipe.
The rectification column is a small-diameter rectification column, the diameter of the rectification column is 15-200 mm, and the gas phase distribution device 9 is arranged in the rectification column, so that uniform gas distribution is realized.
The gas equal-quantity distribution device comprises a supporting plate 10 and a gas phase distribution device 9 arranged on the supporting plate 10, so that equal-quantity distribution of gas in each rectification column 1 is realized. The gas equal-quantity distribution device comprises a supporting plate 10 and the gas phase distribution devices 9 on the supporting plate 10, wherein the number of the gas phase distribution devices 9 is two or more, each gas phase distribution device 9 is identical, the gas phase distribution devices 9 are positioned above the supporting plate 10, the bottom plate 5 is connected with the supporting plate 10, the supporting plate 10 is hermetically connected with the inner wall of a rectifying tower cylinder 8, and the gas phase distribution devices 9 are arranged on the supporting plate 10 according to a certain rule.
The cluster distillation tower structure comprises the gas equivalent distribution device. When the gas equivalent distribution device is used for gas phase distribution of a bundled rectifying tower, the gas equivalent distribution device has good robustness, stability and uniformity, can provide stable and even gas quantity for a plurality of rectifying columns, and provides uniform distribution for each part of gas of each rectifying column, so that the bundled rectifying tower is stable in operation. The number of the gas phase distribution devices on the supporting plate 10 is the same as that of the rectifying columns 1 of the cluster rectifying tower, the gas phase distribution devices 9 correspond to the rectifying columns 1 one by one, the axes of the gas phase distribution devices are overlapped, the gas phase distribution devices 9 are located at the lower ends of the corresponding rectifying columns 1, part of the gas phase distribution devices are located in the corresponding rectifying columns 1, and the maximum outer diameter of each gas phase distribution device 9 is smaller than the inner diameter of the corresponding rectifying column.
In the cluster rectifying tower structure, at least one horizontal connecting plate is arranged between the rectifying column 1 and the rectifying tower cylinder 8, and the outer side of the rectifying column 1 and the inner side of the rectifying tower cylinder 8 are connected in a sealing manner. There is no direct contact between the gas phase distribution means 9 and the rectification column 1.
The working principle of the gas phase distribution device of the invention is as follows:
the liquid falling from the upper part of the rectification column 1 contacts the liquid guide plate 2 and then flows between the rectification column 1 and the porous gas lifting channel pipe 3, and when the height of the liquid is higher than the uppermost end of the liquid overflow channel pipe 4, the liquid flows out through the liquid overflow channel pipe 4. The gas rises from the lower part of the rectification column 1, flows into the gas phase distribution device from the space between the porous gas-lifting channel pipe 3 and the liquid overflow channel pipe 4, flows out from each small hole on the porous gas-lifting channel pipe 3, is guided by the gas guide ring 6, and then is uniformly distributed and rises into the rectification column 1. The gas phase distribution device 9 of the invention utilizes the principle that the liquid pressure is the same under the same liquid level, and matches the hydraulic diameter of each layer of through holes 7 on the porous gas-lifting channel pipe 3 and the width and the angle of the gas guide ring 6, so that the lifted gas phase is uniformly distributed after passing through the gas phase distribution device 9, and the gas phase distribution has good uniformity.
When the gas equivalent distribution device is used for gas phase distribution of the cluster distillation tower, the working principle is as follows:
the liquid falling from the upper part of each rectification column 1 contacts with a liquid guide plate 2, flows between the rectification column 1 and a porous ascending gas channel pipe 3, flows between the rectification column 1 and a rectification column barrel 8 through a gap between the rectification column 1 and a supporting plate 10, and flows out through a liquid overflow channel pipe 4 when the liquid height is higher than the uppermost end of the liquid overflow channel pipe 4. The gas rises from the lower portion of the trays 10, and since the resistance of each gas phase distribution means 9 is the same, the gas equally enters each gas phase distribution means 9, and each gas entering each gas phase distribution means 9 is uniformly distributed into the rectification column 1 by the porous gas-lifting passage tube 3. When the gas equivalent distribution device is used for gas phase distribution of a bundling rectifying tower, the liquid height in each rectifying column 1 is the same through a gap between the rectifying column 1 and the supporting plate 10 by utilizing the principle of a communicating vessel, so that the gas is ensured to be equally distributed in each rectifying column 1. The pressure drop and the fluctuation of the liquid phase flow in the individual rectifying column 1 in the bundled rectifying tower have little influence on the equivalent distribution of gas phase and good stability. When abnormal phenomena such as flooding and the like occur in a certain rectification column 1, the pressure drop is rapidly increased, the gas equivalent distribution device can automatically reduce the gas phase flow of the rectification column 1, so that the rectification column 1 is promoted to return to normal operation, and after the pressure drop returns, the gas equivalent distribution device can rapidly return to a normal state, so that the gas equivalent distribution device has good robustness.
Example 1
In this example, the gas phase distribution of a rectification column having an inner diameter of 100mm was carried out by using a gas phase distribution apparatus shown in FIG. 2. The porous gas-lifting passage pipe 3 is a diameter-variable circular pipe, the axial section of the diameter-variable circular pipe is trapezoidal, the hollow geometric body is a circular table, the outer diameter of the uppermost end of the porous gas-lifting passage pipe 3 is 40mm, the outer diameter of the lowermost end of the porous gas-lifting passage pipe is 70mm, and the height of the porous gas-lifting passage pipe is 100 mm.
The circumference of the porous gas-lifting channel pipe 3 is provided with 4 layers of through holes 7, and the 1 st layer from top to bottom is provided with 8 round holes with the diameter of 1.5 mm; layer 2 has 12 circular holes with a diameter of 1.8 mm; layers 3 to 4 each had 16 circular holes with a diameter of 2 mm. The distance of each layer of holes in the vertical direction was 20mm, and the vertical distance of the first layer of holes from the uppermost end of the porous lift gas channel tube 3 was 10 mm. The porous gas lifting channel pipe 3 is provided with 3 gas guide rings 6, the widths of the gas guide rings are all 10mm, and the gas guide rings are respectively positioned 1mm above the through holes 7 of the 2 nd to 4 th layers. The angles a of the gas deflector ring 6 from top to bottom are respectively 80 degrees, 60 degrees and 40 degrees.
The liquid overflow passage pipe 4 is a circular pipe with an equal diameter, an outer diameter of 20mm, a height of 150mm, an uppermost end of the pipe being flush with an uppermost end of the porous gas-lifting passage pipe 3, and a U-shaped pipe liquid seal (not shown in the figure) being provided at a lower end thereof. The bottom plate 5 is a circular ring with the outer diameter of 100mm and the inner diameter of 70mm, and is hermetically connected with the outer side of the lower end of the porous gas lifting pipeline 3 and the inner wall of the rectification column 1. The bottom plate 5 is provided with 2 centrally symmetrical liquid discharge holes which are round holes with the diameter of 1.5 mm. The liquid flow deflector 2 is a conical surface-shaped sheet, the generatrix of the conical surface of the liquid flow deflector is 12mm long, and the height of the liquid flow deflector in the vertical direction is 3 mm. The liquid flow deflector 2 is supported above the liquid overflow channel pipe 4 through an iron wire, and the vertical distance between the lowest end of the liquid flow deflector 2 and the uppermost end of the liquid overflow channel pipe 4 is 20 mm. The outer side of the upper end of the liquid overflow channel pipe 4 is closely connected with the inner side of the upper end of the porous gas lifting channel pipe 3.
The axes of the liquid overflow channel pipe 4, the porous gas-lifting channel pipe 3 and the rectifying column 1 are coincided, and the center of the liquid flow deflector 2 and the center of the bottom plate 5 are on the axis of the porous gas-lifting channel pipe 3.
Example 2
As shown in FIGS. 3 to 4, a gas equal-quantity distribution device is used for gas phase distribution of the cluster distillation tower. The inner diameter of the barrel 8 of the bundled rectifying tower is 309mm, wherein the inner diameter of the barrel is 40mm, and the barrels are arranged in a triangle manner and are centrosymmetrically as shown in figure 3, and the total number of the rectifying columns 1 is 24.
The outer diameter of a supporting plate 10 of the gas equivalent distribution device is 309mm, and the supporting plate is connected with the inner wall of the rectifying tower cylinder 8 in a sealing manner. The pallet 10 has 41 identical gas phase distribution devices 9, and each gas phase distribution device 9 corresponds to each rectification column 1 one by one and has the axis coincident with the axis. The supporting plate 10 is provided with 2 centrally symmetrical liquid discharge holes which are round holes with the diameter of 2mm and are respectively positioned at two points b in the figure, and the points b are positioned on the same diameter of the cylinder body 8. The lower end face of the bottom plate 5 is connected with the upper end face of the supporting plate 10 in a sealing mode. The gap between the lower end of the rectification column 1 and the supporting plate 10 is 20 mm.
The gas distribution device 9 on the gas equivalent distribution device has a gas lifting channel 11 which is a circular tube with equal diameter, the shaft section is rectangular, the hollow geometric body is a cylinder, the outer diameter of the gas lifting channel 11 is 25mm, and the height is 50 mm. The circumference of the air lifting channel 11 is provided with 3 layers of through holes 7, and the 1 st layer from top to bottom is provided with 6 round holes with the diameter of 1.5 mm; the 2 nd layer has 6 round holes with the diameter of 2 mm; layer 3 has 12 circular holes with a diameter of 2.2 mm. The distance of each layer of holes in the vertical direction is 10mm, and the vertical distance between the first layer of holes and the uppermost end of the lifting channel 11 is 10 mm. The porous gas-lifting channel pipe 3 is provided with 2 gas guide rings 6 which are respectively positioned 1mm above the through holes 7 of the 2 nd layer and the through holes 7 of the 3 rd layer. The widths of the gas guide ring 6 from top to bottom are respectively 2mm and 3.5 mm; the angle a is 70 degrees and 30 degrees respectively.
The liquid overflow channel pipe 4 is an equal-diameter circular pipe, the outer diameter is 10mm, the height is 80mm, the uppermost end of the liquid overflow channel pipe is flush with the uppermost end of the porous gas lifting channel pipe 3, and the lower end of the liquid overflow channel pipe is provided with a U-shaped pipe liquid seal. The bottom plate 5 is a circular ring with the outer diameter of 40mm and the inner diameter of 25mm, and is hermetically connected with the outer side of the lower end of the porous gas lifting pipeline 3 and the inner wall of the rectification column 1. The liquid flow deflector 2 is a conical surface-shaped sheet, the generatrix of the conical surface is 6mm long, and the vertical direction is 1mm high. The liquid flow deflector 2 is supported above the liquid overflow channel pipe 4 through an iron wire, and the vertical distance between the lowest end of the liquid flow deflector 2 and the uppermost end of the liquid overflow channel pipe 4 is 10 mm. The outer side of the upper end of the liquid overflow channel pipe 4 is closely connected with the inner side of the upper end of the porous gas lifting channel pipe 3.
The axes of the liquid overflow channel pipe 4 and the porous gas lifting channel pipe 3 in each gas phase distribution device 9 are coincident with the axis of the corresponding rectification column 1, and the centers of the liquid flow deflector 2 and the bottom plate 5 are on the axis of the porous gas lifting channel pipe 3.
And (4) judging the condition of equal distribution of the gas by using a gas velocity measuring device. Water is injected into the gas equal distribution device, the water level is just raised to the uppermost end of the liquid overflow channel pipe 4, 185L/h of air is introduced into the lower part of the supporting plate 10, the gas velocities are respectively measured at the upper ports of 41 rectifying columns 1 of the bundling rectifying tower, and the statistical results of the gas velocities are listed in Table 1. As can be seen from Table 1, the standard deviation was only 0.046, with a very poor deviation of 0.13m/s, indicating that the gas velocities were uniformly distributed equally in each rectification column 1.
TABLE 1 measurement of gas velocity at the upper end of the rectification column
| Item | Parameter(s) | Item | Parameter(s) |
| Mean gas velocity | 1.01m/s | Maximum gas velocity | 1.08m/s |
| Standard deviation of | 0.046 | Minimum gas velocity | 0.95m/s |
The embodiments described above are described to facilitate an understanding and use of the invention by those skilled in the art. It will be readily apparent to those skilled in the art that various modifications to these embodiments may be made, and the generic principles described herein may be applied to other embodiments without the use of the inventive faculty. Therefore, the present invention is not limited to the above embodiments, and those skilled in the art should make improvements and modifications within the scope of the present invention based on the disclosure of the present invention.
Claims (8)
1. A gas phase distribution apparatus, comprising:
a porous lift gas passage tube (3);
the liquid overflow channel pipe (4) penetrates through the porous gas lifting channel pipe (3) along the axial direction;
the top plate is connected between the outer wall of the top of the liquid overflow channel pipe (4) and the inner wall of the top of the porous gas lifting channel pipe (3) to form an annular closed surface;
the bottom plate (5) is of an annular plate structure, and the bottom plate (5) is connected between the outer wall of the bottom of the porous gas-lifting channel pipe (3) and the inner wall of the rectification column (1) to form an annular closed surface;
the liquid flow deflector (2) is arranged above the porous gas lifting channel pipe (3);
the through holes (7) on the porous gas lifting channel pipe (3) are distributed in a multilayer manner along the axial direction of the porous gas lifting channel pipe (3);
the through holes (7) in each layer are uniformly distributed in a ring shape;
the distance between adjacent layers is 1-100 mm;
the number of the through holes (7) in the adjacent layers is the same or different;
and a gas guide ring (6) is arranged above the through hole (7) in the first layer to the second layer from bottom to top in the vertical direction.
2. The gas phase distribution device according to claim 1, wherein the gas deflector rings (6) form the same or different included angles with the horizontal plane, and the included angle a has a value ranging from 0 to 89 degrees.
3. A gas phase distribution apparatus according to claim 1, wherein the gas deflector ring (6) is a thin sheet whose inner side is connected to the porous lift gas passage tube (3);
the width of the gas guide ring (6) is 2-30 mm.
4. A gas phase distribution apparatus according to claim 1, wherein the porous lift gas passage tube (3) is a sizing tube or a reducing tube;
the liquid overflow channel pipe (4) is a sizing pipe or a reducing pipe;
the length of the liquid overflow channel pipe (4) is greater than that of the porous gas lifting channel pipe (3);
the liquid overflow channel pipe (4) and the porous gas lifting channel pipe (3) are coaxial.
5. A gas phase distribution apparatus according to claim 1, wherein the liquid guide vanes (2) have a radially largest cross-sectional area which is not smaller than the radially cross-sectional area of the upper end of the liquid overflow channel pipe (4);
the liquid flow deflector (2) is supported above the liquid overflow channel pipe (4) through iron wires.
6. A rectification column having a diameter of 15 to 200mm, wherein the gas phase distribution apparatus according to any one of claims 1 to 5 is provided in the rectification column.
7. An equal gas distribution device, characterized in that the equal gas distribution device comprises a supporting plate (10) and a gas phase distribution device according to any one of claims 1-5 arranged on the supporting plate (10), thereby realizing equal distribution of gas in each rectification column (1);
a gap of 5-150 mm is reserved between the lower end of the rectification column (1) and the supporting plate (10).
8. A cluster column, characterized in that it comprises the gas equal distribution device of claim 7.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010893373.1A CN112023431B (en) | 2020-08-31 | 2020-08-31 | Gas phase distribution device, gas equivalent distribution device, rectifying column and cluster rectifying tower |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010893373.1A CN112023431B (en) | 2020-08-31 | 2020-08-31 | Gas phase distribution device, gas equivalent distribution device, rectifying column and cluster rectifying tower |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112023431A CN112023431A (en) | 2020-12-04 |
| CN112023431B true CN112023431B (en) | 2022-06-07 |
Family
ID=73586348
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010893373.1A Active CN112023431B (en) | 2020-08-31 | 2020-08-31 | Gas phase distribution device, gas equivalent distribution device, rectifying column and cluster rectifying tower |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112023431B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112774236B (en) * | 2020-12-10 | 2022-02-18 | 大连理工大学 | Shell-and-tube active gas phase distributor |
| CN113105303B (en) * | 2021-03-27 | 2022-11-25 | 上海化工研究院有限公司 | Refining method of hexafluorobutadiene |
| CN115477288B (en) * | 2022-10-17 | 2024-02-27 | 无锡零一未来新材料技术研究院有限公司 | Phosphoric acid water removal method and preparation method of tris (trimethylsilane) phosphate |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100421756C (en) * | 2006-08-15 | 2008-10-01 | 褚雅安 | Gas-liquid allotter with supporting and mass transfer function |
| CN202921011U (en) * | 2012-10-31 | 2013-05-08 | 重庆恒远晋通科技有限公司 | Distribution device for secondary distribution of gas phase and rectifying tower |
| CN104645655B (en) * | 2015-02-17 | 2018-03-09 | 天津奥展兴达化工技术有限公司 | The gas distribution structure and its control method of iris type rectifying column |
| CN108043061B (en) * | 2017-12-25 | 2021-03-09 | 万华化学集团股份有限公司 | Catalytic distillation column plate capable of replacing catalyst on line |
-
2020
- 2020-08-31 CN CN202010893373.1A patent/CN112023431B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN112023431A (en) | 2020-12-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN112023431B (en) | Gas phase distribution device, gas equivalent distribution device, rectifying column and cluster rectifying tower | |
| CN100361723C (en) | Pyramidal laying liquid typed high performance mass transfer tray with central downcast pipe | |
| CN104226208A (en) | Gas distributor for multiphase flow reactor and multiphase flow reactor | |
| CN101291725B (en) | Distribution device for a gas-liquid phase mixture for apparatus | |
| CN101480595B (en) | Slurry bubble column reactor with needle type fin column tube bundle | |
| CN105582857A (en) | Gas-liquid-solid three-phase reactor and application method thereof | |
| CN103071433A (en) | Gas pre-distributor of fixed-bed reactor for preparing maleic anhydride through n-butane oxidation | |
| CN103108692A (en) | Apparatus and process for distributing vapor and liquid phases | |
| CN103007830B (en) | Gas distributor | |
| CN103212345B (en) | Gas-liquid distributor having hanging structure | |
| CN108097178B (en) | Tooth weir type impact reduction and flow equalization disc | |
| CN102309864B (en) | Distillation tower feeding distributor | |
| KR102501564B1 (en) | Novel concept for collection and distribution channels for a simulated moving bed separation process using n-columns in series | |
| CN101417220B (en) | Method and device for improving flow character of gas liquid bubble column with row tubes | |
| TWI664021B (en) | Underflow equalizing plate and reactor | |
| CN109985571B (en) | Hydrogenation reactor with subtract towards subassembly | |
| CN203737216U (en) | Uplink gas-liquid distributor applicable to gas-liquid-solid three-phase reactor | |
| CN112295253B (en) | Capillary liquid phase distributor and rectifying column | |
| CN109985575B (en) | Hydrogenation reactor with impact reduction assembly | |
| CN103028350B (en) | Fixed bed reactor and method for preparing maleic anhydride by virtue of normal butane oxidation | |
| CN217311999U (en) | Liquid phase distribution device of rectifying tower | |
| CN102039103A (en) | Gas-solid phase feed distributor | |
| CN103084122B (en) | Radial reactor | |
| CN108043061B (en) | Catalytic distillation column plate capable of replacing catalyst on line | |
| CN107551961B (en) | High-temperature high-pressure slurry bed reaction device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |