CN112014451A - Electrochemical-based self-cleaning method for online water quality sensor - Google Patents
Electrochemical-based self-cleaning method for online water quality sensor Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 49
- 238000002484 cyclic voltammetry Methods 0.000 claims abstract description 40
- 239000003792 electrolyte Substances 0.000 claims abstract description 10
- 239000007772 electrode material Substances 0.000 claims description 27
- 229910021332 silicide Inorganic materials 0.000 claims description 23
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 20
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- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 10
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- 229910021607 Silver chloride Inorganic materials 0.000 claims description 7
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 239000004332 silver Substances 0.000 claims description 7
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims description 7
- ZXEYZECDXFPJRJ-UHFFFAOYSA-N $l^{3}-silane;platinum Chemical compound [SiH3].[Pt] ZXEYZECDXFPJRJ-UHFFFAOYSA-N 0.000 claims description 6
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 claims description 6
- 229910021334 nickel silicide Inorganic materials 0.000 claims description 6
- 229910021339 platinum silicide Inorganic materials 0.000 claims description 6
- 229910021341 titanium silicide Inorganic materials 0.000 claims description 6
- WQJQOUPTWCFRMM-UHFFFAOYSA-N tungsten disilicide Chemical compound [Si]#[W]#[Si] WQJQOUPTWCFRMM-UHFFFAOYSA-N 0.000 claims description 5
- 229910021342 tungsten silicide Inorganic materials 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/28—Electrolytic cell components
- G01N27/30—Electrodes, e.g. test electrodes; Half-cells
- G01N27/38—Cleaning of electrodes
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Abstract
The invention provides a self-cleaning method of an electrochemical-based online water quality sensor, which comprises the following steps: the working electrode, the auxiliary electrode and the reference electrode of the on-line water quality sensor are adopted, the water quality system where the on-line water quality sensor is located is used as electrolyte, and the working electrode of the on-line water quality sensor is self-cleaned through a cyclic voltammetry method. The invention adopts cyclic voltammetry to realize a self-cleaning mode combining physical cleaning and chemical cleaning for impurities such as organic matter attachments, inorganic oxides and the like, and other auxiliary devices such as additional cleaning equipment and the like are not needed to be configured in the whole cleaning process, so that the cleaning cost is effectively reduced, the daily maintenance for the cleaning equipment is avoided, and the cleaning effect is superior to that of other cleaning modes.
Description
Technical Field
The invention belongs to the technical field of self-cleaning of online water quality sensors, relates to a self-cleaning method of an online water quality sensor, and particularly relates to a self-cleaning method of an online water quality sensor based on electrochemistry.
Background
Because the online water quality sensor needs to work in a complex water body for a long time, the online water quality sensor is inevitably influenced by pollution of organic matters or inorganic impurities in the water body, and the measurement accuracy of the water quality sensor is further influenced.
The problems of transportation lag and sample deterioration in offline water quality analysis are solved by the online water quality monitoring sensor; however, they place a higher demand on efficient probe cleaning mechanisms to maintain reliable measurements. At present, mechanical cleaning, chemical cleaning, ultrasonic cleaning and the like can be adopted for the pollution on the surface of the on-line water quality sensor.
The existing water quality sensor structurally comprises a water quality sensor main body, a cable and an electrode surface, wherein a sensor electrode is arranged near the electrode surface, water quality information detected by the sensor electrode is processed by a signal processing device in the water quality sensor, and then the detected water quality information is transmitted to the outside of the water quality sensor through the sensor cable.
As is known, a water quality sensor in water quality monitoring is immersed in measured water for a long time, so that a plurality of microorganisms and calcified substances thereof are attached to the surface of an electrode of the water quality sensor or are arranged between the electrodes of the water quality sensor, and the originally detected water quality information is changed, so that the error of the water quality information detected by the water quality sensor is increased. In the past, the method is to regularly replace and manually clean the probe with the electrode of the water quality sensor, but although the problem that the detection precision of the water quality sensor is poor due to long-term work in water can be solved to a certain extent, frequent manual maintenance is finally not left, the full automation of water quality detection is difficult to realize, and the maintenance cost is higher. In addition, frequent disassembly and cleaning of the water quality sensor can also have certain influence on the service life of the water quality sensor.
CN103878131B discloses a water quality sensor stirring cleaner, which comprises a stainless steel bracket formed by fixedly connecting three stainless steel round bars with a first hoop and a second hoop; a water quality sensor is fixed on the top of the stainless steel bracket through a first hoop, the upper end of the water quality sensor is connected with a power supply through a cable, and a water quality sensor electrode is exposed at the lower end of the water quality sensor; the bottom of the stainless steel bracket is fixed with an electromagnetic valve through a second hoop, the electromagnetic valve is connected with a time relay through an electric wire, a mechanical swing head is installed at the moving head part of the electromagnetic valve, a replaceable soft hair brush is installed on the mechanical swing head, and the soft hair brush head of the soft hair brush is located below the water quality sensor electrode and properly contacts the water quality sensor electrode.
CN101520425 discloses a water quality sensor, which is provided with a water quality sensor main body and a primary connecting piece of an ultrasonic generator. The ultrasonic generator is arranged outside the electrode surface of the water quality sensor and comprises a shell, an ultrasonic vibrator, a matching circuit, an ultrasonic emitter and a cable, wherein the shell of the ultrasonic generator is fixedly connected with the water quality sensor main body through a connecting piece and is positioned on the lower side or the oblique lower side of the surface of the electrode of the water quality sensor main body. And cleaning the surface of the sensor electrode by using ultrasonic waves emitted by an ultrasonic generator.
CN207695232U discloses a water quality sensor is from cleaning device, including under casing and detection case, under casing inside is equipped with supersonic generator and the ultrasonic transducer who connects, still be equipped with the motor in the under casing, the under casing top is equipped with the detection case, the detection case side surface is equipped with the mesh, the detection case lower extreme is equipped with the screw, the motor output shaft is connected with the screw, the screw top is equipped with water quality sensor, water quality sensor top rigid coupling is on the fixed plate of detection case upper surface, water quality sensor, motor, supersonic generator and ultrasonic transducer all are connected with PLC.
However, the current response recovery condition of the existing self-cleaning water quality sensor is not expected, and corresponding cleaning equipment needs to be additionally arranged, so that the running cost and the maintenance cost of the equipment are increased invisibly.
Disclosure of Invention
Aiming at the defects in the prior art, the invention aims to provide a platform door control system and a platform door control method, which adopt a cyclic voltammetry method to realize a self-cleaning mode combining physical cleaning and chemical cleaning for impurities such as organic matter attachments, inorganic oxides and the like, and the whole cleaning process does not need to be provided with additional cleaning equipment and other auxiliary devices, thereby not only effectively reducing the cleaning cost, but also avoiding the daily maintenance of the cleaning equipment, and having a cleaning effect superior to other cleaning modes.
In order to achieve the purpose, the invention adopts the following technical scheme:
the invention provides a self-cleaning method of an electrochemical-based online water quality sensor, which comprises the following steps:
the working electrode, the auxiliary electrode and the reference electrode of the on-line water quality sensor are adopted, a water quality system where the on-line water quality sensor is located is used as electrolyte, and pollutants attached to the surface of the working electrode of the on-line water quality sensor are self-cleaned through a cyclic voltammetry method.
The invention adopts cyclic voltammetry to realize a self-cleaning mode combining physical cleaning and chemical cleaning for impurities such as organic matter attachments, inorganic oxides and the like, on one hand, bubbles generated in the electrochemical process are utilized, and rapidly expand and annihilate in the electrochemical deep-going process, so that water particles are instantaneously violently collided for tens of thousands of times to generate strong impact energy, pollutants attached to the surface of a working electrode are rapidly separated under the strong cavitation action, and thus the purpose of deep cleaning is achieved, and the pollutants attached to the surface of the working electrode are physically cleaned; on the other hand, the organic matter or inorganic oxide impurities are chemically cleaned by utilizing the oxidation-reduction effect of the electrochemical reaction, so that the electrochemical degradation of the organic matter and the reduction removal of the inorganic oxide are realized. In addition, the working electrode, the auxiliary electrode and the reference electrode of the on-line water quality sensor are used as a three-electrode system of the cyclic voltammetry, and additional cleaning equipment and other auxiliary devices are not needed in the whole cleaning process, so that the cleaning cost is effectively reduced, the daily maintenance of the cleaning equipment is avoided, and the cleaning effect is superior to that of other cleaning modes.
It should be noted that the cleaning object of the self-cleaning method provided by the present invention is a water quality sensor, and is particularly suitable for a residual chlorine sensor, but the present invention is not limited to a residual chlorine sensor, and the main invention of the present invention is to utilize three electrodes carried by a water quality sensor to perform online self-cleaning on a working electrode of the water quality sensor by using cyclic voltammetry, so it can be understood that the present invention is not particularly required and limited as long as the water quality sensor is ensured to carry three electrodes. Illustratively, the invention provides an alternative water quality sensor, and aims at providing a self-cleaning treatment for a residual chlorine sensor based on an electrochemical principle disclosed in CN 110231379A.
As a preferred technical solution of the present invention, the electrode material adopted by the working electrode includes metal silicide;
preferably, the metal in the metal silicide electrode material adopted by the working electrode is selected from transition metals;
preferably, the metal in the metal silicide electrode material used for the working electrode is selected from one or a combination of at least two of platinum, nickel, titanium, cobalt, palladium or tungsten;
preferably, the electrode material used for the working electrode is selected from one or more of platinum silicide, nickel silicide, titanium silicide, cobalt silicide, palladium silicide or tungsten silicide.
As a preferred technical solution of the present invention, the electrode material adopted by the auxiliary electrode includes metal silicide;
preferably, the metal in the metal silicide electrode material used for the auxiliary electrode is selected from transition metals;
preferably, the metal in the metal silicide electrode material used for the auxiliary electrode is selected from one or a combination of at least two of platinum, nickel, titanium, cobalt, palladium or tungsten;
preferably, the auxiliary electrode is made of an electrode material selected from one or more of platinum silicide, nickel silicide, titanium silicide, cobalt silicide, palladium silicide, and tungsten silicide.
As a preferred technical solution of the present invention, the reference electrode is a silver/silver chloride electrode.
It should be further noted that the main invention of the present invention is to use the three electrodes of the water quality sensor to construct a three-electrode system for implementing cyclic voltammetry, and the materials of the motor used for the three electrodes are not specifically required or limited, and the three electrodes of the water quality sensor are based on, in other words, the three electrodes of the water quality sensor are the three electrodes used in cyclic voltammetry, but not other additional electrodes.
In a preferred embodiment of the present invention, the sweep rate of the cyclic voltammetry is 10 to 100mV/s, and may be, for example, 10mV/s, 20mV/s, 30mV/s, 40mV/s, 50mV/s, 60mV/s, 70mV/s, 80mV/s, 90mV/s, or 100mV/s, but is not limited to the values listed, and other values not listed within the range of values are also applicable.
In a preferred embodiment of the present invention, the lower limit of the sweep potential of the cyclic voltammetry is in the range of-0.8 to-0.2V, and may be, for example, -0.8V, -0.7V, -0.6V, -0.5V, -0.4V, -0.3V or-0.2V, but is not limited to the values listed, and other values not listed in the range of values are also applicable.
In a preferred embodiment of the present invention, the upper limit range of the sweep potential of the cyclic voltammetry is from +0.8 to +1.3V, and may be, for example, +0.8V, +0.9V, +1.0V, +1.1V, +1.2V or +1.3V, but is not limited to the values listed, and other values not listed in the range of the values are also applicable.
In a preferred embodiment of the present invention, the period from the lower limit of the scanning potential to the upper limit of the scanning potential to the lower limit of the scanning potential after retracing to the lower limit of the scanning potential is defined as one cycle period, and 10 to 100 cycle periods are applied to the working electrode, the auxiliary electrode, and the reference electrode, and the number of cycle periods may be, for example, 10, 20, 30, 40, 50, 60, 70, 80, 90, and 100, but the number is not limited to the above-mentioned values, and other values not listed in the above-mentioned value range are also applicable.
It should be noted that, the operation parameters set in the cyclic voltammetry, including the scanning speed, the lower limit range of the scanning potential, the upper limit range of the scanning potential, the cycle period, etc., are related to the electrode material used, and those skilled in the art need to determine appropriate operation parameters according to different electrode materials.
As a preferable technical scheme of the invention, the water quality system of the on-line water quality sensor comprises one or a combination of at least two of industrial water, domestic water, seawater, swimming pool water or natural water.
As a preferred technical solution of the present invention, the self-cleaning method comprises the steps of:
the working electrode, the auxiliary electrode and the reference electrode of the online water quality sensor are adopted, a water quality system where the online water quality sensor is located is used as electrolyte, the working electrode of the online water quality sensor is cleaned through a cyclic voltammetry, the scanning speed of the cyclic voltammetry is 10-100 mV/s, the lower limit range of a scanning potential is-0.8-0.2V, the upper limit range of the scanning potential is + 0.8-1.3V, the scanning potential is retraced from the lower limit of the scanning potential to the upper limit of the scanning potential to the lower limit of the scanning potential to be a cycle period, and 10-100 cycle periods are applied to the working electrode, the auxiliary electrode and the reference electrode.
The system refers to an equipment system, or a production equipment.
Compared with the prior art, the invention has the beneficial effects that:
(1) the cleaning object of the self-cleaning method provided by the invention is a water quality sensor, and is particularly suitable for a water quality sensor for detecting residual chlorine in a water body, the self-cleaning method is provided with three electrodes required by cyclic voltammetry, the self-cleaning method utilizes a self-provided three-electrode system, and the cyclic voltammetry is adopted to realize online periodic cleaning of impurities such as organic matter attachments, inorganic oxides and the like, no additional auxiliary devices such as cleaning equipment and the like are required to be arranged in the whole cleaning process, so that the cleaning cost is effectively reduced, the daily maintenance of the cleaning equipment is avoided, and the cleaning effect is superior to other cleaning modes,
(2) the invention adopts cyclic voltammetry to realize a self-cleaning mode combining physical cleaning and chemical cleaning for impurities such as organic matter attachments, inorganic oxides and the like, on one hand, bubbles generated in the electrochemical process are utilized, and rapidly expand and annihilate in the electrochemical deep-going process, so that water particles are instantaneously violently collided for tens of thousands of times to generate strong impact energy, pollutants attached to the surface of a working electrode are rapidly separated under the strong cavitation action, and thus the purpose of deep cleaning is achieved, and the pollutants attached to the surface of the working electrode are physically cleaned; on the other hand, the organic matter or inorganic oxide impurities are chemically cleaned by utilizing the oxidation-reduction effect of the electrochemical reaction, so that the electrochemical degradation of the organic matter and the reduction removal of the inorganic oxide are realized.
Drawings
FIG. 1 is a graph showing a comparison of current responses for different cleaning modes provided by the present invention;
wherein, the non-contamination sensor shown in the legend in FIG. 1 is a brand-new residual chlorine sensor; the contamination sensor is a residual chlorine sensor after long-term operation, and cyclic voltammetric cleaning is the residual chlorine sensor after electrochemical cleaning adopted in example 4; the mechanical cleaning is the residual chlorine sensor after mechanical cleaning adopted in comparative example 1; the ultrasonic cleaning was the residual chlorine sensor after the ultrasonic cleaning in comparative example 2.
Detailed Description
The technical scheme of the invention is further explained by the specific implementation mode in combination with the attached drawings.
Example 1
The invention utilizes a working electrode, an auxiliary electrode and a reference electrode which are carried by a residual chlorine sensor (a water quality sensor for detecting residual chlorine in water) disclosed in CN110231379A to construct a three-electrode system, wherein the working electrode carried by the residual chlorine sensor is made of an electrode material selected from nickel silicide, the auxiliary electrode is made of titanium silicide, and the reference electrode is a silver/silver chloride electrode.
By constructing a three-electrode system, self-cleaning is carried out on pollutants attached to the surface of a working electrode by adopting cyclic voltammetry, and the self-cleaning method specifically comprises the following steps:
the industrial production water system where the residual chlorine sensor is located is used as electrolyte, a constant voltage is applied to two ends of a working electrode and a reference electrode, the working electrode of the residual chlorine sensor is cleaned through cyclic voltammetry, the scanning speed of the cyclic voltammetry is 10mV/s, the lower limit range interval of a scanning potential is-0.6V, the upper limit range interval of the scanning potential is +1.3V, the scanning potential is retraced from the lower limit of the scanning potential to the upper limit of the scanning potential to the lower limit of the scanning potential and is recorded as a cycle period, and 100 cycle periods are applied to the working electrode, an auxiliary electrode and the reference electrode. The method is characterized in that organic pollutants (mainly comprising chloramine, cyanuric acid, urea, human body secretion and the like) and inorganic pollutants (mainly comprising platinum oxide, calcium magnesium salt and the like) attached to the surface of an electrode are subjected to physical cleaning and electrochemical cleaning through electrochemical action.
After the circulation is finished, current responses of a brand-new residual chlorine sensor and the electrochemically cleaned residual chlorine sensor under the condition that the residual chlorine concentrations are 0ppm, 0.1ppm, 0.2ppm and 0.45ppm respectively are detected, current response recovery rates under different residual chlorine concentrations are calculated, an average value is taken, and after calculation, the average recovery rate of the current responses after the electrochemical cleaning is adopted reaches 99.2%.
Example 2
The invention utilizes a working electrode, an auxiliary electrode and a reference electrode which are carried by a residual chlorine sensor (a water quality sensor for detecting residual chlorine in water) disclosed in CN110231379A to construct a three-electrode system, wherein the working electrode carried by the residual chlorine sensor adopts cobalt silicide as an electrode material, the auxiliary electrode adopts palladium silicide as an electrode material, and the reference electrode is a silver/silver chloride electrode.
By constructing a three-electrode system, self-cleaning is carried out on pollutants attached to the surface of a working electrode by adopting cyclic voltammetry, and the self-cleaning method specifically comprises the following steps:
a domestic water system where a residual chlorine sensor is located is used as electrolyte, a constant voltage is applied to two ends of a working electrode and a reference electrode, the working electrode of the residual chlorine sensor is cleaned through cyclic voltammetry, the scanning speed of the cyclic voltammetry is 30mV/s, the lower limit range interval of scanning potential is-0.4V, the upper limit range interval of the scanning potential is +1V, the scanning potential is recorded as a cycle period from the lower limit of the scanning potential to the upper limit of the scanning potential and then retraced to the lower limit of the scanning potential, and 70 cycle periods are applied to the working electrode, an auxiliary electrode and the reference electrode. The method is characterized in that organic pollutants (mainly comprising chloramine, cyanuric acid, urea, human body secretion and the like) and inorganic pollutants (mainly comprising platinum oxide, calcium magnesium salt and the like) attached to the surface of an electrode are subjected to physical cleaning and electrochemical cleaning through electrochemical action.
After the circulation is finished, current responses of a brand-new residual chlorine sensor and the electrochemically cleaned residual chlorine sensor under the condition that the residual chlorine concentrations are 0ppm, 0.1ppm, 0.2ppm and 0.45ppm respectively are detected, current response recovery rates under different residual chlorine concentrations are calculated, an average value is taken, and after calculation, the average recovery rate of the current responses after the electrochemical cleaning is adopted reaches 99.3%.
Example 3
The invention utilizes a working electrode, an auxiliary electrode and a reference electrode which are carried by a residual chlorine sensor (a water quality sensor for detecting residual chlorine in water) disclosed in CN110231379A to construct a three-electrode system, wherein the working electrode carried by the residual chlorine sensor adopts tungsten silicide as an electrode material, the auxiliary electrode adopts nickel silicide as an electrode material, and the reference electrode is a silver/silver chloride electrode.
By constructing a three-electrode system, self-cleaning is carried out on pollutants attached to the surface of a working electrode by adopting cyclic voltammetry, and the self-cleaning method specifically comprises the following steps:
the method comprises the steps of taking a seawater system where a residual chlorine sensor is located as electrolyte, applying a constant voltage to two ends of a working electrode and a reference electrode, cleaning the working electrode of the residual chlorine sensor through cyclic voltammetry, wherein the scanning speed of the cyclic voltammetry is 50mV/s, the lower limit range interval of a scanning potential is-0.5V, the upper limit range interval of the scanning potential is +1.5V, the scanning potential is retraced from the lower limit of the scanning potential to the upper limit of the scanning potential to the lower limit of the scanning potential and is recorded as a cycle period, and applying 50 cycle periods to the working electrode, an auxiliary electrode and the reference electrode. The method is characterized in that organic pollutants (mainly comprising chloramine, cyanuric acid, urea, human body secretion and the like) and inorganic pollutants (mainly comprising platinum oxide, calcium magnesium salt and the like) attached to the surface of an electrode are subjected to physical cleaning and electrochemical cleaning through electrochemical action.
Mechanical cleaning equipment is regularly adopted to mechanically clean the working electrode, after cleaning is finished, the current response recovery condition of the residual chlorine sensor is detected, the detection result is shown in figure 1, as shown in figure 1, the current response of the residual chlorine sensor cleaned by the cyclic voltammetry is basically recovered to the current response level which can be reached by a brand new residual chlorine sensor, and the condition that the surface of the working electrode of the residual chlorine sensor cleaned by electrochemistry is cleaned is ideal and is basically recovered to a brand new state.
After the circulation is finished, current responses of a brand-new residual chlorine sensor and the electrochemically cleaned residual chlorine sensor under the condition that the residual chlorine concentrations are 0ppm, 0.1ppm, 0.2ppm and 0.45ppm respectively are detected, current response recovery rates under different residual chlorine concentrations are calculated, an average value is taken, and after calculation, the average recovery rate of the current responses after the electrochemical cleaning is adopted reaches 99.5%.
Example 4
The invention utilizes a working electrode, an auxiliary electrode and a reference electrode which are carried by a residual chlorine sensor (a water quality sensor for detecting residual chlorine in water) disclosed in CN110231379A to construct a three-electrode system, wherein the working electrode carried by the residual chlorine sensor adopts platinum silicide as an electrode material, the auxiliary electrode adopts platinum silicide as an electrode material, and the reference electrode is a silver/silver chloride electrode.
By constructing a three-electrode system, self-cleaning is carried out on pollutants attached to the surface of a working electrode by adopting cyclic voltammetry, and the self-cleaning method specifically comprises the following steps:
the method comprises the steps of taking a swimming pool water system where a residual chlorine sensor is located as electrolyte, applying a constant voltage to two ends of a working electrode and a reference electrode, cleaning the working electrode of the residual chlorine sensor through cyclic voltammetry, wherein the scanning speed of the cyclic voltammetry is 100mV/s, the lower limit range interval of a scanning potential is-0.8V, the upper limit range interval of the scanning potential is +1.25V, the scanning potential is retraced from the lower limit of the scanning potential to the upper limit of the scanning potential to the lower limit of the scanning potential and is recorded as a cycle period, and applying 30 cycle periods to the working electrode, an auxiliary electrode and the reference electrode. The method is characterized in that organic pollutants (mainly comprising chloramine, cyanuric acid, urea, human body secretion and the like) and inorganic pollutants (mainly comprising platinum oxide, calcium magnesium salt and the like) attached to the surface of an electrode are subjected to physical cleaning and electrochemical cleaning through electrochemical action.
After the circulation is finished, current responses of a brand-new residual chlorine sensor and the electrochemically cleaned residual chlorine sensor under the condition that the residual chlorine concentrations are 0ppm, 0.1ppm, 0.2ppm and 0.45ppm respectively are detected, current response recovery rates under different residual chlorine concentrations are calculated, an average value is taken, and after calculation, the average recovery rate of the current responses after the electrochemical cleaning is adopted reaches 99.6%.
Example 5
The invention utilizes a working electrode, an auxiliary electrode and a reference electrode which are carried by a residual chlorine sensor (a water quality sensor for detecting residual chlorine in water) disclosed in CN110231379A to construct a three-electrode system, wherein the working electrode carried by the residual chlorine sensor adopts titanium silicide as an electrode material, the auxiliary electrode adopts cobalt silicide as an electrode material, and the reference electrode is a silver/silver chloride electrode.
By constructing a three-electrode system, self-cleaning is carried out on pollutants attached to the surface of a working electrode by adopting cyclic voltammetry, and the self-cleaning method specifically comprises the following steps:
a natural water system where a residual chlorine sensor is located is used as electrolyte, a constant voltage is applied to two ends of a working electrode and a reference electrode, the working electrode of the residual chlorine sensor is cleaned through cyclic voltammetry, the scanning speed of the cyclic voltammetry is 80mV/s, the lower limit range interval of a scanning potential is-0.2V, the upper limit range interval of the scanning potential is +0.8V, the scanning potential is recorded as a cycle period from the lower limit of the scanning potential to the upper limit of the scanning potential and then retraced back to the lower limit of the scanning potential, and 10 cycle periods are applied to the working electrode, an auxiliary electrode and the reference electrode. The method is characterized in that organic pollutants (mainly comprising chloramine, cyanuric acid, urea, human body secretion and the like) and inorganic pollutants (mainly comprising platinum oxide, calcium magnesium salt and the like) attached to the surface of an electrode are subjected to physical cleaning and electrochemical cleaning through electrochemical action.
After the circulation is finished, current responses of a brand-new residual chlorine sensor and the electrochemically cleaned residual chlorine sensor under the condition that the residual chlorine concentrations are 0ppm, 0.1ppm, 0.2ppm and 0.45ppm respectively are detected, current response recovery rates under different residual chlorine concentrations are calculated, an average value is taken, and after calculation, the average recovery rate of the current responses after the electrochemical cleaning is adopted reaches 99.3%.
Comparative example 1
This comparative example provides a install mechanical cleaning equipment's water quality sensor, includes: the mechanical oscillating head is additionally arranged on the basis of the residual chlorine sensor adopted in the embodiment 4, the mechanical oscillating head is arranged on one side of the working electrode, the mechanical oscillating head is fixedly provided with the soft brush head, and the soft brush head moves along with the sector of the mechanical oscillating head to perform horizontal sweeping type mechanical cleaning on organic pollutants (mainly comprising chloramine, cyanuric acid, urea, human body secretion and the like) and inorganic pollutants (mainly comprising platinum oxide, calcium magnesium salt and the like) attached to the surface of the working electrode.
Mechanical cleaning equipment is regularly adopted to mechanically clean the working electrode, after cleaning is finished, the current response recovery condition of the residual chlorine sensor is detected, the relation between the residual chlorine concentration and the current response is shown in figure 1, the current responses of the brand-new residual chlorine sensor and the residual chlorine sensor after mechanical cleaning are respectively detected when the residual chlorine concentration is 0ppm, 0.1ppm, 0.2ppm and 0.45ppm, the current response recovery rates under different residual chlorine concentrations are calculated, an average value is obtained, and after calculation, the average recovery rate of the current response after mechanical cleaning is 46.5%.
As can be seen from fig. 1, the current response of the residual chlorine sensor after mechanical cleaning gradually increased as the residual chlorine concentration increased. The current response of the residual chlorine sensor after mechanical cleaning was higher than that of the residual chlorine sensor before cleaning at the same residual chlorine concentration, indicating that mechanical cleaning does contribute to the recovery of the residual chlorine sensor to some extent. However, the current response after mechanical cleaning is still significantly lower than that after electrochemical cleaning adopted in embodiment 3 of the present invention, which indicates that although single mechanical cleaning has a certain cleaning effect, thorough cleaning cannot be achieved for contaminants with strong adhesion; the invention realizes a self-cleaning mode combining physical cleaning and chemical cleaning, on one hand, the impact force formed by the rupture of bubbles generated by electrochemical reaction is utilized to physically clean the pollutants attached to the surface of the working electrode, and compared with the original mechanical cleaning mode adopted in the comparative example 1, the cleaning depth of the physical cleaning mode realized by the invention is obviously more efficient, because the invention utilizes the bubbles generated in the electrochemical process, the bubbles rapidly expand and annihilate in the electrochemical deep-going process, so that water particles are instantaneously subjected to tens of thousands of times of violent collisions to generate strong impact energy, and the pollutants attached to the surface of the working electrode are quickly separated under the strong cavitation action, thereby achieving the purpose of deep cleaning; meanwhile, on the other hand, the organic matter or inorganic oxide impurities are chemically cleaned by utilizing the redox effect of the electrochemical reaction, so that the organic matter or inorganic oxide on the surface of the electrode is effectively degraded and removed, which cannot be realized by mechanical cleaning.
In addition, because the mechanical cleaning equipment is additionally arranged, the mechanical cleaning equipment needs to be cleaned, overhauled or replaced at regular intervals, and the cleaning period and the operation cost are increased invisibly.
Comparative example 2
This comparative example provides a water quality sensor who installs ultrasonic cleaning equipment, includes: an ultrasonic generator is additionally arranged on the basis of the residual chlorine sensor disclosed in the embodiment 4, and ultrasonic waves emitted by the ultrasonic generator are utilized to carry out ultrasonic cleaning on organic pollutants (mainly comprising chloramine, cyanuric acid, urea, human body secretion and the like) and inorganic pollutants (mainly comprising platinum oxide, calcium magnesium salt and the like) attached to the surface of a working electrode of the residual chlorine sensor.
The surface of the working electrode is periodically cleaned by ultrasonic cleaning equipment, after cleaning is finished, the current response recovery condition of the residual chlorine sensor is detected, the relation between the residual chlorine concentration and the current response is shown in figure 1, the current responses of the brand-new residual chlorine sensor and the ultrasonically cleaned residual chlorine sensor under the conditions that the residual chlorine concentrations are 0ppm, 0.1ppm, 0.2ppm and 0.45ppm respectively are detected, the current response recovery rates under different residual chlorine concentrations are calculated, an average value is obtained, and after calculation, the average recovery rate of the current response after ultrasonic cleaning is 87.6%.
As can be seen from fig. 1, the current response of the residual chlorine sensor after ultrasonic cleaning gradually increased as the residual chlorine concentration increased. Under the same residual chlorine concentration, the current response of the residual chlorine sensor after ultrasonic cleaning is higher than that of the residual chlorine sensor before cleaning, and is closer to the current response trend of a brand new residual chlorine sensor, which shows that the ultrasonic cleaning is favorable for recovering the residual chlorine sensor to a great extent. The current response after ultrasonic cleaning was still slightly lower than that after electrochemical cleaning in example 3 of the present invention. This shows that, although the cleaning effect of the single ultrasonic cleaning is remarkable, the cleaning cannot be completely realized for the organic matter attachments with strong adhesive force; the invention realizes a self-cleaning mode combining physical cleaning and chemical cleaning, on one hand, the impact force formed by breaking the bubbles separated out by electrochemical reaction is utilized to physically clean the pollutants attached to the surface of the working electrode, which is similar to the cleaning principle of ultrasonic cleaning; on the other hand, the organic matter or inorganic oxide on the surface of the electrode is effectively removed by chemically cleaning the organic matter or inorganic oxide impurities by using the redox effect of the electrochemical reaction, which cannot be achieved by ultrasonic cleaning. In addition, because the ultrasonic generator is additionally arranged, the ultrasonic generator needs to be cleaned, overhauled or replaced regularly, and the cleaning period and the operation cost are increased invisibly.
The applicant declares that the above description is only a specific embodiment of the present invention, but the scope of the present invention is not limited thereto, and it should be understood by those skilled in the art that any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are within the scope and disclosure of the present invention.
Claims (10)
1. A self-cleaning method of an electrochemical-based online water quality sensor is characterized by comprising the following steps:
the working electrode, the auxiliary electrode and the reference electrode of the on-line water quality sensor are adopted, a water quality system where the on-line water quality sensor is located is used as electrolyte, and pollutants attached to the surface of the working electrode of the on-line water quality sensor are self-cleaned through a cyclic voltammetry method.
2. The self-cleaning method of claim 1, wherein the working electrode is formed from an electrode material comprising a metal silicide;
preferably, the metal in the metal silicide electrode material adopted by the working electrode is selected from transition metals;
preferably, the metal in the metal silicide electrode material used for the working electrode is selected from one or a combination of at least two of platinum, nickel, titanium, cobalt, palladium or tungsten;
preferably, the electrode material used for the working electrode is selected from one or more of platinum silicide, nickel silicide, titanium silicide, cobalt silicide, palladium silicide or tungsten silicide.
3. A self-cleaning method according to claim 1 or 2, wherein the auxiliary electrode is made of an electrode material comprising a metal silicide;
preferably, the metal in the metal silicide electrode material used for the auxiliary electrode is selected from transition metals;
preferably, the metal in the metal silicide electrode material used for the auxiliary electrode is selected from one or a combination of at least two of platinum, nickel, titanium, cobalt, palladium or tungsten;
preferably, the auxiliary electrode is made of an electrode material selected from one or more of platinum silicide, nickel silicide, titanium silicide, cobalt silicide, palladium silicide, and tungsten silicide.
4. A method according to any of claims 1 to 3, wherein the reference electrode is a silver/silver chloride electrode.
5. The self-cleaning method according to any one of claims 1 to 4, wherein the sweep rate of cyclic voltammetry is 10 to 100 mV/s.
6. A method according to any one of claims 1 to 5, wherein the lower range of the sweep potential of cyclic voltammetry is from-0.8 to-0.2V.
7. A method according to any one of claims 1 to 6, wherein the cyclic voltammetry is carried out at an upper sweep potential range of +0.8 to + 1.3V.
8. The self-cleaning method according to any one of claims 1 to 7, wherein the sweep potential is swept from the lower limit of the sweep potential to the upper limit of the sweep potential and back to the lower limit of the sweep potential is counted as one cycle period, and 10 to 100 cycle periods are applied to the working electrode, the auxiliary electrode and the reference electrode.
9. The self-cleaning method of any one of claims 1-8, wherein the online water quality sensor is located in a water quality system comprising one or a combination of at least two of industrial process water, domestic water, seawater, swimming pool water, or natural water.
10. A self-cleaning method according to any of claims 1-9, comprising the steps of:
the working electrode, the auxiliary electrode and the reference electrode of the online water quality sensor are adopted, a water quality system where the online water quality sensor is located is used as electrolyte, the working electrode of the online water quality sensor is cleaned through a cyclic voltammetry, the scanning speed of the cyclic voltammetry is 10-100 mV/s, the lower limit range of a scanning potential is-0.8-0.2V, the upper limit range of the scanning potential is + 0.8-1.3V, the scanning potential is retraced from the lower limit of the scanning potential to the upper limit of the scanning potential to the lower limit of the scanning potential to be a cycle period, and 10-100 cycle periods are applied to the working electrode, the auxiliary electrode and the reference electrode.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113686941A (en) * | 2021-08-10 | 2021-11-23 | 朱浩奇 | Chemical sensor |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008126184A (en) * | 2006-11-24 | 2008-06-05 | Pentel Corp | Electrode for preventing adhesion of organism |
| WO2009083482A1 (en) * | 2007-12-27 | 2009-07-09 | Adamant Technologie Sa | Method for detecting changes in water quality |
| CN203941128U (en) * | 2014-05-29 | 2014-11-12 | 施世英 | The device of contents of residual chlorine in a kind of on-line measurement tap water |
| CN106486682A (en) * | 2016-09-27 | 2017-03-08 | 上海交通大学 | Spherical nuclei shelly PdxNi1‑x@Pt/C catalyst and its preparation |
| CN107014876A (en) * | 2017-03-21 | 2017-08-04 | 浙江大学 | A kind of yellow rice wine region discrimination method based on metal nanometer composite material modified electrode array |
| CN109518219A (en) * | 2018-12-24 | 2019-03-26 | 江苏大学 | A kind of preparation method and applications of graphene-based nickel cobalt bimetallic oxygen-separating catalyst |
| CN110231379A (en) * | 2019-06-12 | 2019-09-13 | 成都万众壹芯生物科技有限公司 | A kind of residual chlorine sensor and application thereof based on electrochemical principle |
| US20200026138A1 (en) * | 2017-12-07 | 2020-01-23 | Faraday Technology, Inc. | Electrochemical mirror system and method |
-
2020
- 2020-08-26 CN CN202010870577.3A patent/CN112014451A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008126184A (en) * | 2006-11-24 | 2008-06-05 | Pentel Corp | Electrode for preventing adhesion of organism |
| WO2009083482A1 (en) * | 2007-12-27 | 2009-07-09 | Adamant Technologie Sa | Method for detecting changes in water quality |
| CN203941128U (en) * | 2014-05-29 | 2014-11-12 | 施世英 | The device of contents of residual chlorine in a kind of on-line measurement tap water |
| CN106486682A (en) * | 2016-09-27 | 2017-03-08 | 上海交通大学 | Spherical nuclei shelly PdxNi1‑x@Pt/C catalyst and its preparation |
| CN107014876A (en) * | 2017-03-21 | 2017-08-04 | 浙江大学 | A kind of yellow rice wine region discrimination method based on metal nanometer composite material modified electrode array |
| US20200026138A1 (en) * | 2017-12-07 | 2020-01-23 | Faraday Technology, Inc. | Electrochemical mirror system and method |
| CN109518219A (en) * | 2018-12-24 | 2019-03-26 | 江苏大学 | A kind of preparation method and applications of graphene-based nickel cobalt bimetallic oxygen-separating catalyst |
| CN110231379A (en) * | 2019-06-12 | 2019-09-13 | 成都万众壹芯生物科技有限公司 | A kind of residual chlorine sensor and application thereof based on electrochemical principle |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113686941A (en) * | 2021-08-10 | 2021-11-23 | 朱浩奇 | Chemical sensor |
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