CN112013233A

CN112013233A - Control method and device for pod with multi-layer frame and electronic equipment

Info

Publication number: CN112013233A
Application number: CN202010785152.2A
Authority: CN
Inventors: 吴奇文; 赵勇; 汪洋
Original assignee: Guangzhou Keii Electro Optics Technology Co ltd
Current assignee: Guangzhou Keii Electro Optics Technology Co ltd
Priority date: 2020-08-06
Filing date: 2020-08-06
Publication date: 2020-12-01
Anticipated expiration: 2040-08-06
Also published as: CN112013233B

Abstract

The embodiment of the application relates to the technical field of equipment control, and discloses a control method and device for a pod with a multi-layer frame and electronic equipment, wherein the pod at least comprises the following components: the method comprises the following steps that an inner orientation frame, an outer orientation frame, an inner pitching frame and an outer pitching frame are used, the outer orientation frame and the outer pitching frame are used for adjusting the attitude of a pod, and the inner orientation frame and the inner pitching frame are used for setting imaging equipment, and the method comprises the following steps: controlling the rotation of the inner azimuth frame and the inner pitching frame according to the received control instruction; in the process of controlling the rotation of the inner azimuth frame and the inner pitching frame, measuring a first angle difference between the inner azimuth frame and the outer azimuth frame and measuring a second angle difference between the inner pitching frame and the outer pitching frame; and adjusting the outer orientation frame to be aligned with the inner orientation frame according to the first angle difference, and adjusting the outer pitching frame to be aligned with the inner pitching frame according to the second angle difference. By implementing the embodiment of the application, the influence of the rotation of the nacelle on the imaging quality of the imaging equipment can be reduced.

Description

Control method and device for pod with multi-layer frame and electronic equipment

Technical Field

The invention relates to the technical field of equipment control, in particular to a control method and device for a pod with a multi-layer frame and electronic equipment.

Background

A pod having a multi-story frame is generally constituted by an inner azimuth frame, an outer azimuth frame, to which azimuth axes are connected, and an inner pitch frame and an outer pitch frame, to which pitch axes are connected, and is used as a carrier of most imaging apparatuses because of having a large rotation range and accurate rotation accuracy.

In practice, it is found that when a pod with a multi-layer frame is controlled to perform attitude rotation, the pod outer frame (i.e. the outer azimuth frame and the outer pitch frame) is generally directly controlled to rotate to realize the attitude rotation of the whole pod, but due to the geometric constraint effect among the multi-layer frames, the rotation of the pod outer frame will disturb the pod inner frame (i.e. the inner azimuth frame and the inner pitch frame), so that the imaging quality of the imaging device arranged on the pod inner frame is affected.

Disclosure of Invention

The embodiment of the application discloses a control method and device of a pod with a multi-layer frame and electronic equipment, which can reduce the influence of rotation of the pod on the imaging quality of imaging equipment.

A first aspect of embodiments of the present application discloses a method for controlling a pod having a multi-deck frame, the pod comprising at least: an inner azimuth frame, an outer azimuth frame, an inner pitch frame, and an outer pitch frame, the outer azimuth frame and the outer pitch frame being used to adjust a posture of the pod, the inner azimuth frame and the inner pitch frame being used to set an imaging apparatus, the method comprising:

controlling the inner azimuth frame and the inner pitching frame to rotate according to the received control instruction;

measuring a first angle difference between the inner orientation frame and the outer orientation frame and a second angle difference between the inner pitch frame and the outer pitch frame in a process of controlling the inner orientation frame and the inner pitch frame to rotate;

adjusting the outer orientation frame to align with the inner orientation frame according to the first angular difference, and adjusting the outer pitch frame to align with the inner pitch frame according to the second angular difference.

As an optional implementation manner, in the first aspect of this embodiment of the present application, the method further includes:

and if the pod is detected to be unstable due to disturbance of external factors, executing the steps of measuring a first angle difference between the inner azimuth frame and the outer azimuth frame and measuring a second angle difference between the inner pitch frame and the outer pitch frame.

As an alternative implementation, in the first aspect of the embodiment of the present application, the inner azimuth frame and the inner pitch frame are provided with imaging devices, and before the step of measuring a first angle difference between the inner azimuth frame and the outer azimuth frame and measuring a second angle difference between the inner pitch frame and the outer pitch frame is performed if it is detected that the nacelle is unstable due to disturbance from an external factor, the method further includes:

acquiring a plurality of frames of framing pictures continuously acquired by the imaging equipment;

judging whether the multi-frame framing pictures are completely overlapped;

and if the multi-frame view frames are not completely overlapped, determining that the pod is unstable due to disturbance of external factors.

As an alternative implementation, in the first aspect of the embodiment of the present application, before the step of measuring a first angle difference between the inner azimuth frame and the outer azimuth frame and measuring a second angle difference between the inner pitch frame and the outer pitch frame is performed if it is detected that the nacelle is unstable due to disturbance by an external factor, the method further includes:

detecting whether the outer azimuth frame is aligned with the inner azimuth frame or not through a limiting device built in the nacelle and detecting whether the outer pitching frame is aligned with the inner pitching frame or not through a limiting device built in the nacelle;

and if the outer azimuth frame is not aligned with the inner azimuth frame and/or the outer pitch frame is not aligned with the inner pitch frame, determining that the nacelle is disturbed by external factors to cause instability.

As an optional implementation manner, in the first aspect of the embodiments of the present application, the adjusting the outer azimuth frame to be aligned with the inner azimuth frame according to the first angle difference, and adjusting the outer pitch frame to be aligned with the inner pitch frame according to the second angle difference includes:

determining a first target rotation angle of the outer orientation frame according to the first angle difference and a first rotation offset of the outer orientation frame, and controlling the outer orientation frame to rotate the first target rotation angle to align with the inner orientation frame, wherein the first rotation offset is a difference value between an ideal rotation angle and an actual rotation angle of the outer orientation frame;

and determining a second target rotation angle of the outer pitching frame according to the second angle difference and a second rotation offset of the outer pitching frame, controlling the outer pitching frame to rotate by the second target rotation angle so as to align with the inner pitching frame, wherein the second rotation offset is a difference value between an ideal rotation angle and an actual rotation angle of the outer pitching frame.

As an optional implementation manner, in the first aspect of the embodiment of the present application, before the determining, according to the first angle difference and the first rotation offset amount of the outer frame, a first target rotation angle of the outer frame, the method further includes:

according to the first rotation times accumulated by the outer orientation frame, determining a first rotation offset corresponding to the first rotation times in a matching relation recorded by a preset offset adjustment table;

determining a second rotation offset corresponding to the second rotation frequency in the matching relation recorded by the preset offset adjusting table according to the second rotation frequency accumulated by the outer pitching frame;

the offset adjustment table records the matching relationship between the number of rotations and the amount of rotational offset, and comprises a plurality of numbers of rotations and the amount of rotational offset corresponding to each number of rotations.

As an optional implementation manner, in the first aspect of the embodiments of the present application, the controlling, by the imaging device, the rotation of the inner orientation frame and the rotation of the inner tilt frame according to the received control instruction includes:

extracting target coordinates corresponding to a target focusing position included in the received control instruction;

determining a pitch angle required to be rotated by the inner pitch frame and an azimuth angle required to be rotated by the inner azimuth frame according to an initial coordinate corresponding to an initial position at which a focus of the imaging device is currently focused and the target coordinate;

controlling the inner pitch frame to rotate the pitch angle, and controlling the inner azimuth frame to rotate the azimuth angle.

A second aspect of embodiments of the present application discloses a control device for a pod having a multi-story frame, the pod comprising at least: the nacelle attitude control device comprises an inner azimuth frame, an outer azimuth frame, an inner pitching frame and an outer pitching frame, wherein the outer azimuth frame and the outer pitching frame are used for adjusting the attitude of the nacelle, the inner azimuth frame and the inner pitching frame are used for setting imaging equipment, and the control device comprises:

the control unit is used for controlling the rotation of the inner azimuth frame and the inner pitching frame according to the received control instruction;

a measuring unit, configured to measure a first angle difference between the inner orientation frame and the outer orientation frame and a second angle difference between the inner pitch frame and the outer pitch frame in a process of controlling rotation of the inner orientation frame and the inner pitch frame;

and the first adjusting unit is used for adjusting the outer azimuth frame to be aligned with the inner azimuth frame according to the first angle difference and adjusting the outer pitching frame to be aligned with the inner pitching frame according to the second angle difference.

A third aspect of the embodiments of the present application discloses an electronic device, including:

a memory storing executable program code;

a processor coupled with the memory;

the processor calls the executable program codes stored in the memory to execute the control method of the nacelle with the multi-layer frame disclosed by the first aspect of the embodiment of the application.

A fourth aspect of embodiments of the present application discloses a computer-readable storage medium storing a computer program, wherein the computer program causes a computer to execute a control method of a pod with a multi-deck frame disclosed in the first aspect of embodiments of the present application.

A fifth aspect of embodiments of the present application discloses a computer program product, which, when run on a computer, causes the computer to perform part or all of the steps of any one of the methods of the first aspect of embodiments of the present application.

A sixth aspect of the present embodiment discloses an application publishing platform, where the application publishing platform is configured to publish a computer program product, where the computer program product, when running on a computer, causes the computer to perform part or all of the steps of any one of the methods in the first aspect of the present embodiment.

Compared with the prior art, the embodiment of the application has the following beneficial effects:

in the embodiment of the application, unlike the traditional control method that when the nacelle is controlled to rotate in attitude, the nacelle outer frame (i.e. the outer azimuth frame and the outer pitch frame) is directly controlled to rotate to realize the attitude rotation of the whole nacelle, the control method disclosed in the embodiment of the application can control the nacelle inner frame (i.e. the inner azimuth frame and the inner pitch frame) to rotate according to the control command, and in the process of controlling the nacelle inner frame to rotate, adjusting the nacelle outer frame according to the angle difference between the nacelle inner frame and the nacelle outer frame so that the nacelle outer frame is aligned with the nacelle inner frame, thereby avoiding the situation that the rotation of the nacelle outer frame causes disturbance to the nacelle inner frame under the condition that the geometric constraint action among the nacelle frames is avoided on the premise that the whole nacelle rotates in the posture, thereby reducing the influence of the rotation of the pod on the imaging quality of the imaging apparatus inside the pod, and also improving the rotation accuracy of controlling the rotation of the pod.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to these drawings without creative efforts.

FIG. 1 is a schematic structural diagram of a two-axis four-frame pod as disclosed in embodiments of the present application;

FIG. 2 is a schematic flow chart of a method of controlling a nacelle having a layer frame as disclosed in an embodiment of the present application;

FIG. 3 is a schematic flow chart of another method for controlling a nacelle having a layer frame as disclosed in an embodiment of the present application;

fig. 3a to 3h are schematic diagrams illustrating changes in positions of a horizontal central axis and a vertical central axis in a finder screen of an imaging apparatus according to an embodiment of the present disclosure;

FIG. 4 is a schematic flow chart of yet another method of controlling a nacelle having a layer frame as disclosed in an embodiment of the present application;

FIG. 5 is a schematic structural diagram of a control device of a nacelle having a multi-story frame as disclosed in an embodiment of the present application;

FIG. 6 is a schematic structural diagram of another control device of a nacelle with a multi-story frame, disclosed in an embodiment of the present application;

fig. 7 is a schematic structural diagram of an electronic device disclosed in an embodiment of the present application.

Detailed Description

The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

It should be noted that the terms "first", "second", "third" and "fourth" etc. in the description and claims of the present invention are used for distinguishing different objects, and are not used for describing a specific order. The terms "comprises," "comprising," and "having," and any variations thereof, of the embodiments of the present application, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.

The embodiment of the application discloses a control method and a control device of a pod with a multi-layer frame, which can reduce the influence of the rotation of the pod on the imaging quality of an imaging device.

The technical solution of the present invention will be described in detail with reference to specific examples.

To more clearly illustrate a method for controlling a pod with a layer frame disclosed in an embodiment of the present application, a two-axis four-frame pod suitable for the method is first introduced, as shown in fig. 1, the two-axis four-frame pod may at least include: an azimuth axis 101, an inner azimuth frame 102, an outer azimuth frame 103, a pitch axis 104, an inner pitch frame 105, and an outer pitch frame 106; the inner orientation frame 102 and the outer orientation frame 103 are connected to an orientation axis 101, respectively, and the inner pitch frame 105 and the outer pitch frame 106 are connected to a pitch axis 104, respectively.

Alternatively, the inner azimuth frame 102 or the inner pitch frame 105 may be provided with an imaging device 107.

Referring to fig. 2, fig. 2 is a schematic flow chart of a control method for a pod with a layer frame, which can be applied to the control device disclosed in the embodiment of the present application, to correspondingly control the pod with the layer frame, and the pod with the layer frame at least includes: the nacelle comprises an inner orientation frame, an outer orientation frame, an inner pitching frame and an outer pitching frame, wherein the outer orientation frame and the outer pitching frame are used for adjusting the attitude of the nacelle, and the inner orientation frame and the inner pitching frame are used for arranging imaging equipment. The following description will be made by taking a control device as an execution body, and the control method of the pod with the multi-story frame may include the following steps:

202. and controlling the rotation of the inner azimuth frame and the inner pitching frame according to the received control instruction.

In this embodiment of the application, the control instruction may be input by a user, may also be sent by other electronic devices or a server, and may also be generated by the control device according to a control requirement, which is not limited herein.

As an alternative embodiment, the control device may control the inner orientation frame and the inner pitch frame to rotate according to a control command input by a user.

Specifically, the control device may be provided with a control interface, a user may input a control instruction on the control interface, and when the control device receives the control instruction input by the user, the control device may control the azimuth frame and the inner pitch frame to rotate according to the control instruction;

as another alternative, the control device may control the rotation of the inner orientation frame and the inner tilt frame according to a control instruction issued by other electronic devices or a server.

Specifically, the control device may further establish a communication connection relationship with other electronic devices or servers, and the other electronic devices or servers may issue a control instruction to the control device through the communication connection relationship, so that the control device may control the rotation of the inner orientation frame and the inner pitching frame according to the received control instruction;

as still another alternative, the control device may generate a control command according to the control requirement, and control the inner orientation frame and the inner pitch frame to rotate according to the generated control command.

Specifically, the control device can determine attitude information (such as rotating to the left upper side, rotating to the right side or rotating to the right lower side) of the nacelle required to rotate according to a target focusing position to be focused by the imaging equipment and a current focusing initial position of a focus of the imaging equipment, and further the control device can determine a pitching angle required to rotate by the inner pitching frame and an azimuth angle required to rotate by the inner azimuth frame according to the attitude information required to rotate by the nacelle; and generating a control instruction according to the pitching angle of the inner pitching frame required to rotate and the azimuth angle of the inner azimuth frame required to rotate.

By implementing the embodiments, the control device can execute corresponding control work according to the control commands sent by different sending units, and can also automatically generate the control commands based on the control requirements, so that the using scenes of the nacelle are wider.

In the embodiment of the application, the control device can only control the inner azimuth frame to rotate according to the received control instruction; or only the inner pitching frame can be controlled to rotate according to the received control instruction; the inner azimuth frame and the inner pitching frame can be controlled to rotate simultaneously according to the received control instruction; or the inner azimuth frame and the inner pitch frame are controlled to rotate according to a preset sequence (for example, the inner azimuth frame is controlled to rotate first and then the inner pitch frame is controlled to rotate) or a preset interval sequence (for example, the inner azimuth frame is controlled to rotate first, then the inner pitch frame is controlled to rotate and then the inner azimuth frame is controlled to rotate, etc.), which is not limited herein.

Optionally, when the received control instruction only indicates that the pod is subjected to azimuth rotation, the control device may control the inner azimuth frame to perform azimuth rotation and prohibit the inner pitch frame from rotating according to the azimuth rotation requirement indicated by the received control instruction (optionally, the control device may drive the limiting device to fix the inner pitch frame, or disconnect a control signal between the control device and the inner pitch frame to prohibit the inner pitch frame from rotating).

Optionally, when the received control instruction only indicates to perform pitching rotation on the pod, the control device may control the inner pitching frame to perform pitching rotation according to the pitching rotation requirement indicated by the received control instruction, and prohibit the inner orientation frame from rotating (similarly, the control device may drive the limiting device to fix the orientation tilt frame, or prohibit the inner orientation frame from rotating by disconnecting a control signal between the control device and the inner orientation frame, or the like).

Optionally, the control device may control the inner azimuth frame and the inner pitch frame to rotate simultaneously according to the received control instruction.

Optionally, the control device may further control the inner orientation frame and the inner pitch frame to rotate according to the sequence or interval sequence indicated by the received control instruction.

By implementing the method, the control device can control the rotation of the inner azimuth frame and the inner pitching frame according to the control object and the control method indicated by the control instruction so as to realize the transformation of various postures of the nacelle, thereby improving the flexibility of the posture transformation of the nacelle.

As an optional implementation manner, the control device may simulate a process in which the inner azimuth frame and the inner pitch frame are to be rotated according to the environmental information fed back by the sensor and the received control instruction, so as to determine whether the control instruction is reasonable; if the position is reasonable, the rotation of the inner azimuth frame and the inner pitching frame is controlled according to the received control instruction; if the control instruction is not reasonable, the rotation of the inner direction frame and the inner pitching frame is prohibited to be controlled, and prompt information is output and used for prompting a user or a formulation party of the control instruction that the control instruction is not reasonable.

Specifically, the control device can determine the path to be rotated by the inner azimuth frame and/or the inner pitching frame according to the control mode indicated by the control instruction, and further detect whether an obstacle exists on the path to be rotated by the inner azimuth frame and/or the inner pitching frame through an obstacle sensor (such as an infrared sensor, an ultrasonic sensor and the like), and if the obstacle exists, the control device determines that the control instruction is unreasonable; if no obstacle exists, the control device determines that the control command is reasonable.

By implementing the method, the control device can also simulate the control mode indicated by the control command to verify whether the formulation of the control command is reasonable or not, so that the damage of the frame of the nacelle in the rotating process caused by unreasonable control command is avoided.

204. In the process of controlling the rotation of the inner orientation frame and the inner pitching frame, a first angle difference between the inner orientation frame and the outer orientation frame is measured, and a second angle difference between the inner pitching frame and the outer pitching frame is measured.

In the embodiment of the application, the control device may measure a first angle difference between the inner orientation frame and the outer orientation frame and a second angle difference between the inner pitching frame and the outer pitching frame by using a limiting device (e.g., an angle limiter, an opening limiter, etc.) or an angle measuring device (e.g., an angle measuring instrument, an angle sensor, etc.) in the process of controlling the rotation of the inner orientation frame and the inner pitching frame.

It should be noted that: the first and second angular differences may be 0 °, and when the first angular difference is 0 °, the inner orientation frame is aligned with the outer orientation frame; when the second angular difference is 0 °, the inner pitch frame is aligned with the outer pitch frame.

206. Adjusting the outer orientation frame to align with the inner orientation frame according to the first angle difference, and adjusting the outer pitching frame to align with the inner pitching frame according to the second angle difference.

In the embodiment of the present application, when the inner azimuth frame and the outer azimuth frame are aligned, the target angle difference between the inner azimuth frame and the outer azimuth frame may be 0 °.

Optionally, the control device may calculate a target angle difference between the inner orientation frame and the outer orientation frame when the inner orientation frame and the outer orientation frame are aligned, and a difference between the target angle difference and a current first angle difference between the inner orientation frame and the outer orientation frame is used as an angle that the outer orientation frame needs to rotate.

For example: when interior position frame and outer position frame align, the target angle difference between interior position frame and the outer position frame is 0, and in the rotatory in-process of position frame and interior every single move frame in the control, measure the first angle difference between interior position frame and the outer position frame and be 30, then controlling means can calculate that the angle that outer position frame needs the pivoted is: 0 to 30 degrees is equal to-30 degrees.

Similarly, the control device may calculate a target angle difference between the inner pitch frame and the outer pitch frame when the inner pitch frame and the outer pitch frame are aligned, and a difference between the current first angle difference between the inner pitch frame and the outer pitch frame may be used as an angle at which the outer pitch frame needs to rotate.

The implementation of the above embodiments is different from the conventional control method that when the nacelle is controlled to rotate in an attitude, the nacelle outer frame (i.e., the outer azimuth frame and the outer pitch frame) is directly controlled to rotate to realize the attitude rotation of the whole nacelle, the control method disclosed in the embodiments of the present application can control the nacelle inner frame (i.e., the inner azimuth frame and the inner pitch frame) to rotate according to the control instruction, and in the process of controlling the rotation of the nacelle inner frame, the nacelle outer frame is adjusted according to the angle difference between the nacelle inner frame and the nacelle outer frame, so that the nacelle outer frame and the nacelle inner frame are aligned, thereby on the premise of realizing the attitude rotation of the whole nacelle, avoiding the geometric constraint effect between the nacelle outer frames, causing the rotation of the nacelle outer frames to bring disturbance to the nacelle inner frame, and further reducing the influence of the rotation of the nacelle on the imaging quality of the imaging device. And the control device can execute corresponding control work according to control instructions sent by different sending units and can generate the control instructions automatically based on control requirements, so that the using scene of the nacelle is wider. In addition, the control device can control the rotation of the inner azimuth frame and the inner pitching frame according to the control object and the control method indicated by the control instruction, so that the transformation of various postures of the nacelle is realized, and the flexibility of the posture transformation of the nacelle is improved. And the control device can also simulate a control mode indicated by the control command to verify whether the formulation of the control command is reasonable or not, so that the damage of the frame of the nacelle in the rotating process caused by unreasonable control command is avoided.

Referring to fig. 3, fig. 3 is a schematic flow chart of another control method for a pod with a layer frame, which is disclosed in the embodiment of the present application, and the control method can be applied to the control device disclosed in the embodiment of the present application to correspondingly control the pod with the layer frame, where the pod with the layer frame at least includes: the nacelle comprises an inner orientation frame, an outer orientation frame, an inner pitching frame and an outer pitching frame, wherein the outer orientation frame and the outer pitching frame are used for adjusting the attitude of the nacelle, and the inner orientation frame and the inner pitching frame are used for arranging imaging equipment. The following description will be made by taking a control device as an execution body, and the control method of the pod with the multi-story frame may include the following steps:

302. when it is detected that the nacelle is unstable due to disturbance by an external factor, a first angle difference between the inner orientation frame and the outer orientation frame is measured, and a second angle difference between the inner pitch frame and the outer pitch frame is measured.

In this embodiment, the control device may first perform step 202, step 204, and step 206 of the first embodiment, and then perform step 302 and step 304, that is, the control device may first control the inner azimuth frame and the inner pitch frame to rotate according to the control command, adjust the outer azimuth frame to align with the inner azimuth frame based on a first angle difference between the inner azimuth frame and the outer azimuth frame, and adjust the outer pitch frame to align with the inner pitch frame according to a second angle difference between the inner pitch frame and the outer pitch frame; then steps 302 and 304 are performed to make further adjustments to the frame of the nacelle.

Alternatively, the control device may directly perform step 302 and step 304 to adjust the frame of the nacelle when the frame of the nacelle is not controlled to rotate according to the control command, so as to improve the disturbance resistance of the nacelle in a fixed state (i.e., a state in which the frame of the nacelle is not rotated).

As an alternative embodiment, the inner azimuth frame and the inner pitch frame of the nacelle may be provided with an imaging device (for example, an infrared camera, an ultraviolet camera, a visible light camera, or the like, which is not limited herein); the control device can further acquire the multiframe framing pictures continuously acquired by the imaging equipment and judge whether the multiframe framing pictures continuously acquired by the imaging equipment are completely overlapped or not; if the frames of the plurality of frames do not completely overlap, the control device can determine that the nacelle is disturbed by external factors (such as disturbance of wind, disturbance of other associated equipment (such as a motor driving the frame to rotate, a track and the like) to cause instability.

Optionally, when the control device determines that the multiple frames of framing pictures continuously acquired by the imaging device are not completely overlapped, the type of the disturbed frame and the disturbance direction can be determined according to any two continuous and non-overlapped framing pictures.

Specifically, the control device may determine a first vertical central axis and a first horizontal central axis of a first viewing picture in any two consecutive and non-overlapping viewing pictures; determining a second vertical central axis and a second horizontal central axis of a second viewing picture in any two continuous and non-overlapping viewing pictures; and then according to the second vertical central axis and the second horizontal central axis, and the position relation between the first vertical central axis and the first horizontal central axis, determining the type of the disturbed frame and the disturbing direction. Wherein the acquisition time point of the framing picture is faster than the acquisition time point of the second framing picture.

If the second vertical centerline axis (dashed line) is to the right of the first vertical centerline axis (solid line), as shown in FIG. 3a, it means that the inner azimuth frame is disturbed, and the direction of the disturbance is from left to right;

if the second vertical central axis (dashed line) is to the left of the first vertical central axis (solid line), it means that the inner azimuth frame is disturbed, and the direction of disturbance is from right to left, as shown in fig. 3 b;

as shown in fig. 3c, if the second horizontal central axis (dashed line) is above the first horizontal central axis (solid line), it indicates that the inner pitch frame is disturbed, and the direction of the disturbance is from bottom to top;

as shown in fig. 3d, if the second horizontal central axis (dashed line) is below the first horizontal central axis (solid line), it indicates that the inner pitch frame is disturbed, and the direction of the disturbance is from top to bottom;

and, as shown in fig. 3e, if the second vertical central axis (dashed line) is to the right of the first vertical central axis (solid line) and the second horizontal central axis (dashed line) is above the first horizontal central axis (solid line), it indicates that both the inner azimuth frame and the inner pitch frame are disturbed, and the direction of the disturbance is from the lower left to the upper right;

if the second vertical central axis (dashed line) is to the left of the first vertical central axis (solid line) and the second horizontal central axis (dashed line) is above the first horizontal central axis (solid line), as shown in fig. 3f, it means that both the inner azimuth frame and the inner pitch frame are disturbed, and the direction of the disturbance is from the lower right to the upper left;

as shown in fig. 3g, if the second vertical central axis (dashed line) is right of the first vertical central axis (solid line) and the second horizontal central axis (dashed line) is below the first horizontal central axis (solid line), it indicates that both the inner azimuth frame and the inner pitch frame are disturbed, and the direction of the disturbance is from upper right to lower left;

as shown in fig. 3h, if the second vertical central axis (dashed line) is left of the first vertical central axis (solid line) and the second horizontal central axis (dashed line) is below the first horizontal central axis (solid line), it indicates that both the inner azimuth frame and the inner pitch frame are disturbed, and the direction of the disturbance is from upper right to lower left.

Optionally, the control device may calculate a first angle difference between the inner orientation frame and the outer orientation frame according to a distance between the second vertical central axis and the first vertical central axis and a preset first proportional relationship; and the control device can calculate a second angle difference between the inner pitching frame and the outer pitching frame according to the distance between the second horizontal central axis and the first horizontal central axis and a preset second proportional relation.

The first proportional relationship may be a ratio between a distance between the second vertical central axis and the first vertical central axis and a first angle difference between the inner orientation frame and the outer orientation frame, and a specific numerical value of the proportional relationship is set by a developer according to a large amount of development data. For example: the distance between the second vertical central axis and the first vertical central axis is 1 mm and corresponds to a first angle difference of 5 degrees; or, the second vertical central axis and the first vertical central axis are separated by 1 mm, which corresponds to a 6 ° first angle difference, but is not limited herein.

Similarly, the second proportional relationship may be a ratio between a distance between the second horizontal central axis and the first horizontal central axis and a second angular difference between the inner pitch frame and the outer pitch frame, and the setting manner of the second proportional relationship is similar to that of the first proportional relationship.

Alternatively, the control device may generate corresponding control commands according to the type of the disturbed frame and the direction of the disturbance, and execute the control commands to adjust the frame of the nacelle.

By implementing the methods, the control device can determine the type and the disturbance direction of the disturbed frame of the nacelle according to the framing picture of the imaging equipment, so that a corresponding adjustment scheme can be conveniently formulated subsequently.

As another alternative, the control device may further detect whether the outer azimuth frame and the inner azimuth frame are aligned through a limiting device built in the nacelle, and detect whether the outer pitch frame and the inner pitch frame are aligned through a limiting device built in the nacelle; and if the outer azimuth frame is not aligned with the inner azimuth frame and/or the outer pitch frame is not aligned with the inner pitch frame, determining that the nacelle is disturbed by external factors to cause instability.

Optionally, the control device may detect a first angle difference between the outer orientation frame and the inner orientation frame through a limiting device built in the nacelle, and determine that the outer orientation frame is aligned with the inner orientation frame if the first angle difference is a target angle; and the control device can detect a second angle difference between the outer pitching frame and the inner pitching frame through a limiting device arranged in the nacelle, and if the second angle difference is a target angle, the outer pitching frame and the inner pitching frame are determined to be aligned.

The target angle may be 0 °, 0.5 ° or-0.5 °, and the like, because in an ideal state, the angle difference between the two frames when the two frames are aligned should be 0 °, but actually due to the influence of process precision, equipment wear and the like, the target angle is not necessarily 0 °, and a specific numerical value of the target angle is set by a developer according to a large amount of development data, and is not limited herein.

Optionally, the control device may detect a first angle difference between the outer azimuth frame and the inner azimuth frame through a limiting device built in the nacelle, and determine that the outer azimuth frame is aligned with the inner azimuth frame if the first angle difference is within a preset first angle range; and the control device can detect a second angle difference between the outer pitching frame and the inner pitching frame through a limiting device arranged in the nacelle, and determine that the outer pitching frame is aligned with the inner pitching frame if the second angle difference is within a preset second angle range.

It should be noted that, in an ideal state, the angle difference between the two frames when the two frames are aligned should be 0 °, but actually, due to the influence of the process precision, the equipment wear, and the like, the angle difference between the two frames when the two frames are aligned is not necessarily 0 °, but an interval including 0 °.

Alternatively, the predetermined first angle range may be an interval including 0 °, and the upper limit and the lower limit of the interval may be different from 0 ° by a predetermined value, for example (-1 ° to 1 °), (-1 ° to 2 °), etc., and specific values are set by developers according to a large amount of development data, and are not limited herein.

Similarly, the predetermined second angle range may be an interval including 0 °, and the upper limit and the lower limit of the interval are different from 0 ° by a predetermined value.

By implementing the methods, the control device can judge whether the outer azimuth frame and the inner azimuth frame are aligned or not through the limiting device and judge whether the outer pitching frame and the inner pitching frame are aligned or not to determine whether the nacelle is disturbed by external factors or not.

304. Adjusting the outer orientation frame to align with the inner orientation frame according to the first angle difference, and adjusting the outer pitching frame to align with the inner pitching frame according to the second angle difference.

By implementing the method disclosed by each embodiment, the control device can determine the type and the disturbance direction of the disturbed frame of the nacelle according to the framing picture of the imaging equipment, so that a corresponding adjustment scheme can be conveniently formulated subsequently; in addition, the control device can judge whether the outer azimuth frame and the inner azimuth frame are aligned or not through the limiting device and judge whether the outer pitching frame and the inner pitching frame are aligned or not to determine whether the nacelle is disturbed by external factors or not.

Referring to fig. 4, fig. 4 is a schematic flow chart of a control method for a pod with a layer frame, which can be applied to the control device disclosed in the present application embodiment to correspondingly control the pod with the layer frame, and the pod with the layer frame at least includes: the nacelle comprises an inner orientation frame, an outer orientation frame, an inner pitching frame and an outer pitching frame, wherein the outer orientation frame and the outer pitching frame are used for adjusting the attitude of the nacelle, and the inner orientation frame and the inner pitching frame are used for arranging imaging equipment. The following description will be made by taking a control device as an execution body, and the control method of the pod with the multi-story frame may include the following steps:

402. and controlling the rotation of the inner azimuth frame and the inner pitching frame according to the received control instruction.

As an optional implementation manner, the control device may extract a target coordinate corresponding to a target focusing position included in the received control instruction, and determine a pitch angle at which the inner pitch frame needs to be rotated and an azimuth angle at which the inner azimuth frame needs to be rotated according to an initial coordinate corresponding to an initial position at which a focus of the imaging device is currently focused and the target coordinate; the control device can further control the rotation pitch angle of the inner pitch frame and the rotation azimuth angle of the inner azimuth frame.

Optionally, the control device may establish a horizontal coordinate system in the horizontal direction with the position coordinates of the imaging device as the origin of coordinates, and map the original coordinates and the target coordinates into the horizontal coordinate system; and then the control device can calculate the azimuth angle of the inner azimuth frame needing to rotate through a trigonometric function formula according to the position coordinate of the imaging equipment, the coordinate values of the original coordinate and the target coordinate in the horizontal coordinate system.

Specifically, when the control device identifies that a triangle formed by the position coordinates, the original coordinates and the target coordinates of the imaging device is a right triangle, the control device may calculate the azimuth angle of the inner azimuth frame, which needs to be rotated, according to the distance between the original coordinates and the target coordinates, the distance between the original coordinates and the position coordinates of the imaging device, and a trigonometric function formula.

For example: knowing the position coordinates of the imaging device, the original coordinates of the focal point of the imaging device and the target coordinates in the established horizontal coordinate system, the distance a between the original coordinates and the target coordinates and the distance b between the original coordinates and the position coordinates of the imaging device can be calculated, and then the control device can calculate the distance between the imaging device and the target coordinates according to a trigonometric function formula: and (e) calculating the azimuth angle theta of the inner azimuth frame needing to be rotated as a/b. Where θ represents an azimuth angle at which the inner azimuth frame needs to be rotated, a represents a distance between the original coordinates and the target coordinates, and b represents a distance between the original coordinates and the position coordinates of the imaging device.

Optionally, when the control device identifies that a triangle formed by the position coordinates, the original coordinates, and the target coordinates of the imaging device is not a right triangle, the control device may calculate the azimuth angle of the inner azimuth frame, which needs to be rotated, according to the distance between the original coordinates and the target coordinates, the distance between the original coordinates and the position coordinates of the imaging device, the distance between the target coordinates and the position coordinates of the imaging device, and a triangulation formula.

For example: knowing the position coordinates, the original coordinates and the target coordinates of the imaging device in the established horizontal coordinate system, the distance a between the original coordinates and the target coordinates, the distance b between the original coordinates and the position coordinates of the imaging device and the distance c between the target coordinates and the position coordinates of the imaging device can be calculated, and then the control device can calculate the azimuth angle theta of the inner azimuth frame needing to rotate according to a triangulation formula cos theta (a + c-b)/2 ac.

Similarly, the control device may establish a vertical coordinate system in the vertical direction with the position coordinates of the imaging device as the origin of coordinates, and map the original coordinates and the target coordinates into the vertical coordinate system; and then the control device can calculate the pitch angle of the inner pitch frame needing to rotate through a trigonometric function formula according to the coordinate values of the position coordinate, the original coordinate and the target coordinate of the imaging device in the vertical coordinate system.

By implementing the methods, the control device can control the outer frame (namely the outer orientation frame and the outer pitching frame) of the nacelle to rotate according to the control command so as to realize the attitude rotation of the whole nacelle.

404. In the process of controlling the rotation of the inner orientation frame and the inner pitching frame, a first angle difference between the inner orientation frame and the outer orientation frame is measured, and a second angle difference between the inner pitching frame and the outer pitching frame is measured.

406. And determining a first target rotation angle of the outer orientation frame according to the first angle difference and a first rotation offset of the outer orientation frame, and controlling the outer orientation frame to rotate the first target rotation angle so as to align with the inner orientation frame, wherein the first rotation offset is a difference value between an ideal rotation angle and an actual rotation angle of the outer orientation frame.

In practice, it has been found that as the number of rotations of the frame of the nacelle is accumulated, the mechanical structure of the frame may be subjected to a certain degree of wear, and the frame may be rotated by a rotational offset due to the wear of the mechanical structure or other reasons. The offset may be a difference between an ideal rotation angle and an actual rotation angle of the frame (i.e., the offset is equal to the ideal rotation angle — the actual rotation angle, for example, the control device controls the frame to rotate 10 °, but if the frame rotates only 9 ° due to loss of the mechanical structure, the offset is equal to 1 ° between 10 ° and 9 °, and if the frame rotates 10.5 ° due to other reasons, the offset is equal to 0.5 ° between 10 ° and 10.5 °. Therefore, in the present embodiment, the control device may take into account the first rotational offset amount of the outer frame when determining the first target rotational angle at which the outer frame needs to be rotated.

Alternatively, the control device may calculate a sum of a first angular difference between the inner and outer orientation frames and a first rotational offset amount of the outer orientation frame as the first target rotational angle of the outer orientation frame.

For example: the control device measures that the first angle difference between the inner orientation frame and the outer orientation frame is 10 °, and the first rotational offset of the outer orientation frame is known to be 1 °, then the first target rotational angle of the outer orientation frame should be 10 ° +1 ° -11 °, that is, the control device controls the first target rotational angle of the outer orientation frame to be 11 °, so that the error caused by the rotational offset can be compensated.

Of course, while considering the angle of rotation of the frame, the direction of rotation of the frame should also be considered. Alternatively, the control device may determine the direction of rotation of the outer orientation frame according to the positional relationship between the inner orientation frame and the outer orientation frame.

If the control device detects that the outer orientation frame is on the left side of the inner orientation frame, the control device may determine that the rotation direction of the outer orientation frame is to rotate from left to right by a first target rotation angle;

if the control device detects that the outer orientation frame is on the right side of the inner orientation frame, the control device may determine that the rotation direction of the outer orientation frame is to be rotated from right to left by the first target rotation angle.

As an alternative implementation manner, before executing step 406, the control device may determine, according to the first number of rotations accumulated by the outer orientation frame, a first rotational offset corresponding to the first number of rotations in the matching relationship recorded in the preset offset adjustment table; according to the second rotation times accumulated by the outer pitching frame, determining a second rotation offset corresponding to the second rotation times in the matching relation recorded by the preset offset adjusting table; the offset adjustment table records the matching relationship between the number of rotations and the amount of rotational offset, and includes a plurality of numbers of rotations and the amount of rotational offset corresponding to each number of rotations.

It should be noted that: the offset adjustment table (which may be an electronic table, an entity table, or the like) may be made by a developer according to a large amount of development experience and development data, and the developer may store the table in the control device for the control device to call; alternatively, the offset adjustment table may be a table generated by the control device based on a large number of records of the rotation of the nacelle frame, and is not limited herein.

For example, assuming that the accumulated first number of rotations of the outer frame is 500, and the first rotational offset amount corresponding to the 500 number of rotations is 0.5 ° in the matching relationship recorded in the preset offset amount adjustment table, the control device may determine that the first rotational offset amount of the outer frame is 0.5 °.

For another example, if the accumulated second number of rotations of the outer pitch frame is 800 times, and the second rotational offset corresponding to the 800 times of rotations in the matching relationship recorded in the preset offset adjustment table is 1 °, the control device may determine that the second rotational offset of the outer pitch frame is 1 °.

In practice, it has been found that the cause of the rotation error of the frame may be caused by the rotation accuracy of the frame (due to the manufacturing process, each pod has different rotation accuracy at the time of shipment, and the rotation accuracy is similar to the rotation offset and is the difference between the ideal rotation angle and the actual rotation angle of the frame), in addition to the rotation offset.

Optionally, the control device may obtain a first rotation number of accumulated rotation of the outer orientation frame, and determine whether the first rotation number is smaller than a preset loss number threshold, and if the first rotation number of the outer orientation frame is smaller than the preset loss number threshold, the control device may determine the first target rotation angle of the outer orientation frame directly according to a first angle difference between the inner orientation frame and the outer orientation frame and the first rotation precision of the outer orientation frame.

Optionally, if the first rotation number of the outer orientation frame is greater than or equal to the preset loss number threshold, the control device may determine the first target rotation angle of the outer orientation frame according to a first angle difference between the inner orientation frame and the outer orientation frame, a first rotation offset of the outer orientation frame, and a first rotation precision of the outer orientation frame.

It should be noted that the preset loss number threshold is a critical value that the accumulated number of rotations of the frame may cause the frame to generate a rotational offset, and when the number of rotations of the frame is greater than or equal to the number threshold, it is indicated that the frame has the rotational offset, so the rotational offset also needs to be considered when determining the control quantity of the frame; on the contrary, if the number of times of rotation of the frame is smaller than the number threshold, it is determined that the frame has not yet generated the rotational offset amount, and the rotational offset amount does not need to be considered when determining the control amount of the frame, and only the rotational accuracy of the frame needs to be considered.

Optionally, the control device may obtain identification information of the nacelle, and query rotation accuracy information of frames such as an outer orientation frame and an outer pitch frame of the nacelle through the identification information of the nacelle.

The identification information of the pod may include, among other things, the production number, name, etc. of the pod. Further, the control device can inquire the rotation accuracy of the nacelle frame through the internet based on the identification information such as the production number or the name.

By implementing the above embodiments, the control device can also take the rotational offset amount and the rotational accuracy of the nacelle frame as factors for determining the rotational angle of the frame, thereby eliminating the rotational error of the frame to a greater extent.

408. And determining a second target rotation angle of the outer pitching frame according to the second angle difference and a second rotation offset of the outer pitching frame, controlling the outer pitching frame to rotate by the second target rotation angle so as to be aligned with the inner pitching frame, wherein the second rotation offset is a difference value between an ideal rotation angle and an actual rotation angle of the outer pitching frame.

Similarly to step 406, the control device may calculate a sum of a second angle difference between the inner pitch frame and the outer pitch frame and a second rotational offset amount of the outer pitch frame as the second target rotational angle of the outer pitch frame.

And the control device can determine the rotating direction of the outer pitching frame according to the position relation between the inner pitching frame and the outer pitching frame.

If the control device detects that the outer pitching frame is above the inner pitching frame, the control device can determine that the rotation direction of the outer pitching frame is a second target rotation angle from top to bottom;

if the control device detects that the outer pitching frame is below the inner pitching frame, the control device may determine that the rotation direction of the outer pitching frame is the second target rotation angle from bottom to top.

By implementing the methods, the control device can control the outer frame (namely the outer orientation frame and the outer pitching frame) of the nacelle to rotate according to the control command so as to realize the attitude rotation of the whole nacelle. Furthermore, the control device can also take the rotation accuracy of the nacelle frame as a factor in determining the frame rotation angle, thereby eliminating the rotation error of the frame to a greater extent.

Referring to fig. 5, fig. 5 is a schematic structural diagram of a control device of a nacelle with a multi-layer frame according to an embodiment of the present application. The control device can be used for correspondingly controlling the nacelle with the multi-layer frame, and the nacelle with the multi-layer frame at least comprises: the nacelle comprises an inner orientation frame, an outer orientation frame, an inner pitching frame and an outer pitching frame, wherein the outer orientation frame and the outer pitching frame are used for adjusting the attitude of the nacelle, and the inner orientation frame and the inner pitching frame are used for arranging imaging equipment. The control device of the nacelle having a multi-story frame may include: a control unit 501, a measurement unit 502 and an adjustment unit 503, wherein:

the control unit 501 is configured to control the rotation of the inner azimuth frame and the inner pitch frame according to the received control instruction;

a measuring unit 502, configured to measure a first angle difference between the inner orientation frame and the outer orientation frame and a second angle difference between the inner pitch frame and the outer pitch frame in a process of controlling rotation of the inner orientation frame and the inner pitch frame;

a first adjusting unit 503, configured to adjust the outer orientation frame to be aligned with the inner orientation frame according to the first angle difference, and adjust the outer pitching frame to be aligned with the inner pitching frame according to the second angle difference.

The control device is different from the traditional control method that when the nacelle is controlled to rotate in the attitude, the nacelle outer frame (namely the outer azimuth frame and the outer pitching frame) is directly controlled to rotate to achieve the attitude rotation of the whole nacelle, the control method disclosed by the embodiment of the application can control the nacelle inner frame (namely the inner azimuth frame and the inner pitching frame) to rotate according to the control instruction, and in the process of controlling the rotation of the nacelle inner frame, the nacelle outer frame is adjusted according to the angle difference between the nacelle inner frame and the nacelle outer frame, so that the nacelle outer frame is aligned with the nacelle inner frame, on the premise of achieving the attitude rotation of the whole nacelle, the situation that the rotation of the nacelle outer frame brings disturbance to the nacelle inner frame is avoided, and the influence of the rotation of the nacelle on the imaging quality of imaging equipment inside the nacelle is reduced.

Referring to fig. 6, fig. 6 is a schematic structural diagram of another control device of a nacelle with a multi-layer frame according to an embodiment of the present application. The control device shown in fig. 6 can be optimized from the control device shown in fig. 5, and can also be used for correspondingly controlling the nacelle with the multi-story frame, and the nacelle with the multi-story frame at least comprises: the nacelle comprises an inner orientation frame, an outer orientation frame, an inner pitching frame and an outer pitching frame, wherein the outer orientation frame and the outer pitching frame are used for adjusting the attitude of the nacelle, and the inner orientation frame and the inner pitching frame are used for arranging imaging equipment. Compared to the control device shown in fig. 5, the control device shown in fig. 6 may further include: a second adjusting unit 504, wherein:

a second adjusting unit 504, configured to, when it is detected that the nacelle is unstable due to disturbance by an external factor, measure a first angle difference between the inner orientation frame and the outer orientation frame, and measure a second angle difference between the inner pitch frame and the outer pitch frame, and adjust the outer orientation frame to be aligned with the inner orientation frame according to the first angle difference, and adjust the outer pitch frame to be aligned with the inner pitch frame according to the second angle difference.

By implementing the control device, the disturbance resistance of the nacelle in a fixed state (i.e., a state in which the frame of the nacelle is not rotated) can be improved.

As an alternative embodiment, the inner azimuth frame and the inner pitch frame may be provided with an imaging device, and the control apparatus shown in fig. 6 may further include: an obtaining unit 505, a judging unit 506 and a first determining unit 507, wherein:

an acquiring unit 505 configured to acquire a plurality of frames of framing pictures continuously acquired by the imaging apparatus before the second adjusting unit 504 measures a first angle difference between the inner orientation frame and the outer orientation frame and a second angle difference between the inner pitch frame and the outer pitch frame;

a judging unit 506 for judging whether or not the multiple frames of framing pictures continuously collected by the imaging apparatus are completely overlapped;

a first determination unit 507 for determining that the nacelle is unstable due to disturbance by an external factor when the judgment unit 506 judges that the framing pictures of the frames continuously acquired by the imaging apparatus are completely overlapped.

By implementing the control device, whether the nacelle is disturbed or not can be determined according to the framing picture of the imaging equipment, so that a corresponding adjustment scheme can be conveniently formulated subsequently.

As an alternative embodiment, the control device shown in fig. 6 may further include: a detection unit 508 and a second determination unit 509, wherein:

a detecting unit 508 for detecting whether the outer azimuth frame and the inner azimuth frame are aligned or not by a limiting device built in the nacelle and detecting whether the outer pitch frame and the inner pitch frame are aligned or not by a limiting device built in the nacelle before the second adjusting unit 504 measures a first angle difference between the inner azimuth frame and the outer azimuth frame and measures a second angle difference between the inner pitch frame and the outer pitch frame;

and a second determining unit 509, configured to determine that the nacelle is unstable due to disturbance from an external factor when the detecting unit 508 detects that the azimuth frame is misaligned with the inner azimuth frame and/or the outer pitch frame is misaligned with the inner pitch frame.

By implementing the control device, whether the outer azimuth frame and the inner azimuth frame are aligned or not can be judged through the limiting device, and whether the outer pitching frame and the inner pitching frame are aligned or not is judged to determine whether the nacelle is disturbed by external factors or not.

As an alternative embodiment, the manner of adjusting the outer azimuth frame to align with the inner azimuth frame according to the first angle difference and adjusting the outer pitch frame to align with the inner pitch frame according to the second angle difference may specifically be:

a first adjusting unit 503, configured to determine a first target rotation angle of the outer frame according to the first angle difference and a first rotation offset of the outer frame, and control the outer frame to rotate by the first target rotation angle to align with the inner frame, where the first rotation offset is a difference between an ideal rotation angle and an actual rotation angle of the outer frame; and determining a second target rotation angle of the outer pitching frame according to the second angle difference and a second rotation offset of the outer pitching frame, and controlling the outer pitching frame to rotate by the second target rotation angle so as to align with the inner pitching frame, wherein the second rotation offset is a difference value between an ideal rotation angle and an actual rotation angle of the outer pitching frame.

By implementing the control device, the rotation offset of the nacelle frame can be used as a factor for determining the rotation angle of the frame, so that the rotation error of the frame can be eliminated to a greater extent.

As an alternative embodiment, the control device shown in fig. 6 may further include: a matching unit 510, wherein:

a matching unit 510, configured to determine, according to the first number of rotations accumulated by the outer frame, a first rotational offset corresponding to the first number of rotations in a matching relationship recorded in a preset offset adjustment table before the first adjusting unit 503 determines the first target rotational angle of the outer frame according to the first angle difference and the first rotational offset of the outer frame; according to the second rotation times accumulated by the outer pitching frame, determining a second rotation offset corresponding to the second rotation times in the matching relation recorded by the preset offset adjusting table; the offset adjustment table records the matching relationship between the number of rotations and the amount of rotational offset, and includes a plurality of numbers of rotations and the amount of rotational offset corresponding to each number of rotations.

By implementing the control device, the offset adjusting table can be directly used for determining the corresponding rotary offsets of different frames, so that the control device can conveniently use the rotary offset of the nacelle frame as a factor for determining the rotary angle of the frame, and the rotary error of the frame can be eliminated to a greater extent.

As an alternative embodiment, the inner orientation frame and the inner tilt frame may be provided with an imaging device, and the manner that the control unit 501 is configured to control the inner orientation frame and the inner tilt frame to rotate according to the received control instruction may specifically be:

a control unit 501, configured to extract a target coordinate corresponding to a target focus position included in the received control instruction; determining a pitching angle required to rotate by the inner pitching frame and an azimuth angle required to rotate by the inner azimuth frame according to an initial coordinate and a target coordinate corresponding to an initial position of a focus of the imaging equipment, which is focused currently; controlling the inner pitching frame to rotate the pitching angle, and controlling the inner azimuth frame to rotate the azimuth angle.

The control device can control the outer frame (namely the outer orientation frame and the outer pitching frame) of the nacelle to rotate according to the control command so as to realize the attitude rotation of the whole nacelle.

By implementing the control device disclosed in each of the above embodiments, it is possible to improve the disturbance resistance of the nacelle in a fixed state (i.e., a state in which the frame of the nacelle is not rotated); whether the nacelle is disturbed or not can be determined according to the framing picture of the imaging equipment, so that a corresponding adjustment scheme can be conveniently formulated subsequently; whether the outer azimuth frame and the inner azimuth frame are aligned or not and whether the outer pitching frame and the inner pitching frame are aligned or not can be judged through the limiting device to determine whether the nacelle is disturbed by external factors or not, and the detection method is simple so as to facilitate the adjustment scheme corresponding to a subsequent system; and the rotational offset of the nacelle frame can be used as a factor for determining the frame rotation angle, thereby eliminating the frame rotation error to a greater extent; the corresponding rotary offset of different frames can be determined by the direct offset adjusting table, so that the rotary offset of the nacelle frame can be conveniently used as a factor for determining the rotary angle of the frame by the control device, and the rotary error of the frame can be eliminated to a greater extent; and the outer frame (namely the outer orientation frame and the outer pitching frame) of the nacelle can be controlled to rotate according to the control command so as to realize the attitude rotation of the whole nacelle.

Referring to fig. 7, fig. 7 is a schematic structural diagram of an electronic device according to an embodiment of the present disclosure. As shown in fig. 7, the electronic device may include:

a memory 701 in which executable program code is stored;

a processor 702 coupled to the memory 701;

the processor 702 calls the executable program code stored in the memory 701 to execute the control method of the pod with the multi-layer frame disclosed in the above embodiments.

Embodiments of the present application disclose a computer-readable storage medium storing a computer program, wherein the computer program causes a computer to execute a control method of a pod with a multi-deck frame disclosed in each of the above embodiments.

The embodiment of the present application also discloses an application publishing platform, wherein the application publishing platform is used for publishing a computer program product, and when the computer program product runs on a computer, the computer is caused to execute part or all of the steps of the method in the above method embodiments.

It should be appreciated that reference throughout this specification to "one embodiment" or "an embodiment" means that a particular feature, structure or characteristic described in connection with the embodiment is included in at least one embodiment of the present invention. Thus, the appearances of the phrases "in one embodiment" or "in an embodiment" in various places throughout this specification are not necessarily all referring to the same embodiment. Furthermore, the particular features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. Those skilled in the art should also appreciate that the embodiments described in this specification are exemplary and alternative embodiments, and that the acts and modules illustrated are not required in order to practice the invention.

In various embodiments of the present invention, it should be understood that the size of the sequence number of each process described above does not mean that the execution sequence is necessarily sequential, and the execution sequence of each process should be determined by its function and inherent logic, and should not constitute any limitation on the implementation process of the embodiments of the present application.

The units described as separate parts may or may not be physically separate, and parts displayed as units may or may not be physical units, may be located in one place, or may be distributed on a plurality of network units. Some or all of the units can be selected according to actual needs to achieve the purpose of the solution of the embodiment.

In addition, functional units in the embodiments of the present invention may be integrated into one processing unit, or each unit may exist alone physically, or two or more units are integrated into one unit. The integrated unit can be realized in a form of hardware, and can also be realized in a form of a software functional unit.

The integrated units, if implemented as software functional units and sold or used as a stand-alone product, may be stored in a computer accessible memory. Based on such understanding, the technical solution of the present invention, which is a part of or contributes to the prior art in essence, or all or part of the technical solution, can be embodied in the form of a software product, which is stored in a memory and includes several requests for causing a computer device (which may be a personal computer, a server, a network device, or the like, and may specifically be a processor in the computer device) to execute part or all of the steps of the above-described method of each embodiment of the present invention.

It will be understood by those skilled in the art that all or part of the steps in the methods of the embodiments described above may be implemented by hardware instructions of a program, and the program may be stored in a computer-readable storage medium, where the storage medium includes Read-Only Memory (ROM), Random Access Memory (RAM), Programmable Read-Only Memory (PROM), Erasable Programmable Read-Only Memory (EPROM), One-time Programmable Read-Only Memory (OTPROM), Electrically Erasable Programmable Read-Only Memory (EEPROM), Compact Disc Read-Only Memory (CD-ROM), or other Memory, such as a magnetic disk, or a combination thereof, A tape memory, or any other medium readable by a computer that can be used to carry or store data.

The detailed description of the control method, the control device and the electronic device for the pod with multi-layer frame disclosed in the embodiments of the present application is provided above, and the principle and the implementation of the present invention are explained herein by applying specific examples, and the description of the above embodiments is only used to help understanding the method and the core idea of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.

Claims

1. A method for controlling a nacelle having a multi-level frame, characterized in that said nacelle comprises at least: an inner azimuth frame, an outer azimuth frame, an inner pitch frame, and an outer pitch frame, the outer azimuth frame and the outer pitch frame being used to adjust a posture of the pod, the inner azimuth frame and the inner pitch frame being used to set an imaging apparatus, the method comprising:

2. The method of claim 1, further comprising:

3. The method of claim 2, wherein the inner azimuth frame and the inner pitch frame are provided with imaging devices, and wherein the step of measuring a first angular difference between the inner azimuth frame and the outer azimuth frame and measuring a second angular difference between the inner pitch frame and the outer pitch frame is performed before the step of detecting that the nacelle is unstable due to disturbance by an external factor, further comprises:

judging whether the multi-frame framing pictures are completely overlapped;

4. The method of claim 2, wherein prior to the steps of measuring a first angular difference between the inner azimuth frame and the outer azimuth frame and measuring a second angular difference between the inner pitch frame and the outer pitch frame if it is detected that the nacelle is unstable due to disturbance by an external factor, the method further comprises:

5. The method of claim 1, wherein said adjusting said outer azimuth frame to align with said inner azimuth frame according to said first angular difference and said outer pitch frame to align with said inner pitch frame according to said second angular difference comprises:

6. The method of claim 5, wherein prior to said determining a first target angle of rotation of said outer frame based on said first angular difference and a first amount of rotational offset of said outer frame, said method further comprises:

7. The method according to any one of claims 1 to 6, wherein the inner orientation frame and the inner tilt frame are provided with an imaging device, and the controlling the inner orientation frame and the inner tilt frame to rotate according to the received control instruction comprises:

8. A control device for a nacelle with a multi-level frame, characterized in that it comprises at least: the nacelle attitude control device comprises an inner azimuth frame, an outer azimuth frame, an inner pitching frame and an outer pitching frame, wherein the outer azimuth frame and the outer pitching frame are used for adjusting the attitude of the nacelle, the inner azimuth frame and the inner pitching frame are used for setting imaging equipment, and the control device comprises:

9. An electronic device comprising a memory storing executable program code, and a processor coupled to the memory; wherein the processor calls the executable program code stored in the memory to execute the control method of the pod with multi-story frame according to any one of claims 1 to 7.

10. A computer-readable storage medium storing a computer program, wherein the computer program causes a computer to execute the control method of a pod with a multi-story frame according to any one of claims 1 to 7.