CN111999988A - Lithography machine exposure device with high maintenance efficiency - Google Patents
Lithography machine exposure device with high maintenance efficiency Download PDFInfo
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- CN111999988A CN111999988A CN202010845359.4A CN202010845359A CN111999988A CN 111999988 A CN111999988 A CN 111999988A CN 202010845359 A CN202010845359 A CN 202010845359A CN 111999988 A CN111999988 A CN 111999988A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Environmental & Geological Engineering (AREA)
- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention relates to a high-maintenance-efficiency exposure device of a photoetching machine, which comprises a box body and a sealing cover, wherein the box body is in a cuboid shape, the bottom of the box body is provided with an opening, the top of the box body is provided with an access hole, the sealing cover is covered on the top of the box body and is in sealing connection with the access hole, an exposure mechanism and a dust removal mechanism are arranged in the box body, the exposure mechanism comprises a rotating plate, a sealing component, two lamp tubes and two rotating components, the sealing component comprises a fixed tube, a moving tube and two moving units, the moving units comprise electromagnets, magnet plates, guide rods and first springs, the rotating components comprise rotating shafts, connecting bearings, one-way bearings, rotating gears, racks, supporting blocks, second springs, connecting rods and push plates, and the high-maintenance-efficiency exposure device of the photoetching machine realizes the function of exposing ultraviolet rays through the exposure mechanism, moreover, the function of removing dust on the lamp tube can be realized through the dust removing mechanism.
Description
Technical Field
The invention relates to the field of chip production, in particular to an exposure device of a photoetching machine with high maintenance efficiency.
Background
The lithography machine is the core equipment for producing chips, and adopts a technology similar to photo development to print fine patterns on a mask plate on a silicon wafer through ultraviolet rays generated by an exposure device, wherein one of the most core parts of the exposure device is an ultraviolet lamp tube.
The exposure device for the lithography machine is in the operation in-process, and when ultraviolet tube damaged the back, then need stop operating the lithography machine and change ultraviolet tube, and change ultraviolet tube and need dismantle more part, wasted a large amount of time, reduced chip production efficiency, moreover, when having the dust on ultraviolet tube, the dust shelters from and influences chip production quality to the ultraviolet production, has reduced the practicality.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: in order to overcome the defects of the prior art, the exposure device of the photoetching machine is high in maintenance efficiency.
The technical scheme adopted by the invention for solving the technical problems is as follows: an exposure device of a photoetching machine with high maintenance efficiency comprises a box body and a sealing cover, wherein the box body is in a cuboid shape, an opening is formed in the bottom of the box body, an access hole is formed in the top of the box body, the sealing cover is arranged on the top of the box body in a covering mode and is connected with the access hole in a sealing mode, and an exposure mechanism and a dust removal mechanism are arranged in the box body;
the exposure mechanism comprises a rotating plate, a sealing component, two lamp tubes and two rotating components, wherein the rotating plate is horizontally arranged, the directions of the two lamp tubes are arranged at the top and the bottom of the rotating plate, the sealing component is arranged at the top of the rotating plate, and the rotating components are respectively arranged at two sides of the rotating plate;
the sealing assembly comprises a fixed pipe, a moving pipe and two moving units, the fixed pipe is perpendicular to the rotating plate and is opposite to the access hole, the top end of the fixed pipe is hermetically and fixedly connected with the top in the box body, a gap is formed between the fixed pipe and the rotating plate, the moving pipe and the fixed pipe are coaxially arranged, the bottom end of the fixed pipe is inserted into the moving pipe, the fixed pipe and the moving pipe are slidably and hermetically connected, the bottom end of the moving pipe is abutted against and hermetically connected with the top of the rotating plate, a gap is formed between the top end of the moving pipe and the top in the box body, a lamp tube positioned at the top of the rotating plate is positioned in the moving pipe, and the moving units and the rotating assembly are in one-to-one correspondence and are arranged on the outer wall of;
the moving unit comprises an electromagnet, a magnet plate, a guide rod and a first spring, the guide rod is parallel to the fixed pipe, the top end of the guide rod is fixed at the top in the box body, the electromagnet is fixed at the bottom end of the guide rod, the magnet plate is perpendicular to the guide rod, the magnet plate is provided with a guide hole and is fixed on the moving pipe, the guide rod penetrates through the guide hole and is in sliding connection with the inner wall of the guide hole, and the top of the magnet plate is connected with the top in the box body through the first spring;
the rotating assembly comprises a rotating shaft, a connecting bearing, a one-way bearing, a rotating gear, a rack, a supporting block, a second spring, a connecting rod and a push plate, wherein the axis of the rotating shaft is vertical to and intersected with the axis of the fixed pipe, the two rotating shafts are coaxially arranged, one end of the rotating shaft is fixed on the rotating plate, the inner ring of the one-way bearing is arranged at the other end of the rotating shaft, the inner ring of the connecting bearing is arranged on the rotating shaft, the outer ring of the connecting bearing is fixedly connected with the inner wall of the box body, the rotating gear is arranged on the outer ring of the one-way bearing, the rack is meshed with the rotating gear, the connecting rod is parallel to the fixed pipe and is fixed at the top of the rack, the push plate is vertical to the connecting rod and is fixed at the top end of the connecting rod, and, the push plate is positioned above the magnet plate, the distance between the push plate and the magnet plate is smaller than the distance between the moving pipe and the inner top of the box body, the supporting block is fixed on the inner wall of the box body, a connecting hole is formed in the supporting block, the connecting rod penetrates through the connecting hole and is in sliding connection with the inner wall of the connecting hole, a gap is formed between the supporting block and the rack, the second spring is positioned between the supporting block and the push plate, and the push plate is connected with the supporting block through the second spring;
the dust removing mechanism comprises two dust removing components, and the dust removing components correspond to the racks one by one and are arranged at the bottoms of the racks;
the dust removal assembly comprises an auxiliary pipe, a moving disc, nozzles, an air pipe, a first check valve, a second check valve and an air inlet hole, the air inlet hole is formed in the bottom of the box body, the auxiliary pipe and the moving disc are coaxially arranged with the connecting rod, the bottom end of the auxiliary pipe is hermetically and fixedly connected with the bottom in the box body, the air inlet hole is communicated with the auxiliary pipe, the first check valve is installed in the air inlet hole, the moving disc is arranged in the auxiliary pipe and fixed at the bottom of the rack, the moving disc is connected with the inner wall of the auxiliary pipe in a sliding and sealing mode, the nozzles are fixed on one side, close to the axis of the fixed pipe, of the auxiliary pipe, a lamp tube located at the bottom of the rotating plate is located between the two nozzles, one end of the air pipe is fixed on the auxiliary pipe and communicated with the auxiliary pipe, the other end of each nozzle is installed in the air, the second one-way valve is installed in the trachea.
Preferably, for dust prevention, a filter screen is installed in each of the two air pipes.
Preferably, in order to reduce a gap between the inner wall of the auxiliary tube and the moving plate, the inner wall of the auxiliary tube is coated with a sealing grease.
Preferably, the guide bar is coated with a lubricating oil in order to reduce friction between the guide bar and the inner wall of the guide hole.
Preferably, in order to facilitate the installation of the magnet plate, both ends of the guide rod are provided with chamfers.
Preferably, in order to realize automation, a photoelectric sensor and a PLC are arranged in the driving box, and both the photoelectric sensor and the electromagnet are electrically connected with the PLC.
Preferably, in order to improve the light utilization efficiency, the top and the bottom of the rotating plate are both mirror surfaces.
Preferably, in order to prolong the service life of the box body, the box body is provided with an anti-corrosion zinc coating.
Preferably, in order to improve the heat dissipation effect, the rotating plate is coated with heat-conducting silica gel.
Preferably, in order to realize buffering and vibration reduction, the push plate is made of rubber.
The photo-etching machine exposure device with high maintenance efficiency has the advantages that the exposure mechanism realizes the function of exposing ultraviolet rays, compared with the existing exposure mechanism, the exposure mechanism does not need to replace the lamp tube after the photo-etching machine stops running, the maintenance efficiency of the photo-etching machine is improved, not only can the function of removing dust on the lamp tube be realized, but also the function of removing the dust on the lamp tube can be realized through the dust removal mechanism, compared with the existing dust removal mechanism, the dust removal mechanism uses the movement of the rack as the driving force of nozzle air injection, and an integrated linkage structure is realized with the exposure mechanism, so that the practicability is stronger.
Drawings
The invention is further illustrated with reference to the following figures and examples.
FIG. 1 is a schematic structural diagram of an exposure apparatus of a high maintenance efficiency lithography machine according to the present invention;
FIG. 2 is a cross-sectional view of an exposure apparatus of a high maintenance lithography machine according to the present invention;
FIG. 3 is an enlarged view of portion A of FIG. 2;
FIG. 4 is a schematic structural diagram of a dust-removing component of the exposure apparatus of the high-maintenance lithography machine of the present invention;
in the figure: 1. the automatic cleaning device comprises a box body, 2 parts of a sealing cover, 3 parts of a rotating plate, 4 parts of a lamp tube, 5 parts of a fixed tube, 6 parts of a moving tube, 7 parts of an electromagnet, 8 parts of a magnet plate, 9 parts of a guide rod, 10 parts of a first spring, 11 parts of a rotating shaft, 12 parts of a connecting bearing, 13 parts of a one-way bearing, 14 parts of a rotating gear, 15 parts of a rack, 16 parts of a supporting block, 17 parts of a second spring, 18 parts of a connecting rod, 19 parts of a push plate, 20 parts of an auxiliary tube, 21 parts of a moving disc, 22 parts of a nozzle, 23 parts of an air tube, 24 parts of a first one-way valve, 25 parts of a second.
Detailed Description
The present invention will now be described in further detail with reference to the accompanying drawings. These drawings are simplified schematic views illustrating only the basic structure of the present invention in a schematic manner, and thus show only the constitution related to the present invention.
As shown in fig. 1-3, an exposure device of a lithography machine with high maintenance efficiency comprises a box body 1 and a sealing cover 2, wherein the box body 1 is in a cuboid shape, an opening is formed in the bottom of the box body 1, an access hole is formed in the top of the box body 1, the sealing cover 2 is arranged on the top of the box body 1 in a covering manner and is connected with the access hole in a sealing manner, and an exposure mechanism and a dust removal mechanism are arranged in the box body 1;
the exposure mechanism comprises a rotating plate 3, a sealing assembly, two lamp tubes 4 and two rotating assemblies, wherein the rotating plate 3 is horizontally arranged, the two lamp tubes 4 are arranged at the top and the bottom of the rotating plate 3 in the directions, the sealing assembly is arranged at the top of the rotating plate 3, and the rotating assemblies are respectively arranged at two sides of the rotating plate 3;
the sealing assembly comprises a fixed pipe 5, a moving pipe 6 and two moving units, the fixed pipe 5 is perpendicular to the rotating plate 3 and is just opposite to the access hole, the top end of the fixed pipe 5 is hermetically and fixedly connected with the top in the box body 1, a gap is arranged between the fixed pipe 5 and the rotating plate 3, the moving pipe 6 and the fixed pipe 5 are coaxially arranged, the bottom end of the fixed pipe 5 is inserted into the moving pipe 6, the fixed pipe 5 is slidably and hermetically connected with the moving pipe 6, the bottom end of the moving pipe 6 is abutted against and hermetically connected with the top of the rotating plate 3, a gap is arranged between the top end of the moving pipe 6 and the top in the box body 1, the lamp tube 4 positioned at the top of the rotating plate 3 is positioned in the moving pipe 6, and the moving units and the rotating assemblies are in one-to-one correspondence and are arranged on the outer wall of the moving pipe 6;
the moving unit comprises an electromagnet 7, a magnet plate 8, a guide rod 9 and a first spring 10, the guide rod 9 is parallel to the fixed tube 5, the top end of the guide rod 9 is fixed at the top in the box body 1, the electromagnet 7 is fixed at the bottom end of the guide rod 9, the magnet plate 8 is perpendicular to the guide rod 9, the magnet plate 8 is provided with a guide hole and fixed on the moving tube 6, the guide rod 9 penetrates through the guide hole and is in sliding connection with the inner wall of the guide hole, and the top of the magnet plate 8 is connected with the top in the box body 1 through the first spring 10;
the rotating assembly comprises a rotating shaft 11, a connecting bearing 12, a one-way bearing 13, a rotating gear 14, a rack 15, a supporting block 16, a second spring 17, a connecting rod 18 and a push plate 19, wherein the axis of the rotating shaft 11 is perpendicular to and intersected with the axis of the fixed pipe 5, the two rotating shafts 11 are coaxially arranged, one end of the rotating shaft 11 is fixed on the rotating plate 3, the inner ring of the one-way bearing 13 is arranged at the other end of the rotating shaft 11, the inner ring of the connecting bearing 12 is arranged on the rotating shaft 11, the outer ring of the connecting bearing 12 is fixedly connected with the inner wall of the box body 1, the rotating gear 14 is arranged on the outer ring of the one-way bearing 13, the rack 15 is meshed with the rotating gear 14, the connecting rod 18 is parallel to the fixed pipe 5 and is fixed at the top of the rack 15, the push plate 19 is perpendicular to the connecting rod 18 and is fixed at the top end of the connecting rod 18, and the distance between the axes, the push plate 19 is located above the magnet plate 8, the distance between the push plate 19 and the magnet plate 8 is smaller than the distance between the moving pipe 6 and the inner top of the box body 1, the supporting block 16 is fixed on the inner wall of the box body 1, the supporting block 16 is provided with a connecting hole, the connecting rod 18 passes through the connecting hole and is in sliding connection with the inner wall of the connecting hole, a gap is arranged between the supporting block 16 and the rack 15, the second spring 17 is located between the supporting block 16 and the push plate 19, and the push plate 19 is connected with the supporting block 16 through the second spring 17;
during the use of the device, the lamp tube 4 at the bottom of the rotating plate 3 is lighted to generate ultraviolet light, the ultraviolet light passes through the opening and is printed on a silicon wafer, after the lamp tube 4 at the bottom of the rotating plate 3 is damaged, the electromagnet 7 is electrified, so that mutually repulsive acting force is generated between the electromagnet 7 and the magnet plate 8, the magnet plate 8 moves on the guide rod 9 towards the direction far from the rotating plate 3, the first spring 10 is compressed, the moving tube 6 moves towards the direction far from the rotating plate 3, during the movement of the magnet plate 8 towards the direction far from the rotating plate 3, when the magnet plate 8 is abutted against the push plate 19, the push plate 19 can drive the connecting rod 18 to realize synchronous movement on the supporting block 16, the second spring 17 is stretched, the moving of the connecting rod 18 drives the rack 15 to realize synchronous movement, namely, the rotating gear 14 can drive the outer ring of the one-way bearing 13 to realize rotation, because the one-way bearing 13 can freely rotate in one direction, and a bearing locked in the other direction, at this time, the outer ring of the one-way bearing 13 drives the inner ring of the one-way bearing 13 to synchronously rotate, that is, the rotating shaft 11 rotates under the supporting action of the connecting bearing 12, the rotating plate 3 rotates 180 under the rotation of the rotating shaft 11, that is, the two lamp tubes 4 can exchange positions, and the undamaged lamp tubes 4 rotate to the bottom state of the rotating plate 3, here, because a gap is arranged between the magnet plate 8 and the push plate 19, the rotation of the rotating plate 3 and the movement of the moving tube 6 can be prevented from being synchronously executed and being blocked, then, the electromagnet 7 is powered off, the magnet plate 8 is reset under the elastic action of the first spring 10, that is, the moving tube 6 can be reset and abutted against the rotating plate 3, and the push plate 19 is reset under the elastic action of the second spring 17, that is, the outer ring of the one-way bearing 13 can reversely rotate, and at this time, the outer ring of the one-way bearing 13 cannot drive the inner ring of the one-way bearing 13 to rotate, then, a maintainer opens the sealing cover 2 to maintain the damaged lamp tube 4, and during maintenance, the photoetching machine does not need to stop running, so that time is saved, and the maintenance efficiency of the photoetching machine is improved.
As shown in fig. 4, the dust removing mechanism includes two dust removing assemblies, and the dust removing assemblies correspond to the racks 15 one by one and are arranged at the bottoms of the racks 15;
the dust removal assembly comprises an auxiliary pipe 20, a moving disc 21, nozzles 22, an air pipe 23, a first check valve 24, a second check valve 25 and an air inlet hole, the air inlet hole is formed in the bottom of the box body 1, the auxiliary pipe 20 and the moving disc 21 are coaxially arranged with the connecting rod 18, the bottom end of the auxiliary pipe 20 is hermetically and fixedly connected with the bottom in the box body 1, the air inlet hole is communicated with the auxiliary pipe 20, the first check valve 24 is installed in the air inlet hole, the moving disc 21 is arranged in the auxiliary pipe 20 and fixed at the bottom of the rack 15, the moving disc 21 is slidably and hermetically connected with the inner wall of the auxiliary pipe 20, the nozzles 22 are fixed on one side, close to the axis of the fixed pipe 5, of the auxiliary pipe 20, the lamp tubes 4 positioned at the bottom of the rotating plate 3 are positioned between the two nozzles 22, one end of the air pipe 23 is fixed on the auxiliary pipe 20 and communicated with the auxiliary pipe 20, and the other, the joint of the air pipe 23 and the fixed pipe 5 is positioned below the movable plate 21, and the second one-way valve 25 is installed in the air pipe 23.
During the movement of the rack 15 away from the first one-way valve 24, the movable disk 21 can be driven to synchronously move in the auxiliary tube 20, the air in the air tube 23 cannot be conveyed into the auxiliary tube 20 and only the air outside the box body 1 can be conveyed into the auxiliary tube 20 from the air inlet hole through the one-way characteristic of the second one-way valve 25, when the rack 15 moves in the reverse direction, the movable disk 21 is driven to reset, at the moment, the air in the auxiliary tube 20 cannot be discharged from the air inlet hole through the one-way characteristic of the first one-way valve 24, the air in the auxiliary tube 20 can only be conveyed to the nozzle 22 through the air tube 23 and is sprayed to the lamp tube 4 at the bottom of the rotating plate 3 from the nozzle 22, and the dust on the lamp tube 4 at the bottom of the rotating plate 3 can be separated from the lamp tube 4 under the action of the air flow, so that the dust removal.
Preferably, a filter screen 26 is installed in each of the two air pipes 23 for dust prevention.
The filter screen 26 is used for filtering dust in air, and dust prevention is achieved.
Preferably, in order to reduce the gap between the inner wall of the auxiliary tube 20 and the moving plate 21, the inner wall of the auxiliary tube 20 is coated with a sealing grease.
The sealing grease serves to reduce the gap between the inner wall of the auxiliary tube 20 and the movable plate 21, and improves the sealing property.
Preferably, the guide rod 9 is coated with a lubricating oil in order to reduce the friction between the guide rod 9 and the inner wall of the guide hole.
The lubricating oil is used for reducing the friction force between the guide rod 9 and the inner wall of the guide hole, and the moving fluency of the magnet plate 8 is improved.
Preferably, both ends of the guide rod 9 are chamfered to facilitate the installation of the magnet plate 8.
The chamfer has the effect of reducing the caliber of the guide rod 9 when passing through the guide hole and facilitating the installation of the magnet plate 8.
Preferably, in order to realize automation, a photoelectric sensor 27 and a PLC are arranged in the driving box, and both the photoelectric sensor 27 and the electromagnet 7 are electrically connected with the PLC.
PLC can program the logic controller, is mainly used for realizing central data processing, and when fluorescent tube 4 when rotor plate 3 bottom can't light, the data value that photoelectric sensor 27 detected is less than the settlement scope, and photoelectric sensor 27 sends a signal for PLC, and PLC control electro-magnet 7 circular telegram is cut off the power supply after the settlement time, has realized automaticly.
Preferably, in order to improve the light utilization efficiency, the top and the bottom of the rotating plate 3 are both mirror surfaces.
The rotating plate 3 of the mirror surface can reflect the ultraviolet light generated by the lamp tube 4, so that the light utilization rate is improved, namely the working efficiency is improved.
Preferably, in order to prolong the service life of the box body 1, an anti-corrosion zinc coating is arranged on the box body 1.
The function of anticorrosive galvanizing coat is to promote the rust-resistant ability of box 1, prolongs the life of box 1.
Preferably, in order to improve the heat dissipation effect, the rotating plate 3 is coated with heat conductive silica gel.
The lamp tube 4 generates heat during lighting and transmits the heat to the rotating plate 3, and the heat dissipation capability of the rotating plate 3 can be improved through the heat conduction silica gel, namely, the heat dissipation effect of the lamp tube 4 is improved.
Preferably, the material of the push plate 19 is rubber for achieving buffering and vibration reduction.
The rubber texture is softer, can reduce the impact force that produces when magnet board 8 and push pedal 19 support to lean on, has realized buffering and damping.
During the use of the device, the lamp tube 4 at the bottom of the rotating plate 3 is lighted to generate ultraviolet light, the ultraviolet light passes through the opening and is printed on a silicon wafer, after the lamp tube 4 at the bottom of the rotating plate 3 is damaged, the electromagnet 7 is electrified, so that mutually repulsive acting force is generated between the electromagnet 7 and the magnet plate 8, the magnet plate 8 moves on the guide rod 9 towards the direction far from the rotating plate 3, the first spring 10 is compressed, the moving tube 6 moves towards the direction far from the rotating plate 3, during the movement of the magnet plate 8 towards the direction far from the rotating plate 3, when the magnet plate 8 is abutted against the push plate 19, the push plate 19 can drive the connecting rod 18 to realize synchronous movement on the supporting block 16, the second spring 17 is stretched, the moving of the connecting rod 18 drives the rack 15 to realize synchronous movement, namely, the rotating gear 14 can drive the outer ring of the one-way bearing 13 to realize rotation, because the one-way bearing 13 can freely rotate in one direction, and a bearing locked in the other direction, at this time, the outer ring of the one-way bearing 13 drives the inner ring of the one-way bearing 13 to synchronously rotate, that is, the rotating shaft 11 rotates under the supporting action of the connecting bearing 12, the rotating plate 3 rotates 180 under the rotation of the rotating shaft 11, that is, the two lamp tubes 4 can exchange positions, and the undamaged lamp tubes 4 rotate to the bottom state of the rotating plate 3, here, because a gap is arranged between the magnet plate 8 and the push plate 19, the rotation of the rotating plate 3 and the movement of the moving tube 6 can be prevented from being synchronously executed and being blocked, then, the electromagnet 7 is powered off, the magnet plate 8 is reset under the elastic action of the first spring 10, that is, the moving tube 6 can be reset and abutted against the rotating plate 3, and the push plate 19 is reset under the elastic action of the second spring 17, that is, the outer ring of the one-way bearing 13 can reversely rotate, and at this time, the outer ring of the one-way bearing 13 can not drive the inner ring of the one-way bearing 13 to rotate, then, a maintainer opens the sealing cover 2 to maintain the damaged lamp tube 4, and during the maintenance, the photoetching machine does not need to stop running, the time is saved, the maintenance efficiency of the photoetching machine is improved, moreover, during the time that the rack 15 moves away from the first one-way valve 24, the moving disc 21 can be driven to synchronously move in the auxiliary tube 20, the air in the air pipe 23 can not be conveyed into the auxiliary tube 20 through the one-way characteristic of the second one-way valve 25, and only the air outside the box body 1 can be conveyed into the auxiliary tube 20 from the air inlet, when the rack 15 moves reversely, the moving disc 21 is driven to reset, at the moment, the air in the auxiliary tube 20 can not be discharged from the air inlet through the one-way characteristic of the first one-way valve 24, and only the air in the auxiliary tube 20 can be conveyed to the nozzle 22 through, and the air is sprayed to the lamp tubes 4 at the bottom of the rotating plate 3 from the nozzles 22, and the dust on the lamp tubes 4 at the bottom of the rotating plate 3 can be separated from the lamp tubes 4 under the action of the air flow, so that the dust removal is realized.
Compared with the prior art, this maintain efficient lithography machine exposure device has realized exposing ultraviolet function through exposure mechanism, compare with current exposure mechanism, this exposure mechanism need not to make and changes fluorescent tube 4 after the lithography machine shut down, the maintenance efficiency of lithography machine has been improved, moreover, can also realize the function of cleaing away the dust on fluorescent tube 4 through dust removal mechanism, compare with current dust removal mechanism, this dust removal mechanism passes through the removal of rack 15 and regards as the jet-propelled drive power of nozzle 22, integral type linkage structure has been realized with exposure mechanism, the practicality is stronger.
In light of the foregoing description of the preferred embodiment of the present invention, many modifications and variations will be apparent to those skilled in the art without departing from the spirit and scope of the invention. The technical scope of the present invention is not limited to the content of the specification, and must be determined according to the scope of the claims.
Claims (10)
1. The exposure device of the photoetching machine is high in maintenance efficiency and comprises a box body (1) and a sealing cover (2), wherein the box body (1) is in a cuboid shape, an opening is formed in the bottom of the box body (1), an access hole is formed in the top of the box body (1), the sealing cover (2) is covered on the top of the box body (1) and is in sealing connection with the access hole, and the exposure device is characterized in that an exposure mechanism and a dust removal mechanism are arranged in the box body (1);
the exposure mechanism comprises a rotating plate (3), a sealing assembly, two lamp tubes (4) and two rotating assemblies, wherein the rotating plate (3) is horizontally arranged, the directions of the two lamp tubes (4) are arranged at the top and the bottom of the rotating plate (3), the sealing assembly is arranged at the top of the rotating plate (3), and the rotating assemblies are respectively arranged at two sides of the rotating plate (3);
the sealing assembly comprises a fixed pipe (5), a moving pipe (6) and two moving units, the fixed pipe (5) is vertical to the rotating plate (3) and is arranged opposite to the access hole, the top end of the fixed pipe (5) is sealed and fixedly connected with the top part in the box body (1), a gap is arranged between the fixed pipe (5) and the rotating plate (3), the moving pipe (6) and the fixed pipe (5) are coaxially arranged, the bottom end of the fixed pipe (5) is inserted into the movable pipe (6), the fixed pipe (5) and the movable pipe (6) are connected in a sliding and sealing way, the bottom end of the moving pipe (6) is abutted against and hermetically connected with the top of the rotating plate (3), a gap is arranged between the top end of the movable tube (6) and the top part in the box body (1), the lamp tube (4) positioned at the top part of the rotating plate (3) is positioned in the movable tube (6), the moving units correspond to the rotating assemblies one by one and are arranged on the outer wall of the moving pipe (6);
the moving unit comprises an electromagnet (7), a magnet plate (8), a guide rod (9) and a first spring (10), the guide rod (9) is parallel to the fixed pipe (5), the top end of the guide rod (9) is fixed to the top of the box body (1), the electromagnet (7) is fixed to the bottom end of the guide rod (9), the magnet plate (8) is perpendicular to the guide rod (9), the magnet plate (8) is provided with a guide hole and fixed to the moving pipe (6), the guide rod (9) penetrates through the guide hole and is in sliding connection with the inner wall of the guide hole, and the top of the magnet plate (8) is connected with the top of the box body (1) through the first spring (10);
the rotating assembly comprises a rotating shaft (11), a connecting bearing (12), a one-way bearing (13), a rotating gear (14), a rack (15), a supporting block (16), a second spring (17), a connecting rod (18) and a push plate (19), wherein the axis of the rotating shaft (11) is perpendicular to and intersected with the axis of the fixed pipe (5), the two rotating shafts (11) are coaxially arranged, one end of the rotating shaft (11) is fixed on the rotating plate (3), the inner ring of the one-way bearing (13) is arranged at the other end of the rotating shaft (11), the inner ring of the connecting bearing (12) is arranged on the rotating shaft (11), the outer ring of the connecting bearing (12) is fixedly connected with the inner wall of the box body (1), the rotating gear (14) is arranged on the outer ring of the one-way bearing (13), the rack (15) is meshed with the rotating gear (14), the connecting rod (18) is parallel to the fixed pipe (5) and is fixed at the, the push plate (19) is vertical to the connecting rod (18) and is fixed at the top end of the connecting rod (18), the distance between the push plate (19) and the axis of the fixed tube (5) is less than the distance between one side of the magnet plate (8) far away from the fixed tube (5) and the axis of the fixed tube (5), the push plate (19) is positioned above the magnet plate (8), the distance between the push plate (19) and the magnet plate (8) is less than the distance between the moving pipe (6) and the inner top of the box body (1), the supporting block (16) is fixed on the inner wall of the box body (1), the supporting block (16) is provided with a connecting hole, the connecting rod (18) penetrates through the connecting hole and is in sliding connection with the inner wall of the connecting hole, a gap is arranged between the supporting block (16) and the rack (15), the second spring (17) is positioned between the supporting block (16) and the push plate (19), the push plate (19) is connected with the supporting block (16) through a second spring (17);
the dust removing mechanism comprises two dust removing components, the dust removing components correspond to the racks (15) one by one and are arranged at the bottoms of the racks (15);
the dust removal assembly comprises an auxiliary pipe (20), a moving disc (21), nozzles (22), an air pipe (23), a first one-way valve (24), a second one-way valve (25) and an air inlet hole, the air inlet hole is formed in the bottom of the box body (1), the auxiliary pipe (20) and the moving disc (21) are coaxially arranged with a connecting rod (18), the bottom end of the auxiliary pipe (20) is hermetically and fixedly connected with the bottom in the box body (1), the air inlet hole is communicated with the auxiliary pipe (20), the first one-way valve (24) is installed in the air inlet hole, the moving disc (21) is arranged in the auxiliary pipe (20) and fixed to the bottom of the rack (15), the moving disc (21) is slidably and hermetically connected with the inner wall of the auxiliary pipe (20), the nozzles (22) are fixed to one side, close to the axis of the fixed pipe (5), of the auxiliary pipe (20), and a lamp tube (4) located at the bottom of the rotating plate (3) is located between the two nozzles (22), one end of the air pipe (23) is fixed on the auxiliary pipe (20) and communicated with the auxiliary pipe (20), the other end of the nozzle (22) is installed in the air pipe (23), the joint of the air pipe (23) and the fixed pipe (5) is located below the movable disc (21), and the second one-way valve (25) is installed in the air pipe (23).
2. The exposure apparatus of the lithography machine with high maintenance efficiency as claimed in claim 1, wherein a filter screen (26) is installed in each of the two air pipes (23).
3. The exposure apparatus of the lithography machine with high maintenance efficiency according to claim 1, wherein the inner wall of the auxiliary tube (20) is coated with a sealing grease.
4. The exposure apparatus of the lithography machine with high maintenance efficiency as claimed in claim 1, wherein the guide rod (9) is coated with a lubricating oil.
5. The exposure apparatus of the lithography machine with high maintenance efficiency as claimed in claim 1, wherein both ends of the guide rod (9) are provided with chamfers.
6. The exposure apparatus of the lithography machine with high maintenance efficiency as claimed in claim 1, wherein a photoelectric sensor (27) and a PLC are arranged in the driving box, and the photoelectric sensor (27) and the electromagnet (7) are both electrically connected with the PLC.
7. The exposure apparatus of the lithography machine with high maintenance efficiency according to claim 1, wherein the top and the bottom of the rotating plate (3) are both mirror surfaces.
8. The exposure apparatus of the lithography machine with high maintenance efficiency as claimed in claim 1, wherein the box body (1) is provided with an anti-corrosion zinc coating.
9. The exposure apparatus of the lithography machine with high maintenance efficiency as claimed in claim 1, wherein the rotating plate (3) is coated with heat conductive silica gel.
10. The exposure apparatus of the lithography machine with high maintenance efficiency as claimed in claim 1, wherein the material of the pushing plate (19) is rubber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010845359.4A CN111999988A (en) | 2020-08-20 | 2020-08-20 | Lithography machine exposure device with high maintenance efficiency |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010845359.4A CN111999988A (en) | 2020-08-20 | 2020-08-20 | Lithography machine exposure device with high maintenance efficiency |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111999988A true CN111999988A (en) | 2020-11-27 |
Family
ID=73473956
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010845359.4A Withdrawn CN111999988A (en) | 2020-08-20 | 2020-08-20 | Lithography machine exposure device with high maintenance efficiency |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111999988A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113000977A (en) * | 2021-02-18 | 2021-06-22 | 河北经贸大学 | Clamping system |
-
2020
- 2020-08-20 CN CN202010845359.4A patent/CN111999988A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113000977A (en) * | 2021-02-18 | 2021-06-22 | 河北经贸大学 | Clamping system |
| CN113000977B (en) * | 2021-02-18 | 2023-04-11 | 河北经贸大学 | Clamping system |
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Application publication date: 20201127 |